Polycrystalline material synthesis device

Abstract

The utility model relates to the technical field of crystal manufacturing equipment, and discloses a polycrystalline material synthesizing device which comprises a base and a synthesizing assembly, the synthesizing assembly is located above the base and comprises a polycrystalline furnace, the polycrystalline furnace is fixedly installed above the base, a movable shaft is movably installed at the upper end of the left end of the polycrystalline furnace, and the lower end of the polycrystalline furnace is provided with a rotating shaft. A first cover plate is movably mounted at the outer end of the movable shaft. According to the polycrystalline material synthesizing device, by installing the synthesizing assembly and heating synthesized polycrystals, through cooperation of the first discharging plate, the fixing shaft and other components, the second discharging plate and the first discharging plate can be kept on the same level, the synthesized polycrystals slide into the aqua regia from the first discharging plate and the fixing shaft to be cleaned, it is avoided that the heated polycrystals need to wait for cooling, and the cooling efficiency of the polycrystals is improved. And the polycrystalline is manually taken out for cleaning, so that a large amount of time is wasted during cooling of the polycrystalline, the time for carrying out the next step is prolonged, the processing efficiency of the device is influenced, and the practicability of the device is favorably improved.

Description

Technical Field

[0001] The utility model relates to the technical field of crystal manufacturing equipment, in particular to a polycrystalline material synthesis device. Background Art

[0002] Optical evaporation materials are key materials for preparing optical films. Optical films are an important type of optical element. They are widely used in modern optics, optoelectronics, optical engineering and other related scientific and technological fields. Optical films can perform spectral transmission, spectral reflection, spectral absorption, and change the polarization state or phase of light. They are used as various reflective films, anti-reflection films and interference filters. They give optical elements various performance properties and play an important or decisive role in the quality of optical instruments. Among the various types of optical film materials, titanium pentoxide crystals are very popular in the market because of their high refractive index, good stability and firmness in the visible and near-infrared spectrum.

[0003] After the heating synthesis, the polycrystals generally need to be taken out manually before the next cleaning step. The synthesized polycrystals need to wait for cooling before they can be taken out manually. The cooling process takes too much time, resulting in an increase in the time for the next step, thereby affecting the processing efficiency of the device. Utility Model Content

[0004] 1. Technical issues to be resolved

[0005] The utility model aims to provide a polycrystalline material synthesis device to solve the problem in the above background technology that the synthesized polycrystalline needs to be cooled before being taken out for the next step, which reduces the processing efficiency of the device.

[0006] (II) Technical solution

[0007] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a polycrystalline material synthesis device, comprising a base and a synthesis component, wherein the synthesis component is located above the base, and the synthesis component comprises a polycrystalline furnace, wherein the polycrystalline furnace is fixedly installed above the base, a movable shaft is movably installed at the upper end of the left end of the polycrystalline furnace, a cover plate is movably installed at the outer end of the movable shaft, a support frame is fixedly installed inside the polycrystalline furnace, a reaction tank is fixedly installed at the inner end of the support frame, a heating tube is fixedly installed at the lower end inside the polycrystalline furnace, a heat conduction plate is fixedly installed at the outer end of the heating tube, a discharge port is opened in the middle of the left end of the polycrystalline furnace, and a discharge plate is fixedly installed inside the discharge port.

[0008] Preferably, a fixed shaft is movably installed on the outer end of the discharge plate one, and a discharge plate two is movably installed on the outer end of the fixed shaft. A notch is opened in the middle of the left end of the polycrystalline furnace, and an adjusting column is movably installed inside the notch. The adjusting column is at the lower end of the left end of the reaction tank. By installing a synthesis component, the synthesized polycrystals are heated. Through the cooperation between the discharge plate one, the fixed shaft and other components, the discharge plate two and the discharge plate one can be kept at the same level. The synthesized polycrystals slide from it into the aqua regia tank for cleaning, which avoids the need to wait for the heated polycrystals to cool down and then be manually taken out for cleaning, which results in a lot of time wasted when the polycrystals are cooled, resulting in an increase in the time for the next step, thereby affecting the processing efficiency of the device and helping to improve the practicability of the device.

[0009] Preferably, a cleaning assembly is provided above the polycrystalline furnace, and the cleaning assembly includes a support column, a water trough is fixedly installed on the upper end of the support column, slide grooves are provided on the left and right ends of the upper end of the water trough, and a push plate is movably installed inside the water trough.

