Collimator and magnetron sputtering equipment

Abstract

The utility model discloses a collimator and magnetron sputtering equipment. The collimator comprises a first plate group and a second plate group, the first plate set comprises a first plate body and a second plate body which are arranged in a spaced mode in the first direction. The second plate set and the first plate set are oppositely arranged in the vertical direction. The second plate set comprises a third plate body and a fourth plate body which are arranged in the second direction in a spaced mode. The second direction intersects with the first direction, and the second direction and the first direction are both perpendicular to the vertical direction. The first plate set and the second plate set are connected in an inserted mode to jointly define a filter hole, and the filter hole extends in the vertical direction. The second plate group is configured to be provided with a first inserting position and a second inserting position, the filtering holes have a first hole area at the first inserting position, and the filtering holes have a second hole area at the second inserting position. The first hole area is larger than the second hole area. According to the collimator and the magnetron sputtering equipment, the sizes of the filtering holes can be adjusted, the collimation and filtering requirements of substrates of various specifications can be met, and the application range is greatly expanded.

Description

Technical Field

[0001] The utility model relates to the technical field of magnetron sputtering, in particular to a collimator and magnetron sputtering equipment. Background Art

[0002] Magnetron sputtering is an efficient thin film deposition technology that can be used in vacuum coating fields such as semiconductors and photovoltaics. Magnetron sputtering can use the interaction of electric and magnetic fields to accelerate electrons to collide with argon atoms in the process of flying toward the substrate under the action of the electric field, ionizing a large number of argon ions and electrons, and the electrons fly toward the substrate. Argon ions are accelerated to bombard the target material under the action of the electric field, and a large number of sputtered target atoms and ions are deposited on the substrate to form a thin film.

[0003] In semiconductors, when the device circuit density increases, the substrate surface with high aspect ratio holes needs to be plated. During the coating process, in order to avoid problems such as the bottom of the deep hole of the substrate not being completely plated with film, resulting in hole closure and poor coating, it is necessary to make the plated atoms and ions run from the target surface to the substrate surface in a direction approximately perpendicular to the substrate surface. The magnetic field generated by the coil can only correct the trajectory of ion movement, and the plated atoms are not affected by the magnetic field and electric field. Therefore, a collimator is required to screen the plated atoms to filter out the plated atoms whose movement direction is tilted to the substrate surface.

[0004] In the related art, the collimator uses machining to form filter holes. After the filter holes are machined, the size of the filter holes is fixed. Therefore, a single collimator can only meet the collimation and screening requirements of substrates with holes of a specific aspect ratio, and has a small application range. Utility Model Content

[0005] The main purpose of the utility model is to provide a collimator and a magnetron sputtering device, aiming to solve the technical problem that the application range of the collimator is small.

[0006] To achieve the above-mentioned purpose, the first embodiment of the utility model provides a collimator for a magnetron sputtering device, the collimator comprising:

[0007] A first plate group, comprising a first plate body and a second plate body arranged at intervals along a first direction;

[0008] a second plate group, arranged opposite to the first plate group in a vertical direction, the second plate group comprising a third plate body and a fourth plate body arranged at intervals along a second direction, the second direction intersecting the first direction, and the second direction and the first direction both being perpendicular to the vertical direction;

[0009] Among them, the first plate group and the second plate group are plugged into each other to jointly enclose a filter hole, and the filter hole extends along the vertical direction. The second plate group is configured to have a first plug-in position and a second plug-in position. At the first plug-in position, the filter hole has a first hole area, and at the second plug-in position, the filter hole has a second hole area, and the first hole area is larger than the second hole area.

[0010] In some embodiments, the first plate group includes a fifth plate body, the fifth plate body and the second plate body are arranged in the first direction at intervals, and the fifth plate body is arranged on a side of the second plate body away from the first plate body;

[0011] The second plate group includes a sixth plate body, the sixth plate body is arranged with a gap from the fourth plate body along the second direction, and the sixth plate body is arranged on a side of the fourth plate body away from the third plate body;

[0012] The first plate group and the second plate group are plugged together to enclose a plurality of filter holes, and each of the filter holes extends along the vertical direction.

