Extreme ultraviolet grating monochromator

Abstract

An extreme ultraviolet grating monochromator disclosed by the present invention comprises a support assembly, a grating, an entrance slit and an exit slit, the grating is arranged on the support assembly, the grating is a single aberration correction toroidal grating, the entrance slit is arranged on the support assembly and is located at the entrance of the extreme ultraviolet grating monochromator, and the exit slit is arranged on the support assembly and is located at the exit of the extreme ultraviolet grating monochromator. The entrance slit is used for controlling a light beam entering the extreme ultraviolet grating monochromator so that the light beam can act on the grating, and the exit slit is arranged on the supporting assembly and located on a focus point of grating diffraction light. According to the extreme ultraviolet grating monochromator provided by the embodiment of the invention, the single aberration correction toroidal grating is adopted, so that high luminous flux and high signal-to-noise ratio of a spectrum can be ensured in an extreme ultraviolet band, astigmatism can be reduced to a certain extent, the performance of the extreme ultraviolet grating monochromator can be improved, and meanwhile, the performance of the extreme ultraviolet grating monochromator can be improved. The single aberration correction toroidal grating is simple in structure and convenient to mount and dismount, so that the convenience of replacement and maintenance of the grating can be improved to a certain extent, and the performance of the grating can be ensured.

Description

Technical Field

[0001] The present invention relates to the technical field of monochromators, and in particular to an extreme ultraviolet grating monochromator. Background Art

[0002] Extreme ultraviolet light is the main means of detecting and analyzing atomic and molecular scale structures, and is widely used in photoelectron spectroscopy, lithography, materials science, and environmental testing.

[0003] Among them, the extreme ultraviolet grating monochromator can decompose the composite light emitted by the extreme ultraviolet light source into monochromatic light, and can select monochromatic light of any wavelength in the extreme ultraviolet light band. Researchers can accurately study the optical properties, electronic structure and chemical reactions of substances at specific extreme ultraviolet wavelengths. For example, by measuring the absorption, emission or scattering of extreme ultraviolet light of different wavelengths by the substance, the composition, structure and energy level information of the substance can be determined.

[0004] However, the optical elements of existing EUV grating monochromators are complex, resulting in problems such as large light intensity loss, low signal-to-noise ratio, complex structure, and difficult assembly and adjustment, which affect the working performance of the EUV grating monochromator. Summary of the Invention

[0005] The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, the present invention proposes an EUV grating monochromator that not only ensures high spectral flux and a high signal-to-noise ratio in the EUV band, but also reduces astigmatism to a certain extent. Furthermore, the device has advantages such as a simple structure and ease of assembly and disassembly, thus resolving the technical problem of poor performance of EUV grating monochromators in the prior art.

[0006] An extreme ultraviolet grating monochromator according to an embodiment of the present invention includes: a support assembly; a grating, the grating being provided on the support assembly, the grating being a single-piece aberration-corrected hyper-torus grating; an entrance slit, the entrance slit being provided on the support assembly and located at the entrance of the extreme ultraviolet grating monochromator, the entrance slit being used to control a light beam entering the extreme ultraviolet grating monochromator so that the light beam acts on the grating; and an exit slit, the exit slit being provided on the support assembly and located at the focal point of the grating diffracted light.

[0007] According to the EUV grating monochromator of the embodiment of the present invention, by adopting a single-piece aberration-corrected hyper-toroidal grating, on the one hand, a high spectral light flux and a high signal-to-noise ratio can be ensured in the EUV band, and on the other hand, astigmatism can be reduced, thereby improving the performance of the EUV grating monochromator. At the same time, because the single-piece aberration-corrected hyper-toroidal grating has a simple structure and is easy to install and disassemble, it can also improve the convenience of grating replacement and maintenance to a certain extent, thereby ensuring the performance of the grating.

[0008] In some embodiments, the grating is detachably mounted on the support assembly.

[0009] In some embodiments, the incident angle of the grating is grazing incidence; and / or the angle between the incident light and the diffracted light of the grating is 142°.

[0010] In some embodiments, the extreme ultraviolet grating monochromator further includes: a vacuum cavity, the vacuum cavity being disposed in the supporting assembly, and the grating being disposed in the vacuum cavity; an incident pipe, the incident pipe being connected to the vacuum cavity and the incident cavity of the incident slit respectively; and an exit pipe, the exit pipe being connected to the vacuum cavity and the exit cavity of the exit slit respectively.

[0011] In some embodiments, the exit slit is detachably matched with the exit pipeline and the support assembly.

[0012] In some embodiments, a fastening clamp is provided at one end of the exit pipeline facing the exit slit, and the fastening clamp is used to achieve detachable sealing cooperation between the exit pipeline and the exit cavity or to achieve detachable sealing cooperation between the exit pipeline and the detector.

[0013] In some embodiments, a fastening bolt is provided at one end of the exit pipe facing the exit slit, and one end of the fastening bolt is sequentially passed through the exit pipe and the exit cavity and extends out of the exit cavity, so as to facilitate the use of the fastening bolt to achieve detachable cooperation between the exit pipe and the exit cavity or to achieve detachable cooperation between the exit pipe, the exit cavity and the detector.

[0014] In some embodiments, the opening size of the entrance slit and / or the exit slit is adjustable.

[0015] In some embodiments, the opening width of the incident slit and / or the exit slit ranges from 5 μm to 300 μm; and / or the incident slit and / or the exit slit has a first blade and a second blade arranged opposite to each other, the opening is formed between the first blade and the second blade, and the parallelism of the first blade and the second blade is ≤0.003 mm.

[0016] In some embodiments, the extreme ultraviolet grating monochromator further includes a sinusoidal drive mechanism and a rotation mechanism, both of which are arranged on the support assembly, the grating is arranged on the rotation mechanism, and the sinusoidal drive mechanism is used to drive the rotation mechanism to rotate.

[0017] Additional aspects and advantages of the invention will become apparent from the description which follows, or may be learned by practice of the invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The above and / or additional aspects and advantages of the present invention will become apparent and readily understood from the following description of the embodiments with reference to the accompanying drawings, in which:

[0019] Figure 1 Schematic diagram of an extreme ultraviolet grating monochromator according to some embodiments of the present invention.

[0020] Figure 2 Schematic diagram of gratings according to some embodiments of the present invention.

[0021] Figure 3 for Figure 2 Front view of .

[0022] Figure 4 for Figure 2 side view.

[0023] Figure 5 for Figure 2 rear view.

[0024] Figure 6 Schematic diagram of a grating at another viewing angle according to some embodiments of the present invention.

