Ionic liquid electroplating device used under protective atmosphere

Abstract

The utility model provides an ionic liquid electroplating device used under a protective atmosphere, which comprises an inert gas cylinder, a three-way valve I, a deposition cabin body, a transition cabin body, a three-way valve II, a vacuum pump, a gas circulating pump, a purifier, a plating tank and an electroplating power supply, and further comprises an independently arranged management tank glove box cabin body, the management tank glove box cabin body is communicated with the deposition cabin body through a connecting valve pipe, an inlet of the gas circulating pump is communicated with the management tank glove box cabin body, an outlet of the purifier is communicated with the management tank glove box cabin body, a plating solution management tank is installed in the management tank glove box cabin body, and a plating solution circulating assembly is arranged between the plating solution management tank and the plating tank. And the plating solution circulating assembly is used for alternate circulating flow of the plating solution in the plating solution management tank and the plating tank. According to the device, the temperature of the electroplating liquid is conveniently controlled, the circular flowing effect of the electroplating liquid in the plating tank is enhanced, the problem that the concentration of the electroplating liquid in the plating tank is inconsistent is solved, the electroplating deposition effect is improved, and filtering and pump maintenance are convenient.

Description

Technical Field

[0001] The utility model relates to the technical field of electroplating equipment, in particular to an ionic liquid electroplating device used in a protective atmosphere. Background Art

[0002] Ionic liquid plating is a new electroplating technology that uses non-aqueous ionic liquid as the electrolyte. It has many advantages that traditional electroplating technologies cannot match. For example, it can realize the electroplating of active metals such as aluminum that cannot be electrodeposited from aqueous solutions, has no risk of hydrogen embrittlement, and is suitable for the electroplating of easily oxidized metals. At the same time, the electroplating process is green and environmentally friendly, so it has broad application prospects. At present, the plating solution management tank on the electroplating equipment on the market is generally integrated on the plating tank, that is, the plating solution flows out from the top of one end of the plating tank and enters the plating solution management tank. The plating solution has the problem of inconsistent concentration, which affects the electroplating deposition effect. Utility Model Content

[0003] The technical problem to be solved by the utility model is that the electroplating liquid flows out from the top of one end of the plating tank and enters the plating liquid management tank, and the electroplating liquid has the problem of inconsistent concentration, which affects the electroplating deposition effect. In order to overcome the defects of the above prior art, the utility model provides an ionic liquid electroplating device for use in a protective atmosphere.

[0004] The utility model provides an ionic liquid electroplating device for use in a protective atmosphere, comprising an inert gas cylinder, a three-way valve, a deposition chamber body, a transition chamber body, a three-way valve, a vacuum pump, a gas circulation pump, a purifier, a plating tank and an electroplating power supply, wherein the inert gas cylinder is communicated with a first end of the three-way valve, a second end of the three-way valve is communicated with the deposition chamber body, a third end of the three-way valve is communicated with the transition chamber body, the transition chamber body is connected to the outer side wall of the deposition chamber body, the vacuum pump is communicated with a first end of the three-way valve, a second end of the three-way valve is communicated with the deposition chamber body, a third end of the three-way valve is communicated with the transition chamber body, and the gas circulation pump is communicated with a first end of the three-way valve. The inlet of the gas circulation pump is connected with the inlet of the purifier, the outlet of the purifier is connected with the deposition chamber body, the plating tank is installed in the deposition chamber body, and also includes an independently arranged management tank glove box body, the management tank glove box body is connected with the deposition chamber body through a connecting valve pipe, the inlet of the gas circulation pump is connected with the management tank glove box body, the outlet of the purifier is connected with the management tank glove box body, a plating liquid management tank is installed in the management tank glove box body, a plating liquid circulation assembly is provided between the plating liquid management tank and the plating tank, and the plating liquid circulation assembly is used for the alternating circulation of the electroplating liquid in the plating liquid management tank and the plating tank.

