Straight pull type round silicon core growth furnace

Abstract

The utility model discloses a straight-pull type round silicon core growing furnace, which comprises a furnace body, a lifting and rotating device, a multi-shaft lifting disc device and a heat shield lifting device, the furnace body comprises a main furnace chamber and an auxiliary furnace chamber, the auxiliary furnace chamber is detachably connected with the main furnace chamber, the lifting and rotating device is respectively connected with the furnace body and the multi-shaft lifting disc device, and the heat shield lifting device is connected with the multi-shaft lifting disc device. The multi-shaft lifting disc device is connected with a plurality of groups of seed crystals, and the heat shield lifting device comprises a lifting driving device and a porous water-cooled jacket connected with the lifting driving device. When a silicon material needs to be fed again, the lifting device drives the porous water-cooled jacket to move upwards, and the charging barrel connected to the porous water-cooled jacket synchronously moves upwards along with the porous water-cooled jacket; and the porous water-cooled jacket and the charging barrel are moved into the auxiliary furnace chamber for re-feeding, and the rotary vane valve is closed to seal the main furnace chamber, so that the re-feeding function of the silicon material can be realized under the switching of the opening state and the closing state of the rotary vane valve without stopping the furnace in the drawing process.

Description

Technical Field

[0001] The utility model belongs to the field of silicon core preparation and relates to a vertical pull type round silicon core growth furnace. Background Art

[0002] Most of the existing silicon cores are prepared by zone melting, and the drawing process is mainly completed by high-frequency coils and seed crystal chucks. However, this method has a limited number of silicon cores that can be drawn per furnace, and during the drawing process, the pulses generated by the stepper motor and AC motor used will affect the drawing process of the silicon core, resulting in low drawing efficiency. In addition, the existing cooling plates also have the following defects: First, most cooling plates adopt an integral design and a single-hole structure, and the movable joints are assembled and sealed. The life of the sealing ring of this cooling plate is greatly affected under long-term vacuum and high-temperature conditions, and there is a risk of water leakage at the sealing joints. The single-hole cooling plate First, during the silicon core pulling process, the thermal radiation of the silicon liquid will directly radiate upward through the center hole of the cooling plate, causing the temperature of the entire furnace chamber and the auxiliary chamber to rise sharply, and placing high requirements on the material of the pulling device; second, the cooling plate cannot be lifted to a position above the rotary vane valve, resulting in the inability to re-feed silicon material during the crystal pulling process, resulting in the inability to continue crystal pulling; third, the cooling plate cannot be lifted to the end of the auxiliary chamber, which will cause the silicon liquid and volatile impurities in the furnace to condense onto its side walls or bottom during the crystal pulling process. When the condensation thickness reaches a certain level, there will be a risk of falling, affecting the purity of the silicon liquid, and there will also be a risk of the crystal getting stuck during crystal pulling. Summary of the invention

[0003] In order to overcome at least one deficiency of the prior art, the utility model provides a vertical pull type round silicon core growing furnace.

[0004] In order to achieve the above-mentioned purpose, the utility model adopts the following technical scheme: a vertical pulling round silicon core growth furnace, including a furnace body, a pulling and rotating device, a multi-axis pulling disk device and a heat shield lifting device, the furnace body includes a main furnace chamber and an auxiliary furnace chamber, the auxiliary furnace chamber is detachably connected to the main furnace chamber, the pulling and rotating device is respectively connected to the furnace body and the multi-axis pulling disk device, the multi-axis pulling disk device is connected to multiple groups of seed crystals, and the heat shield lifting device includes a lifting drive device and a porous water cooling jacket connected to the lifting drive device.

[0005] Furthermore, the main furnace chamber is connected to a rotary vane valve, which is located between the auxiliary furnace chamber and the main furnace chamber. The opening and closing of the rotary vane valve controls the connection and disconnection between the main furnace chamber and the auxiliary furnace chamber.

[0006] Furthermore, the pulling and rotating device includes a crystal lifting mechanism, a rotating mechanism and a horizontal adjustment mechanism. The multi-axis pulling disk device is connected to multiple groups of seed crystals. The crystal lifting mechanism and the rotating mechanism are respectively connected to the multi-axis pulling disk device. The horizontal adjustment mechanism is connected to the crystal lifting mechanism.

[0007] Furthermore, the crystal lifting mechanism includes a lifting mechanism and a tungsten wire rope connected to the lifting mechanism, the lifting mechanism is connected to the horizontal adjustment mechanism, one end of the tungsten wire rope is wound on the lifting and winding shaft, and the other end is connected to the multi-axis lifting disk device; the rotating mechanism includes a cable retractable mechanism and a rotating motor, the cable retractable mechanism is connected to the auxiliary furnace chamber, the rotating motor is arranged on the multi-axis lifting disk device and is linked with multiple groups of seed crystals, and the cable retractable mechanism and the rotating motor are connected by a cable.

[0008] Furthermore, the multi-axis lifting disk device includes a box body and a gear transmission mechanism, the gear transmission mechanism is located in the box body, the tungsten wire rope and the rotating motor are respectively connected to the box body, the power output shaft of the rotating motor is connected to the gear transmission mechanism, the rotating motor serves as the power source of the gear transmission mechanism, and the gear transmission mechanism connects multiple groups of seed crystals.

