Air inlet structure and tubular PECVD (plasma enhanced chemical vapor deposition) equipment
By adopting arc-shaped air intake pipeline and symmetrically arranged air outlet section design in the tubular PECVD equipment, combined with the uniform flow plate in the ark structure, the problem of uneven gas flow field in the prior art is solved, and a more uniform The gas distribution and film material thickness distribution improve film quality.
Patent Information
- Application Number
- CN202420754317.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-04-12
- Publication Date
- 2025-01-07
- Estimated Expiration
- 2034-04-12
AI Technical Summary
The intake method in the existing pipe PECVD equipment causes uneven gas flow field. The pressure and flow rate of gas ejected from the outlet near the air inlet side is greater than the outlet far away from the air inlet side, resulting in the gas flow field bias. Stay away from the air inlet side.
The arc-shaped intake pipe is adopted, and the outlet section is arranged symmetrically on both sides of the intake pipe section. The number and layout of the air outlets are designed to ensure that the air pressure and flow rate of each outlet are roughly equal, forming a hedge gas flow field, and the intake flange is equipped with gas The passage is fixedly installed at the reactor furnace opening and combined with the uniform plate in the ark structure to flow in or out of the air flow in layered.
A more uniform gas flow field is formed through hedging design to ensure uniform distribution of gas in the reactor, improve the uniformity of the thickness distribution of film materials, and thus improve the film quality.
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Figure CN222313296U_ABST
Abstract
Description
Technical Field
[0001] The present application belongs to the technical field of photovoltaic production equipment, and in particular, relates to an air intake structure and a tubular PECVD device. Background Art
[0002] In the field of solar cell manufacturing, chemical vapor deposition equipment is particularly used. Tubular plasma enhanced chemical vapor deposition equipment (hereinafter referred to as tubular PECVD equipment) is one of them. Tubular PECVD equipment is widely used in the preparation of thin film materials.
[0003] The characteristic of tubular PECVD equipment is that it adopts a tubular structure reactor. It is necessary to introduce reaction gas and discharge gas into the reactor to generate plasma. The plasma gas undergoes chemical reaction and deposits thin film material on the substrate of the graphite boat in the reactor.
[0004] The uniformity of the thickness distribution of the thin film material on the substrate is one of the important indicators that determine the quality of the thin film, and the distribution of the inlet gas flow field in the reactor is one of the important factors affecting the thickness distribution of the thin film material.
[0005] The air inlet pipeline in the existing tubular PECVD equipment is set at the furnace mouth of the reactor and most of it is a circular pipeline. The circular pipeline has only one air inlet and multiple air outlets. The multiple air outlets are symmetrically arranged about the central axis of the circular pipeline, and the intersection point of the extension lines of the air outlet directions of each air outlet is located on the central axis of the circular pipeline.
[0006] It should be understood that the gas pressure and flow rate of the gas ejected from each gas outlet with different spacing from the gas inlet are different. For the solution of centrally symmetrically arranging the gas outlets, the gas pressure and flow rate of the gas ejected from the gas outlet close to the gas inlet are greater than the gas pressure and flow rate of the gas ejected from the gas outlet far from the gas inlet, resulting in the gas flow field being biased toward the side far from the gas inlet, and the uniformity of the gas flow field being deviated. Utility Model Content
[0007] The present application provides an air intake structure and a tubular PECVD device to solve the technical problem that the existing air intake method tends to be away from the air inlet, resulting in an uneven gas flow field.
[0008] According to one aspect of the present application, an air intake structure is provided, including an air intake pipe and an air intake flange, the air intake flange is provided with a gas channel, the air intake pipe is connected to the air intake flange and is an arc-shaped pipeline with an arc length exceeding half a circle circumference, and the air intake pipe is located in the air intake channel; the air intake pipe includes an air intake pipe section and an air outlet pipe section symmetrically arranged on both sides of the air intake pipe section.
[0009] In an optional solution of the present application, the air outlet pipe sections on both sides are arranged symmetrically with respect to the center axis of the air inlet flange.
[0010] In an optional solution of the present application, the air inlet pipe section is provided with an air inlet, and the air outlet pipe section is provided with multiple air outlets; the multiple air outlets in the air outlet pipe sections on both sides are arranged symmetrically with respect to the air inlet.
