Tantalum pentachloride powder gasifying and feeding assembly and tantalum carbide coating synthesizing device

Abstract

The utility model discloses a tantalum pentachloride powder gasification and feeding assembly and a tantalum carbide coating synthesis device, the tantalum pentachloride powder gasification and feeding assembly comprises a powder tank, the powder tank is used for storing tantalum pentachloride powder, the powder tank is provided with a feed port and a discharge port, the feed port is arranged at the top end of the powder tank, and the discharge port is arranged at the bottom end of the powder tank; the reamer module is arranged at the lower end of the powder tank, the reamer module is provided with a powder inlet and a powder outlet, the powder inlet is communicated with the discharge port, and a control switch valve is arranged at the powder outlet; an inlet of the vaporizing chamber is communicated with the control switch valve, and an outlet of the vaporizing chamber is communicated with the chemical vapor deposition furnace. According to the tantalum pentachloride powder gasifying and feeding assembly, a large amount of tantalum pentachloride powder can be added, the reamer module and the switch control valve can accurately control the adding amount of the tantalum pentachloride powder, the powder can be gasified uniformly, the requirement of large-scale batch production can be met, and the synthesis quality of a tantalum carbide coating can be improved.

Description

Technical Field

[0001] The utility model relates to the field of material preparation, in particular to a tantalum pentachloride powder gasification powder feeding component and a tantalum carbide coating synthesis device. Background Art

[0002] Tantalum carbide coating is an important high-temperature structural material with high strength, corrosion resistance and good chemical stability. Its melting point is as high as 4273℃, and it is one of the highest temperature-resistant compounds. It has excellent high-temperature mechanical properties, high-speed airflow erosion resistance, ablation resistance, and good chemical and mechanical compatibility with graphite materials. At present, CVD method is mostly used to prepare tantalum carbide coating on high-purity and high-density graphite substrates. The raw materials used are tantalum pentachloride powder, etc. The equipment used is a tantalum carbide coating high-temperature CVD furnace, in which the gasification part is an important component structure in the furnace system. The gasification part is responsible for gasifying the tantalum pentachloride raw material and transporting it to the CVD furnace for reaction to prepare tantalum carbide coating on the graphite substrate.

[0003] In the related art, the setting of the gasification part is relatively simple, and the tantalum pentachloride raw material is directly placed in the gasification chamber. This existing technology has certain problems. First, the volume of the gasification chamber is limited, and a large amount of tantalum pentachloride powder cannot be added, so it cannot meet the needs of large-scale batch production of enterprises; secondly, the tantalum pentachloride powder is directly placed in the gasification chamber, and the amount of gasification cannot be accurately controlled. In addition, since the tantalum pentachloride powder is directly placed in the gasification chamber, powder residue and deposition exist in the gasification chamber, which affects the synthesis quality of the tantalum carbide coating. Utility Model Content

[0004] The utility model aims to solve at least one of the technical problems existing in the prior art. To this end, the utility model proposes a tantalum pentachloride powder gasification and powder feeding component, which can directly put the tantalum pentachloride powder into the powder tank, which is conducive to adding a large amount of tantalum pentachloride powder. The reamer module and the switch control valve can accurately control the amount of tantalum pentachloride powder added, which can make the powder gasification uniform, meet the needs of large-scale batch production, and is conducive to improving the synthesis quality of tantalum carbide coating.

[0005] The utility model also provides a tantalum carbide coating synthesis device with the tantalum pentachloride powder gasification and powder feeding component.

[0006] According to the embodiment of the utility model, the tantalum pentachloride powder gasification and powder feeding assembly includes: a powder tank, the powder tank is used to store tantalum pentachloride powder, the powder tank has a feeding port and a discharging port, the feeding port is arranged at the top of the powder tank, and the discharging port is arranged at the bottom of the powder tank; a reamer module, the reamer module is arranged at the lower end of the powder tank, the reamer module has a powder inlet and a powder outlet, the powder inlet is connected to the discharging port, and a control switch valve is arranged at the powder outlet; a vaporization chamber, the inlet of the vaporization chamber is connected to the control switch valve, and the outlet of the vaporization chamber is connected to a chemical vapor deposition furnace.

