Graphite piece and ion implanter
By designing the graphite parts as a two-half structure and combining the inclined guide structure, the problem of removing adjacent parts when replacing the graphite parts is solved, rapid disassembly and assembly are achieved, and the operation efficiency of the ion implanter is improved.
Patent Information
- Application Number
- CN202421900033.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-07
- Publication Date
- 2025-07-01
- Estimated Expiration
- 2034-08-07
AI Technical Summary
When replacing existing graphite parts in an ion implanter, adjacent parts need to be removed, resulting in extended maintenance and machine return time, affecting efficiency.
A graphite piece is designed to consist of the first and second graphite half pieces. By setting half grooves on the bonding surface to form a through-process through hole, and adopting a bevel guide structure, the radial disassembly and assembly of the graphite piece is realized to avoid dismantling adjacent parts.
It realizes rapid disassembly and assembly of graphite parts, reduces the impact on adjacent parts, shortens maintenance and machine return time, and improves machine operation efficiency.
Smart Images
Figure CN223052096U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of semiconductors, and particularly relates to a graphite component and an ion implanter. Background Art
[0002] Graphite is a commonly used material in semiconductor devices. For example, in an ion implanter, a high-energy ion beam bombards the surface of the device. Graphite has high chemical stability and is not easily eroded by acids, alkalis, etc. This chemical stability makes graphite one of the ideal materials in an ion implanter. Graphite can not only withstand the bombardment of high-energy ion beams, but also protect the device from the influence of ion beams and chemical reactions, and can effectively absorb sputtered ions to prevent dust particles from being implanted into the wafer. In addition, graphite is a material with high thermal conductivity. For an ion implanter, this means that graphite can quickly transfer the heat on the product surface to the surrounding environment of the ion implanter to keep the temperature of the device within a controllable range. Moreover, graphite is a good conductive material, which can maintain the stability of the device during the ion implantation process. The conductivity of graphite can also prevent the device from accumulating charges during the implantation process.
[0003] Many graphite components are installed on the path of the ion implanter from the generation of ions at the source to the implantation into the wafer. The reason is that the ion beam has high energy, and during the bombardment process, it can avoid high losses of metal components and prevent dust particles from being brought into the implantation to cause product contamination or defects. Therefore, many graphite component shields are installed.
[0004] Graphite components are consumables, and the graphite components in the ion implanter need to be frequently replaced. For example, on the path from the analysis magnet to the ion source in the ion implanter, an isolation valve and a graphite component are usually connected. When replacing the graphite component at this part, the isolation valve needs to be removed and then the graphite component is replaced. Since the isolation valve is removed, leak detection of the isolation valve needs to be carried out after reinstallation, which will delay the entire maintenance and machine return time.
[0005] Therefore, based on the above technical problems, a graphite component and an ion implanter are needed. By improving the graphite component, rapid disassembly and assembly of the graphite component can be achieved, and other components adjacent to the graphite component do not need to be removed during the disassembly and assembly process. Summary of the Utility Model
[0006] The purpose of the utility model is to provide a graphite component and an ion implanter. By improving the graphite component, rapid disassembly and assembly of the graphite component can be achieved, and other components adjacent to the graphite component do not need to be removed during the disassembly and assembly process.
[0007] The utility model provides a graphite component and an ion implanter, including: a first graphite half-piece and a second graphite half-piece;
[0008] The first graphite half-piece has a first joint surface, and a first half-groove is formed on one side of the first graphite half-piece located at the first joint surface;
[0009] The second graphite half-piece has a second joint surface, and a second half-groove is formed on one side of the second graphite half-piece located at the second joint surface;
[0010] After the first joint surface is attached to the second joint surface, the first graphite half-piece and the second graphite half-piece are spliced to form an assembly, and the first half-groove and the second half-groove enclose a process through-hole penetrating the assembly.
[0011] Optionally, a bevel is provided at the edge of the assembly;
[0012] The bevel makes the thickness of the edge of the assembly gradually decrease from the center of the assembly to the outside.
[0013] Optionally, the assembly has opposite first side walls and second side walls along the penetration direction of the process through-hole, and the bevel is connected from the first side wall to the second side wall.
