Continuous vacuum evaporation equipment
By designing a continuous vacuum evaporation equipment, using the cooperation of multiple process chambers, belt conveyors and gate valves, the production discontinuity caused by batch feeding and single-piece retention of robots in existing equipment is solved, and high efficiency is achieved evaporation process and output increase.
Patent Information
- Application Number
- CN202421345896.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-06-13
- Publication Date
- 2025-02-25
- Estimated Expiration
- 2034-06-13
AI Technical Summary
The existing small evaporation equipment uses batch feed and single-piece pickup of robots, resulting in the inability to continuously produce, the process time is extended, affecting the entire process.
A continuous vacuum evaporation device is designed, and the continuous flow of the substrate between each cavity and the different evaporation processes are realized by configuring N sequentially connected process chambers, belt conveyors, vacuum pumps and gate valves.
Continuous vacuum evaporation of substrates is realized, the efficiency of evaporation process is improved, the process time is shortened, the yield is improved, and the substrate is processed simultaneously under different evaporation routes.
Smart Images

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Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of evaporation equipment, in particular to continuous vacuum evaporation equipment. Background Art
[0002] Existing small-scale evaporation equipment (suitable for substrates with smaller sizes, such as 300mmX300mm or smaller) adopts a three-chamber evaporation mode, namely a feed chamber, a transport chamber and a process chamber. When the substrate (including but not limited to wafers) is subjected to the evaporation process, multiple substrates are manually mounted on a fixed tray in the feed chamber. This process takes about 5 minutes. After the chamber door of the feed chamber is closed and the vacuum is completed, the robot in the transport chamber picks up the substrate on the fixed tray from the feed chamber according to the set program (one substrate at a time for a single process) and places the substrate into the process chamber. This process takes about 8 minutes for the robot to work. The process chamber evaporates the substrate. After the process is completed, the robot in the transport chamber transports the substrate back to the fixed tray in the feed chamber. This process takes about 8 minutes for the robot to work. After the vacuum is broken in the feed chamber, the substrate is taken out, and the single evaporation process is completed.
[0003] In summary, when a small-scale evaporation device performs evaporation deposition on a substrate, batch feeding is adopted and the robot picks up the substrate one by one. This results in the problem of non-continuous production, which prolongs the evaporation deposition process time and affects the entire process.
[0004] The utility model is used to solve at least one of the above problems. Utility Model Content
[0005] The purpose of the utility model is to solve the problem that when the existing small-scale evaporation equipment carries out the evaporation process on the substrate, batch feeding is adopted and the robot arm picks up the substrate one by one, resulting in the problem of inability to produce continuously, which leads to the prolongation of the evaporation process time and even affects the whole process. By setting the coordination between the process chamber, the transfer chamber, the belt conveyor, the vacuum pump and the gate valve, not only continuous vacuum evaporation is achieved, but also the efficiency of the evaporation process is improved, the whole process is accelerated and the output is increased.
[0006] In order to achieve the above object, the utility model provides a continuous vacuum evaporation device, comprising:
[0007] N process chambers connected in sequence, including a first process chamber to an Nth process chamber, N is an integer greater than 1, a process gate valve is provided between two adjacent process chambers, for controlling the on-off between the two adjacent process chambers, and each process chamber is configured for a different evaporation process;
[0008] The first transfer chamber has a first port and a second port which are arranged opposite to each other along the flow direction of the substrate, the first port is connected to the first process chamber, a first transfer gate valve is arranged between the first transfer chamber and the first process chamber, and is used to control the connection and disconnection between the first transfer chamber and the first process chamber; the second port is provided with a first gate valve, and is used to control the connection and disconnection of the second port;
[0009] The second transfer chamber has a third port and a fourth port which are arranged opposite to each other along the flow direction of the substrate, the third port is connected to the Nth process chamber, a second transfer gate valve is arranged between the second transfer chamber and the Nth process chamber, and is used to control the connection and disconnection between the second transfer chamber and the Nth process chamber; the fourth port is provided with a second gate valve, and is used to control the connection and disconnection of the fourth port;
[0010] A belt conveyor and a vacuum pump are respectively arranged in the first transfer chamber, the second transfer chamber and each process chamber. The belt conveyor is used to carry and transport the substrate between the chambers, and the vacuum pump is used to adjust the vacuum in each chamber.
