Bearing box and evaporation equipment

By using the load box and rotary box lid outside the metal evaporator to manage the plating source, the problem of low weighing efficiency of the plating source is solved, and the advance material preparation and accurate identification of the plating source is achieved, and wafer production efficiency and product quality are improved.

CN222349097UActive Publication Date: 2025-01-14CHANGZHOU CHEMSEMI CO LTD
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Patent Information

Application Number
CN202420143427.6
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-01-19
Publication Date
2025-01-14
Estimated Expiration
2034-01-19

AI Technical Summary

Technical Problem

During the integrated circuit manufacturing process, the weighing of the metal plating source needs to be repeated, resulting in a decrease in wafer production efficiency, because the on-machine weighing of the metal plating source can only be carried out inside the evaporation machine, and it is impossible to weigh in advance.

Method used

A load-bearing box is designed, including a base, a loading device and a rotatable box cover, for carrying and managing a variety of metal plating sources outside the metal evaporator, and the placement and removal of the plating source is achieved by rotating the box cover. Integrate the identification module to ensure accurate identification and prevention of mixing.

Benefits of technology

By weighing and preparing materials for the plating source in the load box in advance, the weighing time of the plating source is shortened, the production efficiency is improved, and the pollution of the plating source is prevented, the integrity of the plating source and the accuracy of the evaporation process are ensured, and the accuracy of the plating source is improved. Product quality.

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Abstract

The utility model discloses a bearing box and evaporation equipment, and the bearing box is used for a metal evaporator. The carrying devices are arranged in the circumferential direction of the base; the box cover comprises at least one first window penetrating through the box cover and a connecting part, the shape of the first window is matched with that of any object carrying equipment, the object carrying equipment is distributed around the connecting part, and the box cover covers the base and is movably connected with the base through the connecting part; the box cover rotates relative to the base so that the first window can be aligned with the object carrying equipment. The bearing box for bearing the metal plating source is arranged outside the metal evaporator, so that the problem of placement of the metal plating source during evaporation is solved, and the efficiency of evaporation work is improved.
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Description

Technical Field

[0001] The utility model relates to the technical field of semiconductors, and in particular to a carrier box and evaporation equipment. Background Art

[0002] In the thin film process of integrated circuit manufacturing, metal evaporation machines are usually used to deposit metal film layers on the surface of wafers. The metal plating source required for producing wafers is placed in a bushing, and then placed in the crucible position of the equipment, and melted at high temperature in the equipment. The dissolved metal is called "plating source".

[0003] At present, different metal plating sources need to be weighed repeatedly before being placed in the crucible of the machine to ensure the accuracy of the evaporation process. For example, before the metal evaporation machine performs deposition operations on the wafers, the metal plating sources used will be weighed and the weight on the machine will be recorded through the system. After leaving the machine, the metal plating sources will be weighed again and the weight off the machine will be recorded through the system. The weight difference before and after entering and leaving the machine is the weight consumed by the metal plating source. However, in the process, there is only a position for carrying the metal plating source inside the metal evaporation machine, that is, the crucible of the machine. The metal plating source can only be weighed on the machine after the wafers to be produced reach the station for depositing the metal film layer. Therefore, the metal plating source cannot be weighed in advance, which increases the wafer production time and reduces the wafer production efficiency. Utility Model Content

[0004] The technical problem solved by the utility model is to provide a carrier box and an evaporation device to improve the production efficiency of wafers.

[0005] In order to solve the above technical problems, an embodiment of the utility model provides a carrier box, which is used to carry a metal plating source and includes: a base; a plurality of carrier devices arranged along the circumference of the base; a box cover, wherein the box cover includes at least one first window and a connecting portion passing through the box cover, the shape of the first window matches the shape of any of the carrier devices, the carrier devices are distributed around the connecting portion, the box cover is disposed on the base and is movably connected to the base through the connecting portion, and the box cover rotates relative to the base to align the first window with the carrier device.

[0006] Optionally, the carrying box further includes an identification module, the identification module includes a plurality of material identifications, the identification module is fixed to the surface of the base, and each material identification corresponds to the carrying device one by one.

[0007] Optionally, the box cover further includes at least one second window penetrating the box cover, the shape of the second window matches the shape of any of the material identifiers, and the second window is arranged corresponding to the first window.

