Multi-cavity gas isolation device

Abstract

The utility model relates to the technical field of semiconductor processing equipment, in particular to a multi-chamber gas isolation device, which comprises a mounting plate, a gas guide pipe, a gas isolation mechanism and a connecting block, the gas isolation mechanism is connected onto the mounting plate through the connecting block, one end of the gas guide pipe is connected with a gas inlet of the gas isolation mechanism, and the other end of the gas guide pipe is connected with a gas outlet of the gas isolation mechanism. The other end of the gas-guide tube is connected with a gas source. Due to the arrangement of the gas isolation mechanism, the gas isolation devices on the two sides of the cathode cavities form one path of gas, the gas adjustment of the cathode cavities is more controllable, and the gas between the two cathode cavities can be effectively isolated; the problem of gas blow-by is solved, the process environment is optimized, the equipment can cope with various composite film layers, and the applicability is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor processing equipment, in particular to a multi-chamber gas isolation device. Background Art

[0002] PVD is the abbreviation of Physical Vapor Deposition, which refers to the method of using physical methods (such as evaporation, sputtering, etc.) to vaporize the coating material and deposit it into a metal, alloy or compound film on the surface of the substrate. In the field of photovoltaic cell chip manufacturing, PVD technology is a process technology for preparing thin films on substrates. PVD equipment usually rotates the cathode to improve the utilization rate of the target material and save costs. The equipment consists of multiple cavities forming a continuous line with large production capacity and high efficiency. The cathodes of traditional PVD equipment are interconnected, and the types and contents of gases required for various target materials are different, which will cause the gas to flow between the cathodes, commonly known as cross-gas, affecting the quality of the film layer and the difficulty of process debugging. Utility Model Content

[0003] In view of the deficiencies in the prior art, the purpose of the present invention is to provide a multi-chamber gas isolation device which has a simple structure, is easy to use and can prevent gas cross-talk. The setting of the gas isolation mechanism of the present invention enables the gas isolation devices on both sides of the cathode chamber to have one gas, which is more controllable for cathode chamber gas regulation and can effectively isolate the gas between the two cathode chambers; it solves the problem of gas cross-talk, optimizes the process environment, enables the equipment to cope with various composite film layers, and improves applicability.

[0004] To achieve the above-mentioned purpose, the technical solution of the utility model is: a multi-chamber gas isolation device, including a mounting plate and an air duct, characterized in that it also includes a gas isolation mechanism and a connecting block, the gas isolation mechanism is connected to the mounting plate through the connecting block, one end of the air duct is connected to the air inlet of the gas isolation mechanism, and the other end of the air duct is connected to the gas source.

[0005] Furthermore, the gas isolation mechanism includes an air distribution plate and a sealing plate, a gas flow channel is provided on one side of the air distribution plate, a gas outlet is provided on the other side of the air distribution plate, a gas inlet is provided on the sealing plate, the sealing plate is installed on the air distribution plate to seal the gas flow channel of the air distribution plate, and the gas inlet on the sealing plate is connected to the gas flow channel on the air distribution plate.

[0006] Furthermore, the gas distribution plate is provided with a plurality of gas outlets at even intervals, and a gas inlet is provided in the middle of the sealing plate.

[0007] Furthermore, the gas distribution plate is provided with a plurality of gas flow channels, and the gas flow channels are of a folded structure so that the distance from the gas inlet to each gas outlet is equal.

[0008] Furthermore, the connection block is an L-shaped structure, one side of the connection block is fixedly connected to the mounting plate, and the other side of the connection block is fixedly connected to the sealing plate of the gas isolation mechanism.

[0009] Furthermore, the gas isolation device includes two parallel arranged gas isolation mechanisms and two baffles, the baffles are installed at both ends of the gas isolation mechanisms, the baffles are vertically connected to the ends of the gas distribution plates to form a trough structure, and the gas outlets of the two gas isolation mechanisms are both located in the trough body surrounded by the gas isolation mechanisms and the baffles.

[0010] Furthermore, the multi-chamber comprises a plurality of cathode chambers and molecular pump chambers, the cathode chambers and the molecular pump chambers are arranged at intervals, and the gas isolation devices are installed on both sides of the cathode chambers.

