Silicon wafer rotating and lifting mechanism for multilayer metal wet etching

By designing a multi-layer metal wet corrosion silicon wafer rotary lifting mechanism, the silicon wafer is automatically operated to corrode and clean between the reagent tank and the cleaning tank, and the product inconsistency and operator safety caused by manual operation in the prior art is solved. Problem, improving corrosion efficiency and product quality.

CN222226653UActive Publication Date: 2024-12-24FUJIAN ANTE MICROELECTRONICS CO LTD
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Patent Information

Application Number
CN202420595634.5
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-03-26
Publication Date
2024-12-24
Estimated Expiration
2034-03-26

AI Technical Summary

Technical Problem

When existing multi-layer metal wet corrosion cleaning machines are manually operated, product consistency is difficult to ensure, and operators need to get close contact with chemical reagents, which can easily cause harm to the body.

Method used

A multi-layer metal wet corrosion rotary lifting mechanism is designed, including a workbench, support legs, slide rails, toothed plates, sliding sleeves, motors and electric telescopic rods, which are automated through mechanical transmission and rotational movement. Corrosion and cleaning of the silicon wafer between the reagent tank and the cleaning tank to avoid manual contact with chemical reagents.

Benefits of technology

It achieves stability and consistency in product quality, improves corrosion and cleaning efficiency, and protects the health of the operator.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model relates to the technical field of metal wet etching, in particular to a silicon wafer rotating and lifting mechanism for multilayer metal wet etching, which comprises a workbench and supporting legs, the bottom of the workbench is fixedly connected with the supporting legs, the workbench is fixedly connected with a reagent tank and a cleaning tank through rectangular grooves, and the rear side of the top of the workbench is fixedly connected with a supporting plate. The top of the supporting plate is fixedly connected with a sliding rail, the left side and the right side of the sliding rail are fixedly connected with anti-falling plates, the tops of the anti-falling plates are fixedly connected with dustproof plates, the inner side of the sliding rail is fixedly connected with a clamping tooth plate, the outer side of the sliding rail is slidably connected with a sliding sleeve plate, and the top of the sliding sleeve plate is fixedly connected with a first motor. The metal sheets in the sheet frame can be driven into the reagent tank and the cleaning tank to be subjected to corrosion processing and cleaning, the processing efficiency is improved by rotating the sheet frame, the consistency of products is guaranteed, an operator can be prevented from being in close contact with a chemical reagent, and the body health of the operator is guaranteed.
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Description

Technical Field

[0001] The utility model relates to the technical field of metal wet etching, in particular to a silicon slice rotating and pulling mechanism for multi-layer metal wet etching. Background Art

[0002] Wet etching of metals utilizes the activity of metals, that is, the tendency of metal elements to lose electrons in aqueous solution to generate metal cations. The commonly used metal activities in MEMS are as follows: potassium, sodium, magnesium, aluminum, titanium, zinc, chromium, nickel, copper, silver, platinum, and gold. This can be understood as the more active metal is, the easier it is to react chemically under the action of the same oxidant. For example, when chromium and gold are immersed in a hydrochloric acid solution, chromium can react with hydrochloric acid while gold does not.

[0003] An etching cleaning machine is a device used to corrode or clean metals, on which a cleaning tank and a reagent tank are arranged. When using the etching cleaning machine to corrode or clean metals, it is necessary to place the silicon wafer in a wafer basket, and then place the wafer frame in the cleaning tank or the reagent tank, and operate by manually shaking and pulling the wafer basket. Some existing multi-layer metal wet etching etching cleaning machines do not have a rotating lifting mechanism, and the consistency of the product is difficult to ensure during manual operation, resulting in unstable product quality. During operation, the operator needs to be in close contact with chemical reagents, which can easily cause harm to the operator's body. Therefore, in view of the above problems, a multi-layer metal wet etching silicon wafer rotating lifting mechanism is proposed. Utility Model Content

[0004] The purpose of the utility model is to provide a rotating and pulling mechanism for silicon wafers for multi-layer metal wet etching, so as to solve the problem that the consistency of the product is difficult to ensure when the multi-layer metal wet etching corrosion cleaning machine is manually operated, resulting in unstable product quality, and the operator needs to be in close contact with chemical reagents during operation, which is easy to cause harm to the operator's body.

