Monoalkyl tin trialkoxides and / or monoalkyl tin triamides with particulate contamination, and corresponding methods

Abstract

To provide monoalkyl tin trialkoxides and / or monoalkyl tin triamides with particulate contamination, and corresponding methods.SOLUTION: The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and / or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective in removal of fine particulates. Commercially practical processing techniques are described.SELECTED DRAWING: Figure 2

Description

[Technical field]

[0001] The present invention relates to monoalkyltin compositions, particularly monoalkyltin trialkoxides and monoalkyltin triamides, that have been processed to have low metal contamination and / or low particulate contamination. The present invention further relates to solutions made with the low metal contaminating monoalkyltin compositions that can be used for radiation patterning, e.g., photoresists useful in EUV lithography. The present invention further relates to corresponding processes for forming purified monoalkyltin compositions. [Background technology]

[0002] Solutions of organometallic compounds form coatings containing radiation-sensitive metal-carbon bonds that can be used to lithographically pattern structures. Processing of semiconductor materials and devices with ever-decreasing dimensions creates a demand for high purity solutions with low particle counts that reduce contamination issues, minimize pattern defects, and enable the benefits of organometallic photoresists. Processing and performance of semiconductor materials for microelectronic applications can be sensitive to metallic contaminants. To produce microelectronic products using lithography, proper control of metallic contaminants can reduce waste from failing to meet product specifications. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] U.S. Patent Application Serial No. 15 / 950,292 [Patent Document 2] U.S. Patent No. 9,310,684 [Patent Document 3] US Patent Application Publication No. 2016 / 0116839A1 [Patent Document 4] US Patent Application Publication No. 2017 / 0102612A1 [Patent Document 5] PCT Application International Publication No. 2017 / 163922 Brochure [Non-patent literature]

[0004] [Non-Patent Document 1] Haenssgen, D.; Puff, H.; Beckerman, NJ Organomet. Chem. 1985, 293, 191 Summary of the Invention [Means for solving the problem]

[0005] In a first aspect, the present invention relates to a composition comprising a solvent and a monoalkyltin trialkoxide (RSn(OR')3), having a tin concentration of about 0.004M to about 1.4M, and a contamination of other metal or metalloid elements of 10 parts per billion (ppb) or less, each by mass.

[0006] In a further aspect, the present invention relates to a composition comprising a solvent and a monoalkyltin triamide (RSn(NR'2)3), each having a tin concentration of about 0.01 M to about 1.4 M, and a contamination of other metal or metalloid elements of 50 parts per billion (ppb) or less by mass.

[0007] In another aspect, the invention relates to a method for forming a monoalkyltin trialkoxide or monoalkyltin triamide having low metal contamination, which method comprises fractionating the monoalkyltin trialkoxide or monoalkyltin triamide with a temperature, pressure and equipment selected to collect the monoalkyltin trialkoxide or monoalkyltin triamide, respectively, having 50 ppb or less by weight of other metal or metalloid contamination. In some embodiments, the composition for purification is placed in a distillation vessel (and up to 10% by volume of tris(2-aminoethyl)amine with the monoalkyltin triamide) in association with a heating element, where at least about 0.5% by volume remains in the distillation vessel.

[0008] In another aspect, the present invention relates to a composition comprising a solvent and a monoalkyltin trialkoxide (RSn(OR')3) or a monoalkyltin triamide (RSn(NR'2)3), having a tin concentration of about 0.005M to about 0.5M and having about 40 or less particles per mL having a diameter of at least about 70 nm.

[0009] The present invention further relates to a method for preparing a radiation sensitive composition comprising a solvent and an organometallic composition selected from the group consisting of monoalkyltin trialkoxides, monoalkyltin triamides, or mixtures thereof, the method comprising the step of flowing the composition through a filter using an impeller-type pump to remove particulate contaminants and form a filtered composition, wherein the measured concentration of particles having a size of at least 70 nm is less than 100 particles per mL. [Brief description of the drawings]

[0010] [Figure 1] FIG. 1 is a schematic diagram of a fractional distillation apparatus suitable for the purification of monoalkyltin compositions. [Diagram 2] FIG. 1 is a schematic diagram of a filtration device suitable for removing fine particles from a monoalkyltin composition. [Diagram 3] FIG. 119Sn NMR spectrum of the as-synthesized t-BuSn(NMe2)3 sample, where t-Bu represents the tertiary butyl ligand and NMe2 represents the dimethylamide ligand. [Figure 4] FIG. 4 is a 119Sn NMR spectrum of the t-BuSn(NMe2)3 sample used to obtain the spectrum in FIG. 3 following purification by fractional distillation. [Diagram 5] FIG. 119Sn NMR spectrum of a t-BuSn(OtAm)3 sample following purification by fractional distillation, where t-Bu represents the tertiary butyl ligand and OtAm represents the tertiary amyl ligand. [Figure 6] FIG. 1 is a schematic diagram of a particular illustrative filtration system. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0011] Monoalkyltin alkoxides and monoalkyltin amides have been formed with very low metal contamination in the parts per billion range. The tin composition can be selected to have high EUV absorption so that the composition can be useful for EUV patterning in semiconductor manufacturing. In particular, monoalkyltin compositions have been found to provide very effective EUV patterning resists that can be used to form very fine structures. Fractional distillation has been found to be effective for purification of the compounds with respect to metal impurities. Processing can also be used to separate the monoalkyltin compounds from the polyalkyltin contaminants. The purified compositions can then be further diluted with semiconductor grade solvents to form the desired patterned products. Additionally or alternatively, improved filtration techniques can also achieve low particulate contamination in the radiation resist composition. The purified radiation resist composition is suitable for patterning very small features with low failure rates and high yields of the patterned products.

[0012] For semiconductor processing and other microelectronic applications, metal contaminants can be harmful and can lead to product failure and high processing loss rates due to components being unable to meet specifications. The threshold contaminant level that is harmful for some products can be very low. Thus, there is considerable motivation to significantly reduce metal contaminants. Radiation-based patterning has been a key process technology for forming ever-decreasing feature sizes, but this demand for miniaturization has pushed radiation-based patterning to higher energy radiation regimes, such as extreme ultraviolet and electron beam. To take advantage of the finer patterns available using higher energy radiation, organometallic-based radiation resists, especially organotin compounds, have been found to have high levels of performance. For processing with organotin compounds, in addition to dealing with the introduction and removal of tin, it is desirable to avoid the introduction of contamination with other metals. As described herein, contaminant metals can be reduced to parts per billion by mass level.

[0013] In particular, it has been found that for monoalkyltin trialkoxides and monoalkyltin triamides, non-tin metal contamination can be effectively reduced to very low levels using appropriate purification processes. Based on experience with the application of these compositions for radiation resist materials, it may also be desirable to eliminate polyalkyltin compounds, and processing for metal contamination may also be effective in removing polyalkyltin contaminants. In particular, monoalkyltin trialkoxides and monoalkyltin triamides can be purified using fractional distillation using appropriate distillation columns, and in some embodiments, by appropriate selection of distillation fractions. Corresponding handling of the purified composition can maintain a high purity composition. In addition, the purified composition can be filtered to remove particulate contaminants that may result in patterning incompleteness. With improved filtration, a continuous impeller-type pump can be used to circulate and recirculate the photoresist through a semiconductor grade filter to remove particulates. Particulate removal can be verified using in-line light scattering measurements.