[0011] The advantages of adopting the technical solution of the utility model are:

[0012] The setting of the gas isolation mechanism of the utility model makes the gas isolation devices on both sides of the cathode chamber have one gas, which is more controllable for the cathode chamber gas regulation and can effectively isolate the gas between the two cathode chambers; it solves the problem of gas cross-talk, optimizes the process environment, enables the equipment to cope with various composite film layers, and improves applicability. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] In order to more clearly illustrate the technical solutions in the present invention or the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings in the following description are only for the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0014] Figure 1 This is a schematic diagram of the overall structure of the gas isolation device of the utility model;

[0015] Figure 2 This is a schematic diagram of the explosion of the gas isolation device of the utility model;

[0016] Figure 3 This is a schematic diagram of the structure of the air distribution plate of the utility model;

[0017] Figure 4 This is a schematic diagram of the gas isolation device of the utility model when in use.

[0018] The markings in the above figure are: 1, cathode chamber; 2, molecular pump chamber; 3, mounting plate; 4, gas guide tube; 5, gas isolation mechanism; 51, gas distribution plate; 52, sealing plate; 53, gas flow channel; 54, gas outlet; 55, gas inlet; 6, connecting block; 7, baffle; 8, molecular pump. DETAILED DESCRIPTION

[0019] In order to make the purpose, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with specific embodiments.

[0020] It should be noted that, unless otherwise defined, the technical terms or scientific terms used in the present invention should be understood by people with ordinary skills in the field to which the present invention belongs. The words "first", "second" and similar words used in the present invention do not indicate any order, quantity or importance, but are only used to distinguish different components. "Include" or "comprise" and similar words mean that the elements or objects appearing before the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0021] like Figures 1 to 4 As shown, a multi-chamber gas isolation device includes a mounting plate 3 and an air duct 4, and also includes a gas isolation mechanism 5 and a connection block 6. The gas isolation mechanism 5 is connected to the mounting plate 3 through the connection block 6, one end of the air duct 4 is connected to the air inlet of the gas isolation mechanism 5, and the other end of the air duct 4 is connected to the gas source. The setting of the gas isolation mechanism of the utility model makes the gas isolation devices on both sides of the cathode chamber one-way gas, which is more controllable for the cathode chamber gas regulation and can effectively isolate the gas between the two cathode chambers; it solves the problem of gas cross-talk, optimizes the process environment, enables the equipment to cope with various composite film layers, and improves applicability.

[0022] The gas isolation mechanism 5 includes an air distribution plate 51 and a sealing plate 52. A gas flow channel 53 is provided on one side of the air distribution plate 51, a gas outlet 54 is provided on the other side of the air distribution plate 51, and a gas inlet 55 is provided on the sealing plate 52. The sealing plate 52 is installed on the air distribution plate 51 to seal the gas flow channel 53 of the air distribution plate 51, and the gas inlet 55 on the sealing plate 52 is connected with the gas flow channel 53 on the air distribution plate 51. The air distribution plate 51 is provided with a plurality of evenly spaced gas outlets 54, and a gas inlet 55 is provided in the middle of the sealing plate 52. The air distribution plate 51 is provided with a plurality of gas flow channels 53, and the gas flow channels 53 are folded structures so that the distance from the gas inlet to each gas outlet is equal. Specifically, the air distribution plate structure adopts a special design so that the distance from the gas inlet to each outlet is equal, ensuring uniform gas outlet.

[0023] In order to ensure the firmness of the connection and increase the connection area, the connecting block 6 is an L-shaped structure, one side of the connecting block 6 is fixedly connected to the mounting plate 3, and the other side of the connecting block 6 is fixedly connected to the sealing plate 52 of the gas isolation mechanism 5.

[0024] The gas isolation device includes two parallel arranged gas isolation mechanisms 5 and two baffles 7. The baffles 7 are installed at both ends of the gas isolation mechanism 5. The baffles 7 are vertically connected to the ends of the gas distribution plate 51 to form a slot structure. The gas outlets of the two gas isolation mechanisms 5 are both located in the slot surrounded by the gas isolation mechanism 5 and the baffles 7. Specifically, it is composed of two groups of upper and lower gas isolation devices, with baffles installed on both sides to form a substrate channel. The gas isolation device uses sputtering gas (generally argon) as auxiliary gas, which is transported to the upper and lower groups of gas isolation devices through a tee.