[0009] Furthermore, the heat shield lifting device is connected to the auxiliary furnace chamber, and the heat shield lifting device includes a lifting drive device and a porous water cooling jacket. The lifting drive device is connected to the porous water cooling jacket, and the lifting drive device is connected to the auxiliary furnace chamber. The lifting drive device controls the porous water cooling jacket to move up and down.

[0010] Furthermore, the porous water cooling jacket includes at least two groups of water cooling plate assemblies, the water cooling plate assembly includes a water cooling plate and a water inlet and return device connected to the water cooling plate, the water cooling plate is provided with a water flow channel connected to the water inlet and return device, and the water cooling plates of the two groups of water cooling plate assemblies are connected.

[0011] Furthermore, the water inlet and return device includes a water inlet structure and a water return structure, the water inlet structure and the water return structure are respectively connected to the water flow channel of the water cooling disk, and the water inlet structure, the water flow channel and the water return structure constitute the water inlet and return channel.

[0012] Furthermore, the water inlet and return device also includes a regulating device, which includes a temperature measuring flow meter and an over-temperature switch. The temperature measuring flow meter and the over-temperature switch are arranged on the water return structure, and the over-temperature switch is connected to the temperature measuring flow meter.

[0013] Furthermore, the lifting drive device includes two groups, the two groups of lifting drive devices are respectively connected to the auxiliary furnace chamber, and the two groups of lifting drive devices are respectively connected to the two groups of water cooling plate assemblies.

[0014] In summary, the utility model is beneficial in that:

[0015] 1) The cooling jacket of the utility model is a split structure consisting of two groups of water-cooled plate assemblies, which is simple to assemble. The water-cooled plate assembly is an integrated structure, and the water inlet pipe and the water return pipe are welded to the water-cooled plate, which effectively avoids the risk of failure of the pipe joints in a vacuum high-temperature environment and ensures the reliability of the cooling jacket; the water-cooled plates of the two groups of water-cooled plate assemblies have separate water inlet and return structures, which reduces the cooling path and effectively improves the cooling effect; the water inlet and return devices are provided with a temperature measuring flow meter and an over-temperature switch, which realize the function of real-time monitoring of water temperature and flow during crystal pulling. When the water temperature detected by the temperature measuring flow meter exceeds the set value, the over-temperature switch threshold alarms, and the water flow is adjusted through manual or automatic intervention. The over-temperature pre-tightening function is effectively realized through the over-temperature switch, further improving the cooling effect.

[0016] 2) When the silicon material of the utility model needs to be re-added, the lifting device drives the porous water-cooling jacket to move upward, and the barrel connected to the porous water-cooling jacket moves upward synchronously with the porous water-cooling jacket, and the porous water-cooling jacket and the barrel are moved to the auxiliary furnace chamber for re-addition, and the rotary vane valve is closed to seal the main furnace chamber, thereby realizing the re-addition function of silicon material without stopping the furnace during the drawing process under the switching state of the rotary vane valve open and closed.

[0017] 3) The utility model uses a lifting device to lift the porous water-cooling jacket to move up and down, and a structure in which the auxiliary furnace chamber and the main furnace chamber are detachably connected to realize the function of cleaning the furnace without stopping the furnace, effectively preventing impurities from falling and ensuring the purity of the silicon liquid.

[0018] 4) The utility model uses a rotating device as a power source, and achieves an ideal number of output shafts through the structural design within the multi-axis gearbox, which greatly improves production efficiency and greatly improves the production efficiency and quality of the silicon core. The multi-axis gearbox has a simple manufacturing process and is suitable for large-scale modern production. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 This is a schematic diagram of the crystal pulling position of the round silicon core growth furnace of the utility model.

[0020] Figure 2 This is a schematic diagram of the position of the round silicon core growth furnace of the utility model before adding materials.

[0021] Figure 3 This is a schematic diagram of the feeding position of the round silicon core growth furnace of the utility model.

[0022] Figure 4 This is a schematic diagram of the interior of the multi-axis lifting disk device of the utility model.

[0023] Figure 5 It is a schematic diagram of the distribution of the pull-out axes of the utility model.

[0024] Figure 6 It is a schematic diagram of a porous water cooling jacket of the utility model.

[0025] Figure 7 It is a top view of the porous water cooling jacket of the utility model.

[0026] Figure 8 It is the front view of the porous water cooling jacket of the utility model.

[0027] Fig. 9 For the utility model Figure 7 Sectional view of AA.

[0028] Fig.10 For the utility model Figure 8 Cross-sectional view of BB.

[0029] Fig.11 For the utility model Figure 8 Cross-sectional view of CC.