[0005] In order to achieve the above purpose, the utility model provides the following technical solutions:

[0006] A multi-layer metal wet etching silicon wafer rotating and pulling mechanism comprises a workbench and supporting legs, the bottom of the workbench is fixedly connected to the supporting legs, the workbench is fixedly connected to a reagent tank and a cleaning tank through a rectangular groove, the top rear side of the workbench is fixedly connected to a supporting plate, the top of the supporting plate is fixedly connected to a slide rail, the left and right sides of the slide rail are fixedly connected to anti-slip plates, the top of the anti-slip plates are fixedly connected to dustproof plates, the inner side of the slide rail is fixedly connected to a toothed plate, the outer side of the slide rail is slidably connected to a sliding sleeve plate, the top of the sliding sleeve plate is fixedly connected to a first motor, the inner side of the sliding sleeve plate is fixedly connected to a limit plate, the limit plate is rotatably connected to a first rotating shaft, the outer side of the first rotating shaft is fixedly connected to a card gear, The front end of the first rotating shaft is meshed with the transmission belt, the first motor main shaft is meshed with the transmission belt, the front side of the first motor housing is fixedly connected to the protective shell, the front side of the sliding sleeve is fixedly connected to the connecting plate, the front side of the connecting plate is fixedly connected to the first electric telescopic rod, the front end of the first electric telescopic rod is fixedly connected to the adjusting block, the top of the adjusting block is fixedly connected to the connecting block, the top of the connecting block is fixedly connected to the second motor, the second motor main shaft is fixedly connected to the second rotating shaft, the bottom end of the second rotating shaft is fixedly connected to the second electric telescopic rod, the bottom end of the second electric telescopic rod is fixedly connected to the welding frame, reinforcement plates are welded on the front and rear sides of the welding frame, and sheet frames are welded on the inner sides of the welding frame and the reinforcement plate.

[0007] Preferably, the workbench is a horizontally distributed rectangular plate, the supporting legs are vertically distributed rectangular axes, the reagent tank and the cleaning tank are rectangular shells, and the supporting plate is a vertically distributed rectangular plate.

[0008] Preferably, the slide rail is a long "U"-shaped rail horizontally distributed in the left and right directions, the anti-slip plate is a vertically distributed metal plate, the dustproof plate is a horizontally distributed metal plate, the tooth plate is a rectangular plate with teeth on the top, and the sliding sleeve is a "C"-shaped sleeve.

[0009] Preferably, the first motor main shaft is horizontally facing forward, the limit plate is a vertically distributed metal plate, the first rotating shaft is a circular shaft horizontally distributed in the front-to-back direction, and the outer side of the locking gear is provided with locking teeth.

[0010] Preferably, the connecting plate is a vertically distributed rectangular plate, the first electric telescopic rod is horizontally distributed in the front-to-back direction, the adjusting block is a rectangular metal block provided with a circular rotating groove, the inner side of the adjusting block is rotatably connected to the second rotating shaft, and the connecting blocks are all rectangular blocks.

[0011] Preferably, the second motor main shaft is vertically downward, the second rotating shaft is a vertically distributed circular shaft, the second electric telescopic rod is vertically distributed, the welding frame is a rectangular metal frame, and the reinforcement plates are all "U"-shaped bent plates.