[0010] Preferably, sliders are fixedly installed on the left and right ends of the push plate, and the sliders are movably installed inside the slide groove. A material discharge chute is opened inside the king water trough, and a sealing plate is movably installed inside the material discharge chute. The rear end of the king water trough is fixedly connected to a water inlet pipe, and a water outlet is opened in the middle of the king water trough.

[0011] Preferably, an alcohol box is fixedly installed on the left end of the upper end of the base, and the alcohol box is located below the aqua regia tank. A cover plate 2 is movably installed at the rear end of the upper end of the alcohol box, and an isolation tube is fixedly installed in the middle of the interior of the alcohol box. By installing the cleaning component, when the polycrystals are cleaned in the aqua regia tank, the polycrystals can be directly put from the aqua regia tank into the alcohol box for dehydration through the cooperation between the push plate and the discharge chute and other components, thereby avoiding the need for manual cleaning during use, which leads to increased labor costs, thereby affecting the use effect of the device and is conducive to improving the practicability of the device.

[0012] Preferably, the isolation tube passes through the base, the lower end of the water outlet is fixedly connected to a water outlet pipe, the water outlet pipe is inside the isolation tube, an ultrasonic cleaning machine is fixedly installed at the front end of the upper end of the base, and the right end of the ultrasonic cleaning machine is fixedly connected to a drain pipe. By installing the cleaning assembly, when the polycrystals are being cleaned, the polycrystals do not need to be taken out again after soaking through the cooperation between the regia tank and the water inlet pipe and other components. The water flow can directly fill the regia tank with water from the water inlet pipe so that it can be directly rinsed, avoiding the need to rinse the polycrystals and then take them out again, which wastes time and causes a waste of time in the retrieval process, thereby affecting subsequent cleaning work and helping to improve the processing efficiency of the device.

[0013] Compared with the prior art, the beneficial effects of the utility model are:

[0014] 1. The polycrystalline material synthesis device, by installing the synthesis component, heats the synthesized polycrystals, and through the cooperation between the discharge plate 1, the fixed shaft and other components, the discharge plate 2 can be kept at the same level as the discharge plate 1, and the synthesized polycrystals slide from it into the aqua regia tank for cleaning, avoiding the need for the heated polycrystals to wait for them to cool down and then be manually taken out for cleaning, resulting in a large amount of time wasted when the polycrystals are cooled, resulting in an increase in the time for the next step, thereby affecting the processing efficiency of the device, which is conducive to improving the practicality of the device;

[0015] 2. The polycrystalline material synthesis device is equipped with a cleaning component. When the polycrystalline is being cleaned, the polycrystalline can be soaked without being taken out again through the cooperation between the aqua regia tank and the water inlet pipe. The water inlet pipe can directly fill the aqua regia tank with water flow, so that it can be directly washed, avoiding the need to wash the polycrystalline and then take it out again, resulting in a waste of time in the taking process, thereby affecting the subsequent cleaning work, which is conducive to improving the processing efficiency of the device;

[0016] 3. The polycrystalline material synthesis device is equipped with a cleaning component. When the polycrystals are cleaned in the aqua regia tank, the push plate, the discharge chute and other components cooperate to directly put the polycrystals from the aqua regia tank into the alcohol tank for dehydration, thereby avoiding the need for manual cleaning during use, which increases labor costs and affects the use effect of the device, and is conducive to improving the practicality of the device. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a schematic diagram of the three-dimensional structure of the utility model;

[0018] Figure 2 This is a schematic diagram of the partial structure of the cross-section of the synthetic component of the utility model;

[0019] Figure 3 It is a schematic diagram of the three-dimensional partial structure of the utility model;

[0020] Figure 4 It is a schematic diagram of the three-dimensional partial structure of the synthetic component of the utility model;

[0021] Figure 5 This is a three-dimensional partial enlarged structural diagram of the cleaning component of the utility model;

[0022] Figure 6 It is a three-dimensional partial enlarged structural schematic diagram of the synthetic component of the utility model.

