Metal mask and pattern selection method, device and storage medium thereof

Abstract

The application provides a metal mask and a pattern selection method, device and storage medium thereof. The pattern selection method comprises: processing n different transition region images to obtain corresponding n groups of pattern design parameters for representing the pattern distribution state of the transition region; determining minimum equivalent regions based on the n groups of pattern design parameters, performing mechanical simulation on each minimum equivalent region by using a finite element algorithm to obtain n groups of material properties corresponding to n different metal masks; performing mechanical simulation on the n different metal masks by using the finite element algorithm based on the n groups of material properties to obtain n groups of first deformation variables corresponding to the n different metal masks; determining at least one group of target first deformation variables from the n groups of first deformation variables, and outputting a transition region image corresponding to the target first deformation variable. The computer simulation test method can shorten the product development cycle, reduce the manufacturing cost and improve the research and development efficiency.

Description

Technical Field

[0001] This invention relates to the field of metal photomask technology, and more specifically, to a metal photomask and its pattern selection method, apparatus, and storage medium. Background Technology

[0002] In the manufacturing process of semiconductor display devices (such as Organic Light-Emitting Diodes, OLEDs), many film structures are formed by vapor deposition using metal masks. The metal mask is strip-shaped and includes an effective region (also known as the AA region) in the middle, clamping regions at both ends, and a transition region (also known as the dummy region) between the effective region and the clamping regions. The effective region has pixel deposition holes corresponding to the substrate of the display device. Before deposition, the metal mask needs to be soldered onto the mask frame in the form of a mesh. Then, the clamping regions are removed, leaving the effective region, and the light-emitting material is deposited onto the substrate through the pixel deposition holes.

[0003] During the screen stretching process, the metal mask is held in the clamping area by grippers, causing the mask to open. During stretching, the effective area is easily wrinkled, deformed, or even cracked under tension. Therefore, the transition area contains fully etched perforated patterns (such as round holes, square holes, or strip-shaped holes) to buffer the sudden stress change from the clamping area to the effective area, and to absorb the deformation caused by stress buffering, protecting the effective area and preventing deformation or even cracking that could affect the evaporation effect.

[0004] Understandably, the deformation after meshing will vary depending on the metal mask used for the transition zone of different pattern designs. Smaller deformation indicates a stronger stress buffering capacity in the transition zone, resulting in higher precision of the metal mask and the vapor deposition process. Therefore, it is necessary to conduct meshing tests on different metal masks for the transition zones of different pattern designs, obtain and compare the deformation after meshing, and then select the metal mask with the smallest deformation after meshing for the transition zone of which pattern design has the strongest stress buffering capacity.

[0005] In existing technologies, the selection of patterns for different metal photomasks generally involves physical testing of the metal photomasks. This experimental method requires pre-designing the pattern for the transition area and manufacturing the corresponding metal photomask, followed by screen stretching tests to select the pattern with the smallest deformation, which increases design costs and development time. Moreover, because metal photomasks have high precision, are thin, easily damaged, and have high manufacturing costs, damaged metal photomasks must be discarded, resulting in a waste of metal photomask resources. Summary of the Invention

[0006] This application provides a metal photomask and its pattern selection method, apparatus, and storage medium to solve the technical problems existing in related technologies, such as the increased design cost and development cycle or the waste of metal photomask resources due to the use of physical experiments with metal photomasks.

[0007] In a first aspect, this application provides a method for pattern selection in a metal photomask, the metal photomask comprising: an effective area in the middle, clamping areas at both ends, and a transition area between the effective area and the clamping areas, including:

[0008] S101: Process n different transition zone images to obtain n sets of corresponding pattern design parameters, which are used to characterize the pattern distribution state of the transition zone; the patterns of the transition zones are different for n different metal masks; n is a positive integer;

[0009] S102: Based on n sets of pattern design parameters, determine the minimum equivalent regions of the effective area, transition area, and clamping area of ​​each of the n different metal masks. Perform mechanical simulation on each minimum equivalent region using the finite element algorithm to obtain n sets of material properties corresponding to the n different metal masks. Each set of material properties includes the material properties of the effective area, transition area, and clamping area of ​​the corresponding metal mask.

[0010] S103: Based on n sets of material properties, mechanical simulation is performed on n different metal masks using the finite element algorithm to obtain n sets of first deformation variables corresponding to the n different metal masks; each set of first deformation variables includes the first deformation variables of the effective area, transition area and clamping area of ​​the corresponding metal mask;

[0011] S104: Determine at least one target first deformation from n groups of first deformations, and output the transition zone image corresponding to the target first deformation.

[0012] In some embodiments, in step S101, each set of pattern design parameters in the n sets of pattern design parameters includes at least one of the following: hole size, hole spacing, and hole distribution density of the pattern design in the transition zone.