[0030] Symbols in the figure: main furnace chamber 11, auxiliary furnace chamber 12, rotary vane valve 14, crystal lifting mechanism 21, rotating mechanism 22, multi-axis lifting plate device 23, horizontal adjustment mechanism 24, lifting drive device 31, porous water cooling jacket 32, furnace bottom plate 111, lower furnace chamber 112, upper furnace chamber 113, furnace cover 114, quartz crucible 131, insulation system, main heater 132, side heater 133, heat conduction tube 134, bottom insulation layer 135, upper insulation layer 136, lower insulation layer 137, silicon liquid 138, graphite support rod 139, tungsten wire rope 211, lifting mechanism 212, cable retracting mechanism 221, rotating motor 222, cable 223, outer ring slave drive wheel 230, box 231, main drive wheel 232, outer ring main drive wheel 233, inner ring main drive wheel 234, lifting and pulling shaft 235, pulling tungsten wire rope 236, pulling weight 237, slave driving wheel 238, inner ring slave driving wheel 239, lifting driving device 31, porous water cooling jacket 32, water cooling plate assembly 33, water cooling plate 34, water inlet and return device 35, cooling hole 340, water cooling jacket upper plate 341, water cooling jacket connecting pipe 342, water cooling jacket lower plate 343, temperature measuring flow meter 350, water inlet pipe joint 351, water inlet pipe 352, water return pipe joint 353, water return pipe 354, over-temperature switch 355, water inlet chamber 3411 on water cooling jacket, water return chamber 3412 on water cooling jacket, circulation chamber 3413, first connecting pipe 3421, second connecting pipe 3422, third connecting pipe 3423, fourth connecting pipe 3424, water inlet chamber 3431 below water cooling jacket, water return chamber 3432 below water cooling jacket, screw hole 3433. DETAILED DESCRIPTION

[0031] The following describes the implementation of the present invention through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification. The present invention can also be implemented or applied through other different specific implementations, and the details in this specification can also be modified or changed in various ways based on different viewpoints and applications without departing from the spirit of the present invention. It should be noted that the following embodiments and features in the embodiments can be combined with each other without conflict.

[0032] It should be noted that the illustrations provided in the following embodiments are only schematic illustrations of the basic concept of the present invention, and thus the drawings only show components related to the present invention rather than being drawn according to the number, shape and size of components in actual implementation. In actual implementation, the type, quantity and proportion of each component may be changed at will, and the component layout may also be more complicated.

[0033] All directional indications in the embodiments of the present invention (such as up, down, left, right, front, back, horizontal, vertical...) are only used to explain the relative position relationship, movement status, etc. between the components in a certain specific posture. If the specific posture changes, the directional indication will also change accordingly.

[0034] Due to installation errors and other reasons, the parallel relationship referred to in the embodiments of the present invention may actually be an approximately parallel relationship, and the vertical relationship may actually be an approximately vertical relationship.

[0035] Embodiment 1:

[0036] like Figure 1-Figure 11 As shown, a vertical pulling round silicon core growth furnace includes a furnace body, a pulling and rotating device, a multi-axis pulling disk device 23 and a heat shield lifting device. The furnace body includes a main furnace chamber 11 and an auxiliary furnace chamber 12. The auxiliary furnace chamber 12 is detachably connected to the main furnace chamber 11. The pulling and rotating device is respectively connected to the furnace body and the multi-axis pulling disk device 23. The multi-axis pulling disk device 23 is connected to multiple groups of seed crystals. The heat shield lifting device includes a lifting drive device 31 and a porous water cooling jacket 32 ​​connected to the lifting drive device 31.

[0037] The main furnace chamber 11 is the main working environment during crystal pulling. The main furnace chamber 11 includes a furnace bottom plate 111, a lower furnace chamber 112, an upper furnace chamber 113 and a furnace cover 114 which are connected in sequence. The furnace cover 114 is connected to a rotary valve 14 which is located between the auxiliary furnace chamber 12 and the main furnace chamber 11. The opening and closing of the rotary valve 14 controls the connection between the main furnace chamber 11 and the auxiliary furnace chamber 12.

[0038] The main furnace chamber 11 is provided with a thermal field device, which includes a quartz crucible 131, a heat preservation system, a main heater 132, a side heater 133 and a heat conduction tube 134. The heat preservation system includes a lower heat preservation layer 137, an upper heat preservation layer 136 and a bottom heat preservation layer 135. The bottom heat preservation layer 135 is installed above the furnace bottom plate 111, and a main heater 132 is installed thereon. The main heater 132 is used to heat the bottom of the quartz crucible 131 to melt the silicon material. After the silicon material in the quartz crucible 131 is melted, Silicon liquid 138 is formed; the side heaters 133 are distributed in a circle around the furnace bottom plate 111 to ensure that the temperature around the crucible is uniform and stable; the lower insulation layer 137, the upper insulation layer 136 and the bottom insulation layer 135 together form a complete insulation system, so that the heat inside the furnace body is dissipated to the outside of the furnace as little as possible, energy saving and heat insulation, and the heat conduction tube 134 is installed above the upper insulation layer 136. On the one hand, it plays a role of heat insulation, and on the other hand, it guides argon gas to make the airflow convect evenly, so that the crystal pulling is more uniform.

[0039] A graphite support rod 139 is also provided at the bottom of the quartz crucible 131. The graphite support rod 139 is located at the center of the furnace bottom plate 111. The graphite support rod 139 can move up and down to compensate for the loss of silicon liquid and keep the liquid level of the silicon liquid stable at the same horizontal plane.

