Doping device suitable for different crystal pulling technologies and operation method thereof
By designing an automated doping device, the problems of magnetic component failure, uneven dopant distribution, and incomplete doping in single-crystal silicon doping devices under high-temperature environments were solved, achieving uniform dispersion and complete dopant doping, thus improving crystal pulling quality and operational efficiency.
Patent Information
- Application Number
- CN202511208339.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-08-27
- Publication Date
- 2025-12-02
AI Technical Summary
Existing single-crystal silicon doping devices suffer from problems such as magnetic component failure under high-temperature environments, uneven dopant distribution, incomplete dopant delivery, and waste. Furthermore, manual operation is cumbersome, leading to unstable crystal pulling quality.
An automated doping device was designed, comprising a linear displacement mechanism, a rotation mechanism, a gas injection mechanism, and a closing mechanism. The device utilizes a cover plate to control the opening state and inert gas purging to achieve uniform dispersion and complete dopant delivery. Combined with an intelligent control center, it enables automated operation.
It improves the uniformity and efficiency of dopant application, reduces the operational error rate, extends the life of the equipment, and ensures the complete application of dopant and the stability of crystal pulling quality.
Smart Images

Figure CN121046931A_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of silicon doping in single crystal furnaces, specifically to a doping device and its operation method suitable for different crystal pulling technologies. Background Technology
[0002] The existing Chinese patent with publication number CN222389963U discloses a single-crystal silicon doping device. Although the above-mentioned doping device solves the problem of uneven mixing between the master alloy and the silicon liquid, which leads to uneven resistivity of single-crystal silicon produced by RCZ and CCZ, it introduces new problems: Firstly, the movement of the mixing hopper is manually operated, which is cumbersome. The inner magnetic sleeve used to drive the displacement and rotation of the mixing hopper is controlled by the outer magnetic sleeve. In actual use, the ambient temperature of the single crystal silicon reaction is very high. The inner and outer magnetic sleeves will be affected by the long-term exposure to the high temperature environment, which will eventually lead to the inability to control the movement of the mixing hopper through the outer magnetic sleeve. Secondly, the dopant hopper disperses the material by controlling the distribution of the material through the sealing plate. In actual use, if the dopant in the dopant hopper is concentrated in one place, the dopant will still fall into the single crystal furnace after the dopant hopper is separated from the sealing plate. Therefore, the sealing plate cannot completely disperse the dopant into the single crystal furnace, and the distribution of the dopant will change. Third, the dopant in the doping hopper falls out through the drain hole. In actual use, although the diameter of the drain hole is larger than the particle size of the dopant, when multiple dopants pass through the same drain hole, due to the friction between the dopants, multiple dopants may get stuck in the same drain hole and cannot fall by their own weight, which will eventually lead to incomplete dopant dispensing and waste of a certain amount of dopant. Summary of the Invention
[0003] Therefore, it is necessary to provide a doping device and its operation method applicable to different crystal pulling techniques to address the problems of existing technologies.
[0004] To address the problems of existing technologies, the present invention adopts the following technical solution: a doping device suitable for different crystal pulling technologies, comprising a support, a linear displacement mechanism on the support, the linear displacement mechanism including a slider that slides horizontally, a rotating mechanism on the slider, the rotating mechanism including a horizontal rotating tube connected to the slider for rotation, a doping spoon at the end of the rotating tube away from the slider, the doping spoon having an opening, a cover plate hinged to the opening, a torsion spring between the cover plate and the doping spoon to keep the opening open, a gas injection mechanism on the rotating tube for blowing air into the doping spoon, the gas injection mechanism including a gas supply pipe parallel to the rotating tube, and a closing mechanism on the slider for driving the cover plate to flip and close the opening, the closing mechanism including a reel and a pull wire wound on the reel, the reel being rotatably connected to the slider, one end of the pull wire being fixedly connected to the reel, and the other end passing through the gas supply pipe and out of the opening along the gas supply pipe and then being fixedly connected to the cover plate.
[0005] To demonstrate the specific structure of the linear displacement mechanism, the linear displacement mechanism also includes a rodless cylinder that is horizontally fixed to the support. A fixed rod connected to the support is provided below the rodless cylinder. The axis of the fixed rod is parallel to the output direction of the rodless cylinder. A columnar groove is provided on the slider for it to be fitted onto the fixed rod, and the slider is fixedly connected to the output end of the rodless cylinder.
[0006] To demonstrate how the rotating tube is connected to the slider in rotation, a push-pull rod is provided on the side of the slider. The axis of the push-pull rod is parallel to the sliding direction of the slider, and one end of the push-pull rod is fixed to the slider through a connecting rod. The rotating tube is coaxially sleeved on the push-pull rod, and several bearings of the first type are provided between the rotating tube and the push-pull rod at equal intervals.
