Supporting device and polishing machine thereof

Abstract

The utility model relates to the technical field of semiconductors, and discloses a support device and a polisher thereof, the support device comprises a support arm, a support frame and an adsorption piece, the adsorption piece and the support frame are connected to the same end of the support arm, the support frame is provided with a bearing adsorption port and a bearing surface, the bearing adsorption port and the bearing surface are located at the same end of the support frame, and a mounting cavity is arranged in the support frame. The mounting cavity is communicated with the bearing adsorption opening, and the adsorption piece is mounted in the mounting cavity and exposed through the bearing adsorption opening. According to the supporting device and the polishing machine thereof, the ceramic plate is transferred to the discharging workbench through the supporting device, the personnel safety risk in the ceramic plate receiving and transferring process is avoided, and meanwhile the working efficiency is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductors, in particular to a support device and a polishing machine thereof. Background Art

[0002] After the existing wafer polishing is completed, the polishing machine vacuums and adsorbs the ceramic disc to the air. Finally, the employee puts both hands under the ceramic disc. After the vacuum adsorption ends, the ceramic disc falls on the employee's hands, and the employee transfers the ceramic disc to the wafer unloading table. The weight of the ceramic disc is about 15 kilograms. The problem of the existing technology is that during the wafer unloading process, the ceramic disc naturally falls on the employee's hands. The ceramic disc is relatively heavy, and during the falling and transferring process, there may be a risk of the employee being injured by the heavy object due to improper operation. Summary of the Utility Model

[0003] It aims to solve at least one of the technical problems existing in the prior art. The utility model provides a support device and a polishing machine thereof. The ceramic disc is transferred from the support device to the wafer unloading workbench, avoiding the personnel safety risk during the process of receiving and transferring the ceramic disc, and improving the work efficiency at the same time.

[0004] To achieve the above object, the utility model provides a support device, including a support arm, a support frame and an adsorbent. The adsorbent and the support frame are connected to the same end of the support arm. The support frame is provided with a carrying adsorption port and a carrying surface. The carrying adsorption port and the carrying surface are located at the same end of the support frame. An installation cavity is arranged inside the support frame, and the installation cavity is communicated with the carrying adsorption port. The adsorbent is installed in the installation cavity and is exposed through the carrying adsorption port.

[0005] As a preferred solution, the support frame includes a carrying disc and a support rod. One end of the support rod is connected to one end of the support arm, and the other end of the support rod is connected to the carrying disc. The carrying surface and the carrying adsorption port are arranged at the same end of the carrying disc.

[0006] As a preferred solution, a plurality of support rods are provided. One ends of adjacent support rods are circumferentially and spacedly connected along the outer peripheral surface of the support arm, and the other ends of adjacent support rods are circumferentially and spacedly connected along the circumference of the carrying disc.

[0007] As a preferred solution, an adsorption installation pipe is connected to one end of the support arm. The adsorption installation pipe is installed in the installation cavity. The adsorbent is connected inside the adsorption installation pipe. The adsorbent is provided with an adsorption end. One end of the adsorption installation pipe extends to the carrying adsorption port, and the adsorption end is exposed through the carrying adsorption port.

[0008] As a preferred solution, the support arm is connected with a wetting spray pipe, the wetting spray pipe is provided with a liquid inlet and a spray port, the liquid inlet is communicated with the spray port, at least a part of the wetting spray pipe extends into the installation cavity, and the spray port is arranged towards the bearing adsorption port.

[0009] As a preferred solution, the bearing adsorption port is provided with a spray area, the spray area is located radially between the adsorption end and the bearing disc, and the spray port is arranged towards the spray area.

[0010] As a preferred solution, the support arm includes a transfer section, a bearing section and a support base, the support frame is connected to one end of the bearing section, the other end of the bearing section is connected to the transfer section, the other end of the transfer section is rotatably connected to the support base, and the transfer section and the bearing section are arranged perpendicular to each other and rotatably connected.

[0011] As a preferred solution, the support arm further includes a flipping drive and a transfer drive, the transfer section is rotatably connected to the support base through the transfer drive, and the bearing section is rotatably connected to the transfer section through the flipping drive.

