CVD (Chemical Vapor Deposition) material rack

By designing a CVD chemical vapor deposition material rack including U-frame, moving block, insertion rod, placement disk, limit disk and anti-slip mechanism, the problem that existing material racks cannot flexibly add or reduce the placement disk and adjust the spacing, achieving more flexible and safe operation.

CN223033451UActive Publication Date: 2025-06-27ADVANCED NANO COATING TECH CO LTD
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Patent Information

Application Number
CN202422116457.0
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-08-29
Publication Date
2025-06-27
Estimated Expiration
2034-08-29

AI Technical Summary

Technical Problem

The existing CVD chemical vapor deposition material racks cannot be freely added or reduced according to their use, and cannot adjust the spacing between the placing plates. At the same time, the placing plate temperature is high and easy to slip.

Method used

A material rack including a U-shaped frame, a moving block, a plug rod, a placement disc, a limit disc and an anti-slip mechanism is designed. Through the coordination of the slot and the guide groove, the flexible addition and adjustment of the placement disc is achieved; the limit disc and an anti-slip mark avoid the slippage of the placement disc.

Benefits of technology

The free addition or reduction of the number of placed disks according to usage conditions and the adjustment of the spacing between placed disks is achieved, which improves the flexibility and safety of operation and avoids the risk of slippage of placed disks.

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Abstract

The utility model provides a CVD (chemical vapor deposition) material rack which comprises a U-shaped rack, a moving block is slidably connected to the U-shaped rack, an inserting rod is fixedly mounted at the top of the moving block, a placing disc is inserted into the inserting rod, a limiting disc is fixedly mounted at the top of the placing disc, and a placing base plate is integrally formed at the top of the limiting disc; four supporting rods are hinged to the front face and the back face of the U-shaped frame correspondingly, extension plates are fixedly installed on the side walls of the four supporting rods correspondingly, and an anti-skid mechanism is arranged on the outer wall of the containing disc. According to the material shelf, the number of the containing discs can be freely increased or decreased according to the use condition, the distance between the containing discs can be adjusted, and in addition, the problem that when the containing discs are taken down through pliers, the containing discs may slip off from the pliers due to negligence of workers is effectively avoided.
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Description

Technical Field

[0001] The utility model relates to the field of chemical vapor deposition, and more specifically, to a CVD chemical vapor deposition material rack. Background Art

[0002] Chemical vapor deposition is a chemical engineering technology, which mainly uses one or several gaseous compounds or simple substances containing thin film elements to generate a thin film on the surface of a substrate through a chemical reaction. Chemical vapor deposition is a new technology for preparing inorganic materials developed in recent decades. The chemical vapor deposition method has been widely used for purifying substances, developing new crystals, depositing various single crystals, polycrystals or glassy inorganic thin film materials.

[0003] When performing chemical vapor deposition, materials need to be placed on a placement tray. On the existing material rack, the placement tray is fixedly arranged, and the number of placement trays cannot be freely increased or decreased according to the usage situation, nor can the distance between the placement trays be adjusted. In addition, after chemical vapor deposition, the temperature of the placement tray is relatively high, and pliers are needed to remove the placement tray. However, the placement tray may slip out of the pliers due to the negligence of the staff, which is not convenient to use.

[0004] Therefore, we make improvements and propose a CVD chemical vapor deposition material rack. Content of the Utility Model

[0005] The purpose of the utility model is to address the current situation where the placement tray on the existing material rack is fixedly arranged, the number of placement trays cannot be freely increased or decreased according to the usage situation, nor can the distance between the placement trays be adjusted. In addition, after chemical vapor deposition, the temperature of the placement tray is relatively high, and pliers are needed to remove the placement tray. However, the placement tray may slip out of the pliers due to the negligence of the staff, which is not convenient to use.

[0006] In order to achieve the above-mentioned utility model purpose, the utility model provides the following technical solutions:

[0007] A CVD chemical vapor deposition material rack is provided to improve the above problems.

[0008] Specifically, this application is as follows:

[0009] It includes a U-shaped frame, a moving block is slidably connected to the U-shaped frame, a plug rod is fixedly installed on the top of the moving block, a placement tray is inserted on the plug rod, a limiting disk is fixedly installed on the top of the placement tray, a placement backing plate is integrally formed on the top of the limiting disk, support rods are hinged to both the front and back of the U-shaped frame, the number of the support rods is four, extension plates are fixedly installed on the side walls of all four support rods, and an anti-slip mechanism is arranged on the outer wall of the placement tray.

[0010] As a preferred technical solution of this application, a slot is opened at the bottom of the placement tray, and the slot is matched with the plug rod.