[0013] In some embodiments, the first plate body is provided with a plurality of first slots, each of which is arranged at intervals along the second direction, and the second plate body is provided with a plurality of second slots, each of which is arranged at intervals along the second direction;

[0014] The third plate body is inserted into the first slot body and the second slot body, and the fourth plate body is inserted into the first slot body and the second slot body.

[0015] In some embodiments, the third plate body is provided with a plurality of third slots, each of which is arranged at intervals along the first direction, and the fourth plate body is provided with a plurality of fourth slots, each of which is arranged at intervals along the first direction;

[0016] The first plate body is plugged into the third slot body and the fourth slot body, and the second plate body is plugged into the third slot body and the fourth slot body.

[0017] In some embodiments, the collimator includes a plurality of frame groups, each of the frame groups includes a first frame and a second frame, each of the first frames has a first end and a second end opposite to each other, each of the second frames has a third end and a fourth end opposite to each other, wherein the first end is connected to the third end of the same frame group, the second end is connected to the fourth end of the adjacent frame group, and each of the frame groups together encloses a ring structure;

[0018] One end of the first plate group is connected to one of the first frames, and the other end is connected to another of the first frames; one end of the second plate group is connected to one of the second frames, and the other end is connected to another of the second frames.

[0019] In some embodiments, each of the first frames is provided with a first card slot, and the first plate group is provided with a first connecting portion at an end portion along its extension direction, and along the vertical direction, the first connecting portion is inserted into the first card slot;

[0020] Each of the second frames is provided with a second card slot, and the end of the second plate group along the extension direction thereof is provided with a second connecting portion, and along the vertical direction, the second connecting portion is inserted into the second card slot.

[0021] In some embodiments, the annular structure has a sink, the first connecting portion is provided with a first protrusion, the second connecting portion is provided with a second protrusion, and along the vertical direction, the first protrusion and the second protrusion both abut against the sink.

[0022] In some embodiments, the collimator further includes a third plate group, the third plate group is arranged on a side of the second plate group away from the first plate group, the third plate group and the second plate group are arranged opposite to each other along the vertical direction, and the third plate group includes a seventh plate body and an eighth plate body arranged at intervals along the first direction;

[0023] The third plate group is plugged into the second plate group, and the second plate group is plugged into the first plate group to jointly enclose the filter hole.

[0024] In some embodiments, the first plate body and the second plate body in the first plate group have the same structure, and the materials of the first plate body and the second plate body are both sheet metal materials;

[0025] and / or,

[0026] The third plate body and the fourth plate body in the second plate group have the same structure, and the materials of the third plate body and the fourth plate body are both sheet metal materials.

[0027] A second aspect of the present invention provides a magnetron sputtering device, comprising the collimator of the above embodiment.

[0028] Compared with the prior art, the beneficial effects of the utility model include:

[0029] In the technical solution of the utility model, the collimator includes a first plate group and a second plate group. The first plate group includes a first plate body and a second plate body arranged at intervals along a first direction. The second plate group includes a third plate body and a fourth plate body arranged at intervals along a second direction. The first plate group and the second plate group are plugged and can enclose a filter hole extending vertically. The prior art uses machining to form the filter hole, and the size of the filter hole is fixed. The collimator can only adapt to the collimation screening requirements of substrates with specific aspect ratio holes. The second plate group of this solution has a first plug-in position and a second plug-in position. At the first plug-in position, the filter hole has a first hole area. At the second plug-in position, the filter hole has a second hole area. The first hole area is larger than the second hole area, that is, this solution can form filter holes of different sizes by adjusting the specific plug-in position between the first plate group and the second plate group. Therefore, this solution can adapt to the collimation filtering requirements of substrates of various specifications, effectively increasing the application range of the collimator. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on the structures shown in these drawings without paying creative work.