[0012] As a preferred solution, the support base includes a connection base and a connection section, the connection section has the same extending direction as the bearing section, one end of the connection section is connected to the connection base, and the other end of the connection section is rotatably connected to the transfer section.

[0013] A polishing machine includes a polishing machine body and the support device as described above, and one end of the support arm is connected to the side surface of the polishing machine body.

[0014] Compared with the prior art, the support device and the polishing machine according to the embodiment of the present invention have the beneficial effects that: the support arm is used to support the adsorbent and the support frame, and drives the adsorbent and the support frame to move after adsorbing the ceramic disc. The support frame is provided with an installation cavity, the adsorbent is located in the installation cavity, the installation cavity provides an installation space for the adsorbent, the same end of the support frame is provided with a bearing adsorption port and a bearing surface, the bearing surface is used to bear the ceramic disc, the adsorption end of the adsorbent is exposed through the bearing adsorption port, and adsorbs the ceramic disc to fix the ceramic disc, prevent the ceramic disc from moving relative to the support frame during the transfer process, thereby realizing the transfer of the ceramic disc from the support device to the down-sheet workbench, avoiding the personnel safety risks during the process of receiving and transferring the ceramic disc, and improving the work efficiency at the same time. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 is the overall structural schematic diagram of the embodiment of the present invention.

[0016] Figure 2 is the structural schematic diagram of the support device of the embodiment of the present invention.

[0017] Figure 3 It is a schematic structural diagram of the support device in the embodiment of the present utility model carrying the ceramic disc.

[0018] Figure 4 It is a schematic structural diagram of the support device in the embodiment of the present utility model after being transferred to the lower sheet table and flipped.

[0019] In the figure:

[0020] 10. Support arm; 11. Transfer section; 12. Carrying section; 13. Support base; 14. Connection base; 15. Connection section; 16. Flipping drive; 17. Transfer drive;

[0021] 20. Support frame; 21. Carrying adsorption port; 22. Spraying area; 23. Carrying surface; 24. Installation cavity; 25. Carrying tray; 26. Support rod;

[0022] 30. Adsorbing component; 31. Adsorption installation pipe; 32. Adsorption end;

[0023] 40. Wetting spray pipe; 41. Liquid inlet; 42. Spraying port;

[0024] 50. Polishing machine body; 51. Lower sheet table; 52. Ceramic disc. Specific embodiments

[0025] The following combines the drawings and embodiments to further describe in detail the specific embodiments of the present utility model. The following embodiments are used to illustrate the present utility model, but are not used to limit the scope of the present utility model.

[0026] In the description of the present utility model, it should be understood that the orientation or positional relationship indicated by the terms "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. in the present utility model is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the present utility model.

[0027] In the description of the present utility model, it should be understood that the terms "connected", "connected", "fixed", etc. used in the present utility model should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or integrated; it can be a mechanical connection, a welded connection; it can be directly connected, or indirectly connected through an intermediate medium, and can be the communication inside two elements or the interaction relationship between two elements, unless otherwise clearly defined. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.

[0028] As shown Figures 1 to 4 in the figure, a support device according to a preferred embodiment of the present utility model includes a support arm 10, a support frame 20, and an adsorbing member 30. The adsorbing member 30 and the support frame 20 are connected to the same end of the support arm 10. The support frame 20 is provided with a carrying adsorption port 21 and a carrying surface 23. The carrying adsorption port 21 and the carrying surface 23 are located at the same end of the support frame 20. An installation cavity 24 is provided inside the support frame 20. The installation cavity 24 is communicated with the carrying adsorption port 21. The adsorbing member 30 is installed inside the installation cavity 24 and is exposed through the carrying adsorption port 21.

[0029] A polishing machine, as Figure 1 shown in the figure, includes a polishing machine body 50 and a support device. One end of the support arm 10 is connected to the side surface of the polishing machine body 50 to fix the support arm 10 on the polishing machine.

