Method for manufacturing product generating aroma

Abstract

To provide a method for manufacturing a product that generates aroma, by which it is possible to adjust an aroma balance without using other material, such as fragrance, or while reducing an amount of use of the fragrance, etc.SOLUTION: A control method includes: a calculation step (S104) of calculating a total amount of necessary evaporation of an aroma component in a raw material from a planned processing amount of the raw material; an evaporation step (S105) of evaporating part of the aroma component from the raw material by supplying the raw material to an evaporation system; and an integration step (S106) of integrating an amount of the aroma component evaporated in the evaporation step, and calculating an integrated amount as a total actual evaporation amount. The evaporation step is repetitively carried out until the total actual evaporation amount reaches the total amount of necessary evaporation.SELECTED DRAWING: Figure 3

Description

[Technical field]

[0001] The present disclosure relates to methods for producing products that emit fragrance, such as foods and cosmetics. [Background technology]

[0002] Manufacturing methods have been developed that realize flavors and textures that match the tastes of consumers by blending various ingredients such as flavorings, sugar raw materials, and emulsifiers with the main raw materials of food. For example, the following Patent Document 1 proposes a manufacturing method for chocolate that prevents the aroma components in the cacao from evaporating by mixing cacao and sugar raw materials and grinding them in an enclosed space. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] International Publication No. 2020 / 095913 Summary of the Invention [Problem to be solved by the invention]

[0004] In conventional manufacturing methods, in order to adjust the aroma balance of food, it was necessary to add other ingredients such as flavorings to the main ingredients of the food. However, in recent years, consumers have become more conscious of raw materials, so it may be difficult to adjust the aroma balance by adding other ingredients from the perspective of product value. Moreover, such difficulties in adjusting the aroma balance are not limited to food, but occur in all products that emit aromas, such as cosmetics.

[0005] Therefore, the present disclosure proposes a method for producing a product that emits a fragrance, which allows the fragrance balance to be adjusted without using other materials such as fragrances, or while reducing the amount of fragrances and the like used. [Means for solving the problem]

[0006] (1) The manufacturing method proposed in this disclosure is a method for manufacturing a product that emits an aroma, and includes a calculation step of calculating a total required evaporation amount of aroma components in the raw material from a planned processing amount of the raw material, an evaporation step of supplying the raw material to an evaporation system and evaporating a part of the aroma components from the raw material, and an integration step of accumulating the amount of aroma components evaporated in the evaporation step and calculating the accumulated amount as a total actual evaporation amount. The evaporation step is repeatedly performed on the raw material until the total actual evaporation amount reaches the total required evaporation amount.

[0007] (2) In the manufacturing method of (1), in the accumulation step, the total actual evaporation amount of the aroma components may be calculated based on the flow rate of the gas flowing through the evaporation system in the evaporation step and the concentration of the aroma components in the gas.

[0008] (3) In the manufacturing method of (1) or (2), the evaporation step may be carried out under reduced pressure. This allows aroma components with low vapor pressure to be evaporated, increasing the freedom of aroma adjustment.

[0009] (4) In any of the manufacturing methods (1) to (3), the raw material may be heated in the evaporation step, which makes it possible to evaporate aroma components that are difficult to evaporate at room temperature, thereby increasing the freedom in aroma adjustment.

[0010] (5) In any one of the manufacturing methods (1) to (4), the calculation step may calculate the total required evaporation amount for each aroma component, and the integration step may integrate the total actual evaporation amount for each aroma component. This allows a more desirable aroma balance to be achieved.

[0011] (6) In any of the manufacturing methods described in (1) to (5), the method may further include a step of measuring the aroma components evaporated in the evaporation step and adjusting control parameters of the evaporation system based on the measurement results, thereby realizing a more desirable evaporation step.

[0012] (7) In any one of the manufacturing methods described in (1) to (6), a step of inputting a required evaporation amount of the aroma components emitted from the raw material and a plurality of control parameters of the evaporation system into a machine learning model generated using training data of the evaporation amount of the aroma components and calculating the plurality of control parameters to be used in the evaporation step as an output from the machine learning model may be included. This allows a good balance of the aroma components to be achieved.

[0013] (8) In any one of the manufacturing methods (1) to (7), the aroma components are preselected using as an index the level of variation in the amount of evaporation depending on the degree of vacuum and temperature in the evaporation system.

[0014] (9) In any one of the manufacturing methods described in (1) to (8), the method includes a step of classifying the aroma components emitted by the raw material into a plurality of groups based on their vapor pressures and octanol / water partition coefficients, and determining control parameters of the evaporation system for each of the plurality of groups.