[0013] In some embodiments, step S102 involves determining the minimum equivalent region of the effective area, transition area, and clamping area for each of the n different metal masks, including:

[0014] The effective area of ​​each metal mask is divided into m1 equivalent regions, and the area of ​​each equivalent region is s1. The patterns are the same, m1 is a positive integer, and the equivalent region corresponding to the minimum value of s1 is the minimum equivalent region of the effective area.

[0015] The transition area of ​​each metal mask is divided into m2 equivalent regions, and the area of ​​each equivalent region is s2. The patterns are the same, m2 is a positive integer, and the equivalent region corresponding to the minimum value of s2 is the minimum equivalent region of the transition area.

[0016] The clamping area of ​​each metal mask is divided into m3 equivalent regions, each with an area of ​​s3. The patterns are the same, m3 is a positive integer, and the equivalent region corresponding to the minimum value of s3 is the smallest equivalent region of the clamping area.

[0017] In some embodiments, the material properties include at least one of elastic modulus, Poisson's ratio, and shear modulus.

[0018] In some embodiments, in step S102, mechanical simulation is performed on each minimum equivalent region using a finite element algorithm to obtain n sets of material properties corresponding to n different metal masks, including:

[0019] For each minimum equivalent region of n different metal masks, tensile simulations are performed in the X, Y, Z and shear directions, respectively, and the second deformation of the minimum equivalent region in the X, Y and Z directions is calculated.

[0020] Based on the second deformation, the material properties of the minimum equivalent region are obtained, and then the n sets of material properties corresponding to n different metal masks are obtained.

[0021] The X direction is the length direction of the minimum equivalent region, the Y direction is the width direction of the minimum equivalent region, the Z direction is the thickness direction of the minimum equivalent region, and the shear direction is the diagonal direction of the minimum equivalent region.

[0022] In some embodiments, tensile simulations are performed on each minimum equivalent region of n different metal masks in the X, Y, Z, and shear directions, respectively, and the second deformation of the minimum equivalent region in the X, Y, and Z directions is calculated, including:

[0023] Fix one end of each minimum equivalent region along the X direction, apply a tension force to the other end along the X direction, and calculate the second deformation of the minimum equivalent region in the X and Y directions;

[0024] Fix one end of each minimum equivalent region along the Y direction, apply a tension force to the other end along the Y direction, and calculate the second deformation of the minimum equivalent region in the X and Y directions;

[0025] Fix one side of each minimum equivalent region along the Z direction, apply a tensile force to the other side along the Z direction, and calculate the second deformation of the minimum equivalent region in the X, Y and Z directions;

[0026] Apply tension to the two opposite corners of each minimum equivalent region and calculate the second deformation of the minimum equivalent region in the X and Y directions.

[0027] In some embodiments, determining at least one set of target first deformation variables from n sets of first deformation variables in step S104 includes:

[0028] Determine at least one set of first shape variables in which the first shape variables of the effective region, transition region, and clamping region all satisfy the target threshold.

[0029] Based on the weighted analysis method, from at least one set of first-shaped variables that meet the target threshold, determine at least one set of first-shaped variables with the smallest comprehensive data as the target first-shaped variable.

[0030] Secondly, this application provides a metal mask, including: an effective area located in the middle, clamping areas located at both ends, and a transition area located between the effective area and the clamping areas;

[0031] The pattern distribution in the transition zone is obtained by any of the pattern selection methods provided in the first aspect above.

[0032] Thirdly, this application provides a pattern selection device for a metal photomask, comprising:

[0033] The processing module is used to process n different transition zone images to obtain n sets of corresponding pattern design parameters, which are used to characterize the pattern distribution state of the transition zone; the patterns of the transition zones are different for n different metal masks; n is a positive integer;

[0034] The first simulation module is used to determine the minimum equivalent regions of the effective area, transition area, and clamping area of ​​each of the n different metal masks based on n sets of pattern design parameters. The finite element algorithm is used to perform mechanical simulation on each minimum equivalent region to obtain n sets of material properties corresponding to the n different metal masks. Each set of material properties includes the material properties of the effective area, transition area, and clamping area of ​​the corresponding metal mask.

[0035] The second simulation module is used to perform mechanical simulations on n different metal masks based on n sets of material properties using the finite element algorithm, and obtain n sets of first deformation variables corresponding to the n different metal masks; each set of first deformation variables includes the first deformation variables of the effective area, transition area and clamping area of ​​the corresponding metal mask;

[0036] The output module is used to determine the target first shape variable from n sets of first shape variables and output the transition zone image corresponding to the target first shape variable.

[0037] Fourthly, this application provides a computer-readable storage medium having a computer program stored thereon, which, when executed by a processor, implements a pattern selection method for any of the metal photomasks provided in the first aspect above.

