Wafer position detection and correction device
By designing a wafer position detection and proofreading device combining electric push rods, vision detectors and multiple mechanical structures, the problems of low efficiency and insufficient accuracy of traditional methods are solved, and efficient and accurate detection and clamping of wafers of different sizes are achieved, which improves detection accuracy and applicability.
Patent Information
- Application Number
- CN202421641883.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-07-11
- Publication Date
- 2025-04-18
- Estimated Expiration
- 2034-07-11
AI Technical Summary
The traditional wafer position detection and proofreading method has low efficiency, insufficient accuracy and complex operation, making it difficult to meet the detection requirements of large-size wafers and small-sized grain sizes.
A wafer position detection and proofreading device is designed, using an electric push rod to drive a vision detector, combining slide rails, racks, mounting blocks, moving blocks, telescopic rods and elastic clamping plates to achieve accurate detection and clamping limits for wafers of different sizes. Through the meshing and self-locking functions of the worm gear, the position of the elastic clamping plate is adjusted to ensure stable clamping of the wafer.
It improves the accuracy and efficiency of wafer position detection, is suitable for wafers of different sizes, enhances the applicability and working efficiency of the device, and ensures the clamping and fixing quality of the wafer.
Smart Images
Figure CN222775283U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of wafer detection equipment, in particular to a wafer position detection and calibration device. Background Art
[0002] In the field of semiconductor manufacturing, wafers are core materials, and the accuracy and stability of their position have a vital impact on manufacturing quality and efficiency. With the continuous advancement of semiconductor technology, the diameter of wafers continues to increase, while the grain size continues to decrease, which puts higher requirements on wafer position detection and calibration technology.
[0003] Traditional wafer position detection and calibration methods mostly use manual or semi-automatic methods, which have problems such as low efficiency, insufficient precision and complex operation. Especially when the wafer size varies greatly and the grain size is small, traditional detection and calibration methods can no longer meet production needs. Utility Model Content
[0004] The purpose of the utility model is to provide a wafer position detection and calibration device to solve the problems raised in the above background technology.
[0005] In order to achieve the above purpose, the utility model provides the following technical solutions:
[0006] A wafer position detection and correction device comprises a base plate, a mounting frame is arranged on the rear side of the top of the base plate, an electric push rod is arranged on the mounting frame, a visual detector is arranged at the end of the telescopic arm at the bottom of the electric push rod, a mounting seat is also arranged on the top of the base plate, a cavity is arranged above the inside of the mounting seat, two front and rear slide rails are arranged on the cavity wall below the cavity, a rack is slidably arranged on the slide rail, a mounting block is arranged on the top of the rack, a moving block is arranged on the mounting block, a plurality of telescopic rods are evenly arranged on the inner wall of the moving block, an elastic clamping plate is arranged at the end of the telescopic arm of the telescopic rod, a driving gear is also arranged in the cavity through a mounting shaft, and the driving gear is meshed with the front and rear racks.
[0007] As a further solution of the utility model: an installation cavity is also provided inside the mounting seat below the cavity, a rotating shaft is rotatably provided in the installation cavity, a second bevel gear is provided on the rotating shaft via a key connection, a first bevel gear is also provided on the installation shaft inside the installation cavity via a key connection, and the first bevel gear and the second bevel gear are meshed with each other.
[0008] As a further solution of the utility model: a worm wheel is also provided on the rotating shaft through a key connection, a worm is rotatably provided on the mounting seat, and the worm and the worm wheel are meshed with each other.
[0009] As a further solution of the utility model: a limiting block is arranged at the bottom of the moving block, a sliding groove is arranged on the mounting seat, and the limiting block is slidably connected to the sliding groove.
[0010] As a further solution of the utility model: a rotary handle is arranged at the front end of the worm.
[0011] As a further solution of the present invention: the installation shaft passes through the installation cavity and extends into the interior of the installation cavity.
[0012] Compared with the prior art, the beneficial effects of the present invention are as follows:
[0013] 1. The electric push rod drives the visual detector to move, which can realize accurate detection of the wafer position, thereby improving the detection accuracy. At the same time, under the action of the slide rail, rack, mounting block and moving block, the telescopic rod and elastic clamping plate are used to realize the clamping limit of wafers of different sizes, further improving the applicability and working efficiency of the device;
[0014] 2. The device can realize the adjustment function of the elastic clamping plate by rotating the worm and the worm wheel to engage with each other. Since the worm wheel and the worm have a self-locking function, the position of the elastic clamping plate after adjustment can be limited, ensuring the clamping and fixing quality of the wafer. BRIEF DESCRIPTION OF THE DRAWINGS
[0015] Figure 1 It is a schematic structural diagram of an embodiment of the utility model.
