Phosphorus source supply system and phosphorus source diffusion equipment
By designing a phosphorus source supply system, using the combination of main source and secondary source devices, the long-term stable supply and temperature uniformity of the phosphorus source diffusion equipment are achieved, and the waste and low efficiency problems in the replacement of old phosphorus source are solved, and the crystallization is improved Silicon battery performance and production line efficiency.
Patent Information
- Application Number
- CN202420581936.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-03-25
- Publication Date
- 2024-12-27
- Estimated Expiration
- 2034-03-25
AI Technical Summary
In the existing phosphorus source diffusion process, the replacement process of the old phosphorus source diffusion bottle has problems such as waste, danger and low production line efficiency, resulting in uneven supply of the phosphorus source in the phosphorus diffusion process, affecting the performance of crystalline silicon batteries.
A phosphorus source supply system is designed, including the main source device and the secondary source device. Through the source pipe and pressure regulator, the long-term supply of the phosphorus source and the temperature uniformity are achieved, the number of shutdowns and replacements are reduced, and the production line efficiency and products are improved. Yield rate.
The long-term and stable supply of phosphorus source diffusion equipment has been achieved, the production line efficiency and product yield of the phosphorus source diffusion process have been improved, and the safety risks in the replacement and processing of old secondary source devices have been reduced.
Smart Images
Figure CN222261094U_ABST
Abstract
Description
Technical Field
[0001] The present application belongs to the field of photovoltaic cell technology, and specifically relates to a phosphorus source supply system and a phosphorus source diffusion device. Background Art
[0002] In the photovoltaic industry, the improvement of processes and equipment must be based on the goal of "reducing costs and increasing efficiency". One of the core steps in preparing crystalline silicon cells is the phosphorus diffusion process, which will affect the quality of the PN junction and thus the performance of crystalline silicon cells.
[0003] The prior art connects a phosphorus source diffusion bottle with a phosphorus source furnace tube of a phosphorus diffusion process, and the phosphorus source in the phosphorus source diffusion bottle is introduced to the phosphorus source furnace tube by carrier gas to carry out the phosphorus diffusion process. When the phosphorus source in the phosphorus source diffusion bottle is about to be exhausted, the old phosphorus source diffusion bottle needs to be replaced to ensure the normal progress of the phosphorus diffusion process. However, there are problems including: (1) when replacing the old phosphorus source diffusion bottle, there is still a small amount of residual phosphorus source in the old phosphorus source diffusion bottle, which not only causes waste of phosphorus source, but also there are certain dangers in the replacement, transportation and treatment of the old phosphorus source diffusion bottle; (2) every time a period of time, it is necessary to stop production and replace the old phosphorus source diffusion bottle, and it is necessary to wait until the phosphorus source temperature in the phosphorus source diffusion bottle reaches the specified process temperature range before starting production, which seriously affects the production line efficiency and product yield; (3) as the phosphorus diffusion process continues, the phosphorus source in the phosphorus source diffusion bottle gradually decreases, and the amount of phosphorus source entrained by the carrier gas gradually decreases, resulting in different phosphorus source supply amounts in different phosphorus diffusion process batches, and then resulting in poor uniformity of square resistance of crystalline silicon solar cells. Utility Model Content
[0004] The present application aims to solve one of the technical problems in the related art at least to some extent.
[0005] In the first aspect of the present application, the present application proposes a phosphorus source supply system, including a main source device, the main source device including a phosphorus source inlet, a carrier gas inlet, and a first phosphorus source outlet, the phosphorus source is discharged from the first phosphorus source outlet; a secondary source device, the secondary source device including a second phosphorus source outlet, the second phosphorus source outlet is connected to the phosphorus source inlet through a source introduction pipeline, and a driving member is provided on the source introduction pipeline. Therefore, the phosphorus source supply system of the present application can not only realize the phosphorus source supply to the phosphorus source diffusion equipment, but also can realize the long-term phosphorus source supply to the phosphorus source diffusion equipment by introducing the phosphorus source in the secondary source device to the main source device without stopping production to replace the main source device, thereby improving the phosphorus source diffusion process with better production line efficiency and stability, and the product yield obtained through the phosphorus source diffusion process is better.