[0038] The metal photomask and its pattern selection method, apparatus, and storage medium provided in this application have the following technical advantages:

[0039] This application employs a full computer simulation experiment to select the desired first deformation variable from n different transition zone images. This indirectly determines that the stronger the buffering capacity of the transition zone image corresponding to the target first deformation variable, the smaller the deformation after the metal mask to which the transition zone image belongs, and the higher the accuracy. This application embodiment achieves a quantitative pre-evaluation of the performance of the pattern design scheme for the transition zone, which can shorten the product development cycle, reduce manufacturing costs, improve R&D efficiency, and reduce manufacturing cost waste of the metal mask.

[0040] Specifically, n different metal masks can be preset with n different transition zone pattern designs, while other parameters such as the effective area and the clamping area remain the same. This application processes images of n different transition zones to obtain n sets of pattern design parameters that quantify the pattern distribution state of different transition zones. Then, based on the n sets of pattern design parameters for different transition zones, the material properties of n different metal masks are obtained through mechanical simulation. Next, based on the material properties of n different metal masks, the first deformation of n different metal masks is obtained through mechanical simulation. Then, one or more sets of target first deformations that meet the expectations are selected from these, and the transition zone image corresponding to the target first deformation is used as the output result. Thus, it is determined that the stronger the buffering capacity of the transition zone image, the smaller the deformation of the metal mask to which the transition zone image belongs after meshing, and the higher the accuracy. Attached Figure Description

[0041] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the embodiments of the present invention will be briefly introduced below. It should be understood that the following drawings only show some embodiments of the present invention and should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0042] Figure 1 A schematic flowchart illustrating a pattern selection method for a metal photomask provided in an embodiment of this application;

[0043] Figure 2 This is a schematic diagram of the structure of a metal photomask provided in an embodiment of this application;

[0044] Figure 3 Schematic diagrams of the transition regions of three different metal photomasks provided in the embodiments of this application;

[0045] Figure 4 This is a schematic diagram of a pattern selection device for a metal mask provided in an embodiment of this application.

[0046] Figure label:

[0047] 100 - Metal mask; 110 - Effective area; 120 - Transition area; 130 - Clamping area;

[0048] 200 - Pattern selection device; 210 - Processing module; 220 - First analog module; 230 - Second analog module; 240 - Output module. Detailed Implementation

[0049] The embodiments of this application are described below with reference to the accompanying drawings. It should be understood that the embodiments described below with reference to the accompanying drawings are exemplary descriptions for explaining the technical solutions of the embodiments of this application, and do not constitute a limitation on the technical solutions of the embodiments of this application.

[0050] Those skilled in the art will understand that, unless specifically stated otherwise, the terms "described" and "the" as used herein may also include plural forms. It should be further understood that the term "comprising" as used in this application's specification means the presence of the stated features, integers, steps, operations, elements, and / or components, but does not exclude implementations of other features, information, data, steps, operations, elements, components, and / or combinations thereof supported by this art. It should be understood that when we say an element is "connected" or "coupled" to another element, the element may be directly connected or coupled to the other element, or it may mean that the element and the other element are connected through an intermediate element. Furthermore, "connected" or "coupled" as used herein may include wireless connections or wireless coupling. The term "and / or" as used herein refers to at least one of the items defined by the term; for example, "A and / or B" may be implemented as "A," or as "B," or as "A and B."

[0051] To make the objectives, technical solutions, and advantages of this application clearer, the embodiments of this application will be described in further detail below with reference to the accompanying drawings.

[0052] This application provides a method for pattern selection on a metal mask 100, the flowchart of which is shown below. Figure 1 As shown, Figure 2 As shown, the metal mask 100 includes: an effective area 110 located in the middle, clamping areas 130 located at both ends, and a transition area 120 located between the effective area 110 and the clamping areas 130. The method includes steps S101-S104:

[0053] S101: Process n different transition region 120 images to obtain n sets of pattern design parameters, which are used to characterize the pattern distribution state of the transition region 120; the patterns of the transition region 120 of n different metal masks 100 are different; n is a positive integer.

[0054] It should be noted that step S101 can quantify n actual transition zone 120 pattern designs to obtain n sets of pattern design parameters with specific data. Each set of pattern design parameters includes multiple different feature parameters, which together characterize the pattern design of the same transition zone 120.

[0055] S102: Based on n sets of pattern design parameters, determine the minimum equivalent regions of the effective area 110, transition area 120, and clamping area 130 of each of the n different metal mask plates 100. Perform mechanical simulation on each minimum equivalent region using the finite element algorithm to obtain n sets of material properties corresponding to the n different metal mask plates 100. Each set of material properties includes the material properties of the effective area 110, transition area 120, and clamping area 130 of the corresponding metal mask plate 100.

[0056] It should be noted that a metal mask 100 has a corresponding set of material properties. Each set of material properties includes the material properties of the effective area 110, the material properties of the transition area 120, and the material properties of the clamping area 130. The material properties of each area may include at least one specific material property data.

