Electroplating cleaning device
By introducing cleaning tank groups, handling mechanisms, water supply systems, and water circulation control systems into the electroplating cleaning device, the problems of high water costs, excessive wastewater, and poor cleaning effects in electroplating cleaning are solved, achieving efficient and environmentally friendly water resource utilization.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- LENGSHUIJIANG TIANBAO IND
- Filing Date
- 2025-03-24
- Publication Date
- 2026-04-14
AI Technical Summary
Existing electroplating cleaning processes suffer from high water costs, large wastewater generation, poor cleaning results, and low water utilization.
The electroplating cleaning device, consisting of a cleaning tank assembly, a transport mechanism, a water supply system, a water quality monitoring unit, a water flow circulation control system, and a spray unit, achieves precise water quality management and efficient utilization of water resources through water quality monitoring and circulation control.
It improves cleaning effectiveness, reduces water costs and wastewater generation, increases water utilization, and achieves stability and environmental friendliness in the cleaning process.
Smart Images

Figure CN224114725U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of cleaning equipment technology, specifically to an electroplating cleaning device. Background Technology
[0002] Electroplating cleaning is a major water-consuming and wastewater-generating process in electroplating production, accounting for over 95% of both production water consumption and electroplating wastewater generation. Traditional electroplating cleaning methods employ counter-current rinsing, where the cleaning water flows in the opposite direction to the movement of the workpiece. This method consists of multiple cleaning tanks connected in series. However, to ensure cleaning quality, excessive amounts of cleaning water are often used, increasing both the cost of electroplating water and the amount of wastewater generated, thus raising wastewater treatment costs.
[0003] Chinese patent CN205329202U discloses an electroconductivity-controlled water cleaning system that uses a conductivity sensor to detect the water quality in the cleaning tank and supply clean water in a timely manner, effectively reducing water consumption. It employs a multi-stage flow method with interconnected edges across multiple tanks. However, since the cleaning process lacks a precise sequence, the water quality does not necessarily improve with each stage. It's possible that the first stage of water is uncontaminated while the second stage is more polluted. Simply passing highly polluted water from the second stage into the first stage does not guarantee effective results. Therefore, this multi-stage flow method does not effectively improve water utilization. Utility Model Content
[0004] The purpose of this invention is to provide an electroplating cleaning device to solve the problems of high water cost, large wastewater generation, poor cleaning effect and low water utilization rate in the existing electroplating cleaning process.
[0005] To achieve the above objectives, this utility model provides the following technical solution: an electroplating cleaning device, comprising:
[0006] A cleaning pool assembly consists of several cleaning pools; the cross-sectional shape of the cleaning pools is usually rectangular, but can be adjusted as needed.
[0007] The transport mechanism, located on one side of the cleaning tank assembly, is used to transport the fixture frame so that it is immersed in the cleaning tank. The transport mechanism enables the operation of the fixture frame and is helpful for automation.
[0008] The water supply system is located on one side of the cleaning pool group to provide clean water to the cleaning pools. The water supply system can be fixed to supply water to a certain pool, supply water to a certain pool on demand, or supply water to all pools, depending on the design cost and project requirements.
[0009] The water quality monitoring unit is installed inside the cleaning tank. It controls the water supply system to supply clean water to the cleaning tank. The purpose of the water quality monitoring unit is to detect whether the water in the tank is suitable for continued cleaning. If the water quality exceeds the standard, the cleaning conditions are not met, and the water quality parameters need to be reduced, i.e., clean water or water with better quality is introduced. Therefore, it is used to control the water supply system to supply clean water.
[0010] The water circulation control system is installed between the cleaning tanks and connected to a drain pipe. Traditional stepped flow is inefficient and detrimental to production. The water circulation control system can quickly discharge excess water and replenish high-quality water through valves and pumps, thereby improving production efficiency.
[0011] Preferably, the cleaning tank is equipped with a mixing structure. The mixing structure keeps the water in a dynamic state, which facilitates mixing and ensures the accuracy of water quality monitoring; at the same time, it facilitates cleaning and improves cleaning quality.
