Transparent conductive film for improving transmission color
By setting a flexible substrate layer, barrier layer, anti-film layer and color layer in the transparent conductive film, the transmission color and stability problems are solved, and a transparent conductive film with high color, stability and flexibility is achieved, suitable for a variety of purposes Application field.
Patent Information
- Application Number
- CN202420232050.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-01-31
- Publication Date
- 2025-01-03
- Estimated Expiration
- 2034-01-31
AI Technical Summary
The transmission color of the transparent conductive film in the visible light region is affected by the material itself, usually appearing light yellow or light blue, and may produce uneven defects during the preparation process, affecting its optical and electrical properties.
By setting a flexible substrate layer, a barrier layer, a detonation layer and a color layer in the transparent conductive film, silicon nitride, silicon oxide, niobium pentoxide and indium tin oxide films are deposited by vacuum magnetron sputtering deposition technology respectively, to adjust Transmitting color, eliminating surface defects, enhancing flexibility and preventing conductive layers from diffusion.
The transmission color adjustment is achieved, optical uniformity and stability is improved, flexibility is enhanced, conductivity is maintained, resistivity and power consumption is reduced, and it is suitable for applications with high color requirements such as displays and touch screens.
Smart Images

Figure CN222300325U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of conductive films, in particular to a transparent conductive film with improved transmission color. Background Art
[0002] Transparent conductive film (TCO) is a semiconductor material with high visible light transmittance and good conductivity. It is widely used as a window material for optoelectronic devices (such as LEDs, thin-film solar cells, etc.). Common transparent conductive films include ITO (tin-doped indium trioxide) and AZO (aluminum-doped zinc oxide). They have a large bandgap and only absorb ultraviolet light, not visible light, so they are called "transparent".
[0003] However, the transmission color of transparent conductive film in the visible light region is affected by the material itself, usually showing a light yellow or light blue color, which will reduce the visual effect for some applications with high color requirements, such as displays, touch screens, etc. In addition, during the preparation process of transparent conductive film, due to etching, scratches, etc., some uneven defects may occur, affecting its optical and electrical properties. Therefore, how to improve the transmission color of transparent conductive film and improve its uniformity and stability is an important topic in the current research of transparent conductive film. Utility Model Content
[0004] The utility model aims to provide a transparent conductive film with improved transmission color, so as to improve the transmission color of the transparent conductive film and enhance its uniformity and stability.
[0005] In order to achieve the above-mentioned purpose, the technical solution adopted by the utility model is: to provide a transparent conductive film with improved transmission color, the transparent conductive film with improved transmission color comprises:
[0006] The transparent conductive film for improving transmission color has a flexible substrate layer, a barrier layer, a shadow elimination layer, a color layer and a conductive layer arranged in sequence from the bottom surface to the surface.
[0007] In one embodiment, the conductive layer is an indium tin oxide thin film deposited by vacuum magnetron sputtering with a ratio of 95 indium to 5 tin.
[0008] In one embodiment, the thickness of the conductive layer is 30 nm.
[0009] In one embodiment, the barrier layer is a silicon nitride film deposited by vacuum magnetron sputtering.
[0010] In one embodiment, the image elimination layer is a stacked film of silicon oxide and silicon nitride deposited by vacuum magnetron sputtering.
[0011] In one embodiment, the color layer is a niobium pentoxide film deposited by vacuum magnetron sputtering, and the thickness of the color layer is 35 nm.
[0012] In one embodiment, the flexible substrate layer includes a PI layer, a PET layer, and a COP layer.
[0013] In one embodiment, the thickness of the silicon nitride film is 2 nm.
[0014] In one embodiment, the image elimination layer is composed of a 15 nm silicon nitride layer, a 25 nm silicon oxide layer, an 8 nm silicon nitride layer, and a 40 nm silicon dioxide layer stacked from bottom to top.
[0015] In one embodiment, the flexible substrate layer includes a transparent PI layer, a transparent PET layer and a transparent COP layer.
[0016] One or more of the above technical solutions in the embodiments of the present utility model have at least the following technical effects or advantages:
[0017] The embodiment of the utility model can adjust the transmission color of the transparent conductive film by setting a color layer, so that it presents black or other desired colors, meets different application requirements, and improves the aesthetics and applicability of the product. By setting a shadow elimination layer, the surface defects of the transparent conductive film, such as etching marks, scratches, etc., can be eliminated, the optical uniformity and stability of the transparent conductive film can be improved, and the decline of optical performance and the scrapping of the product can be avoided. By setting a flexible substrate layer, the flexibility of the transparent conductive film can be enhanced, so that it can adapt to different curved surface shapes, and the application range of the transparent conductive film can be expanded, which is suitable for flexible displays, touch screens and other fields. By setting a barrier layer, the mutual diffusion between the conductive layer and other layers of the transparent conductive film can be prevented, the good conductivity of the transparent conductive film is maintained, the resistivity and power consumption are reduced, and the performance and life of the product are improved. In summary, the transparent conductive film with improved transmission color of the present invention has the characteristics of good color, good stability, no etching marks, good flexibility, good conductivity, etc., and is an excellent transparent conductive film suitable for promotion in the industry. BRIEF DESCRIPTION OF THE DRAWINGS
[0018] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.
