SAFETY ELEMENT

Description

[0001] The invention relates to a security element for securities or security papers, wherein the security element has an embossing with diffractive embossed structures.

[0002] In the present context, valuable documents and security papers are understood to mean, in particular, banknotes, passports, identity cards, tickets, event tickets, securities, etc.

[0003] Security elements of the above-mentioned type have become known in large numbers. The embossing is typically used to create a visually recognizable security feature.

[0004] Relevant security elements are known from DE102005061749A1, DE102012105571A1, DE102017009226A1, and DE 10 2010 025775 A1. Security elements having relief structures and reflective layers are also known from WO2010 / 059208A2 and WO2012 / 123303 A1.

[0005] The object of the present invention is to create an embossed security element whose security against counterfeiting is further increased.

[0006] This object is achieved according to the invention with a security element of the type mentioned at the outset in that the embossed structures are at least partially coated with a partial, metallic layer forming a mosaic-like image, wherein a partial layer is understood to mean a layer that is interrupted and thus only partially present as a closed layer.

[0007] By combining the embossed structures with a mosaic-like image, an image with a three-dimensional impression that is recognizable to the viewer can be created, which significantly increases the security against counterfeiting.

[0008] According to an advantageous variant of the invention, it can be provided that the embossed structures are designed as achromatic embossed structures.

[0009] It has proven particularly advantageous for the embossed structures to form a relief that matches the mosaic-like image. For example, the embossed structures can correspond to a three-dimensional representation of an image underlying the mosaic-like image or a motif of the mosaic-like image.

[0010] According to a preferred embodiment of the invention, the embossed structures can form a bas-relief. An example of a bas-relief is the minting of a coin.

[0011] In order to achieve a particularly good three-dimensional impression of the mosaic-like image, the embossed structures can be designed to be translucent.

[0012] According to an advantageous development of the invention, it can be provided that the security element has a carrier film made of plastic, in particular of translucent plastic.

[0013] According to a preferred variant, it is provided that the carrier film and / or the embossed structures are made of one or more materials selected from the group polyimide (PI), polypropylene (PP), monoaxially oriented polypropylene (MOPP), biaxially oriented polypropylene (BOPP), polyethylene (PE), polyphenylene sulfide (PPS), polyetheretherketone (PEEK), polyetherketone (PEK), polyethyleneimide (PEI), polysulfone (PSU), polyaryletherketone (PAEK), polyethylene naphthalate (PEN), liquid crystalline polymers (LCP), polyester, polybutylene terephthalate (PBT), polyethylene terephthalate (PET), polyamide (PA), polycarbonate (PC), cycloolefin copolymers (COC), polyoxymethylene (POM), acrylonitrile butadiene styrene (ABS), polyvinyl chloride (PVC), ethylenetetrafluoroethylene (ETFE), polytetrafluoroethylene (PTFE), polyvinyl fluoride (PVF), polyvinylidene fluoride (PVDF). and / or ethylene-tetrafluoroethylene-hexafluoropropylene fluoroterpolymer (EFEP).

[0014] It has proven particularly advantageous that the layer forming the mosaic-like image consists of at least one metallic material, in particular selected from the group consisting of aluminum, silver, copper, gold, platinum, niobium, tin, or of nickel, titanium, vanadium, chromium, cobalt and palladium or alloys of these materials, in particular cobalt-nickel alloys, or of at least one high-index dielectric material with a refractive index of greater than 1.65, in particular selected from the group consisting of zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO 2 ), carbon (C), indium oxide (In 2 O 3 ), indium tin oxide (ITO), tantalum pentoxide (Ta 2 O 5 ), cerium oxide (CeO 2 ), yttrium oxide (Y 2 O 3 ), europium oxide (Eu 2 O 3 ), iron oxides such as, for example, (II) iron (III) oxide (Fe 3 O 4 ) and Iron oxide (Fe 2 O 3 ), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO 2 ), lanthanum oxide (La 2 O 3 ), magnesium oxide (MgO), neodymium oxide (Nd 2 O 3 ), praseodymium oxide (Pr 6 O 11 ),Samarium oxide (Sm 2 O 3 ), antimony trioxide (Sb 2 O 3 ), silicon carbide (SiC), silicon nitride (Si 3 N 4 ), silicon monoxide (SiO), selenium trioxide (Se 2 O 3 ), tin oxide (SnO 2 ), tungsten trioxide (WO 3 ), high-index organic monomers and / or high-index organic polymers or layers of metal oxides, such as unstoichiometric aluminum oxide, copper oxides, or chromium oxides. These metal oxides exhibit a characteristic color; for example, unstoichiometric aluminum oxide appears black, while copper oxides appear black or red. Alternatively, the layer can be made of at least one metallic material from printing inks or varnishes with metallic pigments, in particular selected from the group of aluminium, silver, copper, gold, platinum, niobium, tin, or from nickel, titanium, vanadium, chromium, cobalt and palladium or alloys of these materials, in particular cobalt-nickel alloys, by means of common printing processes.