[0014] In particular, the use of organometallic tin compositions as photoresists for extreme ultraviolet-based patterning is generally based on monoalkyltin oxohydroxo compounds. The oxohydroxo compounds can be prepared in solution or they can be prepared during and / or following an in situ coating process involving water-based hydrolysis of RSnX3 compounds, where R is an alkyl group and Sn-X is a hydrolyzable group. Monoalkyltin triamides and monoalkyltin trialkoxides are suitable precursor compounds for forming monoalkyltin oxohydroxo compounds, and monoalkyltin triamides are suitable precursors for forming monoalkyltin trialkoxides. The current best practice for using these resist compositions involves forming a coating of monoalkyltin trialkoxide and hydrolyzing the trialkoxide in situ to form an oxohydroxo composition with a volatile alcohol by-product that is easily evaporated. The processes and compositions described herein are generally useful in such previously described processes and compositions, as well as in other monoalkyltin-based photoresist patterning processes and compositions that go beyond current best practices. Thus, monoalkyltin triamides can be useful intermediates in the preparation of organotin photoresists, either through their use to synthesize monoalkyltin trialkoxides, or for deposition and in situ processing to form monoalkyltin oxohydroxo compositions.

[0015] Methods for the preparation of monoalkyltin triamides have previously employed lithium reagents that convert tin tetraamides to the desired triamides. For example, t-butyltris(diethylamido)tin (t-BuSn(NEt2)3) can be synthesized with lithium reagents by the method of "Synthetic Chemistry of Metals, Vol. 1, No. 1, pp. 111-115, 2003," incorporated herein by reference. However, these methods with lithium reagents can produce a mixture of monoalkyl and dialkyltin products. Lithium alkyls are often highly reactive compounds. They can spontaneously ignite with air, moisture, or both, forming flammable alkanes and corrosive lithium hydroxide. As a result, a high degree of care and expense is required to handle lithium alkyls. Lithium contamination can also be undesirable for semiconductor applications, and the processes described herein are directed to the reduction of non-tin metal contamination. While lithium contamination can be removed using the purification techniques described herein, improved synthesis techniques have been developed that do not use lithium reactants. These improved synthesis techniques are described in co-pending U.S. Patent No. 5,399,633 to Edson et al., entitled "Monoalkyl Tin Compounds With Low Polyalkyl Contamination, Their Compositions and Methods," incorporated herein by reference (the '292 application, hereinbelow). Further processing can be used to reduce both polyalkyltin contaminants and non-tin metal contaminants.

[0016] The use of alkyl metal coordination compounds in patterning compositions based on high performance irradiation is described, for example, in Patent Document 2 to Meyers et al. entitled "Organometallic Solution Based High Resolution Patterning Compositions", which is incorporated herein by reference. The purification of these organometallic compositions for patterning is described in Published Patent Document 3 to Meyers et al. entitled "Organometallic Solution Based High Resolution Patterning Compositions and Corresponding Methods", and Patent Document 4 to Meyers et al. entitled "Organotin Oxide Hydroxide Patterning Compositions, Precursors, and Patterning" (the '612 application below in this specification), both of which are incorporated herein by reference.

[0017] The compositions synthesized herein may be effective precursors for forming alkyltin oxohydroxo compositions that are advantageous for high resolution patterning. The alkyltin precursor compositions can be hydrolyzed with water or other suitable reagents under appropriate conditions to form alkyltin oxohydroxo patterning compositions that can be represented by the formula RSnO (1.5-(x / 2)) (OH) x (where 0 < x ≦ 3). Hydrolysis and condensation reactions that can convert compositions having hydrolyzable Sn-X groups are shown in the following reactions. RSnX3 + 3H2O → RSn(OH)3 + 3HX RSn(OH)3 → RSnO (1.5-(x / 2)) OH x +(x / 2)H2O

[0018] If the hydrolysis product HX is sufficiently volatile, in situ hydrolysis can be accomplished with water vapor during the substrate coating process, but the hydrolysis reaction can also be carried out in solution to form the alkyltin oxohydroxo composition. These processing options are further described in the '612 application.

[0019] Monoalkyltin triamide compositions can generally be represented by the formula RSn(NR')3, where R and R' are independently alkyl or cycloalkyl having 1 to 31 carbon atoms, one or more of which are optionally substituted with one or more heteroatom functional groups containing O, N, Si, Ge, Sn, Te, and / or halogen atoms, or the alkyl or cycloalkyl are further functionalized with phenyl or cyano groups. In some embodiments, R' can contain ≦10 carbon atoms, and can be, for example, methyl, ethyl, propyl, isopropyl, butyl, t-butyl, isobutyl, or t-amyl. The R group can be a linear, branched (i.e., secondary or tertiary at the metal-bonded carbon atom), or cyclic hydrocarbyl group. Each R group can individually and generally have 1 to 31 carbon atoms, with 3 to 31 carbon atoms for groups having secondary bonded carbon atoms and 4 to 31 carbon atoms for groups having tertiary bonded carbon atoms. In particular, branched alkyl ligands may be desirable for some patterning compositions, where the compound is R 1 R 2 R 3 CSn(NR')3, where R 1 and R 2 are independently an alkyl group having 1 to 10 carbon atoms; R 3 is hydrogen or an alkyl group having 1 to 10 carbon atoms. As noted below, this representation of an alkyl ligand R is generally 1 R 2 R 3 Similarly applicable to other embodiments involving CS(X)3, where X corresponds to a trialkoxide or triamide moiety.1 and R 2 can form a cyclic alkyl moiety, R 3 may also be joined to other groups in the cyclic moiety. Suitable branched alkyl ligands are, for example, isopropyl (R 1 and R 2 is methyl, R 3 is hydrogen), tert-butyl (R 1 , R 2 and R 3 is methyl), tert-amyl (R 1 and R 2 is methyl, R 3 is -CH2CH3), sec-butyl (R 1 is methyl, R 2 is -CH2CH3, R 3 is hydrogen), neopentyl (R 1 and R 2 is hydrogen and R 3may be -C(CH3)3), cyclohexyl, cyclopentyl, cyclobutyl, and cyclopropyl. Examples of suitable cyclic groups include, for example, 1-adamantyl (bonded to the metal at a tertiary carbon, -C(CH2)3(CH)3(CH2)3 or tricyclo(3.3.1.13,7)decane) and 2-adamantyl (bonded to the metal at a secondary carbon, -CH(CH)2(CH2)4(CH)2(CH2) or tricyclo(3.3.1.13,7)decane). In other embodiments, the hydrocarbyl group may comprise an aryl or alkenyl group, such as benzyl or allyl, or an alkynyl group. In other embodiments, the hydrocarbyl ligand R may comprise any group consisting exclusively of C and H and containing 1 to 31 carbon atoms. In summary, some examples of suitable alkyl groups attached to tin include, for example, linear or branched alkyl (i-Pr((CH3)2CH-), t-Bu((CH3)3C-), Me(CH3-), n-Bu(CH3CH2CH2CH2-)), cyclo-alkyl (cyclo-propyl, cyclo-butyl, cyclo-pentyl), olefinic (alkenyl, aryl, allyl), or alkynyl groups, or combinations thereof. In further embodiments, suitable R groups can include hydrocarbyl groups substituted with heteroatom functional groups, including cyano, thio, silyl, ether, keto, ester, or halogenated groups, or combinations thereof.

[0020] The alkyltin trialkoxide composition has the formula RSn(OR 0The alkyltin trialkoxides can be synthesized from alkyltin triamides, although other synthetic routes can be used, such as those described in the '292 application, where the synthesis of the monoalkyltin trialkoxide is accomplished from the alkyltriamide tin composition. The alkyltriamide tin composition can be represented by the formula RSn(NR''COR''')3. The R groups in the formula for the alkyltin trialkoxides and alkyltriamide tin compositions can be the same R groups as summarized above for the alkyltin triamide compositions, and the corresponding discussion of these R groups above is as if copied in its entirety in this paragraph. The monoalkyltriamide tin compositions will not be discussed further herein. The alkoxide ligand -OR 0 About R 0 The groups may independently be hydrocarbon groups having 1 to 10 carbon atoms, such as methyl, ethyl, and the like.