[0031] Figure 1 It is a schematic diagram of a magnetron sputtering device in one embodiment of the utility model;

[0032] Figure 2 It is an exploded schematic diagram of a collimator in an embodiment of the utility model, wherein a first plate group, a second plate group and a frame group are shown;

[0033] Figure 3 It is a schematic diagram of a collimator in one embodiment of the utility model observed along the vertical direction;

[0034] Figure 4 is a cross-sectional view of a collimator in one embodiment of the utility model;

[0035] Figure 5 for Figure 4 A partial enlarged view of point A in the middle.

[0036] Description of Figure Numbers:

[0037] Magnetron sputtering equipment 1;

[0038] Collimator 10;

[0039] First plate assembly 100; first plate body 110; first tank body 111; second plate body 120; second tank body 121;

[0040] Fifth plate 130; first connecting portion 140; first protrusion 141;

[0041] The second plate assembly 200; the third plate body 210; the third slot body 211; the fourth plate body 220; the fourth slot body 221; the sixth plate body 230; the second connecting portion 240; the second protrusion 241;

[0042] Filter hole 300;

[0043] Frame assembly 400; first frame 410; first end 411; second end 412; first slot 413; second frame 420; third end 421; fourth end 422; second slot 423; sink 430;

[0044] Target 20; magnetron 30; substrate 40; stage 50; upper coil 60; lower coil 70;

[0045] First direction X; second direction Y; vertical direction Z.

[0046] The realization of the purpose, functional features and advantages of the utility model will be further explained in conjunction with embodiments and with reference to the accompanying drawings. DETAILED DESCRIPTION

[0047] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0048] In the related art, the collimator uses machining to form filter holes. After the filter holes are machined, the size of the filter holes is fixed. Therefore, a single collimator can only meet the collimation and screening requirements of substrates with holes of a specific aspect ratio, and has a small application range.

[0049] In view of this, the first embodiment of the present invention proposes a collimator 10, which can adapt to the collimation and filtering requirements of substrates 40 of various sizes and has a wide range of applications. Figures 1 to 5 The collimator 10 according to the embodiment of the present application is introduced. Specifically, the collimator 10 includes a first plate group 100 and a second plate group 200 .

[0050] Reference Figure 2 and Figure 3 The first plate group 100 and the second plate group 200 can form a filter hole 300 together, and the filter hole 300 can filter out the coating atoms whose movement direction is inclined to the surface of the substrate 40. In order to facilitate the description and understanding of the specific configuration of the first plate group 100, a first direction X is defined, Figure 3 The first direction X is a reference to the left and right direction. The first plate group 100 includes a first plate body 110 and a second plate body 120 arranged at intervals along the first direction X. The structures of the first plate body 110 and the second plate body 120 may be the same.

[0051] Reference Figure 2 and Figure 3 , the second plate group 200 can be arranged relative to the first plate group 100 along the vertical direction Z. In order to facilitate the description and understanding of the specific settings of the second plate group 200, a second direction Y is defined, and the second direction Y can intersect with the first direction X. The second plate group 200 includes a third plate body 210 and a fourth plate body 220 arranged at intervals along the second direction Y. In some embodiments, the second direction Y can be perpendicular to the first direction X. In other embodiments, the second direction Y can be at other non-perpendicular angles to the first direction X. Some embodiments of the present application are described by taking the example that the second direction Y is perpendicular to the first direction X. It should be noted that the second direction Y and the first direction X are both perpendicular to the vertical Z. With Figure 3 With reference to the direction in , the first direction X can point to the left and right direction, the second direction Y can point to the up and down direction, and the vertical direction Z can point to the front and back direction.

[0052] It should be noted that in some embodiments, the first plate group 100 may be located on the upper side of the second plate group 200 along the vertical direction Z. In other embodiments, the second plate group 200 may be located on the upper side of the first plate group 100 along the vertical direction Z. Figure 2 In some embodiments of the present application, the first plate group 100 is located on the upper side of the second plate group 200 along the vertical direction Z as an example for description.