[0015] It is provided that the mosaic-like image is formed from picture elements which are of different size and shape, wherein a picture element is formed by a continuous area of ​​the layer forming the mosaic-like image and wherein the layer forming the mosaic-like image is interrupted between two picture elements.

[0016] According to the invention, image elements of different sizes correspond to different mosaics of the mosaic-like image.

[0017] Particularly preferably, the regions interrupting the mosaic-like image-forming layer are formed by demetallization.

[0018] The carrier film can have a thickness between 5 - 700 µm, preferably 5 - 200 µm, particularly preferably 5 - 125 µm, in particular 10 - 75 µm.

[0019] Preferably, a layer thickness of the layer forming the mosaic-like image is the same in all non-recessed areas of the layer.

[0020] For a better understanding of the invention, it is explained in more detail using the following figures.

[0021] They show in a highly simplified, schematic representation: Fig. 1A section through a security element according to the invention.

[0022] By way of introduction, it should be noted that in the variously described embodiments, identical parts are provided with identical reference symbols or component designations. The disclosures contained throughout the description can be applied analogously to identical parts with identical reference symbols or component designations. Furthermore, the positional information chosen in the description, such as top, bottom, side, etc., refers to the directly described and illustrated figure, and these positional information must be applied analogously to the new position in the event of a change in position.

[0023] According to Fig. 1A security element 1 according to the invention for securities or security papers has an embossing 2 with embossed structures 3. The embossed structures 3 are preferably designed as diffractive embossed structures. The embossed structures 2 are at least partially coated with a partial, metallic layer 4 forming a mosaic-like image. A partial layer is understood here to be a layer that is interrupted and thus only partially present as a continuous layer.

[0024] Additionally, the embossed structures 2 can be designed as achromatic embossed structures. The embossed structures 3 can form a relief, in particular a bas-relief, that matches the mosaic-like image. Furthermore, the embossed structures 3 can be translucent.

[0025] Favorable lateral dimensions for the embossed structures are 0.3 - 5.0 µm, particularly preferred between 0.5 - 2.0 µm.

[0026] As from Fig.1As can also be seen, the security element can have a carrier film 5 made of plastic, in particular of translucent plastic. The embossed structures 3 can be embossed directly into the carrier film 5. Alternatively, the embossed structures 3 can also be embossed into a layer located on the carrier film 5, for example, an embossing lacquer layer. The carrier film 5 preferably has a thickness between 5 and 700 µm, preferably 5 and 200 µm, particularly preferably 5 and 125 µm, in particular 10 and 75 µm.

[0027] The carrier film 5 and / or the embossed structures 3 can be made of one or more materials selected from the group polyimide (PI), polypropylene (PP), monoaxially oriented polypropylene (MOPP), biaxially oriented polypropylene (BOPP), polyethylene (PE), polyphenylene sulfide (PPS), polyetheretherketone (PEEK), polyetherketone (PEK), polyethyleneimide (PEI), polysulfone (PSU), polyaryletherketone (PAEK), polyethylene naphthalate (PEN), liquid crystalline polymers (LCP), polyester, polybutylene terephthalate (PBT), polyethylene terephthalate (PET), polyamide (PA), polycarbonate (PC), cycloolefin copolymers (COC), polyoxymethylene (POM), acrylonitrile butadiene styrene (ABS), polyvinyl chloride (PVC), ethylenetetrafluoroethylene (ETFE), polytetrafluoroethylene (PTFE), polyvinyl fluoride (PVF), polyvinylidene fluoride (PVDF) and / or Ethylene-tetrafluoroethylene-hexafluoropropylene fluoroterpolymer (EFEP).