[0057] S103: Based on n sets of material properties, mechanical simulation is performed on n different metal mask plates 100 using the finite element algorithm to obtain n sets of first deformation variables corresponding to the n different metal mask plates 100; each set of first deformation variables includes the first deformation variables of the effective area 110, transition area 120 and clamping area 130 of the corresponding metal mask plate 100.

[0058] It should be noted that metal mask plates 100 with different material properties have different first deformation variables when performing mechanical simulations. That is, a set of material properties has a corresponding set of first deformation variables. Each set of first deformation variables includes the first deformation variable of the effective area 110, the first deformation variable of the transition area 120, and the first deformation variable of the clamping area 130. The first deformation variable of each region can include at least one specific first deformation variable data.

[0059] S104: Determine at least one target first deformation from n groups of first deformations, and output the transition region 120 image corresponding to the target first deformation.

[0060] It should be noted that the target first deformation variable is the group or groups of first deformation variables with the smallest comprehensive deformation rate among the n groups of first deformation variables obtained. The comprehensive deformation rate refers to the overall comprehensive deformation rate of the effective area 110, the transition area 120, and the clamping area 130. Therefore, it can be determined that the transition area 120 of the metal mask 100 corresponding to the target first deformation variable has a strong buffering capacity, and the pattern of the transition area 120 can be selected to complete the process of selecting the pattern of the transition area 120 in the pattern selection method of this application. In other words, the pattern selection method of the metal mask 100 provided in this application is the pattern selection method of the transition area 120 of the metal mask 100.

[0061] In this embodiment, a full computer simulation experiment is used to select the desired target first deformation from n different transition zone 120 images. This indirectly determines that the stronger the buffering capacity of the transition zone 120 image corresponding to the target first deformation, the smaller the deformation after the metal mask 100 meshes to which the transition zone 120 image belongs, and the higher the accuracy. This embodiment of the application realizes a quantitative pre-evaluation of the performance of the pattern design scheme of the transition zone 120, which can shorten the product development cycle, reduce manufacturing costs, improve R&D efficiency, and reduce the waste of manufacturing costs of the metal mask 100.

[0062] Specifically, n different metal mask 100s can be preset with n different transition zone 120 pattern designs, while other parameters such as the relevant parameters of the effective area 110 and the relevant parameters of the clamping area 130 are the same. This application processes images of n different transition zones 120 to obtain n sets of pattern design parameters that quantify the pattern distribution state of different transition zones 120; then, based on the n sets of pattern design parameters of different transition zones 120s, n sets of material properties of different metal mask 100s are obtained through mechanical simulation; then, based on the material properties of n sets of different metal mask 100s, n sets of first deformation variables of different metal mask 100s are obtained through mechanical simulation, and one or more sets of target first deformation variables that meet the expectations are selected from them. The transition zone 120 image corresponding to the target first deformation variable is used as the output result, thereby determining that the stronger the buffering capacity of the transition zone 120 image, the smaller the deformation amount of the metal mask 100 to which the transition zone 120 image belongs after meshing, and the higher the accuracy.

[0063] It should be noted that mechanical simulation refers to the simulation process of applying a load to the smallest equivalent region to cause its deformation, without actually applying a load to the metal mask 100.

[0064] Understandably, please refer to Figure 3 The pattern design of the transition region 120 generally includes etching through holes of different shapes on the metal mask 100 body of the transition region 120, such as... Figure 3 The diamond-shaped holes, strip-shaped holes, round holes, and through holes in the pattern have a certain arrangement order. Therefore, in some embodiments, in step S101, each set of pattern design parameters in the n sets of pattern design parameters includes at least one of the hole size, hole spacing, and hole distribution density of the pattern design in the transition zone 120.

[0065] In this embodiment, step S101 quantifies n different transition zone 120 pattern designs, and the resulting n sets of pattern design parameters each set of pattern design parameters includes at least one characteristic parameter among hole size, hole spacing and hole distribution density; when each set of pattern design parameters includes multiple characteristic parameters, for example, each set of pattern design parameters includes three characteristic parameters: hole size, hole spacing and hole distribution density, then the specific data of these three characteristic parameters jointly characterize the pattern design of the same transition zone 120.

[0066] The present application embodiment can quantify the pattern of the transition region 120 by using hole size, hole spacing and hole distribution density, and use it in subsequent mechanical simulation.

[0067] In some embodiments, step S102 involves determining the minimum equivalent region of the effective region 110, transition region 120, and clamping region 130 for each of the n different metal masks 100, including:

[0068] The effective area 110 of each metal mask 100 is divided into m1 equivalent regions. The area of ​​each equivalent region is s1. The patterns are the same. m1 is a positive integer. The equivalent region corresponding to the minimum value of s1 is the minimum equivalent region of the effective area 110.