[0016] Figure 2 It is a schematic diagram of the structure inside the cavity in the embodiment of the utility model.
[0017] Figure 3 It is a schematic diagram of the structure inside the installation cavity in the embodiment of the utility model.
[0018] Notes on the accompanying drawings: 1. Base plate; 2. Mounting frame; 3. Electric push rod; 4. Visual detector; 5. Mounting seat; 6. Slide rail; 7. Rack; 8. Mounting block; 9. Moving block; 901. Limit block; 10. Telescopic rod; 11. Elastic clamping plate; 12. Driving gear; 13. Mounting shaft; 14. Rotating shaft; 15. First bevel gear; 16. Second bevel gear; 17. Worm gear; 18. Worm; 1801. Rotary handle. DETAILED DESCRIPTION
[0019] The following embodiments will be combined with the accompanying drawings to describe the utility model in detail. In the drawings or descriptions, similar or identical parts use the same reference numerals, and in actual applications, the shape, thickness or height of each component can be enlarged or reduced. The various embodiments listed in the utility model are only used to illustrate the utility model, and are not used to limit the scope of the utility model. Any obvious modifications or changes made to the utility model do not depart from the spirit and scope of the utility model.
[0020] Example
[0021] See also Figures 1 to 3 In an embodiment of the utility model, a wafer position detection and correction device includes a base plate 1, a mounting frame 2 is arranged on the top rear side of the base plate 1, an electric push rod 3 is arranged on the mounting frame 2, and a visual detector 4 is arranged at the end of the telescopic arm at the bottom of the electric push rod 3. At this time, under the action of the electric push rod 3, the visual detector 4 can be driven to move, so that the visual detector 4 can better detect and correct the wafer position, thereby ensuring the use efficiency of the detection and correction quality.
[0022] A mounting seat 5 is also provided on the top of the base plate 1, a cavity is provided above the inside of the mounting seat 5, and two front and rear slide rails 6 are provided on the cavity wall below the cavity, a rack 7 is slidably provided on the slide rail 6, a mounting block 8 is provided on the top of the rack 7, and a moving block 9 is provided on the mounting block 8. At this time, under the action of the front and rear racks 7, the left and right moving blocks 9 can be driven to move closer or farther away, and a number of telescopic rods 10 are also evenly provided on the inner wall of the moving block 9, and an elastic clamping plate 11 is provided at the end of the telescopic arm of the telescopic rod 10. At this time, the spacing can be adjusted under the action of the left and right moving blocks 9, and used in conjunction with the elastic clamping plate 11 and the telescopic rod 10, so that the device can meet the clamping limit for wafers of different sizes, thereby ensuring the efficiency and quality of wafer detection by the visual detector 4, and at the same time because it can meet the clamping and fixation for wafers of different sizes, thereby to a certain extent, the applicability of the device is improved.
[0023] A limit block 901 is provided at the bottom of the moving block 9, and a slide groove is provided on the mounting seat 5. The limit block 901 is slidably connected to the slide groove. At this time, under the action of the limit block 901 and the slide groove, the movement efficiency of the moving block 9 is guaranteed.
[0024] A driving gear 12 is also provided in the cavity through the mounting shaft 13, and the driving gear 12 is meshed with the front and rear racks 7. At this time, rotating the mounting shaft 13 can drive the front and rear racks 7 to move through the driving gear 12, so that the elastic clamping plate 11 can better clamp and fix the wafer.
[0025] The mounting seat 5 is provided with a mounting cavity below the cavity, in which a rotating shaft 14 is rotatably provided, and a second bevel gear 16 is provided on the rotating shaft 14 through a key connection. The mounting shaft 13 passes through the mounting cavity and extends into the mounting cavity. A first bevel gear 15 is provided on the mounting shaft 13 inside the mounting cavity through a key connection. The first bevel gear 15 and the second bevel gear 16 are meshed with each other. At this time, rotating the rotating shaft 14 can drive the driving gear 12 to rotate through the second bevel gear 16 and the first bevel gear 15, thereby adjusting the distance between the left and right elastic clamping plates 11, so that the elastic clamping plates 11 can better clamp the wafer.