[0007] To demonstrate the specific structure of the rotating mechanism, the rotating mechanism also includes a drive tube, a magnetic coupling component, a servo motor, and a reduction gear set. The drive tube is coaxially sleeved on the push-pull rod, and the drive tube and the rotating tube are spaced apart. Several equidistant No. 2 bearings are provided between the drive tube and the push-pull rod. The magnetic coupling component drives the drive tube and the rotating tube together. A support is fixed on the slider. The servo motor is mounted on the support and is driven by the drive tube through the reduction gear set.
[0008] To demonstrate the specific structure of the gas injection mechanism, the gas injection mechanism also includes a gas distribution pipe. One end of the gas distribution pipe is a closed structure, and the other end is an open structure. The open end of the gas distribution pipe is fixedly connected to the outer wall of the mixing spoon, and the closed end of the gas distribution pipe is coaxially fixedly connected to the rotating tube. Several strip-shaped gas ports connected to the gas distribution pipe are opened on the outer wall of the mixing spoon. The gas distribution pipe is provided with a connecting nozzle, and one end of the gas delivery pipe is bent upward and connected to the connecting nozzle.
[0009] To demonstrate how the pull wire is routed, a gas-sealing sleeve is coaxially fixed to the end of the gas supply pipe away from the gas distribution pipe. One end of the gas-sealing sleeve is an open structure, and the other end is a closed structure that seals the port of the gas supply pipe. An air inlet is provided on the outer wall of the gas supply pipe near the gas-sealing sleeve. A wire ring is fixed on the outer wall of the rotating pipe. Before the pull wire enters the gas supply pipe, it passes through the wire ring and the gas-sealing sleeve in sequence. A through hole is provided on the closed end of the gas-sealing sleeve for the pull wire to pass through. A rubber ring is provided on the through hole. Before the pull wire enters the mixing spoon, it passes through the gas distribution pipe.
[0010] To demonstrate how the spool rotates, a support tube is fixedly mounted on the slider. The support tube is coaxially sleeved outside the fixed rod. The spool is connected to the support tube via a wheel frame. A stepper motor for rotating the spool is fixedly mounted on the support tube.
[0011] To limit the flipping stroke of the cover plate when driven by the torsion spring, a vertically upward baffle is fixed on the outer wall of the air distribution pipe, and the cover plate abuts against the baffle after flipping from horizontal to vertical.
[0012] To improve the stability of the support during sliding, several sets of equidistant guide rods are provided below the support, and the axial direction of each set of guide rods is parallel to the sliding direction of the slider. Several sets of sliding sleeves corresponding to the guide rods are fixedly provided at the bottom of the support, and each set of sliding sleeves is coaxially sleeved on the corresponding guide rod.
[0013] An operating method for a doping device applicable to different crystal pulling techniques, the operating method comprising the following steps: S1, In the initial state, the doping spoon is in the retracted position with the opening facing upwards, and the cover plate is kept open under the action of the torsion spring. When doping is required, the doping spoon is extended by the slider, and then the doping material is injected into the doping spoon. S2, the spool rotates to wind up the cable, and the cable pulls the cover plate along the gas supply pipe and gas distribution pipe to flip the cover plate over, and the cover plate overcomes the spring force of the torsion spring to completely close the opening; S3, the slider drives the doping spoon into the single crystal furnace. After the doping spoon reaches the designated position, the rotating tube drives the doping spoon to rotate 180° so that the opening faces down. The wire wheel releases the pull wire, and the cover plate gradually opens under the action of the torsion spring. At the same time, the pull wire is controlled to maintain appropriate tension so that the opening is in a half-open state. S4, the slider slides in the opposite direction to drive the doping spoon to retract, and the half-open opening allows the dopant to be dispersed and fall into the single crystal furnace. When the doping spoon is about to exit the single crystal furnace, the wire wheel completely releases the pull wire, the cover plate is fully opened, and at the same time, the gas supply pipe introduces inert gas, and the inert gas blows the residual dopant into the furnace through the strip-shaped gas port. S5, the reel winds up to reset and close the cover plate, the doping spoon exits the furnace and rotates to reset, and the slider drives the doping spoon back to its initial position, completing one doping cycle.