[0012] Preferably, the water supply system moves along the cleaning tank group to provide clean water to the corresponding cleaning tank. Using a movable water supply system reduces pipework and increases construction efficiency.
[0013] Preferably, a liquid level sensor is installed inside the cleaning tank. Using a liquid level sensor transmits liquid volume information to the control terminal, enabling automatic water replenishment and reducing manual monitoring.
[0014] Preferably, the several cleaning tanks are arranged in a stepped manner, allowing water from one cleaning tank to flow into the next. This combination of forced drainage and natural overflow improves water utilization.
[0015] Preferably, a spray unit is provided on the upper part of the cleaning tank. The spray unit further improves the cleaning quality, and the water used in the spray unit can be reused, effectively increasing water utilization.
[0016] Compared with the prior art, the beneficial effects of this utility model are:
[0017] Improved cleaning effect: Utilizing ultrasonic oscillators or a mechanical mixing structure effectively promotes water movement, ensuring uniform water quality within the cleaning tank and enhancing cleaning efficiency. The spray unit further rinses the fixture frame, ensuring the cleanliness of the material surface.
[0018] Precise water quality control: The water quality monitoring unit monitors the water quality in real time through a conductivity detector to ensure the stability and reliability of the cleaning water.
[0019] The application of liquid level sensors allows for precise control of water volume, preventing over- or under-watering and ensuring the continuity and stability of the cleaning process.
[0020] Flexible water flow management: The water flow circulation control system is designed to allow for flexible adjustment of water flow direction and discharge based on water quality conditions, enabling rapid drainage and water replenishment to adapt to different cleaning needs. The water supply system can move along the cleaning tank group to provide clean water to specific cleaning tanks, achieving precise control.
[0021] Energy-saving and environmentally friendly: Through tiered layout and baffle design, water resources are recycled, reducing clean water consumption and wastewater discharge. The rapid drainage system effectively treats water exceeding standards, minimizing environmental impact.
[0022] In summary, the electroplating cleaning device of this invention demonstrates significant advantages in improving cleaning effect, accurately controlling water quality, flexibly managing water flow, and energy conservation and environmental protection, providing an efficient and reliable solution for the electroplating cleaning industry. Attached Figure Description
[0023] Figure 1 This is a schematic diagram of the overall structure of this utility model;
[0024] Figure 2 This is a top view of the structure of this utility model;
[0025] Figure 3 This is a schematic diagram of the liquid flow direction in the cleaning tank of this utility model.
[0026] Reference numerals: 1. Cleaning tank; 11. Mixing structure; 12. Liquid level sensor; 2. Water supply system; 3. Water quality monitoring unit; 4. Water flow circulation control system; 5. Transport mechanism. Detailed Implementation
[0027] To make the technical means, creative features, objectives and effects of this utility model easier to understand, the present utility model will be further described below in conjunction with specific embodiments.
[0028] In the description of this utility model, it should be noted that the terms "upper," "lower," "inner," "outer," "front end," "rear end," "both ends," "one end," and "the other end," etc., indicating orientation or position, are based on the orientation or positional relationships shown in the accompanying drawings. They are used only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.
[0029] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installed," "equipped with," and "connected," etc., should be interpreted broadly. For example, "connected" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be a connection within two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.
[0030] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.
[0031] like Figure 1 and Figure 2 As shown, the electroplating cleaning apparatus of this embodiment includes:
[0032] A cleaning pool assembly, comprising several cleaning pool bodies 1;
[0033] The transport mechanism 5 is located on one side of the cleaning pool group and is used to transport the fixture frame so that the fixture frame is immersed in the cleaning pool 1.
[0034] Water supply system 2, located on one side of the cleaning tank assembly, provides clean water to cleaning tank 1; water supply system 2 is the outlet pipe with a control valve, providing clean water to the equipment. For ease of use, a moving module is provided to drive the outlet pipe to move. The movement includes moving left and right along the cleaning tank assembly, and can also include moving up and down within the cleaning tank assembly, using a common linear drive structure.