[0030] For the support device of the present utility model and its polishing machine, the support arm 10 is used to support the adsorbing member 30 and the support frame 20, and drives the adsorbing member 30 and the support frame 20 to move after adsorbing the ceramic disc 52. The support frame 20 is provided with an installation cavity 24. The adsorbing member 30 is located inside the installation cavity 24. The installation cavity 24 provides an installation space for the adsorbing member 30. The same end of the support frame 20 is provided with a carrying adsorption port 21 and a carrying surface 23. The carrying surface 23 is used to carry the ceramic disc 52. The adsorption end 32 of the adsorbing member 30 is exposed through the carrying adsorption port 21 and adsorbs the ceramic disc 52 to fix the ceramic disc 52, prevent the ceramic disc 52 from moving relative to the support frame 20 during the transfer process, and further realize the transfer of the ceramic disc 52 from the polishing machine to the unloading table 51, avoiding the personal safety risks during the process of receiving and transferring the ceramic disc 52, and improving the work efficiency at the same time.

[0031] As one of the embodiments, the adsorbing member 30 is a vacuum generator. The vacuum generator is a prior art.

[0032] Furthermore, as Figures 1 to 3 shown in the figure, the support frame 20 includes a carrying disc 25 and a support rod 26. One end of the support rod 26 is connected to one end of the support arm 10, and the other end of the support rod 26 is connected to the carrying disc 25. The carrying surface 23 and the carrying adsorption port 21 are arranged at the same end of the carrying disc 25. The carrying disc 25 is connected and fixed to the support arm 10 through the support rod 26. The carrying surface 23 on the carrying disc 25 contacts the ceramic disc 52 to support and carry the ceramic disc 52, and the adsorbing member 30 is exposed through the carrying adsorption port 21 on the carrying disc 25 to adsorb the ceramic disc 52.

[0033] Furthermore, as Figures 1 to 3As shown, a plurality of support rods 26 are provided. One ends of adjacent support rods 26 are circumferentially and spacedly connected along the outer peripheral surface of the support arm 10, and the other ends of adjacent support rods 26 are circumferentially and spacedly connected along the circumference of the bearing plate 25. The bearing plate 25 is formed by arranging a plurality of support rods 26 along the circumference, improving the connection stability between the bearing plate 25 and the support arm 10, and further improving the bearing stability of the bearing plate 25.

[0034] Furthermore, as Figures 1 to 3 shown, one end of the support arm 10 is connected with an adsorption installation pipe 31. The adsorption installation pipe 31 is installed in the installation cavity 24. The adsorbent 30 is connected inside the adsorption installation pipe 31. The adsorbent 30 is provided with an adsorption end 32. One end of the adsorption installation pipe 31 extends to the bearing adsorption port 21, and the adsorption end 32 is exposed through the bearing adsorption port 21. The adsorbent 30 is installed inside the adsorption installation pipe 31 to achieve fixation. At the same time, the adsorption installation pipe 31 has a protective effect on the adsorbent 30. The adsorption end 32 is exposed through the bearing adsorption port 21 to adsorb the ceramic disc 52.

[0035] Furthermore, as Figures 1 to 3 shown, the support arm 10 is connected with a wetting spray pipe 40. The wetting spray pipe 40 is provided with a liquid inlet 41 and a spray port 42. The liquid inlet 41 is communicated with the spray port 42. At least a part of the wetting spray pipe 40 extends into the installation cavity 24, and the spray port 42 is arranged towards the bearing adsorption port 21. The wetting spray pipe 40 is provided with a liquid inlet 41 and a spray port 42. Among them, the liquid inlet 41 is used to connect with the liquid for wetting the wafer. The liquid inlet 41 is communicated with the spray port 42. The wetting liquid enters the wetting spray pipe 40 through the liquid inlet 41 and is sprayed out through the spray port 42 to wet and wash the wafer, reducing the generation of chemical defects and improving the wafer yield to a certain extent.

[0036] Furthermore, as Figure 2 shown, the bearing adsorption port 21 is provided with a spray area 22. The spray area 22 is located radially between the adsorption end 32 and the bearing plate 25, and the spray port 42 is arranged towards the spray area 22. The bearing adsorption port 21 is relatively large, and the bearing plate 25 is annular. After the adsorption end 32 adsorbs the ceramic disc 52, the bearing plate 25 bears the edge of the ceramic disc 52. The area radially between the adsorption end 32 and the bearing plate 25 is hollowed out to form the spray area 22. The wafers on the ceramic disc 52 are more concentrated and exposed in the spray area 22. The spray port 42 is arranged towards the spray area 22 to wet and wash the wafers on the ceramic disc 52, improving the accuracy of the spray position and the spray effect on the wafers.