[0025] Figure 7 A diagram illustrating the range of raster scan rotation for some embodiments of the present invention.

[0026] Figure 8 Schematic diagram of a performance test 1 of an EUV grating monochromator according to some embodiments of the present invention.

[0027] Figure 9 for Figure 8 Front view of .

[0028] Figure 10 for Figure 8 Top view of .

[0029] Figure 11 for Figure 8 Schematic diagram of the detector.

[0030] Figure 12 for Figure 11 side view.

[0031] Figure 13 for Figure 11 Front view of .

[0032] Figure 14 for Figure 11 Top view of .

[0033] Figure 15 Schematic diagram of the second performance test of the EUV grating monochromator according to some embodiments of the present invention.

[0034] Figure 16 for Figure 15 Front view of .

[0035] Figure 17 for Figure 15 Top view of .

[0036] Figure 18 for Figure 15 Schematic diagram of the detector.

[0037] Figure 19 Schematic diagram of an exit slit according to some embodiments of the present invention.

[0038] Figure 20 for Figure 19 Sectional view along line AA.

[0039] Figure 21 for Figure 19 Magnified view of region I in the middle.

[0040] Figure 22 Schematic diagram of a sinusoidal drive mechanism, a rotation mechanism, and a grating according to some embodiments of the present invention.

[0041] Figure 23 This is a data diagram of test results of performance testing method 1 according to some embodiments of the present invention.

[0042] Figure 24 This is a spectrum line calibration data diagram of the performance test method 1 in some embodiments of the present invention.

[0043] Figure 25 This is a spectrum line calibration data diagram of the second performance testing method in some embodiments of the present invention.

[0044] Reference numerals:

[0045] 1000, extreme ultraviolet grating monochromator;

[0046] 100. Support assembly;

[0047] 200, grating;

[0048] 210, adjustment seat; 220, mounting seat; 230, adjustment mechanism;

[0049] 300, entrance slit;

[0050] 400, exit slit;

[0051] 410, exit cavity; 420, first blade; 430, second blade;

[0052] 920, extension spring; 930, hinge;

[0053] 500, vacuum chamber;

[0054] 600, outgoing pipeline; 610, incoming pipeline;

[0055] 700, tighten the clamp;

[0056] 710, tighten the bolts;

[0057] 800, detector; 810, bracket; 820, flange;

[0058] 900, sinusoidal drive mechanism; 950, driving member; 960, output shaft; 970, elastic member; 980, transmission member;

[0059] 910. Rotating mechanism. DETAILED DESCRIPTION

[0060] The following describes embodiments of the present invention in detail. Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended only to explain the present invention and are not to be construed as limiting the present invention.

[0061] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like to indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as limiting the present invention.

[0062] The following describes an EUV grating monochromator 1000 according to an embodiment of the present invention with reference to the accompanying drawings.

[0063] like Figure 1 As shown, an extreme ultraviolet grating monochromator 1000 according to an embodiment of the present invention includes: a supporting assembly 100 , a grating 200 , an entrance slit 300 and an exit slit 400 .

[0064] Among them, Figure 1 As shown, the support assembly 100 serves as the basic structure of the entire extreme ultraviolet grating monochromator 1000, providing stable support for other components of the extreme ultraviolet grating monochromator 1000 (such as the incident slit 300, the exit slit 400 and the grating 200, etc.), ensuring that they maintain the correct position and relative relationship during the installation process, thereby ensuring the normal operation of the extreme ultraviolet grating monochromator 1000 and the accuracy of the optical path.

[0065] Combine Figure 1 and Figure 2 As shown, grating 200 is disposed on support assembly 100. Grating 200 is a monolithic aberration-corrected toroidal grating. By disposing grating 200 on support assembly 100, the flat surface of support assembly 100 can be utilized to mount grating 200, facilitating positioning and securing grating 200. This, in turn, ensures the accuracy of grating 200 installation to a certain extent. Furthermore, support assembly 100 also provides a reference for grating 200 calibration, facilitating adjustment of parameters such as the angle and position of grating 200 to achieve optimal operating conditions, thereby ensuring the normal operation of EUV grating monochromator 1000 and the accuracy of the optical path.

[0066] At the same time, by adopting a single-piece aberration-corrected hypertoroid grating, because the hypertoroid grating is different from a plane or spherical grating, the surface shape of the hypertoroid grating is complex and can better correct the aberration. Therefore, on the one hand, it can ensure high luminous flux and high signal-to-noise ratio of the spectrum in the extreme ultraviolet band. On the other hand, it can also make the entire optical path unnecessary for reflectors and lenses, reduce astigmatism, and thus improve the performance of the extreme ultraviolet grating monochromator 1000.

[0067] At the same time, because the single-piece aberration-corrected hyper-torus grating is formed into a monolithic structure, the grating and aberration correction functions are integrated into one component, simplifying the system design, thereby making the structure of the grating 200 simple and easy to install and disassemble. To a certain extent, it can also improve the convenience of replacing and maintaining the grating 200, thereby ensuring the performance of the grating 200.

[0068] like Figure 1 As shown, the entrance slit 300 is provided on the support assembly 100 and is located at the entrance of the EUV grating monochromator 1000. The entrance slit 300 is used to control the light beam entering the EUV grating monochromator 1000 so that the light beam acts on the grating 200. This facilitates the use of the grating 200 to decompose composite light (including light of multiple wavelengths) into light of a single wavelength (monochromatic light), thereby ensuring the working performance of the EUV grating monochromator 1000 to a certain extent.

[0069] At the same time, by arranging the incident slit 300 on the supporting assembly 100 , it is also convenient to utilize the supporting assembly 100 to support the incident slit 300 , thereby improving the position stability of the incident slit 300 and ensuring the working performance of the incident slit 300 to a certain extent.

[0070] In some embodiments, the entrance slit 300 can, on the one hand, limit the light beam entering the extreme ultraviolet grating monochromator 1000 to a certain width range, so that the light beam is incident on the grating 200 in a specific size and shape, so that the light beam propagates in the extreme ultraviolet grating monochromator 1000 according to the designed optical path, avoiding the light beam being too wide, resulting in light scattering or unnecessary interaction with other components, thereby affecting the performance of the extreme ultraviolet grating monochromator 1000. On the other hand, the entrance slit 300 can perform preliminary screening and shaping of the light beam, remove stray light or irregular light components that may exist in the light beam, so that the light beam entering the grating 200 has better parallelism and uniformity, thereby improving the quality and stability of the output light of the grating 200 to a certain extent, thereby improving the performance of the extreme ultraviolet grating monochromator 1000.

