Switch type supporting mechanism

Abstract

The invention provides a switch type supporting mechanism which is suitable for an inner box base of a double-layer photomask container. A switch of a static dissipation conduction path is built between the switch type supporting mechanism and the inner box base, and when a supporting piece of the switch type supporting mechanism is pressed by the photomask and makes contact with the inner box base, the static dissipation conduction path is opened, so that static charges accumulated on the front face of the photomask are conducted and dissipated. Otherwise, the supporting piece does not make contact with the inner box base, and the static dissipation conduction path is closed. Therefore, the problems of carbon pollution, damage and the like caused by electric breakdown of the supporting piece due to the arc discharge phenomenon caused by the voltage difference between the electrostatic charge of the photomask and the existing supporting mechanism can be avoided.

Description

Technical Field

[0001] The present invention relates to a support mechanism for a photomask container, and in particular to a switch-type support mechanism. Background Art

[0002] Today's extreme ultraviolet (EUV) masks carry residual static electricity (e.g., positive charge) on their front surfaces during exposure. Existing mask supports are secured within the inner box (EIP) of the mask container and configured to provide electrostatic dissipation (ESD). When the inner box is placed within the scanner and opened, the supports, inner box base, and equipment arm are electrically connected to each other and to ground, forming an electrical conduction path. In this case, when the mask is placed back onto the inner box base and contacts the supports, the residual static electricity on the mask surface is dissipated through the electrical conduction path.

[0003] For reticles that have been exposed multiple times, the accumulated charge on the surface of the reticles continues to build up, resulting in a significant charge. When such reticles are placed back onto the inner box base, which features static dissipation, arcing can easily occur due to the excessive voltage between the reticles and the support, as positive and negative charges attract. This can lead to electrical breakdown of the support, resulting in carbon contamination (C-burst) and damage to the support.

[0004] If the support is entirely made of insulating material (without electrostatic dissipation capabilities), the static electricity accumulated on the photomask cannot be dissipated through any path, resulting in a significant potential difference between the photomask and the support. In this case, if any residue from the photomask's metal coating remains on the support surface, arc discharge is likely to occur, and the damage caused is much more serious than if the support were made of electrostatic dissipative materials. Therefore, solving the arc discharge problem and effectively dissipating the static charge on the photomask is an urgent problem to be solved. Summary of the Invention

[0005] In view of the aforementioned problems, the present invention proposes a switch-type support mechanism that can solve the arc discharge problem and effectively dissipate the static charge on the mask.

[0006] The present invention proposes a switch-type support mechanism suitable for the inner box base of a double-layer mask container, the switch-type support mechanism comprising: a base body, arranged on the inner box base; a support member, comprising an electrostatic dissipative material, the support member passing through the base body to the vicinity of the inner box base; and an insulating isolation member, for isolating the contact between the base body and the support member, allowing the support member to reciprocate relative to the base body so that the support member contacts the inner box base to establish an electrostatic dissipative conductive path, or maintaining a distance between the support member and the inner box base to close the electrostatic dissipative conductive path.

[0007] In a specific embodiment, when the support member is not subjected to external force, the support member leaves the inner box base, so that the distance between the support member and the inner box base is maintained to close the electrostatic dissipation conductive path; when the support member is subjected to external force, the support member contacts the inner box base to establish the electrostatic dissipation conductive path.

[0008] In a specific embodiment, the base body includes a mounting portion and a mounting hole passing through the mounting portion and the base body, and the insulating isolation piece includes a contact portion and a connecting portion, the contact portion supports the upper surface of the mounting portion, and the connecting portion fixes the insulating isolation piece to the mounting portion through the mounting hole.

[0009] In a specific embodiment, the support member includes a bearing portion, a contact portion, and a latch portion located between the bearing portion and the contact portion. The insulating isolation member has a through hole connected to the mounting hole. The latch portion is inserted into the through hole and the mounting hole so that the contact portion is adjacent to the inner box base, and the bearing portion is located on the upper surface of the abutting portion.

[0010] In a specific embodiment, the insulating spacer includes at least one mounting structure located outside the connecting portion. The mounting structure is fixed to the lower surface of the mounting portion after passing through an extended expansion hole of the mounting hole.

