Gas layering diffuser and preheating cavity

Abstract

The utility model discloses a gas layering diffuser and a preheating cavity. The gas layering diffuser is used for supplying gas to n layers of sub-cavities of equipment and comprises an inner pipe, an outer pipe, a top wall and a bottom wall, the inner pipe and the outer pipe are concentrically nested, the inner pipe forms a gas inlet port on one side of the top wall, the top wall seals an annular cavity between the first tail end of the inner pipe and the first tail end of the outer pipe, and the bottom wall seals the annular cavity between the first tail end of the inner pipe and the first tail end of the outer pipe. The bottom wall seals the second tail end of the inner pipe and the second tail end of the outer pipe, the inner pipe is provided with a first air hole array, and the outer pipe is provided with a second air hole array corresponding to the n layers of sub-cavities, and the radial distance between the second air hole array and the first air hole array is at least a preset angle; the axial distance between the first air holes in the first air hole array is decreased along with increasing of the distance from the air inlet port. According to the utility model, the gas supply uniformity of each layer of sub-cavity, the heating uniformity and the heating efficiency can be improved.

Description

Technical Field

[0001] The utility model relates to the field of photovoltaic manufacturing, in particular to a gas stratified diffuser and a preheating chamber. Background Art

[0002] In the manufacturing of heterojunction solar cells, a Plasma Enhanced Chemical Vapor Deposition (PECVD) process needs to be carried out through a PECVD device to deposit P-type amorphous silicon, N-type amorphous silicon and intrinsic I-type amorphous silicon thin films on silicon wafers. The PECVD process is carried out at a temperature of 200-250 degrees Celsius. Heating in the PECVD process chamber takes a long time to reach the predetermined temperature, which will reduce production capacity. Therefore, a preheating chamber needs to be set before the PECVD process chamber for preheating, so as to effectively reduce the heating time in the PECVD process chamber.

[0003] The preheating chambers in the prior art usually correspond to multiple layers of trays and are provided with multiple heating sub-chambers. Hydrogen is introduced into the preheating chamber to improve the heat conduction efficiency. In the prior art, hydrogen is usually introduced from the top of the preheating chamber and then diffuses to each layer of the heating sub-chamber through its own flow. As a result, there are differences in the flow rate of hydrogen on the surface of each layer of the tray, resulting in a large problem in the preheating uniformity of each layer of silicon wafers.

[0004] Therefore, how to provide a gas stratified diffuser and a preheating chamber to improve the uniformity of gas supply, heating uniformity and heating efficiency for each layer of sub-chambers has become an urgent technical problem in the industry. Summary of the Utility Model

[0005] In view of the above problems of the prior art, the utility model proposes a gas stratified diffuser for respectively supplying gas to n layers of sub-chambers of a device, including an inner tube, an outer tube, a top wall and a bottom wall. The inner tube and the outer tube are concentrically nested. The inner tube forms an air inlet port on one side of the top wall. The top wall seals the annular cavity between the first ends of the inner tube and the outer tube. The bottom wall seals the second ends of the inner tube and the outer tube. The inner tube is provided with a first pore array, and the outer tube is provided with a second pore array corresponding to n layers of sub-chambers and radially spaced from the first pore array by at least a predetermined angle. The axial distance between the first pores in the first pore array decreases as the distance from the air inlet port increases.

[0006] In one embodiment, the axial distance between the first pores in the first pore array starts from 80-90 mm and gradually decreases with a tolerance of 3-5 mm as the axial distance from the air inlet port increases.

[0007] In one embodiment, the n-layer sub-cavity of the device is a 4-layer sub-cavity or a 6-layer sub-cavity, and the predetermined angle between the first pore array and the second pore array is greater than or equal to 120 degrees.

[0008] In one embodiment, the first pore array includes three rows of axially first pores, the second pore array includes three rows of axially second pores, any row of axially first pores in the first pore array is 180 degrees apart from the corresponding row of axially second pores in the second pore array, and the radial distance range between each row of axially first pores and between each row of axially second pores is 3-5 mm.

[0009] In one embodiment, the second pore array correspondingly forms n pore partitions for supplying gas to each sub-cavity. The axial spacing range between adjacent second pores in each pore partition is 10-15 mm, the axial distance range between each pore partition is 100-200 mm, the length range of the outer tube is 1.5-2 m, the inner tube extends beyond the top wall to form the intake port, the length range of the intake port is 20-30 mm, and the pore diameter range of the first pores and the second pores is 3-5 mm.

