Mass analyzer and ion implantation equipment

Abstract

The utility model belongs to the technical field of semiconductor technology, and discloses a mass analyzer and ion implantation equipment. The mass analyzer comprises a vacuum cavity and a magnet yoke. The vacuum cavity is internally provided with a vacuum channel through which an ion beam flows; outer magnetic poles are arranged on the opposite side faces of the magnet yokes, the vacuum cavity is located between the two outer magnetic poles, and inner magnetic poles corresponding to the outer magnetic poles are arranged on the side, close to the outer magnetic poles, of the vacuum channel. When the mass analyzer is used, the burdens of a power supply system and a heat dissipation system can be effectively reduced, and meanwhile, the three-dimensional shape of a magnetic induction line of a magnetic field formed by the inner magnetic pole can be more accurate, so that the analysis precision of an ion beam is effectively improved, and the focusing effect on target ions is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor process, in particular to a mass analyzer and ion implantation equipment. Background Art

[0002] Ion implantation refers to the process of accelerating and screening ions in a magnetic field and then injecting them into a substrate material with doped atoms under vacuum to form an implantation layer with special properties in the implanted area, thus achieving doping modification of the material. The mass analyzer is one of the key structures of the ion implantation system. Its function is to separate the target ions from the ion beam formed by the mixture of multiple groups of ions and to adjust the shape, uniformity, injection angle and transmission efficiency of the ion beam.

[0003] In the prior art, a mass analyzer includes a magnetic yoke and a vacuum chamber disposed inside the magnetic yoke. The vacuum chamber has a channel for the ion beam to flow. The magnetic yoke has two sets of oppositely disposed external magnetic poles, and the vacuum chamber is located between the two sets of external magnetic poles to form a magnetic field in the channel to deflect the target ions to a specific position.

[0004] However, the channel in the vacuum chamber needs to be kept in a vacuum state, so the outer magnetic poles are isolated from the channel in the vacuum chamber, resulting in a large distance between the outer magnetic poles and the ion beam. In order to ensure that the magnetic field strength in the channel meets the requirements, the electromagnetic coil needs to be powered by a large current, resulting in a large burden on the power supply system and the heat dissipation system. In addition, the two sets of outer magnetic poles are separated by the vacuum chamber, which will also cause a large error in the three-dimensional shape of the magnetic flux lines of the magnetic field formed between the two sets of outer magnetic poles, which will reduce the analysis accuracy of the ion beam and worsen the focusing effect. Utility Model Content

[0005] The purpose of the utility model is to provide a mass analyzer and ion implantation equipment to solve the problem in the prior art that due to the large distance between the external magnetic pole and the ion beam, the external magnetic pole needs a large current when generating a magnetic field of a specific intensity, resulting in a large burden on the power supply system and the heat dissipation system. It also solves the problem that due to the two groups of external magnetic poles being separated by a vacuum chamber, the distance between the external magnetic poles is large, the three-dimensional shape error of the magnetic flux lines of the magnetic field formed is large, resulting in reduced analysis accuracy of the magnetic field for the ion beam and poor focusing effect.

[0006] To achieve this purpose, the utility model adopts the following technical solutions:

[0007] In a first aspect, the utility model provides a mass analyzer, comprising:

[0008] A vacuum chamber having a vacuum channel inside for the ion beam to flow;

[0009] A magnetic yoke, wherein opposite sides of the magnetic yoke are provided with outer magnetic poles, the vacuum cavity is located between the two outer magnetic poles, and an inner magnetic pole corresponding to the outer magnetic pole is provided on one side of the vacuum channel close to the outer magnetic poles.

[0010] Optionally, the side of the vacuum chamber has a mounting port communicating with the vacuum channel, and the mass analyzer further comprises:

[0011] A magnetic pole plate is fixed in the mounting opening and closes the vacuum channel, and the inner magnetic pole is fixed on one side of the magnetic pole plate close to the vacuum channel.