[0053] Reference Figures 2 to 5 , the specific connection settings of the first plate group 100 and the second plate group 200 are introduced below. The first plate group 100 can be plugged with the second plate group 200 to jointly enclose a filter hole 300, wherein the filter hole 300 extends along the vertical direction Z. In addition, the second plate group 200 is configured to have a first plug-in position and a second plug-in position. When the first plate group 100 is plugged in the first plug-in position, the filter hole 300 formed has a first hole area; when the first plate group 100 is plugged in the second plug-in position, the filter hole 300 formed has a second hole area. In addition, the first hole area can be larger than the second hole area. That is, the first plate group 100 and the second plate group 200 can form filter holes 300 of different sizes by switching the plug-in positions to meet the filtering requirements of substrates 40 of different specifications.

[0054] In the technical solution of the utility model, the collimator 10 includes a first plate group 100 and a second plate group 200. The first plate group 100 includes a first plate body 110 and a second plate body 120 arranged at intervals along a first direction X. The second plate group 200 includes a third plate body 210 and a fourth plate body 220 arranged at intervals along a second direction Y. The first plate group 100 and the second plate group 200 are plugged and can enclose a filter hole 300 extending along a vertical direction Z. The prior art uses machining to form a filter hole, and the size of the filter hole is fixed. The collimator can only adapt to the collimation screening requirements of substrates with specific aspect ratio holes. The second plate group 200 of this solution has a first plug-in position and a second plug-in position. At the first plug-in position, the filter hole has a first hole area. At the second plug-in position, the filter hole 300 has a second hole area. The first hole area is greater than the second hole area, that is, the present solution can form filter holes 300 of different sizes by adjusting the specific plug-in position between the first plate group 100 and the second plate group 200. Therefore, this solution can adapt to the collimation and filtering requirements of substrates 40 of various sizes, effectively expanding the application range of the collimator 10.

[0055] Reference Figure 2 In some embodiments, the first plate group 100 further includes a fifth plate body 130, and the structure of the fifth plate body 130 may be the same as that of the first plate body 110. The fifth plate body 130 and the second plate body 120 are arranged in a spaced relationship along the first direction X, and the fifth plate body 130 may be disposed on a side of the second plate body 120 away from the first plate body 110. It can be understood that the first plate group 100 may include a plurality of plates, and the specific number of plates may be determined according to actual conditions.

[0056] The second plate group 200 also includes a sixth plate body 230, and the structure of the sixth plate body 230 can be the same as that of the third plate body 210. The sixth plate body 230 and the fourth plate body 220 are arranged at intervals along the second direction Y, and the sixth plate body 230 is arranged on the side of the fourth plate body 220 away from the third plate body 210. Similarly, the second plate group 200 can also include a plurality of plate bodies, and the number of plate bodies of the second plate group 200 can be the same as that of the first plate group 100. Among them, the first plate group 100 can be plugged with the second plate group 200 and jointly enclose a plurality of filter holes 300, and each filter hole 300 is arranged to extend along the vertical direction Z. The collimator 10 of this scheme includes a plurality of filter holes 300, that is, to achieve the screening of coating atoms in a larger area, and to ensure the effect of magnetron sputtering coating.

[0057] Reference Figure 2, the specific plug-in arrangement of the first plate group 100 and the second plate group 200 is introduced below. In some embodiments, the first plate body 110 is provided with a plurality of first slot bodies 111, and each first slot body 111 can be arranged at intervals along the second direction Y. The second plate body 120 is provided with a plurality of second slot bodies 121, and each second slot body 121 can be arranged at intervals along the second direction Y. The third plate body 210 can be plugged into the first slot body 111 and the second slot body 121 at the same time, and the fourth plate body 220 can be plugged into the first slot body 111 and the second slot body 121 at the same time, that is, the first plate body 110, the second plate body 120, the third plate body 210 and the fourth plate body 220 can be connected to each other and form the filter hole 300 together. This solution can ensure the stability of the connection between the first plate group 100 and the second plate group 200, and the second plate group 200 can switch to penetrate different first slots 111 and second slots 121 along the second direction Y, so as to adjust the size of the filter hole 300 along the second direction Y to adapt to the collimation filtering requirements of substrates 40 of various sizes.

