A semiconductor target melting and purification apparatus

Abstract

This utility model provides a semiconductor target melting and purification device, belonging to the technical field of copper target melting equipment. It includes a movable device installed at the bottom of the melting furnace body, with a support frame on each side. A support platform is slidably installed on the top of the support frame, with an opening in the middle of the support platform. Two sliding devices are slidably installed within the opening, and a support rod is fixedly installed at the bottom of each sliding device. A cleaning trough is movably installed between the bottoms of the support rods. This utility model adjusts the position of the cleaning trough relative to the melting furnace body using the movable device and an electric telescopic rod. Then, by starting a motor, the pawl drives the feed to rotate, which in turn drives the ratchet to rotate the shaft and the cleaning trough, thus completing the collection action and cleaning the impurities floating on the top of the melting furnace body. Finally, the cleaning trough is rotated to allow the collected waste residue to be deposited into a waste bin, completing the operation. This reduces the risk of injury to operators and improves purification efficiency.

Description

Technical Field

[0001] This utility model relates to the technical field of copper target smelting equipment, and specifically to a semiconductor target smelting and purification device. Background Technology

[0002] Copper sputtering targets are core materials for sputtering coatings in semiconductors, flat panel displays, photovoltaics, and other fields. Their purity and internal structure directly affect the coating quality. Copper sputtering target purification and smelting equipment is a key piece of equipment for achieving the preparation of high-purity copper sputtering targets. Its core design is to remove metallic impurities, gaseous impurities, and non-metallic inclusions from the raw materials through a synergistic effect of smelting and purification, and to obtain copper billets with uniform composition and dense structure.

[0003] In related technologies, copper target purification equipment typically consists of a raw material pretreatment system, a smelting system, a purification system, an ingot casting system, and finally, qualified copper material.

[0004] In remelting systems, scrap copper targets are often used for smelting and purification to save resources. By putting the scrap copper targets into the smelting furnace, many impurities will float on the surface of the molten copper during smelting. In the existing technology, manual retrieval is often used to clean the impurities on the surface of the molten copper. This method not only increases the risk of injury to operators, but is also inefficient. To solve the above problems, a semiconductor target smelting and purification device is proposed. Utility Model Content

[0005] In view of this, the present invention provides a semiconductor target melting and purification device. The present invention adjusts the position of the cleaning tank and the melting furnace body by means of a moving device and an electric telescopic rod. Then, by starting the motor, the pawl drives the feed to rotate, which in turn drives the ratchet to rotate the shaft and the cleaning tank, thereby completing the receiving action. This cleans the impurities floating on the top of the melting furnace body. Finally, the cleaning tank is controlled to rotate so that the collected waste residue is put into the waste box to complete the operation. This reduces the risk of injury to the operator and improves the purification efficiency.

[0006] To solve the above-mentioned technical problems, this utility model provides a semiconductor target melting and purification device, including a movable device installed at the bottom of the melting furnace body, a support frame installed on both sides of the movable device, a support platform slidably installed on the top of the support frame, an opening in the middle of the support platform, two sliding devices slidably installed in the opening, a support rod fixedly installed at the bottom of each sliding device, and a cleaning groove movably installed between the bottoms of the support rods.

[0007] The cleaning groove is arc-shaped, and a rotating shaft is provided at both ends of the cleaning groove. The rotating shaft is used to rotate the cleaning groove. A sealing shell is provided on the side of each rotating shaft away from the center of the cleaning groove. The sealing shell is used to seal components such as ratchet and pawl.

[0008] Each sealed housing contains a ratchet that is rotatably connected to the rotating shaft. The ratchet is connected to a pawl, and a pawl is engaged at the end of the ratchet away from the rotating shaft. The pawl, in conjunction with the ratchet, is used to change the rotation direction of the motor shaft. A connecting shaft is rotatably mounted on the pawl, which is used to connect the output shaft of the motor to the pawl. Thus, when the output shaft of the motor rotates, the ratchet and the pawl work synchronously. A motor is mounted on the top of the connecting shaft, which drives the ratchet to rotate.