[0012] Optionally, a sealing member abutting against the magnetic pole plate is provided in the mounting opening.

[0013] Optionally, there is a gap between the magnetic pole plate and the outer magnetic pole.

[0014] Optionally, the height of the magnetic pole plate is less than or equal to the depth of the mounting opening.

[0015] Optionally, the length of the mounting opening is smaller than the length of the vacuum channel, and the side wall of the magnetic pole plate abuts against the side wall of the mounting opening.

[0016] Optionally, the vacuum chamber comprises:

[0017] A vacuum shell, wherein the vacuum shell has the vacuum channel therein, the vacuum shell is disposed between the two outer magnetic poles, and the inner magnetic pole is embedded on a side of the vacuum shell close to the outer magnetic poles;

[0018] an inlet cover plate, disposed at an opening at one end of the vacuum housing and having an inlet slit communicating with the vacuum channel; and

[0019] An outlet cover plate is arranged at the other end opening of the vacuum shell and has an outlet slit communicated with the vacuum channel.

[0020] Optionally, the magnetic yoke comprises:

[0021] A middle magnetic yoke, wherein the opposite ends of the middle magnetic yoke are respectively provided with end magnetic yokes, and the outer magnetic poles are provided on the opposite sides of the two end magnetic yokes.

[0022] Optionally, the mass analyzer further comprises:

[0023] A detection member, used to detect the strength of the magnetic field in the vacuum channel; and

[0024] A controller is communicatively connected with the detection element.

[0025] In a second aspect, the utility model also provides an ion implantation device, which comprises:

[0026] A mass analyzer as described in any one of the first aspects;

[0027] an ion source for emitting an ion beam into a vacuum channel within the mass analyzer; and

[0028] A cooling component is used to cool the outer magnetic pole and the vacuum chamber of the mass analyzer.

[0029] Beneficial effects of the utility model:

[0030] On the one hand, by setting the outer magnetic pole and the inner magnetic pole, when a magnetic field is formed in the vacuum channel, the outer magnetic pole is first energized to generate a magnetic field. After the magnetic field magnetizes the inner magnetic pole, the inner magnetic pole will also form a magnetic field, and one side of the inner magnetic pole extends into the vacuum channel, so the outer magnetic pole and the inner magnetic pole can directly form a specific magnetic field in the vacuum channel. In this way, when the mass analyzer is in use, compared with setting the outer magnetic pole outside the vacuum chamber, the outer magnetic pole and the inner magnetic pole in this embodiment are connected to the vacuum channel, so the current required by the outer magnetic pole to form a specified magnetic field in the vacuum channel is smaller, which can effectively reduce the burden on the power supply system and the heat dissipation system. At the same time, the distance between the two inner magnetic poles is small, and there is no barrier structure between the two, which can make the three-dimensional shape of the magnetic flux lines of the magnetic field formed by the inner magnetic pole more accurate, thereby effectively improving the analysis accuracy of the ion beam and improving the focusing effect on the target ions.

[0031] Secondly, when the ion implantation device is in use, the ion source can continuously input an ion beam into the mass analyzer, and the mass analyzer forms a specific magnetic field in the vacuum channel according to the operation requirements, so that the target ions are deflected in a specific direction and fly out of the mass analyzer. When the mass analyzer is running, the cooling component can continue to operate to cool the outer magnetic pole and the vacuum cavity to maintain the temperature in the vacuum channel 11. The cooling system can adopt a water cooling mode to ensure good cooling efficiency through the circulation of cooling water. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] Figure 1 is a side sectional view of a mass analyzer in an embodiment of the utility model;

[0033] Figure 2 It is a planar cross-sectional view of the mass analyzer in the embodiment of the utility model.