[0014] The beneficial effects of this invention compared to the prior art are: Firstly, the doping spoon of the present invention is provided with a cover plate for closing the opening of the doping spoon. The cover plate can prevent dust from falling into the doping spoon and contaminating the doping material before the doping spoon is inserted into the single crystal furnace. Secondly, during the material feeding process, the closure degree of the cover plate is controlled by the pull wire, so that the opening is kept in a half-open state. This allows the dopant to fall into the single crystal furnace in a dispersed manner as the doping spoon retracts. Even if the dopant in the doping spoon accumulates in one place, because the opening is half-open and the doping spoon is in a moving state, the dopant will not fall into the single crystal furnace in one concentrated manner, ensuring that the dopant can always fall into the single crystal furnace in a dispersed manner, thereby improving the resistivity uniformity of crystal pulling such as RCZ and CCZ. Third, at the end of the feeding stage of the doping spoon, the gas supply pipe will discharge inert gas into the doping spoon through the gas distribution pipe. In this way, the force of the inert gas will blow out all the dopants attached to the doping spoon, ensuring that the doping spoon is fully fed and avoiding waste of dopants. Fourth, this invention uses an intelligent control center for automated doping. Compared with the manual doping of the above-mentioned patents, automated doping effectively shortens the feeding time, improves the parameter response speed, and reduces the operation error rate. Fifth, automated doping improves the lifespan of the drive device compared to manual doping. The drive device includes, but is not limited to, magnetic coupling components and linear displacement mechanisms. Attached Figure Description
[0015] Figure 1 This is a three-dimensional structural diagram of the invention in its initial state. Figure 1 ; Figure 2 yes Figure 1 A magnified view of the area indicated by A1 in the diagram; Figure 3 yes Figure 1 The enlarged view of the area indicated by A2 in the diagram; Figure 4 This is a three-dimensional structural diagram of the invention in its initial state. Figure 2 ; Figure 5 This is a three-dimensional structural diagram of the mixing spoon; Figure 6 It is an exploded view of the three-dimensional structure of the slider and the fixed rod; Figure 7 This is a three-dimensional structural cross-sectional view of the present invention in its initial state; Figure 8 yes Figure 7 The enlarged view of the area indicated in A3; Figure 9 yes Figure 7 The enlarged view shown in section A4; Figure 10 This is a three-dimensional sectional view of the present invention after the cover plate is closed; Figure 11 yes Figure 10 The enlarged view of the area indicated in A5; Figure 12 yes Figure 10 The enlarged view of the area indicated by A6 in the middle; Figure 13 This is a comparison chart of the efficiency of manual doping and automatic doping; Figure 14 This is a comparison chart of usage data for manual doping and automatic doping devices.
[0016] The following are the labels in the diagram: 1. Support; 2. Slider; 3. Rotary tube; 4. Mixing spoon; 5. Opening; 6. Cover plate; 7. Torsion spring; 8. Air supply pipe; 9. Thread reel; 10. Pull line; 11. Rodless cylinder; 12. Fixed rod; 13. Columnar slide groove; 14. Push-pull rod; 15. Connecting rod; 16. Bearing No. 1; 17. Drive tube; 18. Magnetic coupling component; 19. Servo motor; 20. Reduction gear set; 21. Bearing No. 2; 22. Support; 23. Air distribution pipe; 24. Strip-shaped air inlet; 25. Connecting nozzle; 26. Air sealing sleeve; 27. Air inlet; 28. Wire ring; 29. Perforation; 31. Rubber ring; 32. Support tube; 33. Wheel frame; 34. Stepper motor; 35. Baffle; 36. Guide rod; 37. Sliding sleeve. Detailed Implementation
[0017] To further understand the features, technical means, and specific objectives and functions achieved by the present invention, the present invention will be described in further detail below with reference to the accompanying drawings and specific embodiments.
[0018] refer to Figures 1 to 3 The doping device shown is suitable for different crystal pulling technologies. It includes a support 1, a linear displacement mechanism on the support 1, a slider 2 that slides horizontally, a rotating mechanism on the slider 2, a rotating tube 3 that is horizontal and rotatably connected to the slider 2, a doping spoon 4 at the end of the rotating tube 3 away from the slider 2, the doping spoon 4 having an opening 5, a cover plate 6 hinged to the opening 5, a torsion spring 7 between the cover plate 6 and the doping spoon 4 to keep the opening 5 open, an injection mechanism on the rotating tube 3 for blowing air into the doping spoon 4, the injection mechanism including a gas supply pipe 8 parallel to the rotating tube 3, and a closing mechanism on the slider 2 for driving the cover plate 6 to flip and close the opening 5, the closing mechanism including a spool 9 and a pull wire 10 wound on the spool 9, the spool 9 being rotatably connected to the slider 2, one end of the pull wire 10 being fixedly connected to the spool 9, and the other end passing through the gas supply pipe 8 and out of the opening 5 and then fixedly connected to the cover plate 6.