[0021] Polyalkyltin impurity compositions can affect the condensation of coated resist materials and can contribute to radiation resist outgassing during lithographic processing, which increases the potential for tin contamination of equipment used for film deposition and patterning. Based on these concerns, there is a significant desire to reduce or eliminate dialkyl or other polyalkyl components of resist compositions. Monoalkyltin trialkoxide compositions can be desirable constituents in precursor patterning composition solutions because they are susceptible to in situ hydrolysis and condensation, forming monoalkyltin oxohydroxo compositions with alcohol by-products that are generally and suitably volatile for corresponding removal upon in situ hydrolysis. As described herein, contaminants from polyalkyltin compounds are removed in the distillation of monoalkyltin triamide compositions, although direct purification of monoalkyltin trialkoxide compositions may be suitable to remove polyalkyl contaminants.

[0022] Monoalkyltin triamide compositions can be directly synthesized with relatively low polyalkyl contamination using any one of three methods summarized herein, which are described in more detail in the '292 application. The purified monoalkyltin triamides and monoalkyltin trialkoxides can have both low polyalkyl contamination and low non-tin metal contamination. By particularly effective purification of monoalkyltin trialkoxides, compared to compounds with non-tin metals, the trialkoxides can be purified to very low metal contamination, as shown in the examples below. With respect to polyalkyltin contaminants, these trace metal concentrations can be reduced to undetectable levels.

[0023] The fractional distillation process described herein can be effective for removing non-tin metal contaminants to a significant extent for monoalkyltin triamides, particularly monoalkyltin trialkoxides. Generally, monoalkyltin compositions are diluted in organic solvents for further processing, and these diluted solutions are suitable for analysis by ICP-MS or ICP-AES techniques, as described further below, to obtain metal concentrations down to low levels. Evaluation of metal contamination by ICP-MS or ICP-AES techniques, and the formation of resist precursor formulations generally involve dilution with organic solvents. For evaluation of metal contamination, the pure compositions are diluted to prevent saturation of the mass spectrometer detector by high tin concentrations. Suitable solvents that do not themselves contribute significant metal contamination can be used.

[0024] The monoalkyltin triamide can be purified and dissolved in a solvent to reduce each non-tin metal element to a level of about 50 parts per billion (ppb) or less by mass, in a further embodiment, about 40 ppb or less by mass, in another embodiment, about 30 ppb or less, and in a further embodiment, about 25 ppb or less. The solution of the monoalkyltin trialkoxide can be purified to reduce each non-tin metal element to a particularly low level of about 3 ppb or less by mass, in a further embodiment, about 2 ppb or less, and in another embodiment, about 1.5 ppb or less. As seen in the examples below, metal contaminant levels can generally be reduced below the detection limit for most non-tin metals, generally below 1 ppb. For the monoalkyltin trialkoxide exemplified below, of the 23 non-tin elements, only barium was measured to be below 1 ppb but slightly above the detection limit. Those skilled in the art will recognize that further ranges of non-tin metal purification within the above explicit ranges are contemplated and within the scope of the present disclosure.

[0025] The resist precursor composition can be conveniently specified based on the ion molar concentration of tin. The resist precursor composition can have a low level of non-tin metal contamination as specified in the preceding paragraph. In general, the resist precursor solution generally contains about 0.0025M to about 1.4M tin cations, in some embodiments about 0.004M to about 1M, in further embodiments about 0.005M to about 0.75M, and in some embodiments about 0.01M to about 1M, and in further embodiments about 0.01M to about 0.5M tin cations. One of ordinary skill in the art will recognize that additional concentration ranges and values ​​within the above explicit ranges are contemplated and are within the scope of the present disclosure.

[0026] Non-tin metal contaminants can be assessed using standard analytical techniques, particularly inductively coupled plasma mass spectrometry (ICP-MS) and / or inductively coupled plasma atomic emission spectrometry (ICP-AES). These techniques are capable of measuring metals down to very low levels. Measurements were performed in a commercial analytical testing facility, as shown in the examples. For sample handling and introduction into the analytical equipment, the samples are diluted with a solvent. Solvents suitable for forming the resist precursor coating solution are described below, and in the examples, 4-methyl-2-pentanol was used as the solvent. Semiconductor grade solvents with parts per trillion metal contamination levels are commercially available from Alfa Aesar, Fuji Film, KMG Chemicals (TX, USA), TOK America, Inc., Honeywell Electronic Materials, and other suppliers. Proper handling of the solutions and storage containers, as well as dilution of the monoalkyltin composition with a suitable semiconductor grade solvent with metal contamination in the parts per trillion range, should not alter the measurement of non-tin metal contaminants for tin over a wide concentration range.

[0027] Ultra-pure solvents are typically stored and transported in plastic containers made of high density polyethylene (HDPE), polytetrafluoroethylene (PTFE), or polypropylene (PP). Aicello Corporation CLEANBARRIER™ (CB) bottles are constructed from HDPE and are designed to store and transport pure semiconductor grade chemicals with low particle counts and low trace metal concentrations. Photoresists can also be stored in dealkalized glass bottles. Commercially available containers are typically made of soda-lime glass. This glass contains high concentrations of sodium, and solvents and liquids can leach out of the glass. The process of dealkalization depletes sodium from the surface of the glass container, eliminating sodium leaching.

[0028] The monoalkyltin composition can also be filtered to remove particulate contaminants. An improved procedure for performing the filtration is described in detail below. Filtration and evaluation of the filtered composition is performed on samples dissolved in a solvent. Dilution is generally performed to the concentration of the resist composition, since the desired resist composition is directly filtered and then added to a container for storage and shipping. The tin concentration in the resist precursor composition is presented above.

[0029] Particulate contamination can be measured using particle measurement equipment. For example, for photoresists, Rion Co., Ltd. (Japan) generally sells particle counters based on light scattering, and such particle counters are used in the examples below. An appropriately selected particle counter can perform in-line particle measurement by sampling the solution from the filtration flow system. Results from particle measurement are presented in number of particles per milliliter (mL) of liquid. A particular particle counter has a selected range of particle sizes to measure, and the results in the examples below provide particle counts at or above 70 nm in size.

[0030] Removal of particulates from organometallic photoresists is described in published U.S. Patent Application No. 5,333,393 to Tsubaki et al. (translated) entitled "Active Ray-Sensitive or Radiation-Sensitive Composition, Method for Purifying Active Ray-Sensitive or Radiation-Sensitive Composition, Pattern-Forming Method, and Method for Producing Electronic Device," which is incorporated herein by reference. The filtration method in the Tsubaki application was directed to various metal compounds with selected ligands, as well as butyltin oxide hydroxide (C4H9-SnOOH), which is exemplified in Example 9. Tsubaki does not discuss the filtration of alkyl metal alkoxides. As described below, filtration of alkyl metal alkoxides to remove particulates presents particular challenges.

[0031] Based on the filtration process developed and described herein, resist compositions comprising monoalkyl metal trialkoxides and / or monoalkyl tin triamides at concentrations (based on moles of tin) of about 0.0025M to about 1.4M in an organic solvent, in some embodiments about 0.01M to about 0.5M, can be purified to remove particulates such that the solution has no more than about 3 particles per mL having an average size greater than 150 nm, in further embodiments no more than about 2 particles / mL, and in further embodiments no more than about 1 particle / mL having an average size greater than 150 nm as determined by light scattering. Particles down to 70 nm can be counted using light scattering using a commercially available particle counter with optional capabilities, such as a Rion KS-41B Liquid-Borne Particle Sensor. Using the filtration techniques herein, alkyl metal alkoxides in organic solvents having a concentration (based on moles of tin) of 0.025M to 1.4M, in some embodiments about 0.05M to about 0.5M, can be purified to have particle contaminants of 25 particles / mL or less, in further embodiments 20 particles / mL or less, and in further embodiments 12 particles / mL or less for particle sizes between 70 nm and 150 nm. Those of skill in the art will recognize that additional ranges of particle contamination within the explicit ranges above are contemplated and are within the scope of the present disclosure. Also with regard to reducing metal and polyalkyl metal contaminants using the processes described herein, these compositions can be purified to produce resist compositions, particularly monoalkyl tin trialkoxide compositions, with simultaneously low metal contamination, low polyalkyl metal contamination, and low particulate contamination.