[0011] In an optional solution of the present application, the multiple air outlets in the air outlet pipe sections on both sides are arranged symmetrically with respect to the center axis of the air inlet flange.
[0012] In an optional solution of the present application, the opening directions of the air outlets in the air outlet pipe sections on both sides are symmetrically distributed facing each other.
[0013] In an optional solution of the present application, the extension lines of the opening directions of the air outlets in the air outlet pipe sections on both sides intersect at the central axis of the air inlet flange.
[0014] In an optional scheme of the present application, the line between the nearest end of the single-sided outlet pipe section to the inlet pipe section and the center of the inlet flange is the first line; the line between the farthest end of the single-sided outlet pipe section to the inlet pipe section and the center of the inlet flange is the second line; the acute angle formed by the first line and the second line is 5° to 15°.
[0015] According to another aspect of the present application, a tubular PECVD device is provided, comprising a reaction furnace and the above-mentioned air intake structure, wherein the air intake flange is arranged at the furnace mouth of the reaction furnace.
[0016] In the optional scheme of the present application, it also includes at least one ark structure, which can be set in the reactor; the ark structure includes an ark frame and a flow plate, and the flow plate is set at both ends of the ark frame; the flow plate is provided with a multi-layer diversion structure to allow the airflow to flow into or out of the ark frame in layers.
[0017] In an optional scheme of the present application, the flow equalizer is provided with a plurality of guide holes, and the plurality of guide holes are arranged in an array, and the multi-layer diversion structure includes a plurality of layers of guide hole rows formed by the plurality of guide holes; the ark frame includes a plurality of boat plates, and the plurality of boat plates are stacked and arranged at intervals, and there is at least one layer of guide hole rows corresponding to two adjacent boat plates.
[0018] In summary, the air intake structure and tubular PECVD equipment provided by the present application have at least the following beneficial effects:
[0019] The air intake mechanism includes an air intake pipe and an air intake flange, and the air intake flange can be fixedly installed at the furnace mouth of the reaction furnace in the tubular PECVD equipment. The air intake flange is formed with a gas channel, the air intake pipe is a non-closed annular structure and is fixedly installed in the gas channel, and the air intake pipe can be connected to a gas source to introduce the reaction gas into the reaction furnace in the tubular PECVD equipment.
[0020] The air inlet pipe includes an air inlet pipe section and an air outlet pipe section, wherein the air inlet pipe section is used to connect to the air source, and the air outlet pipe section is used to eject the gas. Since the air outlet pipe sections are symmetrically arranged on both sides of the air inlet pipe section, the air outlet pipe sections aligned on both sides are at the same distance from the air inlet pipe section, the air pressure and flow rate of the gas ejected from the air outlet pipe sections on both sides are roughly equal, and the uniformity of the gas flow field formed after the collision will be relatively better. BRIEF DESCRIPTION OF THE DRAWINGS
[0021] In order to more clearly illustrate the specific implementation of the present application or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the specific implementation or the prior art description. Obviously, the drawings described below are some implementations of the present application. For those skilled in the art, other drawings can be obtained based on these drawings without creative work.
[0022] Figure 1 A partial schematic diagram of a tubular PECVD device provided according to one embodiment of the present application;
[0023] Figure 2 for Figure 1 Schematic diagram of the gas inlet structure in a tubular PECVD device from one perspective;
[0024] Figure 3a for Figure 2 Schematic diagram of the air intake pipe in the air intake structure at one viewing angle;
[0025] Figure 3b for Figure 3a A local enlarged view of the S in FIG.
[0026] Figure 4a A schematic diagram of the direction of gas ejection from each gas outlet in an air intake pipe provided in one embodiment of the present application is shown;
[0027] Figure 4b A schematic diagram showing the direction of gas ejection from each gas outlet in an air intake pipe provided in another embodiment of the present application is shown;
[0028] Figure 5 This is a schematic diagram of a flow equalizer provided according to one embodiment of the present application.