[0040] The pulling and rotating device includes a crystal lifting mechanism 21, a rotating mechanism 22 and a horizontal adjustment mechanism 24. The multi-axis pulling disk device 23 is connected to multiple groups of seed crystals. The crystal lifting mechanism 21 and the rotating mechanism 22 are respectively connected to the multi-axis pulling disk device 23. The horizontal adjustment mechanism 24 is connected to the crystal lifting mechanism 21. The multi-axis pulling disk device 23 is raised and lowered by the crystal lifting mechanism 21, the multiple groups of seed crystals are rotated by the rotating mechanism 22, and the position of the crystal lifting mechanism 21 is adjusted by the horizontal adjustment mechanism 24.

[0041] The horizontal adjustment mechanism 24 is fixed above the auxiliary furnace chamber 12. The crystal pulling and lifting mechanism 21 includes a lifting mechanism 212 and a tungsten wire rope 211 connected to the lifting mechanism. The lifting mechanism is connected to the horizontal adjustment mechanism 24. The horizontal adjustment mechanism 24 drives the lifting mechanism in the horizontal direction to ensure that the crystal pulling and lifting mechanism 21 is in a centered position.

[0042] The lifting mechanism includes a wire winding shaft support (not marked in the figure), a lifting wire winding shaft (not marked in the figure) and a wire winding shaft rotating motor (not marked in the figure). The wire winding shaft support is fixedly mounted on the horizontal adjustment mechanism 24, the wire winding shaft rotating motor is fixedly mounted on the wire winding shaft support, the lifting wire winding shaft is located inside the wire winding shaft support, the motor output shaft of the wire winding shaft rotating motor is connected to the lifting wire winding shaft, one end of the tungsten wire rope 211 is wound on the lifting wire winding shaft, and the other end is connected to the multi-axis lifting disk device 23. The wire winding shaft rotating motor is started to drive the lifting wire winding shaft to rotate, thereby realizing the retraction and release of the tungsten wire rope 211, so that the tungsten wire rope 211 lifts the multi-axis lifting disk device 23 according to the set crystal growth speed.

[0043] The rotating mechanism 22 includes a cable retracting mechanism 221 and a rotating motor 222. The cable retracting mechanism 221 is connected to the auxiliary furnace chamber 12. The rotating motor 222 is arranged on the multi-axis lifting disk device 23 and is linked with multiple groups of seed crystals. The cable retracting mechanism 221 and the rotating motor 222 are connected by a cable 223. The multi-axis lifting disk device 23 is raised and lowered by the tungsten wire rope 211, and the seed crystal is rotated by the rotating motor 222.

[0044] The crystal pulling and lifting mechanism 21 controls the tungsten wire rope 211 to lift and lower the multi-axis lifting disk device 23 and further controls the lifting and lowering of the seed crystal. During the lifting and lowering process of the multi-axis lifting disk device 23, the cable retracting and releasing mechanism 221 starts to control the synchronous lifting and lowering of the rotating motor 222 through the cable 223, so that the moving speed of the rotating motor 222 is consistent with that of the multi-axis lifting disk device 23, and the pressure of the rotating motor 222 on the multi-axis lifting disk device 23 is reduced as much as possible. The rotating motor 222 provides a power source to control the rotation of the seed crystal. When pulling the crystal, the seed crystal first contacts with the silicon liquid 138, and is acted upon by the crystal pulling and lifting mechanism 21 and the rotating mechanism 22. The seed crystal is lifted upward and rotated at the same time, so that the diameter of the seed crystal gradually increases to form a silicon core until the silicon core is generated.

[0045] The cable retractable mechanism 221 includes a retractable wire reel (not shown in the figure) and a retractable wire reel motor (not shown in the figure). The retractable wire reel motor is fixedly installed in the auxiliary furnace chamber 12, and the retractable wire reel is located inside the auxiliary furnace chamber 12. The motor output shaft of the retractable wire reel motor is fixedly connected to the retractable wire reel. One end of the cable 223 is wound on the retractable wire reel, and the other end is connected to the rotating motor 222. The retractable wire reel motor starts and drives the retractable wire reel to rotate, thereby realizing the retraction and release of the cable 223 and driving the rotating motor 222 to increase at a set speed.

[0046] The multi-axis lifting disk device 23 includes a box 231 and a gear transmission mechanism. The gear transmission mechanism is located in the box 231. The tungsten wire rope 211 and the rotating motor 222 are respectively connected to the box 231. The power output shaft of the rotating motor 222 is connected to the gear transmission mechanism. The rotating motor 222 serves as a power source for the gear transmission mechanism.