[0032] In general, the synthesis process for preparing monoalkyltin triamides involves reacting a tin tetraamide with an alkylating agent, a compound having an alkyl donor group, also described herein. The desired results are achieved, where the alkylating agent can be a Grignard reagent, a diorganozinc reagent, or a monoorganozinc amide. These syntheses can directly produce monoalkyltin triamides with low polyalkyl contamination, which can be used to form resists, or can be further purified to further reduce polyalkyl contamination levels. The Zn reagent method was developed specifically for the synthesis of pure monoalkyltin triamides containing secondary alkyl groups. In the synthesis method, the alkylating agent selectively replaces the amide group of the tin tetraamide with an alkyl group, with improved selectivity and yield of monoalkyltin triamide. Thus, in some embodiments, the reaction selectively produces monoalkyltin triamides with low polyalkyltin contamination, especially low dialkyltin contamination. The method is particularly suitable for branched alkyl systems. The monoalkyltin triamide with low polyalkyl contaminants can then be used to form a monoalkyltin trialkoxide with low polyalkyl contaminants.

[0033] For the reaction to form the monoalkyltin triamide compound, the tin tetraamide compound can be obtained commercially or synthesized using known techniques. For example, tetrakis(dimethylamido)tin, Sn(NMe2)4, is available from Sigma-Aldrich. For the synthesis of the monoalkyltin composition, the tin tetraamide reactant in solution can generally have a concentration of about 0.025M to about 1.5M, in further embodiments, about 0.05M to about 1M, or in further embodiments, about 0.1M to 0.75M. Those of skill in the art will recognize that additional ranges of reactant concentrations within the above explicit ranges are contemplated and are within the scope of the present disclosure. In general, the relevant reaction to introduce alkyl ligands to Sn can be initiated with tin tetraamide in solution in a reactor in the dark under an inert gas purge. In an alternative embodiment, some or all of the tin tetraamide reactant is added gradually, in which case a higher concentration in the gradually added solution may be appropriate and the above concentrations may not be directly relevant since the concentration in the reactor may be transient.

[0034] The alkylating agent is generally added in an amount relatively close to the stoichiometric amount. In other words, the alkylating agent is added to provide one molar equivalent of alkyl group per tin atom. If the alkylating agent can provide a diorganozinc compound that can provide multiple alkyl groups, e.g., two alkyl groups per zinc atom, the stoichiometric amount of the alkylating agent is adjusted accordingly to provide about one alkyl group for each Sn. Thus, for a diorganozinc compound, as much as one mole of Zn is required for every two moles of Sn. The amount of alkylating agent can be about ±25%, about ±20%, or about ±15% of the stoichiometric amount of reagent, or in other words, a selected amount that achieves the desired process performance of the stoichiometric amount of reagent + or -. Those skilled in the art will recognize that additional ranges of the relative amounts of alkylating agent within the above explicit ranges are contemplated and are within the scope of the present disclosure.

[0035] The alkylating agent dissolved in the organic solvent can be gradually added to the reactor, for example, dropwise or flowing at an appropriate rate to control the reaction. The rate of addition can be adjusted to control the reaction process, for example, over a period of about 1 minute to about 2 hours, and in further embodiments, from about 10 minutes to about 90 minutes. The concentration of the alkylating agent in the addition solution can be adjusted within a reasonable value taking into account the rate of addition. In principle, the alkylating reagent can be initiated by the gradual addition of tin tetraamide in the reactor. Those skilled in the art will recognize that additional ranges for the alkylating agent and additional times within the above explicit ranges are contemplated and are within the scope of the present disclosure.

[0036] The reaction to introduce alkyl ligands to the tin atom may be carried out in a low-oxygen, substantially oxygen-free, or oxygen-free environment, and an active inert gas purge can provide the appropriate atmosphere, for example, an anhydrous nitrogen purge or an argon purge. In some embodiments, additives, such as neutral coordinating bases, can be used during the reaction to prevent the formation of undesired polyalkyl species. The following additives have been observed to reduce the addition of second alkyl groups to the tin: pyridine, 2,6-lutidine, 2,4-lutidine, 4-dimethylaminopyridine, 2-dimethylaminopyridine, triphenylphosphine, tributylphosphine, trimethylphosphine, 1,2-dimethoxyethane, 1,4-dioxane, and 1,3-dioxane. Other neutral coordinating bases may function similarly. The reaction may optionally further include about 0.25 to about 4 moles of neutral coordinating base for every mole of tin. The reactants may be shielded from light during the reaction. The reaction may be carried out in an organic solvent, such as an alkane (e.g., pentane or hexane), an aromatic hydrocarbon (e.g., toluene), an ether (e.g., diethyl ether, C2H5OC2H5), or a mixture thereof. The solvent may be anhydrous to avoid reaction with water. The reaction is generally carried out for about 15 minutes to about 24 hours, in further embodiments, from about 30 minutes to about 18 hours, and in further embodiments, from about 45 minutes to about 15 hours. The temperature during the reaction may be from about -100°C to about 100°C, in further embodiments, from about -75°C to about 75°C, and in further embodiments, from about -60°C to about 60°C. Cooling or heating may be used to control the reaction temperature within the desired range, and control of the rate of reactant addition may also be used to affect temperature evolution during the course of the reaction. The product monoalkyltin triamide is generally an oil that may be purified using vacuum distillation, as discussed further below. Typical yields have been observed to be roughly 50 to 85 percent. A person of ordinary skill in the art will recognize that additional ranges of concentrations and process conditions within the explicit ranges above are contemplated and are within the present disclosure.

[0037] In some embodiments, the alkylating agent can be a Grignard reagent, a diorganozinc reagent, or a monoorganozinc amide. The Grignard reagent can be an organomagnesium halide. Specifically, the Grignard reagent in the described reaction can be RMgX, where X is a halide, typically Cl, Br, or I. Correspondingly, the diorganozinc reagent can be R2Zn. In further embodiments, the alkylating agent is a monoorganozinc amide (RZnNR'2), where R' is an alkyl or cycloalkyl group, which can be substituted with a heteroatom, and in some embodiments, R' can have 1-8 carbon atoms. R can be an alkyl or cycloalkyl, and has 1-31 carbon atoms, and generally, R can be more fully described above with respect to the R moieties of the product compositions, as if incorporated in its entirety for this discussion. For example, the alkyl or cycloalkyl may be branched, may contain aromatic groups, and / or may have one or more heteroatom functional groups containing atoms such as O, N, Si, Ge, Sn, and / or halogens. Grignard reagents are commercially available or can be synthesized using known methods. Commercial sources include American Elements Company, Sigma-Aldrich, and many other suppliers.

[0038] Diorganozinc compounds are commercially available or can be synthesized using known techniques. Commercial sources include, for example, Alfa Aesar, Sigma-Aldrich, Rieke Metals (Nebraska, USA) and Triveni Chemicals (India). Monoorganozinc amides can be synthesized from alkylzinc halides (RZnX, X=I, Br, Cl) and lithium amide (LiNR'2), commercially available reagents, for example, from Sigma-Aldrich.