[0034] In the figure:

[0035] 1. Vacuum chamber; 11. Vacuum channel; 12. Vacuum shell; 13. Inlet cover plate; 131. Inlet slit; 14. Outlet cover plate; 141. Outlet slit; 2. Magnetic yoke; 21. End yoke; 22. Middle yoke; 3. Outer magnetic pole; 31. Coil; 4. Inner magnetic pole; 5. Seal; 6. Magnetic pole plate. DETAILED DESCRIPTION

[0036] The present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It is to be understood that the specific embodiments described herein are only used to explain the present invention, rather than to limit the present invention. It should also be noted that, for ease of description, only the parts related to the present invention, rather than all structures, are shown in the accompanying drawings.

[0037] In the description of the present invention, unless otherwise clearly specified and limited, the terms "connected", "connected", and "fixed" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0038] In the present utility model, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may include that the first and second features are in direct contact, or may include that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, a first feature being "above", "above" and "above" a second feature includes that the first feature is directly above and obliquely above the second feature, or simply indicates that the first feature is higher in level than the second feature. A first feature being "below", "below" and "below" a second feature includes that the first feature is directly below and obliquely below the second feature, or simply indicates that the first feature is lower in level than the second feature.

[0039] In the description of this embodiment, the terms "upper", "lower", "left", "right" and other directions or positional relationships are based on the directions or positional relationships shown in the drawings, and are only for the convenience of description and simplified operation, rather than indicating or implying that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore cannot be understood as a limitation of the present invention. In addition, the terms "first" and "second" are only used to distinguish in the description and have no special meaning.

[0040] The utility model embodiment discloses a mass analyzer and ion implantation equipment.

[0041] Reference Figure 1 and Figure 2The mass analyzer includes a vacuum chamber 1 and a magnetic yoke 2. The vacuum chamber 1 has a vacuum channel 11 for the ion beam to flow; the opposite sides of the magnetic yoke 2 are provided with external magnetic poles 3, the vacuum chamber 1 is located between the two external magnetic poles 3, and the side of the vacuum channel 11 close to the external magnetic poles 3 is provided with an internal magnetic pole 4 corresponding to the external magnetic pole 3. The internal magnetic pole 4 is magnetized under the magnetic field of the external magnetic pole 3 to form a magnetic field between the vacuum chamber 1 and the two internal magnetic poles 4 to deflect the ion beam.

[0042] Specifically, the yoke 2 may be C-shaped, including a middle yoke 22, with end yokes 21 disposed at opposite ends of the middle yoke 22, and outer magnetic poles 3 disposed on opposite sides of the two end yokes 21. The outer magnetic pole 3 is an electromagnetic module, with a coil 31 sleeved on the outer side of the outer magnetic pole 3, the outer magnetic pole 3 is fixed to the inner wall of the end yoke 21, and the coil 31 is wound around the outer side of the outer magnetic pole 3. The outer magnetic pole 3 may be made of DT4C electromagnetic pure iron, and the coil 31 may be made of TU1 oxygen-free copper. The vacuum chamber 1 is located between the two outer magnetic poles 3, and slit openings for ion beam injection and ejection are disposed at both ends of the vacuum chamber 1, respectively. The shape and position of the specific slit openings may be designed according to the characteristics of the target ion deflection in the magnetic field.

[0043] A set of inner magnetic poles 4 are arranged on the upper and lower sides of the vacuum chamber 1 and respectively correspond to the outer magnetic poles 3. The inner magnetic poles 4 can be embedded in the side wall of the vacuum chamber 1, and the inner magnetic poles 4 can be magnetized under the magnetic field of the outer magnetic poles 3. The magnetized inner magnetic poles 4 can form a specific magnetic field in the vacuum channel 11 to ensure that the target ions in the ion beam can be smoothly deflected to the specified direction.