[0029] The reference numerals are as follows:
[0030] 100. Air intake structure;
[0031] 10. Inlet pipe; 11. Inlet pipe section; 12. Outlet pipe section;
[0032] 20. Inlet flange;
[0033] 200, ark structure; 210, ark frame; 211, ark plate; 220, flow equalizer;
[0034] A, air inlet; B, air outlet; L, flow guide hole row; H1, gas channel; H2, plug hole; H3, flow guide hole. DETAILED DESCRIPTION
[0035] In the description of the present application, it should be understood that if terms such as "center", "up", "down", "left", "right", "vertical", "horizontal", and "axial" appear to indicate orientation or positional relationships, unless otherwise specified, they are understood to be based on the orientation or positional relationships shown in the accompanying drawings. They are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, they should not be understood as limitations on the present application.
[0036] In addition, if there is a feature defined as "first" or "second", it is only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Features defined as "first" or "second" may explicitly or implicitly include at least one of the defined features. If there is a description of "plurality", the general meaning is to include at least two, such as two, three, etc., unless otherwise clearly and specifically defined.
[0037] In order to make the above and other features and advantages of the present application more clear, the present invention is further described below in conjunction with the accompanying drawings. It should be understood that the specific embodiments given herein are for the purpose of explaining to those skilled in the art and are only exemplary and not restrictive.
[0038] Figure 1 It is a partial schematic diagram of a tubular PECVD device provided according to one embodiment of the present application. Figure 2 for Figure 1 Schematic diagram of the gas inlet structure 100 in a tubular PECVD device from a certain perspective. Figure 1 and Figure 2 The tubular PECVD device includes an air intake structure 100 and a reaction furnace ( Figure 1 The reactor is omitted).
[0039] Among them, the air intake structure 100 includes an air intake pipe 10 and an air intake flange 20. The air intake flange 20 is arranged at the furnace mouth of the reactor and has a gas channel H1. The air intake pipe 10 is connected to the air intake flange 20 and is an arc-shaped pipeline with an arc length exceeding half the circumference. The air intake pipe 10 is located in the gas channel H1.
[0040] The air inlet pipe 10 includes an air inlet pipe section 11 and air outlet pipe sections 12 symmetrically arranged on both sides of the air inlet pipe section 11 .
[0041] In this embodiment, the air intake structure 100 is mainly composed of an air intake pipe 10 and an air intake flange 20. Since the air intake flange 20 is fixedly installed at the furnace mouth of the reactor, and the air intake pipe 10 is located in the gas channel H1 of the air intake flange 20, the air intake structure 100 is located at the furnace mouth of the reactor.
[0042] The gas channel H1 of the gas inlet flange 20 can be connected to the reaction chamber of the reactor, and the gas inlet pipe 10 can be connected to the gas source to introduce the reaction gas into the reactor. In other words, the gas is introduced from the furnace mouth of the reactor. It should be noted that the tubular PECVD generally also includes a vacuum system, through which a gas flow flowing from the furnace mouth to the furnace tail can be formed in the reactor.
[0043] The gas channel H1 of the air inlet flange 20 is generally a circular hole, and accordingly, the air inlet pipe 10 is also a circular ring structure. In this embodiment, the air inlet pipe 10 is a non-closed circular ring structure, and the arc length exceeds the semicircular arc length. Further, the air inlet pipe 10 includes an air inlet pipe section 11 and an air outlet pipe section 12, wherein the air inlet pipe section 11 is used to connect to the gas source, and the air outlet pipe sections 12 on both sides are used to spray out gas.
[0044] In addition, the gas ejected from the gas outlet pipe sections 12 on both sides can be counter-charged and dispersed in the gas channel H1, and the gas outlet pipe sections 12 on both sides adopt a symmetrical layout scheme based on the gas inlet pipe section 11, and the distances between the gas outlet pipe sections 12 aligned on both sides and the gas inlet pipe section 11 are equal. Therefore, the gas pressures of the gases ejected from the gas outlet pipe sections 12 aligned on both sides are roughly equal and the flow rates are also close, thereby ensuring uniform counter-charge distribution of the gases, that is, ensuring the uniformity of the initial inlet gas flow field entering the reactor.
[0045] It should be understood that the number of the air outlet pipe segments 12 may be an even number, for example, may be 2, 4, 6, etc.
[0046] In some optional embodiments, the air intake flange 20 is provided with an inserting hole H2, and the air intake pipe section 11 is inserted into the inserting hole H2.