[0006] According to some embodiments of the present application, the main source device further comprises a carrier gas inlet pipe, and the carrier gas inlet pipe extends through the carrier gas inlet to below the liquid level of the main source device. Thus, the carrier gas enters the main source device through the carrier gas inlet pipe, which is conducive to full contact between the carrier gas and the phosphorus source of the main source device. As the pressure in the main source device gradually increases, the carrier gas entrains the phosphorus source and is output to the phosphorus source diffusion device through the first phosphorus source outlet.
[0007] According to some embodiments of the present application, the main source device further includes a first phosphorus source outlet pipe, which extends through the first phosphorus source outlet to above the liquid level of the main source device, thereby facilitating the carrier gas to carry the phosphorus source through the first phosphorus source outlet pipe and output it to the phosphorus source diffusion device.
[0008] According to some embodiments of the present application, the main source device further includes a first pressure-stabilizing valve, the secondary source device further includes a second pressure-stabilizing valve, and the first pressure-stabilizing valve and the second pressure-stabilizing valve are connected via a pressure-stabilizing pipeline. Thus, the first pressure-stabilizing valve and the second pressure-stabilizing valve are used to regulate the pressure of the main source device and the pressure of the secondary source device to be close to or the same, which is conducive to introducing the phosphorus source in the secondary source device into the main source device through the driving member.
[0009] According to some embodiments of the present application, the main source device is located in the first constant temperature box. Therefore, placing the main source device in the first constant temperature box is conducive to controlling the temperatures of different batches of phosphorus sources introduced from the main source device to the phosphorus source diffusion device to be close or the same, which is conducive to improving the uniformity of phosphorus source diffusion.
[0010] According to some embodiments of the present application, the secondary source device is located in the second constant temperature box. This is conducive to ensuring that the phosphorus source diffusion process has better production line efficiency and stability, and the product yield obtained through the phosphorus source diffusion process is better.
[0011] According to some embodiments of the present application, a first pneumatic valve is provided on the source introduction pipeline, so that when it is not necessary to introduce the phosphorus source of the secondary source device to the primary source device, it is helpful to reduce the conduction of the phosphorus source or other gas in the secondary source device to the primary source device, and the conduction of the phosphorus source or other gas in the primary source device to the secondary source device.
[0012] According to some embodiments of the present application, a second pneumatic valve is provided on the pressure stabilizing pipeline, thereby helping to reduce the conduction of the phosphorus source or other gas in the secondary source device to the primary source device, and vice versa, when the pressure stabilizing operation is not required.
[0013] According to some embodiments of the present application, the bottom of the secondary source device is convex downward, thereby significantly improving the utilization rate of the phosphorus source in the secondary source device and reducing the probability of safety problems occurring during replacement, transportation and disposal of the old secondary source device.
[0014] According to some embodiments of the present application, a driving pump is provided on the source pipeline, and the driving pump includes a pneumatic diaphragm pump. Thus, the phosphorus source of the secondary source device can be pumped along the source pipeline to the primary source device by the driving pump, and the operation is simple and easy.
[0015] According to some embodiments of the present application, the phosphorus source supply system further includes: a weighing device, the weighing device being located at the bottom of the main source device. This is conducive to ensuring that the phosphorus source diffusion process has better production line efficiency and stability, and the product yield obtained through the phosphorus source diffusion process is better.
[0016] According to some embodiments of the present application, the phosphorus source supply system further includes: a control device, the control device being electrically connected to the driving member and the weighing device, respectively. Thus, the control device can adjust the driving member according to the mass electrical signal of the weighing device to control the single phosphorus source amount introduced from the secondary source device to the primary source device, thereby facilitating the control of the mass of the primary source device to remain constant.
[0017] In a second aspect of the present application, the present application provides a phosphorus source diffusion device, wherein the phosphorus source of the phosphorus source diffusion device is provided by the aforementioned phosphorus source supply system. Thus, the phosphorus source supplied by the aforementioned phosphorus source supply system has a temperature close to or the same, and a single supply amount close to or the same, and the product obtained by diffusion using the phosphorus source diffusion device has good uniformity. BRIEF DESCRIPTION OF THE DRAWINGS
[0018] The above and / or additional aspects and advantages of the present application will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which:
[0019] Figure 1 It is a schematic diagram of the phosphorus source supply system of some embodiments of the present application.
