Assembly line type double-head plasma cleaning machine
The design of the assembly line-type dual-head plasma cleaning machine solves the problem of exhaust gas pollution during plasma cleaning, realizes timely recovery and effective filtration of exhaust gas, ensures cleaning quality and operational safety, and reduces environmental pollution and health risks.
Patent Information
- Application Number
- CN202520026374.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-01-06
- Publication Date
- 2026-01-06
- Estimated Expiration
- 2035-01-06
AI Technical Summary
The exhaust gas generated during plasma cleaning contains harmful components such as ozone and volatile organic compounds. Direct emission of these gases will pollute the environment and endanger the health of operators.
A streamlined dual-head plasma cleaning machine was designed, comprising a conveying component, a cleaning component, a recovery component, and a filtration component. The recovery component collects waste gas in a timely manner, the filtration component removes harmful substances, and a closed space is formed to prevent leakage, ensuring cleaning quality and operational safety.
It effectively removes harmful substances from exhaust gas, reduces environmental pollution, protects the health of operators, improves cleaning quality and equipment safety, and ensures that exhaust gas meets environmental emission standards.
Smart Images

Figure CN223761706U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of cleaning equipment technology, and in particular to a production line type dual-head plasma cleaning machine. Background Technology
[0002] Plasma cleaning processes generate waste gases that may contain harmful components such as ozone and volatile organic compounds (VOCs). If these waste gases are directly released into the air, they will pollute the environment and endanger the health of operators. Utility Model Content
[0003] Therefore, the purpose of this utility model is to provide a production line type dual-head plasma cleaning machine with good cleaning effect.
[0004] The present invention adopts the following technical solution:
[0005] A conveyor-type dual-head plasma cleaning machine includes a conveyor assembly for conveying workpieces, a movable assembly mounted on the conveyor assembly, a cleaning assembly mounted on the movable assembly for cleaning the workpieces on the conveyor assembly, a recovery assembly mounted on the conveyor assembly for recovering waste gas generated during cleaning by the cleaning assembly, and a filter assembly mounted on the conveyor assembly for filtering the recovered waste gas. The recovery assembly is connected to both the cleaning assembly and the filter assembly. The recovery assembly includes a fixed cover mounted on the conveyor assembly for enclosing the movable assembly, the cleaning assembly, and the filter assembly, and a waste gas recovery component mounted inside the fixed cover for connecting the cleaning assembly and the filter assembly.
[0006] Furthermore, the movable component includes a fixed bracket mounted on the conveying component, a Z-axis fixed plate mounted on the fixed bracket, and a Z-axis slide rail mounted on the Z-axis fixed plate; the cleaning component slides on the Z-axis slide rail; the movable component also includes a Z-axis drive unit mounted on the Z-axis fixed plate for driving the cleaning component to slide along the Z-axis slide rail; the sliding direction of the cleaning component is perpendicular to the conveying direction of the conveying component.
[0007] Furthermore, the Z-axis fixing plate is slidably mounted on the fixed bracket; the movable component also includes a Y-axis drive component mounted on the fixed bracket for driving the Z-axis fixing plate to move up and down along the fixed bracket.
[0008] Furthermore, the cleaning assembly includes a support plate slidably mounted on the Z-axis slide rail, a cleaning chamber mounted on the support plate and communicating with the recycling assembly, a vacuum pump mounted in the cleaning chamber, and a plasma generator mounted on the cleaning chamber.
[0009] Furthermore, the exhaust gas recovery component includes an exhaust gas transmission pipe installed on the fixed cover and communicating with the filter assembly, and an exhaust gas collection pipe installed on the top of the exhaust gas transmission pipe with an opening facing the cleaning assembly; the exhaust gas transmission pipe is installed inside the fixed cover.
[0010] Furthermore, the filtration assembly includes a filter housing mounted on the conveying assembly and connected to the exhaust gas transmission pipe, a filter element disposed within the filter housing, and a filter cartridge disposed within the filter housing; the filter cartridge is disposed at the bottom of the filter element.
[0011] Furthermore, a drain port is provided on the filter housing opposite the bottom of the filter element, and the filter assembly also includes a drain pipe that communicates with the bottom of the filter element, with the free end of the drain pipe extending out along the drain port.
