Chemical vapor deposition (CVD) diamond chemical vapor deposition mechanism

Abstract

The utility model relates to a chemical vapor deposition (CVD) diamond chemical vapor deposition mechanism which comprises a circular vacuum reaction tank which is of a sandwich structure, movable sealing holes are evenly formed in the side edge of the circular vacuum reaction tank, a deposition table is arranged in the center of the interior of the circular vacuum reaction tank, and a heating mechanism is arranged at the lower end of the deposition table. The heating mechanism is arranged in the middle of the lower end of the circular vacuum reaction tank, three same cushioning supporting legs are uniformly arranged at the lower end of the circular vacuum reaction tank, the vacuumizing equipment is arranged on the right side of the heating mechanism, and the upper end of the vacuumizing equipment is fixedly connected with the circular vacuum reaction tank. The temperature on the generation table rises, the deposition efficiency on the deposition composite sheet is improved, the deposition composite sheet is vertically placed, it is guaranteed that crystals can grow on the front face and the back face of the deposition composite sheet, and the cushioning supporting legs are arranged to achieve high deposition efficiency, good cushioning effect, good sealing performance and high safety coefficient.

Description

Technical Field

[0001] The utility model relates to the technical field of diamond chemical vapor deposition equipment, in particular to a CVD diamond chemical vapor deposition mechanism. Background Art

[0002] Chemical vapor deposition is a chemical technology that is widely used to purify substances, develop new crystals, and deposit various single-crystal, polycrystalline or glassy inorganic thin film materials. These materials can be oxides, sulfides, nitrides, carbides, etc. Their physical functions can be precisely controlled through the vapor phase doping deposition process.

[0003] Patent No. CN202310187355.5 discloses a diamond vapor deposition device, which is provided with a furnace body and a guide tube rotatably arranged on the top of the furnace body, a bottom plate is fixedly connected to the inner cavity of the furnace body, and a partition is slidably arranged between the bottom plate and the top wall of the furnace body, and the guide tube passes through the partition and is threadedly connected to the partition; a first exhaust hole and a second exhaust hole are provided on the bottom plate, a guide assembly is arranged between the partition and the guide tube, and a sealing assembly matched with the guide assembly is arranged at the bottom end of the bottom plate, and the sealing assembly can alternately seal the first exhaust hole and the second exhaust hole, so that the gas passing through the guide assembly is alternately discharged from the bottom plate; this device cooperates with the sealing assembly through the arranged guide assembly, so that the mixed gas can be continuously transported to the inside of the furnace body, and the partition is used to make the gas be mixed evenly before being discharged downward, thereby improving the uniformity of the later deposition, and the continuity of the gas is good during the downward discharge process, but the device has the following problems: first, the deposition efficiency is low, and second, the shock absorbing effect is poor and the sealing performance is poor. Utility Model Content

[0004] The purpose of the utility model is to address the deficiencies of the prior art. By setting up a deposition table and utilizing a heating mechanism to heat the heat-conducting column, the temperature on the table is increased, and the deposition efficiency on the deposition composite sheet is improved. The deposition composite sheet is placed vertically to ensure that crystals can grow on both sides. Shock-absorbing support legs are also provided to solve the technical problems of low deposition efficiency, poor shock-absorbing effect, and poor sealing performance in the prior art.

[0005] In order to achieve the above purpose, the utility model provides the following technical solutions:

[0006] A CVD diamond chemical vapor deposition mechanism, comprising a circular vacuum reaction tank, an air inlet pipe is arranged at the rear end of the circular vacuum reaction tank, and the lower end of the circular vacuum reaction tank is fixedly connected to a support frame, the lower ends of the front and rear sides of the support frame are evenly fixedly connected to support columns, the lower ends of the support columns are fixedly connected to a rectangular frame, and the lower ends of the front and rear sides of the rectangular frame are evenly provided with support feet;

[0007] A circular vacuum reaction tank, which is a sandwich structure, and movable sealing holes are evenly opened on the sides of the circular vacuum reaction tank. A deposition platform is provided at the center of the interior of the circular vacuum reaction tank, and a heating mechanism is provided at the lower end of the deposition platform. The heating mechanism is arranged in the middle of the lower end of the circular vacuum reaction tank, and three identical shock-absorbing support legs are evenly provided at the lower end of the circular vacuum reaction tank, and a vacuum pumping device is provided on the right side of the heating mechanism, and the upper end of the vacuum pumping device is fixedly connected to the circular vacuum reaction tank.