[0014] Optionally, the first joint surface and the second joint surface are arranged at an angle to the opening direction of the process through-hole, and the inclination directions of the first joint surface and the second joint surface are opposite.
[0015] Optionally, connection through-holes are provided on the first graphite half-piece and the second graphite half-piece, and the opening direction of the connection through-holes is the same as the opening direction of the process through-hole.
[0016] Optionally, the connection through-holes on the assembly are arranged around the process through-hole.
[0017] Optionally, the process through-hole is a rectangular hole.
[0018] Optionally, the outer contours of the first graphite half-piece and the second graphite half-piece are semi-circular, and the outer contour of the assembly is circular.
[0019] Optionally, the first graphite half-piece, the second graphite half-piece and the assembly are of a plate structure.
[0020] The present invention also relates to an ion implanter, and the ion implanter is equipped with the above-mentioned graphite part.
[0021] In summary, the present utility model provides a graphite component, comprising: a first graphite half-piece and a second graphite half-piece; the first graphite half-piece has a first joint surface, and a first half-groove is formed on one side of the first graphite half-piece located at the first joint surface; the second graphite half-piece has a second joint surface, and a second half-groove is formed on one side of the second graphite half-piece located at the second joint surface; after the first joint surface and the second joint surface are attached to each other, the first graphite half-piece and the second graphite half-piece are spliced to form a combined component, and the first half-groove and the second half-groove enclose a process through-hole penetrating through the combined component.
[0022] With such a configuration, the graphite component has a two-piece structure composed of a first graphite half-piece and a second graphite half-piece, enabling the first graphite half-piece and the second graphite half-piece to be removed or installed radially. It is not necessary to remove other components adjacent to the graphite component. For example, it is not necessary to remove the isolation valve adjacent to the graphite component, thus not affecting the sealing performance of the isolation valve, and there is no need to perform a side leakage detection again, so as to shorten the entire maintenance and machine return time and improve the operation efficiency of the machine. BRIEF DESCRIPTION OF THE DRAWINGS
[0023] Figure 1 is an exploded structural schematic diagram of the graphite component according to an embodiment of the present utility model;
[0024] Figure 2 is a structural schematic diagram of the combined graphite component according to an embodiment of the present utility model;
[0025] Figure 3 is a side view structural schematic diagram of the graphite component according to an embodiment of the present utility model;
[0026] Figure 4 is a partial structural schematic diagram of an ion implanter according to an embodiment of the present utility model.
[0027] Among them, in the drawings:
[0028] 100 - graphite component;
[0029] 10 - first graphite half-piece; 11 - first joint surface; 12 - first half-groove;
[0030] 20 - second graphite half-piece; 21 - second joint surface; 22 - second half-groove;
[0031] 30 - combined component; 301 - first side wall; 302 - second side wall; 31 - inclined surface;
[0032] 40 - process through-hole;
[0033] 50 - connection through-hole;
[0034] 200 - ion source;
[0035] 300 - Ion analyzer;
[0036] 400 - Isolation valve;
[0037] a - Axial direction of the graphite part. Detailed implementation mode
[0038] The graphite part and the ion implanter proposed by the present utility model will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. According to the following description, the advantages and features of the present utility model will be clearer. It should be noted that the accompanying drawings are all in a very simplified form and use non - precise scales, only for the purpose of conveniently and clearly assisting in explaining the purpose of the embodiments of the present utility model.
[0039] As used in the present utility model, the singular forms "a", "an" and "the" include plural objects. The term "or" is usually used in the sense of including "and / or". The term "several" is usually used in the sense of including "at least one". The term "at least two" or "multiple" is usually used in the sense of including "two or more". In addition, the terms "first", "second", "third" are only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly indicating the quantity of the indicated technical features. Thus, the features defined with "first", "second", "third" may explicitly or implicitly include one or at least two of such features. In addition, as used in the present utility model, "installation", "connection", "coupling", when an element is "arranged" on another element, should be understood in a broad sense, usually only indicating that there is a connection, coupling, cooperation or transmission relationship between the two elements, and the two elements can be directly or indirectly connected, coupled, cooperated or transmitted through an intermediate element, and cannot be understood as indicating or implying the spatial position relationship between the two elements, that is, an element can be in any position such as inside, outside, above, below or on one side of another element, unless the content clearly indicates otherwise. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances. In addition, directional terms such as above, below, up, down, upward, downward, left, right, etc. are used relative to the exemplary embodiments as shown in the figures, with the upward or upper direction facing the top of the corresponding figure and the downward or lower direction facing the bottom of the corresponding figure.
