Silicon tetrachloride vaporization device

Abstract

The utility model relates to the technical field of chemical industry production, and discloses a silicon tetrachloride vaporization device which comprises a bottom plate. The reacted high-temperature tail gas exchanges heat with a jacket high-temperature water pipe in a reaction tail gas pipe, then enters a reaction tail gas cooling end socket lower cavity, enters a tail gas heat exchange pipe, exchanges heat with liquid silicon tetrachloride, then enters a reaction tail gas cooling end socket upper cavity, and flows out of a high-temperature cooling water inlet pipe to the next process; the boiling point of liquid silicon tetrachloride in the vaporizer is controlled by changing the amount of hydrogen entering the vaporizer through the hydrogen feeding regulating valve pipe, and the vaporization of the liquid silicon tetrachloride is controlled by adjusting the amount of steam through adjusting the steam inlet regulating valve pipe; the vaporizer is monitored through the pressure monitor, the temperature monitor and the liquid level monitor instrument, meanwhile, the slag discharging opening and the slag discharging pipeline are arranged at the bottom of the vaporizer, silicon powder and other impurities in silicon tetrachloride can be conveniently treated, energy consumption is reduced, control is more stable in the operation process, and the effect of reducing energy consumption is achieved.

Description

Technical Field

[0001] The utility model relates to the technical field of production in the chemical industry, in particular to a silicon tetrachloride vaporizing device. Background Art

[0002] With the rapid expansion of polysilicon production in recent years, the amount of liquid byproduct silicon tetrachloride produced will be a huge number. How to ensure that all silicon tetrachloride is converted into trichlorosilane is the bottleneck restricting the expansion of polysilicon production. In order to recycle the byproduct silicon tetrachloride, two methods are commonly used internationally to convert silicon tetrachloride. One is the high-temperature thermal hydrogenation method, which is to react silicon tetrachloride with hydrogen at a temperature of 900~1200℃ in a hydrogenation furnace to generate trichlorosilane; the other method is the cold hydrogenation method, which is mainly to mix silicon tetrachloride with hydrogen and then generate trichlorosilane with silicon powder and catalyst at a temperature of 500~600℃ through a fluidized bed reactor.

[0003] The disadvantages of large power consumption and high vaporization temperature during the vaporization of silicon tetrachloride in the prior art polysilicon cold hydrogenation method are provided. A method and a vaporization device for vaporizing silicon tetrachloride in the polysilicon cold hydrogenation method are provided. The method and the device can consume less or no power. Therefore, a silicon tetrachloride vaporization device is needed. Utility Model Content

[0004] The utility model aims to provide a silicon tetrachloride vaporizing device to solve the problems raised in the above background technology.

[0005] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a silicon tetrachloride vaporization device, comprising a base plate; a support block fixedly connected to the upper surface of the base plate; a vaporizer assembly arranged on the upper surface of the support block; a cooling assembly arranged on one side of the vaporizer assembly; wherein the vaporizer assembly comprises: a vaporizer, fixedly connected to the upper surface of the support block; a pressure monitor, fixedly mounted on the outer wall of the vaporizer; a temperature monitor, fixedly mounted on the outer wall of the vaporizer; and a liquid level monitor, arranged on the outer wall of the vaporizer.

[0006] Preferably, the liquid level monitor is connected and arranged on the outer wall of the vaporizer, the vaporizer shell is provided with a pad block 1, the pad block 1 is fixedly connected to the inside of the vaporizer shell, the vaporizer outer wall is provided with a hydrogen feed regulating valve pipe, the hydrogen feed regulating valve pipe is connected and arranged on the outer wall of the vaporizer, and the outer wall of the hydrogen feed regulating valve pipe is provided with hydrogen bubbling holes.

[0007] Preferably, a hydrogen bubbling hole is opened on the outer wall of the hydrogen feed regulating valve tube, a liquid trichlorosilane feed regulating valve tube is arranged on the outer wall of the vaporizer, the liquid trichlorosilane feed regulating valve tube is connected and arranged on the outer wall of the vaporizer, a mixing gas pipe is arranged on the outer wall of the vaporizer, and a slag discharge pipe is arranged on the outer wall of the vaporizer.

[0008] Preferably, the slag discharge pipe is connected to the vaporizer, a steam inlet regulating valve pipe is provided on the outer wall of the vaporizer, the steam inlet regulating valve pipe is connected to the vaporizer shell side, a steam condensate pipe is provided on the outer wall of the vaporizer, the steam condensate pipe is connected to the vaporizer shell side, and a connection is opened on the outer wall of the vaporizer.

