Cleaning equipment

Abstract

The utility model discloses a cleaning device which comprises a water tank, a water pump and a water pump. The cleaning raw material storage bin is used for containing cleaning raw materials; the liquid supply bin is provided with a mixing cavity capable of mixing the diluent and the cleaning raw materials to form cleaning liquid, and the mixing cavity is provided with a feeding port capable of being connected with the output end of the water tank and the output end of the cleaning raw material storage bin; the processing station is used for arranging wafer processing equipment, and the wafer processing equipment and the mixing cavity can form a liquid supply circulation system; and the concentration monitor can monitor specific parameters of the cleaning liquid discharged from the liquid output end of the liquid supply circulating system. According to the cleaning equipment provided by the utility model, the labor cost is reduced, and the cleaning efficiency and the cleaning effect are improved.

Description

Technical Field

[0001] The utility model relates to the technical field of wafer processing equipment, in particular to a cleaning device. Background Art

[0002] In recent years, with the accelerated innovation of my country's scientific and technological development, new semiconductor materials have achieved rapid development. Electronic devices with good performance require wafer substrates with no scratches or damage on the surface.

[0003] In order to improve the processing quality of chips, the surface of the object is ground and polished through reasonable process parameters, suitable grinding fluid and grinding pad, so that the surface of the object can meet high-precision requirements in terms of roughness, glossiness, flatness, etc.

[0004] During the wafer processing, in addition to removing the damage itself, it is also important to prevent the introduction of foreign particles and dirt that cause new scratches. Therefore, the wafer processing equipment needs to be thoroughly cleaned after processing to avoid residual polishing liquid particles, cleaning agents and dirt in the environment.

[0005] At present, the cleaning of chip processing equipment is still mainly done by manual liquid preparation and manual operation. This method increases labor costs and is inefficient. Judging the cleaning status of the chip processing equipment by naked eyes can easily lead to incomplete cleaning and poor product processing.

[0006] Therefore, how to reduce labor costs and improve cleaning efficiency and cleaning effect is a problem that needs to be solved urgently by people in this technical field. Utility Model Content

[0007] In view of this, the utility model provides a cleaning device to reduce labor costs and improve cleaning efficiency and cleaning effect.

[0008] In order to achieve the above purpose, the utility model provides the following technical solutions:

[0009] A cleaning device, comprising:

[0010] A water tank, used to hold the diluent;

[0011] Cleaning raw material storage bin, used for containing cleaning raw materials;

[0012] A liquid supply bin, the liquid supply bin having a mixing chamber capable of mixing the diluent and the cleaning raw material to form a cleaning liquid, the mixing chamber having a feed port capable of being connected to an output end of the water tank and an output end of the cleaning raw material storage bin;

[0013] A processing position, used to set a wafer processing device, wherein the wafer processing device can form a liquid supply circulation system with the mixing chamber;

[0014] A concentration monitor is provided, wherein the concentration monitor is capable of monitoring specific parameters of the cleaning liquid discharged from the liquid output end of the liquid supply circulation system.

[0015] Optionally, in the above cleaning device, the output end of the water tank is connected to the feed port via a first feed flow path, and the first feed flow path is connected with a first control switch;

[0016] The output end of the cleaning material storage bin is connected to the feed port via a second feed flow path, and the second feed flow path is connected with a second control switch;

[0017] The control system of the cleaning device is connected to the first control switch and the second control switch signals and can control the switching of the first control switch and the second control switch.

[0018] Optionally, in the above cleaning device, the liquid supply tank further comprises a liquid level sensor capable of detecting the liquid level in the mixing chamber;

[0019] The liquid level sensor is connected to the control system signal, and the control system can control the switching of the first control switch and the second control switch according to the feedback signal of the liquid level sensor.