[0012] Furthermore, the filter element includes an adsorbent material layer and a catalytic decomposition material layer disposed within the filter housing, wherein the catalytic decomposition material layer is disposed between the adsorbent material layer and the filter element.
[0013] Furthermore, the assembly line type dual-head plasma cleaning machine also includes an alarm device installed on the fixed cover.
[0014] The beneficial effects of this utility model are as follows:
[0015] The automated dual-head plasma cleaning machine of this invention features a recovery component that promptly collects the generated waste gas during the cleaning process, preventing pollutants in the waste gas from re-adhering to the already cleaned components. This ensures that the surfaces of the cleaned components are clean and tidy, helping to maintain the stability and consistency of the cleaning quality. The filtration component treats the recovered waste gas, effectively removing harmful substances such as ozone and volatile organic compounds. The filtered waste gas meets environmental emission standards, reducing pollution to the atmospheric environment. Attached Figure Description
[0016] Figure 1 This is a three-dimensional schematic diagram of a conveyor-type dual-head plasma cleaning machine according to an embodiment of the present invention;
[0017] Figure 2 for Figure 1 A 3D schematic diagram of a streamlined dual-head plasma cleaner after removing the fixing cover;
[0018] Figure 3 for Figure 1 Exploded view of the moving parts and cleaning parts of a streamlined dual-head plasma cleaner;
[0019] Figure 4 for Figure 1A three-dimensional schematic diagram of the filter components of a streamlined dual-head plasma cleaner;
[0020] Figure 5 for Figure 4 Left sectional view of the filter component;
[0021] Figure 6 for Figure 1 A three-dimensional schematic diagram of the recycling component of a streamlined dual-head plasma cleaning machine. Detailed Implementation
[0022] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.
[0023] In the description of this utility model, it should be noted that the terms "vertical direction," "up," "down," and "horizontal," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. In addition, "first," "second," "third," and "fourth" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.
[0024] In the description of this utility model, it should also be noted that, unless otherwise explicitly specified and limited, the terms "set," "install," "connect," and "link" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or a connection through an intermediate medium; and they can refer to the internal communication between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.
[0025] Please see Figures 1 to 6This utility model discloses a conveyor-type dual-head plasma cleaning machine according to one embodiment of the present invention. It includes a conveyor assembly 10 for conveying workpieces, a movable assembly 20 mounted on the conveyor assembly 10, a cleaning assembly 30 mounted on the movable assembly 20 for cleaning the workpieces on the conveyor assembly 10, a recovery assembly 40 mounted on the conveyor assembly 10 for recovering waste gas generated during cleaning by the cleaning assembly 30, and a filter assembly 50 mounted on the conveyor assembly 10 for filtering the waste gas recovered from the recovery assembly 40. The recovery assembly 40 is connected to both the cleaning assembly 30 and the filter assembly 50. The recovery assembly 40 includes a fixed cover 41 mounted on the conveyor assembly 10 to cover the movable assembly 20, the cleaning assembly 30, and the filter assembly 50, and a waste gas recovery component 42 mounted inside the fixed cover 41 to connect the cleaning assembly 30 and the filter assembly 50. In this embodiment, there are two waste gas recovery components 42, which are respectively disposed on the fixed cover 41 on both sides of the cleaning assembly 30.
[0026] The working principle of this utility model's assembly line type dual-head plasma cleaning machine is as follows: The conveyor assembly 10 conveys the workpiece at a set speed and direction; when the workpiece is conveyed to the position of the cleaning assembly 30, the movable assembly 20 installed on the conveyor assembly 10 can adjust the position and angle of the cleaning assembly 30, enabling the cleaning assembly 30 to accurately align with the workpiece; the cleaning assembly 30 generates plasma by ionizing gas; this plasma has high energy and chemical activity, capable of physically impacting or chemically reacting with contaminants on the workpiece surface, thereby removing the contaminants; for example, for organic contaminants, the active particles in the plasma can decompose them into small molecule gases, such as carbon dioxide and water, which are then extracted from the cleaning area; during the cleaning process of the cleaning assembly 30, waste gas is generated; this waste gas may contain... The plasma cleaning process includes unreacted gases, reaction byproducts (such as ozone and other harmful gases), and cleaned-off pollutant particles. The recovery component 40 is connected to the cleaning component 30 via a pipe or suction device, using negative pressure to collect the waste gas. The waste gas is drawn into the recovery component 40 to prevent leakage into the surrounding environment, thus ensuring workplace air quality and the health of operators. After collecting the waste gas, the recovery component 40 transports it to the filter component 50, which filters and discharges the waste gas. During plasma cleaning, some harmful gases and substances, such as ozone and nitrogen oxides, may be generated. The fixed cover 41 encloses the moving component 20, the cleaning component 30, and the filter component 50, forming a relatively enclosed space to prevent these harmful gases from leaking into the surrounding environment.