[0058] Reference Figure 2 Further, in some embodiments, the third plate 210 may be provided with a plurality of third slots 211, and each third slot 211 may be arranged at intervals along the first direction X. The fourth plate 220 may be provided with a plurality of fourth slots 221, and each fourth slot 221 may be arranged at intervals along the first direction X. The first plate 110 of this solution may be plugged into the third slot 211 and the fourth slot 221, and the second plate 120 may be plugged into the third slot 211 and the fourth slot 221, that is, the plugging stability between the first plate group 100 and the second plate group 200 may be improved, and the first plate group 100 may be switched to penetrate different third slots 211 and fourth slots 221 along the first direction X, that is, the size of the filter hole 300 along the first direction X may be adjusted to meet the collimation filtering requirements of substrates 40 of various sizes.

[0059] It should be noted that in other embodiments, the plurality of first slots 111 of the first plate body 110 can be interpenetrated with the third slot body 211 and the fourth slot body 221, and the plurality of second slots 121 of the second plate body 120 can be interpenetrated with the third slot body 211 and the fourth slot body 221. This solution can increase the penetration depth between the two plate groups, thereby adjusting the hole depth of the filter hole 300, so as to adapt to different collimation filtering requirements. In other embodiments, the first plate group 100 and the second plate group 200 of different heights can also be replaced to adjust the hole depth of the filter hole 300.

[0060] Reference Figure 2 and Figure 3In some embodiments, the collimator 10 includes a plurality of frame groups 400. Some embodiments of the present application are described by taking two frame groups 400 as an example. Each frame group 400 includes a first frame 410 and a second frame 420. The structure of the second frame 420 may be the same as that of the first frame 410. Each first frame 410 has a first end 411 and a second end 412 opposite to each other, and the second frame 420 has a third end 421 and a fourth end 422 opposite to each other. The first end 411 may be connected to the third end 421 of the same frame group 400, and the second end 412 may be connected to the fourth end 422 of the adjacent frame group 400. Each frame group 400 is enclosed together to form a ring structure. Further, the ring structure may be square.

[0061] One end of the first plate group 100 can be connected to a first frame 410, and the other end can be connected to another first frame 410, that is, the first plate body 110 and the second plate body 120 can each be connected to two first frames 410 at both ends along the extension direction thereof. One end of the second plate group 200 can be connected to a second frame 420, and the other end can be connected to another second frame 420, that is, the third plate body 210 and the fourth plate body 220 can each be connected to two second frames 420 at both ends along the extension direction thereof. By providing a frame, this solution can not only improve the stability of the connection between the two plate groups, but also facilitate the assembly and disassembly of the two plate groups and the magnetron sputtering device body.

[0062] Reference Figure 2 , Figure 4 and Figure 5 , the specific connection settings between the first plate group 100 and the second plate group 200 and the frame are described below. In some embodiments, each first frame 410 is provided with a first slot 413, and the first plate group 100 is provided with a first connecting portion 140 at the end along its extension direction. Specifically, the first plate body 110 and the second plate body 120 can each be provided with a first connecting portion 140 at the end along its extension direction. Along the vertical direction Z, the first connecting portion 140 can be inserted with a first slot 413. Each second frame 420 is provided with a second slot 423, and the second plate group 200 is provided with a second connecting portion 240 at the end along its extension direction. Specifically, the third plate body 210 and the fourth plate body 220 can each be provided with a second connecting portion 240 at the end along its extension direction. Along the vertical direction Z, the second connecting portion 240 can be inserted with a second slot 423. This solution can effectively improve the reliability of the connection between the frame and each plate group by making each connecting portion penetrate each slot, and can ensure the stability of the structure of each filter hole 300.

[0063] Reference Figure 5In some embodiments, the annular structure has a sink 430. The first connection portion 140 may be provided with a first protrusion 141, and the second connection portion 240 may be provided with a second protrusion 241. In the vertical direction Z, both the first protrusion 141 and the second protrusion 241 may abut against the sink 430, that is, the sink 430 can limit each first connection portion 140 to ensure the penetration accuracy between each connection portion and the card slot.