[0005] Compared with the prior art, the ionic liquid electroplating device for use in a protective atmosphere in the present application has the following advantages: a plating liquid management tank is arranged in an independent management tank glove box cabin, so that the plating liquid management tank is separated from the plating tank to facilitate the management of the plating liquid, and at the same time, a plating liquid circulation component is used to realize the circulation flow of the plating liquid in the plating tank, thereby enhancing the circulation flow effect of the plating liquid in the plating tank, reducing the problem of inconsistent concentration, and improving the electroplating deposition effect.

[0006] In a possible embodiment, the plating liquid circulation component includes a liquid circulation pump, a first pipe and a second pipe, the inlet of the first pipe is connected to the plating tank, the outlet of the first pipe is connected to the plating liquid management tank, the inlet of the second pipe is connected to the plating liquid management tank, the outlet of the second pipe is connected to the plating tank, the liquid circulation pump is connected to the second pipe, and there is a height difference between the inlet of the first pipe and the outlet of the second pipe.

[0007] Compared with the prior art, the above technical solution can realize the alternating circulation flow of the electroplating solution in the plating solution management tank and the plating tank, thereby improving the electroplating effect.

[0008] In a possible implementation manner, a filter is further provided on the second pipe.

[0009] Compared with the prior art, the above technical solution can improve the electroplating effect.

[0010] In a possible implementation manner, a heater for heating the electric plating solution is provided on the plating solution management tank.

[0011] Compared with the prior art, the above technical solution can achieve thermal control of the electroplating solution.

[0012] In a possible implementation manner, a condenser for cooling the electroplating solution is provided on the plating solution management tank.

[0013] Compared with the prior art, the above technical solution can further control the stability of the electroplating solution.

[0014] In a possible implementation manner, a plurality of management slot sealing gloves are provided on the bulkhead of the management slot glove box cabin.

[0015] Compared with the prior art, the above technical solution can facilitate the internal operation of the management tank glove box cabin.

[0016] In a possible implementation manner, a management tank dew point meter, a management tank oxygen probe and a management tank pressure gauge are provided on the management tank glove box cabin.

[0017] Compared with the prior art, the above technical solution can monitor the moisture, oxygen content and air pressure of the glove box cabin in real time. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a structural schematic diagram of the utility model;

[0019] Description of reference numerals:

[0020] 1. Inert gas cylinder; 2. Three-way valve 1; 3. Sedimentation chamber; 31. Sedimentation chamber dew point meter; 32. Sedimentation chamber oxygen probe; 33. Sedimentation chamber pressure gauge; 34. Sedimentation chamber sealing gloves; 4. Transition chamber; 41. First cabin door; 42. Second cabin door; 43. Transition chamber pressure gauge; 5. Three-way valve 2; 6. Vacuum pump; 7. Gas circulation pump; 8. Purifier; 9. Plating tank; 10. Electroplating power supply; 11. Management tank glove box Cabin; 111, management tank dew point meter; 112, management tank oxygen probe; 113, management tank pressure gauge; 114, management tank sealing gloves; 12, connecting valve pipe; 13, plating solution management tank; 14, plating solution circulation assembly; 141, liquid circulation pump; 142, first pipeline; 143, second pipeline; 15, filter; 16, heater; 17, condenser; 18, electroplating parts; 19, anode material; 20, temperature controller. DETAILED DESCRIPTION

[0021] First, those skilled in the art should understand that these implementations are only used to explain the technical principles of the embodiments of the present application, and are not intended to limit the protection scope of the embodiments of the present application. Those skilled in the art can make adjustments to them as needed to adapt to specific application scenarios.

[0022] In the description of the embodiments of the present application, it should be noted that, unless otherwise clearly specified and limited, the terms "connected" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium. For ordinary technicians in this field, the specific meanings of the above terms in the embodiments of the present application can be understood according to specific circumstances.

[0023] In the embodiments of the present application, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, a first feature being "above", "above" or "above" a second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. A first feature being "below", "below" or "below" a second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0024] The present application is further described in detail below with reference to the accompanying drawings and specific embodiments.