[0009] A slide rail is symmetrically embedded in the opening. The slide rail is used for the movement of the slider. The sliding device includes two sliders that are slidably disposed between the slide rails. The sliders are used to connect the support rod to the support platform. A support rod is fixedly disposed at the bottom of each slider. The support rod is used to connect the slider to the cleaning groove. A connecting block is disposed at the top of each slider. The connecting block is used to install the linkage plate. A linkage plate is fixedly disposed between the tops of the connecting blocks. The linkage plate is used to connect the two connecting blocks and the two support rods into one unit.

[0010] One of the connecting blocks has an electric push rod on the side furthest from the center of the cleaning tank. The electric push rod is used to move the sliding device. The other connecting block has a driven telescopic rod on the side furthest from the center of the cleaning tank. The driven telescopic rod is used to adjust the position of the sliding device on the opening. The drive end of the electric push rod is mounted on the support platform, thereby connecting the electric push rod to the support platform. A positioning block is provided at the end of the driven telescopic rod furthest from the connecting block. The positioning block is used to fix the driven telescopic rod and also to connect the driven telescopic rod to the support platform. The positioning block is fixed on the support platform.

[0011] The support frame includes two symmetrically arranged fixed vertical plates for supporting the support platform. Each fixed vertical plate has a slide rail at its top, and a movable block is slidably mounted on each slide rail. The movable block is used to connect the support platform to the fixed vertical plate. Each movable block is fixed to the support platform on the same side. An electric telescopic rod is provided at one end of each slide rail on the same side. The electric telescopic rod is used to move the movable block, thereby moving the support platform and the components installed on it. Each electric push rod is connected to the movable block on the same side.

[0012] A waste bin is installed on the opposite side of the mobile device, which is used to collect waste residue in the cleaning tank.

[0013] In summary, compared with the prior art, this application includes at least one of the following beneficial technical effects:

[0014] 1. The position of the cleaning trough and the smelting furnace body is adjusted by the moving device and electric telescopic rod. Then, the motor is started to make the pawl drive the feed to rotate, which in turn drives the ratchet to rotate the shaft and the cleaning trough to complete the receiving action. This cleans the impurities floating on the top of the smelting furnace body. Then, the cleaning trough is rotated to put the collected waste slag into the waste box to complete the operation. This reduces the risk of injury to the operator and improves the purification efficiency.

[0015] 2. The electric push rod is used to move the sliding device, and the driven telescopic rod is used to adjust the position of the sliding device on the opening. The drive end of the electric push rod is mounted on the support platform by bolts, thereby connecting the electric push rod to the support platform. A positioning block is provided at the end of the driven telescopic rod away from the connecting block. The positioning block is used to fix the driven telescopic rod and also to connect the driven telescopic rod to the support platform.

[0016] 3. The waste bin can be a movable bin made of high-temperature resistant material. The waste bin is used to collect waste residue in the cleaning tank. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of the main structure of this utility model;

[0018] Figure 2 This is a front sectional view of the present invention;

[0019] Figure 3 This utility model Figure 2 A magnified view of part A;

[0020] Figure 4 This is a side sectional view of the present invention;

[0021] Figure 5 This is a top sectional view of the present invention.

[0022] Explanation of reference numerals in the attached drawings: 100, smelting furnace body; 101, moving device; 102, support frame; 103, support platform; 104, fixed vertical plate; 105, slide rail; 106, moving block; 107, electric telescopic rod; 108, waste bin; 200, opening; 201, slide rail; 202, slider; 203, connecting block; 204, linkage plate; 205, electric push rod; 206, driven telescopic rod; 207, positioning block; 208, sliding device; 209, support rod; 300, cleaning groove; 301, rotating shaft; 302, sealing shell; 303, ratchet; 304, pawl; 305, connecting shaft; 306, motor. Detailed Implementation

[0023] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the following will be described in conjunction with the accompanying drawings of the embodiments of this utility model. Figure 1-5The technical solutions of the embodiments of this utility model are clearly and completely described below. Obviously, the described embodiments are only some, not all, of the embodiments of this utility model. All other embodiments obtained by those skilled in the art based on the described embodiments of this utility model are within the protection scope of this utility model.