[0040] This embodiment provides a graphite part, which can be used in ion implantation and / or other semiconductor devices.
[0041] As Figure 1 shown, the graphite part includes: a first graphite half - part 10 and a second graphite half - part 20.
[0042] Wherein, both the first graphite half piece 10 and the second graphite half piece 20 are in a plate structure, and their outer contours are both semi-circular;
[0043] The first graphite half piece 10 has a first joint surface 11. As Figure 1 shown, the first joint surface 11 is the non-arc side of the semi-circular first graphite half piece 10. A first half groove 12 is formed on one side of the first graphite half piece 10 where the first joint surface 11 is located.
[0044] The second graphite half piece 20 has a second joint surface 21. As Figure 1 shown, the second joint surface 21 is the non-arc side of the semi-circular second graphite half piece 20. A second half groove 22 is formed on one side of the second graphite half piece 20 where the second joint surface 21 is located.
[0045] As Figure 2 shown, after the first joint surface 11 and the second joint surface 21 are attached, the first graphite half piece 10 and the second graphite half piece 20 are spliced to form an assembly 30, and the first half groove 12 and the second half groove 22 enclose a process through hole 40 that penetrates the assembly 30.
[0046] In this embodiment, since both the first graphite half piece 10 and the second graphite half piece 20 are semi-circular, the outer contour of the assembly 30 formed by splicing the first graphite half piece 10 and the second graphite half piece 20 is a circular structure. In other alternative embodiments, the outer contours of the first graphite half piece 10 and the second graphite half piece 20 can be set as polygons or other special-shaped structures, and the outer contour shapes of the first graphite half piece 10 and the second graphite half piece 20 can be adjusted adaptively based on their installation positions and usage requirements.
[0047] In this embodiment, the first half groove 12 and the second half groove 22 are rectangular grooves, so that the process through hole 40 formed by enclosing the first half groove 12 and the second half groove 22 is a rectangular hole. The process through hole 40 can allow the ion beam to pass through, and the process through hole 40 is adapted to the channel shape of the process chamber after the ion beam passes through, so as to effectively protect the process chamber. In other alternative embodiments, the shapes of the first half groove 12 and the second half groove 22 can be set as other structures, such as semi-circular grooves, so that the process through hole 40 is a circular hole. The shapes of the first half groove 12 and the second half groove 22 can be adjusted adaptively based on the shape of the channel of the process chamber to be protected.
[0048] In this embodiment, the first graphite half-piece 10, the second graphite half-piece 20, and the assembly 30 are in a plate-like structure. Therefore, the overall graphite piece is in a circular thin sheet structure. In other alternative embodiments, the structures of the first graphite half-piece 10 and the second graphite half-piece 20 can be adjusted based on the actual structure. For example, the first graphite half-piece 10 and the second graphite half-piece 20 can be special-shaped structures with curved surface shapes.
[0049] Please continue to refer to Figure 1 and Figure 2 As shown, connection through-holes 50 are provided on the first graphite half-piece 10 and the second graphite half-piece 20, and the opening direction of the connection through-holes 50 is the same as the opening direction of the process through-hole 40.
[0050] Specifically, two connection through-holes 50 are respectively provided on the first graphite half-piece 10 and the second graphite half-piece 20. Among them, the two connection through-holes 50 on the first graphite half-piece 10 are roughly arranged on both sides of the first half-slot 12 along its length direction, and the two connection through-holes 50 on the second graphite half-piece 20 are roughly arranged on both sides of the second half-slot 22 along its length direction. Corresponding to the assembly 30, the four connection through-holes 50 are distributed at the four corners and are arranged around the process through-hole 40.