[0020] Optionally, in the above cleaning device, the liquid level sensor comprises:

[0021] A high liquid level sensor, wherein the control system can control the closing of the first control switch and the second control switch according to a feedback signal of the high liquid level sensor; the high liquid level sensor is located at a first position of the liquid supply tank;

[0022] A low liquid level sensor, wherein the control system can control the opening of the first control switch and the second control switch according to a feedback signal of the low liquid level sensor; the low liquid level sensor is located at the second position of the liquid supply tank, and the first position is higher than the second position.

[0023] Optionally, in the above-mentioned cleaning equipment, a control system of the cleaning equipment is connected to the concentration monitor signal, and the control system can control the switching of the first control switch and the second control switch according to a feedback signal of the concentration monitor.

[0024] Optionally, in the above cleaning device, the liquid supply tank has a first liquid discharge control switch capable of controlling the opening and closing of the liquid discharge port of the liquid supply tank;

[0025] The control system of the cleaning device is connected to the first liquid discharge control switch signal and can control the switch of the first liquid discharge control switch.

[0026] Optionally, in the above-mentioned cleaning equipment, the control system of the cleaning equipment can be connected to the liquid supply circulation system signal and control the start and stop of the liquid supply circulation system.

[0027] Optionally, in the above-mentioned cleaning equipment, the processing position is provided with a second liquid discharge control switch capable of controlling the opening and closing of the liquid output end of the liquid supply circulation system;

[0028] The control system of the cleaning device is connected to the second liquid discharge control switch signal and can control the switch of the second liquid discharge control switch.

[0029] Optionally, the above cleaning device further includes a data processor;

[0030] The control system of the cleaning device is signal-connected to the data processor.

[0031] Optionally, in the above cleaning equipment, the liquid supply tank further has an agitator disposed in the mixing chamber.

[0032] Optionally, in the above-mentioned cleaning equipment, the number of the cleaning material storage bins is at least two, and different cleaning material storage bins can carry different types of cleaning materials.

[0033] It can be seen from the above technical solutions that the cleaning equipment provided by the utility model can complete the liquid preparation in the mixing chamber, and the chip processing equipment can form a liquid supply circulation system with the mixing chamber, so that the cleaning liquid can circulate in the liquid supply circulation system formed by the chip processing equipment and the mixing chamber to realize the cleaning operation, avoid manual operation, and effectively improve the cleaning efficiency; and, by monitoring the cleaning results based on the concentration monitor, the cleaning effect can be effectively improved compared with the judgment by the naked eye. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0035] Figure 1 A schematic diagram of the structure of a cleaning device provided in an embodiment of the utility model. DETAILED DESCRIPTION

[0036] The utility model discloses a cleaning device, which can reduce labor cost and improve cleaning efficiency and cleaning effect.

[0037] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0038] like Figure 1 As shown, an embodiment of the utility model provides a cleaning device, including a water tank 1, a cleaning raw material storage bin 2, a liquid supply bin 3, a processing position 5 and a concentration monitor 7.

[0039] in,

[0040] The water tank 1 is used to hold a diluent, which can be water or other solutions, and is used to dilute the cleaning raw materials to a certain ratio.

[0041] The cleaning raw material storage bin 2 is used to hold the cleaning raw material; wherein the cleaning raw material can be a powder structure, a granular structure or a solution. In this embodiment, the cleaning raw material can be a sodium hydroxide solution and / or an ethanol solution. Of course, the cleaning raw material can also be other solutions or powders, etc., which are not specifically limited here and are all within the scope of protection.

[0042] The liquid supply bin 3 has a mixing chamber capable of mixing the diluent and the cleaning raw material to form the cleaning liquid, and the mixing chamber has a feed port capable of being connected to the output end of the water tank 1 and the output end of the cleaning raw material storage bin 2;

[0043] The processing position 5 is used to set up the wafer processing equipment, and the wafer processing equipment can form a liquid supply circulation system with the mixing chamber; wherein, the processing position 5 can be a vacant area of ​​the cleaning equipment, or a structure with physical components such as a support platform and a connecting structure.