[0019] This doping device is suitable for different crystal pulling techniques, such as existing RCZ and CCZ. In actual use, this doping device is installed outside the single crystal furnace (not shown in the figure). Above this doping device is a feeding device (not shown in the figure) for injecting dopant into the doping spoon 4. The single crystal furnace is equipped with a valve for the doping spoon 4 and the rotating tube 3 to pass through. The slider 2 is equipped with a distance sensor (not shown in the figure), and the rotating tube 3 is equipped with a rotary encoder (not shown in the figure). The specific usage process of this doping device is as follows: Initially, the doping spoon 4 is in a retracted state, with the opening 5 facing upwards, and the cover plate 6 is in an open state via the torsion spring 7. When doping is required in the single crystal furnace, the slider 2 drives the doping spoon 4 towards the injection device via the rotating tube 3. During this process, the translational distance of the doping spoon 4 is monitored by a distance sensor. When the doping spoon 4 is translated to the area below the injection device, the slider 2 stops moving, and the injection device injects a fixed amount of dopant into the doping spoon 4 through the opening 5. After the dopant is injected into the doping spoon 4, the wire wheel 9 begins to rewind the wire 10. During the process, the cover plate 6 is driven downwards by the pull wire 10 to cover the opening 5. After the cover plate 6 closes the opening 5, the valve on the single crystal furnace opens, and the slider 2 drives the doping spoon 4 into the single crystal furnace through the rotating tube 3. During this process, the translational distance of the doping spoon 4 is monitored by a distance sensor. When the doping spoon 4 reaches the designated position, the slider 2 stops moving, and the rotating tube 3 begins to rotate. During this process, the rotation angle of the rotating tube 3 is monitored by a rotary encoder. When the rotating tube 3 drives the doping spoon 4 to rotate 180°, the rotating tube 3 stops rotating. At this time, the wire wheel 9 begins to pull. As the wire 10 is unwound, and the tension of the wire 10 gradually eases, the cover plate 6 is driven by the torsion spring 7 to gradually open. When the cover plate 6 opens, the slider 2 slides in the opposite direction, causing the dopant spoon 4 to retract. During this process, the rotation angle of the wire wheel 9 is controlled to maintain a certain tension on the wire 10, ultimately ensuring that the cover plate 6 is in a state where the opening 5 is half-open, so that the dopant will not fall out completely. During the retraction of the dopant spoon 4, the dopant will disperse and fall into the single crystal furnace. Before the dopant spoon 4 retracts out of the single crystal furnace, the wire wheel 9 further unwinds the wire 10, so that the cover plate 6 is... The torsion spring 7 drives the opening 5 to open completely. At the same time, the gas supply pipe 8 blows inert gas into the doping spoon 4. The gas force blows out all the dopant adhering to the doping spoon 4, ensuring that the dopant is completely added and preventing waste. Then, the wire wheel 9 winds up the wire 10, causing the cover plate 6 to close the opening 5. After the cover plate 6 closes the opening 5, the doping spoon 4 retracts outside the single crystal furnace. The retracted doping spoon 4 will be driven by the rotating tube 3 to rotate 180° again, so that the opening 5 faces upward. Finally, the slider 2 will drive the doping spoon 4 to retract to the initial state.
[0020] refer to Figure 1 and Figure 6As shown, the linear displacement mechanism also includes a rodless cylinder 11 that is horizontally fixed to the support 1. A fixed rod 12 connected to the support 1 is provided below the rodless cylinder 11. The axial direction of the fixed rod 12 is parallel to the output direction of the rodless cylinder 11. A columnar groove 13 is provided on the slider 2 for it to be fitted onto the fixed rod 12, and the slider 2 is fixedly connected to the output end of the rodless cylinder 11.
[0021] The slider 2 slides along the axial direction of the fixed rod 12 driven by the rodless cylinder 11. When the slider 2 slides, the fixed rod 12 stabilizes the sliding of the slider 2.
[0022] refer to Figure 7 As shown, a push-pull rod 14 is provided on the side of the slider 2. The axial direction of the push-pull rod 14 is parallel to the sliding direction of the slider 2. One end of the push-pull rod 14 is fixedly connected to the slider 2 through a connecting rod 15. The rotating tube 3 is coaxially sleeved on the push-pull rod 14. Several bearings 16 of the first type are provided between the rotating tube 3 and the push-pull rod 14 at equal intervals.
[0023] The rotating tube 3 is rotatably connected to the push-pull rod 14 via several No. 1 bearings 16. In actual installation, the No. 1 bearings 16 are fitted onto the push-pull rod 14 with an interference fit. This prevents the No. 1 bearings 16 from axially displacing when fitted onto the push-pull rod 14. The rotating tube 3 is equipped with two No. 1 retaining rings (not shown in the figure). The two No. 1 retaining rings cooperate with the No. 1 bearings 16 located at both ends to prevent the rotating tube 3 from axially displacing on the push-pull rod 14. Finally, when the slider 2 slides, the slider 2 will drive the rotating tube 3 to translate through the push-pull rod 14. The connecting rod 15 is made of high-strength material, so that the push-pull rod 14 can remain stable during movement.