[0012] Compared with the prior art, the beneficial effects of the utility model are:

[0013] In the utility model, through the arranged tooth plate, sliding sleeve plate, locking gear, first electric telescopic rod and second electric telescopic rod, the first motor can drive the first rotating shaft and the locking gear to rotate, and the locking action of the locking gear and the tooth plate can drive the sliding sleeve plate to move, that is, drive the film frame to move right, the position of the film frame in the front and rear directions can be adjusted by the first electric telescopic rod, and the position of the film frame in the up and down directions can be adjusted by the second electric telescopic rod, that is, the film frame can be placed in the reagent tank or the cleaning tank respectively, the second motor drives the second rotating shaft and the second electric telescopic rod to rotate, and then drives the film frame to rotate through the welding frame, which can accelerate the corrosion speed and improve the work efficiency. The device can drive the metal sheet in the film frame to the reagent tank and the cleaning tank for corrosion processing and cleaning, and improve the processing efficiency by rotating the film frame, unify the processing time by mechanical operation, so that the consistency of the product is guaranteed, the product quality is guaranteed, and the operator can be prevented from close contact with chemical reagents, thereby ensuring the health of the operator. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0015] Figure 2 It is an exploded view of the overall structure of the utility model;

[0016] Figure 3 This is a schematic diagram of the installation structure of the clamping plate of the utility model;

[0017] Figure 4 This is a schematic diagram of the installation structure of the card gear of the utility model;

[0018] Figure 5 This is a schematic diagram of the sheet frame installation structure of the utility model;

[0019] Figure 6 This is a cross-sectional view of the transmission belt structure of the utility model;

[0020] Figure 7 This is a schematic diagram of the structure of the limit plate of the utility model;

[0021] Figure 8 This is a schematic diagram of the first rotating shaft structure of the utility model;

[0022] Fig. 9 This is a schematic diagram of the structure of the card gear of the utility model;

[0023] Fig.10 For this utility model Figure 3 Schematic diagram of the structure at point A.

[0024] In the figure: 1. workbench; 2. supporting legs; 3. reagent tank; 4. cleaning tank; 5. supporting plate; 6. slide rail; 7. anti-slip plate; 8. dustproof plate; 9. latch plate; 10. sliding sleeve; 11. first motor; 12. limit plate; 13. first rotating shaft; 14. latch gear; 15. transmission belt; 16. protective shell; 17. connecting plate; 18. first electric telescopic rod; 19. adjusting block; 20. connecting block; 21. second motor; 22. second rotating shaft; 23. second electric telescopic rod; 24. welding frame; 25. reinforcement plate; 26. sheet frame. DETAILED DESCRIPTION

[0025] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0026] See also Figure 1-10 , the utility model provides a technical solution:

[0027] A multi-layer metal wet etching silicon wafer rotating and pulling mechanism comprises a workbench 1 and a supporting leg 2, wherein the bottom of the workbench 1 is fixedly connected to the supporting leg 2, the workbench 1 is fixedly connected to a reagent tank 3 and a cleaning tank 4 through a rectangular groove, the top rear side of the workbench 1 is fixedly connected to a supporting plate 5, the top of the supporting plate 5 is fixedly connected to a slide rail 6, both left and right sides of the slide rail 6 are fixedly connected to an anti-slip plate 7, the top of the anti-slip plate 7 is fixedly connected to a dustproof plate 8, the inner side of the slide rail 6 is fixedly connected to a toothed plate 9, the outer side of the slide rail 6 is slidably connected to a sliding sleeve plate 10, the top of the sliding sleeve plate 10 is fixedly connected to a first motor 11, the inner side of the sliding sleeve plate 10 is fixedly connected to a limiting plate 12, the limiting plate 12 is rotatably connected to a first rotating shaft 13, the outer side of the first rotating shaft 13 is fixedly connected to a card gear 14, the front end of the first rotating shaft 13 The first motor 11 is meshed with the transmission belt 15, the main shaft of the first motor 11 is meshed with the transmission belt 15, the front side of the housing of the first motor 11 is fixedly connected to the protective shell 16, the front side of the sliding sleeve 10 is fixedly connected to the connecting plate 17, the front side of the connecting plate 17 is fixedly connected to the first electric telescopic rod 18, the front end of the first electric telescopic rod 18 is fixedly connected to the adjusting block 19, the top of the adjusting block 19 is fixedly connected to the connecting block 20, the top of the connecting block 20 is fixedly connected to the second motor 21, the main shaft of the second motor 21 is fixedly connected to the second rotating shaft 22, the bottom end of the second rotating shaft 22 is fixedly connected to the second electric telescopic rod 23, the bottom end of the second electric telescopic rod 23 is fixedly connected to the welding frame 24, the front and rear sides of the welding frame 24 are welded with reinforcement plates 25, and the inner sides of the welding frame 24 and the reinforcement plate 25 are welded with sheet frames 26.