[0011] By configuring N number of process chambers, different evaporation process requirements of the substrate can be met; the flow of the substrate between the chambers is achieved through the transportation of each belt conveyor and the coordination of gate valves, and different evaporation processes are achieved for the substrate through the coordination of each chamber, vacuum pump and gate valve; continuous vacuum evaporation of the substrate is achieved through the coordination of each belt conveyor, gate valve, chamber and vacuum pump, so as to meet the process requirements of different evaporation process routes of the substrate and reduce the circulation time of the substrate in each chamber during the evaporation process, thereby improving the efficiency of the evaporation process, accelerating the entire process and increasing the output; and according to the design requirements of the process chamber, the substrate can be processed simultaneously under different evaporation routes.
[0012] In some possible embodiments, it also includes: a first zone located near the second port, the first zone includes a belt conveyor, and the belt conveyor in the first zone can transport the substrate from the belt conveyor in the first zone to the belt conveyor in the first transfer chamber when the first gate valve is opened; and / or, a second zone located near the fourth port, the second zone includes a belt conveyor, and the belt conveyor in the second transfer chamber can transport the substrate from the belt conveyor in the second transfer chamber to the belt conveyor in the second zone when the second gate valve is opened.
[0013] In some possible embodiments, it also includes: a first zone located near the second port, the first zone includes a belt conveyor, and the belt conveyor in the first transfer chamber can transport the substrate from the belt conveyor in the first transfer chamber to the belt conveyor in the first zone when the first gate valve is opened; and / or, a second zone located near the fourth port, the second zone includes a belt conveyor, and the belt conveyor in the second zone can transport the substrate from the belt conveyor in the second zone to the belt conveyor in the second transfer chamber when the second gate valve is opened.
[0014] In some possible implementations, the first zone, the first transfer chamber, N sequentially connected process chambers, the second transfer chamber, and the second zone are arranged in a straight line.
[0015] In some possible embodiments, the belt conveyor in the first zone can be provided with a first shelf, and the first shelf includes: a first supporting plate, placed on the conveyor belt of the belt conveyor in the first zone, the first supporting plate having a first end and a second end along the width direction; a plurality of first L-shaped blocks, spaced apart at the first end of the first supporting plate; a plurality of second L-shaped blocks, spaced apart at the second end of the first supporting plate; the first L-shaped blocks and the second L-shaped blocks correspond one to one and are symmetrically arranged with each other, and the vertical distance between the first L-shaped blocks and the second L-shaped blocks along the width direction of the first supporting plate is greater than the length and / or width of the substrate.
[0016] In some possible embodiments, the belt conveyor in the second zone can be provided with a second shelf, and the second shelf includes: a second supporting plate, placed on the conveyor belt of the belt conveyor in the second zone, the second supporting plate having a third end and a fourth end along the width direction; a plurality of third L-shaped blocks, spaced apart at the third end of the second supporting plate; a plurality of fourth L-shaped blocks, spaced apart at the fourth end of the second supporting plate; the third L-shaped blocks and the fourth L-shaped blocks correspond to each other one by one and are symmetrically arranged with each other, and a vertical distance between the third L-shaped blocks and the fourth L-shaped blocks along the width direction of the second supporting plate is greater than the length and / or width of the substrate.
[0017] In some possible implementations, the belt conveyor uses a hollow mesh belt, and the hollow mesh belt is an electrostatic mesh belt.
[0018] In some possible implementations, all belt conveyors are located at the same horizontal plane, so that the current belt conveyor can drive the substrate thereon to be transported to the target belt conveyor.
[0019] In some possible embodiments, it also includes: a first controller, which is used to control the operation of the process gate valve, the first transfer gate valve, the second transfer gate valve, the first gate valve, the second gate valve, the belt conveyor and the vacuum pump; and / or, a second controller, which is used to control the process chamber to perform a corresponding evaporation process.
[0020] In some possible implementations, the first transfer chamber is sealedly connected to the process chamber, and the second transfer chamber is sealedly connected to the process chamber. BRIEF DESCRIPTION OF THE DRAWINGS
[0021] Figure 1 This is a schematic diagram of the overall structure of the continuous vacuum evaporation equipment of the embodiment of the utility model;
[0022] Figure 2 This utility model embodiment Figure 1 The enlarged structural diagram at A in the middle;
[0023] Figure 3 This utility model embodiment Figure 1 Enlarged structural diagram at B in the middle.