[0064] In some embodiments, not shown in the drawings, the collimator 10 further includes a third plate group. The third plate group is disposed on the side of the second plate group 200 away from the first plate group 100. The third plate group can be arranged relative to the second plate group 200 along the vertical Z. Specifically, the third plate group includes a seventh plate body and an eighth plate body arranged at intervals along the first direction X. The structure of the third plate group can be the same as that of the first plate group 100. The third plate group of this solution is plugged into the second plate group 200, the second plate group 200 is plugged into the first plate group 100, and the filter hole 300 is enclosed together, that is, the hole depth of the filter hole 300 can be effectively increased, and the collimation and filtering requirements of substrates 40 of various specifications can be adapted. It can be understood that the plug-in setting between the third plate group and the second plate group 200 can be the same as the plug-in setting between the second plate group 200 and the first plate group 100. It should be noted that the collimator 10 can also be provided with a fourth plate group, a fifth plate group, etc., and the specific number of plate groups can be determined according to the actual situation.

[0065] Reference Figure 2 In some embodiments, the first plate body 110 and the second plate body 120 in the first plate group 100 have the same structure, and the materials of the first plate body 110 and the second plate body 120 are both sheet metal materials. In other embodiments, the third plate body 210 and the fourth plate body 220 in the second plate group 200 have the same structure, and the materials of the third plate body 210 and the fourth plate body 220 are both sheet metal materials. Therefore, the grooves of each plate body in this solution can be processed by laser or wire cutting, etc., which is low-cost and convenient to process compared with the solution of opening through holes by machining.

[0066] Reference Figure 1 The second aspect of the utility model proposes a magnetron sputtering device 1, including the collimator 10 of the above embodiment. This solution can adapt to the collimation and filtering requirements of substrates 40 of various sizes, has a wide range of applications, and can ensure the magnetron sputtering effect. The working process of the magnetron sputtering device 1 of an embodiment is introduced below. The magnetron 30 can generate a magnetic field to control and orient the sputtering target 20. When coating a substrate 40 with deep holes, the substrate 40 can be placed on a carrier 50, and the collimator 10 can filter out the coating atoms that are inclined to the surface of the substrate 40, so that other coating atoms run from the target 20 to the surface of the substrate 40 in a direction approximately perpendicular to the surface of the substrate 40. The magnetic field generated by the upper coil 60 and the lower coil 70 can correct the ions of the target 20, thereby ensuring the coating effect.

[0067] It should be noted that if the embodiments of the present invention involve directional indications (such as up, down, left, right, front, back...), the directional indications are only used to explain the relative position relationship, movement status, etc. between the components in a certain specific posture. If the specific posture changes, the directional indications will also change accordingly.

[0068] In addition, if there are descriptions involving "first", "second", etc. in the embodiments of the utility model, the descriptions of "first", "second", etc. are only used for descriptive purposes and cannot be understood as indicating or implying their relative importance or implicitly indicating the number of technical features indicated. Therefore, the features limited to "first" and "second" may explicitly or implicitly include at least one of the features. In addition, if "and / or", "and / or" or "and / or" appears in the full text, its meaning includes three parallel schemes. Taking "A and / or B" as an example, it includes scheme A, or scheme B, or a scheme that satisfies both A and B. In addition, the technical solutions between the various embodiments can be combined with each other, but it must be based on the ability of ordinary technicians in this field to implement. When the combination of technical solutions is contradictory or cannot be implemented, it should be deemed that such a combination of technical solutions does not exist and is not within the scope of protection required by the utility model.

[0069] The above are only preferred embodiments of the present invention, and do not limit the patent scope of the present invention. All equivalent structural changes made by using the contents of the present invention specification and drawings under the utility model concept, or directly / indirectly used in other related technical fields are included in the patent protection scope of the present invention.