[0023] In the figure: 1. base; 2. synthesis component; 201. polycrystalline furnace; 202. movable shaft; 203. cover plate 1; 204. support frame; 205. reaction tank; 206. heating tube; 207. heat conduction plate; 208. discharge port; 209. discharge plate 1; 210. fixed shaft; 211. discharge plate 2; 212. notch; 213. adjustment column; 3. cleaning component; 301. support column; 302. king water trough; 303. slide; 304. push plate; 305. slider; 306. discharge trough; 307. sealing plate; 308. water inlet pipe; 309. water outlet; 310. alcohol tank; 311. cover plate 2; 312. isolation pipe; 313. water outlet pipe; 314. ultrasonic cleaning machine; 315. drain pipe. DETAILED DESCRIPTION

[0024] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0025] See also Figure 1-Figure 6The utility model provides a technical solution: a polycrystalline material synthesis device, comprising a base 1 and a synthesis component 2, the synthesis component 2 is located above the base 1, the synthesis component 2 comprises a polycrystalline furnace 201, the polycrystalline furnace 201 is fixedly installed above the base 1, a movable shaft 202 is movably installed on the upper end of the left end of the polycrystalline furnace 201, a cover plate 203 is movably installed on the outer end of the movable shaft 202, a support frame 204 is fixedly installed inside the polycrystalline furnace 201, a reaction tank 205 is fixedly installed on the inner end of the support frame 204, a heating tube 206 is fixedly installed on the lower end of the polycrystalline furnace 201, a heat conducting plate 207 is fixedly installed on the outer end of the heating tube 206, a discharge port 208 is opened in the middle of the left end of the polycrystalline furnace 201, a discharge plate 209 is fixedly installed inside the discharge port 208, a fixed shaft 210 is movably installed on the outer end of the discharge plate 209, and a fixed A discharge plate 211 is movably installed at the outer end of the shaft 210, and a slot 212 is provided in the middle of the left end of the polycrystalline furnace 201. An adjusting column 213 is movably installed inside the slot 212. The adjusting column 213 is at the lower end of the left end of the reaction tank 205. During use, the polycrystalline is first placed in the reaction tank 205, and then the cover plate 203 is firmly closed with the polycrystalline furnace 201. After observing the sealing performance of the polycrystalline furnace 201, the heating tube 206 is operated through the regulator, and the heat generated by the heating tube 206 is continuously absorbed by the heat conducting plate 207 and transmitted to the reaction tank 205 to heat it for synthesis. When the synthesis is completed, the reaction tank 205 is shaken by pressing the adjusting column 213 into the slot 212. The shaking of the reaction tank 205 causes the discharge plate 211 to move downward along the fixed shaft 210 so that it is maintained at the same level as the discharge plate 209.

[0026] A cleaning assembly 3 is arranged above the polycrystalline furnace 201, and the cleaning assembly 3 includes a supporting column 301, a water trough 302 is fixedly installed on the upper end of the supporting column 301, slide grooves 303 are provided at the left and right ends of the upper end of the water trough 302, a push plate 304 is movably installed inside the water trough 302, sliders 305 are fixedly installed at the left and right ends of the push plate 304, the slider 305 is movably installed inside the slide groove 303, a material discharge trough 306 is provided inside the water trough 302, a sealing plate 307 is movably installed inside the material discharge trough 306, a water inlet pipe 308 is fixedly connected to the rear end of the water trough 302, a water outlet 309 is provided in the middle of the water trough 302, an alcohol tank 310 is fixedly installed at the left end of the upper end of the base 1, the alcohol tank 310 is located below the water trough 302, a cover plate 2 311 is movably installed at the rear end of the upper end of the alcohol tank 310, and a sealing plate 307 is fixedly installed in the middle of the inner part of the alcohol tank 310 There is an isolation tube 312, which runs through the base 1. The lower end of the water outlet 309 is fixedly connected to a water outlet pipe 313, and the water outlet pipe 313 is inside the isolation tube 312. An ultrasonic cleaner 314 is fixedly installed at the front end of the upper end of the base 1. The right end of the ultrasonic cleaner 314 is fixedly connected to a drain pipe 315. The synthesized polycrystals fall into the regia tank 302 and soak for 20 minutes. Then the water inside is discharged through the water outlet 309 and the water outlet pipe 313, and then the water inlet pipe 308 is connected to the water pump, so that the water source flows into the regia tank 302 along the water inlet pipe 308 to rinse the polycrystals. After completion, the water flows out along the water outlet pipe 313, and then the synthetic polycrystals in the regia tank 302 are dropped from the discharge trough 306 into the alcohol tank 310 through the manual push plate 304 to dehydrate them. Then they are taken out and placed in the ultrasonic cleaner 314 for vibration cleaning, and then taken out after completion.

