Gas path pipeline of ALD (Atomic Layer Deposition) equipment and ALD equipment with gas path pipeline easy to maintain

Abstract

The utility model discloses a gas circuit pipeline of ALD equipment and ALD equipment easy to maintain the gas circuit pipeline, wherein the gas circuit pipeline comprises a gas inlet pipe in a cavity, the gas inlet pipe in the cavity is further connected with a pipeline connector used for being connected to a flow uniformizing back plate, the flow uniformizing back plate is provided with a first connecting pipe, and the pipeline connector comprises a first sleeve. Any one of the first sleeve or the first connecting pipe, the adjacent uniform flow back plate and the air inlet pipe in the cavity jointly define a connecting space and are matched with the first connecting pipe or the first sleeve of the other one of the first sleeve and the first connecting pipe, and a sealing ring arranged on the first connecting pipe or the first sleeve in a sleeving manner is limited in the connecting space; the sealing ring is arranged in the connecting space so as to seal at least part of the connecting space. The utility model provides an ALD (atomic layer deposition) equipment external source raw material gas supply pipeline interface design, so that the inside of a pipeline can be quickly cleaned at low cost through a detachable gas path pipeline, and high-quality deposition can be realized.

Description

Technical Field

[0001] This utility model belongs to the field of membrane preparation technology, specifically relating to an ALD device with an air path pipeline and an ALD device with an easy-to-maintain air path pipeline. Background Technology

[0002] Atomic layer deposition is a technique that uses an inert gas to alternately carry precursors into a reaction chamber and where they undergo a chemical reaction to form a thin film. The film is deposited not only on the substrate surface in the chamber but also in the inlet pipe inside the chamber.

[0003] To reduce particles formed by film peeling in the tubing, the air inlet pipe inside the chamber needs to be disassembled and maintained regularly. Currently, the air inlet pipe is integrated into the chamber, making it difficult to disassemble and maintain, which can easily lead to an increase in the number of particles on the sample surface inside the chamber.

[0004] Therefore, in view of the above-mentioned technical problems, it is necessary to provide an ALD device with an air circuit pipeline and an ALD device with an easy-to-maintain air circuit pipeline.

[0005] The information disclosed in this background section is intended only to enhance the understanding of the overall background of this utility model and should not be construed as an admission or in any way implying that the information constitutes prior art known to those skilled in the art. Utility Model Content

[0006] The purpose of this utility model is to provide an ALD device with an air circuit pipeline and an ALD device with an easy-to-maintain air circuit pipeline.

[0007] To achieve the above objectives, the technical solution provided by a specific embodiment of this utility model is as follows:

[0008] The gas pipeline of the ALD device includes an inlet pipe inside the cavity. The inlet pipe inside the cavity is also connected to a pipeline interface for connecting to a flow equalization backplate. The flow equalization backplate is provided with a first connecting pipe. The pipeline interface includes a first sleeve. Either the first sleeve or the first connecting pipe, together with the adjacent flow equalization backplate and the inlet pipe inside the cavity, defines a connection space and is matched with the first connecting pipe or the first sleeve of the other two. A sealing ring is limited within the connection space and fitted onto the first connecting pipe or the first sleeve. The sealing ring is provided in the connection space to seal at least part of the connection space to achieve sealing of the interface and prevent gas leakage from the connection position.

[0009] In one or more embodiments of the present invention, the first sleeve and the first connecting pipe each have a threaded structure or a snap-fit ​​structure for mating connection.

[0010] In one or more embodiments of this utility model, the first sleeve is an internally threaded sleeve with internal threads and a connection space, and the first connecting pipe is an externally threaded connecting pipe with external threads and is matchedly confined within the connection space. Alternatively, the first connecting pipe can be an internally threaded sleeve with internal threads and a connection space, and the first sleeve can be an externally threaded connecting pipe with external threads and is matchedly confined within the connection space.

[0011] In one or more embodiments of this utility model, a limiting body is further constrained within the connecting space, extending along the outer side of the air inlet pipe inside the cavity. The sealing ring is tightly pressed between the flow equalization back plate and the limiting body, and the other end of the limiting body is constrained to the edge of the connecting space to form a squeezing contact with the sealing ring.

[0012] In one or more embodiments of this utility model, a limiting body is further constrained within the connecting space and fitted onto the air inlet pipe inside the cavity. A sealing ring is fitted onto the outside of the air inlet pipe inside the cavity and tightly abuts against the flow equalization back plate and the limiting body. The other end of the limiting body is constrained to the first sleeve to form a squeezing abutment against the sealing ring.

[0013] In one or more embodiments of this utility model, the limiting body is a tubular sleeve.