[0020] Reference numerals:
[0021] 100-main source device; 110-phosphorus source inlet; 120-carrier gas inlet; 130-first phosphorus source outlet; 140-first pressure-stabilizing valve; 200-auxiliary source device; 210-second phosphorus source outlet; 220-second pressure-stabilizing valve; 300-source guide pipe; 310-driving element; 320-first pneumatic valve; 400-pressure-stabilizing pipe; 410-second pneumatic valve; 500-first constant temperature box; 600-second constant temperature box; 700-weighing device; 800-bracket. DETAILED DESCRIPTION
[0022] Embodiments of the present application are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended to be used to explain the present application, and should not be construed as limiting the present application.
[0023] In the description of this application, it should be understood that the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features.
[0024] In this application, unless otherwise clearly specified and limited, the terms such as "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection. It can be a mechanical connection or an electrical connection. It can be directly connected or indirectly connected through an intermediate medium. It can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to the specific circumstances.
[0025] In the first aspect of the present application, the present application proposes a phosphorus source supply system, referring to Figure 1 , including a main source device 100, the main source device 100 includes a phosphorus source inlet 110, a carrier gas inlet 120, and a first phosphorus source outlet 130, and the phosphorus source is discharged from the first phosphorus source outlet 130; an auxiliary source device 200, the auxiliary source device 200 has a second phosphorus source outlet 210, and the second phosphorus source outlet 210 is connected to the phosphorus source inlet 110 through a source introduction pipeline 300, and a driving member 310 is provided on the source introduction pipeline 300. Therefore, the phosphorus source supply system of the present application can not only realize the phosphorus source supply to the phosphorus source diffusion equipment, but also can realize the long-term phosphorus source supply to the phosphorus source diffusion equipment by introducing the phosphorus source in the auxiliary source device 200 to the main source device 100 without stopping production to replace the main source device 100, thereby improving the phosphorus source diffusion process with better production line efficiency and stability, and the product yield obtained through the phosphorus source diffusion process is better.
[0026] The following is a brief description of the principle by which the phosphorus source supply system can achieve technical effects:
[0027] When it is necessary to supply phosphorus source to the phosphorus source diffusion device, the carrier gas will enter the main source device 100 through the carrier gas inlet 120, and the pressure in the main source device 100 will gradually increase. Under the action of the pressure difference, the carrier gas will carry the phosphorus source and be discharged to the phosphorus source diffusion device through the first phosphorus source outlet 130, so as to realize the phosphorus source supply system to the phosphorus source diffusion device. When it is necessary to introduce phosphorus source to the main source device 100, the driving member 310 on the source introduction pipeline 300 is started. Under the driving action of the driving member 310, the phosphorus source of the auxiliary source device 200 will be introduced to the main source device 100 through the source introduction pipeline 300, so as to realize the phosphorus source supplement of the auxiliary source device 200 to the main source device 100. By adjusting the power parameters of the driving component 310 to control the amount of phosphorus source introduced to the main source device 100 by the auxiliary source device 200, it is beneficial to control the amount of phosphorus source in the main source device 100 to remain constant, and further to regulate the phosphorus source supply of the main source device 100 to the phosphorus source diffusion equipment, so that the main source device 100 can output the phosphorus source more stably for a long time, so that the phosphorus source diffusion process has better production line efficiency and stability, and the product yield obtained through the phosphorus source diffusion process is better.
[0028] Furthermore, the carrier gas enters the main source device 100 through the carrier gas inlet 120, and the carrier gas entrains the phosphorus source and is discharged to the phosphorus source diffusion equipment through the first phosphorus source outlet 130. Therefore, by controlling the amount of phosphorus source in the main source device 100 to remain constant, it is beneficial to keep the carrier gas amount in the main source device 100 constant. In the process of the carrier gas entraining the phosphorus source and being discharged to the phosphorus source diffusion equipment through the first phosphorus source outlet 130, it is beneficial to regulate the main source device 100 to keep the supply of different batches of phosphorus source to the phosphorus source diffusion equipment constant, so that the phosphorus source diffusion process has better production line efficiency and stability, and the product yield obtained through the phosphorus source diffusion process is better.
[0029] In some embodiments, the phosphorus source diffusion equipment may be a phosphorus source diffusion furnace tube in the process of preparing a crystalline silicon cell.