[0027] Working principle: In use, first place the polycrystals in the reaction tank 205, then firmly close the cover plate 203 with the polycrystal furnace 201, observe the sealing of the polycrystal furnace 201, and operate the heating tube 206 through the regulator, and the heat generated by the heating tube 206 is continuously absorbed by the heat conducting plate 207 and transmitted to the reaction tank 205 to heat it for synthesis. When the synthesis is completed, the reaction tank 205 is shaken by pressing the regulating column 213 into the notch 212, and the shaking of the reaction tank 205 causes the discharge plate 211 to move downward along the fixed shaft 210, so that it is aligned with the discharge plate 211. 09 is kept at the same level. The synthesized polycrystals fall into the aqua regia tank 302 and soak for 20 minutes. The water inside is discharged through the water outlet 309 and the outlet pipe 313. The water in the aqua regia tank 302 is connected with the water pump through the water inlet pipe 308, so that the water source flows into the aqua regia tank 302 along the water inlet pipe 308 to rinse the polycrystals. After completion, the water flows out along the outlet pipe 313, and the synthetic polycrystals in the aqua regia tank 302 are dropped from the feed trough 306 into the alcohol tank 310 through the manual push plate 304 to dehydrate them. Then they are taken out and placed in the ultrasonic cleaning machine 314 for vibration cleaning. They can be taken out after completion.

[0028] Finally, it should be noted that the above content is only used to illustrate the technical solution of the utility model, rather than to limit the protection scope of the utility model. Simple modifications or equivalent substitutions of the technical solution of the utility model by ordinary technicians in this field do not deviate from the essence and scope of the technical solution of the utility model.

Claims

1. A polycrystalline material synthesis device, comprising a base (1) and a synthesis component (2), characterized in that: The synthesis component (2) is located above the base (1), and the synthesis component (2) comprises a polycrystalline furnace (201). The polycrystalline furnace (201) is fixedly mounted above the base (1), a movable shaft (202) is movably mounted on the upper end of the left end of the polycrystalline furnace (201), a cover plate (203) is movably mounted on the outer end of the movable shaft (202), a support frame (204) is fixedly mounted inside the polycrystalline furnace (201), a reaction tank (205) is fixedly mounted on the inner end of the support frame (204), a heating tube (206) is fixedly mounted on the lower end of the polycrystalline furnace (201), a heat conducting plate (207) is fixedly mounted on the outer end of the heating tube (206), a discharge port (208) is opened in the middle of the left end of the polycrystalline furnace (201), and a discharge plate (209) is fixedly mounted inside the discharge port (208).

2. A polycrystalline material synthesis device according to claim 1, characterized in that: A fixed shaft (210) is movably mounted on the outer end of the discharge plate 1 (209), and a discharge plate 2 (211) is movably mounted on the outer end of the fixed shaft (210). A notch (212) is provided in the middle of the left end of the polycrystalline furnace (201), and an adjustment column (213) is movably mounted inside the notch (212). The adjustment column (213) is located at the lower end of the left end of the reaction tank (205).

3. A polycrystalline material synthesis device according to claim 2, characterized in that: A cleaning assembly (3) is arranged above the polycrystalline furnace (201), and the cleaning assembly (3) includes a support column (301), and a water tank (302) is fixedly installed on the upper end of the support column (301), and slide grooves (303) are opened on the left and right ends of the upper end of the water tank (302), and a push plate (304) is movably installed inside the water tank (302).

4. A polycrystalline material synthesis device according to claim 3, characterized in that: Slide blocks (305) are fixedly installed at the left and right ends of the push plate (304), and the slide blocks (305) are movably installed inside the slide groove (303). A material discharge groove (306) is provided inside the royal water trough (302), and a sealing plate (307) is movably installed inside the material discharge groove (306). The rear end of the royal water trough (302) is fixedly connected to a water inlet pipe (308), and a water outlet (309) is provided in the middle of the royal water trough (302).

5. A polycrystalline material synthesis device according to claim 4, characterized in that: An alcohol box (310) is fixedly installed at the left end of the upper end of the base (1), and the alcohol box (310) is located below the aqua regia tank (302). A cover plate 2 (311) is movably installed at the rear end of the upper end of the alcohol box (310), and an isolation tube (312) is fixedly installed in the middle of the interior of the alcohol box (310).

6. A polycrystalline material synthesis device according to claim 5, characterized in that: The isolation tube (312) passes through the base (1); the lower end of the water outlet (309) is fixedly connected to a water outlet pipe (313); the water outlet pipe (313) is inside the isolation tube (312); an ultrasonic cleaning machine (314) is fixedly installed at the front end of the upper end of the base (1); and the right end of the ultrasonic cleaning machine (314) is fixedly connected to a drain pipe (315).

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