[0047] In this embodiment, the air intake flange 20 is used to fix the insertion hole H2 of the air intake pipe section 11. The position of the air intake pipe 10 in the gas channel H1 can be limited by the cooperation between the air intake pipe section 11 and the insertion hole H2.
[0048] In a specific application, a rubber ring is further provided in the plug hole H2 to ensure the sealing performance between the air intake pipe 10 and the air intake flange 20 , and the air intake pipe 10 can be installed by plugging and unplugging.
[0049] Figure 3a for Figure 2 A schematic diagram of the air intake pipe 10 in the air intake structure 100 at a certain viewing angle. Figure 3b for Figure 3a A partial enlarged view of the S in FIG. Figure 3a and Figure 3b In some optional embodiments, a line between the nearest end of the single-side outlet pipe section 12 to the inlet pipe section 11 and the center of the inlet flange 20 is the first line.
[0050] The line connecting the farthest end of the single-side outlet pipe section 12 from the inlet pipe section 11 and the center of the inlet flange 20 is the second line. The acute angle formed by the first line and the second line is 5° to 15°.
[0051] In this embodiment, the range of the single-side air outlet pipe section 12 is limited to the corresponding range of the arc pipe section of 5° to 15°, so that the gas ejected from the single-side air outlet pipe section 12 is relatively more concentrated, and the air pressure of the gas on both sides is more concentrated, which is conducive to ensuring uniform distribution of airflow after gas collision.
[0052] In order to further ensure the concentration of the gas ejected from the single-side outlet pipe section 12, preferably, the acute angle formed by the first connecting line and the second connecting line is 6° to 12°. It should be noted that the center of the air inlet flange 20 is the center of the gas channel H1, the air inlet pipe 10 is coaxially arranged with the gas channel H1, and the center of the air inlet flange 20 is also the center of the air inlet pipe 10.
[0053] In a further optional embodiment, the air outlet pipe sections 12 on both sides are arranged symmetrically with respect to the central axis of the air inlet flange 20 .
[0054] In this embodiment, the gas ejected from the outlet pipe sections 12 on both sides can collide near the central axis of the inlet flange 20, ensuring that the collided gas can diffuse from the central axis of the inlet flange 20 to the surroundings, which is conducive to improving the uniformity of the collided gas distribution. Here, the central axis of the inlet flange 20 is the central axis of the gas channel H1.
[0055] Preferably, the number of the air outlet pipe sections 12 is two, and the two air outlet pipe sections 12 are aligned in the plane direction of the central axis of the gas channel H1 and are symmetrical on both sides of the air inlet pipe section 11. In this way, the gas counterattack position is basically located in the center of the gas channel H1 and the gas pressure and flow rate of the ejected gas are similar. The gas after counterattack can be evenly dispersed from the center position of the gas channel H1 to the surroundings, which can further improve the uniform distribution of the counterattack gas.
[0056] In the illustrated embodiment, the two outlet pipe sections 12 are respectively located at the two ends of the inlet pipe 10, the two outlet pipe sections 12 are aligned in the horizontal direction and on the diameter of the gas channel H1, and the inlet pipe section 11 is located on the diameter of the gas channel H1 in the vertical direction and at the bottom of the inlet pipe 10. In this way, the gases ejected from the two outlet pipe sections 12 collide in the horizontal direction and are located near the center of the gas channel H1, and the collided gases radiate outward from the center of the gas channel H1 to form a uniformly distributed gas flow field.
[0057] Of course, the arrangement of the air outlet pipe segments 12 on both sides is not limited to the illustrated embodiment. For example, within the range of two centrally symmetrical 15° arc-shaped pipe segments, two air outlet pipe segments 12 are arranged on a single arc-shaped pipe segment, i.e., a total of four air outlet pipe segments 12, and these four air outlet pipe segments 12 are arranged both bilaterally symmetrically with respect to the air inlet pipe segment 11 and centrally symmetrically with respect to the center of the gas channel H1.
[0058] It should be understood that the position of the air outlet pipe section 12 can be adaptively adjusted according to the shape of the air inlet pipe 10 to ensure that the air outlet pipe sections 12 on both sides can be symmetrically arranged on both sides of the air inlet pipe section 11, can also be symmetrically arranged about the central axis of the gas channel H1, and can also offset each other.
