Feeding device of vertical chemical vapor deposition furnace

Abstract

The utility model relates to a feeding device of a vertical chemical vapor deposition furnace, the deposition furnace comprises a vertical furnace tube, a liftable furnace door arranged below the furnace tube, and a wafer boat assembly directly or indirectly fixed above the furnace door, and the feeding device comprises a temporary storage area provided with at least one wafer conveying box storage position, the wafer fork hand assembly is used for taking and placing wafers into the wafer boat assembly and the wafer transportation box in the temporary storage area and comprises a rotary table which is driven to rotate by a rotation executing mechanism; the rotary table is provided with an independent fork hand, a fork hand set composed of at least two fork hands, a first executing mechanism for driving the independent fork hand to stretch out and draw back in an intermittent mode and a second executing mechanism for driving the fork hand set to stretch out and draw back in an intermittent mode. When the independent fork hand and the fork hand set stretch out at the same time, the fork hands of the independent fork hand and the fork hand set are arranged in an up-down stacked mode, and the independent fork hand is located on the uppermost portion or the lowermost portion.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor manufacturing processes, and in particular to a loading device for a vertical chemical vapor deposition furnace. Background Art

[0002] In the semiconductor manufacturing process, a vertical chemical deposition furnace (Furnace tube) is a widely used cluster deposition device, which has the advantages of high deposition efficiency and high-precision control. The conventional structure of a vertical chemical deposition furnace mainly includes a furnace tube and a furnace door arranged at the lower part of the furnace tube. The furnace tube serves as a deposition reaction chamber, and a precursor nozzle component is arranged inside. A susceptor is fixedly arranged on the liftable furnace door. The number of nozzles in the precursor nozzle component varies according to the requirements of the deposited film or the process requirements, and one or more nozzles can be set. The nozzle component is distributed along the axis of the susceptor and is arranged on one side of the susceptor. The furnace tube is also provided with an air inlet and an air outlet.

[0003] When the vertical chemical deposition furnace is performing a deposition process, there are often two modes: small-batch trial production and large-batch production. The existing wafer handling robots have two types: single-pronged and multi-pronged. The gap of the multi-pronged robot matches the wafer gap of the susceptor / wafer transport box, and multiple wafers can be picked and placed each time it extends and retracts. Obviously, the single-pronged robot can only operate on one wafer at a time, and the operation efficiency is low during large-batch production; in the case where the wafers in the wafer transport box are closely arranged, the multi-pronged robot will inevitably pick and place multiple wafers each time it operates, resulting in the wafers in the susceptor still being closely arranged, which does not meet the design requirements during small-batch trial production. At this time, if the wafers in the susceptor need to be loosely arranged, the arrangement of the wafers in the wafer transport box must be adjusted manually in advance, which not only reduces the production efficiency but also may introduce contamination.

[0004] It is necessary to improve and optimize the existing loading device of the vertical chemical deposition furnace so that it can better meet the user's needs. Summary of the Utility Model

[0005] The purpose of the embodiment of the utility model is to overcome the structural defects of the existing technology and propose a loading device for a vertical chemical vapor deposition furnace. By designing independently driven individual prongs and prong groups, the function of the individual prongs extending separately during small-batch trial production is realized, and the individual prongs and the prong group extend and retract synchronously as a whole during large-batch production, without reducing the production efficiency. This device realizes fully automated production, improves efficiency, reduces labor costs, and is safer to operate.

[0006] In order to achieve the above utility model purpose, a loading device for a vertical chemical vapor deposition furnace proposed by the embodiment of the utility model is realized through the following technical solutions:

[0007] A loading device for a vertical chemical vapor deposition furnace, the deposition furnace including a vertical furnace tube, a liftable furnace door disposed below the furnace tube, and a susceptor assembly directly or indirectly fixed above the furnace door, characterized in that: the loading device includes a temporary storage area provided with at least one storage position for a wafer transfer cassette, and a wafer fork assembly for picking and placing wafers into and from the wafer transfer cassettes in the susceptor assembly and the temporary storage area. The wafer fork assembly includes a turntable driven to rotate by a rotational actuator, and an independent fork, a fork group composed of at least two forks, a first actuator for driving the independent fork to perform intermittent telescoping, and a second actuator for driving the fork group to perform intermittent telescoping are provided on the turntable; when the independent fork and the fork group extend simultaneously, the forks of the independent fork and the fork group are stacked vertically, and the independent fork is located at the uppermost or lowermost position.

