Self-cleaning tunnel type baking device for wafer biscuit processing

Abstract

The utility model relates to the technical field of biscuit production, in particular to a self-cleaning tunnel type baking device for wafer biscuit processing, which comprises a conveying belt, a tunnel baking oven and a cleaning mechanism, a rack is arranged on the side edge of the conveying belt, and the conveying belt and the tunnel baking oven are mounted on the rack; a side support is installed at the bottom of the rack, the cleaning mechanism is installed on the side support and comprises a first water tank, a second water tank, a collecting hopper and a plurality of spray heads, the spray heads are located in the collecting hopper, and water outlets of the spray heads face the bottom of the conveying belt. The cleaning mechanism is arranged at the bottom of the conveying belt of the tunnel type biscuit baking equipment to clean and dry the surface of the conveying belt, the sweeping mechanism is used for cleaning the surface of the conveying belt, biscuit residues are prevented from being attached to the conveying belt, and the follow-up biscuit baking quality is prevented from being affected by the residues.

Description

Technical Field

[0001] This utility model relates to the field of biscuit production technology, specifically a self-cleaning tunnel baking device for wafer biscuit processing. Background Technology

[0002] Wafer biscuits, also known as wafer biscuits, are a type of biscuit made primarily from glutinous rice flour, oil, and white sugar. They are characterized by their vibrant color, distinct layers, pure and sweet flavor, fluffy and smooth texture, long shelf life, and rich nutritional value (including vitamins, protein, and fat), but are also relatively high in calories.

[0003] An oven is a device that uses heating wires in a partition to dry objects. It is suitable for baking, drying, and heat treatment in a range of 5–300°C (some are 200°C higher than room temperature). Tunnel ovens, in particular, use a long chamber with hot air circulation and far-infrared heating for temperature control. They are primarily designed for high-volume, high-efficiency baking needs. Tunnel ovens are continuous baking equipment, allowing for uninterrupted baking and improving production efficiency. Therefore, tunnel ovens are commonly used for batch baking of foods such as biscuits and bread.

[0004] Current baking tunnel ovens consist of a preheating chamber, a high-temperature baking chamber, and a cooling chamber. During the baking process, cookie crumbs will stick to the conveyor belt. After cooling in the cooling chamber, the cookie crumbs will stick even more firmly, so these contaminants must be cleaned off. Otherwise, they will accumulate on the conveyor belt, affecting the stable placement of subsequent cookies and the uniformity of oven heating, resulting in a decline in the baking quality of the cookies. Utility Model Content

[0005] The purpose of this invention is to provide a self-cleaning tunnel baking device for wafer biscuit processing, so as to solve the problems mentioned in the background art.

[0006] To achieve the above objectives, this utility model provides the following technical solution:

[0007] A self-cleaning tunnel baking device for wafer biscuit processing includes a conveyor belt, a tunnel oven, and a cleaning mechanism. A frame is provided on the side of the conveyor belt, and the conveyor belt and the tunnel oven are mounted on the frame. A side support is installed at the bottom of the frame, and the cleaning mechanism is mounted on the side support. The cleaning mechanism includes a first water tank, a second water tank, a collection hopper, and several nozzles. The nozzles are located inside the collection hopper, and the outlets of the nozzles face the bottom of the conveyor belt. The drain outlet of the collection hopper is connected to the second water tank, the second water tank is connected to the first water tank, and the first water tank is connected to the nozzles. A filter assembly is provided inside the second water tank.

[0008] As a further embodiment of this utility model: the first water tank is fixedly installed on the side bracket, a water inlet pump is installed at the bottom of the first water tank, the water inlet end of the water inlet pump is connected to the first water tank, the water outlet end of the water inlet pump is connected to the water inlet pipe, and a connecting water pipe is provided at the bottom of the nozzle, the connecting water pipe is connected to the water inlet pipe.

[0009] As a further embodiment of this utility model: a drain pump is installed on the outside of the second water tank, the inlet of the drain pump is connected to the inside of the second water tank, and the drain outlet of the drain pump is connected to the first water tank through a return pipe.

[0010] As a further improvement of this utility model, a heating plate is also installed on the inner side of the side bracket as a far-infrared dryer.

[0011] As a further improvement of this utility model: a water baffle is also fixedly installed on the inner side of the side bracket, and the water baffle is located above the lower side belt of the conveyor belt.

[0012] As a further embodiment of this utility model, it also includes a cleaning mechanism disposed on the discharge side of the conveyor belt. The cleaning mechanism includes a mounting bracket, a cleaning roller and an elastic connecting frame. One end of the elastic connecting frame is fixedly connected to the mounting bracket, and the cleaning roller is rotatably mounted on the other end of the elastic connecting frame. A drive motor for driving the cleaning roller to rotate is provided on the elastic connecting frame.