[0059] In some optional embodiments, the air inlet pipe section 11 is provided with an air inlet A, and the air outlet pipe section 12 is provided with a plurality of air outlets B. The plurality of air outlets B in the air outlet pipe sections 12 on both sides are arranged symmetrically with respect to the air inlet A.
[0060] In this embodiment, the outlet pipe section 12 on one side is provided with multiple outlets B, and the multiple outlets B on both sides are symmetrically arranged on both sides of the air inlet A. It can be seen that the number of the outlets B on both sides is equal, and the number of the outlets B is an even number.
[0061] It should be understood that only when the number of gas outlets B on both sides is equal can the flow rate of the gas ejected from the gas outlet pipe sections 12 on both sides be ensured to be similar.
[0062] It should be noted that the air outlet B may be a circular hole, a waist-shaped hole, an elliptical hole, etc. Preferably, the air outlet B is a circular hole with a hole diameter of 2 mm to 4 mm. In addition, the closest end of the above-mentioned single-side air outlet pipe section 12 to the air inlet pipe section 11 may refer to the center of the air outlet B closest to the air inlet pipe section 11 in the air outlet pipe section 12 on that side, and correspondingly, the farthest end of the single-side air outlet pipe section 12 from the air inlet pipe section 11 may refer to the center of the air outlet B farthest from the air inlet pipe section 11 in the air outlet pipe section 12 on that side.
[0063] In a further optional embodiment, the multiple air outlets B in the air outlet pipe sections 12 on both sides are arranged symmetrically with respect to the center axis of the air inlet flange 20 .
[0064] In this embodiment, in addition to ensuring that the multiple air outlets B on both sides are symmetrically arranged on both sides of the air inlet A, the multiple air outlets B on both sides are also symmetrically arranged about the central axis of the air inlet flange 20, so that the gases ejected from the multiple air outlets B can collide at the center position of the gas channel H1, and the pressure and flow rate of the collided gases are close.
[0065] In the embodiment shown in FIG. 3 , the number of the air outlet pipe sections 12 is 2, the number of the air outlets B in a single air outlet pipe section 12 is 5, and the total number of the air outlets B is 10. The 10 air outlets B are symmetrically arranged on the left and right sides of the air inlet A. In addition, since the 10 air outlets B are also symmetrically arranged about the center of the circle of the air inlet pipe 10, the 5 air outlets B in a single air outlet pipe section 12 are symmetrically arranged up and down about the extension line of the horizontal diameter.
[0066] The air inlet pipe 10 is generally arranged coaxially with the gas channel H1, that is, the 10 air outlets B are arranged symmetrically about the central axis of the gas channel H1. In this way, it can be ensured that the air pressure and flow rate on the left and right sides are symmetrically distributed after the gas enters from the air inlet flange 20, and the air pressure and flow rate are also symmetrically distributed up and down about the extension line of the horizontal diameter, which is obviously more conducive to gas collision and improves the uniformity of the initial air flow field entering the reactor.
[0067] Figure 4a A schematic diagram of the direction of gas ejection from each gas outlet B in the air inlet pipe 10 provided in one embodiment of the present application is shown. In an optional embodiment, the opening directions of each gas outlet B in the gas outlet pipe sections 12 on both sides are symmetrically distributed facing each other.
[0068] In this embodiment, the gases ejected from the two aligned gas outlets B in the gas outlet pipe sections 12 on both sides collide with each other, and the distances between the two gas outlets B and the gas inlet A are equal, so the air pressure and the ejection flow rate are similar, and the collision position is close to the middle plane defined by the center line of the gas outlet A and the central axis of the gas channel H1, which is conducive to forming a uniform gas flow field.
[0069] In the illustrated embodiment, the number of the air outlet pipe sections 12 is 2 and the number of the air outlets B in a single air outlet pipe section 12 is 5, and the air pressure and flow rate of the two air outlets B aligned on both sides are similar. Although the air pressure and flow rate of the two air outlets B farthest and closest to the air inlet A in a single air outlet pipe section 12 have certain differences, the air outlet pipe section 12 is limited to the arc pipe section range of 5° to 15°, so the air pressure and flow rate of the two air outlets B are not much different.