[0047] The gear transmission mechanism includes a main drive wheel 232, a slave drive wheel 238, an outer ring main drive wheel 233, an inner ring main drive wheel 234, an outer ring slave drive wheel 230 and an inner ring slave drive wheel 239. The power output shaft of the rotating motor 222 is connected to the main drive wheel 232, the main drive wheel 232 is meshed with the slave drive wheel 238, the slave drive wheel 238, the outer ring main drive wheel 233 and the inner ring main drive wheel 234 are coaxially arranged through a rotating shaft, the rotating shaft is rotatably connected to the housing 231, the outer ring main drive wheel 233 is meshed with the outer ring slave drive wheel 230, and the inner ring main drive wheel 239 is meshed with the outer ring slave drive wheel 230. 34 is meshed and connected with the inner ring slave driving wheel 239, and a pulling shaft 235 is fixedly arranged at the center of the outer ring slave driving wheel 230 and the inner ring slave driving wheel 239, and a pulling shaft 235 is fixedly arranged with a pulling tungsten wire rope 236, and a pulling weight 237 is fixedly arranged with the pulling weight 237, and a seed crystal is fixedly arranged with the pulling weight 237. The rotating device serves as the input power of the gear transmission mechanism to transmit the rotational motion from the main driving wheel 232, the slave driving wheel 238, the outer ring main driving wheel 233, the inner ring main driving wheel 234, the outer ring slave driving wheel 230 and the inner ring slave driving wheel 239 to the seed crystal in sequence, so that the seed crystal rotates.

[0048] The slave drive wheel 238 is coaxially arranged with the outer ring main drive wheel 233 and the inner ring main drive wheel 234. The rotation of the slave drive wheel 238 drives the outer ring main drive wheel 233 and the inner ring main drive wheel 234 to rotate simultaneously, thereby driving the outer ring slave drive wheel 230 and the inner ring slave drive wheel 239 to rotate simultaneously, so that the rotation direction of the seed crystal is consistent and the rotation speed is the same.

[0049] In this embodiment, multiple groups of outer ring slave driving wheels 230 and inner ring slave driving wheels 239 are respectively provided and distributed in inner and outer rings. The number and distribution of seed crystals can be set according to actual needs. The number of seed crystals is set to 46.

[0050] The present application drives the outer ring main driving wheel 233 and the inner ring main driving wheel 234 to rotate through the driving wheel 238, thereby driving multiple seed crystals to rotate synchronously, with the same rotation direction and the same speed, thereby realizing multi-axis crystal pulling with one-axis input and multiple-axis output, which effectively improves the production effect of silicon cores compared to the existing single-axis crystal pulling.

[0051] This application uses a rotating device as a power source and achieves an ideal number of output shafts through the structural design within a multi-axis gearbox, greatly improving production efficiency and greatly improving the production efficiency and quality of the silicon core. The multi-axis gearbox has a simple manufacturing process and is suitable for large-scale modern production.

[0052] The horizontal adjustment mechanism 24 may adopt a transmission structure such as a motor transmission, a cylinder transmission, etc., which is not limited in the present embodiment.

[0053] like Figure 6-Figure 11As shown, the heat shield lifting device is connected to the auxiliary furnace chamber 12, and the heat shield lifting device includes a lifting drive device 31 and a porous water cooling jacket 32. The lifting drive device 31 is connected to the porous water cooling jacket 32, and the lifting drive device 31 is connected to the auxiliary furnace chamber 12. The lifting drive device 31 controls the porous water cooling jacket 3 to move up and down.

[0054] The porous water cooling jacket 32 ​​has at least two groups of water cooling plate assemblies 33, and the water cooling plate assembly 33 includes a water cooling plate 34 and a water inlet and return device 35 connected to the water cooling plate. The water cooling plate 34 is provided with a water flow channel connected to the water inlet and return device 35, and the water cooling plates 34 of the two groups of water cooling plate assemblies 33 are connected.

[0055] The water cooling plate assembly 33 is an integrated structure. Two groups of water cooling plate assemblies 33 are connected to form a porous water cooling jacket. Compared with the existing integral water cooling jacket, the porous water cooling jacket in this embodiment is configured as a split structure composed of two groups of water cooling plate assemblies 33. The split porous water cooling jacket is simple to assemble and can be placed in the equipment as a whole, avoiding the risk of failure of the pipe joint in a vacuum high temperature environment.

[0056] The two groups of water cooling plate assemblies 33 are distributed on the left and right, but the number and distribution of the water cooling plate assemblies 33 in the present application are not limited thereto.

[0057] In this embodiment, the two groups of water cooling plate assemblies 33 have the same structure, and one group of water cooling plate assemblies 33 is taken as an example for structural description.

[0058] The water inlet and return device 35 includes a water inlet structure and a water return structure, and the water inlet structure and the water return structure are respectively connected to the water flow channel of the water cooling plate 34. The water inlet structure, the water flow channel and the water return structure constitute an inlet and return water channel. Water flows along the inlet and return water channel to realize the separate inlet and return water cooling of a single water cooling plate assembly 33. Compared with the existing integral water cooling jacket, which has the disadvantage of long water channel distribution and low cooling effect, the present application is assembled through a split water cooling plate assembly 33, and an independent inlet and return water device 35 is set in any water cooling plate assembly 33, so as to reduce the cooling path and effectively improve the cooling effect.