[0037] As one embodiment, a plurality of wetting spray pipes 40 are provided. The wetting spray pipes 40 are circumferentially and spacedly arranged along the support arm 10, increasing the spray area in the spray area 22 and improving the spray effect.

[0038] Furthermore, as Figures 1 to 3As shown, the support arm 10 includes a transfer section 11, a bearing section 12 and a support base 13, a support frame 20 is connected to one end of the bearing section 12, the other end of the bearing section 12 is connected to the transfer section 11, the other end of the transfer section 11 is rotatably connected to the support base 13, and the transfer section 11 and the bearing section 12 are arranged perpendicular to each other and rotatably connected. The extension direction of the support frame 20 and the transfer section 11 is the same, and both are arranged in the vertical direction. The support frame 20 extends into the range of the polishing machine through the bearing section 12, shortening the distance between the support frame 20 and the ceramic disc 52, so as to facilitate the bearing of the ceramic disc 52. The transfer section 11 is rotatably connected to the support base 13, and the transfer section 11 is connected to the support frame 20 through the bearing section 12. The transfer section 11 is rotated to drive the support frame 20 to move, so as to realize the transfer of the ceramic disc 52 between the polishing machine and the lower plate 51. The bearing section 12 is rotatably connected to the transfer section 11 so that the support frame 20 can drive the ceramic disc 52 to flip over, transfer the ceramic disc 52 from the polishing machine to the lower sheet table 51 for flipping, with the ceramic disc 52 facing the lower sheet table 51, and place the ceramic disc 52 on the lower sheet table 51.

[0039] Further, such as Figure 2 As shown, the support arm 10 also includes a flip drive 16 and a transfer drive 17. The transfer section 11 is rotationally connected to the support base 13 through the transfer drive 17, and the bearing section 12 is rotationally connected to the transfer section 11 through the flip drive 16. The transfer drive 17 is fixed to the support base 13. The arrangement direction of the transfer drive 17 is the same as that of the transfer section 11 and is transmission-connected to the transfer section 11, so that the transfer section 11 drives the bearing section 12 and the support frame 20 to rotate, so as to realize the transfer of the ceramic disc 52 connected to the support frame 20. The bearing section 12 is perpendicular to the transfer section 11. The transfer section 11 is located on one side of the polishing machine. The bearing section 12 drives the support frame 20 to extend into the range of the polishing machine to facilitate the loading of the ceramic disc 52. The arrangement direction of the flip drive 16 is the same as the extension direction of the bearing section 12. The flip drive 16 is fixed to the upper end of the transfer section 11. When the support frame 20 needs to load the ceramic disc 52, the bearing surface 23 of the support frame 20 faces upward, as shown in FIG. Figure 4 As shown, when the support frame 20 drives the ceramic plate 52 to move onto the lower plate platform 51 , the flip drive 16 drives the support frame 20 to flip through the bearing section 12 , so that the ceramic plate 52 faces downward, making it easier to place the ceramic plate 52 on the lower plate platform 51 .

[0040] As one embodiment, Figure 2 As shown, the flip drive 16 and the transfer drive 17 are motors. Of course, the flip drive 16 and the transfer drive 17 are electrically connected to the controller respectively, and the flip drive 16 and the transfer drive 17 are controlled by the controller.

[0041] Further, such as Figures 1 to 4As shown in the figure, the support base 13 includes a connecting base 14 and a connecting section 15. The connecting section 15 has the same extending direction as the bearing section 12. One end of the connecting section 15 is connected to the connecting base 14, and the other end of the connecting section 15 is rotatably connected to the transfer section 11. The connecting base 14 is connected to one side of the polishing machine to fix the support arm 10 on the polishing machine. There are various connection methods between the connecting base 14 and the polishing machine, such as screw connection, etc., which are prior arts. The transfer section 11 is connected to the connecting base 14 through the connecting section 15, so that there is a certain distance between the transfer section 11 and the polishing machine to avoid interference during use.