[0071] like Figure 1 As shown, the exit slit 400 is provided on the support assembly 100 and is located at the focal point of the diffracted light from the grating 200. This allows light within a specific wavelength range to be selected from the light diffracted by the grating 200 for output, allowing the required monochromatic light to pass through the exit slit 400 while blocking light of other wavelengths. This improves the quality of the light output from the exit slit 400 and the accuracy of the signal to a certain extent, thereby enhancing the performance of the EUV grating monochromator 1000.

[0072] In addition, by arranging the exit slit 400 on the support assembly 100 , it is also convenient to utilize the support assembly 100 to support the exit slit 400 , thereby improving the position stability of the exit slit 400 and ensuring the working performance of the exit slit 400 to a certain extent.

[0073] As can be seen from the above structure, the extreme ultraviolet grating monochromator 1000 of the embodiment of the present invention, by adopting a single-piece aberration-corrected hyper-torroidal grating, can, on the one hand, ensure high luminous flux and high signal-to-noise ratio of the spectrum in the extreme ultraviolet band, and on the other hand, reduce astigmatism, thereby improving the performance of the extreme ultraviolet grating monochromator 1000. At the same time, it can also simplify the structure of the grating 200, facilitate the installation and disassembly of the grating 200, and to a certain extent improve the convenience of replacing and maintaining the grating 200, thereby ensuring the performance of the grating 200.

[0074] It can be understood that, compared with the prior art, the grating 200 of the present application adopts a single-piece aberration-corrected hyper-torus grating, which can, on the one hand, ensure high luminous flux and high signal-to-noise ratio of the spectrum in the extreme ultraviolet band, and on the other hand, it can also make the entire optical path unnecessary for reflectors and lenses. This simple optical design greatly reduces astigmatism, thereby improving the performance of the extreme ultraviolet grating monochromator 1000. At the same time, it can also simplify the structure of the grating 200, facilitate the installation and disassembly of the grating 200, and to a certain extent improve the convenience of replacing and maintaining the grating 200, thereby ensuring the performance of the grating 200.

[0075] In some embodiments, the grating 200 is detachably mounted on the support assembly 100. While achieving the goal of mounting the grating 200 on the support assembly 100, the difficulty of securing the grating 200 is reduced, thereby facilitating the installation, adjustment, and replacement of the grating 200 during subsequent use. Furthermore, it is convenient to select gratings 200 with different groove densities to design the system wavelength range of the EUV grating monochromator 1000, thereby broadening the use range of the EUV grating monochromator 1000 to a certain extent.

[0076] In some embodiments, combined Figure 1-Figure 5 As shown, the grating 200 includes an adjustment seat 210, a mounting seat 220, and an adjustment mechanism 230. The adjustment seat 210 is detachably mounted on the support assembly 100. This allows the grating 200 to be detachably mounted on the support assembly 100, thereby reducing the difficulty of matching the grating 200 with the support assembly 100. This facilitates the use of the support assembly 100 to support the grating 200, improves the positional stability of the grating 200, and ensures the working performance of the grating 200 to a certain extent.

[0077] It should be noted that the adjustment seat 210 mentioned here is provided on the support assembly 100 and can be fixed by welding, bonding or bolt connection, etc., and no specific limitation is made here.

[0078] In some embodiments, the mounting base 220 is movably mounted on the adjustment base 210. The mounting base 220 is hollowed to form a mounting cavity, and the grating 200 is mounted in the mounting cavity. By mounting the grating 200 in the mounting cavity, the grating 200 is mounted on the mounting base 220, thereby achieving a mating connection between the mounting base 220 and the grating 200.

[0079] At the same time, the mounting cavity in the mounting base 220 also provides stable support for the grating 200 , preventing the grating 200 from shaking, displacement or deformation during use to a certain extent, thereby ensuring the optical performance and measurement accuracy of the grating 200 .

[0080] In addition, by movably arranging the mounting seat 220 on the adjustment seat 210, the position of the mounting seat 220 relative to the adjustment seat 210 is adjustable. Since the grating 200 is arranged on the mounting seat 220 and the adjustment seat 210 is arranged on the support assembly 100, the position of the grating 200 relative to the support assembly 100 is adjustable, which facilitates the adjustment of the posture of the grating 200 and reduces the difficulty of adjusting the posture of the grating 200.

[0081] In some embodiments, combined Figure 2-Figure 5As shown, the adjustment mechanism 230 is connected to the mounting base 220 and is used to adjust the position of the mounting base 220 relative to the support assembly 100 to adjust the posture of the grating 200. This achieves the purpose of adjusting the posture of the grating 200 using the adjustment mechanism 230, reduces the difficulty of adjusting the posture of the grating 200, and facilitates quick and convenient adjustment of the grating 200, allowing the grating 200 to adapt to the application requirements of various loads, thereby improving the versatility and flexibility of the grating 200 to a certain extent.

[0082] In some embodiments, the angle of incidence of the grating 200 is grazing incidence. It should be noted that grazing incidence refers to the phenomenon in which light strikes the grating 200 at a very large angle of incidence (usually close to 90 degrees, i.e., almost parallel to the surface). Grazing incidence can, to a certain extent, increase the interaction length between the light beam and the surface of the grating 200, making the scattering and diffraction of the light beam more obvious, thereby enabling the grating 200 to effectively decompose the composite light into light beams of different wavelengths, thereby, to a certain extent, improving the dispersion efficiency of the light beam, improving the resolution of the extreme ultraviolet grating monochromator 1000, and making the monochromatic light output by the extreme ultraviolet grating monochromator 1000 higher in purity, so as to more accurately select light of a specific wavelength.

[0083] It should be noted that compared with vertical incidence or incidence at other angles, the energy impact of light on the surface of the grating 200 is relatively small during grazing incidence, which helps to reduce the damage that may be caused to the grating 200 due to long-term exposure to strong light, and to a certain extent can extend the service life of the grating 200 elements, thereby ensuring the long-term stable operation of the extreme ultraviolet grating monochromator 1000.

[0084] That is to say, by setting the incident angle of the grating 200 to grazing incidence, the resolution of the EUV grating monochromator 1000 can be improved while the service life of the grating 200 can be extended, thereby extending the service life of the EUV grating monochromator 1000.

[0085] At the same time, in the extreme ultraviolet band, the larger the incident angle, the better the reflectivity, and the smaller the incident angle, the worse the reflectivity. By setting the incident angle of the grating 200 to grazing incidence, the light intensity loss can be minimized.