[0059] The water inlet structure includes an inlet pipe joint 351 and an inlet pipe 352. One end of the inlet pipe 352 is connected to the inlet pipe joint 351, and the other end is connected to the water inlet of the water flow channel. Water flows into the water flow channel through the inlet pipe joint 351, the inlet pipe 352 and the water inlet; the return water structure includes a return water pipe joint 353 and a return water pipe 354. One end of the return water pipe 354 is connected to the return water pipe joint 353, and the other end is connected to the water outlet of the water flow channel. Water flows out through the water outlet, the return water pipe 354 and the return water pipe joint 353.

[0060] The water inlet pipe 352 and the water return pipe 354 are coaxially arranged, and the water return pipe 354 is sleeved on the outside of the water inlet pipe 352. The ends of the water inlet pipe 352 and the water return pipe 354 are respectively connected to the water inlet and the water outlet. The water inlet pipe 352 and the water return pipe 354 are both made of insulation material to prevent the return water temperature from affecting the inlet water temperature.

[0061] The return water device 35 also includes a regulating device, which includes a temperature measuring flow meter 350 and an over-temperature switch 355. The temperature measuring flow meter 350 and the over-temperature switch 355 are arranged on the return water pipe 354. The over-temperature switch 355 is connected to the temperature measuring flow meter 350. The real-time water flow rate and temperature of the return water are detected by the temperature measuring flow meter 350, so as to realize the function of real-time monitoring of water temperature and flow rate during crystal pulling. When the water temperature detected by the temperature measuring flow meter 350 exceeds the set value, the over-temperature switch 355 threshold alarm is triggered, and the water flow rate is adjusted through manual or automatic intervention. The over-temperature pre-tightening function is effectively realized through the over-temperature switch 355, so as to further improve the cooling effect.

[0062] In this embodiment, the water inlet pipe 352 and the return pipe 354 are welded to the water cooling plate 34. Compared with the existing solution of sealing through flexible joints, in which the service life of the sealing ring is affected by high temperature and fails to leak, the present application eliminates the flexible joint assembly seal and the sealing ring, and directly welds the water inlet pipe 352 and the return pipe 354 to the water cooling plate 34, which can effectively avoid the risk of failure of the pipe joints in a vacuum high temperature environment.

[0063] The water cooling plate 34 includes a water cooling jacket upper plate 341, a water cooling jacket connecting pipe 342 and a water cooling jacket lower plate 343. The water cooling jacket upper plate 341 and the water cooling jacket lower plate 343 are connected by the water cooling jacket connecting pipe 342, and water flows between the water cooling jacket upper plate 341 and the water cooling jacket lower plate 343 through the connecting pipe 22.

[0064] A through cooling hole 340 and a middle hole (not shown) are respectively provided on the upper plate 341 and the lower plate 343 of the water cooling jacket. During crystal pulling, the seed crystal is lifted upward by the lifting device in the crystal preparation equipment, and the seed crystal passes through the cooling hole 340. When its diameter gradually increases to form a silicon core, water flows in the water cooling plate 34 to cool the seed crystal. The middle hole is insulated with graphite material, which completely solves the problem of thermal damage to the pulling device caused by the extremely high temperature caused by the heat radiation from the hole.

[0065] In this embodiment, the cooling holes 340 on the upper plate 341 of the water cooling jacket and the cooling holes 340 on the lower plate 343 of the water cooling jacket correspond one to one. There are a plurality of cooling holes 340, the number of which can be set according to needs, and the cooling holes 340 are arranged in an inner and outer double circle.

[0066] The upper plate 341 of the water cooling jacket is provided with an upper water inlet chamber 3411 of the water cooling jacket and an upper water return chamber 3412 of the water cooling jacket, which are separated by a partition to form an independent cavity. The water inlet is arranged on the upper water inlet chamber 3411 of the water cooling jacket, and the lower plate 343 of the water cooling jacket is provided with a lower water inlet chamber 3431 of the water cooling jacket and a lower water return chamber 3432 of the water cooling jacket, which are separated by a partition to form an independent cavity. The outlet is arranged in the lower water return chamber 3432 of the water cooling jacket, the upper water inlet chamber 3411 of the water cooling jacket and the lower water inlet chamber 3431 of the water cooling jacket, the lower water inlet chamber 3431 of the water cooling jacket and the lower water return chamber 3432 of the water cooling jacket, and the upper water return chamber 3412 of the water cooling jacket and the lower water return chamber 3432 of the water cooling jacket are respectively connected through the water cooling jacket connecting pipe 342, and the upper water inlet chamber 3411 of the water cooling jacket, the lower water inlet chamber 3431 of the water cooling jacket, the lower water return chamber 3432 of the water cooling jacket and the upper water return chamber 3412 of the water cooling jacket constitute a water flow channel, and water flows along the water flow channel.