[0008] Optionally, the identification module is arranged on the periphery of the connecting portion, and the carrying equipment is distributed around the identification module.

[0009] Optionally, the loading device is a crucible.

[0010] Optionally, the material of the crucible includes: copper.

[0011] Optionally, the number of the carriers ranges from 6 to 11.

[0012] Optionally, the base further includes: a plurality of first protrusions located on the bottom surface of the base, and the distances between the plurality of first protrusions and the center of the bottom surface of the base are equal.

[0013] Optionally, the connecting portion is a bearing.

[0014] Optionally, the box cover further comprises: at least one second protrusion located on the top surface of the box cover.

[0015] Optionally, the material of the box cover includes stainless steel or aluminum alloy.

[0016] Correspondingly, the technical solution of the utility model also provides an evaporation device, including: a metal evaporation machine and the above-mentioned carrying box, the metal evaporation machine includes a machine crucible, and the machine crucible includes a plurality of plating source areas; the carrying box is independently arranged from the metal evaporation machine, and each carrying device is used to carry the metal plating source input into the corresponding plating source area.

[0017] Compared with the prior art, the technical solution of the embodiment of the utility model has the following beneficial effects:

[0018] The supporting box provided by the technical solution of the utility model realizes the placement of multiple metal plating sources by arranging a supporting box for carrying metal plating sources outside the metal vapor deposition machine, and the supporting box includes a plurality of loading devices and a first window located on the box cover. At least one metal plating source can be placed or taken out by rotating the box cover relative to the base, thereby solving the problem of placing and taking the metal plating source during vapor deposition. During the production process, materials can be prepared in advance, and the metal plating sources required for the wafers to be produced can be weighed in advance and temporarily placed in the supporting box, thereby shortening the weighing time of the metal plating sources and improving production efficiency. In addition, a accommodating space is formed between the box cover and the base, so that the metal plating source can be stored in the accommodating space, thereby preventing the metal plating source from being contaminated and ensuring the integrity of the metal plating source.

[0019] Furthermore, the carrier box in the technical solution of the utility model also includes an identification module and a second window located on the surface of the box cover, the identification module includes a plurality of material identifications, the shape of the second window matches the shape of any of the material identifications, the second window is arranged corresponding to the first window, so that the metal plating source can be accurately identified, preventing the risk of mixing the metal plating source during machine operation, ensuring the accuracy of the evaporation process, improving the efficiency of evaporation, and thereby ensuring product quality.

[0020] The evaporation equipment in the technical solution of the utility model includes a metal evaporation machine and a carrying box independent of the metal evaporation machine, so that during the evaporation process of the metal evaporation machine, the metal plating source can be placed in the carrying box, thereby ensuring the integrity of the metal plating source and improving the efficiency of evaporation; and during the evaporation process, the corresponding metal plating source is input into the plating source area according to the material identification, thereby ensuring the accuracy of the evaporation process. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a schematic diagram of the structure of the carrying box in an embodiment of the utility model in which the box cover is omitted;

[0022] Figure 2 It is a structural schematic diagram of a box cover in a carrier box in one embodiment of the utility model;

[0023] Figure 3 It is a structural schematic diagram of the connection part in the carrier box in one embodiment of the utility model;

[0024] Figure 4 It is a perspective structural diagram of the carrier box described in one embodiment of the utility model;

[0025] Figure 5 It is a side structural schematic diagram of the carrying box described in one embodiment of the utility model. DETAILED DESCRIPTION

[0026] As mentioned in the background technology, the accuracy of the evaporation process of current evaporation equipment needs to be further improved.

[0027] At present, different metal plating sources need to be weighed repeatedly before being placed in the crucible of the machine to ensure the accuracy of the evaporation process. For example, before the metal evaporation machine performs deposition operations on the wafers, the metal plating sources used will be weighed and the weight on the machine will be recorded through the system. After leaving the machine, the metal plating sources will be weighed again and the weight off the machine will be recorded through the system. The weight difference before and after entering and leaving the machine is the weight consumed by the metal plating source. However, in the process, there is only a position for carrying the metal plating source inside the metal evaporation machine, that is, the crucible of the machine. The metal plating source can only be weighed on the machine after the wafers to be produced reach the station for depositing the metal film layer. Therefore, the metal plating source cannot be weighed in advance, which increases the wafer production time and reduces the wafer production efficiency.