[0070] Figure 4bA schematic diagram of the direction of gas ejection from each gas outlet B in the air inlet pipe 10 provided in another embodiment of the present application is shown. In an optional embodiment, the extension lines of the opening directions of each gas outlet B in the air outlet pipe sections 12 on both sides intersect at the central axis of the air inlet flange 20.
[0071] In this embodiment, the gas ejected from the two gas outlets B in the gas outlet pipe sections 12 on both sides, which are arranged symmetrically about the central axis of the gas inlet flange 20, is directed toward the central axis of the gas channel H1. This facilitates the collision of the gas ejected from each gas outlet B at the central axis of the gas channel H1, thereby facilitating the formation of a uniform gas flow field.
[0072] In the illustrated embodiment, the number of the air outlet pipe segments 12 is 2 and the number of the air outlets B in a single air outlet pipe segment 12 is 5. Although the distances between the two centrally symmetrical air outlets B and the air inlet A may be different, since the air outlet pipe segment 12 is only limited to an arc-shaped pipe segment range of 5° to 15°, the air pressure and flow rate of the two air outlets B are not much different.
[0073] It can be seen that in the air intake structure 100 provided in the present application, two arc-shaped pipe sections can be selected on the air intake pipe 10 and are symmetrically arranged on both sides of the air intake pipe section 11 and are symmetrical about the central axis of the air intake flange 20. The two arc-shaped pipe sections can form at least one air outlet pipe section 12 correspondingly. Since the lengths of the two arc-shaped pipe sections are relatively short, the positions of the air outlets B in the air outlet pipe sections 12 are close to the air inlet A, and the air pressure and flow rate of the gas ejected from the air outlets B are close, which is more conducive to ensuring the uniformity of the initial air intake flow field entering the reactor.
[0074] In some optional embodiments, the tubular PECVD equipment further includes at least one ark structure 200, and the ark structure 200 can be disposed in the reaction furnace.
[0075] The ark structure 200 includes an ark frame 210 and a flow equalizer 220, and the flow equalizer 220 is disposed at both ends of the ark frame 210. The flow equalizer 220 has a multi-layer flow distribution structure to allow airflow to flow into or out of the ark frame 210 in layers.
[0076] In this embodiment, flow equalizers 220 are fixedly installed at both ends of the ark frame 210, and the flow equalizers 220 are provided with a multi-layer flow distribution structure, through which airflow stratification is formed in the ark frame 210 to flow through the ark frame 210. It should be understood that since the initial inlet gas outflow into the reactor has a high uniformity, the airflow stratification of each layer also has a high uniformity.
[0077] Figure 5 This is a schematic diagram of a flow plate provided according to one embodiment of the present application. Figure 5In a further optional embodiment, the flow equalizer plate 220 is provided with a plurality of flow guide holes H3, the plurality of flow guide holes H3 are arranged in an array, and the multi-layer flow diversion structure includes a plurality of layers of flow guide hole rows L formed by the plurality of flow guide holes H3.
[0078] The ark frame 210 includes a plurality of boat plates 211 , which are stacked and arranged at intervals, and there is at least one layer of guide hole row L between two adjacent boat plates 211 .
[0079] In this embodiment, the flow equalizer 220 is provided with a plurality of guide holes H3 arranged in an array, and accordingly, a plurality of guide hole rows L arranged at intervals are formed, and each layer of guide hole rows L can form a layer of airflow stratification and includes a plurality of guide holes H3 arranged at intervals.
[0080] The ark frame 210 also includes boat plates 211 stacked at intervals, and materials to be coated can be placed on the boat plates 211. After the ark frame 210 is fixed in the reactor, the boat plates 211 are extended and arranged along the gas flow direction in the reactor, and multiple boat plates 211 are arranged at intervals perpendicular to the gas flow direction in the reactor, and a gap is formed between two adjacent boat plates 211 for gas to pass through.
[0081] Since there is at least one layer of guide hole row L between two adjacent boat plates 211, airflow stratification is formed between two adjacent boat plates 211 through the guide hole row L to ensure that each layer of gap between the multiple boat plates 211 has uniform airflow stratification, thereby ensuring that a coating with uniform thickness can be formed.