[0030] In some embodiments, reference Figure 1 The main source device 100 further includes a carrier gas inlet pipe, which extends through the carrier gas inlet 120 to below the liquid level of the main source device 100. Thus, the carrier gas enters the main source device 100 through the carrier gas inlet pipe, which is conducive to full contact between the carrier gas and the phosphorus source of the main source device 100. As the pressure in the main source device 100 gradually increases, the carrier gas entrains the phosphorus source and is output to the phosphorus source diffusion device through the first phosphorus source outlet 130.
[0031] Preferably, reference Figure 1 The carrier gas inlet pipe extends through the carrier gas inlet 120 to the bottom of the main source device 100, thereby further facilitating full contact between the carrier gas and the phosphorus source of the main source device 100, and facilitating the carrier gas to carry more phosphorus source vapor and output it to the phosphorus source diffusion device through the first phosphorus source outlet 130.
[0032] In some embodiments, reference Figure 1 The main source device 100 further includes a first phosphorus source outlet pipe, which is connected to the first phosphorus source outlet 130 and extends above the liquid level of the main source device 100. This facilitates the carrier gas to carry the phosphorus source through the first phosphorus source outlet pipe and output it to the phosphorus source diffusion device.
[0033] In some embodiments, reference Figure 1 , the main source device 100 further includes a first pressure-stabilizing valve 140, and the auxiliary source device 200 further includes a second pressure-stabilizing valve 220, and the first pressure-stabilizing valve 140 and the second pressure-stabilizing valve 220 are connected via a pressure-stabilizing pipe 400. By arranging the first pressure-stabilizing valve 140 on the main source device 100, it is beneficial to regulate the pressure in the main source device 100, and by arranging the second pressure-stabilizing valve 220 on the auxiliary source device 200, it is beneficial to regulate the pressure in the auxiliary source device 200. When the first pressure-stabilizing valve 140 and the second pressure-stabilizing valve 220 are connected via the pressure-stabilizing pipe 400, the pressures in the main source device 100 and the auxiliary source device 200 are the same or similar. Therefore, by regulating the pressure of the main source device 100 and the pressure of the auxiliary source device 200 to be close to or the same, it is beneficial to introduce the phosphorus source in the auxiliary source device 200 into the main source device 100 through the driving member 310, which is beneficial to reduce the probability of pump power overload damage and save the operation of using external gas to regulate the pressure of the auxiliary source device 200.
[0034] In some embodiments, reference Figure 1 , the main source device 100 is located in the first constant temperature box 500. Placing the main source device 100 in the first constant temperature box 500 is conducive to controlling the temperatures of different batches of phosphorus sources introduced from the main source device 100 to the phosphorus source diffusion equipment to be similar or the same, which is conducive to improving the uniformity of phosphorus source diffusion.
[0035] As a specific example, setting the main source device 100 in the first constant temperature box 500 is conducive to controlling the temperatures of different batches of phosphorus sources introduced from the main source device 100 to the phosphorus source diffusion workshop in the crystalline silicon cell preparation process to be similar or the same. The phosphorus source diffusion has good uniformity, which is conducive to improving the uniformity of the PN junction of the crystalline silicon cell, thereby improving the quality of the crystalline silicon cell.
[0036] In some embodiments, reference Figure 1 , the auxiliary source device 200 is located in the second constant temperature box 600. Placing the auxiliary source device 200 in the second constant temperature box 600 is conducive to controlling the temperature of different batches of phosphorus sources introduced from the auxiliary source device 200 to the main source device 100 to be similar or the same, and is conducive to always keeping the temperature of the phosphorus source in the main source device 100 within the process temperature range of phosphorus source diffusion, reducing shutdown and cooling operations, and is conducive to ensuring that the phosphorus source diffusion process has better production line efficiency and stability, and the product yield obtained through the phosphorus source diffusion process is better.
[0037] Specifically, it is difficult to ensure that the temperature of the phosphorus source in the auxiliary source device 200 is always kept within the process temperature range during the storage process. Therefore, after the phosphorus source of the auxiliary source device 200 is introduced to the main source device 100, it is often necessary to wait for a period of time until the temperature of the phosphorus source of the main source device 100 is constant within the process temperature range before starting production, which is not conducive to the continuous production process. By setting the auxiliary source device 200 in a constant temperature box, operations such as shutdown and cooling can be omitted, which is conducive to ensuring that the phosphorus source diffusion process has better production line efficiency and stability, and the product yield obtained through the phosphorus source diffusion process is better.