[0028] In order to solve the above problems, the technical solution of the utility model provides a carrier box and an evaporation device. A carrier box for carrying a metal plating source is arranged outside a metal evaporation machine, and the carrier box includes a plurality of carrying devices and a first window located on a box cover, thereby realizing the placement of multiple metal plating sources. By rotating the box cover relative to the base, at least one metal plating source can be placed or taken out, thereby solving the problem of placing and taking the metal plating source during evaporation. During the production process, materials can be prepared in advance, and the metal plating sources required for the wafers to be produced can be weighed in advance and temporarily placed in the carrier box, thereby shortening the weighing time of the metal plating sources and thereby improving production efficiency. In addition, a accommodating space is formed between the box cover and the base, so that the metal plating source can be stored in the accommodating space, thereby preventing the metal plating source from being contaminated and ensuring the integrity of the metal plating source.

[0029] In order to make the above-mentioned objects, features and beneficial effects of the present invention more obvious and easy to understand, the specific embodiments of the present invention are described in detail below with reference to the accompanying drawings.

[0030] Figure 1 It is a schematic diagram of the structure of the carrying box in which the box cover is omitted in one embodiment of the utility model.

[0031] Figure 4 It is a perspective structural diagram of the carrier box described in one embodiment of the utility model.

[0032] Figure 5 It is a side structural schematic diagram of the carrying box described in one embodiment of the utility model.

[0033] Please refer to Figure 1 as well as Figure 4 The technical solution of the utility model provides a carrying box for carrying a metal plating source, comprising: a base 1; and a plurality of carrying devices 102 arranged along the circumference of the base 1.

[0034] The carrying box further includes an identification module 103 , which includes a plurality of material identifications. The identification module 103 is fixed to the surface of the base 1 , and each material identification corresponds to the carrying device 102 one by one.

[0035] In this embodiment, the identification module 103 is sleeved on the connecting portion 203 , and the carrying devices 102 are evenly distributed around the identification module 103 .

[0036] In other embodiments, the carrier devices 102 are unevenly distributed around the identification module 103. The present invention is not limited to this, and other distribution modes of the carrier devices 102 around the identification module 103 are within the protection scope of the present invention.

[0037] In this embodiment, the identification module 103 is annularly sleeved on the connecting portion 203 , but the present invention is not limited thereto, and other shapes of the identification module 103 are within the protection scope of the present invention.

[0038] In other embodiments, the identification module 103 is sleeved on the base 1 , and the material identification on the identification module 103 is distributed around the carrier 102 , and the material identification corresponds to the carrier 102 one by one.

[0039] The identification module 103 is used to distinguish the type of metal plating source carried in each carrying device 102 .

[0040] In this embodiment, the width of the material mark is 22 mm, and the length of the material mark is 35 mm.

[0041] The object carrier 102 includes a crucible fixed on the surface of the base 1 .

[0042] In this embodiment, the material of the crucible is copper.

[0043] The number of the crucibles ranges from 6 to 11.

[0044] In this embodiment, the number of the crucibles is 11.

[0045] In this embodiment, the diameter of the crucible is 50 mm, and the distance between adjacent crucibles is 10 mm.

[0046] The crucible includes a liner (not shown in the figure) for carrying a metal plating source. In the subsequent evaporation process, the liner is used as a container for carrying the metal plating source to achieve transfer of the metal plating source.

[0047] The crucible is used for carrying the metal plating source and the bushing.

[0048] Please refer to Figure 4 as well as Figure 5 The base 1 further includes: a plurality of first protrusions 105 located on the bottom surface of the base 1 , and the distances between the plurality of first protrusions 105 and the center of the bottom surface of the base 1 are equal.

[0049] The plurality of first protrusions 105 are fixedly connected to the base 1 by means of bolts.

[0050] The dimensions of the plurality of first protrusions 105 along a direction perpendicular to the surface of the base 1 are the same.

[0051] The first protrusion 105 is used to support the base 1 to ensure the flatness of the bottom of the base 1 .

[0052] Figure 2It is a structural schematic diagram of a box cover in a carrier box in one embodiment of the utility model.