[0044] Specifically, the liquid supply tank 3 has a liquid outlet for outputting the cleaning liquid and a liquid inlet for inputting the cleaning liquid. The cleaning liquid inlet of the chip processing equipment is connected to the liquid outlet, and the cleaning liquid outlet of the chip processing equipment is connected to the liquid inlet, so as to form a liquid supply circulation system.

[0045] The concentration monitor 7 can monitor specific parameters of the cleaning liquid discharged from the liquid output end of the liquid supply circulation system. The value of a specific parameter monitored by the concentration monitor 7 can be compared with the parameter index (target parameter value) to determine whether the cleaning requirements are met. The number of specific parameters can be one or more, depending on the actual liquid flowing in the liquid supply circulation system of the wafer processing equipment.

[0046] The cleaning equipment provided by the embodiment of the utility model can complete the liquid preparation in the mixing chamber, and the chip processing equipment can form a liquid supply circulation system with the mixing chamber, so that the cleaning liquid can circulate in the liquid supply circulation system formed by the chip processing equipment and the mixing chamber to realize the cleaning operation, avoid manual operation, and effectively improve the cleaning efficiency; and, the cleaning result is monitored by the concentration monitor 7, which can effectively improve the cleaning effect compared with the judgment by the naked eye.

[0047] In order to improve the degree of automation, the output end of the water tank 1 is connected to the feed port through a first feed flow path, and the first feed flow path is connected with a first control switch; the output end of the cleaning material storage bin 2 is connected to the feed port through a second feed flow path, and the second feed flow path is connected with a second control switch; the control system 6 of the cleaning equipment is connected to the first control switch and the second control switch signal and can control the switch of the first control switch and the second control switch. Through the above settings, the total amount of diluent delivered to the mixing chamber by the water tank 1 and the total amount of cleaning material delivered to the mixing chamber by the cleaning material storage bin 2 can be more accurately controlled according to the control system 6 to control the opening and closing time of the first control switch and the second control switch combined with the flow of the first feed flow path and the second feed flow path, so as to accurately control the proportion of the cleaning liquid, avoid the situation of residue caused by excessive cleaning material content, and avoid the situation of incomplete cleaning due to insufficient cleaning material content.

[0048] In order to further realize automatic configuration, the liquid supply tank 3 also includes a liquid level sensor 4 that can detect the liquid level in the mixing chamber; the liquid level sensor 4 is signal-connected to the control system 6, and the control system 6 can control the switching of the first control switch and the second control switch according to the feedback signal of the liquid level sensor 4.

[0049] Specifically, the liquid level sensor 4 includes a high liquid level sensor 41 and a low liquid level sensor 42. Among them, the control system 6 can control the closing of the first control switch and the second control switch according to the feedback signal of the high liquid level sensor 41; the high liquid level sensor 41 is located at the first position of the liquid supply tank 3; the control system 6 can control the opening of the first control switch and the second control switch according to the feedback signal of the low liquid level sensor 42; the low liquid level sensor 42 is located at the second position of the liquid supply tank 3, and the first position is higher than the second position. That is, when the low liquid level sensor 42 detects that the liquid level in the mixing chamber reaches the low liquid level, it can be considered that the mixing chamber is emptied, and the control system 6 controls the opening of the first control switch and the second control switch according to the feedback signal of the low liquid level sensor 42, so that the diluent and the cleaning material enter the mixing chamber to mix and form the cleaning liquid. When the high liquid level sensor 41 detects that the liquid level in the mixing chamber reaches the high liquid level, it can be considered that the mixing chamber is full, and the control system 6 controls the closing of the first control switch and the second control switch according to the feedback signal of the high liquid level sensor 41, and stops delivering the diluent and the cleaning material to the mixing chamber.

[0050] Alternatively, only the high liquid level sensor 41 or the low liquid level sensor 42 may be provided.