[0011] As a preferred technical solution of the present application, an inner guiding groove is provided at the port of the slot.

[0012] As a preferred technical solution of the present application, an outer guiding groove is provided at the top of the plug rod.

[0013] As a preferred technical solution of the present application, a sliding groove is provided on the U-shaped frame, a sliding block is fixedly installed at the bottom of the moving block, and the sliding block is matched with the sliding groove.

[0014] As a preferred technical solution of the present application, the anti-slip mechanism includes anti-slip lines provided on the outer wall of the placement plate.

[0015] Compared with the prior art, the beneficial effects of the present utility model are as follows:

[0016] In the solution of the present application:

[0017] 1. By aligning the slot at the bottom of the placement plate with the plug rod, the plug rod is inserted into the slot. Through the inner guiding groove provided at the port of the slot and the outer guiding groove provided at the top of the plug rod, it is more convenient to insert the plug rod into the slot. By pulling the moving block, the moving block drives the sliding block to slide along the sliding groove, the moving block drives the placement plate at the top to move, the placement plate drives the limiting plate at the top, the limiting plate drives the placement cushion plate to move, and the placement cushion plate drives the material, realizing that the material rack can freely add or reduce the number of placement plates according to the usage situation, and adjust the distance between the placement plates, solving the problem that the number of placement plates cannot be freely added or reduced according to the usage situation, and the distance between the placement plates cannot be adjusted;

[0018] 2. Through the provided limiting plate and anti-slip lines, the problem that the placement plate may slip out of the pliers due to the negligence of the staff when using the pliers to remove the placement plate is effectively avoided. Description of the Drawings

[0019] Figure 1 It is a schematic structural diagram of the CVD chemical vapor deposition material rack provided by the present application;

[0020] Figure 2 It is a schematic structural diagram of the CVD chemical vapor deposition material rack provided by the present application;

[0021] Figure 3 It is a schematic structural diagram of the bottom of the placement plate of the CVD chemical vapor deposition material rack provided by the present application;

[0022] Figure 4 It is a schematic structural diagram of the sliding block of the CVD chemical vapor deposition material rack provided by the present application.

[0023] Labels in the figure:

[0024] 1. U-shaped frame; 2. Moving block; 3. Placing plate; 4. Limiting plate; 5. Placing cushion plate; 6. Support rod; 7. Insert rod; 8. Insert slot; 9. Outer guiding groove; 10. Inner guiding groove; 11. Anti-slip pattern; 12. Sliding groove; 13. Slider; 14. Extension plate. Detailed implementation manners

[0025] To make the objectives, technical solutions and advantages of the embodiments of the present utility model clearer, the technical solutions in the embodiments of the present utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all of the embodiments.

[0026] Therefore, the following detailed description of the embodiments of the present utility model is not intended to limit the scope of the claimed present utility model, but merely represents some embodiments of the present utility model. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present utility model without creative efforts fall within the scope of protection of the present utility model.

[0027] It should be noted that, without conflict, the embodiments in the present utility model and the features and technical solutions in the embodiments may be combined with each other.

[0028] It should be noted that like reference numerals and letters denote like items in the following drawings. Therefore, once an item is defined in one drawing, it does not need to be further defined and explained in subsequent drawings.

[0029] In the description of the present utility model, it should be noted that the orientation or positional relationship indicated by the terms "upper", "lower", etc. is based on the orientation or positional relationship shown in the drawings, or the orientation or positional relationship in which the inventive product is usually placed during use, or the orientation or positional relationship commonly understood by those skilled in the art. Such terms are only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as limiting the present utility model. In addition, the terms "first", "second", etc. are only used for descriptive distinction and cannot be construed as indicating or implying relative importance.

[0030] Embodiment:

[0031] As Figures 1-4As shown in the figure, this embodiment proposes a CVD chemical vapor deposition material rack, which includes a U-shaped rack 1. A moving block 2 is slidably connected to the U-shaped rack 1. A plug rod 7 is fixedly installed on the top of the moving block 2. A placement tray 3 is inserted on the plug rod 7. A limiting disk 4 is fixedly installed on the top of the placement tray 3. A placement backing plate 5 is integrally formed on the top of the limiting disk 4. Support rods 6 are hinged on both the front and back of the U-shaped rack 1. The number of support rods 6 is four. Extension plates 14 are fixedly installed on the side walls of the four support rods 6. An anti-slip mechanism is arranged on the outer wall of the placement tray 3. The material rack of this application can freely add or reduce the number of placement trays 3 according to the usage situation, and adjust the spacing between the placement trays 3. In addition, it can effectively avoid the problem that when using pliers to remove the placement tray 3, it may slip out of the pliers due to the negligence of the staff.