[0042] As one embodiment, the transfer drive 17 is fixed to the connecting section 15, and the transfer drive 17 is in transmission connection with the transfer section 11. The transfer drive 17 is fixed on the connecting section 15.

[0043] In summary, the embodiment of the present utility model provides a support device and its polishing machine. The support arm 10 is used to support the suction attachment 30 and the support frame 20, and drives the suction attachment 30 and the support frame 20 to move after adsorbing the ceramic disc 52. The support frame 20 is provided with an installation cavity 24, and the suction attachment 30 is located in the installation cavity 24. The installation cavity 24 provides an installation space for the suction attachment 30. The same end of the support frame 20 is provided with a bearing suction port 21 and a bearing surface 23. The bearing surface 23 is used to bear the ceramic disc 52. The suction end 32 of the suction attachment 30 is exposed through the bearing suction port 21 and adsorbs the ceramic disc 52 to fix the ceramic disc 52, prevent the ceramic disc 52 from moving relative to the support frame 20 during the transfer process, and thus realize the transfer of the ceramic disc 52 from the support device to the unloading table 51, avoiding the personnel safety risks during the process of receiving and transferring the ceramic disc 52, and improving the work efficiency at the same time.

[0044] The above are only the preferred embodiments of the present utility model. It should be noted that for those of ordinary skill in the art, without departing from the technical principle of the present utility model, several improvements and replacements can still be made, and these improvements and replacements should also be regarded as the protection scope of the present utility model.

Claims

1. A support device, characterized in that: It includes a support arm, a support frame and an adsorbing member. The adsorbing member and the support frame are connected to the same end of the support arm. The support frame is provided with a carrying adsorption port and a carrying surface. The carrying adsorption port and the carrying surface are located at the same end of the support frame. An installation cavity is provided in the support frame, and the installation cavity communicates with the carrying adsorption port. The adsorbing member is installed in the installation cavity and is exposed through the carrying adsorption port.

2. The support device according to claim 1, wherein: The support frame includes a carrying disc and support rods. One end of the support rod is connected to one end of the support arm, and the other end of the support rod is connected to the carrying disc. The carrying surface and the carrying adsorption port are arranged at the same end of the carrying disc.

3. The support device according to claim 2, characterized in that: There are multiple support rods. One ends of adjacent support rods are circumferentially spaced and connected along the outer peripheral surface of the support arm, and the other ends of adjacent support rods are circumferentially spaced and connected along the circumference of the carrying disc.

4. The support device according to claim 2, characterized in that: One end of the support arm is connected with an adsorption installation pipe. The adsorption installation pipe is installed in the installation cavity. The adsorbing member is connected inside the adsorption installation pipe. The adsorbing member is provided with an adsorption end. One end of the adsorption installation pipe extends to the carrying adsorption port, and the adsorption end is exposed through the carrying adsorption port.

5. The support device according to claim 4, wherein: The support arm is connected with a wetting spray pipe. The wetting spray pipe is provided with a liquid inlet and a spray port. The liquid inlet communicates with the spray port. At least a part of the wetting spray pipe extends into the installation cavity, and the spray port is arranged towards the carrying adsorption port.

6. The support device according to claim 5, wherein: The carrying adsorption port is provided with a spray area. The spray area is located radially between the adsorption end and the carrying disc, and the spray port is arranged towards the spray area.

7. The support device according to claim 1, characterized in that: The support arm includes a transfer section, a carrying section and a support base. The support frame is connected to one end of the carrying section. The other end of the carrying section is connected to the transfer section. The other end of the transfer section is rotatably connected to the support base. The transfer section and the carrying section are arranged perpendicular to each other and are rotatably connected.

8. The support device according to claim 7, wherein: The support arm further includes a flipping drive and a transfer drive. The transfer section is rotatably connected to the support base through the transfer drive, and the carrying section is rotatably connected to the transfer section through the flipping drive.

9. The support device according to claim 7, wherein: The support base includes a connection base and a connection section. The connection section has the same extending direction as the carrying section. One end of the connection section is connected to the connection base, and the other end of the connection section is rotatably connected to the transfer section.

10. A polishing machine, characterized in that: It includes a polishing machine body and the support device according to any one of claims 1-9. One end of the support arm is connected to the side surface of the polishing machine body.

Images