[0069] The transition region 120 of each metal mask 100 is divided into m2 equivalent regions. The area of ​​each equivalent region is s2. The patterns are the same. m2 is a positive integer. The equivalent region corresponding to the minimum value of s2 is the minimum equivalent region of the transition region 120.

[0070] The clamping area 130 of each metal mask 100 is divided into m3 equivalent regions. The area of ​​each equivalent region is s3. The patterns are the same. m3 is a positive integer. The equivalent region corresponding to the minimum value of s3 is the minimum equivalent region of the clamping area 130.

[0071] Different transition regions 120 correspond to different metal mask plates 100. Considering that different transition region 120 designs not only affect the buffering capacity of the transition region 120 itself, but also affect the deformation degree of the effective region 110 and the clamping region 130, in this embodiment of the application, the corresponding minimum equivalent region is selected for mechanical simulation of the transition region 120, the effective region 110, and the clamping region 130. A comprehensive analysis of the deformation of the metal mask plate 100 can improve the accuracy of the pattern selection result of the transition region 120.

[0072] Furthermore, the pattern design parameters affect the selection process of the minimum equivalent region. Different patterns represented by different pattern design parameters result in different sizes of the minimum equivalent region.

[0073] Furthermore, in the selection of the minimum equivalent region, equivalent regions of the transition region 120, effective region 110, and clamping region 130 can be selected separately. Specifically, each of the transition region 120, effective region 110, and clamping region 130 is divided into multiple equal parts, with each part containing the same pattern. The minimum number of equal parts that can be divided into is the minimum equivalent region. In subsequent mechanical simulations of the minimum equivalent region, only the first deformation data of the minimum equivalent region needs to be obtained; it is not necessary to calculate the first deformation data of the entire metal mask 100, thus saving resources and improving computational efficiency.

[0074] In some embodiments, the material properties include at least one of elastic modulus, Poisson's ratio, and shear modulus.

[0075] In this embodiment, each set of material properties includes the material properties of the effective region 110, the material properties of the transition region 120, and the material properties of the clamping region 130. The material properties of each region include at least one specific material property data, namely at least one of elastic modulus, Poisson's ratio, and shear modulus.

[0076] This embodiment can analyze material properties from multiple dimensions, thereby improving the accuracy of the obtained n sets of first deformation variables.

[0077] This application also provides the following specific embodiments to illustrate the data acquisition process of material properties. In some embodiments, in step S102, mechanical simulation is performed on each minimum equivalent region using a finite element algorithm to obtain n sets of material properties corresponding to n different metal mask plates 100, including:

[0078] For each minimum equivalent region of n different metal masks 100, tensile simulations are performed in the X, Y, Z and shear directions respectively, and the second deformation of the minimum equivalent region in the X, Y and Z directions is calculated respectively.

[0079] Based on the second deformation, the material properties of the smallest equivalent region are obtained, and then the n sets of material properties corresponding to n different metal mask plates 100 are obtained.

[0080] The X direction is the length direction of the minimum equivalent region, the Y direction is the width direction of the minimum equivalent region, the Z direction is the thickness direction of the minimum equivalent region, and the shear direction is the diagonal direction of the minimum equivalent region.

[0081] In this embodiment, each type of metal mask 100 has a transition region 120, an effective region 110, and a clamping region 130, and each region has a minimum equivalent region. Based on computer simulation, tensile force simulation is performed on each minimum equivalent region of n different metal masks 100 in multiple directions to simulate the tensile force experienced by the metal mask 100 during the actual mesh stretching process, simulate the deformation state of the metal mask 100, and obtain different second deformation data of the minimum equivalent region in multiple directions. Based on the second deformation data, the specific data of the material properties of the metal mask 100 corresponding to each set of second deformations are obtained by software calculation.

[0082] Moreover, this embodiment comprehensively simulates the tensile force in multiple directions, including the X, Y, Z, and shear directions, which can basically cover the tensile force that may be encountered in the actual netting process, making the simulation process closer to actual operation and thus improving the accuracy of the results.

[0083] It should be noted that if the planar figure of the smallest equivalent region is a square, then the extension directions corresponding to the two connected sides with perpendicular extension directions in the square are the length direction and the width direction, that is, the X direction and the Y direction.

[0084] In some embodiments, tensile simulations are performed on each minimum equivalent region of n different metal masks 100 in the X, Y, Z, and shear directions, respectively, and the second deformation of the minimum equivalent region in the X, Y, and Z directions is calculated, including:

[0085] Fix one end of each minimum equivalent region along the X direction, apply a tension force to the other end along the X direction, and calculate the second deformation of the minimum equivalent region in the X and Y directions.

[0086] Fix one end of each minimum equivalent region along the Y direction, apply a tension force to the other end along the Y direction, and calculate the second deformation of the minimum equivalent region in the X and Y directions.