[0008] Preferably, the deposition platform comprises a heat-conducting column, a heat-insulating pad is provided at the lower end of the heat-conducting column, and the upper end of the heat-conducting column is fixedly connected to the generating platform, the lower end of the heat-insulating pad is fixedly connected to the circular vacuum reaction tank, a deposition composite sheet is provided at the upper end of the generating platform, the side of the deposition composite sheet is fixedly connected to a connecting rod, the other end of the connecting rod is fixedly connected to an adjusting fixing rod, the lower end of the adjusting fixing rod is evenly provided with adjusting holes, the fixing rod is fixedly connected in the adjusting hole, and the fixing rod passes through the adjusting hole and is fixedly connected to the generating platform.

[0009] Preferably, one of the movable sealing holes is sealed and connected to the air inlet pipe, and the outer sides of the remaining movable sealing holes are all sealed and connected to sealing covers, and threaded connecting rods are evenly arranged on the outer sides of the sealing covers.

[0010] As a preferred embodiment, the upper end of the circular vacuum reaction tank is sealed and connected to the upper end cover, and C-shaped sealing blocks are evenly arranged on the outer edge of the upper end cover. A threaded hole is opened on the upper end of the C-shaped sealing block, and a fastening screw is threadedly connected to the threaded hole. A sealing rubber pad is provided at the contact position between the lower end surface of the upper end cover and the circular vacuum reaction tank.

[0011] As a preference, the heating mechanism comprises a heating chamber, the upper end of the heating chamber is fixedly connected to a heat-conducting chamber, the upper end of the heat-conducting chamber is fixedly connected to a heat-conducting column, the heat-conducting column is a double-layer structure, and heat-insulating cotton is arranged in the outer interlayer of the heat-conducting column.

[0012] As a preferred embodiment, the shock-absorbing support leg includes a shock-absorbing connecting component, a shock-absorbing spring is provided at the lower end of the shock-absorbing connecting component, a No. 2 shock-absorbing connecting component is provided at the lower end of the shock-absorbing spring, the structure of the No. 2 shock-absorbing connecting component is the same as the structure of the shock-absorbing connecting component, and a supporting connecting column is provided at the lower end of the No. 2 shock-absorbing connecting component, a No. 2 supporting foot is provided at the lower end of the supporting connecting column, the structure of the No. 2 supporting foot is the same as the structure of the supporting foot, and the supporting connecting columns are fixedly connected to each other with reinforcing ribs.

[0013] As another preferred embodiment, the supporting foot includes an anti-slip circular pad, a circular groove is provided at the center of the upper end of the anti-slip circular pad, a circular fixing ball is placed in the circular groove, the upper end of the circular fixing ball is fixedly connected to the supporting thin rod, and the upper end of the supporting thin rod is fixedly connected to the rectangular frame.

[0014] Beneficial effects of the utility model:

[0015] (1) In the utility model, the upper end cover is provided to seal the upper end of the entire circular vacuum reaction tank, and the upper end cover and the circular vacuum reaction tank are evenly provided with C-shaped sealing blocks to seal and firmly connect them, thereby ensuring that the entire circular vacuum reaction tank has good sealing performance, is completely evacuated, and has fewer impurities in diamond chemical vapor deposition gas.

[0016] (2) In the utility model, a deposition table is set up and a heating mechanism is used to heat the heat-conducting column. The heat-conducting column transfers the heat to the generating table and then transfers the heat to the deposition composite sheet in contact with the generating table. The deposition composite sheet can be height-adjusted according to its own model specifications. Then, the deposition composite sheet is placed vertically and crystals can be grown at both ends to ensure high growth efficiency.