[0024] refer to Figure 1 and Figure 7 As shown, the rotating mechanism also includes a drive tube 17, a magnetic coupling element 18, a servo motor 19, and a reduction gear set 20. The drive tube 17 is coaxially sleeved on the push-pull rod 14, and the drive tube 17 and the rotating tube 3 are spaced apart. Several second bearings 21 are provided between the drive tube 17 and the push-pull rod 14 at equal intervals. The magnetic coupling element 18 drives the drive tube 17 and the rotating tube 3. A support 22 is fixedly provided on the slider 2. The servo motor 19 is mounted on the support 22, and the servo motor 19 is driven by the drive tube 17 through the reduction gear set 20.
[0025] When the servo motor 19 is started, it will drive the drive tube 17 to rotate slowly through the reduction gear set 20. Finally, the drive tube 17 will drive the rotating tube 3 to rotate through the magnetic coupling component 18. In actual installation, the second bearing 21 is fitted onto the push-pull rod 14 with an interference fit. The drive tube 17 is provided with two second retaining rings (not shown in the figure). The two second retaining rings are respectively engaged with the second bearings 21 located at both ends to prevent the drive tube 17 from axially displacing on the push-pull rod 14. Finally, when the slider 2 slides, the slider 2 will simultaneously drive the servo motor 19 and the drive tube 17 to translate.
[0026] refer to Figure 8 As shown, the gas injection mechanism also includes a gas distribution pipe 23. One end of the gas distribution pipe 23 is a closed structure, and the other end is an open structure. The open end 5 of the gas distribution pipe 23 is fixedly connected to the outer wall of the mixing spoon 4, and the closed end of the gas distribution pipe 23 is coaxially fixedly connected to the rotating pipe 3. Several strip-shaped gas ports 24 connected to the gas distribution pipe 23 are opened on the outer wall of the mixing spoon 4. A connecting nozzle 25 is provided on the gas distribution pipe 23, and one end of the gas delivery pipe 8 is bent upward and connected to the connecting nozzle 25.
[0027] The inert gas entering the gas supply pipe 8 will flow along the gas supply pipe 8 to the gas distribution pipe 23. The inert gas entering the gas distribution pipe 23 will flow through several strip-shaped gas ports 24 into the doping spoon 4. The inert gas will not react with the chemical substances in the single crystal furnace, and the actual amount of inert gas sprayed into the doping spoon 4 is small, so its impact on the gas pressure in the single crystal furnace can be ignored.
[0028] refer to Figure 3 as well as Figures 7 to 9 As shown, a gas supply pipe 8 is coaxially fixed to a gas-sealing sleeve 26 at the end away from the gas distribution pipe 23. One end of the gas-sealing sleeve 26 is an open structure, and the other end is a closed structure that seals the port of the gas supply pipe 8. An air inlet 27 is provided on the outer wall of the gas supply pipe 8 near the gas-sealing sleeve 26. A guide ring 28 is fixed on the outer wall of the rotating pipe 3. Before the pull wire 10 enters the gas supply pipe 8, it passes through the guide ring 28 and the gas-sealing sleeve 26 in sequence. A through hole 29 is provided on the closed end of the gas-sealing sleeve 26 for the pull wire 10 to pass through. A rubber ring 31 is provided on the through hole 29. Before the pull wire 10 enters the mixing spoon 4, it passes through the gas distribution pipe 23.
[0029] In actual use, a gas source (not shown in the figure) is installed on bracket 1. The gas inlet 27 is connected to the gas source via a flexible hose (not shown in the figure). When the gas source is turned on, the inert gas flows along the flexible hose and into the gas supply pipe 8 through the gas inlet 27. At this time, the gas sealing sleeve 26 prevents the inert gas from flowing out of the port of the gas supply pipe 8. Thus, the inert gas can only flow along the gas supply pipe 8 to the gas distribution pipe 23. The pull wire 10 runs through the gas supply pipe 8, which can effectively isolate it from the high temperature inside the single crystal furnace and prevent wire pulling. 10 is continuously exposed to high temperature, which may cause it to break. The wire ring 28 on the rotating tube 3 is used to guide the wire 10 passing through the gas-sealing sleeve 26 to the wire wheel 9, so as to prevent the wire 10 from being taut and causing hard friction with the gas supply pipe 8. The rubber ring 31 prevents the inert gas flowing into the gas supply pipe 8 from leaking out from the gap between the perforation 29 and the wire 10. All parts that need to be inserted into the single crystal furnace are made of high temperature resistant materials. The parts inserted into the single crystal furnace include, but are not limited to, the doping spoon 4, the rotating tube 3, the wire 10 and the gas distribution pipe 23.