[0039] As noted above, monoalkyltin triamides can also be used to synthesize the corresponding monoalkyltin trialkoxides, although monoalkyltin trialkoxides can be synthesized using other approaches. In particular, monoalkyltin trialkoxides can be produced by reacting the corresponding monoalkyltin triamides with alcohols in a non-aqueous solvent containing a base. The low polyalkyltin contaminants in the monoalkyltin triamides using the processes described herein can carry over into the product monoalkyltin trialkoxides, so that the product monoalkyltin trialkoxides have essentially low dialkyltin contaminants at the molar percentages described above. Suitable organic solvents include, for example, alkanes (e.g., pentane or hexane), aromatic hydrocarbons (e.g., toluene), ethers (e.g., diethyl ether, C2H5OC2H5), or mixtures thereof. The alcohol is selected to provide the desired alkoxide group, such that the alcohol ROH introduces an -OR group as a ligand attached to the tin. A list of suitable R groups is provided above and corresponds to the alcohol. An example is provided below with t-amyl alcohol, however, other alcohols can be used similarly to provide the desired -OR alkoxide ligand.

[0040] For the reaction of the triamide to form the monoalkyltin trialkoxide, the alcohol can be provided in approximately stoichiometric amounts. Since the alcohol is used to replace three amide groups, three molar equivalents of alcohol is stoichiometric. Generally, the amount of alcohol can be at least about -5% stoichiometric equivalent, and in further embodiments at least about stoichiometric equivalent, and a large excess of alcohol can be used. To facilitate purification of the product alkyltin trialkoxide, a tetradentate ligand or chelating agent can be added to coordinate with unreacted species to form a complex that does not vaporize during distillation. For example, tris(2-aminoethyl)amine (TREN), triethylenetetraamine (TRIEN), or other non-planar tetradentate chelating agents can be used to complex with unreacted species to facilitate purification. The chelating agent can be added at a selected time from the start of the reaction in an amount of about 0.5 mol % to about 15 mol %, and in further embodiments, about 1.0 mol % to about 10 mol %, based on the molar amount of tin, at any time up to the time of distillation. A person of ordinary skill in the art will recognize that additional ranges of reactant amounts within the explicit ranges above are contemplated and are within the present disclosure. If desired, fractional distillation can be used to further purify the monoalkyltin trialkoxide from polyalkyl contaminants.

[0041] The monoalkyltin triamides and monoalkyltin trialkoxides produced using the above methods or other methods not specifically described herein can be further purified using fractional distillation. It has been found that fractional distillation can be effective in reducing both metal contamination and contamination from other tin compounds, such as polyalkyltin compounds. Thus, the product monoalkyltin composition can be appropriately processed with fractional distillation to achieve valuable purification for photoresist use. To achieve a suitable temperature range, fractional distillation can be performed under significant reduced pressure, and suitable fractionation can be useful in reducing contaminants. In particular, the initial fraction can be discarded and / or a portion of the composition can remain in the initial distillation vessel. This fractionation can reduce higher and lower boiling components with a moderate reduction in yield while achieving a higher purity product.

[0042] An example of a fractional distillation apparatus is shown diagrammatically in Figure 1. The fractional distillation apparatus 100 includes a distillation vessel 102, e.g., a round bottom flask, a heating element 104, e.g., a heating mantle or oil bath, a distillation column 106, a pump 108, pressure tubing 110 (connects the pump 108 to the distillation system and maintains the system at a selected pressure), a pressure sensor 112 can be used to monitor the pressure, a temperature sensor 114, e.g., a thermometer, can be used to monitor the temperature in the distillation column, a condenser 116 can collect vapors exiting the distillation column 106, and a collection system 118 can collect purified liquid exiting the condenser. The collection system 118 can include a rotatable cow joint 122 having three receiver connectors 124, 126, 128 that connect to three collection flasks 130, 132, 134, e.g., Schlenk bomb flasks. The collection flasks 130, 132, 134 can be rotated to position a selected flask for collection. The rotatable cow joint 122 can further include a valve. The arrangement can be adapted for a different number of collection flasks, for example, 2, 4 or more. The capacity of the distillation vessel 102 can be selected to be an appropriate size for the amount of product to be purified, and the heating element 104 can be arranged to efficiently heat the distillation vessel 102. The condenser 116 can be cooled with circulating water or other coolant. Suitable components for the fractional distillation apparatus 100 are commercially available.

[0043] To reduce the temperature of the distillation process, the pressure can be reduced, for example, to a pressure of about 0.01 Torr to about 10 Torr, in further embodiments, about 0.025 Torr to about 5 Torr, and in further embodiments, about 0.05 Torr to about 2.5 Torr. Those of skill in the art will recognize that additional ranges of pressure within the above explicit ranges are contemplated and within the scope of the present disclosure. Suitable fractional distillation columns can be used with capacities appropriate for the process, and are commercially available. The fractional distillation column includes a surface for condensation and revaporization along the column. Thus, in some embodiments, the column can be packed with, for example, a suitable inert packing material, for example, Pro-Pak® distillation packing from Sigma (316SS), or it can be a Vigreux column with glass fingers that extend into the vapor space. The column can be insulated or not, and the temperature gradient along the column can be adjusted by the length of the column, the insulation of the column, and the ambient temperature.

[0044] Temperatures can be controlled in the tanks holding the material to be purified and along the columns to achieve the desired separation. Thermal conditions for one embodiment are provided in the examples below for both monoalkyltin triamides and monoalkyltin trialkoxides, but these conditions can be readily generalized to other compositions based on the teachings herein. For distillation, the temperature of the heating bath can generally be set at about 50° C. to about 180° C., and in further embodiments, from about 65° C. to about 150° C. One of ordinary skill in the art will recognize that additional ranges of temperatures within the above explicit ranges are contemplated and within the scope of the present disclosure. If the non-tin metal composition and polyalkyltin contaminants have boiling points significantly higher or lower than the monoalkyltin triamides or monoalkyltin trialkoxides, the other metal and polyalkyltin compositions can be separated during the distillation process to produce a purified monoalkyltin composition. TREN or a similar nonplanar tetradentate chelating agent as described above is added to the distillation flask to complex with impurities that would otherwise co-distill with the desired monoalkyltin composition. Additionally, the fractions can be combined with selected volumes of liquid removed in each fraction during the fractional distillation step. The examples show good separations with reasonable yields free of detectable contaminants.

[0045] For specific removal of contaminants with lower boiling points, these contaminants can be separated by collecting and discarding the first fraction during the distillation process. In some embodiments, the discarded first fraction can optionally include at least the first 0.1% by volume, in further embodiments at least the first 0.5% by volume, in other embodiments at least the first 1% by volume, and in further embodiments about 1% by volume to about 20% by volume can be discarded relative to the initial volume charged into the distillation tank. In the examples below, highly purified products were obtained without discarding the first fraction. In some ways, it has been found that retention of a fraction of the distillation material in the distillation flask is more important for the purification process. Additionally or alternatively, a fraction of the initial composition can remain in the distillation tank to remove higher boiling contaminants. In some embodiments, the amount of the composition remaining in the distillation tank may be at least about 0.5 vol.%, in further embodiments at least about 1 vol.%, and in other embodiments at least about 3 vol.%, and in further embodiments from about 1 vol.% to about 30 vol.% for the purification of monoalkyltin triamides, and at least about 0.5 vol.%, in further embodiments from about 0.75 vol.% to about 12 vol.%, and in other embodiments from about 1 vol.% to 10 vol.% for the purification of monoalkyltin trialkoxides. A person of ordinary skill in the art will recognize that additional ranges of fractionation within the explicit ranges above are contemplated and are within the present disclosure.