[0024] In the figure: 1. first process chamber; 2. Nth process chamber; 3. process gate valve; 4. first transfer chamber; 5. second transfer chamber; 6. first transfer gate valve; 7. second transfer gate valve; 8. belt conveyor; 9. first zone; 10. second zone; 11. first gate valve; 12. second gate valve; 13. first shelf; 131. first supporting plate; 132. first L-shaped block; 133. second L-shaped block; 14. second shelf; 141. second supporting plate; 142. third L-shaped block; 143. fourth L-shaped block. DETAILED DESCRIPTION
[0025] Example embodiments will now be described more fully with reference to the accompanying drawings. However, example embodiments can be implemented in a variety of forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided to make the present invention more comprehensive and complete and to fully convey the concepts of example embodiments to those skilled in the art. The same reference numerals in the figures represent the same or similar structures, and thus their repeated description will be omitted.
[0026] The words expressing positions and directions described in the present utility model are all explained by taking the accompanying drawings as examples, but they can be changed as needed, and all such changes are included in the protection scope of the present utility model.
[0027] The words expressing positions and directions described in the present utility model are all explained by taking the accompanying drawings as examples, but they can be changed as needed, and all such changes are included in the protection scope of the present utility model.
[0028] In the description of this embodiment, the terms "upper", "lower", "left", "right" and other directions or positional relationships are based on the directions or positional relationships shown in the drawings, and are only for the convenience of description and simplified operation, rather than indicating or implying that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore cannot be understood as a limitation of the present invention. In addition, the terms "first" and "second" are only used to distinguish in the description and have no special meaning.
[0029] See attached Figure 1 As shown, this embodiment provides a continuous vacuum evaporation device, including N process chambers, a first transfer chamber 4 and a second transfer chamber 5 which are connected in sequence.
[0030] N process chambers connected in sequence include a first process chamber 1 to an Nth process chamber 2, where N is an integer greater than 1, and a process gate valve 3 is provided between two adjacent process chambers for controlling the on-off between the two adjacent process chambers, and each process chamber is configured for a different evaporation process.
[0031] The evaporation process may be line source evaporation of carbon 60, line source evaporation of silver, evaporation of dielectric layer material silicon dioxide, evaporation of conductive metal material gold, etc., and may be evaporation in the semiconductor field.
[0032] The first transfer chamber 4 has a first opening and a second opening which are arranged opposite to each other along the flow direction of the substrate. The first opening is connected to the first process chamber 1. A first transfer gate valve 6 is arranged between the first transfer chamber 4 and the first process chamber 1 to control the connection and disconnection between the first transfer chamber 4 and the first process chamber 1. The second opening is provided with a first gate valve 11 to control the connection and disconnection of the second opening.
[0033] The second transfer chamber 5 has a third port and a fourth port which are arranged relatively along the flow direction of the substrate. The third port is connected to the Nth process chamber 2. A second transfer gate valve 7 is arranged between the second transfer chamber 5 and the Nth process chamber 2 to control the connection and disconnection between the second transfer chamber 5 and the Nth process chamber 2. The fourth port is provided with a second gate valve 12 to control the connection and disconnection of the fourth port.
[0034] It should be further explained that the first transfer chamber 4 is sealed and connected to the process chamber, and the second transfer chamber 5 is sealed and connected to the process chamber.
[0035] A belt conveyor 8 and a vacuum pump are respectively arranged in the first transfer chamber 4, the second transfer chamber 5 and each process chamber. The belt conveyor 8 is used to carry and transport the substrate between the chambers, and the vacuum pump is used to adjust the vacuum in each chamber.
[0036] It should be further explained that all the belt conveyors 8 are located at the same horizontal plane, so that the current belt conveyor 8 can drive the substrate thereon to be transported to the target belt conveyor 8 .
[0037] By configuring N number of process chambers, different evaporation process requirements of the substrate can be met; the flow of the substrate between the chambers is achieved through the transportation of each belt conveyor 8 and the coordination of the gate valves, and the evaporation of different evaporation processes is achieved for the substrate through the coordination of each chamber, vacuum pump and gate valve; continuous vacuum evaporation of the substrate is achieved through the coordination of each belt conveyor 8, gate valve, chamber and vacuum pump, which meets the process requirements of different evaporation process routes of the substrate and reduces the circulation time of the substrate in each chamber during the evaporation process, thereby improving the efficiency of the evaporation process, accelerating the entire process and increasing the output; and according to the design requirements of the process chamber, the simultaneous processing of the substrate under different evaporation routes can be achieved.
[0038] Preferably, the first zone 9, the first transfer chamber 4, N sequentially connected process chambers, the second transfer chamber 5, and the second zone 10 are arranged in a straight line, so that continuous horizontal vacuum evaporation can be achieved.