[0038] In some embodiments, the temperature of the first constant temperature box 500 and the temperature of the second constant temperature box 600 are the same, and both are within the process temperature range of phosphorus source diffusion. This is further beneficial to ensure that the phosphorus source diffusion process has better production line efficiency and stability, and the product yield obtained through the phosphorus source diffusion process is better.
[0039] In some embodiments, reference Figure 1 , a first pneumatic valve 320 is provided on the source introduction pipeline 300. Therefore, when it is not necessary to introduce the phosphorus source of the auxiliary source device 200 to the main source device 100, it is helpful to reduce the phosphorus source or other gas in the auxiliary source device 200 being conducted to the main source device 100, and the phosphorus source or other gas in the main source device 100 being conducted to the auxiliary source device 200.
[0040] In some embodiments, reference Figure 1 A second pneumatic valve 410 is provided on the pressure stabilizing pipeline 400. Thus, when the pressure stabilizing operation is not required, it is helpful to reduce the phosphorus source or other gas in the auxiliary source device 200 from being conducted to the main source device 100, and the phosphorus source or other gas in the main source device 100 from being conducted to the auxiliary source device 200.
[0041] In some embodiments, reference Figure 1 , the bottom of the auxiliary source device 200 is convex downward. Therefore, it is beneficial to introduce the remaining phosphorus source at the bottom of the auxiliary source device 200 into the main source device 100, significantly improving the utilization rate of the phosphorus source in the auxiliary source device 200, and significantly reducing the remaining amount of phosphorus source that cannot be used in the auxiliary source device 200. In addition, the main component of the phosphorus source is phosphorus trichloride, and phosphorus oxychloride, as a highly toxic substance, is very easy to react in humid air. By setting the bottom of the auxiliary source device 200 to bulge downward, the remaining amount of phosphorus source in the auxiliary source device 200 is significantly reduced, which is beneficial to reduce the probability of safety problems occurring during the replacement, transportation, and treatment of the old auxiliary source device.
[0042] In some embodiments, reference Figure 1 The auxiliary source device 200 with a downwardly protruding bottom is arranged on the bracket 800, thereby increasing the stability of the auxiliary source device 200 and reducing the probability of dangerous accidents.
[0043] In some embodiments, reference Figure 1 The driving member 310 is a driving pump, and thus, the phosphorus source of the auxiliary source device 200 can be pumped along the source guide pipe 300 to the main source device 100 through the driving pump, and the operation is simple and easy.
[0044] Preferably, the drive pump comprises an air-operated diaphragm pump.
[0045] In some embodiments, reference Figure 1 The phosphorus source supply system further includes: a weighing device 700, which is located at the bottom of the main source device 100. This is conducive to ensuring that the phosphorus source diffusion process has better production line efficiency and stability, and the product yield obtained through the phosphorus source diffusion process is better.
[0046] Specifically, before the phosphorus source of the main source device 100 is supplied to the phosphorus source diffusion equipment, the mass of the main source device 100 (when no carrier gas enters the main source device 100) is weighed by the weighing device 700 as a, and after a single phosphorus source supply, the mass of the main source device 100 (when no carrier gas enters the main source device 100) is weighed by the weighing device 700 as b, that is, it is proved that the single phosphorus source supply amount is ab, and the power parameter of the driving member 310 is controlled to control the single phosphorus source amount introduced from the auxiliary source device 200 to the main source device 100 to be ab. In addition, if the mass of the main source device 100 (when no carrier gas enters the main source device 100) weighed by the weighing device 700 is greater than a at a certain time, the phosphorus source may not be introduced from the auxiliary source device 200 to the main source device 100, which is conducive to reducing the probability of phosphorus source overflow of the main source device 100. This is beneficial for controlling the quality of the main source device 100 to remain constant, and further controlling the phosphorus source supply of the main source device 100 to the phosphorus source diffusion equipment, so that the phosphorus source diffusion process has better stability and the product yield obtained through the phosphorus source diffusion process is better.
[0047] In the present application, the specific type of the weighing device 700 is not particularly limited, and those skilled in the art can select it according to actual conditions, as long as the weighing of the main source device 100 can be achieved.
[0048] In some embodiments, reference Figure 1 The phosphorus source supply system further includes: a control device, which is electrically connected to the driving member 310 and the weighing device 700. Therefore, the control device can adjust the driving member 310 according to the mass electrical signal of the weighing device 700 to control the single phosphorus source amount introduced from the auxiliary source device 200 to the main source device 100, thereby facilitating the control of the mass of the main source device 100 to remain constant.