[0015] (10) In the production method according to (9), the vapor pressure is a vapor pressure at 20 to 25°C.

[0016] (11) In the manufacturing method of (10), the vapor pressure is the vapor pressure at 25°C.

[0017] (12) In the production method according to any one of (1) to (11), the groups each independently satisfy any one of the following (A1) to (D1): (A1) Vapor pressure range: 11.3 to 1.73 mmHg, and octanol / water partition coefficient range: 1.3 to 1.8; (B1) Vapor pressure range: 1.6 to 9.78 mmHg, and octanol / water partition coefficient range: 1.2 to 3.4; (C1) Vapor pressure range: 1.5 to 3.3 mmHg, and octanol / water partition coefficient range: 0.7 to 0.8 (D1) Vapor pressure range: 0.9 to 3.1 mmHg, and octanol / water partition coefficient range: 0.0 to 0.6.

[0018] (13) In the production method according to any one of (1) to (12), the plurality of groups each independently contain any one of compound groups selected from the following (A2) to (D2): (A2) a compound group including at least one compound selected from 2-methylpropanal, ethyl acetate, butan-2-one, ethanol, butane-2,3-dione, pentanal, 3-methylbutanal, 2-methylbutanal, formic acid, pentan-2-one, (methyldisulfanyl)methane, acetic acid, and hexanal; (B2) a compound group including at least one compound selected from 1-methyl-4-prop-1-en-2-ylcyclohexene, nonanal, nonan-2-one, heptan-2-ol, 3-methylbutyl acetate, pentan-2-yl acetate, pentan-1-ol, benzaldehyde, pentan-2-ol, and 3-methyl-1-butanol; (C2) a compound group including at least one compound selected from 2-methylpropanoic acid, butanoic acid, 2-ethylpyrazine, 2,5-dimethylpyrazine, 2,3-dimethylpyrazine, furan-2-carbaldehyde, propanoic acid, 3-hydroxybutan-2-one, and 1-hydroxypropan-2-one; (D2) A compound group containing at least one compound selected from furan-2-ylmethanol, oxolan-2-one, 3-methylbutanoic acid, 2-phenylacetaldehyde, 3,7-dimethylocta-1,6-dien-3-ol, 2-ethylhexan-1-ol, 2-methoxyphenol, phenylmethanol, 2-phenylethanol, hexanoic acid, and acetamide.

[0019] (14) In any one of the manufacturing methods described in (1) to (13), the product is a food product or a cosmetic product.

[0020] (15) In the manufacturing method according to any one of (1) to (14), the product is an oily food product.

[0021] (16) In any one of the manufacturing methods (1) to (15), the evaporation system is a thin film evaporator.

[0022] (17) In any one of the manufacturing methods according to (1) to (16), the product contains cocoa.

[0023] (18) In the manufacturing method according to any one of (1) to (17), the product is chocolate.

[0024] (19) In any one of the manufacturing methods (1) to (18), the evaporation system has a processing vacuum degree of 0 to −0.08 MPa.

[0025] (20) In any one of the manufacturing methods (1) to (19), the processing temperature in the evaporation system is 45°C to 80°C.

[0026] (21) In addition, the method for producing a food product that emits an aroma proposed in the present disclosure includes: measuring a plurality of aroma components derived from a preselected food raw material using as an index the level of variation in the amount of evaporation depending on the degree of vacuum and temperature in an evaporation system that evaporates aroma components from the food raw material; The method includes a step of adjusting the operating conditions of the evaporation system based on the measurement results so that the aroma balance of the food product falls within a predetermined range.

[0027] (22) In the manufacturing method of (21), the adjustment step includes classifying the plurality of aroma components into a plurality of groups based on the vapor pressure and the octanol / water partition coefficient based on the measurement results, and adjusting the operating conditions of the evaporation system for each of the plurality of groups.

[0028] (23) In the production method according to (21), the vapor pressure is a vapor pressure at 20 to 25°C.

[0029] (24) In the production method of (21), the vapor pressure is the vapor pressure at 25°C.