[0009] Preferably, the cooling assembly includes: a reaction tail gas cooling head, fixedly connected to one side of the vaporizer; a gasket block 2, fixedly connected to the inside of the reaction tail gas cooling head shell; and a tail gas heat exchange pipe, arranged on the inner wall of the connecting hole.

[0010] Preferably, the exhaust gas heat exchange pipe is fixedly connected to the inner wall of the connecting hole, the exhaust gas heat exchange pipe is connected to the reaction exhaust gas cooling head, a partition plate is arranged inside the reaction exhaust gas cooling head, the partition plate is fixedly connected to the inner wall of the reaction exhaust gas cooling head, and a high-temperature cooling water inlet pipe is arranged on the outer wall of the reaction exhaust gas cooling head.

[0011] Preferably, the high-temperature cooling water inlet pipe is connected to the shell side of the reaction tail gas cooling head, the outer wall of the bottom plate is provided with a jacketed high-temperature water pipe, the jacketed high-temperature water pipe is connected to the shell side of the reaction tail gas cooling head, and the outer wall of the reaction tail gas cooling head is provided with a cooling reaction tail gas outlet pipe.

[0012] Preferably, the cooling reaction tail gas outlet pipe is connected to the reaction tail gas cooling head, a reaction tail gas pipe is arranged inside the jacket high-temperature water pipe, the reaction tail gas pipe is connected to the reaction tail gas cooling head, a pad three is arranged between the reaction tail gas pipe and the jacket high-temperature water pipe, the pad three is fixedly connected to the outer wall of the reaction tail gas pipe, and the other side of the pad three is fixedly connected to the inner wall of the jacket high-temperature water pipe.

[0013] The utility model provides a silicon tetrachloride vaporization device, which has the following beneficial effects:

[0014] (1) The utility model controls the liquid trichlorosilane to enter the vaporizer through the control valve pipe, which is controlled by the liquid level monitor; hydrogen enters the bottom of the vaporizer through the control valve pipe of the hydrogen feed, and is evenly distributed through the hydrogen bubbling holes; after vaporization, the silicon tetrachloride and hydrogen are mixed and sent to the next process through the mixed gas pipe; steam enters the vaporizer shell side through the steam inlet control valve pipe to heat the silicon tetrachloride and hydrogen in the vaporizer; condensate flows away from the bottom steam condensate pipe, reducing the boiling point of silicon tetrachloride, thereby achieving the effect of reducing steam consumption.

[0015] (2) The utility model allows the high-temperature tail gas after the reaction to exchange heat with the jacketed high-temperature water pipe in the reaction tail gas pipe, then enter the lower chamber of the reaction tail gas cooling head, enter the tail gas heat exchange pipe, exchange heat with liquid silicon tetrachloride, then enter the upper chamber of the reaction tail gas cooling head and flow out from the high-temperature cooling water inlet pipe to the next process; the amount of hydrogen entering the vaporizer is changed by the hydrogen feed regulating valve pipe to control the boiling point of the liquid silicon tetrachloride in the vaporizer, and the steam amount is adjusted by adjusting the steam inlet regulating valve pipe to control the vaporization of the liquid silicon tetrachloride; the vaporizer is monitored by a pressure monitor, a temperature monitor, and a liquid level monitor. At the same time, a slag discharge port and a slag discharge pipeline are provided at the bottom of the vaporizer, which is convenient for handling silicon powder and other impurities in silicon tetrachloride, reducing energy consumption, and making the control more stable during operation, thereby achieving the effect of reducing energy consumption. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 The utility model is a three-dimensional Figure 1 ;

[0017] Figure 2 The utility model is a three-dimensional Figure 2 ;

[0018] Figure 3 It is a cross-sectional view of the utility model;

[0019] Figure 4 This is a cross-sectional view of the carburetor assembly of the utility model;

[0020] Figure 5 This is a cross-sectional view of the cooling component of the utility model.

[0021] In the figure: 1 base plate, 2 support block, 3 carburetor assembly, 4 cooling assembly;

[0022] 311 vaporizer, 312 pressure monitor, 313 temperature monitor, 314 liquid level monitor, 315 cushion block 1, 316 hydrogen feed regulating valve pipe, 317 hydrogen bubbling hole, 318 liquid trichlorosilane feed regulating valve pipe, 319 mixed gas pipe, 320 slag discharge pipe, 321 steam inlet regulating valve pipe, 322 steam condensate pipe;

[0023] 411 reaction tail gas cooling head, 412 gasket two, 413 tail gas heat exchange pipe, 414 partition plate, 415 high temperature cooling water inlet pipe, 416 jacket high temperature water pipe, 417 cooling reaction tail gas outlet pipe, 418 reaction tail gas pipe, 419 gasket three. DETAILED DESCRIPTION

[0024] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0025] Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended to be used to explain the present invention, and should not be construed as limiting the present invention.