[0011] In a specific embodiment, the upper surface of the mounting portion is provided with a mounting groove, the connecting portion of the insulating isolator is disposed in the mounting groove, and the abutting portion abuts against the peripheral upper surface of the mounting groove to fix the insulating isolator in the mounting portion.

[0012] In a specific embodiment, the insulating spacer is made of elastic material. When external force is applied or released to the support member, the insulating spacer undergoes elastic compression deformation or elastic release and reset, allowing the support member to perform reciprocating motion.

[0013] In a specific embodiment, the switch-type support mechanism further includes an insulating anti-slip element disposed between the base and the support member, and the insulating anti-slip element prevents the support member from being separated from between the base and the insulating isolation member.

[0014] In a specific embodiment, the support member includes a bearing portion, a contact portion, and a latch portion located between the bearing portion and the contact portion, and the insulating anti-fallout element is sleeved on the latch portion.

[0015] In a specific embodiment, the base body includes a mounting portion and a mounting hole passing through the mounting portion and the base body, and a mounting groove is provided on the upper surface of the mounting portion; the support member includes a bearing portion, a contact portion, and a latch portion located between the bearing portion and the contact portion; the insulating isolation member is arranged in the mounting groove, and the insulating isolation member has a through hole connected to the mounting hole, and the latch portion is passed through the through hole and the mounting hole, so that the contact portion is adjacent to the inner box base, and the lower surface of the bearing portion is located on the upper surface of the insulating isolation member.

[0016] In one embodiment, a static dissipation element is further disposed on the top and / or bottom of the support member.

[0017] In a specific embodiment, the support member and the inner box base establish the static dissipation conductive path, and the static dissipation conductive path is connected to a device arm to discharge static charge to the ground through the device arm.

[0018] The switch-type support mechanism proposed by the present invention has the following characteristics and advantages:

[0019] By establishing a switch that provides a static dissipation path, this invention aims to address the problem of arcing caused by voltage differences when a photomask, when subjected to high static buildup, approaches a support structure, leading to electrical breakdown and carbon contamination (C-burst) and damage to the support structure. Furthermore, this device can quickly dissipate residual static electricity on the photomask surface after exposure. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] The present invention may be further understood with reference to the following figures and descriptions. Non-limiting and non-exhaustive examples are described with reference to the following figures. The components in the figures are not necessarily to actual size; the emphasis is on illustrating the structure and principles.

[0021] Figure 1 It is a three-dimensional diagram of an inner box base provided with an embodiment of the present invention.

[0022] Figure 2 for Figure 1 A partial enlarged view of area A in the middle.

[0023] Figure 3 This is an exploded view of the switch-type support mechanism according to the first embodiment of the present invention.

[0024] Figure 4A When the switch-type support mechanism of the first embodiment of the present invention is in the state where the electrostatic dissipation conductive path is open, Figure 2 Schematic diagram of the cross section of line segment aa.

[0025] Figure 4BWhen the switch-type support mechanism of the first embodiment of the present invention is in the state where the electrostatic dissipation conductive path is closed, Figure 2 Schematic diagram of the cross section of line segment aa.

[0026] Figure 5 This is an exploded view of a switch-type support mechanism according to a second embodiment of the present invention.

[0027] Figure 6A FIG2 is a cross-sectional diagram of a switch-type support mechanism according to a second embodiment of the present invention when the electrostatic dissipation conductive path is open.

[0028] Figure 6B FIG2 is a cross-sectional diagram of a switch-type support mechanism according to a second embodiment of the present invention when the electrostatic dissipation conductive path is closed.

[0029] Figure 7 This is an exploded view of a switch-type support mechanism according to a third embodiment of the present invention.

[0030] Figure 8A FIG. 1 is a cross-sectional diagram of a switch-type support mechanism according to a third embodiment of the present invention when the electrostatic dissipation conductive path is open.

[0031] Figure 8B FIG. 1 is a cross-sectional diagram of a switch-type support mechanism according to a third embodiment of the present invention when the electrostatic dissipation conductive path is closed.

