Novel etching reaction tank

Abstract

The utility model relates to a novel etching reaction tank in the field of etching processing, which comprises a support and an etching tank arranged on the support, the support is provided with a bubbling component and a circulating filter component which are matched with the etching tank, a filter plate capable of sliding up and down is arranged in the etching tank, and the filter plate is provided with a water inlet and a water outlet. A plurality of through holes are formed in one side of the filter plate in a penetrating mode, and lifting assemblies matched with the filter plate are arranged on the two sides of the support. According to the utility model, the etching liquid is turned over through the bubbling assembly, so that the flowability of the etching liquid is improved. And impurities in the etching liquid are effectively filtered through the circulating filtering assembly, so that the purity of the etching liquid is improved, and the surface of the workpiece is uniformly etched. In addition, the filter plate slides up and down in the etching tank through cooperation of the filter plate and the lifting assembly, separation and contact of the workpiece and the etching liquid are achieved, and therefore the workpiece taking-out process is simplified, and the operation efficiency is improved.

Description

Technical Field

[0001] This utility model relates to the field of etching processing, specifically to a novel etching reaction tank. Background Technology

[0002] Etching is a technique that uses chemical or physical methods to remove a portion of the material from the surface of a material, thereby forming a desired pattern or text. It is widely used in electronics, semiconductors, optics, decoration, and many other fields. It includes various methods such as spray etching and immersion etching. Immersion etching involves placing the workpiece in an etching solution, using a chemical reaction to remove the material, making it suitable for processing workpieces with complex shapes.

[0003] While existing etching reaction tanks can etch workpieces, their poor etching solution fluidity and the tendency to generate impurities during etching prevent sufficient contact between the etching solution and the workpiece, thus affecting the etching effect. Therefore, this invention proposes a novel etching reaction tank with circulating filtration and bubbling functions. Summary of the Invention

[0004] This invention provides a novel etching reaction tank that solves the problems of poor fluidity and impurity accumulation in existing etching reaction tanks by combining a circulating filter component and a bubbling component.

[0005] The objective of this utility model is achieved through the following means:

[0006] A novel etching reaction tank includes a support and an etching tank mounted on the support. The support is provided with a bubbling assembly and a circulating filter assembly that cooperate with the etching tank. The etching tank is provided with a filter plate that can slide up and down. A plurality of through holes are provided on one side of the filter plate. Lifting assemblies that cooperate with the filter plate are provided on both sides of the support.

[0007] Furthermore, the bubbling assembly includes a bubbling tube and a blower. The bubbling tube is located inside the etching tank, and the blower is installed on one side of the bracket and connected to the bubbling tube. The bubbling tube has a plurality of bubbling holes.

[0008] Furthermore, a one-way valve is provided between the blower and the bubbling pipe.

[0009] Furthermore, the circulating filtration assembly includes a filter membrane group and a first water pump and a second water pump. The etching tank is provided with an outlet pipe and an inlet pipe. The filter membrane group is connected to the outlet pipe and the inlet pipe through the first water pump and the second water pump, respectively.

[0010] Furthermore, a sampling valve is provided on one side of the filter membrane assembly.

[0011] Furthermore, the lifting assembly includes a lifting plate, a drive screw, and a drive motor located on one side of the drive screw. The drive screw is rotatably mounted on both sides of the bracket. The lifting plate is slidably mounted on the bracket via the drive screw. Both sides of the filter plate are provided with connecting frames for the lifting plate.

[0012] Furthermore, guide rods that cooperate with the lifting plate are provided on both sides of the bracket.

[0013] The beneficial effects of this invention are as follows: The bubbling assembly tumbles the etching solution, increasing its fluidity. The circulating filtration assembly effectively filters impurities from the etching solution, improving its purity and ensuring uniform etching of the workpiece surface. Furthermore, the cooperation between the filter plate and the lifting assembly allows the filter plate to slide up and down within the etching tank, facilitating the separation and contact between the workpiece and the etching solution, thus simplifying the workpiece removal process and improving operational efficiency. Attached Figure Description

[0014] Figure 1 This is a schematic diagram of the first structure of a novel etching reaction tank according to the present invention;

[0015] Figure 2 for Figure 1 Enlarged diagram of A in the middle;

[0016] Figure 3 This is a schematic diagram of the second structure of a novel etching reaction tank according to the present invention;

[0017] Figure 4 for Figure 3 Enlarged diagram of B in the diagram;

[0018] Figure 5 This is a partial schematic diagram of a novel etching reaction tank according to the present invention;

[0019] Figure 6 This is a cross-sectional view of a novel etching reaction tank according to the present invention;

[0020] Figure 7 This is a schematic diagram of the structure of the bubbling tube in this utility model;

[0021] The reference numerals in the figure are as follows: 1-bracket, 11-guide rod, 2-etching tank, 21-outlet pipe, 22-inlet pipe, 3-bubbling assembly, 31-bubbling tube, 311-bubbling hole, 32-blower, 33-one-way valve, 4-circulating filter assembly, 41-filter membrane assembly, 411-sampling valve, 42-first water pump, 43-second water pump, 5-filter plate, 51-through hole, 52-connecting frame, 6-lifting assembly, 61-lifting plate, 62-drive screw, 63-drive motor. Detailed Implementation

[0022] The present invention will now be described in further detail with reference to the accompanying drawings and specific embodiments.