[0086] In some embodiments, as Figure 6 As shown, the angle between the incident light and the diffracted light of the grating 200 is 142°. It should be noted that the incident light of the grating 200 can be understood as Figure 6 The diffracted light L1 shown in Figure 6 As shown in L2, Figure 6The S1 shown in FIG can be understood as the central axis of the grating 200, S2 is perpendicular to the center point O of S1, S2 can be understood as the normal of the grating 200, the angle α between the incident light L1 and S2 can be understood as the incident angle α of the grating 200, and the angle β between the diffracted light L2 and S2 can be understood as the exit angle β of the grating 200. Therefore, the angle between the incident light and the diffracted light of the grating 200 can be understood as Figure 6 The sum of the incident angle α and the exit angle β shown in , that is: incident angle α+exit angle β=142°.

[0087] It is worth noting that the grating 200 in the present application is a monolithic aberration-corrected hyper-toroidal grating, which itself has an optical design with a fixed included angle, i.e., the incident angle α + the exit angle β = 142°. The grating 200 rotates around the central axis S1 of the grating 200 to change the size of the incident angle α and the exit angle β, but the angle sum of the incident angle α and the exit angle β is always 142°.

[0088] It should also be noted that, since the grating 200 is a single-piece aberration-corrected hyper-torus grating and the incident angle α of the grating 200 is grazing incidence, the incident light L1 can be directly diffracted at the grating 200 to form the diffracted light L2, and the entire optical path does not require the use of reflectors and lenses in the prior art. This simple optical design greatly reduces astigmatism, which can not only simplify the structure of the extreme ultraviolet grating monochromator 1000, but also ensure high luminous flux and high signal-to-noise ratio of the spectrum in the extreme ultraviolet band, thereby ensuring the performance of the extreme ultraviolet grating monochromator 1000.

[0089] In a specific example, under the premise of using a single-piece aberration-corrected toroidal grating as the grating 200, the design parameters of the EUV grating monochromator 1000 are as follows: the nominal groove density n of the grating 200 is 550 gr / mm, the effective size of the grating 200 is 27 mm 2 ×27mm 2 The included angle ψ is 142°, the wavelength range is 10nm-50nm, the central wavelength λ0 is 15nm, the incident arm length La is 319.9mm, and the exit arm length Lb is 319.5mm. The effective size of the grating 200 refers to the length and height of the entire rectangle of the grating 200 facing the incident and diffracted light. The following are some formulas used in the experiments of this application:

[0090] According to the grating diffraction equation: d(sinα±sinβ)=mλ.

[0091] In the above formula, α is the incident angle, β is the diffraction angle, d is the grating constant, d = 1 / (550*10 -6), m is the diffraction order, here, m = 1, and the rules for using positive and negative signs in the formula are: when α and β are on the same side of the normal S2, the sign is positive; conversely, when α and β are on opposite sides of the normal S2, the sign is negative.

[0092] From the design parameters in the specific example, we can obtain: α+β=142°.

[0093] That is, when α and β are always on opposite sides of the normal, the above parameters are substituted into the grating diffraction equation:

[0094] sinα-sin(142-α)=550λ*106.

[0095] The scanning rotation range of the grating 200 is calculated as follows: Figure 7 shown.

[0096] According to calculations, some rotation margin needs to be reserved for the scanning of the grating 200, so the actual range of the incident angle α of the grating 200 is designed to be: 70.5° ~ 75.5°.

[0097] In some embodiments, as Figure 1 As shown, the extreme ultraviolet grating monochromator 1000 further includes: a vacuum chamber 500, an incident pipe 610, and an output pipe 600. The vacuum chamber 500 is disposed on a support assembly 100, and the grating 200 is disposed in the vacuum chamber 500. The vacuum chamber 500 is disposed on the support assembly 100 so that the support assembly 100 can support the vacuum chamber 500, thereby improving the positional stability of the vacuum chamber 500.

[0098] At the same time, since extreme ultraviolet light cannot propagate in the atmosphere, the light waves will be absorbed by the air. By placing the grating 200 in the vacuum cavity 500, the light can propagate normally.

[0099] In addition, by setting the grating 200 in the vacuum cavity 500, on the one hand, the influence of external environmental factors (such as air pressure, temperature changes, etc.) on the grating 200 can be reduced, and to a certain extent, the grating 200 can be prevented from being deformed due to thermal expansion and contraction or air pressure changes, which helps to improve the resolution of the extreme ultraviolet grating monochromator 1000; on the other hand, the vacuum cavity 500 can be used to isolate external interference sources such as vibration and sound waves, thereby reducing their influence on the internal optical system of the extreme ultraviolet grating monochromator 1000, and improving the quality and accuracy of the output signal of the extreme ultraviolet grating monochromator 1000; on the other hand, dust, water vapor and other impurities in the outside world can be prevented from adhering to the surface of the grating 200 to a certain extent, thereby avoiding problems such as light scattering, reduced reflectivity and reduced resolution caused by contamination of the grating 200, and to a certain extent, the service life of the grating 200 can be extended, so that the extreme ultraviolet grating monochromator 1000 can operate stably for a long time.

[0100] In a specific example, the internal optical system of the extreme ultraviolet grating monochromator 1000 operates under vacuum conditions, and the internal vacuum degree of the vacuum cavity 500 is 10 -4 Pa.

[0101] In some embodiments, as Figure 1 As shown, the incident pipe 610 is connected to the vacuum cavity 500 and the incident cavity of the incident slit 300. Here, the incident slit 300 has an incident cavity, and the vacuum cavity 500 and the incident cavity are connected through the incident pipe 610, so as to form a sealed channel between the vacuum cavity 500 and the incident cavity. This is conducive to maintaining the entire optical path system in a vacuum state. To a certain extent, it can ensure that the diffracted light can be transmitted accurately and stably, thereby reducing the scattering and loss of the diffracted light during the transmission process, so that the diffracted light has good directionality and intensity distribution, thereby improving the performance of the extreme ultraviolet grating monochromator 1000.

[0102] In some embodiments, as Figure 1 As shown, the exit pipe 600 is connected to the vacuum cavity 500 and the exit cavity 410 of the exit slit 400, respectively. Here, the exit slit 400 has the exit cavity 410, and the vacuum cavity 500 and the exit cavity 410 are connected via the exit pipe 600, so as to provide a sealed passage from the interior of the vacuum cavity 500 to the exit slit 400 for the diffracted light after being diffracted by the grating 200. This helps maintain the entire optical system in a vacuum state, and to a certain extent, ensures that the diffracted light can be transmitted accurately and stably, thereby reducing the scattering and loss of the diffracted light during transmission, and making the diffracted light have good directionality and intensity distribution, thereby improving the performance of the extreme ultraviolet grating monochromator 1000.