[0046] In general, there may be a purity versus yield tradeoff in the selection of the amount of initial collected fraction to be discarded and the amount of initial composition remaining in the distillation tank. Depending on the boiling point difference for the contaminants and the purity of the initial composition prior to fractional distillation, the addition of a tetradentate chelating agent and control of the fractional distillation process can help improve yield within the composition constraints. Of course, if the contaminants are co-purified with the desired composition due to boiling point similarity, fractional distillation may not achieve the desired purification. It has been found that desirable monoalkyltin triamides, and in particular monoalkyltin trialkoxides, can be produced with very low levels of metal contaminants, which is presumed to be related to the relative boiling points of the metal contaminants and their complexation with a tetradentate chelating agent, e.g., TREN.

[0047] Further processing of the purified monoalkyltin composition generally involves diluting the composition with an organic solvent. The diluted composition can be used to carry out further reactions, such as reaction of monoalkyltin triamide to form monoalkyltin trialkoxide or to form a resist coating. The diluted composition can be filtered to remove particulates. Filtration can be carried out at one or more suitable process points, such as before use in further reactions, before placing the resist composition in a container for storage and / or transport, and / or in the process line by delivery on a commercial wafer track. Improved processing is described herein, which is particularly useful for filtering monoalkyltin trialkoxide.

[0048] If properly arranged, a single filtration can in principle achieve the desired low particulate levels. In some embodiments, the filtration device can be arranged for repeated filtration of the organometallic composition, for example, by arranging a system for recirculation and / or for sequential filtration. For recirculation of the filtered composition, the vessel can be fitted with a drain port and a return loading port. One or more pumps can be used to drive the flow of the liquid through the filtration system, and suitable filters can be used in-line to remove small particulates from the liquid. Clear tubing can be used to connect the system and the flow between each component.

[0049] A schematic layout of a filtration system 140 is shown in FIG. 2. The composition to be filtered may be in a vessel 142 having an outlet 144, an inlet 146 and an access port 148. Flow from the outlet may be controlled by one or more pumps 150. The flow path then passes through a first filter 152 and optionally a further filter 154. A flow meter 156 may be used to monitor the flow rate through the system. A particle analyzer 158 may be positioned to measure particles in the filtered flow. While FIG. 2 shows the particle analyzer 158 along the flow, other suitable arrangements, e.g., sampling arrangements, may be used. The filtered flow may be directed through a recirculation line 160 connected to the inlet 146 of the vessel 142 for recirculation, or through a collection line 162 that directs the flow to a collection vessel 164 for collection. A valve 165 may be used to selectively direct the flow to the recirculation line 160 or the collection line 162. In some embodiments, when the particle count falls below a selected value, a valve 166 can be used to divert the filtered flow to a collection vessel 168, for example in a recirculation arrangement. The flow can be directed through suitable tubing, for example polymeric tubing.

[0050] The liquid in the collection vessel 164 can be further filtered in a recirculation arrangement or another sequential filtration arrangement as required. A recirculation arrangement for the collection vessel 164 can be designed by conceptually recreating the circulatory flow loop connected to the vessel 142 containing pumps, filters, particle analyzers, and other desired components, which are specifically connected to the collection vessel 164. As shown in FIG. 2, a second sequential filtration arrangement is shown. Flow from the outlet 170 of the collection vessel 164 can be controlled with one or more pumps 172 that direct the flow to one or more filters 174. The flow from the filter 174 is directed through a particle analyzer 176, which can be in-line or in a sampling arrangement, and a flow meter 178, which is located at a convenient location along the flow path. The filtered flow can be collected in a bottle 180. Again, suitable polymeric tubing or other suitable flow conduits can be used to direct the flow through the filtration system. Further sequential filtration and / or a combination of recirculation and sequential filtration can be performed by repeating the filtration system as required. In a filtration system with two or more stages, the filters used for the subsequent stages of filtration can be selected to have finer particle removal capabilities. For example, the first stage filtration can be performed with a filter with a particle size cutoff accuracy of 5 nm to 15 nm, and the second stage filtration can be performed with a filter with a particle size cutoff accuracy of 1 nm to 3 nm. In some embodiments, the first stage filtration can involve recirculation, while the second stage is sequential.

[0051] For the embodiment in which the container is arranged in a closed loop configuration and recirculation is realized, the lid of the container that provides the composition to be filtered can be arranged with multiple ports.One port can be used for removing the liquid that is pumped to the filter, another port can be used to deliver the filtered liquid back into the container, and other ports can be used for various additional functions.For example, another port on the container lid can be used to deliver the filtered liquid to the filling container.Specific embodiments of the filtration device are described in more detail in the following examples.

[0052] While any one of a variety of pumps can generally be used to drive the filtration flow, impeller-type pumps have surprisingly been found to provide improved filtration performance. Without being limited by theory, it is believed that the more uniform pressure delivered by impeller-type pumps improves the performance of the filter for particulate removal by reducing pressure fluctuations. The improved filtration is confirmed in the examples where filtration by impeller-type pumps is contrasted with diaphragm-type pumps using the same filters. Suitable impeller-type pumps include, among others, magnetically levitated impeller pumps from Levitronix® GmbH (Switzerland). With high viscosity monoalkyltin trialkoxides, two or more Levitronix® pumps can be placed in series to obtain the desired flow rate. Magnetically levitated pumps provide low shear and a constant pressure on the liquid during pumping. The flow rate through the system generally depends on the filter selection, pump selection, tubing size, temperature, and pressure (affected by liquid viscosity).

[0053] Filters suitable for resist compositions based on in-line filtration are commercially available. For example, photoresist filters are available from Entegris (e.g., Impact® line of filters) and Nippon Pall Co. Ltd (Japan, e.g., PE-Kleen filters and PhotoKlean™ DDF P-nylon). The rated particle filtration size of the filter can be specified down to >5 nm, but smaller pore sizes can reduce flow rates. As described in the examples, desirable performance is obtained with filters with pore sizes <10 nm. In general, particle filtration accuracy can be 50 nm (i.e., removing particles with a size greater than 50 nm), 25 nm, 10 nm, 5 nm, 3 nm, 2 nm, or 1 nm. Those skilled in the art will recognize that additional ranges of particle filtration accuracy within the above explicit ranges are contemplated and are within the scope of the present disclosure.

[0054] For particulate removal, the purified monoalkyltin composition after fractional distillation can be placed in a clean container equipped to pump the composition for filtration. Suitable filtration systems are summarized above. As noted above, various configurations can be used. For recirculation, the composition can generally be recirculated 1 to 100 times, and in further embodiments, 2 to 40 times. For sequential filtration, the composition can be sequentially filtered 1 to 10 times. Those skilled in the art will recognize that additional ranges of the number of filtration steps within the above explicit ranges are contemplated and are within the scope of the present disclosure. Filtration can be performed prior to placing the radiation resist composition in a container for transportation and / or in the production line immediately prior to use of the composition for patterning purposes. In any case, the filtration system can be arranged to avoid contamination of the radiation resist composition with metal contaminants and / or particulate contaminants. If the filtered composition is placed in a container for transportation, the container can be sealed and appropriately transported to the end-use facility, where an appropriately clean process can be used for the transfer of the composition to the process equipment. EXAMPLES

[0055] Example 1. Preparation and purification of alkoxide precursors from amides This example demonstrates the synthesis and purification of monoalkyltin trialkoxides from monoalkyltin triamide precursors. The synthesis and purification of the triamide is demonstrated first.