[0024] like Figure 1-5 As shown: This embodiment provides a semiconductor target melting and purification device, including a moving device 101 at the bottom of a melting furnace body 100, including a moving platform, a rotating base at the bottom of the moving platform, and multiple movable push rods at the bottom of the rotating base. The moving platform on the moving device 101 is provided with a heat insulation plate for placing the melting furnace body 100. A support frame 102 is provided on both sides of the moving device 101. A support platform 103 is slidably provided on the top of the support frame 102. The support platform 103 is fixedly connected to the moving block 106 by bolts. An opening 200 is provided in the middle of the support platform 103. Two sliding devices 208 are slidably provided in the opening 200. A support rod 209 is fixedly provided at the bottom of each sliding device 208. A cleaning groove 300 is movably provided between the bottoms of the support rods 209. The cleaning groove 300 is arc-shaped to facilitate the collection of impurities floating on the top of the melting furnace body 100.

[0025] In use, the position of the cleaning trough 300 and the smelting furnace body 100 is adjusted by the moving device 101 and the electric telescopic rod 107. Then, the starting motor 306 drives the pawl 304 to rotate the feed, which in turn drives the ratchet 303 to rotate the rotating shaft 301 and the cleaning trough 300, thereby completing the receiving action and cleaning the impurities floating on the top of the smelting furnace body 100. Finally, the cleaning trough 300 is rotated to put the collected waste residue into the waste box 108 to complete the operation, reducing the risk of injury to the operator and improving the purification efficiency.

[0026] This embodiment provides a semiconductor target melting and purification apparatus.

[0027] like Figure 1 , 2As shown in Figures 3 and 4: The cleaning groove 300 is arc-shaped. A rotating shaft 301 is rotatably mounted at both ends of the cleaning groove 300. The rotating shaft 301 is rotatably connected to the cleaning groove 300, allowing the cleaning groove 300 to rotate. A sealing shell 302 is provided on the side of each rotating shaft 301 furthest from the center of the cleaning groove 300. A gap exists between the sealing shell 302 and the cleaning groove 300 to allow rotation. The sealing shell 302 seals components such as the ratchet 303 and pawl 304. A ratchet 303 is rotatably connected to the rotating shaft 301 within each sealing shell 302. The ratchet 303 connects to the pawl 304, and is located furthest from the rotating shaft 301. One end of the motor 306 is engaged with a pawl 304, which is rotatably connected to a connecting shaft 305. The pawl 304, in conjunction with a ratchet 303, is used to change the rotation direction of the motor 306's shaft 301. A connecting shaft 305 is rotatably mounted on the pawl 304. The connecting shaft 305 is sealed to the electric output end via a coupling. The connecting shaft 305 is used to connect the output shaft of the motor 306 with the pawl 304, so that when the output shaft of the motor 306 rotates, the ratchet 303 and the pawl 304 work synchronously. A motor 306 is mounted on the top of the connecting shaft 305. The motor 306 is fixed to the support rod 209 by bolts. The motor 306 is used to drive the ratchet 303 to rotate.

[0028] Its effect is as follows: the rotating shaft 301 is used to rotate the cleaning groove 300; the sealing shell 302 is used to seal components such as the ratchet 303 and the pawl 304; the ratchet 303 is used to connect with the pawl 304; the pawl 304 is rotatably connected to the connecting shaft 305; the pawl 304, in conjunction with the ratchet 303, is used to change the rotation direction of the rotating shaft 301 of the motor 306; and the connecting shaft 305 is used to connect the output shaft of the motor 306 with the pawl 304. Thus, when the output shaft of the motor 306 rotates, the ratchet 303 and the pawl 304 work synchronously, and the motor 306 is used to drive the ratchet 303 to rotate.