[0028] The workbench 1 is a horizontally distributed rectangular plate, the supporting legs 2 are both vertically distributed rectangular shafts, the reagent tank 3 and the cleaning tank 4 are both rectangular shells, the supporting plate 5 is a vertically distributed rectangular plate, which can support the slide rail 6; the slide rail 6 is a "U"-shaped long track horizontally distributed in the left and right directions, the anti-slip plate 7 is a vertically distributed metal plate, the dustproof plate 8 is a horizontally distributed metal plate, the latch plate 9 is a rectangular plate with latches on the top, and the sliding sleeve 10 is a "C"-shaped sleeve, which can drive the film frame 26 to slide left and right; the main shaft of the first motor 11 moves horizontally forward, the limit plate 12 is a vertically distributed metal plate, and the first rotating shaft 13 is horizontal in the front and rear directions. The first electric telescopic rod 18 is horizontally distributed in the front and rear directions, and the adjusting block 19 is a rectangular metal block with a circular rotating groove. The inner side of the adjusting block 19 is rotated to connect the second rotating shaft 22, and the connecting blocks 20 are all rectangular blocks; the main shaft of the second motor 21 is vertically downward, the second rotating shaft 22 is a vertically distributed circular shaft, the second electric telescopic rod 23 is vertically distributed, the welding frame 24 is a rectangular metal frame, and the reinforcing plates 25 are all "U"-shaped bent plates, which can make the sheet frame 26 more firmly connected to the welding frame 24.

[0029] Workflow: Turn on the power before use, the staff stands on the left side of the workbench 1, puts the metal sheet to be processed into the sheet frame 26, and starts the first motor 11. The first motor 11 drives the first rotating shaft 13 to rotate through the transmission belt 15, and then drives the card gear 14 to rotate. The card gear 14 and the card tooth plate 9 can drive the sliding sleeve 10 to move, so that the sliding sleeve 10 slides left and right on the outside of the slide rail 6, and the sheet frame 26 can be driven to move right. When the sheet frame 26 moves to the right side of the reagent tank 3, the position of the sheet frame 26 in the front and rear directions is adjusted by the first electric telescopic rod 18, and the position of the sheet frame 26 in the up and down directions is adjusted by the second electric telescopic rod 23, so that the sheet frame 26 can be placed in the reagent tank 3. There is a corrosive reagent in the reagent tank 3. To perform corrosion processing on the metal sheet, start the second motor 21, the second motor 21 drives the second electric telescopic rod 23 to rotate through the second rotating shaft 22, and then drives the sheet frame 26 to rotate through the welding frame 24, which can accelerate the corrosion speed and improve work efficiency. After the corrosion is completed, repeat the above operation method. There is a cleaning liquid in the cleaning tank 4, which can clean the metal sheet after the corrosion processing. The device can drive the metal sheet in the sheet frame 26 to the reagent tank 3 and the cleaning tank 4 for corrosion processing and cleaning, and improve the processing efficiency by rotating the sheet frame 26. The processing time is unified through mechanical operation, so that the consistency of the product is guaranteed, the product quality is guaranteed, and the operator can be prevented from close contact with chemical reagents, thereby ensuring the health of the operator.