[0032] Figure 9A This is a cross-sectional schematic diagram of the switch-type support mechanism of the first variation of the present invention when the electrostatic dissipation conductive path is open.

[0033] Figure 9B It is a cross-sectional schematic diagram of the switch-type support mechanism of the first variation of the present invention when the electrostatic dissipation conductive path is closed.

[0034] Figure 10A This is a cross-sectional schematic diagram of the switch-type support mechanism of the second variation of the present invention when the electrostatic dissipation conductive path is open.

[0035] Figure 10B This is a cross-sectional schematic diagram of the switch-type support mechanism of the second variation of the present invention when the electrostatic dissipation conductive path is closed.

[0036] Figure 11A Schematic cross-sectional view of the switch-type support mechanism of the third variation of the present invention when the electrostatic dissipation conductive path is open.

[0037] Figure 11B Schematic cross-sectional view of the switch-type support mechanism according to the third variation of the present invention when the electrostatic dissipation conductive path is closed.

[0038] Description of Reference Numerals

[0039] 20. Switch type support mechanism;

[0040] 21. Base body;

[0041] 211, installation department;

[0042] 212, limit part;

[0043] 213, mounting hole;

[0044] 214, extension and expansion;

[0045] 215, base;

[0046] 22. Insulation spacers;

[0047] 221. Contact part;

[0048] 222, connecting part;

[0049] 223, meshing portion;

[0050] 224. Installation structure;

[0051] 225, through hole;

[0052] 23. Support members;

[0053] 231, bearing part;

[0054] 232, latch part;

[0055] 233. Insulation anti-slip components;

[0056] 234. Contact department;

[0057] 24. Static dissipative components;

[0058] 25. Static dissipative components;

[0059] 30. Switch type support mechanism;

[0060] 314, groove;

[0061] 316, restricted structure;

[0062] 34. Insulation anti-slip components;

[0063] 333, groove;

[0064] 40. Switch type support mechanism;

[0065] 414, groove;

[0066] 416. Restricted structure;

[0067] 42. Insulation anti-slip components;

[0068] 433, groove;

[0069] R, mask;

[0070] d. Spacing. DETAILED DESCRIPTION

[0071] See also Figure 1 The present invention provides a photomask container having a switchable support mechanism capable of opening and closing an electrostatic dissipation path. The photomask container is a photomask dual pod, comprising an outer pod and an inner pod accommodated in the outer pod. The switchable support mechanism of the present invention is applicable to the base of the inner pod. Figure 1 The embodiment only shows an inner box base 100 included in the inner box, and a cover of the inner box is omitted. The inner box base 100 is provided with a plurality of switch-type supporting mechanisms 20 for supporting a photomask R.

[0072] See also Figure 2 , the four corners of the photomask R correspond to four switch-type support mechanisms 20 respectively. The inner box base 100 of this embodiment has a groove, and the switch-type support mechanism 20 is configured in the groove. The present invention is not limited to the inner box base 100 with a groove, and the area where the photomask is placed and the switch-type support mechanism 20 are set can be coplanar. The switch-type support mechanism 20 includes a base 21, an insulating spacer 22, and a support 23. The base 21 is set on the inner box base 100 of the photomask container, the insulating spacer 22 is set on the base 21, and the support 23 is set adjacent to the inner box base 100 through the insulating spacer 22. The support 23 serves as a switch function of an electrostatic dissipation path. The photomask R is placed on the support 23. The insulating spacer 22 is located between the support 23 and the base 21 to isolate the contact between the base 21 and the support 23, and to make the base 21 and the support 23 electrically disconnected. The insulating spacer 22 determines whether the support member 23 and the inner box base 100 are in contact with each other. When the insulating spacer 22 is not deformed, the support member 23 and the inner box base 100 are not in direct contact with each other. When the insulating spacer 22 is deformed, the support member 23 and the inner box base 100 are in direct contact with each other, and the details will be described later. Figure 3 , is an exploded view of the switch-type support mechanism 20 according to the first embodiment of the present invention. The base 21 includes a base 215, a stopper 212, and a mounting portion 211. In this embodiment, two stoppers 212 extend upward from each end of the base 215. The mounting portion 211 protrudes upward from the base 215. The mounting portion 211 has a mounting hole 213 at its center, extending through the base 21 and the mounting portion 211. This hole allows the insulating spacer 22 to be positioned within the mounting hole 213.

