Real-time active focus exposure machine and smart dual stage ldi system

Abstract

The utility model provides an exposure machine and intelligent double platform LDI system of real time initiative focus belongs to the field of laser intelligent processing, and the exposure machine includes exposure head and initiative focus module, exposure head includes laser source and exposure lens module, initiative focus module includes focus displacement sensor, compensation optical wedge, optical wedge drive module and focus processor, optical wedge drive module adjusts compensation optical wedge based on the product surface undulation data measurement of focus displacement sensor, realizes real time focus adjustment, the exposure machine of the application has adopted initiative focus scheme, adapts to high speed high accuracy exposure imaging, the system adopts the front and back double workstation alternate exposure, and production efficiency is high, and it is convenient to promote application in the field of IC carrier board, soft board, HDI board, multilayer board, ceramic substrate, alloy plate etc.

Description

Technical Field

[0001] This utility model belongs to the field of laser processing, specifically relating to a real-time active focusing exposure machine and an intelligent dual-platform LDI system. Background Technology

[0002] Laser Direct Imaging (LDI) is a device that uses a laser beam to precisely project circuit patterns onto a photosensitive material, thereby creating high-precision circuit board patterns. It is primarily used in the circuit board manufacturing industry, especially in the exposure process of PCB (Printed Circuit Board) manufacturing.

[0003] When processing IC substrates, it was found that unidirectional or single-channel exposure efficiency is low. Furthermore, for substrates with slight height differences, or for exposure processing of different layers of the same substrate, traditional focusing methods suffer from low accuracy and slow response speed. Therefore, there is an urgent need to develop an exposure machine capable of active, high-precision focusing to improve both efficiency and accuracy. Utility Model Content

[0004] In order to overcome the shortcomings of the prior art, the purpose of this utility model is to provide a real-time active focusing exposure machine and an intelligent dual-platform LDI system, which can solve the above-mentioned problems.

[0005] An exposure machine with real-time active focusing is disclosed. The exposure machine includes an exposure head and an active focusing module. The exposure head includes a laser source and an exposure lens module. The active focusing module includes a focus displacement sensor, a compensation wedge, a wedge driving module, and a focusing processor. The wedge driving module adjusts the compensation wedge based on the product surface undulation data measured by the focus displacement sensor to achieve real-time focus adjustment.

[0006] Furthermore, the exposure head also includes an exposure holder and an image acquisition component; the image acquisition component is electrically connected to the image processor.

[0007] Furthermore, the image acquisition component employs a digital micromirror device (DMD), and a DMD water-cooling unit is connected to the image acquisition component for temperature control.

[0008] Furthermore, the laser source uses ultraviolet / deep ultraviolet laser, and a water-cooling unit for the light source is connected to the laser source for temperature control.

[0009] Furthermore, each compensation wedge of the active focusing module is equipped with two focus displacement sensors along the exposure direction. The focusing processor detects the fluctuation position and change in the super-depth of focus range based on the focus displacement sensors, and then triggers the wedge drive module to drive the compensation wedge to move. When the super-depth of focus position moves to the wedge position, the focal plane is adjusted to the correct position.

[0010] Furthermore, the exposure head is arranged in multiple arrays, and a corresponding number of active focusing modules are set below the lens array of the corresponding exposure lens module.

[0011] Furthermore, the exposure machine also includes a positioning module for positioning the workpiece to be processed below.

[0012] This utility model also provides an intelligent dual-platform LDI system, including an exposure station, an A-stage material platform, a B-stage material platform, an alignment module, and a peripheral module for controlling temperature, humidity, and pressure; the A-stage material platform and the B-stage material platform are arranged on both sides of the exposure station, and the material is loaded and unloaded alternately; the exposure station adopts the aforementioned exposure machine; the two alignment modules are straddling the material platforms on the corresponding sides for front positioning of the workpiece to be processed.