[0028] The layer 4 forming the mosaic-like image is preferably made of at least one metallic material selected from the group consisting of aluminum, silver, copper, gold, platinum, niobium, tin, or of nickel, titanium, vanadium, chromium, cobalt and palladium or alloys of these materials, in particular cobalt-nickel alloys, or of at least one high-index dielectric material with a refractive index of greater than 1.65, in particular selected from the group consisting of zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO 2 ), carbon (C), indium oxide (In 2 O 3 ), indium tin oxide (ITO), tantalum pentoxide (Ta 2 O 5 ), cerium oxide (CeO 2 ), yttrium oxide (Y 2 O 3 ), europium oxide (Eu 2 O 3 ), iron oxides such as, for example, iron(III) oxide (Fe 3 O 4 ) and iron oxide (Fe 2 O 3 ), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO 2 ), lanthanum oxide (La 2 O 3 ), magnesium oxide (MgO), neodymium oxide (Nd 2 O 3 ), praseodymium oxide (Pr 6 O 11 ), samarium oxide (Sm 2 O 3 ), antimony trioxide (Sb 2 O 3 ),Silicon carbide (SiC), silicon nitride (Si 3 N 4 ), silicon monoxide (SiO), selenium trioxide (Se 2 O 3 ), tin oxide (SnO 2 ),

[0029] Tungsten trioxide (WO 3 ), high-index organic monomers and / or high-index organic polymers or layers of metal oxides, such as unstoichiometric aluminum oxide, copper oxides, or chromium oxides.

[0030] Alternatively, the layer can be made of at least one metallic material from printing inks or varnishes with metallic pigments, in particular selected from the group of aluminium, silver, copper, gold, platinum, niobium, tin, or from nickel, titanium, vanadium, chromium, cobalt and palladium or alloys of these materials, in particular cobalt-nickel alloys, by means of common printing processes.

[0031] The mosaic-like image is formed from image elements 6 of different sizes and shapes. Each image element 6 is formed by a contiguous area of ​​the layer 4 forming the mosaic-like image. Image elements 6 of different sizes correspond to different mosaics of the mosaic-like image.

[0032] The layer 4 forming the mosaic-like image is interrupted between two image elements 6. The regions 7 interrupting the mosaic-like image forming layer 4 are preferably formed by demetallization. As can be seen from Fig. 1 As can also be seen, the layer 4 can cover the upper sides of the embossed structures 3 completely or partially.

[0033] Particularly preferably, a layer thickness of the layer 4 is the same in all non-recessed areas, ie in the areas of the image elements 6, of the layer 4.

[0034] All information on value ranges in this description is to be understood as including any and all sub-ranges thereof, e.g. the information 1 to 10 is to be understood as including all sub-ranges starting from the lower limit of 1 and the upper limit of 10, ie all sub-ranges begin with a lower limit of 1 or greater and end with an upper limit of 10 or less, e.g. 1 to 1.7, or 3.2 to 8.1, or 5.5 to 10.

[0035] For the sake of clarity, it should finally be pointed out that, in order to better understand the structure, some elements have been shown out of scale and / or enlarged and / or reduced in size. Reference symbol list

[0036] 1Security element 2Embossing 3Embossed structures 4Layer 5Carrier foil 6Image element 7Areas

Claims

1. A security element (1) for securities or security papers, wherein the security element (1) has an embossing (2) with diffractive embossed structures (3), wherein the embossed structures (2) are at least partially coated with a partial, metallic layer (4) forming a tessellated image, wherein, in this regard, a partial layer is understood to be a layer that is interrupted and is thus only partially present as a closed layer, characterized in that the tessellated image is formed of image elements (6), which have different sizes and shapes, wherein an image element (6) is formed by a continuous surface of the layer (4) forming the tessellated image, and wherein the layer (4) forming the tessellated image is interrupted between two image elements, and that image elements (6) of different sizes correspond to different mosaics of the tessellated image.