[0027] Compared to existing technologies, this utility model's assembly line dual-head plasma cleaning machine features a unique design. During the cleaning process, the recovery component 40 promptly collects the generated waste gas, preventing pollutants from re-adhering to the cleaned components. This ensures the cleaned component surfaces remain clean and helps maintain the stability and consistency of cleaning quality. The filtration component 50 treats the recovered waste gas, effectively removing harmful substances such as ozone and volatile organic compounds. The filtered waste gas meets environmental emission standards, reducing atmospheric pollution. By recovering and filtering the waste gas, the concentration of harmful gases in the workplace air is reduced, lowering the risk of operators being exposed to harmful environments. The movable component 20, mounted on the conveyor component 10, allows for flexible adjustment of the cleaning component 30's position and angle. This enables the cleaning component 30 to be precisely positioned according to the workpiece's shape, size, and cleaning requirements, ensuring that the plasma acts evenly and comprehensively on the component surface, thereby improving cleaning quality. The conveyor component 10 allows the workpiece to flow within the cleaning machine at a stable speed and rhythm, achieving continuous cleaning. This eliminates the time spent on manual loading, unloading, and positioning operations in traditional cleaning methods, enabling comprehensive cleaning. The process is more compact and efficient; the fixed hood 41 covers the moving components 20, cleaning components 30, and filter components 50, forming a relatively enclosed space, which can effectively prevent these harmful gases from leaking into the surrounding environment and avoid operators coming into contact with harmful gases, thereby protecting the health and safety of operators; during the plasma cleaning process, some flammable and explosive gases or substances may be generated; the fixed hood 41 can confine these potentially hazardous substances inside the hood, reduce contact with outside air, reduce the risk of fire or explosion, and improve the safety of equipment operation; the presence of the fixed hood 41 makes... The waste gas generated during the cleaning process by the cleaning component 30 can be collected more centrally; the waste gas recovery component 42 is installed inside the fixed cover 41 and is directly connected to the cleaning component 30, which can collect the waste gas in a timely and effective manner, avoiding the diffusion and leakage of waste gas inside the equipment, thereby improving the collection efficiency of waste gas; the fixed cover 41 is connected to the conveying component 10 to form a relatively sealed space, reducing the possibility of waste gas leaking from the cover into the surrounding environment; this not only helps to protect the environment, but also ensures that the waste gas can be fully collected and transported to the filter component 50 for treatment, improving the effect and reliability of waste gas treatment.
[0028] Please see Figure 2 and Figure 3The movable component 20 includes a fixed bracket 21 mounted on the conveying component 10, a Z-axis fixed plate 22 mounted on the fixed bracket 21, and a Z-axis slide rail 23 mounted on the Z-axis fixed plate 22; the cleaning component 30 is slidably mounted on the Z-axis slide rail 23; the movable component 20 also includes a Z-axis drive component 24 mounted on the Z-axis fixed plate 22 for driving the cleaning component 30 to slide along the Z-axis slide rail 23; the sliding direction of the cleaning component 30 is perpendicular to the conveying direction of the conveying component 10. The sliding direction of the cleaning component 30 is perpendicular to the conveying direction of the conveying component 10. This allows the cleaning component 30 to cover the entire width of the component from the side during component conveying. Like brushing across an item on a conveyor belt perpendicular to its direction, it provides comprehensive cleaning for each component, avoiding blind spots and further improving the integrity and accuracy of the cleaning. During component conveying, the position of the cleaning component 30 on the Z-axis slide rail 23 is dynamically adjusted. This allows for optimal contact and cleaning effect between the cleaning component 30 and the component surface even as the component moves. For example, for components with regularly undulating surfaces, the cleaning component 30 can slide synchronously along the Z-axis, maintaining an appropriate distance from the component surface, thus improving cleaning efficiency and reducing cleaning time. When multiple components are simultaneously conveyed on the conveying component 10, the cleaning component 30 can perform parallel cleaning of multiple components perpendicular to the conveying direction by sliding on the Z-axis slide rail 23. This parallel processing method is similar to processing multiple columns of data simultaneously, fully utilizing the cleaning capacity of the cleaning component 30 to further improve cleaning efficiency and meet the needs of large-scale production.