[0030] (25) In the production method according to any one of (21) to (24), the groups each independently satisfy any one of the following (A1) to (D1): (A1) Vapor pressure range: 11.3 to 1.73 mmHg, and octanol / water partition coefficient range: 1.3 to 1.8; (B1) Vapor pressure range: 1.6 to 9.78 mmHg, and octanol / water partition coefficient range: 1.2 to 3.4; (C1) Vapor pressure range: 1.5 to 3.3 mmHg, and octanol / water partition coefficient range: 0.7 to 0.8 (D1) Vapor pressure range: 0.9 to 3.1 mmHg, and octanol / water partition coefficient range: 0.0 to 0.6.

[0031] (26) In the production method according to any one of (21) to (25), the plurality of groups each independently contain any one of compound groups selected from the following (A2) to (D2): (A2) a compound group including at least one compound selected from 2-methylpropanal, ethyl acetate, butan-2-one, ethanol, butane-2,3-dione, pentanal, 3-methylbutanal, 2-methylbutanal, formic acid, pentan-2-one, (methyldisulfanyl)methane, acetic acid, and hexanal; (B2) a compound group including at least one compound selected from 1-methyl-4-prop-1-en-2-ylcyclohexene, nonanal, nonan-2-one, heptan-2-ol, 3-methylbutyl acetate, pentan-2-yl acetate, pentan-1-ol, benzaldehyde, pentan-2-ol, and 3-methyl-1-butanol; (C2) a compound group including at least one compound selected from 2-methylpropanoic acid, butanoic acid, 2-ethylpyrazine, 2,5-dimethylpyrazine, 2,3-dimethylpyrazine, furan-2-carbaldehyde, propanoic acid, 3-hydroxybutan-2-one, and 1-hydroxypropan-2-one; (D2) A compound group containing at least one compound selected from furan-2-ylmethanol, oxolan-2-one, 3-methylbutanoic acid, 2-phenylacetaldehyde, 3,7-dimethylocta-1,6-dien-3-ol, 2-ethylhexan-1-ol, 2-methoxyphenol, phenylmethanol, 2-phenylethanol, hexanoic acid, and acetamide.

[0032] (27) In any one of the manufacturing methods described in (21) to (26), the evaporation system is a thin film evaporator.

[0033] (28) In any one of the manufacturing methods according to (21) to (27), the food contains cocoa.

[0034] (29) In the manufacturing method according to any one of (21) to (28), the degree of vacuum in the evaporation system is 0 to −0.08 MPa.

[0035] (30) In the manufacturing method according to any one of (21) to (29), the processing temperature in the evaporation system is 45 to 80°C. [Brief description of the drawings]

[0036] [Figure 1] 1 is a block diagram showing an example of an aroma component evaporation system proposed in the present disclosure. [Diagram 2] FIG. 2 is a schematic diagram illustrating an example of the evaporator shown in FIG. [Diagram 3] FIG. 1 is a flow diagram showing an example of a method for producing a fragranced product. [Figure 4] FIG. 11 is a flow diagram showing another example of a method for producing a product that emits fragrance. [Diagram 5] FIG. 11 is a diagram illustrating an example of a relationship between a control parameter and an evaporation amount. [Figure 6] FIG. 1 is a conceptual diagram illustrating an example of a machine learning model used in the manufacture of a fragranced product. [Figure 7] FIG. 7 is a flow diagram illustrating an example of a manufacturing method that utilizes the machine learning model of FIG. [Figure 8] This is a graph showing the changes in aroma components of the resulting chocolate dough measured by GC-MS when the operating parameters of the thin film volatilization device in Test Example 1, namely, the stirring speed, jacket temperature, degree of vacuum, air flow rate, and dough flow rate, were varied. [Figure 9A] The figure shows the results of a hierarchical cluster analysis (Ward method) of the change in aroma over time when the degree of vacuum and jacket temperature were changed when processing chocolate dough using a thin-film evaporator. [Figure 9B] This graph shows that when chocolate dough is processed using a thin-film volatilization device, the aroma components are distributed along the two axes of "vapor pressure (25°C)" and "octanol / water partition coefficient (logKow)," and the above four volatilization pattern clusters (groups) are separated. [Figure 10] 10B is a graph showing the results of a sensory evaluation of a sample obtained by performing an evaporation process while controlling the operating conditions of a thin film volatilization device in Test Example 2 using the graph in FIG. 10B as an index. [Figure 11] 10B is a graph showing the results of a sensory evaluation of a sample obtained by performing an evaporation process while controlling the operating conditions of a thin film volatilization device in Test Example 3 using the graph in FIG. 10B as an index. [Figure 12A] 1 is a graph showing the results when TDS (Temporal Dominance of Sensations) was carried out in Test Example 4 (before treatment). [Figure 12B] 1 is a graph showing the results when TDS (Temporal Dominance of Sensations) was carried out in Test Example 4 (after treatment). DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0037] An example of a method for producing an aroma-emitting product proposed in this disclosure will be described below. Fig. 1 is a block diagram showing an example of an aroma component evaporation system 1 used in the production method proposed in this disclosure.