[0014] In one or more embodiments of this utility model, the air inlet pipe inside the cavity is also independently connected to at least a first branch pipe and a second branch pipe, the first branch pipe and the second branch pipe being respectively connected to a first raw material source and a second raw material source.

[0015] In one or more embodiments of the present invention, an ALD device with an easy-to-maintain gas pipeline includes the gas pipeline of the ALD device.

[0016] In one or more embodiments of this utility model, a vacuum reaction chamber is further included, and an air inlet pipe inside the chamber is connected to the upper chamber of the vacuum reaction chamber through a pipeline interface.

[0017] In one or more embodiments of this utility model, the vacuum reaction chamber is divided into an upper chamber and a lower chamber by a spray plate.

[0018] Compared with the prior art, the ALD equipment of this utility model provides an external raw material gas supply pipeline interface design for the ALD equipment, thereby enabling rapid and low-cost cleaning of the pipeline interior through the detachable gas pipeline, thus achieving high-quality deposition. Attached Figure Description

[0019] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0020] Figure 1 This is a schematic diagram of the structure of an ALD device with an easy-to-maintain gas pipeline in one embodiment of the present invention;

[0021] Figure 2 This is a schematic diagram of the gas pipeline structure of an ALD device in one embodiment of the present invention;

[0022] Figure 3 This is a schematic diagram of the air inlet pipe inside the cavity in one embodiment of the present invention.

[0023] The attached diagram is labeled as follows: 1. Upper heating plate; 2. Upper cavity shell; 3. Spray plate; 4. Tray; 5. Lower cavity shell; 6. Base; 7. Vacuum extraction pipe; 8. Vacuum pump; 9. Insulation cotton; 10. Flow equalization plate; 11. Inlet pipe inside the cavity; 111. First branch pipe; 112. Second branch pipe; 12. Flow equalization back plate; 13. Substrate; 14. Internal threaded sleeve; 15. Sleeve; 16. External threaded connector; 17. Sealing ring; 19. Cavity cover handle; 20. Nitrogen cylinder; 21. Mass flow meter; 22. Hand valve; 23. ALD valve; 24. Source bottle; 25. Special gas pipeline outside the cavity; 26. Metal hose; 27. VCR connector. Detailed Implementation

[0024] To enable those skilled in the art to better understand the technical solutions of this utility model, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort should fall within the protection scope of this utility model.

[0025] like Figures 1-3As shown, in one embodiment of this utility model, the air passage of an ALD device and the ALD device using the easily maintainable air passage of the same device are illustrated. The air passage includes an inlet pipe inside the cavity, which is also connected to a pipe interface for connecting to a flow equalization backplate. The flow equalization backplate is provided with a first connecting pipe, and the pipe interface includes a first sleeve that is defined to the inlet pipe inside the cavity (the two can be defined by a fixed connection with the outer sheath of the inlet pipe inside the cavity, or by the engagement of a sheet-like or disc-like limiting member protruding outward from the port of the inlet pipe inside the cavity with the minimum inner diameter of the first sleeve). Of course, other feasible solutions can also be adopted to ensure that both are fixed at least in the use state. The first sleeve or the first connecting pipe, together with the adjacent flow equalization back plate and the air inlet pipe in the cavity, define a connection space and is matched with the first connecting pipe or the first sleeve of the other two. A sealing ring is restricted in the connection space and is sleeved on the first connecting pipe or the first sleeve. The sealing ring is set in the connection space to close at least part of the connection space adjacent to the flow equalization back plate so as to isolate the parts that are prone to leakage, such as the docking interface of the pipe formed on the flow equalization back plate.

[0026] To achieve the connection between the pipe interface and the first connecting pipe, specifically, as follows: Figure 2 The diagram shows that the first sleeve is an internally threaded sleeve with internal threads and a connection space, and the first connecting pipe is an externally threaded connecting pipe with external threads and is matched and confined within the connection space. Alternatively, the first connecting pipe can be an internally threaded sleeve with internal threads and a connection space, and the first sleeve can be an externally threaded connecting pipe with external threads and is matched and confined within the connection space.

[0027] Of course, as one embodiment, the above-mentioned threaded connection can also be replaced by other fastening connection structures such as locking and riveting.

