Photoetching machine for automatic switching of high multiplying power and low multiplying power

Abstract

The utility model relates to a photoetching machine for automatically switching high multiplying power and low multiplying power, and belongs to the technical field of laser direct writing equipment. According to the utility model, by arranging the automatic switching photoetching system, not only can automatic switching of objective lenses with different multiplying powers be realized, but also accurate photoetching, alignment and focusing can be realized, so that pollution to the environment of an optical machine room caused by manual switching of the objective lenses by a user is avoided, and the photoetching process is not influenced; and meanwhile, real-time focusing alignment can be carried out through the focusing system, so that the accuracy of the photoetching process is further improved.

Description

Technical Field

[0001] The utility model relates to a photolithography machine for automatic switching between high and low magnifications, belonging to the technical field of laser direct writing equipment. Background Art

[0002] Laser direct writing imaging equipment is used for maskless direct writing lithography. Its working principle is that the illumination light source is projected onto the workpiece to be photolithography through a spatial light modulator (DMD). The line width and line spacing of the lithography are directly related to the objective lens magnification, and usually the lithography accuracy is inversely proportional to the production capacity. The higher the lithography accuracy, the slower the production capacity.

[0003] In the prior art, high-precision lithography is performed using high-magnification microscope lenses. If there is a need to replace a lower-magnification lens in order to increase production capacity, it is necessary to manually switch the lens to achieve this. However, this method is not only inconvenient, but manual switching may also cause pollution to the entire optical machine room environment, resulting in affected lithography indicators; further, after successfully replacing the lens, the various processes of the equipment also require manpower and time to readjust, affecting production capacity. Utility Model Content

[0004] In order to solve the above problems, the utility model provides a photolithography machine for automatic switching between high and low magnifications, comprising:

[0005] A motion platform having a multi-axis motion guide rail; and

[0006] A gantry mounted on the motion platform; and

[0007] The automatic switching photolithography system is fixed to the gantry, and the automatic switching photolithography system comprises a photolithography system and a plurality of objective lenses with different magnifications, and a motion module capable of moving with the plurality of objective lenses.

[0008] It should be understood that the objects to be exposed include wafers, mask plates, etc., and can realize multi-axis movement on a motion platform; in the present utility model, the "up" refers to the direction of each component away from the ground, and the "down" refers to the direction of each component close to the ground; wherein the magnification of the objective lens may include but is not limited to 20X, 15X, 10X, 5X, etc.

[0009] Furthermore, the automatic switching lithography system also includes an alignment system and a reflector assembly, and the reflector assembly is located below the lithography system and the alignment system.

[0010] Furthermore, the reflector assembly includes a first reflector and a second reflector, the first reflector and the second reflector are inclined 45 degrees in the same direction, and the first reflector is located below the lithography system, and the second reflector is located below the alignment system, thereby ensuring that the light path of the point light source of the alignment system is reflected downward through the second reflector and the first reflector in sequence.

[0011] It should be understood that the "first" and "second" are only used to distinguish similar components with different positions or features, and have no other limiting meanings. The first tube lens and the second tube lens are provided to respectively lengthen the focal length from the DMD to the microscope objective lens and the focal length from the CCD camera to the microscope objective lens.

[0012] In one embodiment of the present invention, the upper surface of the first reflector can transmit a light source with a wavelength of 405 nm, and the lower surface can reflect a light source with a wavelength of >550 nm; the upper surface of the second reflector can reflect a light source with a wavelength of >550 nm.

[0013] Furthermore, the motion module is a linear motion module, including a fixed plate, an objective lens moving seat with objective lenses of different magnifications installed, a linear guide rail is provided below the fixed plate, and the objective lens moving seat is connected to the linear guide rail via a slider to perform linear motion.

[0014] Furthermore, the motion module is a nose wheel type motion module, comprising a fixed plate, an objective lens moving seat on which objective lenses of different magnifications are installed, and the objective lens moving seat performs rotational motion.

[0015] In one embodiment of the present utility model, the objective lens moving seat is provided with a plurality of fixing holes, and objective lenses with different magnifications are respectively installed in the fixing holes.