[0039] The continuous vacuum evaporation equipment also includes a first controller and a second controller.
[0040] The first controller is used to control the operation of the process gate valve 3, the first transfer gate valve 6, the second transfer gate valve 7, the first gate valve 11, the second gate valve 12, the belt conveyor 8 and the vacuum pump; and / or,
[0041] The second controller is used to control the process chamber to perform a corresponding evaporation process.
[0042] The first controller and the second controller realize the coordinated work between the gate valves, chambers and vacuum pumps of each belt conveyor 8, meet the process requirements of different evaporation process routes of the substrate, reduce the circulation time of the substrate in each chamber during the evaporation process, thereby improving the efficiency of the evaporation process and speeding up the entire process.
[0043] See attached Figure 1 The continuous vacuum evaporation device further includes a first zone 9 located near the second opening and a second zone 10 located near the fourth opening.
[0044] The first zone 9 includes a belt conveyor 8, and the belt conveyor 8 of the first zone 9 can convey the substrate from the belt conveyor 8 of the first zone 9 to the belt conveyor 8 in the first transfer chamber 4 when the first gate valve 11 is opened; and / or,
[0045] The second zone 10 includes a belt conveyor 8 . The belt conveyor 8 in the second transfer chamber 5 can convey the substrate from the belt conveyor 8 in the second transfer chamber 5 to the belt conveyor 8 in the second zone 10 when the second gate valve 12 is opened.
[0046] The first zone 9 includes a belt conveyor 8. The belt conveyor 8 in the first transfer chamber 4 can convey the substrate from the belt conveyor 8 in the first transfer chamber 4 to the belt conveyor 8 in the first zone 9 when the first gate valve 11 is opened; and / or,
[0047] The second zone 10 includes a belt conveyor 8 . The belt conveyor 8 of the second zone 10 can convey the substrate from the belt conveyor 8 of the second zone 10 to the belt conveyor 8 in the second transfer chamber 5 when the second gate valve 12 is opened.
[0048] Based on this, the following loading and unloading working modes of the substrate can be realized respectively:
[0049] 1. The substrate is loaded from the first zone 9 and unloaded from the second zone 10.
[0050] 2. The substrate is loaded into and unloaded from the first zone 9 .
[0051] 3. The substrate is loaded and unloaded from the second zone 10 .
[0052] 4. The substrate is loaded from the second zone 10 and unloaded from the first zone 9.
[0053] See attached Figure 2 The belt conveyor 8 of the first zone 9 can be provided with a first shelf 13 , and the first shelf 13 includes a first carrying plate 131 , a plurality of first L-shaped blocks 132 and a plurality of second L-shaped blocks 133 .
[0054] The first carrying plate 131 is placed on the conveyor belt of the belt conveyor 8 of the first zone 9 , and the first carrying plate 131 has a first end and a second end in the width direction.
[0055] A plurality of first L-shaped blocks 132 are disposed at intervals on the first end of the first supporting plate 131 .
[0056] A plurality of second L-shaped blocks 133 are disposed at intervals on the second end of the first supporting plate 131 .
[0057] The first L-shaped block 132 and the second L-shaped block 133 correspond to each other and are symmetrically arranged. The vertical distance between the first L-shaped block 132 and the second L-shaped block 133 along the width direction of the first supporting plate 131 is greater than the length and / or width of the substrate.
[0058] The substrate is transferred and transported by the first shelf 13, and the substrate is loaded and unloaded in the first area 9. The first L-shaped blocks 132 and the second L-shaped blocks 133 are symmetrically arranged to prevent the substrate from moving and shaking during the synchronous movement with the belt conveyor 8, causing deviation and affecting the evaporation process.
[0059] See attached Figure 3 The belt conveyor 8 of the second zone 10 can be provided with a second shelf 14 , and the second shelf 14 includes a second carrying plate 141 , a plurality of third L-shaped blocks 142 and a plurality of fourth L-shaped blocks 143 .
[0060] The second carrying plate 141 is placed on the conveyor belt of the belt conveyor 8 in the second zone 10 , and the second carrying plate 141 has a third end and a fourth end along the width direction.
[0061] A plurality of third L-shaped blocks 142 are disposed at intervals on the third end of the second supporting plate 141 .
[0062] A plurality of fourth L-shaped blocks 143 are disposed at intervals on the fourth end of the second supporting plate 141 .
[0063] The third L-shaped block 142 and the fourth L-shaped block 143 correspond to each other and are symmetrically arranged. The vertical distance between the third L-shaped block 142 and the fourth L-shaped block 143 along the width direction of the second supporting plate 141 is greater than the length and / or width of the substrate.