[0010] In one embodiment, the inner tube and the bottom wall are of an integral structure, and the thickness range of the bottom wall is 15-25 mm.

[0011] In one embodiment, the outer diameter range of the inner tube is 32-35 mm, its inner diameter range is 24-27 mm, its tube thickness is 8-11 mm, the outer diameter range of the outer tube is 59-62 mm, its inner diameter range is 51-54 mm, and its tube thickness is 8-11 mm.

[0012] The present utility model also discloses a preheating chamber, which includes an n-layer sub-cavity and a gas stratified diffuser arranged in the inner edge area of the preheating chamber for supplying heat transfer gas to the n-layer sub-cavity. A heating carrier platform is arranged at the bottom end of each layer of sub-cavity, and a carrier plate carrying a silicon wafer is transported to the heating carrier platform for heating. The gas stratified diffuser is the gas stratified diffuser described in any one of the above.

[0013] In one embodiment, the heat transfer gas is hydrogen. The intake port of the inner tube of the gas stratified diffuser is connected to a hydrogen supply pipe, and the air extraction port is arranged in the middle of the bottom of the preheating chamber.

[0014] In one embodiment, a fixed base is provided on the bottom surface of the preheating chamber, and the fixed base includes a fixing ring, a base bottom wall and a base side wall. The fixing ring is used to insert the gas stratified diffuser, and a plurality of threaded holes are provided on the side surface of the bottom wall of the gas stratified diffuser. The fixing ring is correspondingly provided with a fixing ring through hole. The gas stratified diffuser is fixed to the fixing ring by a first fixing piece passing through the fixing ring through hole, and the fixed base is fixed to the bottom surface of the preheating chamber by a second fixing piece passing through the bottom wall of the base.

[0015] Compared to the prior art method of supplying gas from the top, which results in uneven gas supply to each layer of sub-cavity and leads to low heating uniformity and heating efficiency, the gas stratified diffuser of the present invention is used to supply gas to n layers of sub-cavities of the equipment separately. It includes an inner tube, an outer tube, a top wall, and a bottom wall. The inner tube and the outer tube are concentrically nested. The inner tube extends beyond the top wall to form an air inlet port. The top wall seals the annular cavity between the first end of the inner tube and the first end of the outer tube. The bottom wall seals the second end of the inner tube and the second end of the outer tube. The inner tube is provided with a first array of air holes. The outer tube is provided with a second array of air holes corresponding to the n layers of sub-cavities, which is radially spaced at least a predetermined angle from the first array of air holes. The axial spacing between the first air holes in the first array of air holes decreases as the distance from the top wall increases. The present invention can improve the uniformity of gas supply to each layer, the uniformity of heating, and the heating efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] The above features and advantages of the present invention can be better understood after reading the detailed description of the embodiments of the present disclosure in conjunction with the following drawings. In the drawings, the components are not necessarily drawn to scale, and components with similar related properties or characteristics may have the same or similar reference numerals.

[0017] Figure 1 This is a schematic diagram of the composition structure of a gas stratified diffuser embodiment of the present utility model;

[0018] Figure 2 for Figure 1 Schematic diagram of the local composition structure;

[0019] Figure 3 To follow Figure 1 A schematic diagram of a cross-sectional structure formed by cutting the gas stratified diffuser along the cutting line BB in FIG.

[0020] Figure 4 To follow Figure 1 A schematic diagram of a cross-sectional structure formed by cutting the gas stratified diffuser through the cutting line CC in FIG.

[0021] Figure 5 This is a schematic diagram of the three-dimensional structure of a preheating chamber embodiment of the present utility model;

[0022] Figure 6 is a schematic structural diagram of the composition of an embodiment of the preheating chamber of the present utility model; and

[0023] Figure 7 is Figure 1 a partial three-dimensional structural diagram of the gas stratification diffuser in [reference] fixed on the bottom surface of the preheating chamber. Specific Embodiments

[0024] The following specific embodiments illustrate the implementation manners of the present utility model. Those skilled in the art can easily understand other advantages and effects of the present utility model from the content disclosed in this specification. Although the description of the present utility model will be introduced in conjunction with preferred embodiments, this does not mean that the features of this utility model are limited to this implementation manner. On the contrary, the purpose of introducing the utility model in conjunction with the implementation manner is to cover other alternatives or modifications that may be extended based on the claims of the present utility model. To provide a deep understanding of the present utility model, many specific details will be included in the following description. The present utility model can also be implemented without using these details. In addition, to avoid confusing or obscuring the key points of the present utility model, some specific details will be omitted in the description.