[0029] The Z-axis fixed plate 22 is slidably mounted on the fixed bracket 21. The movable component 20 also includes a Y-axis drive unit mounted on the fixed bracket 21 for driving the Z-axis fixed plate 22 to move up and down along the fixed bracket 21. The Z-axis fixed plate 22 can move up and down on the fixed bracket 21 via the Y-axis drive unit. Combined with the previous sliding of the cleaning component 30 on the Z-axis slide rail 23, the cleaning component 30 can now be positioned in two vertical directions (Y-axis and Z-axis). This allows the cleaning component 30 to perform more precise positioning on workpieces with complex shapes and different heights and depths. For example, for a component with a multi-layered stepped structure, the cleaning component 30 can first be adjusted to a suitable height layer via the Y-axis drive unit, and then the sliding of the Z-axis slide rail 23 can be used to precisely clean each part of that layer, thereby achieving comprehensive and thorough cleaning of such complex components. In actual production, workpieces come in various shapes; some components may have inclined surfaces. The Y-axis drive allows the cleaning assembly 30 to move flexibly up and down in the vertical direction, coordinating with the movement in the Z-axis direction to better adapt to these irregular shapes. This ensures that the plasma acts uniformly on the component surface, improving cleaning quality. The presence of the Y-axis drive greatly expands the range of component heights that the cleaning equipment can handle. Whether it is a small precision electronic component or a large industrial part, the position of the Z-axis fixing plate 22 can be adjusted by the Y-axis drive, thereby allowing the cleaning assembly 30 to adapt to the height of the component for effective cleaning. This high compatibility reduces the need to change equipment or adjust complex mechanical structures when cleaning components of different heights, improving the versatility of the equipment.
[0030] The cleaning assembly 30 includes a support plate 31 slidably mounted on the Z-axis slide rail 23, a cleaning chamber 32 mounted on the support plate 31 and communicating with the recovery assembly 40, a vacuum pump mounted in the cleaning chamber 32, and a plasma generator 34 mounted on the cleaning chamber 32. The cleaning chamber 32 is configured to provide a relatively enclosed space for plasma cleaning; this allows the plasma to concentrate within the cleaning chamber 32 and fully react with contaminants on the workpiece surface, thereby enhancing the cleaning effect. Meanwhile, the enclosed cleaning chamber 32 helps maintain a stable cleaning environment, reducing interference from external factors (such as airflow and dust) on the cleaning process and ensuring the consistency and reliability of the cleaning. The vacuum pump installed in the cleaning chamber 32 can reduce the air pressure inside the cleaning chamber 32, creating a near-vacuum environment. In this environment, the generation and propagation of plasma are easier, and the physical and chemical reactions between plasma and contaminants are enhanced, thereby improving cleaning efficiency. The plasma generator 34 can generate plasma, which can chemically react with organic and inorganic contaminants on the surface of the workpiece, decomposing them into small molecules, or physically bombarding contaminants to peel off from the surface of the component, thereby achieving the purpose of cleaning the surface of the component. The cleaning chamber 32 is connected to the recovery component 40, so that the waste gas generated during the cleaning process can be recovered in a timely and effective manner. When plasma cleaning generates waste gas, this waste gas will accumulate in the cleaning chamber 32. Due to the connection between the cleaning chamber 32 and the recovery component 40, under the negative pressure attraction or other driving mechanism of the recovery component 40, the waste gas can be directly transported to the recovery system for treatment, avoiding the accumulation of waste gas in the cleaning chamber 32 or leakage into the surrounding environment.