[0051] In this embodiment, the connection through-hole 50 is a circular hole, and the connection through-hole 50 can be penetrated by connecting parts such as bolts to realize the fixation of the graphite piece and the parts adjacent to the graphite piece. In other alternative embodiments, the number, shape, and setting position of the connection through-holes 50 can be adjusted adaptively based on actual usage requirements.
[0052] Please combine with Figure 3 As shown, the structure of the graphite piece will be introduced below with the assembly 30 as the object.
[0053] Wherein, a bevel 31 is provided at the edge of the assembly 30 (it can also be understood that bevels 31 are provided at the corresponding positions on the first graphite half-piece 10 and the second graphite half-piece 20);
[0054] The bevel 31 makes the thickness of the edge of the assembly 30 gradually decrease from its center to the outside.
[0055] Since the assembly 30 is a two-piece structure, during disassembly, the first graphite half-piece 10 and the second graphite half-piece 20 can be pulled radially to make them move away from each other, so as to realize the disassembly of the graphite piece without removing other parts adjacent to the graphite piece.
[0056] As Figure 3As shown, since the edge position of the assembly 30 gradually thins, during the process of removing the graphite part, the existence of this inclined surface 31 can be used to form a guiding structure to assist the first graphite half part 10 and the second graphite half part 20 to be smoothly pulled out radially without radial interference with other components. The process of removing the first graphite half part 10 and the second graphite half part 20 will be further elaborated in the following content Figure 4 for further elaboration.
[0057] Please refer to Figure 3 As shown, the assembly 30 has opposite first side wall 301 and second side wall 302 along the through direction of the process through hole 40. The first side wall 301 is Figure 3 the upper side surface of the assembly 30 in Figure 3 , and the second side wall 302 is
[0058] the lower side surface of the assembly 30 in
[0059] . The inclined surface 31 is connected from the upper side surface of the assembly 30 to the lower side surface, that is, the thickness at the edge position of the assembly 30 linearly changes and gradually approaches zero to achieve a better guiding effect. The inclination angle of the inclined surface 31 can be set to control the angle at the outermost edge of the assembly 30 to ensure the structural strength at the outermost edge of the assembly 30 and prevent the graphite part from cracking and damaging at the outermost edge.
[0060] Please continue to refer to Figure 3 As shown, the first joint surface 11 and the second joint surface 21 are arranged at an angle with the opening direction of the process through hole 40. The opening direction of the process through hole 40 is the axial direction a of the assembly 30. Therefore, the first joint surface 11 and the second joint surface 21 are not perpendicular to the first side wall 301 of the assembly 30 ( Figure 3 the upper side surface of the assembly 30 in Figure 3 ) and the second side wall 302 (
[0061] the lower side surface of the assembly 30 in
[0062] The inclined setting of the first joint surface 11 causes the thickness of the first graphite half-piece 10 on one side of the first joint surface 11 ( Figure 3 the right side of the first graphite half-piece 10 in Figure 3 ) to gradually change. The first joint surface 11 also has a guiding function, facilitating the radial insertion and installation of the first graphite half-piece 10.
[0063] Similarly, the inclined setting of the second joint surface 21 causes the thickness of the second graphite half-piece 20 on one side of the second joint surface 21 ( Figure 3 the left side of the second graphite half-piece 20 in Figure 3 ) to gradually change. The second joint surface 21 also has a guiding function, facilitating the radial insertion and installation of the second graphite half-piece 20.
[0064] In this embodiment, both the first joint surface 11 and the second joint surface 21 are set as planar structures, and they conformally fit. In other alternative embodiments, the first joint surface 11 and the second joint surface 21 can be set as conformally mating curved surfaces or non-standard surface structures, and the first joint surface 11 and the second joint surface 21 can be adaptively adjusted based on actual usage requirements.
[0065] Please refer to Figure 4 As shown, this embodiment also provides an ion implanter, and the ion implanter is installed with the above-mentioned graphite part 100.
[0066] The ion implanter includes the above-mentioned graphite part 100, an ion source 200, and an ion analyzer 300.
[0067] As Figure 4 shown, the ion source 200 is connected to the ion analyzer 300, and an isolation valve 400 and a graphite part 100 are arranged between the ion source 200 and the ion analyzer 300. The setting of the graphite part 100 is used to protect the process chamber of the ion analyzer 300.