[0087] Fix one side of each minimum equivalent region along the Z direction, apply a tensile force to the other side along the Z direction, and calculate the second deformation of the minimum equivalent region in the X, Y, and Z directions.

[0088] Apply tension to the two opposite corners of each minimum equivalent region and calculate the second deformation of the minimum equivalent region in the X and Y directions.

[0089] This embodiment describes the tensile simulation in detail. Specifically, the minimum equivalent region is a block structure with a certain thickness. The method of simulating the application of tensile force along the X direction is to fix one end of the minimum equivalent region along the X direction and apply a tensile force along the X direction to the opposite end. Under the action of the tensile force along the X direction, the minimum equivalent region deforms in both the X and Y directions. The second deformation of the minimum equivalent region in the X and Y directions is calculated.

[0090] The method of simulating the application of tension along the Y direction is to fix one end of the minimum equivalent region along the Y direction and apply a tension along the Y direction to the other end. Under the action of the tension along the Y direction, the minimum equivalent region will deform in both the X and Y directions. The second deformation of the minimum equivalent region in the X and Y directions is calculated.

[0091] The Z-direction is the thickness direction of the minimum equivalent region. The bottom surface of the minimum equivalent region can be fixed, and a tensile force along the Z-direction is applied to the top surface of the minimum equivalent region. Under the action of the tensile force along the Z-direction, the minimum equivalent region will deform in the X, Y and Z directions. Calculate the second deformation of the minimum equivalent region in the X, Y and Z directions.

[0092] The shear direction can be the diagonal direction of the smallest equivalent region. When a tensile force is applied along the diagonal direction, deformation occurs in both the X and Y directions, while the deformation in the Z direction can be ignored.

[0093] This application also provides experimental data on the second deformation, and the corresponding calculation method for the material properties.

[0094] In this embodiment of the application, the tensile stress simulation of the minimum equivalent region of a region (such as the effective region 110, the transition region 120, or the clamping region 130) of the metal mask 100 is taken as an example. The physical properties of the minimum equivalent region are shown in Table 1. In Table 1, the outer frame length, outer frame width, and outer frame thickness are the length, width, and thickness of a region of the metal mask 100, respectively. The inner frame length, inner frame width, and inner frame thickness are the length, width, and thickness of the minimum equivalent region of that region. The inner frame mass and inner frame density are the mass and density of the minimum equivalent region of the metal mask 100, respectively.

[0095]

[0096] Table 1 Physical properties of the minimum equivalent region

[0097] First, tensile force simulations were performed on the minimum equivalent region in the X, Y, Z and shear directions, respectively. The tensile forces used were represented by Fx, Fy, Fz and Gxy, and four sets of experimental data on deformation were obtained (see Table 2).

[0098]

[0099] Table 2. Four sets of deformation test data under tensile forces in four directions.

[0100] Then, given that the material properties include elastic modulus, Poisson's ratio, and shear modulus, the results of the elastic modulus, Poisson's ratio, and shear modulus of the minimum equivalent region can be obtained based on the calculation formulas for elastic modulus, Poisson's ratio, and shear modulus, according to the physical properties and deformation of the minimum equivalent region. The specific calculation process is similar to the existing technology and will not be repeated here.

[0101]

[0102] Table 3 Material Property Calculation Formulas

[0103]

[0104] Table 4 Material Property Results

[0105] It should be noted that in Table 4, Ex (Pa), Ey (Pa), and Ez (Pa) represent the elastic modulus in the X, Y, and Z directions, respectively. The principal Poisson's ratio (PRxy) represents the lateral contraction ratio in the Y direction when subjected to force in the X direction, the principal Poisson's ratio (PRyz) represents the lateral contraction ratio in the Z direction when subjected to force in the Y direction, the principal Poisson's ratio (PRxz) represents the lateral contraction ratio in the Z direction when subjected to force in the X direction, Gxy (Pa) represents the ability to resist shear deformation in the xy plane, Gyz (Pa) represents the ability to resist shear deformation in the yz plane, and Gxz (Pa) represents the ability to resist shear deformation in the xz plane.

[0106] It should be noted that, as shown in Table 4, the elastic modulus of each minimum equivalent region contains 3 parameters, the principal Poisson's ratio of each minimum equivalent region contains 3 parameters, and the shear modulus of each minimum equivalent region also contains 3 parameters. Together, these 9 parameters completely describe the elastic deformation behavior of the minimum equivalent region in three-dimensional space.

[0107] It should be noted that the calculation process described in the embodiments of this application is all calculated by computer software and does not require human calculation. The table content provided in this application can prove the feasibility of establishing the computer software.

[0108] In some embodiments, determining at least one set of target first deformation variables from n sets of first deformation variables in step S104 above includes:

[0109] Determine at least one set of first deformation variables in which the first deformation variables of the effective region 110, the transition region 120, and the clamping region 130 all satisfy the target threshold.