[0017] (3) In the utility model, by providing shock-absorbing support legs and support frames, the circular vacuum reaction tank is ensured to be placed more stably, with good shock-absorbing effect, and will not be affected by the vibration of the placement ground, thereby ensuring better overall sealing effect, longer service life, and high safety factor.

[0018] In summary, the equipment has the advantages of good shock-absorbing effect, high safety factor, high crystal growth efficiency and good sealing performance, and is particularly suitable for the technical field of diamond chemical vapor deposition equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] In order to more clearly illustrate the technical solutions of the embodiments of the utility model, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0020] Figure 1 It is a schematic diagram of the overall structure of the utility model.

[0021] Figure 2 This is a schematic diagram of the location placement structure of the vacuum pumping equipment in the utility model.

[0022] Figure 3 It is a schematic diagram of the placement structure of the deposition platform in the utility model.

[0023] Figure 4 It is a structural schematic diagram of the deposition platform in the utility model.

[0024] Figure 5 It is a structural schematic diagram of the heating mechanism in the utility model.

[0025] Figure 6It is a schematic structural diagram of the shock-absorbing support leg in the utility model.

[0026] Figure 7 This is a schematic diagram of the structure of the support foot in the utility model DETAILED DESCRIPTION

[0027] The technical solutions in the embodiments of the present utility model are clearly and completely described below in conjunction with the accompanying drawings.

[0028] Embodiment 1

[0029] like Figures 1 to 7 As shown, the utility model provides a CVD diamond chemical vapor deposition mechanism, including a circular vacuum reaction tank 1, the rear end of the circular vacuum reaction tank 1 is provided with an air inlet pipe 2, and the lower end of the circular vacuum reaction tank 1 is fixedly connected to a support frame 3, the lower ends of the front and rear sides of the support frame 3 are evenly fixedly connected to support columns 31, the lower ends of the support columns 31 are fixedly connected to a rectangular frame 32, and the lower ends of the front and rear sides of the rectangular frame 32 are evenly provided with support feet 33;

[0030] A circular vacuum reaction tank 1, which is a sandwich structure, and movable sealing holes 11 are evenly opened on the side of the circular vacuum reaction tank 1, a deposition platform 4 is provided at the center position inside the circular vacuum reaction tank 1, a heating mechanism 5 is provided at the lower end of the deposition platform 4, and the heating mechanism 5 is arranged in the middle of the lower end of the circular vacuum reaction tank 1, and three identical shock-absorbing support legs 6 are evenly provided at the lower end of the circular vacuum reaction tank 1, and a vacuum pumping device 7 is provided on the right side of the heating mechanism 5, and the upper end of the vacuum pumping device 7 is fixedly connected to the circular vacuum reaction tank 1.

[0031] Furthermore, the deposition platform 4 includes a heat-conducting column 41, a heat-insulating pad 42 is provided at the lower end of the heat-conducting column 41, and the upper end of the heat-conducting column 41 is fixedly connected to the generating platform 43, the lower end of the heat-insulating pad 42 is fixedly connected to the circular vacuum reaction tank 1, and a deposition composite sheet 44 is provided at the upper end of the generating platform 43, the deposition composite sheet 44 is fixedly connected to the connecting rod 45 on the side, and the other end of the connecting rod 45 is fixedly connected to the adjusting fixing rod 46, and the adjusting fixing rod 46 has evenly opened adjustment holes 47 at the lower end, and the adjusting holes 47 are connected with fixing rods 48, and the fixing rods 48 pass through the adjustment holes 47 and are fixedly connected to the generating platform 43. The deposition composite sheet 44 can be placed on the generating platform 43, and heat conduction can also be performed. The deposition composite sheet 44 is connected to the connecting rod 45 on the side, and the height of the deposition composite sheet 44 is adjusted by passing the fixing rods 48 through the adjustment holes 47 of different heights, so as to adapt to deposition composite sheets 44 of different sizes, with a wide adaptation range, a high universal coefficient, and strong practicality.