[0049] Specifically, the quality information obtained by the weighing device 700 will be converted into an electrical signal and transmitted to the control device. The control device sends an electrical signal instruction to turn on the driving member 310 and adjust the parameters of the driving member 310 to control the single phosphorus source amount introduced from the auxiliary source device 200 to the main source device 100, control the quality of the main source device 100 to remain constant, and then control the phosphorus source supply of the main source device 100 to the phosphorus source diffusion equipment, so that the phosphorus source diffusion process has better stability and the product yield obtained through the phosphorus source diffusion process is better.
[0050] In some embodiments, the specific type of the control device is not particularly limited, and those skilled in the art can select it according to actual conditions. As a preferred solution, the control device includes at least one of a mobile phone and a computer.
[0051] In some embodiments, the electrical connection method between the control device and the driving pump and the weighing device 700 is not particularly limited, and those skilled in the art can make a selection according to actual conditions.
[0052] In some embodiments, the secondary source device 200 further includes a flow monitoring component and an early warning component. The flow monitoring component is used to monitor the amount of phosphorus source in the secondary source device 200. When the amount of phosphorus source in the secondary source device 200 is lower than the early warning amount, the early warning component will prompt the replacement of the secondary source device 200. The operator introduces all the remaining phosphorus source of the secondary source device 200 into the main source device 100 and replaces the secondary source device 200.
[0053] Furthermore, the single supply amount of the phosphorus source from the main source device 100 to the phosphorus source diffusion equipment accounts for a small proportion of the phosphorus source of the main source device 100. During the process of replacing the auxiliary source device 200, the temperature change of the phosphorus source of the main source device 100 is small and is still within the process temperature range. Therefore, during the process of replacing the auxiliary source device 200, there is no need to shut down the main source device 100 for temperature control. The main source device 100 can still normally supply phosphorus source to the phosphorus source diffusion equipment. The production line efficiency of the phosphorus source diffusion process is greatly improved, and the phosphorus source diffusion process has better stability. The product yield obtained through the phosphorus source diffusion process is better.
[0054] In some embodiments, the warning phosphorus source amount may be a single phosphorus source supply amount from the main source device 100 to the phosphorus source diffusion equipment.
[0055] In some embodiments, the specific types of flow monitoring components and warning components, and the connection relationship between the flow monitoring components and the warning components are not particularly limited, and those skilled in the art can make choices based on specific circumstances.
[0056] In some embodiments, a valve may be provided on the source pipe 300 adjacent to the phosphorus source inlet 110 , which is helpful for accurately adjusting the amount of phosphorus source introduced from the secondary source device 200 to the primary source device 100 .
[0057] In some embodiments, a valve may be provided on the source introduction pipeline 300 adjacent to the second phosphorus source outlet 210 to facilitate adjusting the amount of phosphorus source introduced from the secondary source device 200 to the primary source device 100 .
[0058] In some embodiments, a valve may be provided on the carrier gas inlet pipe adjacent to the carrier gas inlet 120 , so as to facilitate accurate regulation of the amount of carrier gas entering the main source device 100 .
[0059] In some embodiments, a valve may be provided on the source pipe 300 adjacent to the first phosphorus source outlet 130 to facilitate regulating the phosphorus source supply amount introduced from the main source device 100 to the phosphorus source diffusion equipment.
[0060] In some embodiments, a flow meter is provided on the source pipeline 300 to detect the flow in the source pipeline 300 .
[0061] In some embodiments, the carrier gas includes nitrogen.
[0062] The phosphorus source supply system of the present application includes at least one of the following beneficial effects:
[0063] (1) The phosphorus source supply system of the present application can not only supply the phosphorus source to the phosphorus source diffusion equipment, but also guide the phosphorus source in the auxiliary source device 200 to the main source device 100 .
[0064] (2) By providing the first pressure regulating valve 140 and the second pressure regulating valve 220, it is helpful to adjust the pressure of the main source device 100 and the pressure of the auxiliary source device 200 to be close to or the same, which is further helpful to introduce the phosphorus source in the auxiliary source device 200 into the main source device 100 through the driving member 310.