[0029] like Figure 1 , 2As shown in Figures 3, 4, and 5: A slide rail 201 is symmetrically embedded within the opening 200. The slide rail 201 is used for the movement of the slider 202. The sliding device 208 includes two sliders 202 slidably disposed between the slide rail 201. The sliders 202 are slidably engaged with the slide rail 201. The sliders 202 are used to connect the support rod 209 to the support platform 103. A support rod 209 is fixedly disposed at the bottom of each slider 202. The support rod 209 and the slider 202 can be welded together or fixed by bolts. The support rod 209 is used to connect the slider 202 to the cleaning groove 300. Each slider 202 is provided with a connecting block 203 on its top. The connecting block 203 can be welded to the slider 202 or fixed by bolts. The connecting block 203 is used to install the linkage plate 204. The linkage plate 204 is fixedly provided between the tops of the connecting blocks 203. The linkage plate 204 can be welded to the connecting block 203 or fixed by bolts. The linkage plate 204 is used to connect the two connecting blocks 203 and the two support rods 209 into one unit.

[0030] Its effects are as follows: the slider 202 is used to connect the support rod 209 to the support platform 103, the support rod 209 is used to connect the slider 202 to the cleaning groove 300, the connecting block 203 is used to install the linkage plate 204, and the linkage plate 204 is used to connect the two connecting blocks 203 and the two support rods 209 into one unit.

[0031] like Figure 1 , 2 As shown in Figures 3 and 4: One of the connecting blocks 203 has an electric push rod 205 on the side furthest from the center of the cleaning groove 300. The telescopic end of the electric push rod 205 is bolted to one of the connecting blocks 203. The electric push rod 205 is used to push the sliding device 208 to move. The other connecting block 203 has a driven telescopic rod 206 on the side furthest from the center of the cleaning groove 300. The telescopic end of the driven telescopic rod 206 is bolted to the other connecting block 203. The driven telescopic rod 206 is used to... Adjust the position of the sliding device 208 on the opening 200. The drive end of the electric push rod 205 is bolted to the support platform 103, thereby connecting the electric push rod 205 to the support platform 103. A positioning block 207 is provided at the end of the driven telescopic rod 206 away from the connecting block 203. The positioning block 207 is used to fix the driven telescopic rod 206 and also to connect the driven telescopic rod 206 to the support platform 103. The positioning block 207 is fixed to the support platform 103 by bolts.

[0032] Its effects are as follows: the electric push rod 205 is used to push the sliding device 208 to move, the driven telescopic rod 206 is used to adjust the position of the sliding device 208 on the opening 200, the driving end of the electric push rod 205 is installed on the support platform 103 by bolts, so that the electric push rod 205 is connected to the support platform 103, and a positioning block 207 is provided at the end of the driven telescopic rod 206 away from the connecting block 203. The positioning block 207 is used to fix the driven telescopic rod 206 and also to connect the driven telescopic rod 206 to the support platform 103.

[0033] like Figure 1 , 2 As shown: The support frame 102 includes two symmetrically arranged fixed vertical plates 104, which are embedded in the ground. The two fixed vertical plates 104 are used to support the support platform 103. Each fixed vertical plate 104 has a slide rail 105 at its top, which is embedded in the top of the fixed vertical plate 104. Each slide rail 105 has a movable block 106 slidably arranged on it. The movable block 106 is used to connect the support platform 103 with the fixed vertical plate 104. Each movable block 106 is fixed to the support platform 103 on the same side. Each slide rail 105 has an electric telescopic rod 107 at one end on the same side. The driving end of the electric telescopic rod 107 is fixed to the support frame 102 by bolts. The electric telescopic rod 107 is used to drive the movable block 106 to move, thereby driving the support platform 103 and the components installed on it to move. Each electric push rod 205 is connected to the movable block 106 on the same side.

[0034] Its effect is as follows: the movable block 106 is used to connect the support platform 103 with the fixed vertical plate 104, and the electric telescopic rod 107 is used to drive the movable block 106 to move, thereby driving the support platform 103 and the components installed on it to move.