[0032] Furthermore, one of the movable sealing holes 11 is sealed and connected to the intake pipe 2, and the outer sides of the remaining movable sealing holes 11 are all sealed and connected to the sealing cover 111. The outer sides of the sealing cover 111 are evenly provided with threaded connecting rods 112. The provision of multiple movable sealing holes 11 can adapt to the connection of different external components. It can be sealed and connected to the intake pipe 2, and it can also connect multiple intake pipes 2 when the intake pipe 2 is divided into multiple ones. It can also be connected to a glass observation window to realize intuitive observation of the interior. The provision of the sealing cover 111 and the threaded connecting rod 112 is to ensure better overall sealing performance, high flexibility and good sealing.

[0033] Furthermore, the upper end of the circular vacuum reactor 1 is sealed and connected to the upper end cover 12, and the outer edge of the upper end cover 12 is evenly provided with a C-shaped sealing block 13, and the upper end of the C-shaped sealing block 13 is provided with a threaded hole, and the threaded hole is threadedly connected with a fastening screw 14, and a sealing rubber pad is provided at the contact position between the lower end surface of the upper end cover 12 and the circular vacuum reactor 1. The setting of the upper end cover 12 is a sealing setting for the circular vacuum reactor 1, and the use of the vacuum pumping device 7 ensures that the interior can be vacuumed, with less air impurities, the purity of the gas entering the air inlet pipe 2 is high, and the reaction growth crystal is purer.

[0034] Furthermore, the heating mechanism 5 includes a heating chamber 51, wherein the upper end of the heating chamber 51 is fixedly connected to a heat-conducting chamber 52, and the upper end of the heat-conducting chamber 52 is fixedly connected to a heat-conducting column 41. The heat-conducting column 41 is a double-layer structure, and a heat-insulating cotton is arranged in the outer interlayer of the heat-conducting column 41. An electric heating wire is arranged in the heating chamber 51, and the electric heating wire is heated by power, and the heat of the electric heating wire is transferred to the heat-conducting chamber 52. The inside of the heat-conducting chamber 52 is made of a heat-conducting metal material, and heat-insulating materials are arranged outside the heating chamber 51 and the heat-conducting chamber 52. The heating chamber 51 is arranged inside the circular vacuum reaction tank 1, which can effectively reduce the occurrence of dangerous situations such as explosions, and has a higher safety factor. The heat-conducting column 41 transfers heat to the generating platform 43, and the generating platform 43 transfers heat to the deposition composite sheet 44, thereby increasing the temperature on the deposition composite sheet 44, making it easier to produce crystals, thereby improving the efficiency of crystal growth.

[0035] Furthermore, the shock-absorbing support leg 6 includes a shock-absorbing connecting member 61, a shock-absorbing spring 62 is provided at the lower end of the shock-absorbing connecting member 61, and a second shock-absorbing connecting member 63 is provided at the lower end of the shock-absorbing spring 62. The structure of the second shock-absorbing connecting member 63 is the same as that of the shock-absorbing connecting member 61, and a supporting connecting column 64 is provided at the lower end of the No. 2 shock-absorbing connecting member 63. A second supporting foot 65 is provided at the lower end of the supporting connecting column 64. The structure of the No. 2 supporting foot 65 is the same as that of the supporting foot 33. The supporting connecting columns 64 are fixedly connected to each other with reinforcing ribs 66. The function of the shock-absorbing support leg 6 is not only to cooperate with the support frame 3 to support the circular vacuum reactor 1 to ensure that the support is firm and stable, but also to set the shock-absorbing spring 62 and the shock-absorbing connecting member 61 to achieve a good shock-absorbing effect of the entire equipment, thereby improving the overall sealing performance. The principle is simple and the practicability is strong.