[0025] In the description of the present utility model, it should be noted that unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the communication inside two components. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific situations.

[0026] In addition, the "upper", "lower", "left", "right", "top", "bottom", "horizontal", and "vertical" used in the following description should be understood as the orientations shown in this paragraph and the related drawings. This relative term is only for convenience of description and does not represent that the device described needs to be manufactured or operated in a specific orientation. Therefore, it should not be understood as a limitation to the present utility model.

[0027] It can be understood that although the terms "first", "second", "third", etc. can be used here to describe various components, regions, layers, and / or parts, these components, regions, layers, and / or parts should not be limited by these terms, and these terms are only used to distinguish different components, regions, layers, and / or parts. Therefore, the first component, region, layer, and / or part discussed below can be referred to as the second component, region, layer, and / or part without departing from some embodiments of the present utility model.

[0028] Please refer to Figures 1 to 4, Figure 1 This is a schematic diagram of the composition structure of a gas stratified diffuser embodiment of the present utility model. Figure 2 for Figure 1 Schematic diagram of the local composition structure, Figure 3 、 Figure 4 Along Figure 1 The cross-sectional structure diagram of the gas stratified diffuser formed by the cutting lines BB and CC in FIG. Figures 1 to 3 As shown, the gas stratified diffuser 1 of the present invention is used to supply gas to n layers of sub-cavities in a device. It includes an inner tube 10, an outer tube 12, a top wall 14, and a bottom wall 16. The inner tube 10 and the outer tube 12 are concentrically nested. The inner tube 10 forms an air inlet port 100 on one side of the top wall 14. The top wall 14 seals the annular cavity between the first end E1 of the inner tube 10 and the first end E1 of the outer tube 12. The bottom wall 16 seals the second end E2 of the inner tube 10 and the second end E2 of the outer tube 12. The inner tube 10 is provided with a first air hole array 101. The outer tube 12 is provided with a second air hole array 120 corresponding to the n layers of sub-cavities, radially spaced at least a predetermined angle from the first air hole array 101. The axial spacing between the first air holes 105 in the first air hole array 101 decreases with increasing distance from the air inlet port 100. In this embodiment, the inner tube 10 extends beyond the top wall 14 to form the air inlet port 100. In other embodiments, the air inlet port of the inner tube 10 may be flush with the top wall 14 , and an internal thread may be formed on the inner wall of the inner tube 10 accordingly.

[0029] The axial spacing between the first air holes 105 in the first air hole array 101 starts at 80-90 mm and gradually decreases with a tolerance of 3-5 mm as the axial distance from the air inlet port 100 increases. The axial spacing between the first air holes 105 farthest from the air inlet port 100 can be 8-10 mm.

[0030] The n-layer sub-cavity of the device is a 4-layer sub-cavity or a 6-layer sub-cavity, and the predetermined angle between the first pore array 101 and the second pore array 120 is greater than or equal to 120 degrees. The first pore array 101 includes three rows of axially first pores 102, 103, 104, and the second pore array 120 includes three rows of axially second pores 122, 123, 124. Any row of axially first pores 102, 103, 104 in the first pore array 101 is 180 degrees apart from the corresponding row of axially second pores 124, 123, 122 in the second pore array 120. The radial distance range between each row of axially first pores 105 is 3-5 mm, that is, the radial distance range between adjacent rows of axially first pores 102, 103, 104 is 3-5 mm. The radial distance range between each row of axially second pores 121 is 3-5 mm, that is, the radial distance range between adjacent rows of axially second pores 122, 123, 124 is 3-5 mm.

[0031] The second pore array 120 correspondingly forms n pore partitions 125 for supplying gas to each sub-cavity. The axial spacing range between adjacent second pores 121 in each pore partition 125 is 10-15 mm, and the axial distance range between each pore partition 125 is 100-200 mm. The length range of the outer tube 12 is 1.5-2 m, and the length range of the inner tube 10 extending beyond the intake port 100 of the outer tube 12 is 20-30 mm. The pore diameter range of the first pores 105 and the second pores 121 is 3-5 mm.