[0068] During the installation of the isolation valve 400 and the graphite part 100, bolts need to pass through the connection through-holes 50 on the isolation valve 400 and the graphite part 100 to fix the isolation valve 400 and the graphite part 100.
[0069] When removing the graphite part 100, the bolts are removed. At this time, it is not necessary to remove the isolation valve 400. The first graphite half-piece 10 and the second graphite half-piece 20 of the graphite part 100 can be radially extracted. Similarly, the new first graphite half-piece 10 and the second graphite half-piece 20 are radially inserted, and then the bolts are installed.
[0070] The graphite component is composed of a two-piece structure including a first graphite half-piece 10 and a second graphite half-piece 20. This allows for the radial removal or installation of the first graphite half-piece 10 and the second graphite half-piece 20 without the need to remove other components adjacent to the graphite component. For example, there is no need to remove the isolation valve adjacent to the graphite component, which will not affect the sealing performance of the isolation valve and eliminates the need for re-performing leak detection, thus shortening the overall maintenance and machine return time and improving the operating efficiency of the machine.
[0071] The above-mentioned isolation valve 400 and graphite component 100 are existing components on the ion implanter, and their connection method belongs to the prior art, which will not be elaborated here.
[0072] The ion source 200 is used to generate positive ions from gaseous or solid mechanisms, and the ion analyzer 300 is used to separate the required impurity ions from the mixed ion beam.
[0073] In addition, the ion implanter further includes an acceleration tube, a scanning system, and a process chamber.
[0074] The acceleration tube is used to accelerate the ions; the scanning system is used to control the emission direction of the ion beam to cover the entire product surface; the process chamber is used to place the product (such as a wafer), and the accelerated ion beam enters the process chamber to implant into the product.
[0075] In this specification, each embodiment is described in a progressive manner. The key point of each embodiment is to illustrate the differences from other embodiments. For the same or similar parts among the embodiments, reference can be made to each other.
[0076] The above description is only for the description of the preferred embodiments of the present invention and does not limit the scope of the present invention in any way. Any changes and modifications made by those of ordinary skill in the art of the present invention based on the above disclosure fall within the protection scope of the claims.
Claims
1. A graphite part, characterized in that: include: a first graphite half and a second graphite half; The first graphite half piece has a first bonding surface, and a first half groove is formed on one side of the first bonding surface of the first graphite half piece; The second graphite half piece has a second bonding surface, and a second half groove is formed on one side of the second bonding surface of the second graphite half piece; After the first bonding surface is bonded to the second bonding surface, the first graphite half piece and the second graphite half piece are spliced to form an assembly, and the first half groove and the second half groove are surrounded to form a process through hole penetrating the assembly.
2. The graphite part according to claim 1, characterized in that The edge of the assembly is provided with a bevel; The inclined surface makes the thickness of the edge of the assembly gradually decrease from the center of the assembly to the outside.
3. The graphite part according to claim 2, characterized in that The assembly has a first side wall and a second side wall opposite to each other along a through-direction of the process through hole, and the inclined surface is connected from the first side wall to the second side wall.
4. The graphite part according to claim 1, characterized in that The first bonding surface and the second bonding surface are arranged at an angle with the opening direction of the process through hole, and the first bonding surface and the second bonding surface are inclined in opposite directions.
5. The graphite part according to claim 1, characterized in that The first graphite half piece and the second graphite half piece are provided with connecting through holes, and the opening direction of the connecting through holes is consistent with the opening direction of the process through holes.
6. The graphite article according to claim 5, characterized in that The connecting through holes on the assembly are arranged around the process through hole.
7. The graphite article according to claim 1, characterized in that The process through hole is a rectangular hole.
8. The graphite article according to claim 1, characterized in that The outer contours of the first graphite half piece and the second graphite half piece are semicircular, and the outer contour of the assembly is circular.
9. The graphite article according to claim 1, characterized in that: The first graphite half piece, the second graphite half piece and the assembly are in a plate-like structure.
10. An ion implanter, characterized in that: The ion implanter is equipped with the graphite member according to any one of claims 1 to 9.