[0026] Embodiment 1:

[0027] A preferred embodiment of the silicon tetrachloride vaporization device provided by the utility model is as follows Figure 1-5As shown: a silicon tetrachloride vaporization device, including a base plate 1; a support block 2 fixedly connected to the upper surface of the base plate 1; a vaporizer assembly 3 arranged on the upper surface of the support block 2; a cooling assembly 4 arranged on one side of the vaporizer assembly 3; wherein the vaporizer assembly 3 includes: a vaporizer 311, fixedly connected to the upper surface of the support block 2; a pressure monitor 312, fixedly installed on the outer wall of the vaporizer 311; a temperature monitor 313, fixedly installed on the outer wall of the vaporizer 311; a liquid level monitor 314, arranged on the outer wall of the vaporizer 311; the liquid level monitor 314 is connected and arranged on the outer wall of the vaporizer 311, a cushion block 315 is arranged on the shell side of the vaporizer 311, and the cushion block 315 is fixedly connected to the inside of the shell side of the vaporizer 311; a hydrogen feed regulating valve pipe 316 is arranged on the outer wall of the vaporizer 311, and the hydrogen feed regulating valve pipe 316 is connected and arranged on the outer wall of the vaporizer 311, and the hydrogen The outer wall of the feed regulating valve pipe 316 is provided with a hydrogen bubbling hole 317; the outer wall of the hydrogen feed regulating valve pipe 316 is provided with a hydrogen bubbling hole 317, the outer wall of the vaporizer 311 is provided with a liquid trichlorosilane feed regulating valve pipe 318, the liquid trichlorosilane feed regulating valve pipe 318 is connected to the outer wall of the vaporizer 311, the outer wall of the vaporizer 311 is provided with a mixing gas pipe 319, the mixing gas pipe 319 is connected to the outer wall of the vaporizer 311 The outer wall of the vaporizer 311 is provided with a slag discharge pipe 320; the slag discharge pipe 320 is connected to the vaporizer 311, the outer wall of the vaporizer 311 is provided with a steam inlet regulating valve pipe 321, the steam inlet regulating valve pipe 321 is connected to the shell side of the vaporizer 311, the outer wall of the vaporizer 311 is provided with a steam condensate pipe 322, the steam condensate pipe 322 is connected to the shell side of the vaporizer 311, and the outer wall of the vaporizer 311 is provided with a connection;

[0028] Furthermore, in this embodiment, liquid trichlorosilane is controlled to enter the vaporizer 311 through a feed regulating valve pipe 318 and is controlled by a liquid level monitor 314; hydrogen is controlled to enter the bottom of the vaporizer 311 through a hydrogen feed regulating valve pipe 316 and is evenly distributed through hydrogen bubbling holes 317; after vaporization, silicon tetrachloride and hydrogen are mixed and sent to the next process through a mixed gas pipe 319; steam is controlled to enter the shell side of the vaporizer 311 through a steam inlet regulating valve pipe 321 to heat the silicon tetrachloride and hydrogen in the vaporizer 311; and condensate flows away from the bottom steam condensate pipe 322 to reduce the boiling point of silicon tetrachloride.

[0029] Embodiment 2:

[0030] On the basis of Example 1, a preferred embodiment of a silicon tetrachloride vaporization device provided by the utility model is as follows Figure 1-5As shown: the cooling assembly 4 includes: a reaction tail gas cooling head 411, fixedly connected to one side of the vaporizer 311; a gasket 412, fixedly connected to the shell side of the reaction tail gas cooling head 411; a tail gas heat exchange pipe 413, arranged on the inner wall of the connecting hole; the tail gas heat exchange pipe 413 is fixedly connected to the inner wall of the connecting hole, the tail gas heat exchange pipe 413 is connected to the reaction tail gas cooling head 411, a partition plate 414 is arranged inside the reaction tail gas cooling head 411, the partition plate 414 is fixedly connected to the inner wall of the reaction tail gas cooling head 411, and a high-temperature cooling water inlet pipe 415 is arranged on the outer wall of the reaction tail gas cooling head 411; the high-temperature cooling water inlet pipe 415 is connected to the shell side of the reaction tail gas cooling head 411 A jacketed high-temperature water pipe 416 is provided on the outer wall of the bottom plate 1, and the jacketed high-temperature water pipe 416 is connected to the shell side of the reaction tail gas cooling head 411, and a cooling reaction tail gas outlet pipe 417 is provided on the outer wall of the reaction tail gas cooling head 411; the cooling reaction tail gas outlet pipe 417 is connected to the reaction tail gas cooling head 411, and a reaction tail gas pipe 418 is provided inside the jacketed high-temperature water pipe 416, and the reaction tail gas pipe 418 is connected to the reaction tail gas cooling head 411, and a cushion block 419 is provided between the reaction tail gas pipe 418 and the jacketed high-temperature water pipe 416, and the cushion block 419 is fixedly connected to the outer wall of the reaction tail gas pipe 418, and the other side of the cushion block 419 is fixedly connected to the inner wall of the jacketed high-temperature water pipe 416;

[0031] Furthermore, in this embodiment, the high-temperature tail gas after the reaction exchanges heat with the jacket high-temperature water pipe 416 in the reaction tail gas pipe 418, enters the lower chamber of the reaction tail gas cooling head 411, enters the tail gas heat exchange pipe 413, exchanges heat with liquid silicon tetrachloride, enters the upper chamber of the reaction tail gas cooling head 411, and flows out from the high-temperature cooling water inlet pipe 415 to the next process; the amount of hydrogen entering the vaporizer 311 is changed by the hydrogen feed regulating valve pipe 316 to control the boiling point of the liquid silicon tetrachloride in the vaporizer 311, and the steam amount is adjusted by adjusting the steam inlet regulating valve pipe 321 to control the vaporization of the liquid silicon tetrachloride; the vaporizer 311 is monitored by the 311 pressure monitor 312, the temperature monitor 313, and the liquid level monitor 314 instruments, and at the same time, a slag discharge port and a slag discharge pipeline are provided at the bottom of the vaporizer 311, which is convenient for handling silicon powder and other impurities in silicon tetrachloride, reducing energy consumption, and more stable control during operation.

[0032] When in use, first, liquid trichlorosilane is controlled to enter the vaporizer 311 by the feed regulating valve pipe 318 and is controlled by the liquid level monitor 314; hydrogen is controlled to enter the bottom of the vaporizer 311 by the hydrogen feed regulating valve pipe 316 and is evenly distributed through the hydrogen bubbling hole 317; the vaporized silicon tetrachloride and hydrogen are mixed and sent to the next process through the mixed gas pipe 319; steam is controlled to enter the shell side of the vaporizer 311 through the steam inlet regulating valve pipe 321 to heat the silicon tetrachloride and hydrogen in the vaporizer 311; the condensate flows away from the bottom steam condensate pipe 322, and then the high-temperature tail gas after the reaction is heat-exchanged with the jacket high-temperature water pipe 416 in the reaction tail gas pipe 418 and enters the lower chamber of the reaction tail gas cooling head 411, After entering the tail gas heat exchange pipe 413 and exchanging heat with the liquid silicon tetrachloride, it enters the upper chamber of the reaction tail gas cooling head 411 and flows out from the high-temperature cooling water inlet pipe 415 to the next process; the amount of hydrogen entering the vaporizer 311 is changed through the hydrogen feed regulating valve pipe 316 to control the boiling point of the liquid silicon tetrachloride in the vaporizer 311, and the steam amount is adjusted by adjusting the steam inlet regulating valve pipe 321 to control the vaporization of the liquid silicon tetrachloride; the vaporizer 311 is monitored by the 311 pressure monitor 312, the temperature monitor 313, and the liquid level monitor 314. At the same time, a slag discharge port and a slag discharge pipeline are provided at the bottom of the vaporizer 311 to facilitate the treatment of silicon powder and other impurities in the silicon tetrachloride, reduce energy consumption, and make the control more stable during operation.

[0033] Finally, it should be noted that the above description is only a preferred embodiment of the utility model and is not intended to limit the utility model. Although the utility model is described in detail with reference to the above embodiments, those skilled in the art can still modify the technical solutions recorded in the above embodiments or replace some of the technical features therein by equivalents. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the utility model shall be included in the protection scope of the utility model.