[0082] In some applications, the flow plate is an insulating ceramic plate, and the gap between two adjacent boat plates 211 generally corresponds to only one layer of guide hole row L, which can be adjusted adaptively according to the situation. The ark structure 200 is generally a graphite boat, and the number can be multiple. Multiple ark structures 200 are arranged at intervals in the axial direction of the reactor, and the axial direction of the reactor is the gas flow direction in the reactor.
[0083] It can be seen that the tubular PECVD equipment provided in the present application can form a uniform initial inlet air flow field at the furnace mouth of the reaction furnace through the above-mentioned air inlet structure 100, and cooperate with the flow plate 220 to form a uniform air flow layer through each layer of gap between multiple boat plates 211, so as to ensure that a coating with uniform thickness can be formed on the material to be coated.
[0084] Although the embodiments of the present application have been shown and described above, it can be understood that the above embodiments are exemplary and cannot be understood as limitations on the present application. Those skilled in the art can change, modify, replace and modify the above embodiments within the scope of the present application.
Claims
1. An air intake structure, characterized in that: It comprises an air intake pipe (10) and an air intake flange (20), the air intake flange (20) being provided with a gas passage (H1), the air intake pipe (10) being connected to the air intake flange (20) and being an arc-shaped pipeline having an arc length exceeding a semicircle circumference, and the air intake pipe (10) being located in the gas passage (H1); The air inlet pipe (10) comprises an air inlet pipe section (11) and air outlet pipe sections (12) symmetrically arranged on both sides of the air inlet pipe section (11).
2. The air intake structure according to claim 1, characterized in that: The air outlet pipe sections (12) on both sides are arranged symmetrically with respect to the central axis of the air inlet flange (20).
3. The air intake structure according to claim 1, characterized in that: The air inlet pipe section (11) is provided with an air inlet (A), and the air outlet pipe section (12) is provided with a plurality of air outlets (B); The multiple air outlets (B) in the air outlet pipe sections (12) on both sides are arranged symmetrically relative to the air inlet (A).
4. The air intake structure according to claim 3, characterized in that: The multiple air outlets (B) in the air outlet pipe sections (12) on both sides are arranged symmetrically about the center axis of the air inlet flange (20).
5. The air intake structure according to claim 4, characterized in that: The opening directions of the air outlets (B) in the air outlet pipe sections (12) on both sides are symmetrically distributed facing each other.
6. The air intake structure according to claim 4, characterized in that: Extension lines of the opening directions of the air outlets (B) in the air outlet pipe sections (12) on both sides intersect at the central axis of the air inlet flange (20).
7. The air intake structure according to any one of claims 1 to 6, characterized in that: A line connecting the closest end of the outlet pipe section (12) on one side to the inlet pipe section (11) and the center of the inlet flange (20) is a first line; A line connecting the farthest end of the outlet pipe section (12) on one side from the inlet pipe section (11) and the center of the inlet flange (20) is a second line; The acute angle formed by the first connecting line and the second connecting line is 5° to 15°.
8. A tubular PECVD device, characterized in that: It comprises a reaction furnace and an air intake structure (100) according to any one of claims 1 to 7, wherein the air intake flange (20) is arranged at the furnace opening of the reaction furnace.
9. The tubular PECVD equipment according to claim 8, characterized in that: It also includes at least one ark structure (200), and the ark structure (200) can be arranged in the reaction furnace; The ark structure (200) comprises an ark frame (210) and a flow equalizer (220), wherein the flow equalizer (220) is arranged at two ends of the ark frame (210); The flow equalizer (220) is provided with a multi-layer flow distribution structure to enable the airflow to flow into or out of the ark frame (210) in layers.
10. The tubular PECVD equipment according to claim 9, characterized in that: The flow equalizer plate (220) is provided with a plurality of flow guide holes (H3), the plurality of flow guide holes (H3) are arranged in an array, and the multi-layer flow splitting structure comprises a plurality of layers of flow guide hole rows (L) formed by the plurality of flow guide holes (H3); The ark frame (210) comprises a plurality of boat plates (211), wherein the plurality of boat plates (211) are stacked and arranged at intervals, and at least one layer of the guide hole row (L) corresponds between two adjacent boat plates (211).