[0008] The wafer fork assembly further includes a Y-axis linear drive module, and the turntable is disposed on the Y-axis linear drive module.

[0009] Both the first actuator and the second actuator include a guide rail, a slider slidably disposed on the guide rail, a servo motor, and a belt transmission assembly. The belt transmission assembly connects the servo motor and the slider; the guide rails of the first actuator and the second actuator are arranged in parallel, and the fork group / independent fork is directly or indirectly fixedly installed on the slider.

[0010] Compared with the prior art, the beneficial effects of the present utility model are as follows: By designing an independently driven independent fork and a fork group, the function of the independent fork extending alone during small-batch trial production is realized, and during large-batch production, the independent fork and the fork group perform overall synchronous telescoping operations, without reducing production efficiency. This equipment realizes fully automated production, improves efficiency, reduces labor costs, and is safer to operate. BRIEF DESCRIPTION OF THE DRAWINGS

[0011] Through the following description of its exemplary embodiments in conjunction with the drawings, the above features and advantages of the present utility model will become clearer and easier to understand.

[0012] Figure 1 It is a schematic diagram of the overall structure of the loading device for the vertical chemical vapor deposition furnace according to the embodiment of the present utility model;

[0013] Figure 2 It is a schematic perspective view I of the wafer fork assembly according to the embodiment of the present utility model;

[0014] Figure 3 It is a schematic perspective view II of the wafer fork assembly according to the embodiment of the present utility model;

[0015] Figure 4 It is a schematic diagram of the structure of the turntable part of the wafer fork assembly according to the embodiment of the present utility model; DETAILED DESCRIPTION OF THE EMBODIMENTS

[0016] The following specific embodiments illustrate the implementation manners of the present utility model. Those skilled in the art can easily understand other advantages and effects of the present utility model from the content disclosed in this specification. Obviously, the described embodiments are part of the embodiments of the present utility model, rather than all of them. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present utility model without creative work belong to the scope of protection of the present utility model.

[0017] Terms such as "front", "rear", "left", "right", "inside", "outside", etc. cited in this specification are only for the convenience of clear description and are not used to limit the scope of implementation of the present utility model. The change or adjustment of their relative relationships shall also be regarded as the scope of implementation of the present utility model without substantial change in technical content.

[0018] In the description of the following embodiments, unless otherwise clearly specified and limited, terms such as "connection" should be understood in a broad sense. For example, "connection" can be a fixed connection, a detachable connection, or integrated; it can be a mechanical connection or indirectly connected through an intermediate medium, and can be the communication inside two components or the interaction relationship between two components, unless otherwise clearly limited. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.

[0019] See Figures 1-4 As shown, in this embodiment, the furnace body 2 of the deposition furnace has the same structure as that of the existing deposition furnace, including a vertical furnace tube 21. A liftable furnace door 22 is provided at the lower part of the furnace tube. The furnace tube 21 serves as a deposition reaction chamber, and a precursor nozzle component is provided inside. A susceptor 23 is fixedly arranged on the liftable furnace door 22. The furnace tube is also provided with an air inlet and an air outlet.

[0020] The loading device includes:

[0021] Temporary storage area 1

[0022] See Figure 2 , 3 As shown, a stacked box rack is arranged in the temporary storage area 1, and two storage positions for wafer transport boxes are stacked up and down in the box rack.

[0023] Wafer fork component 3

[0024] See Figures 1-4 As shown, the wafer fork component 3 is used to pick and place wafers into and from the susceptor 23 and the wafer transport box in the temporary storage area 1.

[0025] The wafer fork component 3 includes a Y-axis linear drive module 35, a turntable 31, and a rotation actuator 32. In this embodiment, the rotation actuator 32 is a servo motor and a gearbox. The turntable 31 is connected to the servo motor through the gear transmission structure of the gearbox and rotates around its axis under the drive of the servo motor. The turntable 31 and the rotation actuator 32 are arranged on the Y-axis linear drive module.

[0026] An independent fork 33, a fork group 34, a first actuator, and a second actuator are arranged on the turntable 31.