[0044] By setting the outer magnetic pole 3 and the inner magnetic pole 4, when a magnetic field is formed in the vacuum channel 11, the outer magnetic pole 3 is first energized to generate a magnetic field. After the magnetic field magnetizes the inner magnetic pole 4, the inner magnetic pole 4 will also form a magnetic field, and one side of the inner magnetic pole 4 extends into the vacuum channel 11, so the outer magnetic pole 3 and the inner magnetic pole 4 can directly form a specific magnetic field in the vacuum channel 11. In this way, when the mass analyzer is used, compared with setting the outer magnetic pole 3 outside the vacuum chamber 1, the outer magnetic pole 3 and the inner magnetic pole 4 in this embodiment are connected to the vacuum channel 11, so that the current required by the outer magnetic pole 3 when forming a specified magnetic field in the vacuum channel 11 is small, which can effectively reduce the burden of the power supply system and the heat dissipation system. At the same time, the distance between the two inner magnetic poles 4 is small, and there is no barrier structure between the two, which can make the three-dimensional shape of the magnetic flux lines of the magnetic field formed by the inner magnetic pole 4 more accurate, thereby effectively improving the analysis accuracy of the ion beam and improving the focusing effect on the target ions.

[0045] Optionally, the side of the vacuum chamber 1 has a mounting opening connected to the vacuum channel 11, and the mass analyzer further comprises a magnetic pole plate 6. The magnetic pole plate 6 is fixed to the mounting opening and closes the vacuum channel 11, and the inner magnetic pole 4 is arranged on the magnetic pole plate 6 and extends into the vacuum channel 11.

[0046] Specifically, an installation opening is provided on the outer surface of the vacuum chamber 1, the installation opening is connected to the vacuum channel 11, and the magnetic pole plate 6 is installed in the installation opening. The magnetic pole plate 6 can be fixed to the installation opening by bonding, clamping or bolting to form a sealed connection to ensure the airtightness of the vacuum channel 11. The outer side of the magnetic pole plate 6 corresponds to the outer magnetic pole 3, and the inner magnetic pole 4 is arranged on the inner side of the magnetic pole plate 6. The inner magnetic pole 4 and the outer magnetic pole 3 can be an integral structure, or they can be fixed together by bonding or bolting. The side of the inner magnetic pole 4 away from the magnetic pole plate 6 extends into the vacuum channel 11, and a deflection channel for the ion beam to pass through is formed between the two inner magnetic poles 4. The inner magnetic pole 4 is made of a material that can be magnetized to generate a magnetic field.

[0047] By setting the magnetic pole plate 6, while providing a fixed installation position for the inner magnetic pole 4, the distance between the outer magnetic pole 3 and the inner magnetic pole 4 can be made only slightly larger than the thickness of the magnetic pole plate 6, effectively reducing the distance between the inner magnetic pole 4 and the outer magnetic pole 3. Moreover, the magnetic pole plate 6 is fixed on the vacuum chamber 1, and can also effectively seal the side wall of the vacuum chamber 1 to ensure that the vacuum degree in the vacuum channel 11 meets the operating requirements. The inner magnetic pole 4 can be magnetized in the magnetic field generated by the power supply of the outer magnetic pole 3.

[0048] Optionally, a sealing member 5 abutting against the magnetic pole plate 6 is provided in the installation opening.

[0049] Specifically, a sealing groove for accommodating the sealing member 5 can be opened on the bottom wall of the installation port, and the sealing groove is arranged around the circumference of the installation port. The sealing member 5 can be a sealing strip, which can have a certain elasticity. The lower side of the sealing strip is filled in the sealing groove, and the upper side of the sealing strip extends out of the sealing groove and presses against the bottom wall of the magnetic pole plate 6 to form a seal.

[0050] The sealing strip can also be arranged on the side wall of the installation opening, in which case the sealing strip abuts against the side wall of the magnetic pole plate 6, and can also form a seal, and the position of the sealing member 5 can be arranged according to the actual installation difficulty. It should be understood that the sealing member 5 can also be in the form of a sheet, in which case it is no longer necessary to set a sealing groove or other structure, and the specific type of the sealing member 5 can be designed according to the actual sealing requirements, and the utility model does not limit it.