[0038] The evaporation system 1 is a system that evaporates a part of the aroma components contained in the raw materials of a product that emits an aroma, and changes (adjusts) the balance of the aroma components contained in the raw materials. Here, the product that emits an aroma is, for example, a food product. Examples of food raw materials supplied to the evaporation system 1 include cacao (including plants and cacao materials such as cacao beans, cacao nibs, and cacao mass), which is the main raw material of chocolate, soy milk, fermented milk, butter, vegetable juice, coffee, protein drinks, wine, sake, beer, miso, soy sauce, dashi, soup, and extracts. The food raw materials supplied to the evaporation system 1 may be raw materials for plant-based foods or raw materials for plant-based pseudo-foods. Plant-based foods are plant-based foods or foods made from plant-based raw materials, and the raw materials are, for example, wheat, wheat, soybeans, soy milk, oat milk, and almond milk. Moreover, the plant-based pseudo food is a food that imitates a conventional animal-based food by using a plant-based raw material, such as plant-based meat, plant-based chicken, plant-based ham, plant-based fish, plant-based squid, etc. The raw materials for plant-based pseudo food are, for example, wheat, barley, soybeans, soy milk, oat milk, almond milk, etc. The product that emits an aroma is not limited to food, and may be, for example, a cosmetic product.

[0039] According to a preferred embodiment of the present disclosure, the food is an oily food. Here, the term "oily food" refers to a food containing oil and fat, including foods containing a large amount of oil and fat, and oil-processed foods that are foods made by processing oil and fat, including butter, margarine, chocolate, etc.

[0040] According to a preferred embodiment of the present disclosure, the food product contains or is made from a cacao material including cacao beans, cacao nibs, or cacao mass. Here, "cacao beans" refers to the seeds of cacao (Theobroma cacao), and the variety and origin of the raw cacao beans are not particularly limited. Examples of cacao varieties include Forastero, Criollo, Trinitario, and their derivatives and hybrids. Examples of origins include Ghana, Côte d'Ivoire, Nigeria, Brazil, Venezuela, Trinidad and Tobago, Peru, Vietnam, and Madagascar. Furthermore, "cacao nibs" refers to cacao beans from which the shell has been removed and which have not been heated in the presence of moisture. However, cacao nibs include those that have been heat sterilized and / or roasted, which are commonly used in the manufacture of general chocolate and cocoa. Cacao nibs also include crushed products of the above. Furthermore, "cocoa mass" is prepared by conventional methods through the processes of fermenting, drying, sorting, sterilizing, roasting, removing the skin, coarsely crushing, and grinding cocoa beans.

[0041] According to a preferred embodiment of the present disclosure, the food is chocolate. When the food is chocolate, the manufacturing method is not particularly limited, but may be any of the following: "Beckett's Industrial Chocolate Manufacture and Use FIFTH EDITION" (Stephen T. Beckett, Mark S. Fowler Gregory R. Ziegler) or "The Science of Chocolate" (by Stephen T. Buckt, translated by Furuya Tetsuo, Publisher: Saiwai Shobo, ISBN: 4782104049 / 9784782104040), and chocolate can be obtained through a process of selecting cocoa beans, roasting, skin separation, coarse grinding, kneading, grinding, flavor adjustment, crystallization, molding, cooling, molding, etc. According to one embodiment, the method of the present invention is applied in the flavor adjustment process.

[0042] [System Overview] As shown in Fig. 1, the evaporation system 1 includes an evaporator 10. Fig. 2 is a schematic diagram showing an example of the evaporator 10 and a device connected thereto.

[0043] Examples of the evaporator 10 include the thin film volatilizer Exeva manufactured by Kobe Steel and the High Evaporator manufactured by Sakura Seisakusho, but are not limited to these and may be any other device capable of dispersing aroma by changing the temperature or degree of reduced pressure. 2, the evaporator 10 has, for example, a cylinder 11 and an agitator 14 disposed inside the cylinder 11. Note that, for example, as shown in FIG. 2, the agitator 14 has an agitator blade 14a and an agitator motor 14b that rotates the agitator blade 14a.