[0016] Furthermore, the fixed plate is also equipped with a grating ruler, which is used to feedback the position of the movement of the shaft, thereby achieving a precise positioning effect.

[0017] Furthermore, the automatic switching lithography system also includes a focusing system, which includes a transmitting end component and a receiving end component, wherein the transmitting end component and the receiving end component are respectively located on both sides of the lithography system, and the transmitting end component includes a patterned aperture.

[0018] Furthermore, the automatic switching lithography system also includes a focusing system, and the focusing system includes a focusing sensor.

[0019] Beneficial effects of the utility model:

[0020] The utility model is provided with an automatic switching photolithography system, which can not only realize the automatic switching of objective lenses of different magnifications, but also realize accurate photolithography, alignment and focusing, thereby avoiding the pollution of the optical chamber environment caused by the user manually switching the objective lens, so that the photolithography process is not affected; at the same time, real-time focusing alignment can be performed through the focusing system, thereby further improving the accuracy of the photolithography process. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a schematic diagram of the overall structure of one implementation of the utility model.

[0022] Figure 2 It is a schematic structural diagram of an automatic switching photolithography system in one embodiment of the utility model.

[0023] Figure 3 It is a schematic structural diagram of a reflector assembly in one embodiment of the utility model.

[0024] Figure 4 It is a structural schematic diagram of a linear motion module in one embodiment of the utility model.

[0025] Figure 5 It is a structural schematic diagram of an automatic switching photolithography system in another embodiment of the utility model.

[0026] Figure 6 It is a structural schematic diagram of a nose wheel type motion module in one embodiment of the utility model.

[0027] Figure 7 It is a structural schematic diagram of a focusing system in one embodiment of the utility model.

[0028] Figure 8 It is a structural schematic diagram of a focusing system in another embodiment of the present invention.

[0029] In the figure, 1-motion platform; 2-adsorption system; 3-gantry, 4-automatic switching lithography system;

[0030] 4.1: DMD, 4.2: lighting system, 4.3: first tube mirror, 4.4: focusing system, 4.5: linear motion module, 4.5': nose wheel motion module, 4.6: reflector assembly, 4.7: second tube mirror, 4.8: point light source, 4.9: CCD camera, 4.10: focusing sensor, 4.11: guide rail fixing parts, 4.12: guide rail and slider, 4.13: Z-axis slide, 4.14: Z-axis slide and module fixing parts;

[0031] 4.4.1: Transmitter lens barrel, 4.4.2: Patterned aperture, 4.4.3: Transmitter surface light source, 4.4.4: Transmitter fixture, 4.4.5: Receiver fixture, 4.4.6: Focusing CCD, 4.4.7: Receiver lens barrel, 4.4.8: Transmitter reflector, 4.4.9: Receiver reflector;

[0032] 4.5.1: fixed plate, 4.5.2: linear guide rail, 4.5.3: slider, 4.5.4: grating ruler, 4.5.5: objective lens moving seat, 4.5.6: 5X objective lens, 4.5.7: 15X objective lens, 4.5.8: 20X objective lens, 4.5.9: 10X objective lens;

[0033] 4.5.1': nose wheel module fixing part, 4.5.2': fixed end, 4.5.3': rotating end, 4.5.4': motor;

[0034] 4.6.1: first reflector, 4.6.2: second reflector, 4.6.3: reflector fixing part. DETAILED DESCRIPTION

[0035] Example 1

[0036] In order to solve the above problems, the utility model provides a photolithography machine for automatic switching between high and low magnifications, such as Figure 1 , Figure 2 As shown, including:

[0037] A motion platform 1 having a multi-axis movable guide rail and an adsorption system 2 carrying an object to be exposed; and