[0013] As a further improvement of this utility model: the mounting bracket is provided with a feeding baffle below the cleaning roller, and the bottom of the feeding baffle is provided with a discharge port.

[0014] Compared with the prior art, the beneficial effects of this utility model are: by setting a cleaning mechanism at the bottom of the conveyor belt of the tunnel-type biscuit baking equipment to clean and dry the surface of the conveyor belt, and by using a sweeping mechanism to clean the surface of the conveyor belt, the biscuit residue is prevented from adhering to the conveyor belt and from affecting the baking quality of the subsequent biscuits. Attached Figure Description

[0015] Figure 1 A schematic diagram of a self-cleaning tunnel baking device for wafer biscuit processing.

[0016] Figure 2 Side view of a self-cleaning tunnel baking apparatus for wafer biscuit processing.

[0017] Figure 3 A top view of a self-cleaning tunnel baking apparatus for wafer biscuit processing.

[0018] Figure 4 for Figure 3 A cross-sectional view along the AA direction.

[0019] Figure 5 A schematic diagram of the cleaning mechanism in a self-cleaning tunnel baking apparatus for wafer biscuit processing.

[0020] In the diagram: 10-Conveyor belt, 11-Frame, 12-Support leg, 13-Side support, 20-Tunnel oven, 30-Cleaning mechanism, 31-First water tank, 32-Return water pipe, 33-Inlet water pipe, 34-Second water tank, 341-Filter assembly, 35-Collection hopper, 36-Sprayer, 361-Connecting water pipe, 37-Heating plate, 38-Water baffle, 40-Cleaning mechanism, 41-Mounting bracket, 42-Cleaning roller, 43-Elastic connecting frame, 44-Discharge baffle, 45-Discharge port. Detailed Implementation

[0021] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0022] Please see Figures 1-4 In this embodiment of the present invention, a self-cleaning tunnel baking device for wafer biscuit processing includes a conveyor belt 10, a tunnel oven 20, and a cleaning mechanism 30. A frame 11 is provided on the side of the conveyor belt 10, and several support legs 12 are installed on the frame 11. The conveyor belt 10 and the tunnel oven 20 are mounted on the frame 11. In this embodiment, both the conveyor belt 10 and the tunnel oven 20 adopt existing technology. Specifically, the conveyor belt 10 uses a stainless steel chain or stainless steel mesh belt, and the tunnel oven 20 uses a long-box hot air circulation and far-infrared drying method to dry the biscuits. A side support 13 is installed at the bottom of the frame 11, and the cleaning mechanism 30 is mounted on the side support 13. The cleaning mechanism 30 includes a first water tank 31 and a second water tank 32. The system comprises a tank 34, a collection hopper 35, and several nozzles 36. The nozzles 36 are located inside the collection hopper 35, with their outlets facing the bottom of the conveyor belt 10. The drain outlet of the collection hopper 35 is connected to the second water tank 34, which is connected to the first water tank 31. The first water tank 31 is connected to the nozzles 36. It should be noted that the first water tank 31 supplies water to the nozzles 36, allowing them to rinse the bottom of the conveyor belt 10. The rinsed wastewater flows into the collection hopper 35. The second water tank 34 is equipped with a filter assembly 341. The wastewater from the collection hopper 35 flows into the second water tank 34, where the filter assembly 341 treats the wastewater. The treated wastewater then flows back to the first water tank 31, thus forming a water recycling system.

[0023] Furthermore, in this embodiment, the first water tank 31 is fixedly installed on the side bracket 13, and a water inlet pump (not shown in the figure) is installed at the bottom of the first water tank 31. The water inlet end of the water inlet pump is connected to the first water tank 31, and the water outlet end of the water inlet pump is connected to the water inlet pipe 33. A connecting water pipe 361 is provided at the bottom of the nozzle 36, and the connecting water pipe 361 is connected to the water inlet pipe 33. The water inlet pump draws out the cleaning water inside the first water tank 31 and sends it into the nozzle 36 along the water inlet pipe 33 and the connecting water pipe 361.

[0024] Furthermore, a drain pump is installed on the outside of the second water tank 34. The inlet of the drain pump is connected to the inside of the second water tank 34, and the outlet of the drain pump is connected to the first water tank 31 through the return pipe 32, so as to send the treated sewage into the first water tank 31 for recycling.

[0025] In this embodiment, a heating plate 37, serving as a far-infrared dryer, is also installed on the inner side of the side support 13. The heating plate 37 is used to dry the conveyor belt 10 after rinsing. In addition, a baffle plate 38 is fixedly installed on the inner side of the side support 13. The baffle plate 38 is located above the lower belt body of the conveyor belt 10. The baffle plate 38 is used to block the cleaning water sprayed from the nozzle 36, preventing the cleaning water from contacting the upper belt body of the conveyor belt 10, and at the same time promoting the rapid fall of the cleaning water into the collection hopper 35.