[0007] According to the tantalum pentachloride powder gasification and powder feeding assembly of the embodiment of the utility model, by adding a powder tank, the tantalum pentachloride powder storage area and the heating gasification area can be separated, so as to avoid powder residue and deposition in the gasification chamber. At the same time, a large amount of tantalum pentachloride powder can be added to the powder tank, which is conducive to meeting the needs of mass production of enterprises. By setting a reamer module and controlling the switch valve, the amount of tantalum pentachloride powder entering the gasification chamber can be accurately controlled, which is conducive to achieving uniform gasification of the powder, thereby facilitating improving the synthesis quality of the tantalum carbide coating.

[0008] In some embodiments of the present invention, the powder tank is connected to the inflation pipe and the air outlet pipe, and a pressure detector is also provided at the powder tank, and the pressure detector is used to detect the pressure in the powder tank.

[0009] In some embodiments of the utility model, the reamer module includes: a shell, the powder inlet is arranged at the top end of the shell, and the powder outlet is arranged at the bottom end of the shell; a reamer, the reamer is arranged horizontally, one end of the reamer is connected to the shell through a reamer motor, and the other end of the reamer is connected to the shell through a reamer back cover.

[0010] In some embodiments of the present invention, the shell and the powder tank are an integral part.

[0011] In some embodiments of the present invention, the inlet end of the control switch valve is detachably connected to the outlet end of the reamer module, and the outlet end of the control switch valve is detachably connected to the inlet end of the gasification chamber.

[0012] In some embodiments of the present invention, the inlet end of the control switch valve is connected to the outlet end of the reamer module via a first snap assembly, and the outlet end of the control switch valve is connected to the inlet end of the gasification chamber via a second snap assembly.

[0013] In some embodiments of the utility model, the first buckle assembly includes: a sealing ring, the sealing ring includes a metal ring and a rubber ring, the rubber ring is arranged on the outer sleeve of the metal ring, and the sealing ring is arranged on the docking surface of the control switch valve and the reamer module; a clamp, the clamp is arranged on the outer peripheral wall of the docking point of the control switch valve and the reamer module.

[0014] In some embodiments of the utility model, the tantalum pentachloride powder gasification and powder feeding assembly also includes: an argon gas pipeline and a reaction gas pipeline, the argon gas pipeline is connected to the vaporization chamber to provide argon gas to the vaporization chamber, and the reaction gas pipeline is connected to the vaporization chamber to provide reaction gas to the vaporization chamber.

[0015] In some embodiments of the utility model, the tantalum pentachloride powder gasification and powder feeding assembly further includes: a heater, the heater is connected to the vaporization chamber to heat the vaporization chamber, and a temperature sensor is provided at the heater.

[0016] The tantalum carbide coating synthesis device according to the embodiment of the utility model comprises: the above-mentioned tantalum pentachloride powder gasification and powder feeding assembly and a chemical vapor deposition furnace.

[0017] According to the tantalum carbide coating synthesis device of the embodiment of the utility model, by providing the above-mentioned tantalum pentachloride powder gasification and powder feeding assembly, it is beneficial to improve the overall performance of the tantalum carbide coating synthesis device.

[0018] Additional aspects and advantages of the present invention will be given in part in the following description, and in part will become apparent from the following description, or will be learned through the practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 is a schematic diagram of a tantalum carbide coating synthesis device according to an embodiment of the utility model;

[0020] Figure 2 A tantalum pentachloride powder gasification and powder feeding assembly according to one embodiment of the utility model;

[0021] Figure 3 is a schematic diagram of a reamer module according to an embodiment of the utility model;

[0022] Figure 4 is a schematic diagram of a control switch valve according to an embodiment of the utility model;

[0023] Figure 5 is a schematic structural diagram of a sealing member according to an embodiment of the utility model;

[0024] Figure 6 is a structural schematic diagram of a first buckle assembly according to an embodiment of the utility model;

[0025] Figure 7 is a schematic structural diagram of a gasification chamber according to an embodiment of the utility model;

[0026] Reference numerals:

[0027] Tantalum carbide coating synthesis device 1000;

[0028] Tantalum pentachloride powder gasification powder feeding assembly 100:

[0029] Powder tank 10; feeding port 11; discharging port 12; charging pipe 13; air outlet pipe 14; pressure detector 15;

[0030] Reamer module 20; powder inlet 21; powder outlet 22; housing 23; reamer 24; reamer motor 25; reamer rear cover 26;

[0031] Control switch valve 30; motor 31; control valve 32;

[0032] Gasification chamber 40;

[0033] First buckle assembly 50; sealing ring 51; metal ring 511; rubber ring 512; clamp 52; fastener 53;

[0034] A second buckle assembly 60;

[0035] Argon gas pipeline 70; reaction gas pipeline 80; heater 90; temperature sensor 91;

[0036] Chemical vapor deposition furnace 200;

[0037] Heating module 201; metal furnace wall 202; insulation layer 203; reaction kettle 204. DETAILED DESCRIPTION

[0038] The embodiments of the present invention are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended to be used to explain the present invention, and should not be construed as limiting the present invention.