[0056] Part A: Synthesis and purification of t-BuSn(NMe2)3 precursor t-BuSn(NMe2)3 was prepared by the reaction of t-BuMgCl and Sn(NMe2)4 in diethyl ether; t-BuMgCl (2.0 M) and Sn(NMe2)4 (99.9% trace metals basis) were supplied by Sigma Aldrich. In the reaction, the t-butyl group from the Grignard reagent replaces one dimethylamide (-N(CH3)2) group. 119 The Sn NMR spectrum shows that the approximate molecular purity of the product t-BuSn(NMe2)3 (δ = -85.6 ppm) is 94% as determined by peak integration; 1% is (t-Bu)2Sn(NMe2)2 (δ = -56.2 ppm) and the remaining 5% is Sn(NMe2)4 (δ = -120.2 ppm).

[0057] In a glovebox charged with Ar(g) and <0.5 ppm O2(g), 1202.57 g of t-BuSn(NMe2)3 was charged into a 2 L, two-necked, round-bottom flask with a 1.25 inch oval stir bar. A 34.3 g (6 mol%) amount of tris(2-aminoethyl)amine (TREN, Alfa Aesar) was added to the flask and stirred to form a milky suspension. One neck of the 2 L flask was fitted with a Teflon valve and the other neck was sealed with a 24 / 40 glass stopper. The flask was removed from the glovebox and connected to a Schlenk line.

[0058] Purification was carried out using the following packed column distillation settings: ·Heidolph Hei-Tec stir plate with Pt / 1000 RTD probe and temperature feedback control. Silicone oil bath. 300mm vacuum jacketed 24 / 40 Hempel type distillation column (Sigma Aldrich) · 0.24 inch 316 stainless steel saddle mesh column packing (Ace-Glass) · Vacuum jacketed 24 / 40 short path distillation head with water cooled condenser (Chemglass) 1L Schlenk bomb as collection flask

[0059] Vacuum distillation was performed using an oil bath temperature of 115°C-120°C and an absolute pressure of approximately 500 mTorr, resulting in a distillate vapor temperature ranging from 58-62°C. The first distillate was not discarded and 872.6 g of purified t-BuSn(NMe2)3 was recovered, resulting in a yield of 77.2%. At the end of the distillation, approximately 275 grams of material is retained in the distillation flask and packed column. It should be noted that the presence of TREN effectively retains the unreacted Sn(NMe2)4 and (t-Bu)2Sn(NMe2)2 impurities in the distillation flask. In Figure 4, which shows a single peak at δ=-85.6 ppm, 119 Sn NMR spectra confirm the isolation of pure product.

[0060] To evaluate non-tin metal contamination of the distilled t-BuSn(NMe2)3, a sample of the triamide was diluted with 2-methyl-2-butanol to a tin concentration of about 0.05 M with respect to the Sn concentration. The product was subjected to elemental analysis using inductively coupled plasma mass spectrometry (ICP-MS) and / or inductively coupled plasma atomic emission spectrometry (ICP-AES) at ChemTrace (CA, USA). Measurements were performed in triplicate. Results for 23 elements are presented in Table 1.

[0061] [Table 1]

[0062] Part B: Conversion of t-BuSn(NMe2)3 to t-BuSn(OtAm)3 In a glovebox charged with Ar(g) and <0.5 ppm O2(g), purified t-BuSn(NMe2)3 from Part A (2824 mmol) was charged into a 2 L, two-necked, round-bottom flask equipped with a 1.25 inch oval stir bar. 772 g (8755 mmol) of anhydrous 2-methyl-2-butanol (Sigma Aldrich, ≥99%) was added to the 1 L, two-necked, round-bottom flask. One neck of the flask was sealed with a 24 / 40 rubber septum and a Teflon valve was attached to the other. The flask was then removed from the glovebox and connected to a Schlenk line. The t-BuSn(NMe2)3 flask was cooled in an isopropyl alcohol / dry ice bath (cryobath) and then 2-methyl-2-butanol (t-amyl alcohol) was added slowly using a stainless steel 16 gauge cannula and 1-2 psi N2(g) pressure. An 18 gauge needle was used as a vent for the reaction flask to allow the resulting dimethylamine gas to escape. Once the addition was complete, the reaction flask was removed from the cryobath and warmed to room temperature under N2(g). After warming to room temperature, the septum was replaced with a 24 / 40 glass stopper and excess solvent was stripped under vacuum and discarded.

[0063] The product was then distilled under vacuum using a similar setup as described in Part A, but where a small 75 mm vacuum jacketed Vigreux column replaced the large packed column. The distillation was carried out using an oil bath temperature of 155° C. and an absolute pressure of approximately 500 mTorr, resulting in a distillate vapor temperature ranging from 104 to 108° C. A quantity of 1201.68 g of product was recovered, resulting in a yield of 97.3% for this step. The initial distillate material was not discarded. At the end of the distillation, approximately 30 grams of material remained in the distillation flask. Figure 5 shows the fraction of the product. 119 The Sn NMR spectrum is shown. GC-MS analysis shows that it contains 0.28±0.1% (t-Bu)2Sn(Ot-Am)2 (δ=-114.2 ppm) as a molecular impurity.

[0064] Example 2. Photoresist Formulation This example illustrates the composition and characterization of a photoresist formulation.

[0065] A solution (1M) of t-BuSn(Ot-Am)3 in 4-methyl-2-pentanol (>99.5% purity) was first prepared. Approximately 1 mole (437.225 g) of the alkoxide precursor from Example 1 was weighed and transferred into a 1 L volumetric flask in a glove box. 4-methyl-2-pentanol was then added to the flask. The solution was transferred to a fume hood and additional 4-methyl-2-pentanol was added to bring the total volume to 1 L. The formulated resist was then transferred to a 1 L brown Aicello Corp. CLEANBARRIER™ (CB) bottle. The molarity was checked by calcination to SnO2, confirming a precursor concentration of 1.0 M. The formulation was then diluted to a final volume of 20 L and a final concentration of 0.044 M in a 20 L NowPak™ container. Table 2 summarizes the ICP analysis of this solution performed by ChemTrace (Fremont, CA, USA).

[0066] [Table 2]

[0067] In Table 2, values ​​marked with the symbol "<" indicate that the concentrations for these metals were below the detection limit. Thus, for all of the metals tested, only Ba was above the detection limit, but for this metal, the measured value was less than 1 ppb. Based on the relative natural abundance of the metals, it can be reasonably assumed that for other metals not directly measured, their concentrations will be comparable to the measured values ​​in Table 2.

[0068] Example 3. Particle counts of photoresist formulations. The following examples demonstrate and compare the filtration of photoresist solutions to remove particulates with impeller and diaphragm type pumps.

[0069] Part A: Impeller Pumps Filtration of the alkoxide solution began immediately after dilution. The filtration system is shown diagrammatically in FIG. 6. The mixing tank system 200 contains five connection ports at the top of the tank. These ports allow for the following: filtration with recirculation (ports 202, 204), tank cleaning via spray ball (port 206), argon injection (port 208), and headspace pressure monitoring (port 210). The filtration loop consists of two magnetic levitation impeller pumps 212, 214 in series, a temperature probe, a 5 nm Entegris UHP filter 216, pressure transducers before 218 and after 220 the filter, and a particle counting manifold 222. Appropriate clean tubing connects the components.

[0070] The solution was recirculated for 1 day to achieve 17 volumetric turns through the filter. Particle counts were monitored during filtration with a RION KS-41B laser system including a syringe sampler (KZ-31W) and controller (KE-40B1). The system quantifies particle counts in a selected channel size by light scattering method down to sizes as small as 70 nm. The final filtered material was bottled in Aicello CB bottles in a laminar flow hood.

[0071] The particle counts for the 70, 150, and 200 nm channels are 3.80, 0.24, and 0.12 per mL, respectively. Table 4 summarizes the counts in all channels.

[0072] [Table 3]

[0073] Filtration using an impeller pump was highly effective at removing particulates down to small sizes. Filtration results were significantly improved over comparable filtration using a diaphragm pump, as shown above using a comparable system except for the different pump.