[0044] As shown in FIG. 2, the cylinder 11 is provided with a raw material supply port 12a for supplying raw materials for a product that emits aroma. The raw material supply port 12a is provided, for example, at the top of the cylinder 11. The raw materials supplied to the cylinder 11 are liquid materials. For example, in the manufacturing process of solid foods such as chocolate, the raw materials are supplied from the raw material supply port 12a as crushed and liquefied raw materials (for example, cacao mass). The raw materials supplied from the raw material supply port 12a are stirred by the stirring blades 14a while flowing downward along the inner surface of the cylinder 11. When the stirring blades 14a stir the raw materials, the raw materials are subjected to centrifugal force to form a thin film along the inner surface of the cylinder 11. Therefore, a flow path for the raw materials is formed along the inner surface of the cylinder 11. A raw material receiving part 11d for receiving the raw materials may be attached to the lower part of the cylinder 11.

[0045] As shown in FIG. 2, the evaporation system 1 has raw material tanks 51 and 52 that store raw materials. The raw material supply pump 34 delivers the raw material in the raw material tanks 51 and 52 toward the raw material supply port 12a of the cylinder 11. The evaporation system 1 may have a plurality of raw material tanks 51 and 52 as shown in the figure. In this case, a switching valve 55a may be provided in the piping connecting the cylinder 11 and the raw material tanks 51 and 52. By operating the switching valve 55a, the raw material stored in the plurality of raw material tanks 51 and 52 can be selectively supplied to the cylinder 11. The raw material tanks 51 and 52 may store different types of raw materials. Unlike the example shown in FIG. 2, the raw material supply pump 34 may be provided in each of the plurality of raw material tanks 51 and 52.

[0046] The raw material accumulated in the raw material receiving section 11d is returned to the raw material tanks 51 and 52 by the raw material return pump 35. When the evaporation system 1 has a plurality of raw material tanks 51 and 52, a switching valve 55b may be provided between the raw material receiving section 11d and the raw material tanks 51 and 52. By operating the switching valve 55b, the raw material that has passed through the cylinder 11 can be returned to the original raw material tanks 51 and 52. For example, when the raw material in the first raw material tank 51 is processed in the cylinder 11, the raw material that has passed through the cylinder 11 can be returned to the first raw material tank 51 again. The same applies when processing the raw material in the second raw material tank 52.

[0047] As will be described in detail later, for example, when performing evaporation processing on the raw material in the first raw material tank 51, the raw material is circulated between the first raw material tank 51 and the evaporator 10 until the required amount of aroma components is evaporated. Similarly, when performing evaporation processing on the raw material in the second raw material tank 52, the raw material is circulated between the second raw material tank 52 and the evaporator 10 until the required amount of aroma components is evaporated.

[0048] The number of raw material tanks is not limited to the example shown in the drawing, and may be one, or three or more.

[0049] During the evaporation process, a carrier gas is supplied into the cylinder 11. The carrier gas is, for example, air, but may be nitrogen, helium, oxygen, carbon dioxide, hydrogen sulfide, or the like, depending on the raw material to be processed. As the carrier gas, not only an inert gas that does not chemically affect the raw material, but also a gas that causes a chemical reaction such as oxidation or sulfurization with the components in the raw material and affects the aroma of the raw material may be used, or such gases may be mixed and used. As shown in FIG. 2, the gas supply port 11e is provided, for example, at the bottom of the cylinder 11. The carrier gas supplied to the cylinder 11 is discharged, for example, from a gas discharge port 11f provided at the top of the cylinder 11. The evaporation system 1 has a carrier gas pump 33 (see FIG. 1) for sending the carrier gas to the cylinder 11.

[0050] When the raw material is supplied to the cylinder 11, it receives centrifugal force due to the rotation of the stirring blades 14a and flows downward while forming a thin film along the inner surface of the cylinder 11. Aroma components are volatile. Therefore, some of the aroma components contained in the raw material evaporate in the process of flowing along the inner surface of the cylinder 11. The evaporated aroma components are transported to the upper part together with the carrier gas and are discharged from the gas discharge port 11f.

[0051] As shown in FIG. 2, the evaporation system 1 has a gas component measuring instrument 21. The gas component measuring instrument 21 is connected to a pipe extending from the gas exhaust port 11f, and measures the components of the gas exhausted from the gas exhaust port 11f. The gas component measuring instrument 21 outputs information according to the type and amount (concentration in the gas) of the aroma components contained in the exhausted gas. It is desirable for the gas component measuring instrument 21 to output this information in a timely manner. In other words, when the components in the exhausted gas change, it is desirable for the change to be reflected in the output information of the gas component measuring instrument 21 without causing a substantial time delay. For example, a gas FTIR (Fourier transform infrared spectrophotometer) can be used as such a gas component measuring instrument 21, but is not necessarily limited to this.