[0053] Figure 3 It is a structural schematic diagram of the connecting portion in the carrier box in one embodiment of the utility model.

[0054] Please refer to Figure 2 as well as Figure 3 The carrying box also includes: a box cover 2, the box cover 2 includes at least one first window 201 and a connecting portion 203 that penetrates the box cover 2, the shape of the first window 201 matches the shape of any of the carrying devices 102, the carrying devices 102 are evenly distributed around the connecting portion 203, the box cover 2 is covered on the base 1 and is movably connected to the base 1 through the connecting portion 203, and the box cover 2 rotates relative to the base 1 to align the first window 201 with the carrying device 102.

[0055] The first window 201 is used to expose any of the loading devices 102 to facilitate taking and placing of a metal plating source.

[0056] In this embodiment, the connecting portion 203 is a bearing.

[0057] The bearing is connected to the base 1 by bolts, so that the bearing and the base 1 are fixedly connected.

[0058] In a specific embodiment, the bearing includes a top bearing and a bottom bearing, and the top bearing cooperates with the bottom bearing to realize the rotation of the box cover 2 relative to the base 1.

[0059] In other embodiments, the carriers 102 are unevenly distributed around the connection portion 203 , and the present invention is not limited thereto. Other distribution modes of the carriers 102 around the connection portion 203 are within the protection scope of the present invention.

[0060] Please refer to Figure 4 as well as Figure 5 The box cover 2 further includes: at least one second protrusion 204 located on the top surface of the box cover 2 .

[0061] The second protrusion 204 is used to rotate the box cover 2 clockwise or counterclockwise relative to the base 1 .

[0062] In this embodiment, the second protrusion 204 is fixedly connected to the surface of the box cover 2 by bolts.

[0063] The material of the box cover 2 includes stainless steel or aluminum alloy.

[0064] In this embodiment, when the material of the box cover 2 is aluminum alloy, the surface of the box cover 2 is further anodized.

[0065] The box cover 2 further comprises at least one second window 202 penetrating the box cover 2 , and the shape of the second window 202 matches the shape of any of the material identifiers.

[0066] The second window 202 is used to expose any of the material identifications.

[0067] The second window 202 is disposed corresponding to the first window 201 , and the second window 202 and the first window 201 are used to respectively expose any material identification and the metal plating source corresponding thereto.

[0068] In this embodiment, the weight of the carrying box is 9 kg, the dimension of the carrying box parallel to the surface of the base (ie, the diameter of the base) is 290 mm, and the thickness of the carrying box perpendicular to the surface of the base is 58 mm.

[0069] In this embodiment, the carrying box is cylindrical.

[0070] Of course, the present invention is not limited thereto, and other shapes of the carrying box are within the protection scope of the present invention.

[0071] In the above scheme, a carrying box for carrying the metal plating source is arranged outside the metal evaporation machine, and the carrying box includes a plurality of carrying devices 102 and a first window 201 located on the box cover 2, so that a variety of metal plating sources can be placed. By rotating the box cover 2 relative to the base 1, at least one metal plating source can be placed or taken out, thereby solving the problem of placing and taking the metal plating source during evaporation. During the production process, materials can be prepared in advance, and the metal plating sources required for the wafers to be produced can be weighed in advance and temporarily placed in the carrying box, thereby shortening the weighing time of the metal plating sources and improving production efficiency. In addition, a accommodating space is formed between the box cover 2 and the base 1, so that the metal plating source can be stored in the accommodating space, thereby preventing the metal plating source from being contaminated and ensuring the integrity of the metal plating source.

[0072] In addition, the carrier box also includes an identification module 103 and a second window 202 located on the surface of the box cover 2, the identification module 103 includes a plurality of material identifications, the shape of the second window 202 matches the shape of any of the material identifications, and the second window 202 is arranged corresponding to the first window 201, so that the metal plating source can be accurately identified, preventing the risk of mixing the metal plating source during machine operation, ensuring the accuracy of the evaporation process, improving the efficiency of evaporation, and thereby ensuring product quality.