Claims

1. A collimator for a magnetron sputtering device, characterized in that: The collimator comprises: A first plate group, comprising a first plate body and a second plate body arranged at intervals along a first direction; a second plate group, arranged opposite to the first plate group in a vertical direction, the second plate group comprising a third plate body and a fourth plate body arranged at intervals along a second direction, the second direction intersecting the first direction, and the second direction and the first direction both being perpendicular to the vertical direction; Among them, the first plate group and the second plate group are plugged into each other to jointly enclose a filter hole, and the filter hole extends along the vertical direction. The second plate group is configured to have a first plug-in position and a second plug-in position. At the first plug-in position, the filter hole has a first hole area, and at the second plug-in position, the filter hole has a second hole area, and the first hole area is larger than the second hole area.

2. The collimator according to claim 1, characterized in that The first plate group includes a fifth plate body, the fifth plate body and the second plate body are arranged in the first direction at intervals, and the fifth plate body is arranged on a side of the second plate body away from the first plate body; The second plate group includes a sixth plate body, the sixth plate body is arranged with a gap from the fourth plate body along the second direction, and the sixth plate body is arranged on a side of the fourth plate body away from the third plate body; The first plate group and the second plate group are plugged together to enclose a plurality of filter holes, and each of the filter holes extends along the vertical direction.

3. The collimator according to claim 1, characterized in that The first plate body is provided with a plurality of first slots, each of which is arranged at intervals along the second direction; the second plate body is provided with a plurality of second slots, each of which is arranged at intervals along the second direction; The third plate body is inserted into the first slot body and the second slot body, and the fourth plate body is inserted into the first slot body and the second slot body.

4. The collimator according to claim 3, characterized in that The third plate body is provided with a plurality of third slots, each of which is arranged at intervals along the first direction; the fourth plate body is provided with a plurality of fourth slots, each of which is arranged at intervals along the first direction; The first plate body is plugged into the third slot body and the fourth slot body, and the second plate body is plugged into the third slot body and the fourth slot body.

5. The collimator according to claim 3, characterized in that The collimator comprises a plurality of frame groups, each of the frame groups comprises a first frame and a second frame, each of the first frames has a first end and a second end opposite to each other, each of the second frames has a third end and a fourth end opposite to each other, wherein the first end is connected to the third end of the same frame group, the second end is connected to the fourth end of the adjacent frame group, and each of the frame groups is enclosed together to form a ring structure; One end of the first plate group is connected to one of the first frames, and the other end is connected to another of the first frames; one end of the second plate group is connected to one of the second frames, and the other end is connected to another of the second frames.

6. The collimator according to claim 5, characterized in that Each of the first frames is provided with a first card slot, and the first plate group is provided with a first connecting portion at the end along the extension direction thereof, and along the vertical direction, the first connecting portion is inserted into the first card slot; Each of the second frames is provided with a second card slot, and the end of the second plate group along the extension direction thereof is provided with a second connecting portion, and along the vertical direction, the second connecting portion is inserted into the second card slot.

7. The collimator according to claim 6, characterized in that The annular structure has a sinking platform, the first connecting portion is provided with a first protrusion, and the second connecting portion is provided with a second protrusion. Along the vertical direction, the first protrusion and the second protrusion both abut against the sinking platform.

8. The collimator according to claim 1, characterized in that The collimator further includes a third plate group, the third plate group is arranged on a side of the second plate group away from the first plate group, the third plate group and the second plate group are arranged opposite to each other along the vertical direction, and the third plate group includes a seventh plate body and an eighth plate body arranged at intervals along the first direction; The third plate group is plugged into the second plate group, and the second plate group is plugged into the first plate group to jointly enclose the filter hole.

9. The collimator according to claim 1, characterized in that The first plate body and the second plate body in the first plate group have the same structure, and the materials of the first plate body and the second plate body are both sheet metal materials; and / or, The third plate body and the fourth plate body in the second plate group have the same structure, and the materials of the third plate body and the fourth plate body are both sheet metal materials.

10. Magnetron sputtering equipment, characterized in that Comprising a collimator as described in any one of claims 1-9.

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