2. The security element according to claim 1, characterized in that the embossed structures (3) are designed as achromatic embossed structures.

3. The security element according to claim 1 or 2, characterized in that the embossed structures (3) form a relief adapted to the tessellated image.

4. The security element according to one of claims 1 to 3, characterized in that the embossed structures (3) form a low relief.

5. The security element according to one of claims 1 to 4, characterized in that the embossed structures (3) are translucent.

6. The security element according to one of claims 1 to 5, characterized in that it has a carrier film (5) made of a plastic material, in particular made of a translucent plastic material.

7. The security element according to one of claims 1 to 6, characterized in that the carrier film (5) and / or the embossed structures (3) are produced from one or multiple materials selected from the group of polyimide (PI), polypropylene (PP), monoaxially oriented polypropylene (MOPP), biaxially oriented polypropylene (BOPP), polyethylene (PE), polyphenylene sulfide (PPS), polyetheretherketone (PEEK) polyetherketone (PEK), polyethyleneimide (PEI), polysulfone (PSU), polyaryletherketone (PAEK), polyethylene naphthalate (PEN), liquid crystalline polymers (LCP), polyester, polybutylene terephthalate (PBT), polyethylene terephthalate (PET), polyamide (PA), polycarbonate (PC), cycloolefin copolymers (COC), polyoxymethylene (POM), acrylonitrile-butadiene-styrene (ABS), polyvinyl chloride (PVC) ethylene tetrafluoroethylene (ETFE), polytetrafluoroethylene (PTFE), polyvinyl fluoride (PVF), polyvinylidene fluoride (PVDF) and / or ethylene-tetrafluoroethylene-hexafluoropropylene-fluoropolymer (EFEP).

8. The security element according to one of claims 1 to 7, characterized in that the layer (4) forming the tessellated image is produced from at least one metallic material selected from the group of aluminum, silver, copper, gold, platinum, niobium, tin, or of nickel, titanium, vanadium, chromium, cobalt, and palladium, or alloys of these materials, in particular cobalt-nickel alloys, or from at least one highly refractive dielectric material with a refraction index of greater than 1.65, in particular selected from the group of zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO2), carbon (C), indium oxide (In2O3), indium zinc oxide (ITO), tantalum pentoxide (Ta2O5), ceria (CeO2), yttrium oxide (Y2O3), europium oxide (Eu2O3), iron oxides such as, for example, (II)iron(III)oxide (Fe3O4) and iron oxide (Fe2O3), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO2), lanthanum oxide (La2O3), magnesium oxide (MgO), neodymium oxide (Nd2O3), praseodymium oxide (Pr6O11), samarium oxide (Sm2O3), antimony trioxide (Sb2O3), silicon carbide (SiC), silicon nitride (Si3N4), silicon monoxide (SiO), selenium trioxide (Se2O3), tin oxide (SnO2), tungsten trioxide (WO3), highly refractive organic monomers and / or highly refractive organic polymers or layers of metal oxides, such as, for example, non-stoichiometric aluminum oxide, copper oxides, or chromium oxides and / or from at least one metallic material made of printing inks or lacquers with metallic pigments, in particular selected from the group aluminum, silver, copper, gold, platinum, niobium, tin, or from nickel, titanium, vanadium, chromium, cobalt and palladium, or alloys of these materials, in particular cobalt-nickel alloys.

9. The security element according to one of claims 1 to 8, characterized in that the regions (7) interrupting the layer (4) forming the tessellated image are formed by means of demetallization.

10. The security element according to one of claims 1 to 9, characterized in that the carrier film (5) has a thickness of between 5 and 700 µm, preferably between 5 and 200 µm, particularly preferably between 5 and 125 µm, in particular between 10 and 75 µm.

11. The security element according to one of claims 1 to 10, characterized in that a layer thickness of the layer (4) forming the tessellated image is the same in all regions of the layer (4) left blank.