[0023] In this embodiment, refer to Figure 1 - Figure 7 The present invention relates to a novel etching reaction tank, comprising a support 1 and an etching tank 2 mounted on the support 1. The support 1 is equipped with a bubbling assembly 3 and a circulating filter assembly 4 that cooperate with the etching tank 2. The etching tank 2 contains a filter plate 5 that can slide up and down. Several through holes 51 are provided on one side of the filter plate 5. Lifting assemblies 6 that cooperate with the filter plate 5 are provided on both sides of the support 1. The etching tank 2 is made of corrosion-resistant plastic material to avoid chemical reaction with the etching solution, ensuring long-term stable operation of the equipment.

[0024] In operation, the etching solution is injected into the etching tank 2, and the workpiece to be processed is placed on the filter plate 5. Then, the lifting assembly 6 is activated to immerse the workpiece in the etching solution using the filter plate 5. During the immersion etching process, air bubbles are injected into the etching solution through the bubbling assembly 3, causing the etching solution to tumble and flow, thereby ensuring full contact with the workpiece and uniform etching of the workpiece surface. After etching is completed, the lifting assembly 6 lifts the filter plate 5, thereby removing the workpiece from the etching solution. In addition, the circulating filtration assembly 4 continuously circulates and filters the etching solution to remove impurities, thus maintaining the purity of the etching solution and extending its service life.

[0025] The bubbling assembly 3 includes a bubbling tube 31 and a blower 32. The bubbling tube 31 is located inside the etching tank 2, and the blower 32 is mounted on one side of the bracket 1 and connected to the bubbling tube 31. The bubbling tube 31 has several bubbling holes 311. A one-way valve 33 is provided between the blower 32 and the bubbling tube 31. One end of the bubbling tube 31 penetrates the wall of the etching tank 2 and is connected to the one-way valve 33. A ball valve is also provided between the blower 32 and the one-way valve 33. By adjusting the ball valve, the size and flow rate of the bubbles can be controlled, thereby adjusting the turbulence intensity of the etching solution and ensuring the etching effect. The one-way valve 33 can prevent the etching solution from flowing back, thereby avoiding water ingress into the blower 32 and causing malfunction. In use, by starting the blower 32, air is injected into the bubbling tube 31 sequentially through the ball valve and the one-way valve 33, and bubbles are evenly released through the bubbling holes 311, causing the etching solution to turbulently flow and fully contact the workpiece, thereby achieving efficient etching.

[0026] The bubbling holes 311 are positioned downwards or sideways to prevent impurities from clogging them, ensuring smooth bubble release, maintaining uniform flow of the etching solution, and further improving etching efficiency. The bubbling tube 31 adopts a U-shaped design to increase the bubble distribution area, allowing for more comprehensive contact between the etching solution and the workpiece, ensuring etching uniformity. The bubbling tube 31 is fixed to the inner wall of the etching tank 2 by clamps, ensuring it will not shift during use and guaranteeing the stability and uniformity of bubble release.

[0027] The circulating filtration assembly 4 includes a filter membrane group 41 and a first water pump 42 and a second water pump 43. The etching tank 2 is equipped with an outlet pipe 21 and an inlet pipe 22. The filter membrane group 41 is connected to the outlet pipe 21 and the inlet pipe 22 through the first water pump 42 and the second water pump 43, respectively. The first water pump 42 is connected to the inlet of the filter membrane group 41, and the second water pump 43 is connected to the outlet of the filter membrane group 41, thereby forming a closed-loop system. The first water pump 42 draws the etching solution from the etching tank 2 through the outlet pipe 21 and sends it to the filter membrane group 41 for filtration. After removing impurities, the etching solution is then sent back to the etching tank 2 by the second water pump 43 through the inlet pipe 22, thereby realizing the recycling of the etching solution.

[0028] The output end of the first water pump 42 is also equipped with a drain pipe, through which the etching solution can be completely discharged, facilitating the replacement of the etching solution or equipment maintenance. The filter membrane assembly 41 is equipped with a wastewater discharge pipe, used to discharge wastewater generated during the filtration process, thereby preventing clogging of the filter membrane assembly 41 and ensuring unobstructed circulation. A sampling valve 411 is located on one side of the filter membrane assembly 41. The sampling valve 411 is used to periodically check the filtration effect of the filter membrane assembly 41, thereby ensuring that the filtered etching solution reaches the expected purity and preventing impurities from affecting the etching quality.