[0103] In some embodiments, a first seal (not shown) is provided between the incident conduit 610 and the incident cavity, and a second seal (not shown) is provided between the incident conduit 610 and the vacuum cavity 500. The first seal is used to achieve a sealed connection at the interface between the incident conduit 610 and the incident cavity, and the second seal is used to achieve a sealed connection at the interface between the incident conduit 610 and the vacuum cavity 500. To a certain extent, this ensures that the diffracted light transmitted from the incident cavity toward the vacuum cavity 500 is in a vacuum-sealed environment, thereby ensuring that the diffracted light has good directionality and intensity distribution, thereby improving the performance of the extreme ultraviolet grating monochromator 1000.

[0104] In some embodiments, a third seal (not shown) is provided between the vacuum chamber 500 and the exit pipe 600, and a fourth seal (not shown) is provided between the exit pipe 600 and the exit chamber 410. The third seal is used to achieve a sealed connection at the interface between the vacuum chamber 500 and the exit pipe 600, and the fourth seal is used to achieve a sealed connection at the interface between the exit chamber 410 and the exit pipe 600. To a certain extent, this ensures that the diffracted light transmitted from the vacuum chamber 500 to the exit chamber 410 is in a vacuum-sealed environment, thereby ensuring that the diffracted light has good directionality and intensity distribution, thereby improving the performance of the extreme ultraviolet grating monochromator 1000.

[0105] In some embodiments, the first seal, the second seal, the third seal, and the fourth seal are all sealed with fluororubber O-rings, which ensures the sealing effect and the ability to be reused.

[0106] Of course, in some other embodiments, the first seal, the second seal, the third seal, and the fourth seal may also be sealed with copper. It should be noted that, because copper has good ductility and flexibility, it can make the interface between the vacuum chamber 500 and the output pipe 600 and the interface between the output chamber 410 and the output pipe 600 fit tightly together. Even if the EUV grating monochromator 1000 is subjected to a certain degree of vibration, thermal expansion and contraction, or mechanical stress, the sealing performance of the interface between the vacuum chamber 500 and the output pipe 600 and the interface between the output chamber 410 and the output pipe 600 can be maintained, thereby preventing the leakage of diffracted light in the output pipe 600 to a certain extent, thereby improving the performance of the EUV grating monochromator 1000.

[0107] At the same time, copper has good corrosion resistance in a general working environment and can resist erosion by air, water vapor and some chemicals. Furthermore, to a certain extent, it can prevent the interface between the vacuum cavity 500 and the output pipe 600 and the interface between the output cavity 410 and the output pipe 600 from rusting and being damaged due to corrosion, thereby ensuring that the sealing of the interface between the vacuum cavity 500 and the output pipe 600 and the interface between the output cavity 410 and the output pipe 600 is reliable and has long-term effectiveness, thereby improving the performance of the extreme ultraviolet grating monochromator 1000.

[0108] In the description of the present invention, features defined as “first”, “second”, “third” and “fourth” may explicitly or implicitly include one or more such features, and are used to distinguish and describe features, without any distinction in order or importance.

[0109] In some embodiments, the exit slit 400 is detachably coupled to the exit pipe 600 and the support assembly 100. This can, on the one hand, reduce the difficulty of connecting the exit slit 400 to the exit pipe 600 and the support assembly 100, and on the other hand, facilitate the removal of the exit slit 400, thereby reducing the difficulty of assembly and disassembly of the exit slit 400.

[0110] It should be noted that the fixed connection between the exit slit 400 and the exit pipe 600 and the support assembly 100 can be achieved by bolts (not shown in the figure), so that the exit slit 400 and the exit pipe 600 and the support assembly 100 form a detachable connection, which facilitates the disassembly and replacement of the exit slit 400.

[0111] In some embodiments, the incident slit 300 and the supporting assembly 100 are detachably matched to reduce the difficulty of disassembling and assembling the incident slit 300 .

[0112] In some embodiments, combined Figure 8 、 Figure 9 and Figure 10 As shown, a fastening clamp 700 is provided at one end of the exit pipe 600 facing the exit slit 400. The fastening clamp 700 is used to achieve a detachable sealing fit between the exit pipe 600 and the exit cavity 410 or between the exit pipe 600 and the detector 800. This facilitates a tight connection between the exit pipe 600 and the exit cavity 410 or between the exit pipe 600 and the detector 800, and to a certain extent ensures the stability of the connection between the exit pipe 600 and the exit cavity 410 or between the exit pipe 600 and the detector 800, thereby improving the performance of the extreme ultraviolet grating monochromator 1000.

[0113] It should be noted that the installation and disassembly of the fastening clamp 700 is relatively convenient and quick. During the installation, debugging and subsequent maintenance of the extreme ultraviolet grating monochromator 1000, the fastening clamp 700 can be used to easily connect or disconnect the output pipe 600 and the output cavity 410 or the output pipe 600 and the detector 800 without the need for complicated tools and operations. This can improve work efficiency to a certain extent, thereby reducing the maintenance time and maintenance cost of the output pipe 600 and the output cavity 410 or the output pipe 600 and the detector 800.

[0114] It should also be noted that when the fastening clamp 700 is used to achieve detachable sealing between the output pipe 600 and the detector 800, it is mainly used to test the performance of the extreme ultraviolet grating monochromator 1000 using the detector 800.

[0115] Through the above arrangement, in some embodiments, when it is necessary to use the detector 800 to test the performance of the extreme ultraviolet grating monochromator 1000, the exit slit 400 can be first removed using the fastening clamp 700, and then the fastening clamp 700 can be used to achieve the matching connection between the exit pipe 600 and the detector 800.

[0116] In some embodiments, the detector 800 is an Andor DO920P back-illuminated CCD, the photosensitive area of the detector 800 is 26.7 mm×6.7 mm, the detector 800 has 1024×255 pixels and a pixel size of 26 μm×26 μm.

[0117] In a specific example, the performance test of the extreme ultraviolet grating monochromator 1000 uses a Penning lamp as the incident light source. The experiment of this application uses aluminum as the cathode material and introduces neon gas as the discharge gas to obtain standard spectral lines of different wavelengths. The performance test method of the extreme ultraviolet grating monochromator 1000 is as follows:

[0118] S1: After removing the exit slit 400, the detector 800 is connected to the exit pipe 600 by fastening the clamp 700 so that the detection surface of the detector 800 is placed at the focal point of the grating 200 to measure light of various wavelengths.