[0067] The water-cooling jacket connecting pipe 342 is a hollow structure, and water flows along the hollow position. The connection between the water-cooling jacket connecting pipe 342 and the water-cooling jacket upper plate 341 and the water-cooling jacket lower plate 343 is specifically as follows:

[0068] The upper end of the water-cooling jacket connecting pipe 342 is connected to the lower end surface of the water-cooling jacket connecting pipe 342, and the lower end is connected to the upper end surface of the water-cooling jacket lower plate 343. The water-cooling jacket connecting pipe 342 is provided with multiple groups. In this embodiment, there are four groups, which are the first connecting pipe 3421, the second connecting pipe 3422, the third connecting pipe 3423 and the fourth connecting pipe 3424. A flow chamber 3413 is provided between the water inlet chamber 3411 on the water-cooling jacket and the water return chamber 3412 on the water-cooling jacket. The flow chamber 3413 is separated by a partition. The plate is isolated from the upper water inlet chamber 3411 and the upper water return chamber 3412 of the water cooling jacket, the first connecting pipe 3421 connects the upper water inlet chamber 3411 of the water cooling jacket and the lower water inlet chamber 3431 of the water cooling jacket, the second connecting pipe 3422 connects the circulation chamber 3413 and the lower water inlet chamber 3431 of the water cooling jacket, the third connecting pipe 3423 connects the circulation chamber 3413 and the lower water return chamber 3432 of the water cooling jacket, and the fourth connecting pipe 3424 connects the upper water return chamber 3412 and the lower water return chamber 3432 of the water cooling jacket.

[0069] The flow path of water in the water flow channel is: water enters the upper water inlet chamber 3411 of the water cooling jacket along the water inlet, the water in the upper water inlet chamber 3411 of the water cooling jacket enters the lower water inlet chamber 3431 of the water cooling jacket through the first connecting pipe 3421, the water in the lower water inlet chamber 3431 of the water cooling jacket enters the circulation chamber 3413 along the second connecting pipe 3422, the water in the circulation chamber 3413 enters the lower water return chamber 3432 of the water cooling jacket along the third connecting pipe 3423, the water in the lower water return chamber 3432 of the water cooling jacket enters the upper water return chamber 3412 of the water cooling jacket along the fourth connecting pipe 3424, and then enters the return water structure through the water outlet.

[0070] The cooling holes 340 of the present application are arranged in an inner and outer double circle, and the water inlet and outlet and the inlet and outlet of the water cooling jacket connecting pipe 342 are respectively located on both sides of the cooling hole 340. When water flows in the water flow channel, any cooling hole 340 can be cooled to ensure uniform circulation and uniform cooling of the water flow between the water cooling jacket upper plate 341 and the water cooling jacket lower plate 343.

[0071] The upper water inlet chamber 3411 of the water cooling jacket, the upper water return chamber 3412 of the water cooling jacket, the lower water inlet chamber 3431 of the water cooling jacket and the lower water return chamber 3432 of the water cooling jacket are all provided with water baffles 200. The direction of the water flow is regulated by the water baffles 200 to prevent dead water, thereby improving the flow effect of the water flow in the water cooling plate 34.

[0072] The lower surface of the water-cooling jacket lower plate 343, i.e., the end surface opposite to the graphite crucible 131, is provided with a screw hole 3433, and the screw hole 3433 is connected to a heat insulation layer (not shown). The heat insulation layer, on the one hand, provides heat insulation protection for the lower surface of the water-cooling jacket lower plate 343 to prevent direct corrosion of the weak points of the water-cooling jacket lower plate 343 by heat radiation, and on the other hand, prevents the water-cooling jacket from being accidentally immersed in the graphite crucible 131 and directly exploding.

[0073] In other embodiments, the structures of the two groups of water cooling plate assemblies 33 with the same structure may not be completely the same or may be completely different.

[0074] In other embodiments, the water inlet pipe 352 and the water outlet pipe 34 may be provided independently.

[0075] The lifting drive device 31 includes two groups, the two groups of lifting drive devices 31 are respectively connected to the auxiliary furnace chamber 12, and the two groups of lifting drive devices 31 are respectively connected to the water cooling plate assembly 33. The two groups of lifting drive devices 31 synchronously drive the water cooling plate assembly 33 to move up and down, thereby driving the porous water cooling jacket 32 ​​to move.

[0076] The lifting drive device 31 can be a ball screw transmission structure, a motor synchronous belt transmission structure, a cylinder, etc., which can drive the porous water cooling jacket 32 ​​to move up and down in a linear driving structure, and the present application is not limited to this.

[0077] When silicon material needs to be re-added, the lifting drive device 31 drives the porous water-cooling jacket 32 ​​to move upward, and the barrel connected to the porous water-cooling jacket 32 ​​moves upward synchronously with the porous water-cooling jacket 32, and the porous water-cooling jacket 32 ​​and the barrel are moved to the auxiliary furnace chamber 12 for re-addition, and the rotary vane valve 14 is closed to seal the main furnace chamber 11, thereby realizing the function of re-addition of silicon material without stopping the furnace during the drawing process under the switching of the rotary vane valve 14 between the open and closed states.