[0073] The insulating spacer 22 is essentially made of an electrically insulating and elastic material. When an external force is applied to or released from the support member 23, the insulating spacer 22 undergoes elastic compression deformation or elastic release and reset, allowing the support member 23 to reciprocate. The insulating spacer 22 includes an abutting portion 221 and a connecting portion 222. The connecting portion 222 couples the insulating spacer 22 to the base 21 through the mounting hole 213. The abutting portion 221 abuts against the upper surface of the mounting portion 211 and is positioned between the mounting portion 211 and a portion of the support member 23. The insulating spacer 22 also includes a through hole 225 extending through the upper and lower surfaces of the insulating spacer 22. The through hole 225 corresponds to the position of the mounting hole 213 and is interconnected. A portion of the support member 23 is disposed within the through hole 225 and the mounting hole 213. In this embodiment, the insulating spacer 22 also includes a mounting structure 224 that protrudes outward from the surface of the connecting portion 222. The mounting hole 213 has an extended reamer hole 214 corresponding to the mounting structure 224, for the mounting structure 224 to pass through and for the insulating spacer 22 to be installed in the mounting hole 213. Preferably, the lower edge of the insulating spacer 22 further includes an engaging portion 223 for engaging the support member 23 with the insulating spacer 22 to prevent the support member 23 from detaching upward.

[0074] The support member 23 is made of static-dissipative material. It includes a supporting portion 231, a contact portion 234, and a latch portion 232 disposed between the supporting portion 231 and the contact portion 234. The supporting portion 231 is used to support the photomask R. The supporting portion 231 may have a curvature or pattern, thereby achieving point contact between the supporting portion 231 and the photomask R, thereby reducing the contact area of ​​the photomask R and thereby reducing dust generation. The latch portion 232 passes through the through-hole 225 of the insulating spacer 22, aligning the support member 23 with the insulating spacer 32. The contact portion 234 of the support member 23 is then inserted into the mounting hole 213 and positioned adjacent to the inner box base 100. The supporting portion 231 is located on the upper surface of the abutment portion 221.

[0075] The switch-type support mechanism 20 also includes an insulating anti-slip element 233, which is arranged between the base 21 and the support member 23. In this embodiment, the insulating anti-slip element 233 is arranged on the latch portion 232 of the support member 23, and the insulating anti-slip element 233 can engage with the engaging portion 223 of the insulating isolator 22 to prevent the support member 23 from separating from the insulating isolator 22. Since the insulating isolator 22 is fixed to the base 21 using the abutment portion 221 and the mounting structure 224, the support member 23 can be prevented from separating from the base 21 and the insulating isolator 22 by connecting them in a ring-shaped manner. The insulating anti-slip element 233 is suitable for any form of insulating isolator and can be arbitrarily matched and combined, and is not limited to the form described in this embodiment.

[0076] Continuing with the above description of the switchable support mechanism 20, when the switchable support mechanism 20 is applied to the inner box base 100, the base 21 can be secured to the inner box base 100 using any conventional method. Next, the mounting structure 224 of the insulating spacer 22 is aligned with the extended countersunk hole 214 of the mounting hole 213 of the base 21 and inserted. The insulating spacer 22 is then rotated to misalign the mounting structure 224 with the extended countersunk hole 214, securing the insulating spacer 22 to the base 21. Finally, the support member 23 is placed into the through hole 225 of the insulating spacer 22. A slight external force is applied to force the insulating anti-escape element 233 through the lower edge of the insulating spacer 22 and into engagement with the engagement portion 223. At this point, the contact portion 234 of the support member 23 protrudes outside the mounting hole 213 of the base 21 and is adjacent to the inner box base 100. The installation sequence includes, but is not limited to, the aforementioned steps, and the order of installation of the various components can be adjusted as needed.