[0119] In some embodiments, combined Figure 11-14 As shown, the extreme ultraviolet grating monochromator 1000 also includes a bracket 810 and a flange 820. The bracket 810 is used to be fixedly connected to the support assembly 100, and the detector 800 is connected to the bracket 810 through the flange 820 to facilitate fixing the detector 800, thereby facilitating the coordinated connection between the detector 800 and the output pipe 600.

[0120] Among them, the bracket 810 mainly provides support for the detector 800 and the flange 820, so that the connection structure between the detector 800 and the output pipe 600 can be in a stable state, thereby ensuring the accuracy of the data when the detector 800 is measured.

[0121] S2: Set the parameters of the EUV grating monochromator 1000; the aperture size of the incident slit 300 is 65 μm, the detector 800 is Andor DO920P, the cooling temperature is -10 ° C, the integration time is set to 0.1 s, and the test results are as follows: Figure 23 As shown in Figure 24 shown.

[0122] In some embodiments, the calibration formula between wavelength and pixel of detector 800 is: λ=a+b*Pixel+c*Pixel*Pixel, where: a=2.57469; b=0.04366; c=6.78777E-6, λ is wavelength, and Pixel is pixel of detector 800.

[0123] In some embodiments, combined Figure 15 、 Figure 16 and Figure 17 As shown, a fastening bolt 710 is provided at one end of the exit pipe 600 facing the exit slit 400. One end of the fastening bolt 710 is sequentially passed through the exit pipe 600 and the exit cavity 410 and extends out of the exit cavity 410, so that the fastening bolt 710 can be used to achieve detachable connection between the exit pipe 600 and the exit cavity 410, or to achieve detachable connection between the exit pipe 600, the exit cavity 410, and the detector 800. In other words, the fastening clamp 700 is not limited to achieving the connection between the exit pipe 600 and the exit cavity 410. A fastening bolt 710 can also be provided to achieve the connection between the exit pipe 600 and the exit cavity 410.

[0124] Among them, when a fastening bolt 710 is provided to realize the matching connection between the exit pipe 600 and the exit cavity 410, one end of the fastening bolt 710 is successively passed through the exit pipe 600 and the exit cavity 410 and extends out of the exit cavity 410, so as to facilitate the use of the fastening bolt 710 to realize the detachable matching of the exit pipe 600, the exit cavity 410 and the detector 800. On the one hand, it can reduce the difficulty of connecting the exit pipe 600 and the exit cavity 410 or the exit pipe 600, the exit cavity 410 and the detector 800 to a certain extent; on the other hand, it can facilitate the installation and disassembly of the detector 800.

[0125] In some embodiments, as Figure 17 As shown, the number of fastening bolts 710 is set to be multiple. The multiple fastening bolts 710 can, to a certain extent, enhance the connection strength between the output pipe 600 and the output cavity 410, or achieve the output pipe 600, the output cavity 410, and the detector 800, thereby ensuring the position stability of the output pipe 600 and the output cavity 410, or achieve the output pipe 600, the output cavity 410, and the detector 800, to a certain extent, so as to facilitate the subsequent performance test of the extreme ultraviolet grating monochromator 1000.

[0126] In the description of the present invention, unless otherwise specified, "plurality" means two or more.

[0127] In some embodiments, when the exit pipe 600 , the exit cavity 410 and the detector 800 are detachably matched using the fastening bolts 710 , the performance of the extreme ultraviolet grating monochromator 1000 can be tested using the detector 800 without removing the exit slit 400 .

[0128] In a specific example, when testing the performance of EUV grating monochromator 1000, detector 800 is installed behind exit slit 400, with the detection surface of detector 800 and exit slit 400 at a distance of 38.8 mm. Because exit slit 400 blocks light, detector 800 measures a single spectrum, while scanning grating 200 yields a continuous spectrum.

[0129] In some embodiments, as Figure 18 As shown, the extreme ultraviolet grating monochromator 1000 further includes a flange 820 , which is installed behind the exit slit 400 and sealed to the exit cavity 410 , and the detector 800 is installed behind the flange 820 and sealed.

[0130] In some embodiments, the parameter settings of the above test method are: the opening size of the incident slit 300 is 65 μm, the opening size of the exit slit 400 is 68 μm, the integration time of the detector 800 is set to 0.1 s, and the test results of several single spectral line signals and the position of the driving translation stage are obtained. The relationship between the signal and the wavelength is obtained by fitting the formula. The spectral line calibration data is as follows: Figure 25 shown.

[0131] In the above test method, the wavelength and the position of the driving stage are calibrated using the formula: λ = 99.98203 - 11.25017*X + 0.00591*X*X, where X represents the driving stage reading in mm and λ represents the wavelength in nm.

[0132] In some embodiments, the aperture size of the input slit 300 and / or the output slit 400 is adjustable. This means that the aperture size of the input slit 300 is adjustable; or the aperture size of the output slit 400 is adjustable; or the aperture size of both the input slit 300 and the output slit 400 are adjustable. This allows, to a certain extent, high-precision online adjustment of the aperture size of the input slit 300 and / or the output slit 400, thereby finding the optimal balance between light flux and spectral resolution, thereby optimizing the signal-to-noise ratio to a certain extent.

[0133] It should be noted that when high-sensitivity detection is required, the opening of the incident slit 300 and / or the exit slit 400 can be appropriately increased, thereby increasing the light flux, and further increasing the intensity of the light signal received by the detector 800, thereby improving the sensitivity of detection; and when the light intensity is too strong and may cause the saturation of the detector 800 or affect the measurement accuracy, the opening of the incident slit 300 and / or the exit slit 400 can be reduced, thereby reducing the light flux, so that the detector 800 operates within a suitable dynamic range, thereby ensuring the accuracy of the measurement.

[0134] In addition, by adjusting the opening of the incident slit 300 and / or the exit slit 400, the optimal balance between the light flux and the spectral resolution can be found, thereby optimizing the signal-to-noise ratio. Under low light intensity conditions, appropriately increasing the opening of the incident slit 300 and / or the exit slit 400 can increase the signal strength. At the same time, by selecting a suitable detector 800 and signal processing method to suppress noise, the reliability of the measurement can be improved. When the spectral resolution is required to be high, the opening of the incident slit 300 and / or the exit slit 400 can be reduced to obtain a purer spectral signal, reduce stray light and other interference, and also help improve the signal-to-noise ratio.

[0135] In some embodiments, the aperture width of the input slit 300 and / or the output slit 400 ranges from 5 μm to 300 μm. If the aperture width range of the input slit 300 and / or the output slit 400 is too small, the aperture processing of the input slit 300 and / or the output slit 400 becomes difficult, increasing the manufacturing cost and processing difficulty of the input slit 300 and / or the output slit 400. If the aperture width range of the input slit 300 and / or the output slit 400 is too large, performance indicators such as resolution and spectral purity of the input slit 300 and / or the output slit 400 may be affected.