[0025] The multi-chamber includes multiple cathode chambers 1 and molecular pump chambers 2, the cathode chamber 1 and the molecular pump chamber 2 are arranged at intervals, and the gas isolation device is installed on both sides of the cathode chamber 1. Specifically, the gas isolation device is installed on both sides of the cathode chamber, and there is a molecular pump chamber between the cathode chambers. A molecular pump 8 is provided above the molecular pump chamber, and the molecular pump chamber forms a low-pressure area. The gas coming out of the gas isolation device flows toward the molecular pump, and the isolated gas enters the cathode chamber. The gas isolation devices on both sides of the cathode chamber are one-way gas, which is more controllable for the cathode chamber gas regulation and can effectively isolate the gas between the two cathode chambers.

[0026] The gas flow channel in the gas distribution plate in the gas isolation device of the utility model is specially designed to make the distance from the gas inlet to each outlet equal, so that the gas flow rate at the outlet of the gas distribution plate is equal, ensuring uniform gas outlet without affecting the gas atmosphere of the cathode cavity; in addition, the gas isolation devices on both sides of the cathode cavity are one-way gas, which is more controllable for the cathode cavity gas regulation and can effectively isolate the gas between the two cathode cavities.

[0027] Those skilled in the art should understand that the discussion of any of the above embodiments is merely illustrative and is not intended to imply that the scope of the present invention is limited to these examples; under the concept of the present invention, the technical features in the above embodiments or different embodiments can also be combined, the steps can be implemented in any order, and there are many other variations of the different aspects of the present invention as described above, which are not provided in detail for the sake of simplicity. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.

Claims

1. A multi-chamber gas isolation device, comprising a mounting plate (3) and an air guide tube (4), characterized in that: It also comprises a gas isolation mechanism (5) and a connection block (6), wherein the gas isolation mechanism (5) is connected to the mounting plate (3) via the connection block (6), one end of the gas guide pipe (4) is connected to the gas inlet of the gas isolation mechanism (5), and the other end of the gas guide pipe (4) is connected to the gas source.

2. A multi-chamber gas isolation device as claimed in claim 1, characterized in that: The gas isolation mechanism (5) comprises a gas distribution plate (51) and a sealing plate (52); a gas flow channel (53) is provided on one side of the gas distribution plate (51); a gas outlet (54) is provided on the other side of the gas distribution plate (51); a gas inlet (55) is provided on the sealing plate (52); the sealing plate (52) is mounted on the gas distribution plate (51) to seal the gas flow channel (53) of the gas distribution plate (51); and the gas inlet (55) on the sealing plate (52) is in communication with the gas flow channel (53) on the gas distribution plate (51).

3. A multi-chamber gas isolation device as claimed in claim 2, characterized in that: The gas distribution plate (51) is provided with a plurality of gas outlets (54) at even intervals, and a gas inlet (55) is provided in the middle of the sealing plate (52).

4. A multi-chamber gas isolation device as claimed in claim 3, characterized in that: The gas distribution plate (51) is provided with a plurality of gas flow channels (53), and the gas flow channels (53) are of a folded structure, so that the distance from the gas inlet to each gas outlet is equal.

5. A multi-chamber gas isolation device according to any one of claims 2 to 4, characterized in that: The connecting block (6) is an L-shaped structure, one side of the connecting block (6) is fixedly connected to the mounting plate (3), and the other side of the connecting block (6) is fixedly connected to the sealing plate (52) of the gas isolation mechanism (5).

6. A multi-chamber gas isolation device as claimed in claim 5, characterized in that: The gas isolation device comprises two gas isolation mechanisms (5) and two baffles (7) arranged in parallel, the baffles (7) being mounted at both ends of the gas isolation mechanism (5), the baffles (7) being vertically connected to the ends of the gas distribution plate (51) to form a trough structure, and the gas outlets of the two gas isolation mechanisms (5) are both located in the trough body surrounded by the gas isolation mechanism (5) and the baffles (7).

7. A multi-chamber gas isolation device as claimed in claim 1, characterized in that: The multi-chamber comprises a plurality of cathode chambers (1) and molecular pump chambers (2), the cathode chambers (1) and the molecular pump chambers (2) are arranged at intervals, and the gas isolation devices are installed on both sides of the cathode chamber (1).

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