[0039] The disclosure below provides many different embodiments or examples for realizing different structures of the utility model. In order to simplify the disclosure of the utility model, the components and settings of specific examples are described below. Of course, they are merely examples, and the purpose is not to limit the utility model. In addition, the utility model can repeat reference numbers and / or letters in different examples. This repetition is for the purpose of simplification and clarity, and does not itself indicate the relationship between the various embodiments and / or settings discussed. In addition, the utility model provides various specific examples of processes and materials, but those of ordinary skill in the art can be aware of the applicability of other processes and / or the use of other materials.

[0040] Reference below Figure 1-Figure 7 The tantalum pentachloride powder gasification and powder feeding assembly 100 and the tantalum carbide coating synthesis device 1000 according to the embodiment of the present invention are described.

[0041] Reference Figure 1-Figure 2 As shown, the tantalum pentachloride powder gasification and powder feeding assembly 100 according to the embodiment of the utility model includes: a powder tank 10, a reamer module 20, a control switch valve 30 and a gasification chamber 40.

[0042] Reference Figure 1 and Figure 2 As shown, the powder tank 10 is used to store tantalum pentachloride powder (not shown in the figure), and the powder tank 10 has a feeding port 11 and a discharging port 12. The feeding port 11 is arranged at the top end of the powder tank 10, and the discharging port 12 is arranged at the bottom end of the powder tank 10. For example, a circular high-temperature metal cover can be provided at the feeding port 11, and is tightly connected to the powder tank 10 by alloy screws and a high-temperature resistant sealing ring to ensure good sealing inside the powder tank 10.

[0043] Combination Figure 2 and Figure 3 As shown, the reamer module 20 is arranged at the lower end of the powder tank 10, and the reamer module 20 has a powder inlet 21 and a powder outlet 22, the powder inlet 21 is connected to the discharge port 12, and a control switch valve 30 is arranged at the powder outlet 22, the inlet of the gasification chamber 40 is connected to the control switch valve 30, and the outlet of the gasification chamber 40 is connected to the chemical vapor deposition furnace 200 (refer to Figure 1 ). For example, refer to Figure 4 As shown, the control switch valve 30 includes a motor 31 and a control valve 32 . The control valve 32 is connected to the powder outlet 22 and the gasification chamber 40 . The motor 31 is connected to the control valve 32 to control the connection and disconnection between the powder outlet 22 and the gasification chamber 40 .

[0044] It can be understood that according to the tantalum pentachloride powder gasification and powder feeding assembly 100 of the embodiment of the utility model, by adding a powder tank 10, the tantalum pentachloride powder storage area and the heating gasification area can be separated to avoid powder residue and deposition in the gasification chamber 40. At the same time, a large amount of tantalum pentachloride powder can be added to the powder tank 10, which is conducive to meeting the needs of mass production of enterprises. By setting the reamer module 20 and the control switch valve 30, the amount of tantalum pentachloride powder entering the gasification chamber 40 can be accurately controlled, which is conducive to achieving uniform powder gasification and improving the synthesis quality of tantalum carbide coating.

[0045] In some embodiments of the present invention, referring to Figure 2 As shown, the powder tank 10 is connected with the inflation pipe 13 and the air outlet pipe 14. For example, the inflation pipe 13 is located on the right side of the powder tank 10, and the air outlet pipe 14 is located on the left side of the powder tank 10. The inflation pipe 13 is used to control the air intake of the powder tank 10, and the air outlet pipe 14 is used to control the air outlet of the powder tank 10. A pressure detector 15 is also provided at the powder tank 10, and the pressure detector 15 is used to detect the pressure inside the powder tank 10.