[0052] As shown in FIG. 2, the evaporation system 1 has a gas flow meter 22. The gas flow meter 22 outputs a signal according to the amount of gas discharged. As described later, the evaporation system 1 may perform evaporation processing under reduced pressure, so it is desirable that the gas flow meter 22 be a flow meter that can measure the volume (flow rate) even under reduced pressure. In addition, in order to deal with unknown aroma components, it is desirable that the gas flow meter 22 be a flow meter that can measure the volume even when unknown gas components are included. As such a gas flow meter 22, for example, an impeller type flow meter can be used, but the type is not limited thereto.

[0053] A vacuum pump 31 (see FIG. 2) is attached to the pipe connected to the gas exhaust port 11f. The pressure inside the cylinder 11 is adjusted by driving the vacuum pump 31. In particular, in the present disclosure, the pressure inside the cylinder 11 can be set to a pressure lower than atmospheric pressure by driving the vacuum pump 31. This allows aroma components that are difficult to evaporate under atmospheric pressure due to their low vapor pressure to be evaporated, thereby reducing the content of the aroma components in the raw material.

[0054] 2, gas component measuring instrument 21 and the devices of gas component measuring instrument 21 may be arranged in any order as long as they can perform their functions. For example, gas flow meter 22 may be arranged downstream of gas component measuring instrument 21, and vacuum pump 31 may be arranged downstream of gas flow meter 22.

[0055] As shown in FIG. 2, the evaporator 10 is provided with a jacket 13 that covers the outside of the cylinder 11. The jacket 13 has a heat medium passage 13a that is arranged along the outer surface of the cylinder 11. The raw material flowing in the cylinder 11 is heated by the heat medium flowing through the heat medium passage 13a. When the raw material is heated, the evaporation of the aroma components can be promoted. As the heat medium, water vapor can be used, but is not limited to this. The evaporation system 1 has a heater 32 (see FIG. 1). The heater 32 heats the heat medium supplied to the heat medium passage 13a. Unlike the example shown in the figure, the heater 32 may be directly attached to the outer surface of the cylinder 11.

[0056] 1, the evaporation system 1 has a pressure gauge 23, an agitation speed meter 24, a thermometer 25, and a raw material flow meter 26. The evaporation system 1 also has a control device 41, an input device 42, and a display device 43.

[0057] The outputs of the pressure gauge 23 etc. are input to the control device 41. The pressure gauge 23 is provided in the gas flow path and outputs a signal corresponding to the air pressure inside the cylinder 11. The stirring speed meter 24 outputs a signal corresponding to, for example, the rotation speed of the stirring blade 14a (stirring motor 14b). The thermometer 25 outputs a signal corresponding to the temperature of the raw material flowing inside the cylinder 11. The raw material flow meter 26 outputs a signal corresponding to the amount of raw material supplied to the cylinder 11 per unit time (raw material flow rate).

[0058] The control device 41 detects the air pressure inside the cylinder 11 based on the output of the pressure gauge 23, detects the rotation speed of the agitator blade 14a based on the output of the agitator speed meter 24, detects the temperature of the raw material based on the output of the thermometer 25, and detects the flow rate of the raw material (amount supplied per unit time) based on the output of the raw material flow meter 26.

[0059] The control device 41 includes a central processing unit (CPU), a storage device, etc. The storage device includes a random access memory (RAM), a read only memory (ROM), a hard disk drive (HDD), etc. The control device 41 may be composed of one or more personal computers, server computers, etc.

[0060] The control device 41 operates according to a program stored in a storage device or instructions input by an operator via an input device 42, and controls various devices provided in or connected to the evaporator 10. Specifically, the control device 41 controls the stirring motor 14b, the vacuum pump 31, the heater 32, the carrier gas pump 33, and the raw material supply pump 34. The control device 41 may be connected to switching valves 55a and 55b to control these valves 55a and 55b.

[0061] The control device 41 receives information (type and concentration of aroma components) output from the gas component measuring instrument 21, and signals from the gas flow meter 22, pressure gauge 23, stirring speed meter 24, thermometer 25, and raw material flow meter .

[0062] The input device 42 includes a keyboard and a pointing device, and inputs signals to the control device 41 in response to user inputs.