[0035] Water quality monitoring unit 3 is installed inside the cleaning tank 1. The water supply system is controlled by water quality monitoring unit 3 to supply clean water to the cleaning tank 1. Water quality monitoring unit 3 uses a conductivity detector (conductivity sensor) to judge the water quality based on the principle that the degree of pollution of electroplating cleaning water is positively correlated with its conductivity.
[0036] A water circulation control system 4 is installed between the cleaning tanks 1 and connected to a drain pipe. Wastewater is discharged to the wastewater treatment system through the drain pipe. The first-stage cleaning tank 1 is also connected to the wastewater treatment system to discharge overflow water.
[0037] A mixing structure 11 is provided inside the cleaning tank 1. The purpose of the mixing structure 11 is to make the liquid distribution in the cleaning tank 1 uniform, ensure the accuracy of the conductivity detector readings, and further, to make the water move, thereby improving the cleaning effect.
[0038] Example 1
[0039] In this embodiment, the mixing structure 11 employs an ultrasonic oscillator. Selecting a suitable ultrasonic oscillator based on the dimensions of the cleaning tank 1 improves the cleaning effect and ensures uniform water mixing, thereby guaranteeing accurate data monitoring by the water quality monitoring unit 3. Several cleaning tanks 1 are arranged in a stepped configuration, allowing water from one cleaning tank 1 to flow into the next. Additionally, baffles are installed between adjacent cleaning tanks 1 to encourage water to flow into the bottom plate of the next cleaning tank 1. These baffles are water-blocking plates located at the tank inlet, allowing water to flow downwards from the baffle into the next tank.
[0040] Example 2
[0041] In this embodiment, the mixing structure 11 adopts a mechanical mixing structure to drive the water movement within the cleaning tank 1. The mechanical mixing structure includes a stirring impeller and a drive device. The drive device drives the stirring impeller to rotate, thereby causing the water to move.
[0042] In the above embodiment, the water supply system 2 is set in the last stage cleaning tank 1, so that the water passes through the cleaning tank 1 in sequence. During this process, a conductivity detector is usually set in the first stage cleaning tank 1. When the conductivity detector detects data exceeding the standard, the water supply system 2 is started to add water to the last stage cleaning tank 1.
[0043] Example 3
[0044] The water supply system 2 moves along the cleaning pool group to provide clean water to the corresponding cleaning pool 1. In this embodiment, the outlet of the water supply system 2 can move along the cleaning pool group. When the data in a certain cleaning pool 1 exceeds the standard, clean water is added to its interior and the sewage is discharged.
[0045] In this embodiment, a liquid level sensor 12 needs to be installed inside the cleaning tank 1. When the water level is lower or higher than a set value, the water supply system 2 controls the sensor to turn on or off. The liquid level sensor 12 is a conventional choice in the art, which at least ensures that it can detect the lowest and highest water levels.
[0046] Example 4
[0047] In this embodiment, a spray unit is provided on the upper part of the cleaning tank 1. The spray unit can be combined with the water supply system 2. That is, the spray unit only provides nozzles, and the water supply system 2 supplies water to the nozzles to spray and rinse the raised fixture frame. The rinsing water falls into the cleaning tank 1.
[0048] In this embodiment, the water source for the spray unit can also come from the cleaning tank 1, and the water in the cleaning tank 1 is used to rinse it. The cleaning tank 1 is either the next-level cleaning tank or the current-level cleaning tank.
[0049] Detailed explanation:
[0050] like Figure 1 and Figure 2 As shown, the cleaning tanks 1 are arranged from right to left. Four cleaning tanks 1 are shown here, named A, B, C, and D. During use, the material to be cleaned is loaded into a jig frame (not shown in the figure). The jig frame is then moved by a transport mechanism 5 (which includes grippers, lateral and vertical translation units, enabling the transport of the jig frame; this mechanism can handle multiple jig frames simultaneously for cleaning or move only one jig frame at a time). The jig frames are then sequentially immersed in A, B, C, and D for soaking and cleaning. During the cleaning process, as contaminants from the material enter the water, the water quality changes. If no obvious abnormalities are observed, clean water enters from D and flows sequentially into A. This process is a stepped flow, meaning the water quality changes sequentially.