[0136] In summary, the present application sets the value range of the opening width of the incident slit 300 and / or the exit slit 400 to 5μm-300μm, which can reduce the processing difficulty of the opening of the incident slit 300 and / or the exit slit 400 to a certain extent, and at the same time can also ensure the performance indicators such as the resolution and spectral purity of the incident slit 300 and / or the exit slit 400 to a certain extent, thereby ensuring the performance of the extreme ultraviolet grating monochromator 1000.

[0137] Specifically, the opening width of the incident slit 300 and / or the exit slit 400 is 5μm, 25μm, 45μm, 63μm, 65μm, 68μm, 85μm, 105μm, 125μm, 145μm, 165μm, 185μm, 205μm, 225μm, 245μm, 265μm, 285μm or 300μm, etc.

[0138] In some specific examples, the opening width of the incident slit 300 is 63 μm, and the opening width of the exit slit 400 is 68 μm.

[0139] In some embodiments, combined Figure 19 、 Figure 20 and Figure 21 As shown, the entrance slit 300 and / or exit slit 400 includes a first blade 420 and a second blade 430 disposed opposite each other, with an opening formed therebetween. The parallelism between the first blade 420 and the second blade 430 is ≤ 0.003 mm. The arrangement of the first blade 420 and the second blade 430 opposing each other on the entrance slit 300 and / or exit slit 400 allows the size of the opening of the entrance slit 300 and / or exit slit 400 to be adjustable, thereby reducing the difficulty of adjusting the size of the opening of the entrance slit 300 and / or exit slit 400.

[0140] It should be noted that when the range of values of the parallelism of the first blade 420 and the second blade 430 is too large, the parallel offset of the relative position relationship of the first blade 420 and the second blade 430 will be too large, which will in turn affect the accuracy of the first blade 420 and the second blade 430, thereby affecting the accuracy of the opening size of the incident slit 300 and / or the exit slit 400.

[0141] In summary, the present application sets the parallelism of the first blade 420 and the second blade 430 to ≤0.003mm, which can, to a certain extent, avoid excessive parallel offset of the relative position relationship of the first blade 420 and the second blade 430, thereby ensuring the accuracy of the first blade 420 and the second blade 430, and thus, to a certain extent, ensuring the accuracy of the opening size of the incident slit 300 and / or the exit slit 400.

[0142] Specifically, the parallelism between the first blade 420 and the second blade 430 is 0.001 mm, 0.002 mm, or 0.003 mm.

[0143] In some embodiments, combined Figure 19 、 Figure 20 and Figure 21 As shown, the EUV grating monochromator 1000 further includes a tension spring 920 and a hinge 930. The hinge 930 connects the first blade 420 and the second blade 430 respectively, and is used to control the relative opening and closing of the first blade 420 and the second blade 430 in the first direction. The tension spring 920 is used to reset and close the first blade 420 and the second blade 430 after opening. It should be noted that the first direction mentioned here can be understood as Figure 21, wherein, by setting a hinge 930, the relative movement of the first blade 420 and the second blade 430 in the Y direction can be positioned and guided, so that the first blade 420 and the second blade 430 maintain a certain degree of parallelism during the opening or closing process in the Y direction, and to a certain extent, the first blade 420 and the second blade 430 can be prevented from offsetting or shaking, thereby ensuring the parallelism of the first blade 420 and the second blade 430. By setting a tension spring 920, after the hinge 930 controls the first blade 420 and the second blade 430 to close for the first time, the tension spring 920 generates elastic force, so that the first blade 420 and the second blade 430 can be restored to the initial position, thereby achieving complete closure of the first blade 420 and the second blade 430.

[0144] In some embodiments, combined Figure 1 and Figure 22 As shown, the EUV grating monochromator 1000 further includes a sinusoidal drive mechanism 900 and a rotation mechanism 910. Both the sinusoidal drive mechanism 900 and the rotation mechanism 910 are disposed on the support assembly 100. The grating 200 is disposed on the rotation mechanism 910. The sinusoidal drive mechanism 900 is used to drive the rotation mechanism 910 to rotate. The sinusoidal drive mechanism 900 can precisely drive the rotation mechanism 910 to rotate, thereby enabling precise control of the rotation angle of the grating 200 using the rotation mechanism 910. This further changes the diffraction angle of the incident light by the grating 200, allowing light of a specific wavelength to propagate and exit along the direction of the exit slit 400, while light of other wavelengths is blocked or deviates from the exit direction, thereby enabling the desired monochromatic light to be selected from the composite light.

[0145] It should be noted that the spectral scanning of the grating 200 adopts the sinusoidal drive mechanism 900, which can make the grating 200 have the advantage of high precision, which is beneficial to improving the performance of the extreme ultraviolet grating monochromator 1000.

[0146] In some embodiments, as Figure 22As shown, the sinusoidal drive mechanism 900 also includes a driving member 950, an output shaft 960 and a transmission member 980. One end of the output shaft 960 is connected to the driving member 950, and the driving member 950 is used to drive the output shaft 960 to reciprocate. One end of the transmission member 980 is fixedly connected to the rotating mechanism 910, and the other end of the transmission member 980 cooperates with the other end of the output shaft 960 to form a rotating pair. The movement of the output shaft 960 is used to drive the transmission member 980 to rotate. That is to say, the driving member 950 drives the output shaft 960 to reciprocate, and the movement of the output shaft 960 is used to drive the transmission member 980 to rotate, so as to realize the use of the driving member 950 to drive the transmission member 980 to rotate. Since one end of the transmission member 980 is fixedly connected to the rotating mechanism 910, the driving member 950 is used to drive the rotating mechanism 910 to rotate, thereby achieving the purpose of using the sinusoidal driving mechanism 900 to control the rotation of the rotating mechanism 910 relative to the support assembly 100, thereby achieving the purpose of using the sinusoidal driving mechanism 900 to control the rotation of the grating 200 relative to the support assembly 100, thereby reducing the control difficulty of the sinusoidal driving mechanism 900.

[0147] In a specific example, the driving member 950 serves as a power source to provide power for the sinusoidal driving mechanism 900. When the driving member 950 drives the output shaft 960, the output shaft 960 can realize reciprocating motion so as to transmit power to the transmission member 980. Because the other end of the transmission member 980 cooperates with the other end of the output shaft 960 to form a rotating pair, the linear motion of the driving member 950 can be converted into the rotational motion of the rotating mechanism 910. Furthermore, to a certain extent, the rotating mechanism 910 can accurately drive the grating 200 to move, thereby improving the alignment accuracy of the scanning of the grating 200, so that the data collected by the extreme ultraviolet grating monochromator 1000 in subsequent tests is more accurate.