[0063] The display device 43 includes a display panel made of liquid crystal or organic electroluminescence material, and presents to the operator information output from the control device 41. For example, the display device 43 may display information obtained from the gas component measuring instrument 21, a temperature detected based on a signal from the gas flowmeter 22, etc. The display device 43 may also display the air pressure inside the cylinder 11, the temperature of the raw material, the rotation speed of the stirring blade 14a, the flow rate of the raw material, etc.

[0064] [First example of manufacturing method] FIG. 3 is a flow diagram illustrating an example of a method for producing a product that emits a fragrance.

[0065] Raw materials for products that emit aromas usually contain multiple aroma components. Examples of aroma components include acetic acid and ethyl acetate. The aroma component may be water vapor. FIG. 3 illustrates an example of reducing the content of one of these aroma components to adjust the aroma balance. Hereinafter, the aroma component to be reduced in the evaporation system 1 is referred to as "target aroma component A."

[0066] In addition, an example will be described here in which the raw material stored in the first raw material tank 51 out of the multiple raw material tanks 51 and 52 is processed. When processing the raw material in the second raw material tank 52, the raw material tank 52 and the evaporator 10 can be connected by operating the above-mentioned switching valves 55a and 55b before starting the procedure described below.

[0067] First, the control device 41 measures the concentration of the target aroma component A emitted from the raw material stored in the raw material tank 51 (the concentration of the target aroma component A emitted from the raw material before evaporation processing) (S101). For example, the raw material supply pump 34 is driven to supply the raw material to the cylinder 11 without rotating the stirring blade 14a or heating the cylinder 11 (without operating the evaporation system 1). Then, the concentration of the target aroma component A is detected based on the information obtained from the gas component measuring instrument 21. In other words, the concentration of the target aroma component A emitted from the raw material is measured in an environment similar to the environment in which the raw material is consumed by a consumer. For example, when the raw material to be processed is a food raw material, the concentration of the target aroma component A emitted from the raw material is measured in an environment in which the food is eaten (for example, room temperature, atmospheric pressure). The concentration measurement in S101 may be performed before the raw material is placed in the raw material tank 51.

[0068] Next, the control device 41 calculates the difference (concentration difference) between the target concentration of the target aroma component A and the concentration measured in S101 (S102). The target concentration here is, for example, the concentration of the target aroma component A emitted by a product that provides a desirable aroma. The target concentration can be calculated, for example, as follows: A sensory test is performed on the product to identify and select a product that emits a desirable aroma. Then, the concentration of the target aroma component A emitted by the product is measured with a gas component measuring device, and the measured concentration is set as the target concentration. The target concentration may be stored in advance in a storage device included in the control device 41. In this case, the control device 41 refers to the target concentration stored in the storage device and executes the calculation process of S102. The target concentration may be input to the control device 41 by an operator via the input device 42.

[0069] Next, the control device 41 calculates the amount of evaporation required from a unit amount of raw material based on the concentration difference calculated in S102 (S103). Here, the "required amount of evaporation" refers to the amount of target aroma component A that needs to be evaporated from the raw material in order to reduce the concentration of target aroma component A emitted from the raw material from the concentration actually measured in S101 to a target concentration. Hereinafter, the amount of evaporation required from a unit amount of raw material will be referred to as the "unit required amount of evaporation."

[0070] The relationship between the unit required evaporation amount and the concentration difference can be specified in advance by experiment. For example, the concentration of the target aroma component A emitted from a unit amount of raw material is measured before and after a process for evaporating the target aroma component A (for example, a heating process under reduced pressure) (the concentration before the evaporation process is called "C1" and the concentration after the evaporation process is called "C2"). The amount of the target aroma component A evaporated by the evaporation process is also measured (the evaporation amount is called "Ae"). This measurement is then performed multiple times, and a regression analysis is performed on the difference between the concentrations C1 and C2 (concentration difference) and the evaporation amount Ae, thereby obtaining the relationship (correlation curve) between the concentration difference and the unit required evaporation amount. Therefore, in S103, the control device 41, for example, refers to this correlation curve and calculates the required evaporation amount corresponding to the concentration difference calculated in S102.

[0071] The process of S103 is not necessarily limited to this. When the concentration difference and the unit required evaporation amount are in a proportional relationship, the required evaporation amount from the unit amount of the raw material may be calculated based on the concentration difference by using the relational expression.

[0072] Such a relational expression or a table representing a correlation curve may be stored in a storage device. In this case, the control device 41 may refer to such a relational expression or table to calculate the required evaporation amount corresponding to the concentration difference.