[0019] Figure 1 A schematic structural diagram of a transparent conductive film for improving transmission color provided in an embodiment of the utility model.
[0020] The respective reference numerals are as follows:
[0021] 1. Flexible substrate layer; 2. Barrier layer; 3. Shadow elimination layer; 4. Color layer; 5. Conductive layer. DETAILED DESCRIPTION
[0022] The embodiments of the present invention are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended to be used to explain the present invention, and should not be construed as limiting the present invention.
[0023] In the description of the present invention, it should be understood that the terms "length", "width", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.
[0024] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present utility model, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.
[0025] In the present invention, unless otherwise clearly specified and limited, the terms "install", "connect", "connect", "fix" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.
[0026] The specific steps for making the transparent conductive film with improved transmission color provided by the utility model can be as follows:
[0027] This embodiment prepares a transparent conductive film for improving transmission color, which has a structure in which a flexible substrate layer 1, a barrier layer 2, an elimination layer 3, a color layer 4, and a conductive layer 5 are sequentially arranged from the bottom to the surface. The specific steps are as follows:
[0028] A piece of flexible substrate layer 1 is selected, cleaned, and placed in a vacuum magnetron sputtering device.
[0029] A silicon nitride film with a thickness of 2 nm is deposited on the flexible substrate layer 1 as a barrier layer 2 by vacuum magnetron sputtering, with a silicon nitride target as a sputtering source, argon as a working gas, a gas pressure of 0.5 Pa, a power of 100 W, and a deposition time of 10 s.
[0030] A layer of silicon oxide and silicon nitride stacked thin film is deposited on the barrier layer 2 as the erasure layer 3, which is composed of a 15nm silicon nitride layer, a 25nm silicon oxide layer, an 8nm silicon nitride layer, and a 40nm silicon dioxide layer stacked from bottom to top. A vacuum magnetron sputtering method is adopted, with silicon oxide and silicon nitride targets as sputtering sources, argon as working gas, gas pressure of 0.5Pa, power of 100W, and deposition times of 30s, 50s, 16s, and 80s respectively.
[0031] A niobium pentoxide film is deposited on the erasure layer 3 as the color layer 4, with a thickness of 35 nm, by vacuum magnetron sputtering, with a niobium pentoxide target as the sputtering source, argon as the working gas, a gas pressure of 0.5 Pa, a power of 100 W, and a deposition time of 70 s.
[0032] A layer of indium tin oxide film is deposited on the color layer 4 as the conductive layer 5, with a thickness of 30nm, by vacuum magnetron sputtering, with a 95 indium:5 tin target as the sputtering source, argon as the working gas, a gas pressure of 0.5Pa, a power of 100W, and a deposition time of 60s.
[0033] The deposited transparent conductive film is taken out from the vacuum magnetron sputtering equipment and subjected to subsequent processing such as cutting and packaging to obtain the final product.
[0034] The transparent conductive film with improved transmission color prepared in this embodiment has the characteristics of good color, good stability, no etching marks, good flexibility, good conductivity, etc. It is an excellent transparent conductive film suitable for promotion in the industry.
[0035] The above are only preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the protection scope of the present invention.
Claims
1. A transparent conductive film with improved transmission color, characterized in that: The transparent conductive film for improving transmission color has a flexible substrate layer, a barrier layer, a shadow elimination layer, a color layer and a conductive layer arranged in sequence from the bottom surface to the surface.
2. A transparent conductive film with improved transmission color according to claim 1, characterized in that: The thickness of the conductive layer is 30 nm.
3. The transparent conductive film with improved transmission color according to claim 1, characterized in that: The barrier layer is a silicon nitride film deposited by vacuum magnetron sputtering.
4. The transparent conductive film with improved transmission color according to claim 1, characterized in that: The shadow elimination layer is a superimposed film of silicon oxide and silicon nitride deposited by vacuum magnetron sputtering.
5. The transparent conductive film with improved transmission color according to claim 1, characterized in that: The color layer is a niobium pentoxide film deposited by vacuum magnetron sputtering, and the thickness of the color layer is 35 nm.
6. The transparent conductive film with improved transmission color according to claim 1, characterized in that: The flexible substrate layer comprises a PI layer, a PET layer and a COP layer.
7. The transparent conductive film with improved transmission color according to claim 3, characterized in that: The thickness of the silicon nitride film is 2 nm.
8. The transparent conductive film with improved transmission color according to claim 4, characterized in that: The image elimination layer is composed of a 15nm silicon nitride layer, a 25nm silicon oxide layer, an 8nm silicon nitride layer, and a 40nm silicon dioxide layer stacked from bottom to top.
9. The transparent conductive film with improved transmission color according to claim 1, characterized in that: The flexible substrate layer includes a transparent PI layer, a transparent PET layer and a transparent COP layer.