[0035] like Figure 1 , 4 As shown: A waste container 108 is provided on the opposite side of the mobile device 101. The waste container 108 can be a container that is easy to move. The waste container 108 is made of high temperature resistant material. The waste container 108 is used to collect waste residue in the cleaning tank 300.

[0036] Working principle: The position of the cleaning tank 300 and the smelting furnace body 100 is adjusted by the moving device 101 and the electric telescopic rod 107. Then, the starting motor 306 drives the pawl 304 to rotate the feed, which in turn drives the ratchet 303 to rotate the rotating shaft 301 and the cleaning tank 300, thereby completing the receiving action and cleaning the impurities floating on the top of the smelting furnace body 100. The cleaning tank 300 can be preheated before operation. The electric telescopic rod 107 controls the support platform 103 to be above the waste box 108, and then controls the rotation of the cleaning tank 300 to put the collected waste residue into the waste box 108 to complete the operation. This reduces the risk of injury to the operator and improves the purification efficiency.

[0037] Furthermore, it should be noted that, in the description of this utility model, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.

[0038] The above description is the preferred embodiment of this utility model. It should be noted that for those skilled in the art, several improvements and modifications can be made without departing from the principle of this utility model, and these improvements and modifications should also be considered within the protection scope of this utility model.

Claims

1. A semiconductor target melting and purification apparatus, comprising a moving device (101) disposed at the bottom of a melting furnace body (100), characterized in that: The mobile device (101) has a support frame (102) on both sides. A support platform (103) is slidably provided on the top of the support frame (102). An opening (200) is provided in the middle of the support platform (103). Two sliding devices (208) are slidably provided in the opening (200). A support rod (209) is fixedly provided at the bottom of each sliding device (208). A cleaning groove (300) is movably provided between the bottoms of the support rods (209).

2. The semiconductor target melting and purification apparatus as described in claim 1, characterized in that: The cleaning groove (300) is arc-shaped, and a rotating shaft (301) is rotatably provided at both ends of the cleaning groove (300). A sealing shell (302) is provided on the side of each rotating shaft (301) away from the center of the cleaning groove (300).

3. The semiconductor target melting and purification apparatus as described in claim 2, characterized in that: Each of the sealing shells (302) is provided with a ratchet (303) that is rotatably connected to the rotating shaft (301). A pawl (304) is engaged with one end of the ratchet (303) away from the rotating shaft (301). A connecting shaft (305) is rotatably provided on the pawl (304). A motor (306) is provided on the top of the connecting shaft (305).

4. The semiconductor target melting and purification apparatus as described in claim 3, characterized in that: A slide rail (201) is symmetrically embedded in the opening (200). The sliding device (208) includes two sliders (202) that are slidably disposed between the slide rails (201). A support rod (209) is fixedly disposed at the bottom of each slider (202). A connecting block (203) is disposed at the top of each slider (202). A linkage plate (204) is fixedly disposed between the tops of the connecting blocks (203).

5. The semiconductor target melting and purification apparatus as described in claim 4, characterized in that: One of the connecting blocks (203) is provided with an electric push rod (205) on the side away from the center of the cleaning groove (300), and the other connecting block (203) is provided with a driven telescopic rod (206) on the side away from the center of the cleaning groove (300). The driving end of the electric push rod (205) is installed on the support platform (103), and the driven telescopic rod (206) is provided with a positioning block (207) on the end away from the connecting block (203). The positioning block (207) is fixed on the support platform (103).

6. The semiconductor target melting and purification apparatus as described in claim 5, characterized in that: The support frame (102) includes two symmetrically arranged fixed vertical plates (104). Each fixed vertical plate (104) has a slide rail (105) at its top. Each slide rail (105) has a movable block (106) slidably arranged on it. Each movable block (106) is fixed on the support platform (103) on the same side. Each slide rail (105) has an electric telescopic rod (107) at one end on the same side. Each electric push rod (205) is connected to the movable block (106) on the same side.

7. The semiconductor target melting and purification apparatus as described in claim 6, characterized in that: A waste container (108) is provided on the opposite side of the mobile device (101).

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