[0030] refer to Figure 7 As shown, a support tube 32 is fixedly mounted on the slider 2. The support tube 32 is coaxially sleeved outside the fixed rod 12. The spool 9 is connected to the support tube 32 through the wheel frame 33. A stepper motor 34 for rotating the spool 9 is fixedly mounted on the support tube 32.
[0031] When the stepper motor 34 starts, it drives the spool 9 to rotate, thereby winding and unwinding the wire 10 through the spool 9.
[0032] refer to Figure 5 As shown, a vertically upward baffle 35 is fixed on the outer wall of the gas distribution pipe 23, and the cover plate 6 is rotated from horizontal to vertical and then comes into contact with the baffle 35.
[0033] The baffle 35 limits the flipping stroke of the cover plate 6 when it is driven by the torsion spring 7, preventing the cover plate 6 from flipping too much and making it difficult for the pull wire 10 to drive the cover plate 6 to flip toward the opening 5.
[0034] refer to Figure 1 and Figure 7 As shown, several sets of guide rods 36 are provided at equal intervals below the support 22, and the axial direction of each set of guide rods 36 is parallel to the sliding direction of the slider 2. Several sets of sliding sleeves 37 corresponding to the guide rods 36 are fixedly provided at the bottom of the support 22, and each set of sliding sleeves 37 is coaxially sleeved on the corresponding guide rod 36.
[0035] When slider 2 slides, support 22 will slide along with slider 2. During this process, the sliding sleeve 37 connected to support 22 will slide on the corresponding guide rod 36. In this way, the stability of support 22 when sliding is improved by the cooperation between sliding sleeve 37 and guide rod 36.
[0036] An operating method for a doping device applicable to different crystal pulling techniques, the operating method comprising the following steps: S1, In the initial state, the doping spoon 4 is in the retracted position, the opening 5 is facing upward, and the cover plate 6 is kept open under the action of the torsion spring 7. When doping is required, the doping spoon 4 is extended by the slider 2, and then the doping material is injected into the doping spoon 4. In actual use, this doping device is installed outside the single crystal furnace (not shown in the figure). Above this doping device is a feeding device (not shown in the figure) for injecting dopant into the doping spoon 4. When the doping spoon 4 is moved to the bottom of the feeding device, the slider 2 stops moving, and the feeding device injects a certain amount of dopant into the doping spoon 4 through the opening 5.
[0037] S2, the spool 9 rotates to wind up the pull line 10, the pull line 10 pulls the cover plate 6 along the gas supply pipe 8 and the gas distribution pipe 23 to flip the cover plate 6, the cover plate 6 overcomes the elastic force of the torsion spring 7 to completely close the opening 5. The opening 5 is sealed by the cover plate 6 to prevent dust from the environment from falling into the mixing spoon 4.
[0038] S3, slider 2 drives doping spoon 4 to extend into single crystal furnace. After doping spoon 4 reaches the designated position, rotating tube 3 drives doping spoon 4 to rotate 180° so that opening 5 faces down. Wire wheel 9 releases pull wire 10. Cover plate 6 gradually opens under the action of torsion spring 7. At the same time, control pull wire 10 to maintain appropriate tension so that opening 5 is in a half-open state. When the cover plate 6 is opened, the dopant material inside the doping spoon 4 will fall into the single crystal furnace along the inclined cover plate 6.
[0039] S4, the slider 2 slides in the opposite direction to drive the doping spoon 4 to retract, and the half-open opening 5 allows the doping material to be dispersed and fall into the single crystal furnace. When the doping spoon 4 is about to exit the single crystal furnace, the wire wheel 9 completely releases the pull wire 10, the cover plate 6 is completely opened, and at the same time, the gas pipe 8 introduces inert gas, and the inert gas blows the residual doping material into the furnace through the strip-shaped gas port 24. The semi-open opening 5 allows the dopant to be dispersed and fall into the single crystal furnace, thereby increasing the reaction rate inside the furnace. Air is blown into the doping spoon 4 through the strip-shaped air inlet 24 to ensure that the dopant in the doping spoon 4 is completely discharged and to prevent waste of the dopant.
[0040] S5, the reel 9 winds up to reset and close the cover plate 6, the doping spoon 4 exits the furnace and rotates to reset, the slider 2 drives the doping spoon 4 back to the initial position, completing one doping cycle.