[0077] In this embodiment, the support member 23 and the base 21 have an electrostatic dissipation function. For example, they can be made of an electrostatic dissipative material or coated with an electrostatic dissipative coating material. The insulating spacer 22 is made of an insulating material or coated with an insulating coating material. Preferably, the surface resistivity of the support member 23 and the base 21 is between 104Ω / sq and 1010Ω / sq; the surface resistivity of the insulating spacer 22 is greater than 1010Ω / sq. In this embodiment, the material of the insulating spacer 22 may include PE (polyethylene), PP (polypropylene), PET (polyethylene terephthalate), TPR (thermoplastic elastomer), TPEE (thermoplastic polyester elastomer), or FKM (fluorinated rubber), or a combination of any of the above materials. The material of the support member 23 and the base 21 may include Peek (polyetheretherketone), Pi (polyimide), or a combination of the above materials.

[0078] The insulating spacer 22 has an elastic structure. When the downward pressure (or external force) generated by the placement of the photomask is applied to the support member 23, the insulating spacer 22 is subjected to the resistance between the base 21 and the support member 23, resulting in elastic structural deformation, such as elastic compression deformation, allowing the support member 23 to move back and forth relative to the base 21, so that the support member 23 can move downward relative to the base 21 until the contact portion 234 contacts the inner box base 100, thereby establishing an electrostatic dissipation conductive path. The static charge on the photomask can be dissipated from the inner box base 100 through the support member 23. When the inner box base 100 is located in a scanner, the scanner has an equipment arm that is grounded. After the inner box base 100 contacts the equipment arm, it can become one of the electrostatic dissipation conductive paths through the equipment arm and the ground, thus having the function of dissipating static electricity.

[0079] When the photomask is removed from the support member 23 or has not yet been placed on the support member 23, the insulating spacer 22 is no longer held against the support member 23 by the base 21. At this point, the insulating spacer 22 elastically releases, restoring its original elastic height, maintaining a distance d between the contact portion 234 of the support member 23 and the inner box base 100, thereby closing the static dissipation conductive path. Therefore, by isolating the base 21 from the support member 23, the insulating spacer 22 isolates the contact between the base 21 and the support member 23. Whether the support member 23 is in contact with the inner box base 100 is determined based on whether the support member 23 is subjected to external force, thereby achieving the technical function and purpose of establishing a static dissipation conductive path between the switch-type support mechanism 20 and the inner box base 100.

[0080] As mentioned above, please refer to Figure 4A After exposure, the front surface of the photomask R will carry residual static charge, such as a positive charge. When the support member 23 is not subjected to an external force pressing down on the photomask R, there is a distance d between the support member 23 and the inner box base 100. At this time, the support member 23 is unable to attract the static charge on the front surface of the photomask R. Because it cannot conduct electricity through the ground GND, it does not draw electricity. In other words, the support member 23 cannot attract the positive charge of the photomask R from the ground terminal to the ground GND, and therefore the static dissipation conductive path is closed.

[0081] Please refer to Figure 4B When the photomask R is placed on the support member 23, the support member 23 is pushed downward by an external force, forcing the insulating spacer 22 to elastically deform until the contact portion 234 of the support member 23 contacts the surface of the inner box base 100. This activates the static dissipation conductive path. The support member 23 now has the ability to attract static charges from the front of the photomask R, establishing a static dissipation conductive path between the support member 23, the inner box base 100, and ground GND to dissipate the static charge on the photomask R.

[0082] By establishing a switch that provides a static dissipation path, this invention aims to address the problem of arcing caused by voltage differences when a photomask, when subjected to high static buildup, approaches a support structure, leading to electrical breakdown and carbon contamination (C-burst) and damage to the support structure. Furthermore, this device can quickly dissipate residual static electricity on the photomask surface after exposure.

[0083] Figure 5This is a switch-type support mechanism 30 according to a second embodiment of the present invention. Components identical to those of the switch-type support mechanism 20 of the first embodiment, and the reference numerals for these components, represent identical functions. Only structural differences are described herein. The switch-type support mechanism 30 includes a base 21, an insulating spacer 22, an insulating anti-slip element 34, and a support member 23. A groove 314 is formed around the upper surface of the mounting hole 213. A through hole 225 of the insulating spacer 22 extends through both the upper and lower surfaces of the insulating spacer 22. The through holes 225 correspond to the positions of the mounting hole 213 and are interconnected. Portions of the support member 23 extend through the through holes 225 and the mounting hole 213.