[0026] A worm gear 17 is also provided on the rotating shaft 14 through a key connection, and a worm 18 is rotatably provided on the mounting seat 5. The worm 18 and the worm gear 17 are meshed with each other. At this time, rotating the worm gear 18 can drive the rotating shaft 14 to rotate through the worm gear 17. In addition, because the worm gear 17 and the worm gear 18 have a self-locking function, the adjusted position of the elastic clamping plate 11 can be limited, thereby ensuring the clamping and fixing quality of the elastic clamping plate 11 for the wafer. A rotary handle 1801 is provided at the front end of the worm gear 18, and the worm 18 can be driven to rotate by rotating the rotary handle 1801, thereby realizing the function of using the moving block 9 to drive the elastic clamping plate 11 to move, and then adjusting the elastic clamping plate 11, thereby better clamping and fixing the wafer, and ensuring the use efficiency of the device.
[0027] In actual use, the staff rotates the handle 1801 to drive the worm 18 to rotate, and the meshing of the worm 18 and the worm wheel 17 causes the rotating shaft 14 to rotate. The second bevel gear 16 on the rotating shaft 14 drives the first bevel gear 15 and the driving gear 12 on the mounting shaft 13 to rotate, and the driving gear 12 then drives the front and rear racks 7 to slide on the slide rail 6, driving the mounting block 8 and the moving block 9 to move, and adjusting the spacing between the left and right elastic clamping plates 11. The limit block 901 at the bottom of the moving block 9 slides in the slide groove to ensure that the moving block 9 moves stably. The elastic clamping plate 11 is adjusted by the telescopic rod 10 to adapt to wafers of different sizes, and the self-locking function of the worm wheel 17 and the worm 18 ensures that the wafer is stably clamped. At this time, the electric push rod 3 is used to drive the visual detector 4 to move downward, so that the visual detector 4 can perform efficient and accurate detection and calibration.
[0028] It is obvious to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above, and that the present invention can be implemented in other specific forms without departing from the spirit or essential features of the present invention. Therefore, the embodiments should be regarded as exemplary and non-restrictive from any point of view, and the scope of the present invention is defined by the appended claims rather than the above description, and it is intended that all changes falling within the meaning and scope of the equivalent elements of the claims be included in the present invention. Any reference numeral in a claim should not be regarded as limiting the claim to which it relates.
[0029] In addition, it should be understood that although the present specification is described according to implementation modes, not every implementation mode contains only one independent technical solution. This description of the specification is only for the sake of clarity. Those skilled in the art should regard the specification as a whole. The technical solutions in each embodiment may also be appropriately combined to form other implementation modes that can be understood by those skilled in the art.
Claims
1. A wafer position detection and calibration device, comprising a base plate (1), characterized in that: A mounting frame (2) is arranged at the rear side of the top of the base plate (1), an electric push rod (3) is arranged on the mounting frame (2), and a visual detector (4) is arranged at the end of the telescopic arm at the bottom of the electric push rod (3). A mounting seat (5) is also arranged at the top of the base plate (1), a cavity is arranged above the mounting seat (5), two front and rear slide rails (6) are arranged on the cavity wall below the cavity, a rack (7) is slidably arranged on the slide rail (6), a mounting block (8) is arranged at the top of the rack (7), a moving block (9) is arranged on the mounting block (8), a plurality of telescopic rods (10) are evenly arranged on the inner wall of the moving block (9), and an elastic clamping plate (11) is arranged at the end of the telescopic arm of the telescopic rod (10), and a driving gear (12) is also arranged in the cavity through a mounting shaft (13), and the driving gear (12) and the front and rear racks (7) are meshed with each other.
2. The wafer position detection and calibration device according to claim 1, characterized in that: The mounting seat (5) is provided with a mounting cavity located below the cavity, a rotating shaft (14) is rotatably provided in the mounting cavity, a second bevel gear (16) is provided on the rotating shaft (14) via a key connection, and a first bevel gear (15) is provided on the mounting shaft (13) located inside the mounting cavity via a key connection, the first bevel gear (15) and the second bevel gear (16) are meshed with each other.
3. The wafer position detection and calibration device according to claim 2, characterized in that: A worm wheel (17) is also provided on the rotating shaft (14) through a key connection, and a worm (18) is rotatably provided on the mounting seat (5), and the worm (18) and the worm wheel (17) are meshed with each other.
4. The wafer position detection and calibration device according to claim 1, characterized in that: A limiting block (901) is arranged at the bottom of the moving block (9), a sliding groove is arranged on the mounting seat (5), and the limiting block (901) is slidably connected to the sliding groove.
5. The wafer position detection and calibration device according to claim 3, characterized in that: The front end of the worm (18) is provided with a rotating handle (1801).
6. The wafer position detection and calibration device according to claim 2, characterized in that: The installation shaft (13) passes through the installation cavity and extends into the interior of the installation cavity.