[0041] In actual use, the workshop is equipped with an intelligent control center (not shown in the figure) for controlling all drive devices. The drive devices include, but are not limited to, servo motor 19, stepper motor 34 and rodless cylinder 11. The intelligent control center, as a control unit, has a built-in digital preset platform for process parameters using a PLC and HMI dual-core control architecture. The PLC and HMI dual-core control architecture is used to eliminate errors introduced by human-machine interaction. Before doping, the operator sets key parameters such as doping concentration, feeding timing and rotation speed on the human-machine interface (HMI) according to the crystal growth process requirements. The system transmits the parameter configuration to the programmable logic controller (PLC) via industrial Ethernet. At the same time, the equipment self-test program is started to confirm that the subsystems such as rodless cylinder 11, magnetic coupling transmission component and servo motor 19 are in a ready state. When the temperature field, pressure value and melt level in the single crystal furnace reach the preset doping conditions, the sensors in the furnace collect data in real time and trigger the PLC control sequence, and finally start to execute the doping process. The intelligent control center is equipped with a three-level security protection system: 1. Implement the detection module: sample parameters such as transmission torque and position offset; 2. Early warning and protection system: When mechanical jamming, over-temperature or over-pressure, or excessive motion is detected, the power supply to the actuator will be immediately cut off and an audible and visual alarm will be activated (105dB buzzer + three-color warning light). 3. Safety interlock mechanism: Before the fault is resolved, the HMI interface locks the operation permissions. The system reset and process restart can only be performed after the maintenance personnel are authenticated.
[0042] The above embodiments only illustrate one or more implementations of the present invention, and their descriptions are relatively specific and detailed, but they should not be construed as limiting the scope of the present invention. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these all fall within the protection scope of the present invention. Therefore, the protection scope of this patent should be determined by the appended claims.
Claims
1. A doping device suitable for different crystal pulling techniques, characterized in that, The system includes a support (1), on which a linear displacement mechanism is provided. The linear displacement mechanism includes a slider (2) that slides horizontally. The slider (2) is provided with a rotating mechanism, which includes a horizontal rotating tube (3) that is rotatably connected to the slider (2). A doping spoon (4) is provided at one end of the rotating tube (3) away from the slider (2). The doping spoon (4) has an opening (5). A cover plate (6) is hinged to the opening (5). A torsion spring (7) is provided between the cover plate (6) and the doping spoon (4) to keep the opening (5) open. The rotating tube (3) is provided with an air injection mechanism for blowing air into the doping spoon (4). The air injection mechanism includes an air supply pipe (8) parallel to the rotating tube (3). The slider (2) is also provided with a closing mechanism for driving the cover plate (6) to flip and close the opening (5). The closing mechanism includes a spool (9) and a pull wire (10) wound on the spool (9). The spool (9) is rotatably connected to the slider (2). One end of the pull wire (10) is fixedly connected to the spool (9), and the other end passes through the air supply pipe (8) and out of the opening (5) along the air supply pipe (8) and is fixedly connected to the cover plate (6).
2. The doping device applicable to different crystal pulling techniques according to claim 1, characterized in that, The linear displacement mechanism also includes a rodless cylinder (11) that is horizontally fixed to the support (1). A fixed rod (12) connected to the support (1) is provided below the rodless cylinder (11). The axial direction of the fixed rod (12) is parallel to the output direction of the rodless cylinder (11). A columnar groove (13) is provided on the slider (2) for it to be sleeved on the fixed rod (12). The slider (2) is fixedly connected to the output end of the rodless cylinder (11).
3. The doping device applicable to different crystal pulling techniques according to claim 1, characterized in that, A push-pull rod (14) is provided on the side of the slider (2). The axial direction of the push-pull rod (14) is parallel to the sliding direction of the slider (2). One end of the push-pull rod (14) is fixedly connected to the slider (2) through a connecting rod (15). The rotating tube (3) is coaxially sleeved on the push-pull rod (14). Several bearings (16) of the first type are provided between the rotating tube (3) and the push-pull rod (14) at equal intervals.
4. A doping device suitable for different crystal pulling techniques according to claim 3, characterized in that, The rotating mechanism also includes a drive tube (17), a magnetic coupling element (18), a servo motor (19), and a reduction gear set (20). The drive tube (17) is coaxially sleeved on the push-pull rod (14), and the drive tube (17) and the rotating tube (3) are spaced apart. Several equidistant No. 2 bearings (21) are provided between the drive tube (17) and the push-pull rod (14). The magnetic coupling element (18) drives the drive tube (17) and the rotating tube (3) together. A support (22) is fixedly provided on the slider (2). The servo motor (19) is installed on the support (22), and the servo motor (19) is driven by the drive tube (17) through the reduction gear set (20).