[0084] The top of the insulating spacer 22 has an electrically insulating, elastic abutment portion 221, which allows the support member 23 to reciprocate relative to the base 21 when an external force is applied or released to the support member 23. The connecting portion 222 of the insulating spacer 22 corresponds in shape to the groove 314, allowing them to be mounted and fixed to each other, coupling the insulating spacer 22 to the base 21. In this embodiment, the insulating anti-slip element 34 is a ring-shaped elastic member. The latch portion 232 of the support member 23 has a groove 333 surrounding it, allowing the insulating anti-slip element 34 to fit within the groove 333.

[0085] Please also refer to Figure 6A and Figure 6B , the seat 31 is provided with a limiting structure 316, which is located on the inner side of the mounting hole 213 and is used to resist the insulating anti-slip element 34. After the pin portion 232 of the support member 23 passes through the through hole 225 of the insulating isolation member 22 and the mounting hole 213 of the seat 31, the limiting structure 316 resists the insulating anti-slip element 34 to prevent the support member 23 from being separated. Since the support member 23 serves as a switch function of the electrostatic dissipation path, when external force is applied to or released from the support member 23, the insulating isolation member 22 will correspondingly undergo elastic compression deformation or elastic release and reset, allowing the support member 23 to perform reciprocating motion. Figure 6A As shown, the insulating spacer 22 exhibits elastic release, returning to its original spring height, maintaining a distance d between the contact portion 234 of the support member 23 and the inner box base 100, thereby closing the static dissipation conductive path. To prevent the support member 23 from upwardly dislodging from the base 31, the insulating spacer 22, or either of them, the restraining structure 316 abuts and restrains the insulating anti-escape element 34, keeping it positioned within the mounting hole 213. This prevents the support member 23 from excessively moving upward and causing the latch portion 232 to disengage from the mounting hole 213.

[0086] For example Figure 6BAs shown, the insulating spacer 22 is configured to allow the support member 23 to move downward relative to the base 21 until the contact portion 234 contacts the inner box base 100, thereby establishing a static dissipation conductive path. At this point, although the restraining structure 316 does not abut against the insulating anti-detachment element 34, the insulating anti-detachment element 34 is sleeved on the groove 333, allowing it to move downward with the support member 23, thereby not affecting the smooth reciprocating motion of the support member 23.

[0087] Figure 7 This is a switchable support mechanism 40 according to a third embodiment of the present invention. Components identical to those of the support mechanism 20 of the first embodiment and the switchable support mechanism 30 of the second embodiment are denoted by the same reference numerals and their functions. Only structural differences are described herein. The insulating isolator 22 is an annular member made of an electrically insulating and elastic material. The upper surface of the insulating isolator 22 defines an abutment portion 221, and a connection portion 222 is defined between the upper and lower surfaces. The connection portion 222 of the insulating isolator 22 corresponds in shape to the groove 414, allowing for mounting and securing the insulating isolator 22 to the base 21. The abutment portion 221 is positioned between the mounting portion 211 and the support member 23. The insulating anti-slip element 42 is an annular member made of an elastic material. The latch portion 232 of the support member 23 has a groove 433 extending therearound. The insulating anti-slip element 42 is configured to fit within the groove 433. The support member 43 is inserted through the annular hollow portion of the insulating spacer 22 toward the base 21. A slight external force is applied to push the insulating anti-escape element 42 below the limiting structure 416, thereby coupling the support member 23 to the base 21 through the insulating spacer 22. When external force is applied or released to the support member 23, the elastic deformation of the insulating spacer 22 causes the support member 23 to reciprocate relative to the base 21.

[0088] Please refer to Figure 8A When the photomask R has not yet been placed on the support member 23, the insulating spacer 22 has not been compressed and deformed and remains in its original shape and height. The insulating anti-slip element 42 is abutted against the bottom of the limiting structure 416, preventing the support member 23 from moving upward. At this time, the support member 23 is not in contact with the inner box base 100. There is a distance d between the contact portion 234 of the support member 23 and the surface of the inner box base 100. At this time, the static dissipation conductive path between the support member 23 and the inner box base 100 is in a closed state. When the static dissipation conductive path of the switch-type support mechanism 40 is in the closed state, even if static electricity remains on the surface of the photomask R after exposure, arc discharge will not occur when the photomask R is placed close to the support member 23, thereby avoiding contamination caused by arc discharge.