[0064] The second shelf 14 is used to transfer and transport the substrate, and the substrate is loaded and unloaded in the second area 10. The third L-shaped blocks 142 and the fourth L-shaped blocks 143 are symmetrically arranged to prevent the substrate from moving and shaking during the synchronous movement with the belt conveyor 8, causing deviation and affecting the evaporation process.
[0065] In this embodiment, the size of the substrate is 300 mm*300 mm, and the vertical distance in this application is preferably set to 310 mm to ensure that the substrate is located between the blocks, so that the substrate can move synchronously with the shelf.
[0066] See attached Figure 2 The belt conveyor 8 adopts a hollow mesh belt, and the hollow mesh belt is an electrostatic mesh belt.
[0067] The electrostatic hollow mesh belt can prevent static electricity from damaging the internal circuit of the substrate, and can conduct the static electricity generated by friction into the ground through the equipment. The electrostatic hollow mesh belt can be set to a number of strips, which can be an odd number greater than 1. Specifically, 3 electrostatic belts are used, and of course 5 can also be used. It can make the transportation of the substrate on the belt conveyor 8 more stable and less likely to move and shake.
[0068] The following are some examples:
[0069] N=2, the first process chamber 1 is configured to be used for line-source evaporation of carbon material 60 on the substrate, and the Nth process chamber 2 is configured to be used for line-source evaporation of silver material on the substrate.
[0070] The preset evaporation process route of the substrate is: line source evaporation material carbon 60. The working process of this equipment is as follows:
[0071] Place the first substrate on the belt conveyor 8 of the first zone 9. At this time, the first gate valve 11 is opened, and the belt conveyor 8 of the first zone 9 transports the substrate to the belt conveyor 8 in the first transfer chamber 4. The first gate valve 11 is closed to complete the loading. The vacuum degree in the first transfer chamber 4 is adjusted by the vacuum pump in the first transfer chamber 4 to achieve a balance with the vacuum degree in the first process chamber 1. The first transfer gate valve 6 is opened, and the belt conveyor 8 in the first transfer chamber 4 transports the substrate to the belt conveyor 8 in the first process chamber 1. The first transfer gate valve 6 is closed. The first process chamber 1 starts the evaporation process, and the linear source evaporation material carbon 60 is deposited on the substrate. After the evaporation is completed, the vacuum degree in the first process chamber 1 is adjusted by the vacuum pump in the first process chamber 1 to achieve a balance with the vacuum degree in the Nth process chamber 2. The Nth process chamber 2 and the first The process gate valve 3 between the process chambers 1, the belt conveyor 8 in the first process chamber 1 transports the substrate to the belt conveyor 8 in the Nth process chamber 2, and the process gate valve 3 between the first process chamber 1 and the Nth process chamber 2 is closed; the vacuum degree in the Nth process chamber 2 is adjusted by the vacuum pump in the Nth process chamber 2 to achieve a balance with the vacuum degree in the second transfer chamber 5; the second transfer gate valve 7 is opened, the belt conveyor 8 in the Nth process chamber 2 transports the substrate to the belt conveyor 8 in the second transfer chamber 5, the second transfer gate valve 7 is closed, and the vacuum degree in the second transfer chamber 5 is adjusted by the vacuum pump in the second transfer chamber 5 to achieve a balance with the external air pressure; the second gate valve 12 is opened, the belt conveyor 8 in the second transfer chamber 5 transports the substrate to the belt conveyor 8 in the first zone 9, and the second gate valve 12 is closed to complete the unloading.
[0072] When the first substrate is undergoing line source evaporation of material carbon 60 in the first process chamber 1, the second substrate enters the conveyor belt in the first transfer chamber 4 according to the transportation route of the first substrate. At the same time, the vacuum degree in the first transfer chamber 4 is adjusted by the vacuum pump in the first transfer chamber 4 to achieve a balance with the vacuum degree in the first process chamber 1.
[0073] And so on, the process of loading, vapor deposition and unloading is repeated.
[0074] Compared with the traditional robot arm to realize the circulation of substrates in various cavities, the entire process of the evaporation process for each substrate saves about 20 minutes. Taking the evaporation of 10 substrates per day as an example, it can save 200 minutes.