[0051] By providing the installation opening, not only can a space be provided for the installation of the magnetic pole plate 6, but the magnetic pole plate 6 can also be embedded in the installation opening to effectively increase the contact area between the magnetic pole plate 6 and the vacuum chamber 1, thereby improving the sealing effect. Furthermore, by providing the sealing member 5, the gap between the magnetic pole plate 6 and the vacuum chamber 1 can be further closed, thereby further improving the sealing effect and ensuring the vacuum degree in the vacuum channel 11.

[0052] Optionally, the sealing member 5 is made of fluororubber.

[0053] Specifically, the sealing strip made of fluororubber can have good high temperature resistance, ensuring that when the outer magnetic pole 3 generates more heat due to continuous operation and causes the temperature to rise, the sealing member 5 can still maintain good sealing between the magnetic pole plate 6 and the vacuum chamber 1. Moreover, the fluororubber also has low gas permeability, that is, the sealing member 5 can effectively prevent gas leakage, thereby effectively ensuring the vacuum in the vacuum channel 11. It should be understood that the sealing member 5 can also be made of other materials that meet the requirements, which can meet the requirements of effective sealing between the magnetic pole plate 6 and the vacuum chamber 1 during long-term operation.

[0054] Optionally, there is a gap between the magnetic pole plate 6 and the outer magnetic pole 3 .

[0055] Specifically, the gap can be reserved according to the size of the magnetic pole plate 6 and the outer magnetic pole 3, and the gap is small to ensure that the gap has a small enough effect on the magnetic field. By setting the gap, the error between the magnetic pole plate 6 and the outer magnetic pole 3 during installation can be adjusted to ensure that the two will not interfere with each other during installation.

[0056] Optionally, the height of the magnetic pole plate 6 is less than or equal to the depth of the mounting opening.

[0057] Specifically, the depth of the installation opening can be kept consistent with the thickness of the magnetic pole plate 6, so that the magnetic pole plate 6 is just embedded in the installation opening. During installation, as long as it is ensured that the outer wall of the vacuum chamber 1 does not contact the outer magnetic pole 3, the above-mentioned gap can be smoothly formed between the magnetic pole plate 6 and the outer magnetic pole 3 after the installation is completed.

[0058] Optionally, the length of the installation opening is smaller than the length of the vacuum channel 11 , and the side wall of the magnetic pole plate 6 abuts against the side wall of the installation opening.

[0059] Specifically, the installation opening is opened at the middle position of the extension direction of the vacuum chamber 1. In this embodiment, the vacuum chamber 1 is bent and extended, and the installation opening is opened at the bent part of the vacuum chamber 1. The side wall of the magnetic pole plate 6 abuts against the installation opening, so that the magnetic pole plate 6 can completely fill the installation opening, which can effectively seal the installation opening on the one hand, and can also make the inner magnetic pole 4 bend and extend in the same direction on the other hand, so as to smoothly form an effective magnetic field on the ion beam deflection path.

[0060] Optionally, the yoke 2 and the inner magnetic pole 4 are both made of DT4C electromagnetic pure iron.

[0061] Specifically, DT4C electromagnetic pure iron is a material with high magnetic permeability. The yoke 2 and the inner magnetic pole 4 made of DT4C electromagnetic pure iron can be magnetized in a magnetic field. The magnetized yoke 2 and the inner magnetic pole 4 can form a magnetic field, thereby forming a magnetic field of a specific intensity in the vacuum channel 11.