[0148] In some embodiments, as Figure 22 As shown, the sinusoidal drive mechanism 900 further includes an elastic member 970, one end of which is connected to the output shaft 960 and the other end is connected to the transmission member 980. Since the angle between the sine drive mechanism 900 and the rotating mechanism 910 changes when the sine drive mechanism 900 drives the rotating mechanism 910, the elastic member 970 is used to cushion the impact of this angle change on the sine drive mechanism 900 when driving the rotating mechanism 910. To a certain extent, this can prevent the sine drive mechanism 900 from shaking when driving the rotating mechanism 910, ensuring that the rotating mechanism 910 can rotate accurately, thereby achieving accuracy in the scanning of the grating 200.

[0149] The elastic member 970 mentioned here can be understood as a spring.

[0150] In some embodiments, light emitted by the light source reaches the grating 200 through the incident slit 300. The grating 200 separates the monochromatic light and focuses it at the exit slit 400. The sinusoidal drive mechanism 900 drives the rotating mechanism 910 to rotate around the central axis S1 of the grating 200, thereby changing the incident angle of the grating 200, thereby completing the spectrum scanning.

[0151] In some embodiments, the sinusoidal drive mechanism 900 uses a linear translation stage to drive the grating 200 to rotate. According to the characteristics of the sinusoidal drive mechanism 900, when the sinusoidal arm and the translation stage drive arm are perpendicular, that is, when the output shaft 960 and the transmission member 980 are perpendicular, the resolution is the worst. The resolution can be deduced to be:

[0152] In the above formula, ΔL is the resolution of the driven linear translation stage, which is 0.002 mm. The sine arm Lc = 105 mm, so θ ≤ 2.75″. Similarly, given that the incident angle α of the grating 200 ranges from 70.5° to 75.5°, the travel of the driven translation stage can be calculated to be ≥ 13.12 mm.

[0153] In the description of the present invention, it should be noted that, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "connected" should be understood in a broad sense. For example, they may refer to fixed, detachable, or integral connections; mechanical or electrical connections; direct or indirect connections through an intermediate medium; and internal communication between two components. Those skilled in the art will understand the specific meanings of the above terms in the present invention based on the specific circumstances.

[0154] Other components of the EUV grating monochromator 1000 according to the embodiment of the present invention, such as the specific structures of the supporting assembly 100 and the driving member 950 , are well known to those skilled in the art and will not be described in detail here.

[0155] Throughout this specification, reference to terms such as "embodiment" or "example" indicates that the specific features, structures, materials, or characteristics described in conjunction with that embodiment or example are included in at least one embodiment or example of the present invention. In this specification, schematic representations of these terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

[0156] While embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions, and variations may be made to the embodiments without departing from the principles and spirit of the invention, and that the scope of the invention is defined by the claims and their equivalents.

Claims

1. An extreme ultraviolet grating monochromator, characterized in that include: Support assembly (100); A grating (200), the grating (200) being arranged on the supporting assembly (100), and the grating (200) being a single-piece aberration-corrected toroidal grating; an incident slit (300), the incident slit (300) being provided on the supporting assembly (100) and located at the entrance of the extreme ultraviolet grating monochromator, the incident slit (300) being used to control a light beam entering the extreme ultraviolet grating monochromator so that the light beam acts on the grating (200); An exit slit (400) is provided on the support assembly (100) and is located at a focal point of the diffracted light of the grating (200).

2. The extreme ultraviolet grating monochromator according to claim 1, characterized in that The grating (200) is detachably arranged on the supporting assembly (100).

3. The extreme ultraviolet grating monochromator according to claim 1, characterized in that The incident angle of the grating (200) is grazing incidence; And / or, the angle between the incident light and the diffracted light of the grating (200) is 142°.

4. The extreme ultraviolet grating monochromator according to claim 1, characterized in that Also includes: A vacuum cavity (500), the vacuum cavity (500) being arranged on the support assembly (100), and the grating (200) being arranged in the vacuum cavity (500); an incident pipeline (610), the incident pipeline (610) being connected to the vacuum cavity (500) and the incident cavity of the incident slit (300); An exit pipeline (600), the exit pipeline (600) is connected to the vacuum cavity (500) and the exit cavity (410) of the exit slit (400) respectively.

5. The extreme ultraviolet grating monochromator according to claim 4, characterized in that: The exit slit (400), the exit pipeline (600), and the support assembly (100) are detachably matched.

6. The extreme ultraviolet grating monochromator according to claim 5, characterized in that A fastening clamp (700) is provided at one end of the exit pipeline (600) facing the exit slit (400), and the fastening clamp (700) is used to achieve a detachable sealing fit between the exit pipeline (600) and the exit cavity (410) or to achieve a detachable sealing fit between the exit pipeline (600) and the detector (800).

7. The extreme ultraviolet grating monochromator according to claim 4, characterized in that A fastening bolt (710) is provided at one end of the exit pipeline (600) facing the exit slit (400), and one end of the fastening bolt (710) is sequentially passed through the exit pipeline (600) and the exit cavity (410) and extends out of the exit cavity (410), so as to facilitate the use of the fastening bolt (710) to achieve detachable matching of the exit pipeline (600) and the exit cavity (410) or to achieve detachable matching of the exit pipeline (600), the exit cavity (410) and the detector (800).

8. The extreme ultraviolet grating monochromator according to claim 1, characterized in that: The opening size of the incident slit (300) and / or the exit slit (400) is adjustable.

9. The extreme ultraviolet grating monochromator according to claim 4, characterized in that: The opening width of the incident slit (300) and / or the exit slit (400) is in the range of 5 μm to 300 μm; And / or, the incident slit (300) and / or the exit slit (400) has a first blade (420) and a second blade (430) that are arranged opposite to each other, the opening is formed between the first blade (420) and the second blade (430), and the parallelism of the first blade (420) and the second blade (430) is ≤0.003 mm.

10. The extreme ultraviolet grating monochromator according to any one of claims 1 to 9, characterized in that: The invention also includes a sinusoidal drive mechanism (900) and a rotation mechanism (910), wherein the sinusoidal drive mechanism (900) and the rotation mechanism (910) are both arranged on the support assembly (100), the grating (200) is arranged on the rotation mechanism (910), and the sinusoidal drive mechanism (900) is used to drive the rotation mechanism (910) to rotate.

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