[0075] On this basis, the evaporation process route of the substrate is preset as follows: first, the linear source evaporation material carbon 60, and then the linear source evaporation material silver. The working process of this equipment is as follows:
[0076] The first substrate is placed on the belt conveyor 8 of the first zone 9. At this time, the first gate valve 11 is opened, and the belt conveyor 8 of the first zone 9 transports the substrate to the belt conveyor 8 in the first transfer chamber 4. The first gate valve 11 is closed to complete the loading. The vacuum degree in the first transfer chamber 4 is adjusted by the vacuum pump in the first transfer chamber 4 to achieve a balance with the vacuum degree in the first process chamber 1. The first transfer gate valve 6 is opened, and the belt conveyor 8 in the first transfer chamber 4 transports the substrate to the belt conveyor 8 in the first process chamber 1. The first transfer gate valve 6 is closed. The first process chamber 1 starts the evaporation process, and the linear source evaporation material carbon 60 is applied to the substrate. After the evaporation is completed, the vacuum degree in the first process chamber 1 is adjusted by the vacuum pump in the first process chamber 1 to achieve a balance with the vacuum degree in the Nth process chamber 2. The process gate valve 3 between the Nth process chamber 2 and the first process chamber 1 is opened. The belt conveyor 8 in the first process chamber 1 transports the substrate to the belt conveyor 8 in the Nth process chamber 2, the process gate valve 3 between the first process chamber 1 and the Nth process chamber 2 is closed, the Nth process chamber 2 starts the evaporation process, and the line source evaporation material silver is applied to the substrate. After the evaporation is completed, the vacuum degree in the Nth process chamber 2 is adjusted by the vacuum pump in the Nth process chamber 2 to achieve a balance with the vacuum degree in the second transfer chamber 5; the second transfer gate valve 7 is opened, the belt conveyor 8 in the Nth process chamber 2 transports the substrate to the belt conveyor 8 in the second transfer chamber 5, the second transfer gate valve 7 is closed, and the vacuum degree in the second transfer chamber 5 is adjusted by the vacuum pump in the second transfer chamber 5 to achieve a balance with the external air pressure; the second gate valve 12 is opened, the belt conveyor 8 in the second transfer chamber 5 transports the substrate to the belt conveyor 8 in the first zone 9, the second gate valve 12 is closed, and the material unloading is completed.
[0077] When the first substrate is undergoing line source evaporation of material carbon 60 in the first process chamber 1, the second substrate enters the conveyor belt in the first transfer chamber 4 according to the transportation route of the first substrate. At the same time, the vacuum degree in the first transfer chamber 4 is adjusted by the vacuum pump in the first transfer chamber 4 to achieve a balance with the vacuum degree in the first process chamber 1.
[0078] When the first substrate is undergoing line source evaporation of silver material in the Nth process chamber 2, the second substrate enters the conveyor belt in the first process chamber 1 according to the transportation route of the first substrate. At the same time, the vacuum degree in the first process chamber 1 is adjusted by the vacuum pump in the first process chamber 1 to achieve a balance with the vacuum degree in the Nth process chamber 2.
[0079] By analogy, the loading, evaporation and unloading are circulated to realize horizontal continuous vacuum evaporation. By configuring N number of process chambers, the different evaporation process requirements of the substrate can be met. The flow of the substrate between the chambers is realized through the transportation of each belt conveyor 8 and the coordination of the gate valves. Through the coordination of each chamber, the vacuum pump and the gate valve, the evaporation of different evaporation processes is realized on the substrate. Through the coordination of each belt conveyor 8, the gate valve, the chamber and the vacuum pump, continuous vacuum evaporation of the substrate is realized, the process requirements of different evaporation process routes of the substrate are met, and the circulation time of the substrate in each chamber during the evaporation process is reduced, thereby improving the efficiency of the evaporation process, accelerating the entire process, and increasing the output.
[0080] In this embodiment, the first evaporation process route and the second evaporation process route of the substrate can be performed simultaneously, wherein the first evaporation process route is a linear source evaporation of material carbon 60; the second evaporation process route is a linear source evaporation of material silver.
[0081] The working process of this equipment is as follows:
[0082] The process gate valve 3 between the first process chamber 1 and the Nth process chamber 2 is always in a closed state.