[0062] Optionally, the vacuum chamber 1 comprises a vacuum shell 12, an inlet cover plate 13 and an outlet cover plate 14. The vacuum shell 12 has a vacuum channel 11 therein, the vacuum shell 12 is arranged between the two outer magnetic poles 3, and the inner magnetic pole 4 is embedded on the side of the vacuum shell 12 close to the outer magnetic poles 3; the inlet cover plate 13 is arranged at an opening at one end of the vacuum shell 12 and has an inlet slit 131 communicating with the vacuum channel 11; the outlet cover plate 14 is arranged at an opening at the other end of the vacuum shell 12 and has an outlet slit 141 communicating with the vacuum channel 11.

[0063] Specifically, the vacuum shell 12 is in the shape of an elongated strip and is bent and extended to adapt to the deflection of the ion beam in the magnetic field. The interior of the vacuum shell 12 is hollow as a vacuum channel 11. Both ends of the vacuum shell 12 are provided with openings, wherein one end opening corresponds to the ion source as an entrance, and the other end serves as an exit. An entrance cover plate 13 is provided at the entrance, and an exit cover plate 14 is provided at the exit. An entrance slit 131 is provided at the middle position of the entrance cover plate 13, and its opening shape can be designed according to the ion beam. An exit slit 141 is provided at the middle position of the exit cover plate 14, and the size and shape of the exit slit 141 can be designed according to the deflection of the target ion. In the present embodiment, the size of the entrance slit 131 is larger than the size of the exit slit 141.

[0064] Optionally, the vacuum housing 12 is made of aluminum alloy.

[0065] Specifically, the vacuum shell 12 made of aluminum alloy is light in weight, high in strength, and has good thermal conductivity. In addition, the aluminum alloy is easy to process, and the vacuum shell 12 can be bent in a specific direction to adapt to the deflection of target ions in the magnetic field. In addition, the vacuum shell 12 made of aluminum alloy can ensure non-magnetic properties to reduce interference with the ion beam.

[0066] Optionally, the inlet cover plate 13 and the outlet cover plate 14 are both made of graphite material.

[0067] Specifically, the graphite material may be TX76 graphite (TX-76 high-strength fine structure high-purity graphite), which has high density and mechanical strength, as well as good oxidation resistance, self-lubrication and thermal conductivity. The inlet cover plate 13 and the outlet cover plate 14 are made of graphite material, so that the inlet cover plate 13 and the outlet cover plate 14 will not deform at high temperatures, thereby ensuring that the inlet slit 131 and the outlet slit 141 will not deform. Moreover, the graphite material also has excellent electrical conductivity, and can quickly transfer charges when ions in the ion beam accumulate, so as to avoid charge accumulation and affect the stability of the equipment operation.

[0068] Optionally, the mass analyzer further comprises a detection element and a controller. The detection element is used to detect the strength of the magnetic field in the vacuum channel 11; and the controller is in communication connection with the detection element.

[0069] Specifically, the detection component can be a Gaussmeter, and the probe of the Gaussmeter is located in the middle position between the two inner magnetic poles 4 to detect the magnetic field between the two inner magnetic poles 4. It should be understood that the detection component can be other components besides the Gaussmeter, such as a magnetoresistor, etc. The utility model does not limit the specific type of the detection component. The outer magnetic pole 3 is an electromagnetic module, and the controller can obtain the data detected by the detection component, and can control the current of the outer magnetic pole 3 according to the detected data, such as increasing the current or decreasing the current. The specific control principle of the controller can refer to the prior art, and the utility model has no improvement on this, so it will not be repeated.

[0070] By setting up a detection device, the magnetic field strength can be detected in real time, and the current is adjusted in real time through the controller according to the magnetic field strength to adjust the operating state of the outer magnetic pole 3, so as to achieve closed-loop control of the magnetic field strength adjustment and realize flexible adjustment of the magnetic field strength.

[0071] The ion implantation device comprises: an ion source, a cooling assembly and the mass analyzer as described above; the ion source is used to emit ion beams to a vacuum channel 11 in the mass analyzer; and the cooling assembly cools the outer magnetic pole 3 and the vacuum chamber 1 of the mass analyzer.