[0051] However, in actual cleaning processes, due to the lack of uniformity in cleaning, water quality may not follow a gradient distribution. If water quality exceeds standards in pools B and C, continuing to discharge into pool A will affect the cleaning of materials in A. Therefore, a water flow circulation control system 4 is installed to quickly drain water from pools with excessive water quality (quick drainage does not necessarily mean emptying completely, but rather partially draining while simultaneously adding clean water), and then moving the water to the corresponding pool via the water supply system 2 to supply clean water to that pool. The water circulation control system includes connecting pipes between adjacent pools, with valves installed in the middle of these pipes. These valves control the flow of liquid from the next level pool into the previous level pool and simultaneously discharge wastewater from adjacent pools. Figure 3 As shown, if the water quality in pool C exceeds the standard, the valves of pool C and the drain pipe will open, allowing sewage to flow from pool C to the drain pipe. Simultaneously, water supply system 2 will supply water to pool C. After some sewage is discharged, the valves of pool C and the drain pipe will close, and the valve between pool D and pool C will open, allowing water from pool D to enter pool C. Water supply system 2 will then supply water to pool D. This process promptly discharges the substandard water while diluting the non-substandard water for reuse, improving water utilization and reducing water consumption.
[0052] To further improve cleaning quality, a spray unit sprays water onto the fixture frame as it leaves the tank, cleaning it. The spray unit can be installed on each tank, or a single unit can be installed and driven by a moving guide rail connected to the water supply system 2. In this embodiment, the spray unit is directly the outlet of the water supply system 2. The spray unit is a spray net composed of several spray heads, its shape matching the fixture frame to achieve rinsing. Simultaneously, the multi-point (surface) water inlet ensures rapid and uniform water distribution, guaranteeing even water distribution within the cleaning tank 1 and ensuring the effectiveness of the water quality monitoring unit 3.
[0053] The above description is merely an embodiment of this utility model, and common knowledge regarding specific structures and characteristics is not described in detail here. It will be apparent to those skilled in the art that this utility model is not limited to the details of the above exemplary embodiments, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this utility model. Therefore, the embodiments should be considered exemplary and non-limiting in all respects, and the scope of this utility model is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within this utility model. No reference numerals in the claims should be construed as limiting the scope of the claims.
Claims
1. An electroplating cleaning apparatus, characterized by, The utility model relates to a cleaning pool group and a cleaning method thereof. The cleaning pool group comprises a plurality of cleaning pool bodies (1), a carrying mechanism (5) arranged on one side of the cleaning pool group and used for carrying a jig frame so that the jig frame is soaked into the cleaning pool body (1), a water supply system (2) arranged on one side of the cleaning pool group and used for providing clean water for the cleaning pool body (1), a water quality monitoring unit (3) arranged in the cleaning pool body (1) and used for controlling the water supply system (2) to supply clean water for the cleaning pool body (1), and a water flow circulation control system (4) arranged between the cleaning pool bodies (1) and connected with a drain pipe. The cleaning pool body (1) is provided with a mixing structure (11) therein. The water supply system (2) moves along the cleaning pool group to provide clean water for the corresponding cleaning pool body (1). The cleaning pool body (1) is provided with a liquid level sensor (12) at the upper portion. The plurality of cleaning pool bodies (1) are arranged in a step-by-step manner so that water in a previous cleaning pool body (1) enters a next cleaning pool body (1). The cleaning pool body (1) is provided with a spraying unit at the upper portion. 2. The electroplating cleaning apparatus of claim 1, wherein: 3. The electroplating cleaning apparatus according to claim 1 or 2, characterized by: 4. The electroplating cleaning apparatus of claim 3, wherein:
Citation Information
Patent Citations
Be used for electroplating abluent electrodeless formula electric conductance accuse water cleaning system
CN205329202U