[0013] Compared with the prior art, the beneficial effects of this utility model are as follows: the exposure machine of this application adopts an active focusing scheme, which is suitable for high-speed and high-precision exposure imaging; the system adopts alternating exposure at front and rear dual stations, which has high production efficiency and is easy to promote and apply in the fields of IC carrier boards, flexible boards, HDI boards, multilayer boards, ceramic substrates, alloy boards, etc. Attached Figure Description

[0014] Figure 1 This is an attempt to understand the principle of active focusing in this utility model; Figure 2 This is a schematic diagram of the real-time active focusing exposure machine of this utility model; Figure 3 This is a schematic diagram of an exposure machine using an array arrangement; Figure 4 This is a schematic diagram of an intelligent dual-platform LDI system.

[0015] In the picture, 100. Exposure station; 110. Exposure head; 111. Laser source; 112. Upper exposure frame; 113. Exposure lens module; 114. Image acquisition component; 115. Image processor; 116. DMD water-cooling unit; 117. Light source water-cooling unit; 118. Lower exposure frame; 120. Active focusing module; 121. Focusing displacement sensor; 122. Compensation wedge; 123. Wedge drive module; 130. Positioning module; 200, Material A Platform; 300, B material station; 400. Alignment module; 500. Exposure calibration module; 600. Temperature control module; 700. Water chiller; 800. Dryer; 900. Gas storage tank; 1000. Blower. Detailed Implementation

[0016] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this utility model. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.

[0017] Exposure machine A real-time active focusing exposure machine, see Figures 1-3 The exposure machine includes an exposure head 110 and an active focusing module 120; the exposure head 110 includes a laser source 111 and an exposure lens module 113; the active focusing module 120 includes a focus displacement sensor 121, a compensation wedge 122, a wedge drive module 123, and a focusing processor; the wedge drive module 123 adjusts the compensation wedge 122 based on the product surface undulation data measured by the focus displacement sensor 121 to achieve real-time focus adjustment.

[0018] Furthermore, the exposure head 110 also includes an exposure holder and an image acquisition component 114; the image acquisition component 114 is electrically connected to the image processor 115.

[0019] The laser source 111 uses ultraviolet / deep ultraviolet laser, and a water-cooling unit 117 is connected to the laser source 111 to control the temperature.

[0020] The exposure lens module 113 adopts a hybrid band imaging lens, and the compensation wedge 122 of the active focusing module 120 is located directly below the objective lens of the exposure lens module 113.

[0021] The image acquisition component 114 uses a digital micromirror device (DMD), and a DMD water-cooling unit 116 is connected to the image acquisition component 114 for temperature control.

[0022] In a specific example, the exposure frame includes an upper exposure frame 112 and a lower exposure frame 118.

[0023] In this active focusing module 120, each compensation wedge 122 is equipped with two focus displacement sensors 121 along the exposure direction. After the focus processor detects the position and change of the super-depth of focus range based on the focus displacement sensors 121, it triggers the wedge drive module 123 to drive the compensation wedge 122 to move. When the super-depth of focus position moves to the wedge position, the focal plane is adjusted to the correct position.

[0024] The focusing displacement sensor 121 is a laser displacement sensor, the compensation optical wedge 122 is a double wedge prism that slides at relative intervals, the surface of the double wedge prism is provided with an anti-reflection film layer, and the driver of the optical wedge drive module 123 is an actuator.

[0025] In a specific example, the air gap between the wedge faces of the double wedge prism is 0.1mm-1.0mm, and the actuator stroke is greater than 14mm.

[0026] The focusing processor uses a vector position compensation algorithm, which is based on the real-time workpiece surface height signal from the laser displacement sensor. The algorithm corrects the uncertainty in exposure position accuracy caused by motion accuracy error, thereby reducing hardware costs.

[0027] See Figure 3 The exposure head 110 is arranged in multiple arrays, and a corresponding number of active focusing modules 120 are set below the lens array of the corresponding exposure lens module 113.

[0028] Furthermore, the exposure machine also includes a positioning module 130 for positioning the workpiece to be processed below.