[0036] Furthermore, the supporting foot 33 includes an anti-slip circular pad 331, and a circular groove is provided at the center of the upper end of the anti-slip circular pad 331. A circular fixing ball 332 is placed in the circular groove. The upper end of the circular fixing ball 332 is fixedly connected to the supporting thin rod 333, and the upper end of the supporting thin rod 333 is fixedly connected to the rectangular frame 32. The setting of the anti-slip circular pad 331 can effectively ensure the stable placement of the circular vacuum reaction tank 1, and the circular fixing ball 332 is used to achieve the connection with the anti-slip circular pad 331, which has strong flexibility. Some placement platforms with a little curvature can adjust the angle of the anti-slip circular pad 331 to achieve high adaptability, and the sealing effect will be better after stable placement.

[0037] Working process: firstly, the height of the deposition composite sheet 44 is adjusted and placed in contact with the generating platform 43. When the height of the deposition composite sheet 44 is adjusted, the fixing rod 48 is extended into the adjusting hole 47 at different heights for height adjustment. Then, the heating mechanism 5 starts to work, and heat is generated in the heating chamber 51. The heat is transferred to the heat-conducting chamber 52. The heat in the heat-conducting chamber 52 is transferred to the heat-conducting column 41 and then to the generating platform 43, so that the temperature on the deposition composite sheet 44 increases. Then, the air inlet pipe 2 starts to ventilate, and the crystal grows on the deposition composite sheet 44 through the chemical vapor deposition reaction.

[0038] Secondly, the whole device is provided with a support frame 3, a support column 31, a rectangular frame 32 and a support foot 33 to cooperate with the shock-absorbing steel support leg 6 to ensure the stability of the overall placement and a good shock-absorbing effect. In addition, the setting of the support foot 33 and the second support foot 65 can adapt to different inclination angles of the installation platform, with a wide range of adaptability and high flexibility.

[0039] It is worth noting that the circular vacuum reactor 1 is a sandwich arrangement, in which condensation tubes are distributed, so that the gas will not react with the inner wall of the circular vacuum reactor 1, thereby reducing unnecessary waste of raw materials, and the sealing effect of the entire structure is good. Before the entire structure starts to ventilate, the inside of the circular vacuum reactor 1 is first evacuated, and the vacuum equipment 7 is used for extraction. The structure has good sealing performance and simple principle. It is suitable for deposition composite sheets 44 of different specifications, has fast reaction efficiency, and has good structural shock absorption effect.

[0040] In the description of the present invention, it should be understood that the terms "front and back", "left and right", etc. indicate directions or positional relationships based on the directions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the equipment or components referred to must have a specific direction, be constructed and operated in a specific direction, and therefore should not be understood as a limitation on the utility model.

[0041] Of course, in the present technical solution, those skilled in the art should understand that the term "one" should be understood as "at least one" or "one or more", that is, in one embodiment, the number of an element may be one, while in another embodiment, the number of the element may be multiple, and the term "one" should not be understood as a limitation on the quantity.

[0042] The above is only a preferred specific implementation of the utility model, but the protection scope of the utility model is not limited thereto. Any changes or substitutions that can be easily thought of by a person skilled in the art under the technical guidance of the utility model should be included in the protection scope of the utility model. Therefore, the protection scope of the utility model should be based on the protection scope of the claims.

Claims

1. A CVD diamond chemical vapor deposition mechanism, characterized in that: include A circular vacuum reaction tank (1), wherein an air inlet pipe (2) is provided at the rear end of the circular vacuum reaction tank (1), and the lower end of the circular vacuum reaction tank (1) is fixedly connected to a support frame (3), the lower ends of the front and rear sides of the support frame (3) are evenly fixedly connected to support columns (31), the lower ends of the support columns (31) are fixedly connected to a rectangular frame (32), and the lower ends of the front and rear sides of the rectangular frame (32) are evenly provided with support feet (33); A circular vacuum reaction tank (1), wherein the circular vacuum reaction tank (1) is a sandwich structure, and movable sealing holes (11) are evenly opened on the side of the circular vacuum reaction tank (1), a deposition platform (4) is provided at the center position inside the circular vacuum reaction tank (1), a heating mechanism (5) is provided at the lower end of the deposition platform (4), the heating mechanism (5) is arranged at the middle of the lower end of the circular vacuum reaction tank (1), and three identical shock-absorbing support legs (6) are evenly provided at the lower end of the circular vacuum reaction tank (1), and a vacuum pumping device (7) is provided on the right side of the heating mechanism (5), and the upper end of the vacuum pumping device (7) is fixedly connected to the circular vacuum reaction tank (1).