[0089] Please refer to Figure 8BWhen the photomask R is placed on the support member 23, the support member 23 is pushed downward by the external force exerted by the downward pressure of the photomask R, forcing the insulating spacer 22 to compress or deform, allowing the support member 23 to move downward relative to the base 21. The insulating anti-slip element 42 moves downward with the support member 23 until the contact portion 234 of the support member 23 contacts the surface of the inner box base 100. At this point, the electrostatic dissipation conductive path between the bottom of the support member 23 and the inner box base 100 is open. When the electrostatic dissipation conductive path of the switch-type support mechanism 40 is open, the positive charge on the surface of the photomask R is dissipated along the path of the support member 23, the inner box base 100, the device arm, and the ground (not shown).

[0090] In a variation of the present invention, in addition to the entire support member 23 being made of static dissipative material, a localized static dissipative material may also be provided, for example, the top and / or bottom of the support member 23 may further be provided with a static dissipative element. Figure 9A and Figure 9B The first variation of the switchable support mechanism of the present invention is shown in FIG. The support member 23 further includes a static dissipation element 24 disposed on the top of the support member 23. Specifically, the static dissipation element 24 is disposed on the bearing portion 231 of the support member 23 and is detachably connected to the support member 23.

[0091] like Figure 9B As shown, when the photomask R is placed on the support 23, the photomask R first contacts the static dissipative element 24. The static dissipative element 24 then moves downward together with the support 23 until the contact portion 234 of the support 23 contacts the inner box base 100. At this point, the positive charge on the surface of the photomask R is dissipated along the path of the static dissipative element 24, the support 23, the inner box base 100, the device arm, and the ground (not shown).

[0092] like Figure 10A and Figure 10B This is a second variation of a switch-type support mechanism. Support member 23 further includes a static dissipative element 25 disposed at the bottom of support member 23. For example, static dissipative element 25 may be disposed below contact portion 234, or between latch portion 232 and contact portion 234. Specifically, static dissipative element 25 is disposed on support member 23 and is detachably connected to support member 23.

[0093] like Figure 10B As shown, when the photomask R is placed on the support 23, the photomask R first contacts the support 23 and moves downward together with the support 23, so that the static dissipation element 25 at the bottom of the support 23 contacts the inner box base 100. At this time, the positive charge on the surface of the photomask R is dissipated along the path of the support 23, the static dissipation element 25, the inner box base 100, the equipment arm, and the ground (not shown).

[0094] Figure 11A and Figure 11B This is a third variation of a switch-type support mechanism. The support member 23 further includes a first static dissipation element 24 and a second static dissipation element 25, which are disposed at the top and bottom of the support member 23, respectively. Specifically, the first static dissipation element 25 is disposed on the bearing portion 231 of the support member 23 and is detachably connected to the support member 23. The second static dissipation element 25 is disposed on the contact portion 234 of the support member 23 and is detachably connected to the support member 23.

[0095] like Figure 11B As shown, when the photomask R is placed on the support 23, the photomask R first contacts the first static dissipative element 24. Then, the first static dissipative element 24 and the support 23 move downward together until the static dissipative element 25 at the bottom of the support 23 contacts the inner box base 100. At this point, the positive charge on the surface of the photomask R is dissipated along the path of the first static dissipative element 24, the support 23, the second static dissipative element 25, the inner box base 100, the equipment arm, and the ground (not shown).

[0096] By additionally disposing first and second static dissipative elements 24 and 25 on support member 23 in the first through third variations, the ease of replacement of first and second static dissipative elements 24 and 25 prevents wear and tear caused by contact between the mask R and the support member 23's carrier portion 231 and / or the bottom of the support member 23 and the inner box base 100, which could affect the electrical conduction. Regardless of the structural design of support member 23, as long as it functions as a switch for the static dissipative path, it falls within the scope of patent protection of this invention.