[0038] A gantry 3 is installed on the motion platform 1; and

[0039] The automatic switching photolithography system 4 is fixed to the gantry 3, as shown in FIG. Figure 2 As shown, the automatic switching photolithography system 4 includes a photolithography system and four objective lenses with different magnifications, and a linear motion module 4.5 capable of moving with the four objective lenses. The photolithography system includes a DMD 4.1, an illumination system 4.2 and a first tube lens 4.3, as shown in FIG. Figure 4As shown, the linear motion module 4.5 includes a fixed plate 4.5.1, an objective lens moving seat 4.5.5 installed with a 5X objective lens 4.5.6, a 10X objective lens 4.5.9, a 15X objective lens 4.5.7, and a 20X objective lens 4.5.8, and a linear guide rail 4.5.2 is provided below the fixed plate 4.5.1, and the objective lens moving seat 4.5.5 is connected to the linear guide rail 4.5.2 through a slider 4.5.3. The objective lens moving seat 4.5.5 is provided with four fixing holes, which are respectively installed with a 5X objective lens 4.5.6, a 10X objective lens 4.5.9, a 15X objective lens 4.5.7, and a 20X objective lens 4.5.8; the fixed plate 4.5.1 is also installed with a grating ruler 4.5.4, which is used to feedback the position of the axis movement, so as to achieve the effect of precise positioning.

[0040] like Figure 5 and Figure 6 As shown, the motion module can also be a nose wheel type motion module 4.5', including a nose wheel module fixing part 4.5.1', ​​a fixed end 4.5.2', a rotating end 4.5.3', and a motor 4.5.4'. The fixed end 4.5.2' is fixed to the nose wheel module fixing part 4.5.1', ​​and the rotating end 4.5.3' is provided with a plurality of fixing holes, and objective lenses of different magnifications are respectively installed in the fixing holes. The motor 4.5.4' provides rotational power for the rotating end 4.5.3', and the number of rotations is confirmed by pulses.

[0041] Example 2

[0042] The automatic switching lithography system also includes an alignment system and a reflector assembly, such as Figure 2 and 3 As shown, the alignment system includes a second tube lens 4.7, a point light source 4.8, and a CCD camera 4.9. The reflector assembly 4.6 includes a reflector fixing part 4.6.3 and a first reflector 4.6.1 and a second reflector 4.6.2 installed on the reflector fixing part 4.6.3. The first reflector 4.6.1 and the second reflector 4.6.2 are inclined 45 degrees in the same direction, and the first reflector is located below the lithography system, and the second reflector is located below the alignment system; the upper surface of the first reflector 4.6.1 can transmit a 405nm wavelength light source, and the lower surface can reflect a >550nm wavelength light source; the upper surface of the second reflector 4.6.2 can reflect a >550nm wavelength light source.

[0043] Alignment stage: The second light source is emitted by the point light source 4.8, and is reflected by the upper surface of the second reflector 4.6.2 and the lower surface of the first reflector 4.6.1 in turn, and finally irradiates the mark point through the microscope objective lens on the motion module, and then is received by the CCD camera 4.9 of the alignment system after reflection.

[0044] Photolithography stage: The first light source with a wavelength of 405nm is injected by the illumination system 4.2. The first light source passes through the first lens barrel 4.3 and then through the first reflector 4.6.1 to reach the motion module 4.5. After being imaged by the microscope objective lens on the motion module 4.5, photolithography is performed.

[0045] Example 3

[0046] The automatic switching lithography system also includes a focusing system, such as Figure 5 As shown, the focusing system 4.4 includes a transmitting end component and a receiving end component, and the transmitting end component and the receiving end component are respectively located on both sides of the photolithography system. The transmitting end component is fixed by a transmitting end fixing member 4.4.4, and includes a transmitting end lens barrel 4.4.1, a patterned aperture 4.4.2 placed in the transmitting end lens barrel 4.4.1, and a transmitting surface light source 4.4.3. The receiving end component is fixed by a receiving end fixing member 4.4.5, and includes a focusing CCD 4.4.6 and a receiving end lens barrel 4.4.7.

[0047] Focusing stage: The light emitted by the emitting surface light source 4.4.3 (light source wavelength > 550nm) shines on the patterned aperture 4.4.2, passes through the transmitting end lens barrel 4.4.1, and is reflected by the transmitting end reflector 4.4.8 to the object to be exposed on the adsorption system 2. The object to be exposed can be a wafer or a mask plate. Then, it is reflected by the receiving end reflector 4.4.9 and then reaches the receiving end lens barrel 4.4.7. Finally, the image is captured by the focusing CCD 4.4.6. The distance that the motion platform Z axis needs to move is calculated by the offset of the image in the camera's field of view, and then fed back to the host computer through the PLC to issue a focusing action, thereby achieving the purpose of focusing. The focal plane of the focusing system 4.4 needs to be the same as the focal plane of the automatic switching lithography system 4.