[0110] Based on the weighted analysis method, from at least one set of first-shaped variables that meet the target threshold, determine at least one set of first-shaped variables with the smallest comprehensive data as the target first-shaped variable.

[0111] In this embodiment, after obtaining n sets of first deformation variables, at least one set of first deformation variables in each set, where the first deformation variables of the effective area 110, transition area 120, and clamping area 130 all meet the target threshold, is selected. Then, based on the weighted analysis method, weights are assigned to the effective area 110, transition area 120, and clamping area 130, and the weighted score of each set of first deformation variables is calculated. The set of one or more sets of first deformation variables with the highest scores is selected as the output result. Then, based on the output first deformation variables, further analysis is performed to output the final pattern of the transition area 120. This makes the pattern design of the transition area 120 of the output metal mask 100 more reasonable, more accurate, and better meets the actual needs.

[0112] If none of the data in all the first variable groups meet the target threshold, another weighted analysis method can be used to calculate the weighted score of each first variable group, and select the first variable group or multiple groups with the highest scores as the output results.

[0113] Based on the same inventive concept, this application also provides a metal mask 100, including: an effective area 110 located in the middle, clamping areas 130 located at both ends, and a transition area 120 located between the effective area 110 and the clamping areas 130.

[0114] The pattern distribution state of the transition region 120 is selected as provided by the pattern selection method in any of the above embodiments.

[0115] In this embodiment, the pattern selection method provided in any of the above embodiments is adopted, and its implementation principle is similar, so it will not be described again here.

[0116] Based on the same inventive concept, this application also provides a pattern selection device 200 for a metal mask 100, the structural schematic diagram of which is shown below. Figure 4 As shown, the device includes:

[0117] The processing module 210 is used to process n different transition region 120 images to obtain n sets of pattern design parameters, which are used to characterize the pattern distribution state of the transition region 120; the patterns of the transition region 120 of the n different metal mask plates 100 are different; n is a positive integer.

[0118] The first simulation module 220 is used to determine the minimum equivalent regions of the effective region 110, transition region 120 and clamping region 130 of each of the n different metal mask plates 100 based on n sets of pattern design parameters, and to perform mechanical simulation on each minimum equivalent region using the finite element algorithm to obtain n sets of material properties corresponding to the n different metal mask plates 100; each set of material properties includes the material properties of the effective region 110, transition region 120 and clamping region 130 of the corresponding metal mask plate 100.

[0119] The second simulation module 230 is used to perform mechanical simulation on n different metal mask plates 100 based on n sets of material properties using the finite element algorithm, and obtain n sets of first deformation variables corresponding to the n different metal mask plates 100; each set of first deformation variables includes the first deformation variables of the effective area 110, transition area 120 and clamping area 130 of the corresponding metal mask plate 100.

[0120] Output module 240 is used to determine the target first shape variable from n groups of first shape variables and output the transition region 120 image corresponding to the target first shape variable.

[0121] The pattern selection device 200 of this application embodiment can execute any of the pattern selection methods provided in this application embodiment. The implementation principles are similar. The actions performed by each module in the device of each embodiment of this application correspond to the steps in the methods of each embodiment of this application. For detailed functional descriptions of each module of the device, please refer to the descriptions in the corresponding methods shown above, which will not be repeated here.

[0122] Based on the same inventive concept, this application provides a computer-readable storage medium having a computer program stored thereon, which, when executed by a processor, implements the pattern selection method of the metal mask 100 as provided in any of the above embodiments.

[0123] This application provides various optional embodiments of a computer-readable storage medium applicable to the pattern selection method of the metal mask 100 provided in any of the above embodiments, which will not be described in detail here.

[0124] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A method for pattern selection on a metal photomask, the metal photomask comprising: The effective area located in the middle, the clamping areas located at both ends, and the transition area located between the effective area and the clamping area are characterized in that they include: S101: Process n different transition zone images to obtain n sets of corresponding pattern design parameters, which are used to characterize the pattern distribution state of the transition zone; the patterns of the transition zone are different for n different metal masks; n is a positive integer; S102: Based on the n sets of pattern design parameters, determine the minimum equivalent area of ​​the effective area, transition area and clamping area of ​​each of the n different metal masks, and perform mechanical simulation on each minimum equivalent area using the finite element algorithm to obtain n sets of material properties corresponding to the n different metal masks; each set of material properties includes the material properties of the effective area, transition area and clamping area of ​​the corresponding metal mask; S103: Based on the n sets of material properties, mechanical simulation is performed on the n different metal masks using the finite element algorithm to obtain n sets of first deformation variables corresponding to the n different metal masks; each set of first deformation variables includes the first deformation variables of the effective area, transition area and clamping area of ​​the corresponding metal mask; S104: Determine at least one target first deformation from the n groups of first deformations, and output the transition region image corresponding to the target first deformation.