[0030] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A silicon wafer rotating and lifting mechanism for multi-layer metal wet etching, comprising a workbench (1) and supporting legs (2), characterized in that: The bottom of the workbench (1) is fixedly connected to the support leg (2); the workbench (1) is fixedly connected to the reagent tank (3) and the cleaning tank (4) through a rectangular groove; the top rear side of the workbench (1) is fixedly connected to the support plate (5); the top of the support plate (5) is fixedly connected to the slide rail (6); the left and right sides of the slide rail (6) are fixedly connected to the anti-slip plate (7); the top of the anti-slip plate (7) is fixedly connected to the dustproof plate (8); the inner side of the slide rail (6) is fixedly connected to the latch plate (9); the outer side of the slide rail (6) is slidably connected to the sliding sleeve plate (10); the top of the sliding sleeve plate (10) is fixedly connected to the first motor (11); the inner side of the sliding sleeve plate (10) is fixedly connected to the limit plate (12); the limit plate (12) is rotatably connected to the first rotating shaft (13); the outer side of the first rotating shaft (13) is fixedly connected to the latch gear (14); the front end of the first rotating shaft (13) is meshed with the transmission belt (15); the first The main shaft of the motor (11) is meshed with the transmission belt (15); the front side of the housing of the first motor (11) is fixedly connected to the protective shell (16); the front side of the sliding sleeve (10) is fixedly connected to the connecting plate (17); the front side of the connecting plate (17) is fixedly connected to the first electric telescopic rod (18); the front end of the first electric telescopic rod (18) is fixedly connected to the adjusting block (19); the top of the adjusting block (19) is fixedly connected to the connecting block (20); the top of the connecting block (20) is fixedly connected to the second motor (21); the main shaft of the second motor (21) is fixedly connected to the second rotating shaft (22); the bottom end of the second rotating shaft (22) is fixedly connected to the second electric telescopic rod (23); the bottom end of the second electric telescopic rod (23) is fixedly connected to the welding frame (24); the front and rear sides of the welding frame (24) are both welded with reinforcing plates (25); the inner sides of the welding frame (24) and the reinforcing plate (25) are both welded with sheet frames (26).

2. The silicon wafer rotating and pulling mechanism for multi-layer metal wet etching according to claim 1, characterized in that: The workbench (1) is a horizontally distributed rectangular plate, the support legs (2) are both vertically distributed rectangular axes, the reagent tank (3) and the cleaning tank (4) are both rectangular shells, and the support plate (5) is a vertically distributed rectangular plate.

3. The silicon wafer rotating and pulling mechanism for multi-layer metal wet etching according to claim 1, characterized in that: The slide rail (6) is a long "U"-shaped rail horizontally distributed in the left and right directions, the anti-slip plate (7) is a vertically distributed metal plate, the dustproof plate (8) is a horizontally distributed metal plate, the latch plate (9) is a rectangular plate with latch teeth on the top, and the sliding sleeve plate (10) is a "C"-shaped sleeve plate.

4. The silicon wafer rotating and pulling mechanism for multi-layer metal wet etching according to claim 1, characterized in that: The main shaft of the first motor (11) is horizontally facing forward, the limit plate (12) is a vertically distributed metal plate, the first rotating shaft (13) is a circular shaft horizontally distributed in the front-to-back direction, and the outer side of the locking gear (14) is provided with locking teeth.

5. The silicon wafer rotating and pulling mechanism for multi-layer metal wet etching according to claim 1, characterized in that: The connecting plate (17) is a vertically distributed rectangular plate, the first electric telescopic rod (18) is horizontally distributed in the front-rear direction, the adjusting block (19) is a rectangular metal block provided with a circular rotating groove, the inner side of the adjusting block (19) is rotatably connected to the second rotating shaft (22), and the connecting blocks (20) are all rectangular blocks.

6. The silicon wafer rotating and pulling mechanism for multi-layer metal wet etching according to claim 1, characterized in that: The main shaft of the second motor (21) is vertically downward, the second rotating shaft (22) is a vertically distributed circular shaft, the second electric telescopic rod (23) is vertically distributed, the welding frame (24) is a rectangular metal frame, and the reinforcement plates (25) are all "U"-shaped bent plates.

Citation Information

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