[0032] The inner tube 10 and the bottom wall 16 are of an integral structure, and the thickness range of the bottom wall 16 is 15-25 mm. The outer diameter range of the inner tube 10 is 32-35 mm, its inner diameter range is 24-27 mm, and its tube thickness is 8-11 mm. The outer diameter range of the outer tube 12 is 59-62 mm, its inner diameter range is 51-54 mm, and its tube thickness is 8-11 mm.

[0033] See Figure 4 , and a plurality of threaded holes 160 are provided on the side surface of the bottom wall 16 so as to fix the gas stratification diffuser 1 to the bottom of the device cavity such as the preheating cavity through bolts or screws.

[0034] During use Figure 1 and Figure 3When installing the gas stratified diffuser 1, first provide an inner tube 10 that has a first pore array 101 and is integral with the bottom wall 16, and provide an outer tube 12 that has a second pore array 120. Nest the inner tube 10 and the outer tube 12 concentrically, and ensure that any row of axial first pores 102, 103, 104 in the first pore array 101 is 180 degrees apart from the corresponding row of axial second pores 124, 123, 122 in the second pore array 120. The top wall 14 and the bottom wall 16 seal the first end E1 and the second end E2 of the inner tube 10 and the outer tube 12 respectively. Introduce gas (such as heat transfer gas) into the inner tube 10 from the intake port 101. After buffering in the inner tube 10, it is discharged from its first pore array 101 into the annular cavity between the inner tube 10 and the outer tube 12. After buffering in the annular cavity, it enters the n-layer sub-cavity of the device through the second pore array 120. The gas (such as heat transfer gas) is basically evenly distributed in each layer of sub-cavity, and finally is discharged from the device through the exhaust port in the middle of the bottom of the device.

[0035] See Figure 5 and Figure 6 , which are respectively the three-dimensional structural schematic diagram and the component structural schematic diagram of the preheating cavity embodiment of the present invention. As Figure 5 and Figure 6 shown, the preheating cavity 2 of the present invention includes n layers of sub-cavities 20 and a gas stratified diffuser 1 provided in the inner edge area of the preheating cavity for supplying heat transfer gas to the n layers of sub-cavities 20. A heating carrier platform 22 is provided at the bottom end of each layer of sub-cavity 20. The carrier plate 3 carrying the silicon wafer is conveyed to the heating carrier platform 20 for heating. The structure of the gas stratified diffuser 1 is as Figures 1 to 4 shown.

[0036] The heat transfer gas is hydrogen. The intake port 100 of the gas stratified diffuser 1 is connected to a hydrogen supply pipe, and the air extraction port 24 is provided in the middle of the bottom of the preheating cavity 2.

[0037] See Figure 7 , which is Figure 1 The partial three-dimensional structural schematic diagram of the gas stratified diffuser fixed on the bottom surface of the preheating cavity in. As Figure 7 shown, a fixed base 24 is provided on the bottom surface of the preheating cavity 2. As Figure 7 shown, the fixed base 24 includes a fixing ring 240, a base bottom wall 242, and a base side wall 244. The fixing ring 240 is used to insert the gas stratified diffuser 1. A plurality of threaded holes 160 are provided on the side surface of the bottom wall 16 of the gas stratified diffuser 1. The fixing ring 240 is correspondingly provided with a fixing ring through hole 240A. The gas stratified diffuser 1 is fixed on the fixing ring 240 by a first fixing member 246 passing through the fixing ring through hole 240A, and the fixed base 24 is fixed on the bottom surface of the preheating cavity 2 by a second fixing member 248 passing through the base bottom wall 242.

[0038] In summary, the gas stratified diffuser of the present utility model is used to supply gas to the n-layer sub-chambers of the device, and it includes an inner tube, an outer tube, a top wall, and a bottom wall. The inner tube and the outer tube are concentrically nested. The inner tube forms an air inlet port on one side of the top wall. The top wall seals the annular cavity between the first ends of the inner tube and the outer tube. The bottom wall seals the second ends of the inner tube and the outer tube. The inner tube is provided with a first air hole array, and the outer tube is provided with a second air hole array corresponding to the n-layer sub-chambers and radially spaced from the first air hole array by at least a predetermined angle. The axial distance between the first air holes in the first air hole array decreases as the distance from the air inlet port increases. The present utility model can improve the uniformity of gas supply, heating uniformity, and heating efficiency for each layer.