[0027] The fork group 34 is composed of 4 forks. The independent fork 33 has the same structure as these 4 forks, and has a fork rod and a fork head. A front hook is fixed to the front part of the fork head part, and a rear hook is fixed to the rear part. The front hook has a first horizontal support surface and a front stop surface located in front of the first horizontal support surface. The rear hook has a second horizontal support surface and a rear stop surface located on the second horizontal support surface. The upper surfaces of the first horizontal support surface and the second horizontal support surface are on the same horizontal plane. The purpose of this setting is to minimize the contact area between the fork rod and the product, reduce the friction between the product and the fork rod, and avoid product wear.

[0028] The fork group 34 and the independent fork 33 extend and retract independently. Among them, the first actuator drives the independent fork 33 to perform intermittent extension and retraction, and the second actuator drives the fork group 34 to perform intermittent extension and retraction. When the independent fork 33 and the fork group 34 extend simultaneously, the forks of the independent fork 33 and the fork group 34 are stacked vertically, and the independent fork 33 is located at the top.

[0029] The first actuator and the second actuator have the same structure, and both include a guide rail 36, a slider 37 slidably arranged on the guide rail 36, a servo motor 38, and a belt transmission component 39. The belt transmission component 39 connects the servo motor 38 and the slider 37. In this embodiment, the guide rails 36 of the first actuator and the second actuator are arranged in parallel. A connecting piece is installed on the outside of each of the two sliders 37, and the fork rod of the fork group 34 or the independent fork 33 is installed on the connecting piece.

[0030] Compared with the prior art, the beneficial effects of the present utility model are as follows: By designing a storage area and a flat-edge alignment device, not only can automatic flat-edge alignment be achieved, but also automatic pipeline operation of alignment and loading can be realized, improving production efficiency. In addition, by designing independently driven independent forks and fork groups, the function of the independent fork extending alone during small-batch trial production is realized, and during large-batch production, the independent fork and the fork group extend and retract synchronously as a whole, without reducing production efficiency. This equipment realizes fully automated production, improves efficiency, reduces labor costs, and is safer to operate.

[0031] The above uses embodiments to elaborate in detail on the inventive concept and implementation manners of the present utility model. However, those of ordinary skill in the art to which the present utility model pertains can understand that the above embodiments of the present utility model are only one of the preferred embodiments of the present utility model. Due to space limitations, all implementation manners cannot be listed one by one here. Any implementation that can embody the technical solution of the claims of the present utility model falls within the protection scope of the present utility model.

[0032] It should be noted that the above content is a further detailed description of the present utility model in combination with specific implementation manners, and it cannot be determined that the specific implementation manners of the present utility model are limited thereto. Under the guidance of the above embodiments, those skilled in the art can make various improvements and deformations on the basis of the above embodiments, and these improvements or deformations fall within the protection scope of the present utility model.

Claims

1. A loading device for a vertical chemical vapor deposition furnace, the deposition furnace comprising a vertical furnace tube, a liftable furnace door disposed below the furnace tube, and a susceptor assembly directly or indirectly fixed above the furnace door, characterized in that: The loading device includes a temporary storage area provided with at least one storage position for a wafer transfer cassette, and a wafer fork assembly for picking and placing wafers into and from the wafer transport cassette in the susceptor assembly and the temporary storage area. The wafer fork assembly includes a turntable driven to rotate by a rotation actuator, and an independent fork, a fork group composed of at least two forks, a first actuator for driving the independent fork to perform intermittent telescoping, and a second actuator for driving the fork group to perform intermittent telescoping are provided on the turntable; when the independent fork and the fork group extend simultaneously, the forks of the independent fork and the fork group are stacked vertically, and the independent fork is located at the uppermost or lowermost position.

2. The feeding device of a vertical chemical vapor deposition furnace according to claim 1, characterized in that: The wafer fork assembly further includes a Y-axis linear drive module, and the turntable is arranged on the Y-axis linear drive module.

3. The feeding device of a vertical chemical vapor deposition furnace according to claim 2, characterized in that: Both the first actuator and the second actuator include a guide rail, a slider slidably arranged on the guide rail, a servo motor, and a belt transmission assembly. The belt transmission assembly connects the servo motor and the slider; the guide rails of the first actuator and the second actuator are arranged in parallel, and the fork group / independent fork is directly or indirectly fixedly installed on the slider.

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