[0025] See also Figure 1 The embodiment of the present application discloses an ionic liquid electroplating device for use in a protective atmosphere, comprising an inert gas cylinder 1, a three-way valve 2, a deposition chamber body 3, a transition chamber body 4, a three-way valve 5, a vacuum pump 6, a gas circulation pump 7, a purifier 8, a plating tank 9 and an electroplating power supply 10, wherein the inert gas cylinder 1 is connected to a first end of the three-way valve 2, a second end of the three-way valve 2 is connected to the deposition chamber body 3, a third end of the three-way valve 2 is connected to the transition chamber body 4, the transition chamber body 4 is connected to the outer side wall of the deposition chamber body 3, the vacuum pump 6 is connected to a first end of the three-way valve 5, and the The second end of the three-way valve 2 5 is in communication with the deposition chamber body 3, the third end of the three-way valve 2 5 is in communication with the transition chamber body 4, the inlet of the gas circulation pump 7 is in communication with the deposition chamber body 3, the outlet of the gas circulation pump 7 is in communication with the inlet of the purifier 8, the outlet of the purifier 8 is in communication with the deposition chamber body 3, the plating tank 9 is installed in the deposition chamber body 3, the plating tank 9 contains electroplating liquid, the electroplating parts 18 are immersed in the electroplating liquid of the plating tank 9, the electroplating parts 18 are connected to the cathode of the electroplating power supply 10, the anode of the electroplating power supply 10 is connected to the anode material 19 and immersed in the electroplating liquid of the plating tank 9. The deposition chamber body 3 is provided with a deposition chamber dew point meter 31, a deposition chamber oxygen probe 32, and a deposition chamber pressure gauge 33; the deposition chamber body 3 is provided with a deposition chamber sealing glove 34. The transition chamber body 4 is provided with a first cabin door 41 connected to the outside and a second cabin door 42 connected to the deposition chamber body 3. The transition tank body 4 is provided with a transition tank pressure gauge 43 .

[0026] In order to enhance the circulation effect of the electroplating liquid in the plating tank 9, the device also includes an independently arranged management tank glove box cabin 11, and the management tank glove box cabin 11 is connected to the deposition tank cabin 3 through a connecting valve pipe 12, the inlet of the gas circulation pump 7 is connected to the management tank glove box cabin 11, and the outlet of the purifier 8 is connected to the management tank glove box cabin 11, and a plating liquid management tank 13 is installed in the management tank glove box cabin 11, and a plating liquid circulation component 14 is provided between the plating liquid management tank 13 and the plating tank 9, and the plating liquid circulation component 14 is used for the alternating circulation of the electroplating liquid in the plating liquid management tank 13 and the plating tank 9.

[0027] As can be known from the above, the plating solution management tank 13 is arranged in an independent management tank glove box cabin 11, so that the plating solution management tank 13 is separated from the plating tank 9 to facilitate the management of the plating solution. At the same time, the plating solution circulation component 14 is cooperated to realize the circulation flow of the plating solution in the plating tank 9, thereby enhancing the circulation flow effect of the plating solution in the plating tank 9, reducing the problem of inconsistent concentration of the plating solution in the plating tank 9, and improving the electroplating deposition effect.

[0028] In this embodiment, the plating solution circulation assembly 14 includes a liquid circulation pump 141, a first pipe 142, and a second pipe 143. The inlet of the first pipe 142 is connected to the plating tank 9, the outlet of the first pipe 142 is connected to the plating solution management tank 13, the inlet of the second pipe 143 is connected to the plating solution management tank 13, and the outlet of the second pipe 143 is connected to the plating tank 9. The liquid circulation pump 141 is connected to the second pipe 143, and there is a height difference between the inlet of the first pipe 142 and the outlet of the second pipe 143, thereby realizing the alternating circulation of the electroplating solution in the plating solution management tank 13 and the plating tank 9, and improving the electroplating effect. Specifically, the height of the inlet of the first pipe 142 is higher than the height of the outlet of the second pipe 143.

[0029] In this embodiment, a filter 15 is further provided on the second pipe 143, thereby improving the electroplating effect.

[0030] In this embodiment, a heater 16 for heating the electroplating solution is provided on the electroplating solution management tank 13, thereby achieving thermal control of the electroplating solution.