[0039] The foregoing description of the disclosure is provided to enable any person skilled in the art to make or use the disclosure. Various modifications to the disclosure will be readily apparent to those skilled in the art, and the general principles defined herein may be applied to other variations without departing from the spirit or scope of the disclosure. Thus, the disclosure is not intended to be limited to the examples and designs described herein, but should be accorded the widest scope consistent with the principles and novel features disclosed herein. The above embodiments are provided for those skilled in the art to implement or use the present utility model. Those skilled in the art can make various modifications or changes to the above embodiments without departing from the inventive concept of the present utility model. Therefore, the protection scope of the present utility model is not limited by the above embodiments, but should be the maximum scope that conforms to the innovative features mentioned in the claims.

Claims

1. A gas stratified diffuser for supplying gases to the n-layer sub-chambers of a device respectively, characterized in that, It includes an inner tube, an outer tube, a top wall and a bottom wall. The inner tube and the outer tube are concentrically nested. The inner tube forms an air inlet port on one side of the top wall. The top wall seals the annular cavity between the first ends of the inner tube and the outer tube. The bottom wall seals the second ends of the inner tube and the outer tube. The inner tube is provided with a first air hole array, and the outer tube is provided with a second air hole array corresponding to n layers of sub-cavities and radially spaced from the first air hole array by at least a predetermined angle. The axial spacing between the first air holes in the first air hole array decreases as the distance from the air inlet port increases.

2. The gas stratified diffuser according to claim 1, wherein The axial spacing between the first air holes in the first air hole array starts from 80 - 90 mm and gradually decreases with a tolerance of 3 - 5 mm as the axial distance from the air inlet port increases.

3. The gas stratified diffuser according to claim 1, wherein, The n layers of sub-cavities of the device are 4 layers of sub-cavities or 6 layers of sub-cavities, and the predetermined angle between the first air hole array and the second air hole array is greater than or equal to 120 degrees.

4. The gas stratification diffuser according to claim 3, wherein, The first air hole array includes three rows of axial first air holes, the second air hole array includes three rows of axial second air holes. Any row of axial first air holes in the first air hole array is 180 degrees apart from the corresponding row of axial second air holes in the second air hole array. The radial distance range between each row of axial first air holes and between each row of axial second air holes is 3 - 5 mm.

5. The gas stratified diffuser according to claim 1, characterized in that, The second air hole array correspondingly forms n air hole partitions for supplying gas to each sub-cavity. The axial spacing range between adjacent second air holes in each air hole partition is 10 - 15 mm, and the axial distance range between each air hole partition is 100 - 200 mm. The length range of the outer tube is 1.5 - 2 m. The inner tube extends beyond the top wall to form the air inlet port, and the length range of the air inlet port is 20 - 30 mm. The aperture range of the first air holes and the second air holes is 3 - 5 mm.

6. The gas stratified diffuser according to claim 1, wherein The inner tube and the bottom wall are of an integral structure, and the thickness range of the bottom wall is 15 - 25 mm.

7. The gas stratified diffuser according to claim 1, wherein The outer diameter range of the inner tube is 32 - 35 mm, its inner diameter range is 24 - 27 mm, and its tube thickness is 8 - 11 mm. The outer diameter range of the outer tube is 59 - 62 mm, its inner diameter range is 51 - 54 mm, and its tube thickness is 8 - 11 mm.

8. A preheating chamber, comprising n layers of sub-chambers and a gas stratified diffuser disposed in the inner edge region of the preheating chamber for supplying heat transfer gas to the n layers of sub-chambers. A heating carrier platform is provided at the bottom end of each layer of sub-chamber. A carrier plate carrying a silicon wafer is conveyed to the heating carrier platform for heating. It is characterized in that, The gas stratified diffuser is the gas stratified diffuser according to any one of claims 1 to 7.

9. The preheating chamber according to claim 8, characterized in that, The heat transfer gas is hydrogen. The air inlet port of the inner tube of the gas stratified diffuser is connected to a hydrogen supply pipe, and the air extraction port is arranged in the middle of the bottom of the preheating chamber.

10. The preheating chamber according to claim 8, characterized in that, A fixed base is arranged on the bottom surface of the preheating chamber. The fixed base includes a fixing ring, a base bottom wall and a base side wall. The fixing ring is used for inserting the gas stratified diffuser. A plurality of threaded holes are arranged on the side surface of the bottom wall of the gas stratified diffuser. The fixing ring is correspondingly provided with fixing ring through holes. The gas stratified diffuser is fixed on the fixing ring by a first fixing member passing through the fixing ring through holes, and the fixed base is fixed on the bottom surface of the preheating chamber by a second fixing member passing through the base bottom wall.

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