[0051] Furthermore, the control system 6 of the cleaning device is connected to the concentration monitor 7 by signal, and the control system 6 can control the opening and closing of the first control switch and the second control switch according to the feedback signal of the concentration monitor 7. That is, when the concentration monitor 7 detects that the specific parameters of the cleaning liquid discharged from the liquid output end of the liquid supply circulation system meet the requirements (such as when the content of the monitored component is lower than the lower limit of the parameter index), the control system 6 can control the first control switch and the second control switch to be closed according to the feedback signal of the concentration monitor 7 to complete the cleaning operation.

[0052] In order to improve the automatic cleaning effect, the liquid supply tank 3 has a first liquid discharge control switch that can control the opening and closing of the liquid discharge port for emptying the mixing chamber; the control system 6 of the cleaning equipment is connected to the first liquid discharge control switch signal and can control the opening and closing of the first liquid discharge control switch. Among them, the control system 6 can control the opening and closing of the first liquid discharge control switch according to the feedback signal of the above-mentioned liquid level sensor 4 and / or concentration monitor 7, and can also set a specific cleaning time. For example, if the liquid supply circulation system of the wafer processing equipment needs to be circulated and cleaned for 15 minutes, that is, the control system 6 controls the first liquid discharge control switch to be turned on for 15 minutes and then closed.

[0053] The control system 6 of the cleaning equipment can be connected to the liquid supply circulation system signal and control the start and stop of the liquid supply circulation system. Specifically, during the cleaning operation, the liquid supply circulation system has a circulation control switch. When the control system 6 controls the circulation control switch to be turned on, the liquid supply circulation system starts; after the cleaning operation is completed, when the control system 6 controls the circulation control switch to be turned off, the control system 6 controls the liquid supply circulation system to stop. Among them, the liquid supply circulation system can also be provided with a circulation pump. When the circulation pump is turned on, the liquid supply circulation system starts, and when the circulation pump is turned off, the liquid supply circulation system stops.

[0054] In the cleaning device provided by the embodiment of the utility model, the processing position 5 is provided with a second liquid discharge control switch capable of controlling the opening and closing of the liquid output end of the liquid supply circulation system; the control system 6 of the cleaning device is connected to the second liquid discharge control switch signal and can control the opening and closing of the second liquid discharge control switch. Through the above arrangement, the automatic cleaning effect of the cleaning device can also be improved.

[0055] The cleaning device provided in the embodiment of the utility model further includes a data processor 8; the control system 6 of the cleaning device is connected to the data processor 8 by signal. By setting the data processor 8, it is convenient to record the cleaning process of the cleaning device. That is, the control system 6 includes a system write port connected to the data processor 8, and the control system 6 receives the cleaning process parameters of the cleaning device and derives the process cleaning record to the data processor 8.

[0056] The control system 6 may include a plurality of input ports and output ports. The input port receives feedback signals from the liquid level sensor 4 and / or the concentration monitor 7, and calculates and generates corresponding switch signals. The switch signals are fed back to the corresponding workstation signal switches (such as a first control switch, a second control switch, a first liquid discharge control switch, and a second liquid discharge control switch, etc.) through the output port in the form of air pressure signals or electromagnetic signals.

[0057] In order to improve the mixing effect, the liquid supply bin 3 also has a stirrer arranged in the mixing chamber, wherein the stirrer is ultrasonic vibration, mechanical vibration or mechanical stirring or any combination thereof.

[0058] Preferably, there are at least two cleaning material storage bins 2, and different cleaning material storage bins 2 can carry different types of cleaning materials. The number of cleaning material storage bins 2 can be two, five, or other numbers, which will not be described in detail and are all within the scope of protection.

[0059] In a specific cleaning process, the cleaning equipment is used to clean the wafer processing equipment after the wafer is processed.

[0060] In this embodiment, the cleaning equipment has a water tank 1 and two cleaning raw material storage bins 2, the two cleaning raw material storage bins 2 are respectively a first storage bin 21 and a second storage bin 22, the water tank 1 contains pure water, the first storage bin 21 contains 50% sodium hydroxide solution, and the second storage bin 22 contains 10% ethanol solution.