[0031] In this embodiment, the plating solution management tank 13 is provided with a condenser 17 for cooling the electroplating solution, thereby further controlling the stability of the electroplating solution.

[0032] In this embodiment, a plurality of management slot sealing gloves 114 are provided on the wall of the management slot glove box cabin 11 , thereby facilitating the internal operation of the management slot glove box cabin 11 .

[0033] In this embodiment, a management tank dew point meter 111, a management tank oxygen probe 112 and a management tank pressure gauge 113 are provided on the management tank glove box cabin 11, thereby being able to monitor the moisture, oxygen content and air pressure of the management tank glove box cabin 11 in real time.

[0034] The ionic liquid plating process of this application is as follows:

[0035] 1. First, establish the atmosphere for the deposition chamber body 3. Open the inert gas cylinder 1, and the inert gas enters the deposition chamber body 3 through the three-way valve 2, and the air intake is monitored according to the deposition chamber pressure gauge 33. Afterwards, turn on the gas circulation pump 7, and the gas passes through the purifier 8 to keep the water and oxygen content in the gas in the deposition chamber body 3 below the specified value (such as 1ppm). The water and oxygen content are detected by the deposition chamber dew point meter 31 and the deposition chamber oxygen probe 32, respectively. The management tank glove box body 11 is arranged in parallel with the deposition chamber body 3, and the water and oxygen content in the management tank glove box body 11 are detected by the management tank dew point meter 111 and the management tank oxygen probe 112, respectively.

[0036] Second, after the electroplated parts 18 are placed in the transition chamber body 4, the first hatch 41 is closed, the vacuum pump 6 is turned on, and the air in the transition chamber body 4 is extracted through the three-way valve 2 5, and the inert gas is passed into the transition chamber body 4 through the three-way valve 1 2. When the pressure is consistent with that of the deposition chamber body 3, the second hatch 42 is opened, and the electroplated parts 18 are moved into the deposition chamber body 3 and then the second hatch 42 is closed. Thus, while the atmosphere of the deposition chamber body 3 remains unchanged, the electroplated parts 18 are moved from the atmospheric atmosphere into the deposition chamber body 3. The pressure of the transition chamber body 4 is monitored by the transition chamber pressure gauge 43.

[0037] 3. Afterwards, as in conventional electroplating, the electroplated part 18 is placed in the plating tank 9 filled with the electroplating solution, and connected to the negative electrode of the electroplating power source 10; the anode material 19 is connected to the positive electrode of the electroplating power source 10, and electroplating can be achieved after power is turned on. The electroplating solution is pumped into the filter 15 through the liquid circulation pump 141 and returned to the plating tank 9 through the second pipe 143 to achieve stirring and filtering of the electroplating solution. The electroplating solution is heated and temperature-controlled by the heater 16 and the temperature controller 20.

[0038] Fourth, when taking out the plated parts, first open the second hatch 42, put the plated parts into the transition chamber body 4, close the second hatch 42, and then open the first hatch 41 to take out the plated parts and enter the atmospheric atmosphere.

[0039] Thereafter, the aforementioned steps 2 to 4 are repeated to achieve ionic liquid plating of another electroplating part 18 .

[0040] 5. When the pressure of the deposition chamber body 3 is too high, the vacuum pump 6 is turned on to evacuate through the three-way valve 2 5 to reduce the pressure of the deposition chamber body 3; when the pressure of the deposition chamber body 3 is too low, the inert gas is introduced into the deposition chamber body 3 through the inert gas cylinder 1 and the three-way valve 1 2 to increase the pressure of the deposition chamber body 3. Manual operation is performed through three deposition chamber sealing gloves 34 fixed on the deposition chamber body 3.

[0041] In the description of the embodiments of the present application, it should be noted that in the description of the present application, terms such as "inside" and "outside" indicating directions or positional relationships are based on the directions or positional relationships shown in the drawings. This is only for the convenience of description, and does not indicate or imply that the device or component must have a specific orientation, be constructed and operated in a specific orientation. Therefore, it cannot be understood as a limitation on the present application.