[0028] Furthermore, as one embodiment, a limiting body is also provided within the connecting space, extending along the outer side of the intake pipe inside the cavity. The sealing ring tightly abuts against the flow equalization backplate and the limiting body, with the other end of the limiting body confined to the edge of the connecting space to form a compressive contact with the sealing ring. This limiting body is used to apply a clamping force to the sealing ring after the connecting space is assembled and defined, thereby restricting it and improving the clamping and sealing effect. In this case, the limiting body can be one or more structures of a certain length. These structures can be independent or combined during use. For example, three columnar bodies can be used, arranged along the axial direction of the outer side of the intake pipe inside the cavity, with one end freely abutting against the sealing ring. Of course, the columnar bodies at the end abutting the sealing ring can also be connected to a pressure ring, which applies pressure to the sealing ring. Alternatively, it can be as follows... Figure 2 The diagram shows a tubular structure.

[0029] Furthermore, as one embodiment, to accommodate the supply of multiple raw materials, the air inlet pipe within the cavity is independently connected to at least a first branch pipe and a second branch pipe. The first branch pipe and the second branch pipe are respectively connected to a first raw material source and a second raw material source, such as... Figure 3 As shown.

[0030] like Figure 1 The ALD device shown utilizes the gas piping of this application:

[0031] Before starting the operation, connect the air inlet pipe 11 inside the cavity to the pipe interface of the uniform flow back plate through the pipe interface, and complete the air tightness check. At this time, the air inlet pipe 11 inside the cavity has been cleaned and is in a clean state.

[0032] The vacuum reaction chamber comprises an upper chamber 2 and a lower chamber 5. A spray plate 3 marks the boundary between the upper chamber 2 and the lower chamber 5. Figure 1 In the technical solution shown, the vacuum reaction chamber is detachable near the lower surface of the spray plate 3. Therefore, the upper chamber 2 can be lifted by using the handle 19 to open the chamber and take out or put in the substrate 13.

[0033] The substrate 13 is placed in the sample slot of the tray 4. By replacing the tray 4 with sample slots of different sizes, the size of the substrate 13 of different specifications can be matched. The device can be compatible with substrates 13 of any size for deposition coating.

[0034] During the ALD coating process, the temperature of the substrate 13 needs to be within the process window, for example, the heating temperature of the base 6 needs to be set to 200℃~300℃. There is a certain distance between the air inlet pipe 11 and the heating base 6 inside the cavity, so the heat from the base 6 cannot be effectively conducted to the air inlet pipe 11 inside the cavity. Furthermore, a significant amount of heat is lost through the upper cavity cover. For example, when the heating temperature of the base 6 is set to 200℃~300℃, the temperature of the air inlet pipe 11 inside the cavity may only be 50℃. This will cause the gas source in the source bottle 24 to condense in the air inlet pipe 11 inside the cavity, thus contaminating the pipe and affecting the coating quality. To solve this problem, a heating plate 1 is installed close to the air inlet pipe 11 inside the cavity. The temperature of the upper heating plate 1 is set to be greater than 100℃. On the one hand, this effectively prevents the gas source from condensing in the air inlet pipe 11 inside the cavity; on the other hand, the temperature compensation of the upper heating plate 1 ensures the temperature stability of the upper cavity 2, which is beneficial to improving the stability of the coating process.

[0035] Both the inlet pipe 11 inside the cavity and the external air passage 25 outside the cavity can be made of stainless steel special gas pipes. The two are connected by a metal flexible hose 26, and the connector 27 is a VCR connector. When the upper cavity 2 is opened, the metal flexible hose 26 can deform in coordination, thereby effectively ensuring the integrity of the air passage.

[0036] To prevent the gas released from source bottle 24 from condensing in the external gas passages 25 and 26, heating jackets are installed in both gas passages 25 and 26. To increase the vapor pressure of the gas source in source bottle 24, thereby increasing the coating rate, a heating jacket is also installed in source bottle 24.

[0037] During the ALD deposition process, the upper heating plate 1 can be set to a high temperature greater than 100°C, which will result in a high temperature on the surface of the cavity cover and the handle 19. The handle 19 can be wrapped with an external heat insulation layer for protection. Alternatively, thermal insulation cotton 9 with a very low thermal conductivity can be installed between the heating plate 1 and the upper cavity cover, which can effectively reduce the temperature of the cavity cover and the handle 19, improving the ease of operation and safety of the equipment.

[0038] During operation, the pneumatic valve 22 is opened, and the mass flow meter 21 is set to a certain process flow rate according to process requirements. The gas source 24 enters the gas path 25 through the ALD valve 23. The high-purity nitrogen in the gas path 25 is released from the nitrogen cylinder 20 into the gas path to carry the gas source 24. The gas then enters the cavity through the gas path 25, the metal hose 26, and the inlet pipe 11 inside the cavity. The gas in the cavity undergoes a first splitting process through the flow equalization plate 10 and enters the upper cavity. The split gas then undergoes a second splitting process through the spray plate 3 and enters the lower cavity. The gas after being split by the spray plate 3 is uniformly deposited on the surface of the substrate 13. The reacted gas finally flows from the vacuum pipe 7 to the vacuum pump 8 and is extracted from the cavity.