[0031] Please see Figure 2 and Figure 6 The exhaust gas recovery component 42 includes an exhaust gas transmission pipe 420 installed on the fixed cover 41 and communicating with the filter assembly 50, and an exhaust gas collection pipe 421 installed on the top of the exhaust gas transmission pipe 420, which opens towards the cleaning assembly 30. The exhaust gas transmission pipe 420 is installed inside the fixed cover 41. The exhaust gas collection pipe 421 opens towards the cleaning assembly 30, which allows it to accurately collect the exhaust gas generated during the cleaning process. Like a ventilation duct precisely pointing to the pollution source, it can collect the exhaust gas near the source of the exhaust gas generation, greatly improving the efficiency of exhaust gas collection and reducing the possibility of exhaust gas diffusion and residue within the fixed cover 41. The connection structure between the exhaust gas collection pipe 421 and the exhaust gas transmission pipe 420 provides a clear flow path for the exhaust gas. After the exhaust gas is generated near the cleaning assembly 30, it directly enters the exhaust gas collection pipe 421 and is then transported to the filter assembly 50 through the exhaust gas transmission pipe 420. This direct and orderly flow path reduces turbulent gas flow and avoids the situation where the exhaust gas forms vortices or dead zones within the fixed cover 41 and cannot be effectively collected.
[0032] Please see Figure 4 and Figure 5The filter assembly 50 includes a filter housing mounted on the conveying assembly 10 and connected to the exhaust gas transmission pipe 420, a filter element 52 disposed within the filter housing, and a filter cartridge 53 disposed within the filter housing; the filter cartridge 53 is disposed at the bottom of the filter element 52. The combination of the filter element 52 and the filter cartridge 53 enables staged filtration; the exhaust gas first undergoes preliminary filtration through the filter element 52, where larger particles and impurities can be intercepted or adsorbed. The pre-purified exhaust gas then enters the filter cartridge 53 for further fine filtration, effectively removing smaller pollutant particles and harmful gas molecules, thereby improving the filtration effect, making the discharged gas cleaner, and reducing environmental pollution; the filter cartridge 53 is disposed at the bottom of the filter element 52, and the exhaust gas enters the filter cartridge 53 after passing through the filter element 52, extending the residence time and flow path of the exhaust gas in the filter assembly 50, increasing the contact area and contact time between the exhaust gas and the filter material, making the filtration more thorough, and helping to improve the removal efficiency of pollutants in the exhaust gas.
[0033] A drain port 510 is provided on the filter housing opposite the bottom of the filter element 53. The filter assembly 50 also includes a drain pipe 54 that is connected to the bottom of the filter element 53. The free end of the drain pipe 54 extends out along the drain port 510. The drain port 510 and drain pipe 54 provide a direct discharge channel for pollutants accumulated at the bottom of the filter element 53 during the filtration process. When the filter assembly 50 is working, impurities, particulate matter, and sediments generated during the filtration process in the exhaust gas will gradually accumulate at the bottom of the filter element 53. The drain pipe 54 acts like a dedicated "drainage pipe," which can discharge these pollutants from the filter housing in a timely manner, preventing excessive accumulation of pollutants at the bottom of the filter element 53 and affecting its filtration performance. Without the drain port 510 and drain pipe 54, pollutants would continuously accumulate inside the filter housing, potentially re-mixing into the filtered gas or causing secondary pollution to the filter element 53 and filter element 52. This drainage channel effectively prevents internal pollution accumulation, keeps the inside of the filter assembly 50 clean, and extends the service life of the filter element 53 and filter element 52.
[0034] The filter element 52 includes an adsorption material layer 520 and a catalytic decomposition material layer 521 disposed within the filter housing, with the catalytic decomposition material layer 521 positioned between the adsorption material layer 520 and the filter element 53. The adsorption material layer 520 primarily uses physical adsorption to effectively adsorb harmful substances in the waste gas, such as organic pollutants and odorous substances. The catalytic decomposition material layer 521 utilizes chemical reactions to decompose specific harmful substances in the waste gas into harmless substances. For example, some metal oxide catalysts can catalytically decompose ozone and other harmful gases into oxygen. This synergistic effect of adsorption and catalytic decomposition greatly enhances the purification capacity of the waste gas, enabling the treatment of waste gases with various complex compositions. During plasma cleaning, the composition of the waste gas may vary depending on the cleaning materials and the gases used. The combination of the adsorption material layer 520 and the catalytic decomposition material layer 521 can flexibly address this diversity. Whether it is organic waste gas, inorganic waste gas, or a mixture of harmful gases, the combined effect of these two layers can effectively treat it, improving the adaptability of the filter element 50 to different types of waste gas.