[0097] The detailed explanations of the above-mentioned embodiments are intended only to explain the present invention so as to facilitate a better understanding of the present invention. However, these descriptions cannot be interpreted as limiting the present invention for any reason. In particular, the various features described in different embodiments may also be arbitrarily combined with each other to form other embodiments. Unless otherwise clearly described, these features should be understood to be applicable to any embodiment and are not limited to the described embodiments.

Claims

1. A switch type support mechanism, suitable for the inner box base of a double-layer mask container, characterized in that: The switch type support mechanism comprises: A seat body is provided on the inner box base; a support member having a static dissipative material, the support member passing through the base to be adjacent to the inner box base; and An insulating isolation member is used to isolate the contact between the base and the support member, so that the support member can reciprocate relative to the base so that the support member contacts the inner box base to establish an electrostatic dissipation conductive path, or maintain a distance between the support member and the inner box base to close the electrostatic dissipation conductive path.

2. The switch type support mechanism according to claim 1, characterized in that: When the support member is not subjected to external force, the support member leaves the inner box base, so that the distance between the support member and the inner box base is maintained to close the electrostatic dissipation conductive path; when the support member is subjected to external force, the support member contacts the inner box base to establish the electrostatic dissipation conductive path.

3. The switch type support mechanism according to claim 1, characterized in that: The base includes a mounting portion and a mounting hole passing through the mounting portion and the base. The insulating isolator includes a contact portion and a connecting portion. The contact portion supports the upper surface of the mounting portion. The connecting portion fixes the insulating isolator to the mounting portion through the mounting hole.

4. The switch type support mechanism according to claim 3, characterized in that: The support member includes a bearing portion, a contact portion, and a latch portion located between the bearing portion and the contact portion. The insulating isolation member has a through hole connected to the mounting hole. The latch portion is inserted into the through hole and the mounting hole so that the contact portion is adjacent to the inner box base. The bearing portion is located on the upper surface of the abutting portion.

5. The switch type support mechanism according to claim 3, characterized in that: The insulating isolation piece includes at least one mounting structure located outside the connecting portion. The mounting structure is fixed to the lower surface of the mounting portion after passing through an extended expansion hole of the mounting hole.

6. The switch type support mechanism according to claim 3, characterized in that: The upper surface of the mounting portion is provided with a mounting groove, the connecting portion of the insulating isolator is arranged in the mounting groove, and the abutting portion abuts against the peripheral upper surface of the mounting groove to fix the insulating isolator in the mounting portion.

7. The switch type support mechanism according to claim 1, characterized in that: The insulating spacer is made of elastic material. When external force is applied to or released from the support member, the insulating spacer undergoes elastic compression deformation or elastic release and reset, allowing the support member to perform reciprocating motion.

8. The switch type support mechanism according to claim 1, characterized in that: The switch type support mechanism further comprises an insulating anti-slipping element, which is arranged between the base and the support member, and the insulating anti-slipping element prevents the support member from being separated from between the base and the insulating isolation member.

9. The switch type support mechanism according to claim 8, characterized in that: The support component includes a bearing portion, a contact portion, and a latch portion located between the bearing portion and the contact portion. The insulating anti-fallout element is sleeved on the latch portion.

10. The switch type support mechanism according to claim 1, wherein: The base body includes a mounting portion and a mounting hole passing through the mounting portion and the base body, and a mounting groove is provided on the upper surface of the mounting portion; The support member includes a bearing portion, a contact portion, and a latch portion located between the bearing portion and the contact portion; The insulating isolator is arranged in the mounting groove, and has a through hole connected to the mounting hole. The latch portion is passed through the through hole and the mounting hole so that the contact portion is adjacent to the inner box base, and the lower surface of the bearing portion is located on the upper surface of the insulating isolator.

11. The switch type support mechanism according to claim 1, wherein: A static dissipation element is also provided on the top and / or bottom of the support member.

12. The switch type support mechanism according to claim 1, wherein: The support member and the inner box base establish the static dissipation conductive path, and the static dissipation conductive path is connected to a device arm to release the static charge to the ground through the device arm.

Images