[0074] Part B: Diaphragm Pumps Filtration of the monoalkyltin trialkoxide solution from Example 2 began immediately after dilution. For this comparative filtration example, the 20 L NowPak vessel was equipped with a recirculation cap to allow the solution to circulate through the filtration loop.

[0075] The filtration loop consisted of an electric diaphragm pump (Cole-Parmer PTFE-diaphragm pump, model number 7090-42), a pressure gauge, a 5 nm Entegris UHP filter, a particle counting manifold, and a 3-way valve. The solution was recirculated for approximately 2 days, achieving 28 volumetric turns. Particle monitoring was performed during filtration with a RION KS-41B laser system including a syringe sampler (KZ-31W) and controller (KE-40B1). The system quantifies particle counts in selected channel sizes by light scattering method down to sizes as small as 70 nm. The final filtered material was bottled in Aicello CB bottles in a laminar flow hood. The particle counts for the 70, 150, and 200 nm channels are 34.2, 2.40, and 1.44 per mL, respectively. Table 3 summarizes the counts in all channels, which represents a summary of particulate levels before bottling.

[0076] [Table 4]

[0077] Comparison of the data in Table 3 with the data in Table 4 indicates that filtration with an impeller pump was more effective than a diaphragm pump at removing particles of all sizes measured.

[0078] The above embodiments are intended to be illustrative and not limiting. Further embodiments are within the scope of the claims. Moreover, although the present invention has been described with reference to specific embodiments, those skilled in the art will understand that changes can be made in form and detail without departing from the spirit and scope of the present invention. The incorporation by reference of the above documents is limited so as not to incorporate subject matter contrary to the explicit disclosure herein. To the extent that a particular structure, composition and / or process is described herein with components, elements, ingredients or other compartments, it should be understood that the disclosure herein covers the particular embodiment, the embodiment includes the particular components, elements, ingredients, other compartments or combinations thereof, and the embodiment essentially consists of such particular components, ingredients or other compartments or combinations thereof, which may include additional features that do not change the basic nature of the subject matter, as suggested in the discussion unless otherwise expressly stated. [Explanation of symbols]

[0079] 100 Fractional distillation apparatus 102 Distillation vessel 104 Heating Element 106 Distillation column 108 Pump 110 Pressure pipe material 112 Pressure Sensor 114 Temperature Sensor 116 Cooler 118 Collection System 122 Cow Joint 124 Receiver Connector 126 Receiver Connector 128 Receiver Connector 130 collection flasks 132 Collection flask 134 Collection flask 140 Filtration System 142 Container 144 Exit 146 Entrance 148 Access Ports 150 Pump 152 First Filter 154 More Filters 156 Flow meter 158 Particle Analyzer 160 Recirculation Line 162 Collection Line 164 Collection Container 165 Valve 166 Valve 168 Collection Container 170 Exit 172 Pump 174 Filters 176 Particle Analyzer 178 Flow meter 180 bottles 200 Mixing Tank System 202 Port 204 Port 206 Port 208 Port 210 Port 212 Magnetically Levitated Impeller Pump 214 Magnetically Levitated Impeller Pump 216 Filters 218 Pressure Transducer 220 Pressure Transducer 222 Particle Counting Manifold

Claims

1. A mixture of a solvent and a monoalkyltin trialkoxide (RSn(OR')) having a tin concentration of about 0.005M to about 0.5M and having no more than about 40 particles per mL having a particle size of at least about 70 nm. ３ ) or monoalkyltin triamide (RSn(NR' ２ ) ３ ).

2. The composition of claim 1 , wherein the solvent comprises an alcohol or a mixture of alcohols.

3. 10. The composition of claim 1 having a stannous concentration of about 0.01 M to about 0.25 M and having no more than about 5 particles per mL having a size of at least about 100 nm as determined by light scattering.

4. The composition of claim 1 comprising a monoalkyltin trialkoxide.

5. R is R １ R ２ R ３ C-, where R １ and R ２ are independently an alkyl group having 1 to 10 carbon atoms; R ３ The composition of claim 1, wherein is hydrogen or an alkyl group having 1 to 10 carbon atoms.

6. R is methyl (CH ３ -), ethyl (CH ３ CH ２ -), isopropyl (CH ３ CH ３ HC-), t-butyl ((CH ３ ) ３ C-), t-amyl (CH ３ CH ２ (CH ３ ) ２ C-), sec-butyl (CH ３ (CH ３ CH ２ )CH-), neopentyl ((CH ３ ) ３ CCH ２ 2. The composition of claim 1, comprising cyclohexyl, cyclopentyl, cyclobutyl, or cyclopropyl.

7. Monoalkyltin trialkoxide (R １ Sn(OR'') ３ ) or monoalkyltin triamide (R １ Sn(NR' ２ ) ３ wherein R is R １ and R' is the same as or different from R''.

8. The composition of claim 1, wherein R' comprises a methyl group, an ethyl group, an isopropyl group, a t-butyl group, or a t-amyl group.

9. 10. The composition of claim 1 having no more than about 30 particles having a size of at least about 70 nm as determined by light scattering.

10. Monoalkyltin trialkoxides, R is methyl (CH ３ -), ethyl (CH ３ CH ２ -), isopropyl (CH ３ CH ３ HC-), t-butyl ((CH ３ ) ３ C-), t-amyl (CH ３ CH ２ (CH ３ ) ２ C-), sec-butyl (CH ３ (CH ３ CH ２ )CH-), neopentyl ((CH ３ ) ３ CCH ２ 10. The composition of claim 1, wherein R′ comprises a methyl group, an ethyl group, an isopropyl group, a t-butyl group, or a combination thereof, the solvent comprises an alcohol or a mixture of alcohols, and the composition has no more than about 5 particles per mL having a size of at least 100 nm as determined by light scattering.

11. 1. A method for preparing a radiation-sensitive composition comprising a solvent and an organometallic composition selected from the group consisting of monoalkyltin trialkoxides, monoalkyltin triamides, or mixtures thereof, comprising:

20. The method of claim 19, further comprising: flowing the composition through a filter using an impeller-type pump to remove particulate contaminants and form a filtered composition having a concentration of particles at least 70 nm in size of less than 100 particles per mL, as measured by light scattering.

12. The method of claim 11, wherein the organometallic composition has a tin concentration of about 0.005M to about 1M.

13. The method of claim 11 , wherein the solvent comprises an alcohol or a mixture of alcohols.

14. The method of claim 11 , wherein the flow is maintained with multiple in-line impeller pumps.

15. 12. The method of claim 11, wherein the filter is a semiconductor grade filter having a particle filtration accuracy of 50 nm or less.

16. 12. The method of claim 11, wherein said flowing comprises refiltering said filtered composition until said filtered composition has an indicated concentration of particles as measured by light scattering.

17. 12. The method of claim 11, wherein the flowing and refiltering filtration device is configured to recirculate the composition from a mixing vessel having an inlet and an outlet.

18. 20. The method of claim 17, wherein the mixing vessel includes a lid disposed with inlet and outlet ports, respectively, that provide access to the recirculating composition.

19. 20. The method of claim 17, wherein the filtered composition is collected in a clean container and the refiltering comprises flowing the filtered composition through a filter to further remove particles from the filtered composition.

20. 20. The method of claim 17, wherein the refiltration is repeated at least three times based on filtration of a volume of the provided composition.

21. 18. The method of claim 17, wherein the re-filtration of the filtered composition is performed until the measured concentration of particles having a size of at least 70 nm is less than 40 particles per mL.

22. 20. The method of claim 17, wherein the re-filtration of the filtered composition is performed until the measured concentration of particles having a size of at least 100 nm is less than 5 particles per mL.

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