[0061] Take the example of programming a cleaning process requirement through the data processor 8: add 4L of sodium hydroxide solution, add 2L of ethanol solution, add pure water until the liquid level in the liquid supply tank reaches 40L, the cleaning time is 15min, the lower limit of sodium hydroxide content is 1%, the lower limit of ethanol content is 1%, the lower limit of SiO2 content used in the processing process is 0.1%, and the lower limit of KMnO4 content is 0.1%. Import the parameter information into the control system and start the automatic cleaning program of the equipment.

[0062] In the initial state, the control system 6 of the cleaning equipment generates an opening control signal (such as XC1 in the figure), controls the first liquid discharge control switch (such as a liquid discharge valve) to open, so that the liquid discharge port is opened; because the wafer processing equipment can form a liquid supply circulation system with the mixing chamber, when the polishing liquid in the liquid supply circulation system is drained, the feedback signal of the low liquid level sensor 42 (such as XD2 in the figure) is transmitted to the control system 6, and the control system 6 generates an opening control signal (such as XA1, XB1 and XB2 in the figure), controls the first control switch and the second control switch to open (and the first liquid discharge control switch is closed), so that the water tank 1 and the cleaning material storage bin 2 add a certain amount of diluent and cleaning liquid to the mixing chamber of the liquid supply bin 3 according to the process requirements. When the liquid level in the mixing chamber reaches a certain position, the feedback signal of the high liquid level sensor 41 (such as XD1 in the figure) is transmitted to the control system 6, and the control system 6 generates a closing control signal (such as XA1, XB1 and XB2 in the figure) to control the first control switch and the second control switch to close, and stop the water tank 1 and the cleaning material storage bin 2 from conveying materials to the mixing chamber of the liquid supply bin 3; and the control system 6 generates a signal (such as X2 in the figure) to control the starting device (circulation control switch or circulation pump) of the liquid supply circulation system, so that the liquid supply circulation system is started, and the liquid supply circulation system (such as X1 in the figure) allows the cleaning liquid to circulate in the mixing chamber and the wafer processing equipment, and the circulation cleaning is carried out for 15 minutes. After 15 minutes of cleaning, the control system 6 generates a signal to control the opening of the second liquid discharge control switch (such as XE1 in the figure), so that the cleaning liquid in the liquid supply circulation system can be discharged from the liquid output end (liquid discharge valve) of the liquid supply circulation system, and the concentration monitor 7 monitors the various parameters of the discharged cleaning liquid in real time, wherein the specific parameters of the cleaning liquid include SiO2 and KMnO4. When the content of SiO2 or KMnO4 is greater than 0.1%, the control system 6 generates an open control signal (such as XA1, XB1 and XB2 in the figure), controls the first control switch and the second control switch to be opened, so that the water tank 1 and the cleaning material storage bin 2 re-add a certain amount of diluent and cleaning materials to the mixing chamber of the liquid supply bin 3 according to the process requirements, so as to form a cleaning liquid again to clean the liquid supply circulation system of the wafer processing equipment. When the content of sodium hydroxide or ethanol is greater than 1%, the control system 6 generates an open control signal (such as XA1 in the figure), opens the first control switch, and the pure water contained in the water tank 1 passes through the liquid supply bin 3 to clean the liquid supply circulation system of the wafer processing equipment. When the content of each indicator (the content of SiO2, KMnO4, sodium hydroxide and ethanol) is lower than the lower limit, the control system 6 generates a close signal, thereby completing the cleaning of the wafer processing equipment.

[0063] The transmission signal (such as XH1 in the figure) between the control system 6 and the data processor 8 can be bidirectional transmission or unidirectional transmission.

[0064] It should be noted that when the mixing chamber needs to be emptied, the control system 6 can generate a control signal (such as XC1) to open the drain port, control the first drain control switch to open, and allow the cleaning liquid to enter the liquid supply circulation system from the mixing chamber of the liquid supply tank 3.