[0048] In addition to using the Z-axis of the motion platform to achieve focusing, the focusing function can also be achieved by moving the motion module up and down, such as Figure 8 As shown, the motion module is fixedly connected to the module and guide rail fixing part 4.11 and the slide and module fixing part 4.14 respectively. The module and guide rail fixing part 4.11 and the slide and module fixing part 4.14 drive the motion module to move up and down through the guide rail and the slider 4.12. The Z-axis slide 4.13 can drive the motion module to achieve high-precision up and down movement, and the accuracy can reach nm level.

[0049] like Figure 8As shown, the focusing system can also be a focusing sensor 4.10, which emits a beam of light horizontally, passes through the second reflector 4.6.2, is reflected by the first reflector 4.6.1, reaches the object to be measured and returns to the original path. The focusing sensor 4.10 records data and feeds the data back to the host computer to issue a focusing action. The change in the focal plane during the platform movement is transmitted to the Z-axis slide 4.13, so that the motion module moves the objective lens up and down to achieve real-time focusing.

[0050] Although the present invention has been disclosed as above in terms of preferred embodiments, it is not intended to limit the present invention. Anyone familiar with the technology may make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention should be based on the definition of the claims.

Claims

1. A photolithography machine for automatic switching between high and low magnification, characterized in that: include: A motion platform, wherein the motion platform has a multi-axis movable guide rail; as well as A gantry, mounted on the motion platform; as well as The automatic switching photolithography system is fixed to the gantry, and the automatic switching photolithography system comprises a photolithography system and a plurality of objective lenses with different magnifications, and a motion module capable of moving with the plurality of objective lenses.

2. A lithography machine for automatic switching between high and low magnification according to claim 1, characterized in that: The automatic switching photolithography system further comprises an alignment system and a reflector assembly, wherein the reflector assembly is located below the photolithography system and the alignment system.

3. A lithography machine for automatic switching between high and low magnification according to claim 2, characterized in that: The reflector assembly includes a first reflector and a second reflector, wherein the first reflector and the second reflector are inclined in the same direction by 45 degrees, and the first reflector is located below the photolithography system, and the second reflector is located below the alignment system.

4. A lithography machine for automatic switching between high and low magnification according to claim 3, characterized in that: The upper surface of the first reflector can transmit a light source with a wavelength of 405 nm, and the lower surface can reflect a light source with a wavelength of more than 550 nm; the upper surface of the second reflector can reflect a light source with a wavelength of more than 550 nm.

5. A lithography machine for automatic switching between high and low magnification according to any one of claims 1 to 4, characterized in that: The motion module is a linear motion module, including a fixed plate, an objective lens moving seat with objective lenses of different magnifications installed, a linear guide rail is provided below the fixed plate, and the objective lens moving seat is connected to the linear guide rail via a slider to perform linear motion.

6. A lithography machine for automatic switching between high and low magnification according to any one of claims 1 to 4, characterized in that: The motion module is a nose wheel type motion module, comprising a fixed plate and an objective lens moving seat on which objective lenses of different magnifications are installed, and the objective lens moving seat performs rotational motion.

7. A lithography machine for automatic switching between high and low magnification according to claim 5, characterized in that: The objective lens moving seat is provided with a plurality of fixing holes, and objective lenses with different magnifications are respectively installed in the fixing holes.

8. A lithography machine for automatic switching between high and low magnification according to claim 7, characterized in that: The fixed plate is also equipped with a grating ruler.

9. A lithography machine for automatic switching between high and low magnifications according to any one of claims 1 to 4, characterized in that: The automatic switching photolithography system further comprises a focusing system, wherein the focusing system comprises a transmitting end component and a receiving end component, wherein the transmitting end component and the receiving end component are respectively located at two sides of the photolithography system, and the transmitting end component comprises a patterned aperture.

10. A lithography machine for automatic switching between high and low magnification according to any one of claims 1 to 4, characterized in that: The automatic switching lithography system further comprises a focusing system, and the focusing system comprises a focusing sensor.

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