Claims

1. A silicon tetrachloride vaporization device, characterized in that: It comprises a bottom plate (1); A support block (2) fixedly connected to the upper surface of the base plate (1); A carburetor assembly (3) arranged on the upper surface of the support block (2); A cooling assembly (4) disposed on one side of the vaporizer assembly (3); Wherein, the vaporizer assembly (3) comprises: A vaporizer (311) fixedly connected to the upper surface of the support block (2); A pressure monitor (312) is fixedly mounted on the outer wall of the carburetor (311); A temperature monitor (313) is fixedly mounted on the outer wall of the vaporizer (311); The liquid level monitor (314) is arranged on the outer wall of the vaporizer (311).

2. A silicon tetrachloride vaporizing device according to claim 1, characterized in that: The liquid level monitor (314) is arranged in communication with the outer wall of the vaporizer (311); a cushion block 1 (315) is arranged on the shell side of the vaporizer (311); the cushion block 1 (315) is fixedly connected to the inside of the shell side of the vaporizer (311); a hydrogen feed regulating valve pipe (316) is arranged on the outer wall of the vaporizer (311); the hydrogen feed regulating valve pipe (316) is arranged in communication with the outer wall of the vaporizer (311); and a hydrogen bubbling hole (317) is arranged on the outer wall of the hydrogen feed regulating valve pipe (316).

3. A silicon tetrachloride vaporizing device according to claim 2, characterized in that: The outer wall of the hydrogen feed regulating valve pipe (316) is provided with a hydrogen bubbling hole (317); the outer wall of the vaporizer (311) is provided with a liquid trichlorosilane feed regulating valve pipe (318); the liquid trichlorosilane feed regulating valve pipe (318) is arranged in communication with the outer wall of the vaporizer (311); the outer wall of the vaporizer (311) is provided with a mixing gas pipe (319); the mixing gas pipe (319) is arranged in communication with the outer wall of the vaporizer (311); and the outer wall of the vaporizer (311) is provided with a slag discharge pipe (320).

4. A silicon tetrachloride vaporizing device according to claim 3, characterized in that: The slag discharge pipe (320) is connected to the vaporizer (311); a steam inlet regulating valve pipe (321) is provided on the outer wall of the vaporizer (311); the steam inlet regulating valve pipe (321) is connected to the shell side of the vaporizer (311); a steam condensate pipe (322) is provided on the outer wall of the vaporizer (311); the steam condensate pipe (322) is connected to the shell side of the vaporizer (311); and a connection is opened on the outer wall of the vaporizer (311).

5. A silicon tetrachloride vaporizing device according to claim 1, characterized in that: The cooling component (4) comprises: A reaction tail gas cooling head (411) is fixedly connected to one side of the vaporizer (311); The second gasket (412) is fixedly connected to the shell side of the reaction tail gas cooling head (411); The tail gas heat exchange pipe (413) is arranged on the inner wall of the connecting hole.

6. A silicon tetrachloride vaporizing device according to claim 5, characterized in that: The tail gas heat exchange pipe (413) is fixedly connected to the inner wall of the connection hole, the tail gas heat exchange pipe (413) is connected to the reaction tail gas cooling head (411), a partition plate (414) is arranged inside the reaction tail gas cooling head (411), the partition plate (414) is fixedly connected to the inner wall of the reaction tail gas cooling head (411), and a high-temperature cooling water inlet pipe (415) is arranged on the outer wall of the reaction tail gas cooling head (411).

7. A silicon tetrachloride vaporizing device according to claim 6, characterized in that: The high-temperature cooling water inlet pipe (415) is connected to the shell side of the reaction tail gas cooling head (411), the outer wall of the bottom plate (1) is provided with a jacketed high-temperature water pipe (416), the jacketed high-temperature water pipe (416) is connected to the shell side of the reaction tail gas cooling head (411), and the outer wall of the reaction tail gas cooling head (411) is provided with a cooling reaction tail gas outlet pipe (417).

8. A silicon tetrachloride vaporizing device according to claim 7, characterized in that: The cooling reaction tail gas outlet pipe (417) is connected to the reaction tail gas cooling head (411), a reaction tail gas pipe (418) is arranged inside the jacket high-temperature water pipe (416), the reaction tail gas pipe (418) is connected to the reaction tail gas cooling head (411), a pad three (419) is arranged between the reaction tail gas pipe (418) and the jacket high-temperature water pipe (416), the pad three (419) is fixedly connected to the outer wall of the reaction tail gas pipe (418), and the other side of the pad three (419) is fixedly connected to the inner wall of the jacket high-temperature water pipe (416).

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