[0083] Place the first substrate on the belt conveyor 8 of the first zone 9. At this time, the first gate valve 11 is opened, and the belt conveyor 8 of the first zone 9 transports the substrate to the belt conveyor 8 in the first transfer chamber 4. The first gate valve 11 is closed to complete the loading. The vacuum degree in the first transfer chamber 4 is adjusted by the vacuum pump in the first transfer chamber 4 to achieve a balance with the vacuum degree in the first process chamber 1. The first transfer gate valve 6 is opened, and the belt conveyor 8 in the first transfer chamber 4 transports the substrate to the belt conveyor 8 in the first process chamber 1. The first transfer gate valve 6 is closed. The first process chamber 1 starts the evaporation process to linearly evaporate the material carbon 60 on the substrate after the evaporation is completed. The vacuum degree in the first process chamber 1 is adjusted by the vacuum pump in the first process chamber 1 to achieve a balance with the vacuum degree in the first transfer process chamber 4; the first transfer gate valve 6 is opened, and the belt conveyor 8 in the first process chamber 1 transports the substrate to the belt conveyor 8 in the first transfer chamber 4, and the first transfer gate valve 6 is closed; the vacuum degree in the first transfer chamber 4 is adjusted by the vacuum pump in the first transfer chamber 4 to achieve a balance with the vacuum degree in the outside world; the first gate valve 11 is opened, and the belt conveyor 8 in the first transfer chamber 4 transports the substrate to the belt conveyor 8 in the first zone 9 to complete unloading, and then the cycle of loading, evaporation and unloading is continued.
[0084] At the same time, the second substrate is placed on the belt conveyor 8 of the second zone 10. At this time, the second gate valve 12 is opened, and the belt conveyor 8 of the second zone 10 transports the substrate to the belt conveyor 8 in the second transfer chamber 5. The second gate valve 12 is closed to complete the loading. The vacuum degree in the second transfer chamber 5 is adjusted by the vacuum pump in the second transfer chamber 5 to achieve a balance with the vacuum degree in the Nth process chamber 2. The second transfer gate valve 7 is opened, and the belt conveyor 8 in the second transfer chamber 5 transports the substrate to the belt conveyor 8 in the Nth process chamber 2. The second transfer gate valve 7 is closed. The Nth process chamber 2 starts the evaporation process to linearly evaporate the silver material on the substrate after the evaporation is completed. The vacuum degree in the Nth process chamber 2 is adjusted by the vacuum pump in the Nth process chamber 2 to achieve a balance with the vacuum degree in the second transfer process chamber 5; the second transfer gate valve 7 is opened, and the belt conveyor 8 in the Nth process chamber 2 transports the substrate to the belt conveyor 8 in the second transfer chamber 5, and the second transfer gate valve 7 is closed; the vacuum degree in the Nth transfer chamber 5 is adjusted by the vacuum pump in the Nth transfer chamber 5 to achieve a balance with the vacuum degree in the outside world; the first gate valve 11 is opened, and the belt conveyor 8 in the Nth transfer chamber 5 transports the substrate to the belt conveyor 8 in the second zone 10 to complete unloading, and then the cycle of loading, evaporation and unloading is continued.
[0085] Therefore, according to the design requirements of the process chamber, the substrate can be processed simultaneously under different evaporation routes.
[0086] Although the embodiments of the utility model have been shown and described above, it can be understood that the above embodiments are exemplary and cannot be understood as limitations on the utility model. Ordinary technicians in the field can change, modify, replace and modify the above embodiments within the scope of the utility model without departing from the principles and purpose of the utility model. All of these changes should fall within the scope of protection of the claims of the utility model.
Claims
1. A continuous vacuum evaporation device, characterized in that: include: N process chambers connected in sequence, including a first process chamber (1) to an Nth process chamber (2), N being an integer greater than 1, a process gate valve (3) being provided between two adjacent process chambers for controlling the connection and disconnection between the two adjacent process chambers, and each of the process chambers being configured for a different evaporation process; The first transfer chamber (4) has a first opening and a second opening which are arranged opposite to each other along the flow direction of the substrate, the first opening is connected to the first process chamber (1), a first transfer gate valve (6) is arranged between the first transfer chamber (4) and the first process chamber (1) for controlling the connection and disconnection between the first transfer chamber (4) and the first process chamber (1); the second opening is provided with a first gate valve (11) for controlling the connection and disconnection of the second opening; The second transfer chamber (5) has a third opening and a fourth opening which are arranged opposite to each other along the flow direction of the substrate, the third opening is connected to the Nth process chamber (2), a second transfer gate valve (7) is arranged between the second transfer chamber (5) and the Nth process chamber (2) for controlling the connection and disconnection between the second transfer chamber (5) and the Nth process chamber (2); the fourth opening is provided with a second gate valve (12) for controlling the connection and disconnection of the fourth opening; A belt conveyor (8) and a vacuum pump are respectively arranged in the first transfer chamber (4), the second transfer chamber (5) and each of the process chambers. The belt conveyor (8) is used to carry and transport the substrate between the chambers, and the vacuum pump is used to adjust the vacuum in each chamber.