[0042] In the description of the present application, the description with reference to the terms "one embodiment", "some embodiments", "in the present embodiment", "specific example", or "some examples" etc. means that the specific features, mechanisms, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, mechanisms, materials or characteristics described may be combined in a suitable manner in any one or more embodiments or examples. In addition, those skilled in the art may combine and combine the different embodiments or examples described in this specification and the features of the different embodiments or examples, without contradiction.

[0043] The above is only a specific implementation of the present application, but the protection scope of the present application is not limited thereto. Any changes or substitutions that can be easily thought of by a person skilled in the art within the technical scope disclosed in the present application should be included in the protection scope of the present application. Therefore, the protection scope of the present application shall be based on the protection scope of the claims.

Claims

1. An ionic liquid electroplating device for use in a protective atmosphere, comprising an inert gas cylinder (1), a three-way valve (2), a deposition chamber body (3), a transition chamber body (4), a three-way valve (5), a vacuum pump (6), a gas circulation pump (7), a purifier (8), a plating tank (9) and an electroplating power supply (10), wherein the inert gas cylinder (1) is connected to a first end of the three-way valve (2), a second end of the three-way valve (2) is connected to the deposition chamber body (3), a third end of the three-way valve (2) is connected to the transition chamber body (4), and the transition chamber body (4) is connected to ...). The vacuum pump (6) is connected to the outer wall of the deposition chamber body (3), the vacuum pump (6) is connected to the first end of the three-way valve (5), the second end of the three-way valve (5) is connected to the deposition chamber body (3), the third end of the three-way valve (5) is connected to the transition chamber body (4), the inlet of the gas circulation pump (7) is connected to the deposition chamber body (3), the outlet of the gas circulation pump (7) is connected to the inlet of the purifier (8), the outlet of the purifier (8) is connected to the deposition chamber body (3), the plating tank (9) is installed in the deposition chamber body (3), and is characterized in that: The invention also comprises an independently arranged management tank glove box cabin (11), wherein the management tank glove box cabin (11) is connected to the deposition cabin cabin (3) via a connecting valve pipe (12), the inlet of the gas circulation pump (7) is connected to the management tank glove box cabin (11), and the outlet of the purifier (8) is connected to the management tank glove box cabin (11), a plating solution management tank (13) is installed in the management tank glove box cabin (11), a plating solution circulation component (14) is arranged between the plating solution management tank (13) and the plating tank (9), and the plating solution circulation component (14) is used for the alternating circulation of the plating solution in the plating solution management tank (13) and the plating tank (9).

2. The ionic liquid electroplating device for use in a protective atmosphere according to claim 1, characterized in that: The plating liquid circulation component (14) comprises a liquid circulation pump (141), a first pipe (142) and a second pipe (143); the inlet of the first pipe (142) is connected to the plating tank (9); the outlet of the first pipe (142) is connected to the plating liquid management tank (13); the inlet of the second pipe (143) is connected to the plating liquid management tank (13); the outlet of the second pipe (143) is connected to the plating tank (9); the liquid circulation pump (141) is connected to the second pipe (143); and there is a height difference between the inlet of the first pipe (142) and the outlet of the second pipe (143).

3. The ionic liquid electroplating device for use in a protective atmosphere according to claim 2, characterized in that: The second pipe (143) is also provided with a filter (15).

4. The ionic liquid electroplating device for use in a protective atmosphere according to claim 1, characterized in that: The plating solution management tank (13) is provided with a heater (16) for heating the electric plating solution.

5. The ionic liquid electroplating device for use in a protective atmosphere according to claim 4, characterized in that: The plating solution management tank (13) is provided with a condenser (17) for cooling the plating solution.

6. The ionic liquid electroplating device for use in a protective atmosphere according to claim 1, characterized in that: A plurality of management slot sealing gloves (114) are provided on the wall of the management slot glove box cabin (11).

7. The ionic liquid electroplating device for use in a protective atmosphere according to claim 1, characterized in that: The management tank glove box cabin (11) is provided with a management tank dew point meter (111), a management tank oxygen probe (112) and a management tank pressure gauge (113).

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