[0046] It is understandable that the pressure detector 15 can monitor and display the pressure change in the powder tank 10 in real time, which is convenient for outside workers to observe the pressure change in the powder tank 10, and the workers can adjust the pressure in the powder tank 10 through the inflation pipe 13 and the outlet pipe 14 according to the production process requirements, which is conducive to making the powder in the powder tank 10 uniform. Optionally, the powder tank 10 can be a tank body made of high-temperature metal, which is conducive to improving the high-temperature corrosion resistance of the powder tank 10.

[0047] In some embodiments of the present invention, referring to Figure 3 As shown, the reamer module 20 includes: a housing 23, a reamer 24 and a reamer motor 25, a powder inlet 21 is arranged at the top of the housing 23, a powder outlet 22 is arranged at the bottom of the housing 23, the reamer 24 is arranged horizontally, one end of the reamer 24 is connected to the housing 23 through the reamer motor 25, and the other end of the reamer 24 is connected to the housing 23 through the reamer rear cover 26. For example, the left end of the reamer 24 is detachably connected to the housing 23 through the reamer motor 25, and the right end of the reamer 24 is detachably connected to the housing 23 through the reamer rear cover 26.

[0048] It can be understood that the reamer motor 25 drives the reamer 24 to rotate, wherein the speed of the reamer 24 is adjustable, and as the reamer 24 rotates, the tantalum pentachloride powder is transported from the powder inlet 21 to the powder outlet 22, and the reamer motor 25 and the reamer back cover 26 are both detachable, which is convenient for cleaning, repair and maintenance of the reamer module 20, and the reamer motor 25 and the control module of the tantalum pentachloride powder gasification and powder feeding assembly 100 have signal transmission, which is conducive to realizing the automation of the control of the tantalum pentachloride powder gasification and powder feeding assembly 100.

[0049] In some embodiments of the present invention, referring to Figure 2 and Figure 3 As shown, the shell 23 and the powder tank 10 are an integral part. For example, the powder tank 10 and the shell 23 are made of a metal integral structure, connected at the position of the powder inlet 21, and the powder tank 10 and the shell 23 are both made of a high temperature resistant and corrosion resistant metal alloy material. It can be understood that the structure of the integral part can not only ensure the structural and performance stability of the shell 23 and the powder tank 10, but also facilitate molding and simple manufacturing, and eliminate unnecessary assembly parts and connection procedures, greatly improving the assembly efficiency of the shell 23 and the powder tank 10, ensuring the reliability of the connection between the shell 23 and the powder tank 10, and further, the overall strength and stability of the integrally formed structure are higher, the assembly is more convenient, and the service life is longer.

[0050] In some embodiments of the present invention, referring to Figure 2 As shown, the inlet end of the control switch valve 30 is detachably connected to the outlet end of the reamer module 20, and the outlet end of the control switch valve 30 is detachably connected to the inlet end of the gasification chamber 40. For example, the inlet end of the control switch valve 30 is detachably connected to the outlet end of the reamer module 20 through a buckle or a fastening connector, and the outlet end of the control switch valve 30 is detachably connected to the inlet end of the gasification chamber 40 through a buckle or a fastening connector. It can be understood that by making the control switch valve 30 detachably connected to the reamer module 20 and the gasification chamber 40, respectively, the segmented connection of the reamer module 20 and the gasification chamber 40 can be achieved, which is convenient for cleaning, repair and maintenance.

[0051] In some embodiments of the present invention, referring to Figure 2 As shown, the inlet end of the control switch valve 30 is connected to the outlet end of the reamer module 20 through a first buckle assembly 50, and the outlet end of the control switch valve 30 is connected to the inlet end of the gasification chamber 40 through a second buckle assembly 60. Among them, the structures of the first buckle assembly 50 and the second buckle assembly 60 can be the same. It can be understood that the buckle assembly has the advantages of simple structure and easy assembly. By setting the buckle assembly, it is easy to realize the disassembly and assembly of the control switch valve 30 and the reamer module 20 and the gasification chamber 40, and further facilitate the cleaning, repair and maintenance of the reamer module 20 and the gasification chamber 40.