[0035] Please see Figure 1 and Figure 2 The assembly line type dual-head plasma cleaning machine also includes an alarm 60 installed on the fixed cover 41. During the plasma cleaning process, although there is a waste gas recovery and filtration system, unexpected situations may still occur, such as the fixed cover 41 not sealing properly, the waste gas recovery pipe rupture, or the filter component 50 failing, leading to the leakage of harmful gases. The alarm 60 can promptly sound an alarm when a harmful gas leak is detected, reminding operators to take emergency measures, such as evacuation or shutting down the equipment, thereby ensuring the safety of the operators. For situations that may lead to safety accidents, such as excessively high internal temperature or abnormal pressure, when these abnormalities reach the danger threshold, the alarm 60 will sound an alarm, allowing operators to intervene before the problem worsens, such as checking whether the equipment cooling system is normal or adjusting the equipment operating parameters, to avoid serious accidents such as fires and explosions.
[0036] The above description merely illustrates the preferred technical solution of this utility model, and while the description is relatively specific and detailed, it should not be construed as limiting the scope of the utility model patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this utility model, and this utility model also intends to include these modifications and variations.
Claims
1. A pipelined double ended plasma cleaner characterized by, The pipeline double-head plasma cleaning machine comprises a conveying assembly for conveying workpieces, a movable assembly mounted on the conveying assembly, a cleaning assembly mounted on the movable assembly for cleaning the workpieces on the conveying assembly, a recovery assembly mounted on the conveying assembly for recovering waste gas generated during cleaning of the cleaning assembly, and a filtering assembly mounted on the conveying assembly for filtering the waste gas recovered by the recovery assembly; the recovery assembly is in communication with the cleaning assembly and the filtering assembly respectively; the recovery assembly comprises a fixed cover mounted on the conveying assembly for covering the movable assembly, the cleaning assembly and the filtering assembly, and a waste gas recovery member mounted in the fixed cover for communicating the cleaning assembly and the filtering assembly.
2. The inline dual-head plasma cleaner of claim 1, wherein, The movable assembly comprises a fixed support mounted on the conveying assembly, a Z-axis fixed plate mounted on the fixed support, and a Z-axis sliding rail mounted on the Z-axis fixed plate; the cleaning assembly is slidably arranged on the Z-axis sliding rail; the movable assembly further comprises a Z-axis driving member mounted on the Z-axis fixed plate for driving the cleaning assembly to slide along the Z-axis sliding rail; the sliding direction of the cleaning assembly is perpendicular to the conveying direction of the conveying assembly.
3. The inline dual-head plasma cleaner of claim 2, wherein, The Z-axis fixed plate is slidably arranged on the fixed support; the movable assembly further comprises a Y-axis driving member arranged on the fixed support for driving the Z-axis fixed plate to move up and down along the fixed support.
4. The inline dual-head plasma cleaner of claim 3, wherein, The cleaning assembly comprises a support plate slidably arranged on the Z-axis sliding rail, a cleaning cavity mounted on the support plate and in communication with the recovery assembly, a vacuum pump mounted in the cleaning cavity, and a plasma generator mounted on the cleaning cavity.
5. The inline dual-head plasma cleaner of claim 1, wherein, The waste gas recovery member comprises a waste gas transmission pipe mounted on the fixed cover and in communication with the filtering assembly, and a waste gas collecting pipe opening towards the cleaning assembly on the top of the waste gas transmission pipe; the waste gas transmission pipe is mounted in the fixed cover.
6. The inline dual-head plasma cleaner of claim 5, wherein, The filtering assembly comprises a filtering housing mounted on the conveying assembly and in communication with the waste gas transmission pipe, a filtering member arranged in the filtering housing, and a filter core arranged in the filtering housing; the filter core is arranged at the bottom of the filtering member.
7. The inline dual-head plasma cleaner of claim 6, wherein, A blowdown port is arranged on the filtering housing opposite to the bottom of the filter core; the filtering assembly further comprises a blowdown pipe in communication with the bottom of the filter core, and a free end of the blowdown pipe extends out of the blowdown port.
8. The inline dual-head plasma cleaner of claim 7, wherein, The filtering member comprises an adsorption material layer and a catalytic decomposition material layer arranged in the filtering housing; the catalytic decomposition material layer is arranged between the adsorption material layer and the filter core.
9. The inline dual-head plasma cleaner of claim 8, wherein, The pipeline double-head plasma cleaning machine further comprises an alarm arranged on the fixed cover.