[0026] Please see Figure 5 In this embodiment of the application, a cleaning mechanism 40 is also provided on the discharge side of the conveyor belt 10. The cleaning mechanism 40 includes a mounting bracket 41, a cleaning roller 42, and an elastic connecting frame 43. One end of the elastic connecting frame 43 is fixedly connected to the mounting bracket 41, and the cleaning roller 42 is rotatably mounted on the other end of the elastic connecting frame 43. A drive motor (not shown in the figure) for driving the cleaning roller 42 to rotate is provided on the elastic connecting frame 43. The elastic connecting frame 43 can adjust the distance between the cleaning roller 42 and the conveyor belt 10 so that the surface of the cleaning roller 42 contacts the surface of the conveyor belt 10, thereby improving the cleaning effect of the cleaning roller 42 on the conveyor belt 10 when the cleaning roller 42 rotates, and making the biscuit residue attached to the surface of the conveyor belt 10 fall off quickly.

[0027] Furthermore, in this embodiment, the mounting bracket 41 is fixedly mounted on the support leg 12. The mounting bracket 41 is located below the cleaning roller 42 and is provided with a discharge baffle 44. The bottom of the discharge baffle 44 is provided with a discharge port 45. When the cleaning roller 42 cleans the conveyor belt 10, the biscuit residue moves along the discharge baffle 44 until it is discharged from the discharge port 45.

[0028] It will be apparent to those skilled in the art that this invention is not limited to the details of the exemplary embodiments described above, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this invention. Therefore, the embodiments should be considered illustrative and non-limiting in all respects, and the scope of this invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within this invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

[0029] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. A self-cleaning tunnel-type baking device for wafer biscuit processing, characterized in that, The system includes a conveyor belt (10), a tunnel oven (20), and a cleaning mechanism (30). A frame (11) is provided on the side of the conveyor belt (10), and the conveyor belt (10) and the tunnel oven (20) are mounted on the frame (11). A side support (13) is installed at the bottom of the frame (11), and the cleaning mechanism (30) is mounted on the side support (13). The cleaning mechanism (30) includes a first water tank (31) and a second water tank (34). The system includes a collection hopper (35) and several nozzles (36). The nozzles (36) are located inside the collection hopper (35), and the outlets of the nozzles (36) are set towards the bottom of the conveyor belt (10). The drain outlet of the collection hopper (35) is connected to the second water tank (34), the second water tank (34) is connected to the first water tank (31), the first water tank (31) is connected to the nozzles (36), and a filter assembly (341) is provided inside the second water tank (34).

2. The self-cleaning tunnel baking apparatus for wafer processing according to claim 1, characterized in that, The first water tank (31) is fixedly installed on the side bracket (13). A water pump is installed at the bottom of the first water tank (31). The water inlet end of the water pump is connected to the first water tank (31). The water outlet end of the water pump is connected to the water inlet pipe (33). A connecting water pipe (361) is provided at the bottom of the nozzle (36). The connecting water pipe (361) is connected to the water inlet pipe (33).

3. The self-cleaning tunnel baking apparatus for wafer processing according to claim 2, characterized in that, A drain pump is installed on the outside of the second water tank (34). The inlet of the drain pump is connected to the inside of the second water tank (34), and the drain outlet of the drain pump is connected to the first water tank (31) through the return pipe (32).

4. The self-cleaning tunnel baking apparatus for wafer processing according to claim 1, characterized in that, The inner side of the side bracket (13) is also equipped with a heating plate (37) which is a far-infrared dryer.

5. The self-cleaning tunnel baking apparatus for wafer processing according to claim 1, characterized in that, A water baffle (38) is also fixedly installed on the inner side of the side bracket (13), and the water baffle (38) is located above the lower belt body of the conveyor belt (10).

6. The self-cleaning tunnel baking apparatus for wafer processing according to any one of claims 1-5, characterized in that, It also includes a cleaning mechanism (40) disposed on the discharge side of the conveyor belt (10). The cleaning mechanism (40) includes a mounting bracket (41), a cleaning roller (42) and an elastic connecting frame (43). One end of the elastic connecting frame (43) is fixedly connected to the mounting bracket (41), and the other end of the elastic connecting frame (43) is rotatably mounted with the cleaning roller (42). The elastic connecting frame (43) is provided with a drive motor for driving the cleaning roller (42) to rotate.

7. The self-cleaning tunnel baking apparatus for wafer processing according to claim 6, characterized in that, The mounting bracket (41) is located below the cleaning roller (42) and is provided with a discharge baffle (44), and the bottom of the discharge baffle (44) is provided with a discharge port (45).

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