[0039] Figure 2 The cavity contains an air inlet pipe 11 with an easily detachable structure. The externally threaded pipe 16 and the flow equalization backplate 12 are integrated. First, the internally threaded sleeve 14, sleeve 15, and high-temperature resistant sealing ring 17 are sequentially inserted into the cavity's internal air inlet pipe 11. Then, the internal air inlet pipe 11 is inserted into the flow equalization backplate 12, and the internally threaded sleeve 14 and externally threaded pipe 16 are tightened. The sleeve 15 presses against the high-temperature resistant sealing ring 17, thus sealing the cavity. This easily detachable structure allows for regular maintenance and replacement, reducing the entry of particles from the pipeline into the cavity and their adhesion to the substrate surface, thereby improving coating quality.

[0040] Figure 3 The structure of the air inlet pipe 11 inside the cavity is shown. Taking the deposition of Al2O3 thin film as an example, the gas source is selected as TMA source and H2O source. The air inlet pipe 11 inside the cavity can be a multi-path structure. In this case, the first branch pipe 111 of the air inlet pipe 11 inside the cavity is connected to the TMA source, and the second branch pipe 112 is connected to the H2O source. This can isolate the gas path of the TMA source and the H2O source into the cavity, reduce the Al2O3 thin film deposited in the air inlet pipe 11 inside the cavity, thereby reducing the Al2O3 particles in the pipeline from entering the cavity and adhering to the substrate surface, and can effectively extend the maintenance cycle of the equipment.

[0041] It will be apparent to those skilled in the art that this invention is not limited to the details of the exemplary embodiments described above, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this invention. Therefore, the embodiments should be considered illustrative and non-limiting in all respects, and the scope of this invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within this invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

[0042] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. A gas line pipe of an ALD apparatus comprising a gas inlet pipe in a cavity, characterized by, The in-cavity gas inlet pipe is further connected with a pipe interface for connecting to a uniform flow back plate, the uniform flow back plate is provided with a first connecting pipe, the pipe interface comprises a first sleeve pipe, either of the first sleeve pipe or the first connecting pipe cooperates with the adjacent uniform flow back plate and in-cavity gas inlet pipe to define a connecting space, and the other of the first sleeve pipe or the first connecting pipe is matched with the first sleeve pipe or the first connecting pipe, a sealing ring sleeved on the first sleeve pipe or the first connecting pipe is limited in the connecting space, and the sealing ring is arranged in the connecting space to at least partially close the connecting space.

2. The gas line of the ALD apparatus according to claim 1, wherein The first sleeve pipe and the first connecting pipe are each formed with a threaded structure for matching connection.

3. The gas line of the ALD apparatus according to claim 2, wherein The first sleeve pipe is an internally threaded sleeve pipe with internal threads and has a connecting space, and the first connecting pipe is an externally threaded connecting pipe with external threads and is matched and limited in the connecting space.

4. The gas line of the ALD apparatus according to claim 3, wherein The connecting space is further limited with a limiting body arranged along the extending direction of the outer side of the in-cavity gas inlet pipe, the sealing ring is tightly abutted between the uniform flow back plate and the limiting body, and the other end of the limiting body is limited to the edge of the connecting space.

5. The gas line of the ALD apparatus according to claim 4, wherein The connecting space is further limited with a limiting body sleeved on the in-cavity gas inlet pipe, the sealing ring is sleeved on the outer side of the in-cavity gas inlet pipe and is tightly abutted between the uniform flow back plate and the limiting body, and the other end of the limiting body is limited to the first sleeve pipe.

6. The gas line piping of the ALD apparatus according to claim 4 or 5, wherein The limiting body is a sleeve pipe.

7. The gas line of the ALD apparatus according to claim 1, wherein The in-cavity gas inlet pipe is further independently communicated with at least a first branch pipe and a second branch pipe, the first branch pipe and the second branch pipe are respectively connected to a first raw material source and a second raw material source.

8. An ALD apparatus with easy-to-maintain gas line piping, characterized by, A gas path pipeline of an ALD device according to any one of claims 1-7.

9. The ALD apparatus of claim 8, wherein, Further comprising a vacuum reaction cavity, the in-cavity gas inlet pipe is communicated to the upper cavity of the vacuum reaction cavity through the pipe interface.

10. The ALD apparatus of claim 9, wherein, The vacuum reaction cavity is divided into an upper cavity and a lower cavity by a shower plate. The vacuum reaction cavity is divided into an upper cavity and a lower cavity by a shower plate.

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