[0078] In this embodiment, the porous water-cooling jacket 32 ​​can be moved up and down by the lifting drive device 31, and the auxiliary furnace chamber 12 is detachably connected to the main furnace chamber 11. When the porous water-cooling jacket 32 ​​needs to be cleaned, the lifting drive device 31 moves the porous water-cooling jacket 32 ​​into the auxiliary furnace chamber 12, the rotary vane valve 14 is closed to seal the main furnace chamber 11, the auxiliary furnace chamber 12 is disassembled, and the auxiliary furnace chamber 12 and the heat shield lifting device are separated from the main furnace chamber 11 at the same time. At this time, the lifting drive device 31 drives the porous water-cooling jacket 32 ​​to move downward until it moves to the outside of the auxiliary furnace chamber 12, and the condensate on the surface of the hole wall of the porous water-cooling jacket 32 ​​can be cleaned with a cleaning rod. After the cleaning is completed, the auxiliary furnace chamber 12 and the heat shield lifting device are installed to the main furnace chamber 11 according to the above steps, and the rotary vane valve 14 is opened to continue crystal pulling, thereby realizing the function of cleaning the furnace without stopping the furnace, effectively avoiding impurities from falling, and ensuring the purity of the silicon liquid.

[0079] Obviously, the described embodiments are only some embodiments of the utility model, not all embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the utility model.

Claims

1. A Czochralski round silicon core growth furnace, characterized in that: It includes a furnace body, a pulling and rotating device, a multi-axis pulling plate device and a heat shield lifting device. The furnace body includes a main furnace chamber and an auxiliary furnace chamber. The auxiliary furnace chamber is detachably connected to the main furnace chamber. The pulling and rotating device is respectively connected to the furnace body and the multi-axis pulling plate device. The multi-axis pulling plate device is connected to multiple groups of seed crystals. The heat shield lifting device includes a lifting drive device and a porous water cooling jacket connected to the lifting drive device.

2. The Czochralski round silicon core growing furnace according to claim 1, characterized in that: The main furnace chamber is connected with a rotary vane valve, which is located between the auxiliary furnace chamber and the main furnace chamber. The opening and closing of the rotary vane valve controls the connection and disconnection between the main furnace chamber and the auxiliary furnace chamber.

3. The CZ-type round silicon core growing furnace according to claim 1, characterized in that: The pulling and rotating device includes a crystal pulling and lifting mechanism, a rotating mechanism and a horizontal adjustment mechanism. The multi-axis pulling disk device is connected to multiple groups of seed crystals. The crystal pulling and lifting mechanism and the rotating mechanism are respectively connected to the multi-axis pulling disk device. The horizontal adjustment mechanism is connected to the crystal pulling and lifting mechanism.

4. The CZ-type round silicon core growing furnace according to claim 3, characterized in that: The crystal lifting mechanism includes a lifting mechanism and a tungsten wire rope connected to the lifting mechanism, the lifting mechanism is connected to the horizontal adjustment mechanism, one end of the tungsten wire rope is wound on the lifting and winding shaft, and the other end is connected to the multi-axis lifting disk device; the rotating mechanism includes a cable retracting mechanism and a rotating motor, the cable retracting mechanism is connected to the auxiliary furnace chamber, the rotating motor is arranged on the multi-axis lifting disk device and is linked with multiple groups of seed crystals, and the cable retracting mechanism and the rotating motor are connected by a cable.

5. The CZ-type round silicon core growing furnace according to claim 4, characterized in that: The multi-axis lifting disk device includes a box body and a gear transmission mechanism. The gear transmission mechanism is located in the box body. The tungsten wire rope and the rotating motor are respectively connected to the box body. The power output shaft of the rotating motor is connected to the gear transmission mechanism. The rotating motor serves as the power source of the gear transmission mechanism. The gear transmission mechanism connects multiple groups of seed crystals.

6. The CZ-type round silicon core growing furnace according to claim 1, characterized in that: The heat shield lifting device is connected to the auxiliary furnace chamber, and the heat shield lifting device includes a lifting drive device and a porous water cooling jacket. The lifting drive device is connected to the porous water cooling jacket, and the lifting drive device is connected to the auxiliary furnace chamber. The lifting drive device controls the porous water cooling jacket to move up and down.

7. The CZ-type round silicon core growing furnace according to claim 6, characterized in that: The porous water cooling jacket comprises at least two groups of water cooling plate assemblies, the water cooling plate assemblies comprise water cooling plates and water inlet and return devices connected to the water cooling plates, the water cooling plates are provided with water flow channels connected to the water inlet and return devices, and the water cooling plates of the two groups of water cooling plate assemblies are connected.

8. The CZ-type round silicon core growing furnace according to claim 7, characterized in that: The water inlet and return device comprises a water inlet structure and a water return structure, the water inlet structure and the water return structure are respectively connected to the water flow channel of the water cooling disk, and the water inlet structure, the water flow channel and the water return structure constitute the water inlet and return channel.

9. The CZ-type round silicon core growing furnace according to claim 7, characterized in that: The water inlet and return device also includes a regulating device, which includes a temperature measuring flow meter and an over-temperature switch. The temperature measuring flow meter and the over-temperature switch are arranged on the water return structure, and the over-temperature switch is connected to the temperature measuring flow meter.

10. The CZ-type round silicon core growing furnace according to claim 7, characterized in that: The lifting drive device comprises two groups, the two groups of lifting drive devices are respectively connected to the auxiliary furnace chamber, and the two groups of lifting drive devices are respectively connected to the two groups of water cooling plate assemblies.

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