5. A doping device suitable for different crystal pulling techniques according to claim 1, characterized in that, The gas injection mechanism also includes a gas distribution pipe (23), one end of which is a closed structure and the other end is an open structure. The open end of the gas distribution pipe (23) is fixedly connected to the outer wall of the doping spoon (4), and the closed end of the gas distribution pipe (23) is coaxially fixedly connected to the rotating pipe (3). Several strip-shaped gas ports (24) connected to the gas distribution pipe (23) are provided on the outer wall of the doping spoon (4). A connecting nozzle (25) is provided on the gas distribution pipe (23), and one end of the gas delivery pipe (8) is bent upward and connected to the connecting nozzle (25).
6. A doping device suitable for different crystal pulling techniques according to claim 5, characterized in that, The gas supply pipe (8) is coaxially fixed to a gas-sealing sleeve (26) at one end away from the gas distribution pipe (23). One end of the gas-sealing sleeve (26) is an open structure, and the other end is a closed structure that seals the port of the gas supply pipe (8). An air inlet (27) is provided on the outer wall of the gas supply pipe (8) near the gas-sealing sleeve (26). A wire ring (28) is fixed on the outer wall of the rotating pipe (3). Before the pull wire (10) enters the gas supply pipe (8), it passes through the wire ring (28) and the gas-sealing sleeve (26) in sequence. A through hole (29) is provided on the closed end of the gas-sealing sleeve (26) for the pull wire (10) to pass through. A rubber ring (31) is provided on the through hole (29). Before the pull wire (10) enters the mixing spoon (4), it passes through the gas distribution pipe (23).
7. A doping device suitable for different crystal pulling techniques according to claim 2, characterized in that, The slider (2) is fixedly provided with a support tube (32), which is coaxially sleeved outside the fixed rod (12). The spool (9) is connected to the support tube (32) through the wheel frame (33). The support tube (32) is fixedly provided with a stepper motor (34) for rotating the spool (9).
8. A doping device suitable for different crystal pulling techniques according to claim 5, characterized in that, A vertically upward baffle (35) is fixed on the outer wall of the gas distribution pipe (23), and the cover plate (6) is rotated from horizontal to vertical and then comes into contact with the baffle (35).
9. A doping device suitable for different crystal pulling techniques according to claim 4, characterized in that, The support (22) has several sets of equally spaced guide rods (36) below it, and the axial direction of each set of guide rods (36) is parallel to the sliding direction of the slider (2). The bottom of the support (22) is fixedly provided with several sets of sliding sleeves (37) corresponding to the guide rods (36), and each set of sliding sleeves (37) is coaxially sleeved on the corresponding guide rod (36).
10. An operating method for a doping apparatus suitable for different crystal pulling techniques, employing the doping apparatus for different crystal pulling techniques as described in claim 5, characterized in that... The operation method includes the following steps: S1, In the initial state, the doping spoon (4) is in the retracted position, the opening (5) is facing upward, and the cover plate (6) is kept open under the action of the torsion spring (7). When doping is required, the doping spoon (4) is extended by the slider (2), and then doping material is injected into the doping spoon (4). S2, the spool (9) rotates to wind up the pull line (10), the pull line (10) pulls the cover plate (6) along the gas supply pipe (8) and the gas distribution pipe (23) to flip the cover plate (6), and the cover plate (6) overcomes the elastic force of the torsion spring (7) to completely close the opening (5); S3, the slider (2) drives the doping spoon (4) into the single crystal furnace. After the doping spoon (4) reaches the designated position, the rotating tube (3) drives the doping spoon (4) to rotate 180° so that the opening (5) faces down. The wire wheel (9) releases the pull wire (10). The cover plate (6) gradually opens under the action of the torsion spring (7). At the same time, the pull wire (10) is controlled to maintain a moderate tension so that the opening (5) is in a half-open state. S4, the slider (2) slides in the opposite direction to drive the doping spoon (4) to retract, and the half-open opening (5) allows the doping material to be dispersed and fall into the single crystal furnace. When the doping spoon (4) is about to exit the single crystal furnace, the wire wheel (9) completely releases the pull wire (10), the cover plate (6) is completely opened, and at the same time, the gas pipe (8) introduces inert gas. The inert gas blows the residual doping material into the furnace through the strip-shaped gas port (24). S5, the spool (9) rewinds to reset and close the cover plate (6), the doping spoon (4) exits the furnace and rotates to reset, the slider (2) drives the doping spoon (4) back to the initial position, and one doping cycle is completed.
Citation Information
Patent Citations
Monocrystalline silicon doping device
CN222389963U