[0052] In some embodiments of the present invention, referring to Figure 5 and Figure 6As shown, the first buckle assembly 50 includes: a sealing ring 51 and a clamp 52, the sealing ring 51 includes a metal ring 511 and a rubber ring 512, the rubber ring 512 is provided with a jacket of the metal ring 511, the sealing ring 51 is provided at the interface between the control switch valve 30 and the reamer module 20, and the clamp 52 surrounds the outer peripheral wall of the interface between the control switch valve 30 and the reamer module 20. For example, the first buckle assembly 50 also includes a fastener 53, the fastener 53 is connected to the clamp 52 to control the degree of tightening of the clamp 52, optionally, the fastener 53, the clamp 52 and the metal ring 511 are all made of high temperature resistant and corrosion resistant metal materials, and the built-in sealing ring 51 is made of high temperature resistant and corrosion resistant materials. It can be understood that by providing the sealing ring 51 and the clamp 52, while ensuring the sealing of the control switch valve 30 and the reamer module 20, it is convenient to realize the assembly and disassembly between the switch valve and the reamer module 20.

[0053] In some embodiments of the present invention, referring to Figure 2 As shown, the tantalum pentachloride powder gasification powder feeding assembly 100 also includes: an argon gas pipeline 70 and a reaction gas pipeline 80, the argon gas pipeline 70 is connected to the gasification chamber 40 to provide argon gas to the gasification chamber 40, and the reaction gas pipeline 80 is connected to the gasification chamber 40 to provide reaction gas to the gasification chamber 40. It can be understood that the graphite sample is placed in the reactor 204 of the chemical vapor deposition furnace 200, and the tantalum pentachloride powder is placed in the powder tank 10. After the process starts, the equipment is heated first, and when the temperature reaches the process requirements, the control switch valve 30 is opened to feed the powder, and the tantalum pentachloride powder is gasified in the gasification chamber 40, and enters the reactor 204 with the reaction gas and hydrogen, and a chemical reaction occurs on the surface of the graphite sample, which is beneficial to improve the quality of the generated tantalum carbide coating.

[0054] In some embodiments of the present invention, referring to Figure 7 As shown, the tantalum pentachloride powder gasification powder feeding assembly 100 also includes: a heater 90, the heater 90 is connected to the gasification chamber 40 to heat the gasification chamber 40, and a temperature sensor 91 is provided at the heater 90. For example, there are multiple heaters 90, and there are also multiple temperature sensors 91, and the multiple heaters 90 and the multiple temperature sensors 91 are set in a one-to-one correspondence. In this way, the required temperature and heating time can be accurately set, which is convenient for operators to change and debug.

[0055] Reference Figure 1-Figure 7 As shown, a tantalum carbide coating synthesis device 1000 according to an embodiment of the present invention comprises: a tantalum pentachloride powder gasification and powder feeding assembly 100 and a chemical vapor deposition furnace 200 according to the above-mentioned embodiment of the present invention.

[0056] For example, refer to Figure 1As shown, a tantalum pentachloride powder gasification powder feeding assembly 100 is used in conjunction with a chemical vapor deposition furnace 200. The tantalum pentachloride powder gasification powder feeding assembly 100 includes: a powder tank 10, a reamer module 20, a control switch valve 30 and a vaporization chamber 40. The chemical vapor deposition furnace 200 includes: a heating module 201, a metal furnace wall 202, an insulation layer 203 and a reactor 204. The vaporization chamber 40 is connected to the reactor 204 through a pipeline. The graphite sample is placed in the reactor 204, and the tantalum pentachloride powder is placed in the powder tank 10. After the process starts, the equipment is heated first. After the temperature reaches the process requirement, the control switch valve 30 is opened to feed the powder. The tantalum pentachloride powder is vaporized in the vaporization chamber 40, and enters the reactor 204 along with the reaction gas and the carrier gas, and a chemical reaction occurs on the surface of the graphite sample to generate a tantalum carbide coating.

[0057] It is understandable that according to the tantalum carbide coating synthesis device 1000 of the embodiment of the utility model, by separating the tantalum pentachloride powder storage area from the heating and gasification area, the amount of tantalum pentachloride powder gasification can be accurately controlled, and the powder can be uniformly gasified. In actual operation, tantalum pentachloride powder is added from the powder feeding port, and the powder will be stored in the powder inlet 21. At this time, the control switch valve 30 is in a closed state, the powder storage area is not connected to the heating and gasification area, and the pressure on both sides can be controlled separately; when the process requires tantalum pentachloride raw materials, the control switch valve 30 is opened, and the powder storage area is connected to the heating and gasification area, and the reamer motor 25 is turned on, and the reamer 24 rotates slowly, driving the tantalum pentachloride powder to the powder outlet 22, and entering the gasification chamber 40 for gasification, and the speed of the reamer 24 can be adjusted, so the amount of powder can be controlled, so that the powder is completely gasified, and the generated reaction coating is more uniform, which is conducive to improving the overall performance of the tantalum carbide coating synthesis device 1000.