[0073] Please continue to refer to Figures 1 to 5The technical solution of the utility model also provides a vapor deposition device, including: a metal vapor deposition machine and the above-mentioned carrier box, the metal vapor deposition machine includes a machine crucible, and the machine crucible includes a plurality of plating source areas; the carrier box is independently arranged from the metal vapor deposition machine, and each carrier device 102 is used to carry the metal plating source input into the corresponding plating source area.

[0074] The working method of the evaporation equipment is described below:

[0075] Provide a first wafer to be processed; weigh a first metal plating source and place it in a carrier device 102 (i.e., a crucible); before vapor-depositing the first wafer to be processed, transfer the first metal plating source in the carrier device 102 to a machine crucible, and use the first metal plating source to vapor-deposit the first wafer to be processed.

[0076] During the vapor deposition process of the first wafer to be processed, a second wafer to be processed is provided; the second metal plating source is weighed and placed in a carrier device 102 (i.e., a crucible); after the vapor deposition of the first wafer to be processed is completed, the first metal plating source in the machine crucible is transferred to the carrier device 102 (i.e., a crucible); by rotating the box cover 2, the carrier device 102 where the second metal plating source is located is exposed, and the second metal plating source is transferred to the machine crucible, and the second wafer to be processed is vapor deposited based on the second metal plating source.

[0077] During the evaporation process of the second wafer to be processed, a third wafer to be processed is provided, and the above steps are repeated until the evaporation of all wafers to be processed is completed.

[0078] In the above scheme, the evaporation equipment includes a metal evaporation machine and a carrier box independent of the metal evaporation machine, so that during the evaporation process of the metal evaporation machine, the metal plating source can be placed in the carrier box, ensuring the integrity of the metal plating source and improving the efficiency of evaporation; and during the evaporation process, the corresponding metal plating source is input into the plating source area according to the material identification, ensuring the accuracy of the evaporation process. In addition, the time for evaporating the first wafer to be processed is used to weigh the second metal plating source of the second wafer to be processed, so as to make full use of the production time, reduce the production time, and improve the production efficiency.

[0079] Although the utility model is disclosed as above, the utility model is not limited thereto. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the utility model. Therefore, the protection scope of the utility model shall be subject to the scope defined by the claims.

Claims

1. A carrying box for carrying a metal plating source, characterized in that: include: Pedestal; A plurality of loading devices arranged along the circumference of the base; A box cover, comprising at least one first window penetrating the box cover and a connecting portion, wherein the shape of the first window matches the shape of any of the carrying devices, the carrying devices are distributed around the connecting portion, the box cover is disposed on the base and is movably connected to the base through the connecting portion, and the box cover rotates relative to the base to align the first window with the carrying device.

2. The carrier box according to claim 1, characterized in that: It also includes an identification module, which includes a plurality of material identifications. The identification module is fixed to the surface of the base, and each material identification corresponds to the carrier device one by one.

3. The carrier box according to claim 2, characterized in that: The box cover also includes at least one second window penetrating the box cover, the shape of the second window matches the shape of any of the material identifiers, and the second window is arranged corresponding to the first window.

4. The carrier box according to claim 2, characterized in that: The identification module is arranged on the periphery of the connecting portion, and the object-carrying equipment is distributed around the identification module.

5. The carrier box according to claim 1, characterized in that: The object-carrying device is a crucible.

6. The carrier box according to claim 5, characterized in that: The material of the crucible includes: copper.

7. The carrier box according to claim 1, characterized in that: The number of the loading devices ranges from 6 to 11.

8. The carrier box according to claim 1, characterized in that: The base further includes: a plurality of first protrusions located on the bottom surface of the base, and the distances between the plurality of first protrusions and the center of the bottom surface of the base are equal.

9. The carrier box according to claim 1, characterized in that: The connecting portion is a bearing.

10. The carrier box according to claim 1, characterized in that: The box cover further comprises: at least one second protrusion located on the top surface of the box cover.

11. The carrier box according to claim 1, characterized in that: The material of the box cover includes stainless steel or aluminum alloy.

12. A vapor deposition device, characterized in that: include: A metal evaporation machine includes a machine crucible, wherein the machine crucible includes a plurality of plating source areas; The carrier box according to any one of claims 1 to 11, wherein the carrier box is independently arranged from the metal evaporation machine, and each carrier device is used for carrying the metal plating source input into the corresponding plating source area.