[0065] (3) By disposing the main source device 100 in the first constant temperature box 500, and / or disposing the auxiliary source device 200 in the second constant temperature box 600, it is beneficial to always keep the phosphorus source temperature of the main source device 100 within the process temperature range of phosphorus source diffusion, which is beneficial to reduce shutdown and cooling operations, and is beneficial to ensuring that the phosphorus source diffusion process has better production line efficiency and stability, and the product yield obtained through the phosphorus source diffusion process is better.
[0066] (4) By setting up the weighing device 700 and / or the control device, it is helpful to control the mass and temperature of the main source device 100 to remain constant, and then control the main source device 100 to supply the same or similar amounts of phosphorus sources to different batches of the phosphorus source diffusion equipment, and the temperatures of different batches of phosphorus sources are the same or similar, which is helpful to ensure that the phosphorus source diffusion process has better stability and the product yield obtained through the phosphorus source diffusion process is better.
[0067] (5) By setting the bottom of the auxiliary source device 200 to bulge downward, the utilization rate of the phosphorus source in the auxiliary source device 200 is significantly improved, which is conducive to reducing the probability of safety problems occurring during the replacement, transportation, and disposal of the old auxiliary source device.
[0068] In a second aspect of the present application, the present application provides a phosphorus source diffusion device, wherein the phosphorus source of the phosphorus source diffusion device is provided by the aforementioned phosphorus source supply system. Thus, the phosphorus source supplied by the aforementioned phosphorus source supply system has a temperature close to or the same, and a single supply amount close to or the same, and the product obtained by diffusion using the phosphorus source diffusion device has good uniformity.
[0069] In some embodiments, the phosphorus source diffusion device can be a phosphorus source furnace tube for the phosphorus diffusion process of a crystalline silicon cell. Therefore, the phosphorus source temperature supplied by the aforementioned phosphorus source supply system is close or the same, and the single supply amount is close or the same, which is conducive to improving the uniformity and square resistance stability of the cell prepared by the phosphorus source furnace tube, and improving the cell performance of the crystalline silicon cell.
[0070] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art may combine and combine the different embodiments or examples described in this specification and the features of the different embodiments or examples, without contradiction.
[0071] Although the embodiments of the present application have been shown and described above, it can be understood that the above embodiments are exemplary and cannot be understood as limitations on the present application. Ordinary technicians in this field can change, modify, replace and modify the above embodiments within the scope of the present application.
Claims
1. A phosphorus source supply system, characterized in that: include: A main source device, the main source device comprising a phosphorus source inlet, a carrier gas inlet, and a first phosphorus source outlet, the phosphorus source being discharged from the first phosphorus source outlet; A secondary source device, the secondary source device comprises a second phosphorus source outlet, the second phosphorus source outlet is connected to the phosphorus source inlet through a source guide pipe, and the source guide pipe is provided with a driving member, The main source device further includes a first pressure-stabilizing valve, and the secondary source device further includes a second pressure-stabilizing valve. The first pressure-stabilizing valve is connected to the second pressure-stabilizing valve via a pressure-stabilizing pipeline.
2. The phosphorus source supply system according to claim 1, characterized in that: The main source device further comprises a carrier gas inlet pipe, wherein the carrier gas inlet pipe extends through the carrier gas inlet to below the liquid level of the main source device; And / or, the main source device further comprises a first phosphorus source gas outlet pipe, and the first phosphorus source gas outlet pipe extends through the first phosphorus source outlet to above the liquid level of the main source device.
3. The phosphorus source supply system according to claim 1, characterized in that: The main source device is located in a first constant temperature box; and / or the secondary source device is located in a second constant temperature box.
4. The phosphorus source supply system according to claim 1, characterized in that: The source pipeline is provided with a first pneumatic valve; and / or the pressure-stabilizing pipeline is provided with a second pneumatic valve.
5. The phosphorus source supply system according to claim 1, characterized in that: The bottom of the secondary source device protrudes downward.
6. The phosphorus source supply system according to claim 1, characterized in that: The driving member includes a driving pump.
7. The phosphorus source supply system according to any one of claims 1 to 6, characterized in that: Also includes: A weighing device is located at the bottom of the main source device.
8. The phosphorus source supply system according to claim 7, characterized in that: Also includes: A control device is electrically connected to the driving member and the weighing device respectively.
9. A phosphorus source diffusion device, characterized in that: The phosphorus source of the phosphorus source diffusion device is provided by the phosphorus source supply system according to any one of claims 1-8.