[0058] Other structures and operations of the tantalum carbide coating synthesis device 1000 according to the embodiment of the present invention are known to those skilled in the art and will not be described in detail here.

[0059] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.

[0060] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present utility model, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0061] In the present invention, unless otherwise clearly specified and limited, the terms "install", "connect", "connect", "fix" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection, an electrical connection, or a communication; it can be a direct connection, or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0062] In the present utility model, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, a first feature being "above", "above" or "above" a second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. A first feature being "below", "below" or "below" a second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0063] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the utility model. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art may combine and combine the different embodiments or examples described in this specification and the features of the different embodiments or examples, without contradiction.

[0064] Although the embodiments of the present invention have been shown and described, those skilled in the art will appreciate that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the claims and their equivalents.

Claims

1. A tantalum pentachloride powder gasification and powder feeding assembly, characterized in that: include: A powder tank, the powder tank is used to store tantalum pentachloride powder, the powder tank has a feeding port and a discharging port, the feeding port is arranged at the top end of the powder tank, and the discharging port is arranged at the bottom end of the powder tank; A reamer module, the reamer module is arranged at the lower end of the powder tank, the reamer module has a powder inlet and a powder outlet, the powder inlet is communicated with the discharge port, and a control switch valve is arranged at the powder outlet; A vaporization chamber, wherein the inlet of the vaporization chamber is communicated with the control switch valve, and the outlet of the vaporization chamber is communicated with the chemical vapor deposition furnace.

2. The tantalum pentachloride powder gasification and powder feeding assembly according to claim 1, characterized in that: The powder tank is communicated with the air charging pipe and the air outlet pipe. A pressure detector is also provided at the powder tank, and the pressure detector is used to detect the pressure in the powder tank.

3. The tantalum pentachloride powder gasification and powder feeding assembly according to claim 1, characterized in that: The reamer module comprises: A shell, wherein the powder inlet is arranged at the top end of the shell, and the powder outlet is arranged at the bottom end of the shell; The reamer is arranged transversely, one end of the reamer is connected to the housing through a reamer motor, and the other end of the reamer is connected to the housing through a reamer back cover.

4. The tantalum pentachloride powder gasification and powder feeding assembly according to claim 3, characterized in that: The shell and the powder tank are an integral part.

5. The tantalum pentachloride powder gasification and powder feeding assembly according to claim 1, characterized in that: The inlet end of the control switch valve is detachably connected to the outlet end of the reamer module, and the outlet end of the control switch valve is detachably connected to the inlet end of the gasification chamber.

6. The tantalum pentachloride powder gasification and powder feeding assembly according to claim 5, characterized in that: The inlet end of the control switch valve is connected to the outlet end of the reamer module via a first buckle assembly, and the outlet end of the control switch valve is connected to the inlet end of the gasification chamber via a second buckle assembly.

7. The tantalum pentachloride powder gasification and powder feeding assembly according to claim 6, characterized in that: The first buckle assembly comprises: A sealing ring, the sealing ring comprises a metal ring and a rubber ring, the rubber ring is arranged on the outer sleeve of the metal ring, and the sealing ring is arranged on the butt joint surface between the control switch valve and the reamer module; A clamp is surrounded by an outer peripheral wall at a joint between the control switch valve and the reamer module.

8. The tantalum pentachloride powder gasification and powder feeding assembly according to claim 1, characterized in that: Also includes: An argon gas pipeline and a reaction gas pipeline, wherein the argon gas pipeline is communicated with the vaporization chamber to provide argon gas to the vaporization chamber, and the reaction gas pipeline is communicated with the vaporization chamber to provide reaction gas to the vaporization chamber.

9. The tantalum pentachloride powder gasification and powder feeding assembly according to claim 8, characterized in that: Also includes: A heater is connected to the vaporization chamber to heat the vaporization chamber, and a temperature sensor is provided at the heater.

10. A tantalum carbide coating synthesis device, characterized in that: include: A tantalum pentachloride powder gasification and powder feeding assembly and a chemical vapor deposition furnace according to any one of claims 1 to 9.

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