[0065] The various embodiments in this specification are described in a progressive manner, and each embodiment focuses on the differences from other embodiments. The same or similar parts between the various embodiments can be referenced to each other.

[0066] The above description of the disclosed embodiments enables those skilled in the art to implement or use the present invention. Various modifications to these embodiments will be apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention will not be limited to the embodiments shown herein, but will conform to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A cleaning device, characterized in that: include: A water tank (1) for containing a diluent; A cleaning material storage bin (2) for storing cleaning materials; A liquid supply bin (3), the liquid supply bin (3) having a mixing chamber capable of mixing the diluent and the cleaning raw material to form a cleaning liquid, the mixing chamber having a feed port capable of being connected to an output end of the water tank (1) and an output end of the cleaning raw material storage bin (2); A processing position (5) is used to set a wafer processing device, and the wafer processing device can form a liquid supply circulation system with the mixing chamber; A concentration monitor (7), which is capable of monitoring specific parameters of the cleaning liquid discharged from the liquid output end of the liquid supply circulation system.

2. The cleaning device according to claim 1, characterized in that: The output end of the water tank (1) is connected to the feed port via a first feed flow path, and the first feed flow path is connected with a first control switch; The output end of the cleaning material storage bin (2) is connected to the feed port via a second feed flow path, and the second feed flow path is connected with a second control switch; The control system (6) of the cleaning device is connected to the first control switch and the second control switch signals and is capable of controlling the switching of the first control switch and the second control switch.

3. The cleaning device according to claim 2, characterized in that: The liquid supply bin (3) further comprises a liquid level sensor (4) capable of detecting the liquid level in the mixing chamber; The liquid level sensor (4) is connected to the control system (6) by signal, and the control system (6) can control the switching of the first control switch and the second control switch according to the feedback signal of the liquid level sensor (4).

4. The cleaning device according to claim 3, characterized in that: The liquid level sensor (4) comprises: A high liquid level sensor (41), wherein the control system (6) is capable of controlling the closing of the first control switch and the second control switch according to a feedback signal of the high liquid level sensor (41); the high liquid level sensor (41) is located at a first position of the liquid supply tank (3); A low liquid level sensor (42), wherein the control system (6) is capable of controlling the opening of the first control switch and the second control switch according to a feedback signal of the low liquid level sensor (42); the low liquid level sensor (42) is located at a second position of the liquid supply tank (3), and the first position is higher than the second position.

5. The cleaning device according to claim 2, characterized in that: The control system (6) of the cleaning equipment is connected to the concentration monitor (7) by signal, and the control system (6) can control the switching of the first control switch and the second control switch according to the feedback signal of the concentration monitor (7).

6. The cleaning device according to claim 1, characterized in that: The liquid supply bin (3) has a first liquid discharge control switch capable of controlling the opening and closing of the liquid discharge port of the liquid supply bin (3); The control system (6) of the cleaning device is connected to the first liquid discharge control switch signal and is capable of controlling the switching of the first liquid discharge control switch.

7. The cleaning device according to claim 1, characterized in that: The control system (6) of the cleaning equipment can be connected to the liquid supply circulation system signal and control the start and stop of the liquid supply circulation system.

8. The cleaning device according to claim 1, characterized in that: The processing position (5) is provided with a second liquid discharge control switch capable of controlling the opening and closing of the liquid output end of the liquid supply circulation system; The control system (6) of the cleaning device is connected to the second liquid discharge control switch signal and is capable of controlling the switching of the second liquid discharge control switch.

9. The cleaning device according to any one of claims 1 to 8, characterized in that: Also includes a data processor (8); The control system (6) of the cleaning equipment is connected to the data processor (8) by signals.

10. The cleaning device according to claim 1, characterized in that: The liquid supply bin (3) also has a stirrer arranged in the mixing chamber; And / or, the number of the cleaning material storage bins (2) is at least two, and different cleaning material storage bins (2) are capable of carrying different types of cleaning materials.

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