2. A CVD diamond chemical vapor deposition mechanism according to claim 1, characterized in that: The deposition platform (4) comprises a heat-conducting column (41), the lower end of which is provided with a heat-insulating pad (42), and the upper end of which is fixedly connected to a generating platform (43), the lower end of which is fixedly connected to a circular vacuum reaction tank (1), and the upper end of which is provided with a deposition composite sheet (44), the side of which is fixedly connected to a connecting rod (45), the other end of which is fixedly connected to an adjusting fixing rod (46), the lower end of which is evenly provided with adjusting holes (47), the inside of which is connected to a fixing rod (48), and the fixing rod (48) passes through the adjusting hole (47) and is fixedly connected to the generating platform (43).

3. A CVD diamond chemical vapor deposition mechanism according to claim 1, characterized in that: One of the movable sealing holes (11) is sealed to the air intake pipe (2), and the outer sides of the other movable sealing holes (11) are all sealed to the sealing covers (111), and the outer sides of the sealing covers (111) are evenly provided with threaded connecting rods (112).

4. A CVD diamond chemical vapor deposition mechanism according to claim 1, characterized in that: The upper end of the circular vacuum reaction tank (1) is sealedly connected to the upper end cover (12), the outer edge of the upper end cover (12) is evenly provided with C-shaped sealing blocks (13), the upper end of the C-shaped sealing block (13) is provided with a threaded hole, the threaded hole is threadedly connected to a fastening screw (14), and a sealing rubber pad is provided at the contact position between the lower end surface of the upper end cover (12) and the circular vacuum reaction tank (1).

5. The CVD diamond chemical vapor deposition mechanism according to claim 1, characterized in that: The heating mechanism (5) comprises a heating chamber (51), wherein the upper end of the heating chamber (51) is fixedly connected to a heat-conducting chamber (52), and the upper end of the heat-conducting chamber (52) is fixedly connected to a heat-conducting column (41), wherein the heat-conducting column (41) is a double-layer structure, and heat-insulating cotton is arranged in an outer interlayer of the heat-conducting column (41).

6. The CVD diamond chemical vapor deposition mechanism according to claim 1, characterized in that: The shock-absorbing support leg (6) comprises a shock-absorbing connection component (61), a shock-absorbing spring (62) is provided at the lower end of the shock-absorbing connection component (61), a second shock-absorbing connection component (63) is provided at the lower end of the shock-absorbing spring (62), the structure of the second shock-absorbing connection component (63) is the same as the structure of the shock-absorbing connection component (61), and a supporting connection column (64) is provided at the lower end of the second shock-absorbing connection component (63), a second supporting foot (65) is provided at the lower end of the supporting connection column (64), the structure of the second supporting foot (65) is the same as the structure of the supporting foot (33), and the supporting connection columns (64) are fixedly connected to each other by reinforcing ribs (66).

7. The CVD diamond chemical vapor deposition mechanism according to claim 1, characterized in that: The support foot (33) comprises an anti-skid circular pad (331), a circular groove opening is provided at the center position of the upper end of the anti-skid circular pad (331), a circular fixing ball (332) is placed in the circular groove opening, the upper end of the circular fixing ball (332) is fixedly connected to the supporting thin rod (333), and the upper end of the supporting thin rod (333) is fixedly connected to the rectangular frame (32).

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