[0029] The filter membrane assembly 41 uses multi-layer composite filter media to effectively filter impurities in the etching solution through layer-by-layer filtration, thereby ensuring the purity of the etching solution. The maintenance cycle of the filter membrane assembly 41 can be determined based on the quality of the etching solution discharged from the sampling valve 411, and the filter media should be replaced in a timely manner to ensure the filtration effect.

[0030] The lifting assembly 6 includes a lifting plate 61, a drive screw 62, and a drive motor 63 located on one side of the drive screw 62. The drive screw 62 is rotatably mounted on both sides of the bracket 1. The lifting plate 61 is slidably mounted on the bracket 1 via the drive screw 62. Connecting brackets 52 for the lifting plate 61 are provided on both sides of the filter plate 5. Guide rods 11 that cooperate with the lifting plate 61 are provided on both sides of the bracket 1. The drive screw 62 is rotatably mounted on the bracket 1 via a bearing seat and bearing cooperation. The bracket 1 is provided with a motor mount for mounting the drive motor 63. The lifting plate 61 is provided with a screw nut and a guide sleeve that cooperate with the drive screw 62 and the guide rods 11, respectively.

[0031] The threaded engagement between the lead screw nut and the drive lead screw 62 allows the lifting plate 61 to rise and fall smoothly under the drive of the drive motor 63. The sliding engagement between the guide sleeve and the guide rod 11 ensures the stability and accuracy of the lifting plate 61 in the vertical direction, thus preventing the filter plate 5 from colliding with the etching tank 2 due to vibration or displacement, which could lead to damage to the etching tank 2.

[0032] The beneficial effects of this invention are as follows: The bubbling assembly 3 agitates the etching solution, thereby increasing its fluidity. The circulating filter assembly 4 effectively filters impurities from the etching solution, improving its purity and ensuring uniform etching of the workpiece surface. Furthermore, the cooperation between the filter plate 5 and the lifting assembly 6 allows the filter plate 5 to slide up and down within the etching tank 2, achieving separation and contact between the workpiece and the etching solution, thus simplifying the workpiece removal process and improving operational efficiency.

[0033] The above description is merely a preferred embodiment of the present utility model and is not intended to limit the present utility model in any way. Although the present utility model has been disclosed above with reference to a preferred embodiment, it is not intended to limit the present utility model. Any person skilled in the art can make some changes or modifications to the above-disclosed technical content to create equivalent embodiments without departing from the scope of the present utility model. Any simple modifications, equivalent changes, and modifications made to the above embodiments based on the present utility model without departing from the scope of the present utility model shall fall within the scope of the present utility model.

Claims

1. A novel etching reaction tank, comprising a support (1) and an etching tank (2) mounted on the support (1), characterized in that: The bracket (1) is provided with a bubble assembly (3) and a circulating filter assembly (4) that cooperate with the etching tank (2). The etching tank (2) is provided with a filter plate (5) that can slide up and down. A number of through holes (51) are provided on one side of the filter plate (5). The bracket (1) is provided with lifting assemblies (6) that cooperate with the filter plate (5) on both sides.

2. The novel etching reaction tank according to claim 1, characterized in that: The bubbling assembly (3) includes a bubbling tube (31) and a blower (32). The bubbling tube (31) is located inside the etching tank (2). The blower (32) is installed on one side of the bracket (1) and is connected to the bubbling tube (31). The bubbling tube (31) has a plurality of bubbling holes (311).

3. The novel etching reaction tank according to claim 2, characterized in that: A one-way valve (33) is provided between the blower (32) and the bubbling pipe (31).

4. The novel etching reaction tank according to claim 1, characterized in that: The circulating filtration assembly (4) includes a filter membrane assembly (41), a first water pump (42), and a second water pump (43). The etching tank (2) is provided with an outlet pipe (21) and an inlet pipe (22). The filter membrane assembly (41) is connected to the outlet pipe (21) and the inlet pipe (22) through the first water pump (42) and the second water pump (43), respectively.

5. The novel etching reaction tank according to claim 4, characterized in that: A sampling valve (411) is provided on one side of the filter membrane assembly (41).

6. The novel etching reaction tank according to claim 1, characterized in that: The lifting assembly (6) includes a lifting plate (61), a drive screw (62), and a drive motor (63) located on one side of the drive screw (62). The drive screw (62) is rotatably mounted on both sides of the bracket (1). The lifting plate (61) is slidably mounted on the bracket (1) via the drive screw (62). Both sides of the filter plate (5) are provided with connecting frames (52) to the lifting plate (61).

7. The novel etching reaction tank according to claim 6, characterized in that: The bracket (1) is provided with guide rods (11) on both sides that cooperate with the lifting plate (61).

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