[0072] When the ion implantation device is in use, the ion source can continuously input an ion beam into the mass analyzer, and the mass analyzer forms a specific magnetic field in the vacuum channel 11 according to the operation requirements, so that the target ions are deflected in a specific direction and fly out of the mass analyzer. When the mass analyzer is running, the cooling component can continue to operate to cool the outer magnetic pole 3 and the vacuum chamber 1 to maintain the temperature in the vacuum channel 11. The cooling system can adopt a water cooling mode to ensure good cooling efficiency through the circulation of cooling water.

[0073] Obviously, the above embodiments of the present invention are merely examples for the purpose of clearly illustrating the present invention, and are not intended to limit the implementation methods of the present invention. For those skilled in the art, various obvious changes, readjustments and substitutions can be made without departing from the scope of protection of the present invention. It is not necessary and impossible to list all implementation methods here. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention shall be included in the scope of protection of the claims of the present invention.

Claims

1. A mass analyzer, characterized in that include: A vacuum chamber (1) having a vacuum channel (11) inside for the ion beam to flow; A magnetic yoke (2), wherein opposite sides of the magnetic yoke (2) are provided with external magnetic poles (3), the vacuum chamber (1) is located between the two external magnetic poles (3), and an internal magnetic pole (4) corresponding to the external magnetic pole (3) is provided on a side of the vacuum channel (11) close to the external magnetic poles (3).

2. The mass analyzer according to claim 1, characterized in that The side surface of the vacuum chamber (1) has a mounting port communicating with the vacuum channel (11), and the mass analyzer further comprises: A magnetic pole plate (6) is fixed in the mounting opening and closes the vacuum channel (11); and the inner magnetic pole (4) is fixed on a side of the magnetic pole plate (6) close to the vacuum channel (11).

3. The mass analyzer according to claim 2, characterized in that A sealing member (5) abutting against the magnetic pole plate (6) is arranged in the installation opening.

4. The mass analyzer according to claim 2, characterized in that There is a gap between the magnetic pole plate (6) and the outer magnetic pole (3).

5. The mass analyzer according to claim 2, characterized in that The height of the magnetic pole plate (6) is less than or equal to the depth of the installation opening.

6. The mass analyzer according to claim 2, characterized in that The length of the installation opening is smaller than the length of the vacuum channel (11), and the side wall of the magnetic pole plate (6) abuts against the side wall of the installation opening.

7. The mass analyzer according to claim 1, characterized in that The vacuum chamber (1) comprises: A vacuum shell (12), wherein the vacuum shell (12) has the vacuum channel (11) therein, the vacuum shell (12) is arranged between the two outer magnetic poles (3), and the inner magnetic pole (4) is embedded on a side of the vacuum shell (12) close to the outer magnetic poles (3); an inlet cover plate (13), which is disposed at an opening at one end of the vacuum housing (12) and has an inlet slit (131) communicating with the vacuum channel (11); and An outlet cover plate (14) is arranged at the other end opening of the vacuum housing (12) and has an outlet slit (141) communicating with the vacuum channel (11).

8. The mass analyzer according to claim 1, characterized in that The magnetic yoke comprises: A middle magnetic yoke (22), wherein end magnetic yokes (21) are respectively arranged at opposite ends of the middle magnetic yoke (22), and the outer magnetic poles (3) are arranged on opposite sides of the two end magnetic yokes (21).

9. The mass analyzer according to any one of claims 1 to 8, characterized in that The mass analyzer further comprises: A detection member, used for detecting the intensity of the magnetic field in the vacuum channel (11); and A controller is communicatively connected with the detection element.

10. Ion implantation equipment, characterized in that include: A mass analyser as claimed in any one of claims 1 to 9; An ion source for emitting an ion beam toward a vacuum channel (11) in the mass analyzer; as well as A cooling component is used to cool the outer magnetic pole (3) and the vacuum chamber (1) of the mass analyzer.

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