2. A continuous vacuum evaporation device according to claim 1, characterized in that: Also includes: a first zone (9) located near the second port, the first zone (9) comprising a belt conveyor (8), the belt conveyor (8) of the first zone (9) being capable of conveying the substrate from the belt conveyor (8) of the first zone (9) to the belt conveyor (8) in the first transfer chamber (4) when the first gate valve (11) is opened; and / or, A second zone (10) is located near the fourth port, wherein the second zone (10) includes a belt conveyor (8), and the belt conveyor (8) in the second transfer chamber (5) can transport the substrate from the belt conveyor (8) in the second transfer chamber (5) to the belt conveyor (8) in the second zone (10) when the second gate valve (12) is opened.
3. A continuous vacuum evaporation device according to claim 1, characterized in that: Also includes: a first zone (9) located near the second opening, the first zone (9) comprising a belt conveyor (8), the belt conveyor (8) in the first transfer chamber (4) being capable of conveying the substrate from the belt conveyor (8) in the first transfer chamber (4) to the belt conveyor (8) in the first zone (9) when the first gate valve (11) is opened; and / or A second zone (10) is located near the fourth port, wherein the second zone (10) includes a belt conveyor (8), and the belt conveyor (8) of the second zone (10) can transport the substrate from the belt conveyor (8) of the second zone (10) to the belt conveyor (8) in the second transfer chamber (5) when the second gate valve (12) is opened.
4. A continuous vacuum evaporation device according to claim 2 or 3, characterized in that: The first zone (9), the first transfer chamber (4), N sequentially connected process chambers, the second transfer chamber (5), and the second zone (10) are arranged in a straight line.
5. A continuous vacuum evaporation device according to claim 2 or 3, characterized in that: The belt conveyor (8) of the first zone (9) can be provided with a first shelf (13), wherein the first shelf (13) comprises: A first carrying plate (131) is placed on the conveyor belt of the belt conveyor (8) in the first zone (9), wherein the first carrying plate (131) has a first end and a second end along a width direction; A plurality of first L-shaped card blocks (132) are arranged at intervals on the first end of the first bearing plate (131); A plurality of second L-shaped card blocks (133) are arranged at intervals on the second end of the first bearing plate (131); The first L-shaped card block (132) and the second L-shaped card block (133) correspond to each other one by one and are symmetrically arranged. The vertical distance between the first L-shaped card block (132) and the second L-shaped card block (133) along the width direction of the first supporting plate (131) is greater than the length and / or width of the substrate.
6. A continuous vacuum evaporation device according to claim 2 or 3, characterized in that: The belt conveyor (8) of the second zone (10) can be provided with a second shelf (14), wherein the second shelf (14) comprises: A second carrying plate (141) is placed on the conveyor belt of the belt conveyor (8) in the second zone (10), wherein the second carrying plate (141) has a third end and a fourth end along the width direction; A plurality of third L-shaped card blocks (142) are arranged at intervals on the third end of the second bearing plate (141); A plurality of fourth L-shaped card blocks (143) are arranged at intervals on the fourth end of the second bearing plate (141); The third L-shaped card block (142) and the fourth L-shaped card block (143) correspond to each other one by one and are symmetrically arranged. The vertical distance between the third L-shaped card block (142) and the fourth L-shaped card block (143) along the width direction of the second carrier plate (141) is greater than the length and / or width of the substrate.
7. The continuous vacuum evaporation equipment according to claim 1, characterized in that: The belt conveyor (8) adopts a hollow mesh belt, and the hollow mesh belt is an electrostatic mesh belt.
8. The continuous vacuum evaporation equipment according to claim 1, characterized in that: All the belt conveyors (8) are located at the same horizontal plane, so that the current belt conveyor (8) can drive the substrate thereon to be transported to the target belt conveyor (8).
9. The continuous vacuum evaporation equipment according to claim 1, characterized in that: Also includes: a first controller, the first controller being used to control the operation of the process gate valve (3), the first transfer gate valve (6), the second transfer gate valve (7), the first gate valve (11), the second gate valve (12), the belt conveyor (8) and the vacuum pump; and / or, A second controller is used to control the process chamber to perform a corresponding evaporation process.
10. The continuous vacuum evaporation equipment according to claim 1, characterized in that: The first transfer chamber (4) is sealedly connected to the process chamber, and the second transfer chamber (5) is sealedly connected to the process chamber.