[0029] Intelligent Dual-Platform LDI System A smart dual-platform LDI system, see [link / reference] Figure 4 It includes an exposure station 100, an A-stage platform 200, a B-stage platform 300, an alignment module 400, and peripheral modules for controlling temperature, humidity, and pressure. The A-stage platform 200 and the B-stage platform 300 are arranged on both sides of the exposure station 100, and the materials are loaded and unloaded alternately. The exposure station 100 adopts the aforementioned exposure machine. The two alignment modules 400 are straddling the corresponding material stages above the material stages for front positioning of the workpieces to be processed.

[0030] The intelligent dual-platform LDI system also includes an exposure calibration module 500, which is connected to the carrier modules of A platform 200 and B platform 300 via a calibration adapter.

[0031] The peripheral modules include a temperature control module 600, a water chiller 700, a dryer 800, an air storage tank 900, and a blower 1000, which are used to regulate the exposure station 100 to maintain a constant temperature, humidity, and pressure working environment.

[0032] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this utility model, and not to limit it. Although this utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of this utility model.

Claims

1. A real-time active focusing exposure machine, comprising an exposure head (110) and an active focusing module (120); characterized in that: The exposure head (110) includes a laser source (111) and an exposure lens module (113); the active focusing module (120) includes a focus displacement sensor (121), a compensation wedge (122), a wedge drive module (123), and a focusing processor; the wedge drive module (123) adjusts the compensation wedge (122) based on the product surface undulation data measured by the focus displacement sensor (121) to achieve real-time focus adjustment.

2. The exposure machine according to claim 1, characterized in that: The exposure head (110) also includes an exposure holder and an image acquisition component (114); the image acquisition component (114) is electrically connected to an image processor (115).

3. The exposure machine according to claim 1, characterized in that: The image acquisition component (114) uses a digital micromirror device (DMD), and a DMD water-cooling unit (116) is connected to the image acquisition component (114) for temperature control.

4. The exposure machine according to claim 1, characterized in that: The laser source (111) uses ultraviolet / deep ultraviolet laser, and a water-cooling unit (117) is connected to the laser source (111) for temperature control.

5. The exposure machine according to claim 1, characterized in that: The exposure lens module (113) adopts a hybrid band imaging lens, and the compensation wedge (122) of the active focusing module (120) is located directly below the objective lens of the exposure lens module (113).

6. The exposure machine according to claim 1, characterized in that: Each compensation wedge (122) of the active focusing module (120) has two focus displacement sensors (121) set in front and behind along the exposure direction. After the focusing processor detects the position and change of the super-depth of focus range based on the focus displacement sensor (121), it triggers the wedge drive module (123) to drive the compensation wedge (122) to move. When the super-depth of focus position moves to the wedge position, the focal plane is adjusted to the correct position.

7. The exposure machine according to claim 1 or 6, characterized in that: The focusing displacement sensor (121) adopts a laser displacement sensor, the compensation optical wedge (122) adopts a double wedge prism with relative interval sliding, the surface of the double wedge prism is provided with an anti-reflection film layer, and the driver of the optical wedge drive module (123) adopts an actuator.

8. The exposure machine according to claim 2, characterized in that: The exposure head (110) is arranged in multiple arrays, and a corresponding number of active focusing modules (120) are set below the lens array of the corresponding exposure lens module (113).

9. The exposure machine according to claim 8, characterized in that: The exposure machine also includes a positioning module (130) for positioning the workpiece to be processed below.

10. An intelligent dual-platform LDI system, characterized in that: It includes an exposure station (100), an A-stage platform (200), a B-stage platform (300), an alignment module (400), and peripheral modules for controlling temperature, humidity, and pressure; the A-stage platform (200) and the B-stage platform (300) are arranged on both sides of the exposure station (100) and alternately load and unload materials; the exposure station (100) adopts the exposure machine described in claim 8 or 9; the two alignment modules (400) are straddling the corresponding material stages above the material stages for front positioning of the workpiece to be processed.

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