[0032] To facilitate the removal of the placement tray 3, a slot 8 is opened at the bottom of the placement tray 3. The slot 8 is matched with the plug rod 7. Align the slot 8 at the bottom of the placement tray 3 with the plug rod 7 so that the plug rod 7 enters the slot 8.

[0033] To facilitate the insertion of the plug rod 7 into the slot 8, an inner guiding groove 10 is opened at the port of the slot 8, and an outer guiding groove 9 is opened at the top of the plug rod 7. By opening the inner guiding groove 10 at the port of the slot 8 and the outer guiding groove 9 at the top of the plug rod 7, it is more convenient to insert the plug rod 7 into the slot 8.

[0034] To facilitate the adjustment of the spacing between the placement trays 3, a sliding groove 12 is opened on the U-shaped rack 1. A slider 13 is fixedly installed at the bottom of the moving block 2. The slider 13 is matched with the sliding groove 12. Pull the moving block 2, and the moving block 2 drives the slider 13 to slide along the sliding groove 12. The moving block 2 drives the placement tray 3 at the top to move. The placement tray 3 drives the limiting disk 4 at the top, the limiting disk 4 drives the placement backing plate 5 to move, and the placement backing plate 5 drives the material.

[0035] To prevent the placement tray 3 from falling off the pliers when it is taken out, the anti-slip mechanism includes anti-slip lines 11 opened on the outer wall of the placement tray 3.

[0036] Specifically, when this CVD chemical vapor deposition material rack is in use: freely add the number of placement trays 3 according to the usage situation. Align the slot 8 at the bottom of the placement tray 3 with the plug rod 7 so that the plug rod 7 enters the slot 8. By opening the inner guiding groove 10 at the port of the slot 8 and the outer guiding groove 9 at the top of the plug rod 7, it is more convenient to insert the plug rod 7 into the slot 8;

[0037] The spacing between each placement tray 3 can be adjusted according to the size of the material placed on the placement backing plate 5. Pull the moving block 2, and the moving block 2 drives the slider 13 to slide along the sliding groove 12. The moving block 2 drives the placement tray 3 at the top to move. The placement tray 3 drives the limiting disk 4 at the top, the limiting disk 4 drives the placement backing plate 5 to move, and the placement backing plate 5 drives the material;

[0038] When taking out after chemical vapor deposition is completed, use pliers to clamp the placement tray 3. The anti-slip pattern 11 on the outer wall of the placement tray 3 can prevent the pliers from slipping. In addition, when the pliers clamp the placement tray 3, the limit disk 4 on the placement tray 3 can also effectively prevent the pliers from falling off.

[0039] All technical features in this embodiment can be freely combined according to actual needs.

[0040] The above embodiment is a preferred implementation scheme of the present utility model. In addition, the present utility model can also be implemented in other ways. Any obvious replacement without departing from the concept of the technical solution is within the protection scope of the present utility model.

Claims

1. A CVD chemical vapor deposition material rack, comprising a U-shaped rack (1), characterized in that: The U-shaped frame (1) is slidably connected with a moving block (2), a plug rod (7) is fixedly installed on the top of the moving block (2), a placement plate (3) is inserted on the plug rod (7), a limit plate (4) is fixedly installed on the top of the placement plate (3), and a placement pad (5) is integrally formed on the top of the limit plate (4), the front and back of the U-shaped frame (1) are hinged with support rods (6), the number of the support rods (6) is four, and the side walls of the four support rods (6) are fixedly installed with extension plates (14), and the outer wall of the placement plate (3) is provided with an anti-slip mechanism.

2. The CVD chemical vapor deposition material rack according to claim 1, characterized in that: A slot (8) is provided at the bottom of the placement plate (3), and the slot (8) matches the insertion rod (7).

3. The CVD chemical vapor deposition material rack according to claim 2, characterized in that: An inner guide groove (10) is provided at the end of the slot (8).

4. The CVD chemical vapor deposition material rack according to claim 2, characterized in that: An outer guide groove (9) is formed on the top of the insertion rod (7).

5. The CVD chemical vapor deposition material rack according to claim 1, characterized in that: The U-shaped frame (1) is provided with a slide groove (12), and a slider (13) is fixedly installed at the bottom of the moving block (2), and the slider (13) cooperates with the slide groove (12).

6. The CVD chemical vapor deposition material rack according to claim 1, characterized in that: The anti-skid mechanism comprises anti-skid patterns (11) formed on the outer wall of the placement plate (3).