2. The pattern selection method according to claim 1, characterized in that, In step S101, each set of pattern design parameters in the n sets of pattern design parameters includes at least one of the following: hole size, hole spacing, and hole distribution density of the pattern design in the transition zone.

3. The pattern selection method according to claim 1, characterized in that, In step S102, the minimum equivalent area of ​​the effective area, transition area, and clamping area of ​​each of the n different metal masks is determined, including: The effective area of ​​each metal mask is divided into m1 equivalent regions, each with an area of ​​s1. The patterns are the same, m1 is a positive integer, and the equivalent region corresponding to the minimum value of s1 is the minimum equivalent region of the effective area. The transition region of each metal mask is divided into m2 equivalent regions, each with an area of ​​s2. The patterns are the same, m2 is a positive integer, and the equivalent region corresponding to the minimum value of s2 is the minimum equivalent region of the transition region. The clamping area of ​​each metal mask is divided into m3 equivalent regions, each with an area of ​​s3. The patterns are the same, m3 is a positive integer, and the equivalent region corresponding to the minimum value of s3 is the smallest equivalent region of the clamping area.

4. The pattern selection method according to claim 1, characterized in that, The material properties include at least one of the following: elastic modulus, Poisson's ratio, and shear modulus.

5. The pattern selection method according to claim 4, characterized in that, In step S102, mechanical simulation is performed on each minimum equivalent region using the finite element method to obtain n sets of material properties corresponding to the n different metal masks, including: For each minimum equivalent region of n different metal masks, tensile simulations are performed in the X, Y, Z and shear directions, respectively, and the second deformation of the minimum equivalent region in the X, Y and Z directions is calculated respectively. Based on the second deformation, the material properties of the minimum equivalent region are obtained, and then the n sets of material properties corresponding to the n different metal masks are obtained. The X direction is the length direction of the minimum equivalent region, the Y direction is the width direction of the minimum equivalent region, the Z direction is the thickness direction of the minimum equivalent region, and the shearing direction is the diagonal direction of the minimum equivalent region.

6. The pattern selection method according to claim 5, characterized in that, The tensile simulation is performed on each minimum equivalent region of n different metal masks in the X, Y, Z and shear directions, respectively, and the second deformation of the minimum equivalent region in the X, Y and Z directions is calculated, including: Fix one end of each of the minimum equivalent regions along the X direction, apply a tensile force to the other end along the X direction, and calculate the second deformation of the minimum equivalent region in the X and Y directions; Fix one end of each of the minimum equivalent regions along the Y direction, apply a tensile force to the other end along the Y direction, and calculate the second deformation of the minimum equivalent region in the X and Y directions; Fix one side of each of the minimum equivalent regions along the Z direction, apply a tensile force to the other side along the Z direction, and calculate the second deformation of the minimum equivalent region in the X, Y and Z directions; Apply tensile forces to the two opposite corners of each of the minimum equivalent regions, and calculate the second deformation of the minimum equivalent region in the X and Y directions.

7. The pattern selection method according to claim 1, characterized in that, Step S104, which involves determining at least one target first deformation variable from the n sets of first deformation variables, includes: Determine at least one set of first shape variables in which the first shape variables of the effective region, transition region, and clamping region all satisfy the target threshold. Based on the weighted analysis method, from at least one set of first variables that meet the target threshold, the minimum set of first variables with the smallest comprehensive data is determined as the target first variable.

8. A metal photomask, characterized in that, include: The effective area is located in the middle, the clamping areas are located at both ends, and the transition area is located between the effective area and the clamping area; The pattern distribution state of the transition zone is selected by the pattern selection method as described in any one of claims 1-7.

9. A pattern selection device for a metal photomask, characterized in that, include: The processing module is used to process n different transition zone images to obtain n sets of corresponding pattern design parameters, which are used to characterize the pattern distribution state of the transition zone; the patterns of the transition zone are different for the n different metal masks; n is a positive integer; The first simulation module is used to determine the minimum equivalent regions of the effective area, transition area, and clamping area of ​​each of the n different metal masks based on the n sets of pattern design parameters, and to perform mechanical simulation on each minimum equivalent region using the finite element algorithm to obtain n sets of material properties corresponding to the n different metal masks; each set of material properties includes the material properties of the effective area, transition area, and clamping area of ​​the corresponding metal mask; The second simulation module is used to perform mechanical simulation on the n different metal masks using the finite element algorithm based on the n sets of material properties, and obtain n sets of first deformation variables corresponding to the n different metal masks; each set of first deformation variables includes the first deformation variables of the effective area, transition area and clamping area of ​​the corresponding metal mask; The output module is used to determine the target first deformation from the n groups of first deformations and output the transition region image corresponding to the target first deformation.

10. A computer-readable storage medium having a computer program stored thereon, characterized in that, When the computer program is executed by the processor, it implements the pattern selection method for the metal mask as described in any one of claims 1-7.

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