[0073] Next, the control device 41 calculates the amount of target aroma component A that needs to be evaporated from the planned processing amount of raw material (total required evaporation amount) based on the planned processing amount of raw material and the required evaporation amount calculated in S103 (S104, calculation step). Here, the planned processing amount is the amount of raw material to be processed by the evaporation system 1, for example, the amount of raw material stored in the raw material tank 51. The control device 41 calculates the total required evaporation amount, for example, by multiplying the planned processing amount by the unit required evaporation amount, which is the amount of target aroma component A that needs to be evaporated from a unit amount of raw material.

[0074] Next, the control device 41 operates the evaporation system 1 (S105, evaporation step). That is, the control device 41 drives the vacuum pump 31, the heater 32, the stirring motor 14b, the raw material supply pump 34, the raw material return pump 35, and the carrier gas pump 33.

[0075] The inventors of the present application have found that the environment (operating conditions) in which evaporation is facilitated varies depending on the aroma component. As an example, they have found that acetic acid is easily evaporated under reduced pressure, whereas the amount of evaporation of ethyl acetate is limited even under reduced pressure. Therefore, the control device 41 operates the evaporation system 1 under operating conditions suitable for the target aroma component A. These operating conditions (i.e., the control parameters of the vacuum pump 31, etc.) may be stored in a storage device in association with the target aroma component A, or may be input to the control device 41 by an operator via the input device 42.

[0076] The evaporator 10 is connected to the raw material tank 51 by the switching valves 55a and 55b. Therefore, when the control device 41 drives the raw material supply pump 34 and the raw material return pump 35, the raw material in the raw material tank 51 is repeatedly supplied to the evaporator 10, and the raw material circulates between the evaporator 10 and the raw material tank 51. Then, as the raw material passes through the cylinder 11, the target aroma component A evaporates from the raw material. Therefore, the amount of the target aroma component A contained in the raw material gradually decreases. This makes it possible to change the balance of the aroma components emitted by the raw material.

[0077] Next, the control device 41 integrates the amount of the target aroma component A evaporated in the evaporation process by the evaporator 10, and calculates the integrated amount as the total actual evaporation amount (S106). For example, the control device 41 calculates the actual evaporation amount of the target aroma component A per unit time based on the concentration of the target aroma component A obtained from the output of the gas component measuring device 21 and the gas flow rate obtained from the output of the gas flow meter 22. Here, the measured actual evaporation amount may be the mass of the target aroma component A calculated from the concentration of the target aroma component A, the gas flow rate, and the gas pressure. The actual evaporation amount may be the actual evaporation amount from a unit amount of raw material. In this case, the control device 41 may calculate the actual evaporation amount based on the supply rate of the raw material obtained from the output of the raw material flow meter 26 in addition to the concentration of the target aroma component A, the gas flow rate, and the gas pressure. Then, the control device 41 may integrate the actual evaporation amount calculated in this way during the evaporation process, and set it as the total actual evaporation amount.

[0078] Next, the control device 41 judges whether the total actual evaporation amount calculated in S106 has reached the total required evaporation amount calculated in S104 (S107). If the total actual evaporation amount has not yet reached the total required evaporation amount, the process returns to S105 and executes the subsequent processes. By repeating S105 to S107, the raw material in the raw material tank 51 is repeatedly supplied to the evaporator 10, and the concentration of the target aroma component A in the raw material gradually decreases.

[0079] When the actual evaporation amount reaches the total required evaporation amount in S107, the control device 41 stops the operation of the evaporation system 1. Specifically, after stopping the driving of the stirring motor 14b and the vacuum pump 31, the concentration of the target aroma component A emitted from the evaporated raw material is measured, and it is determined whether the concentration is within a reference range (S108). The concentration measurement in S108 may be performed in an environment similar to the environment in which the raw material to be processed is consumed by consumers, as in S101. For example, the concentration measurement in S108 is performed by driving the raw material supply pump 34 to supply the raw material to the cylinder 11 without rotating the stirring blade 14a or heating the cylinder 11 (without operating the evaporation system 1). Then, the concentration of the target aroma component A is measured by the gas component measuring device 21. The evaporation system 1 may have a dedicated gas component measuring device for measuring aroma components emitted from the raw material after the evaporation process.

[0080] In S108, if the concentration of the target aroma component A falls within the reference range, for example, if the difference between the measured concentration and the target concentration is equal to or less than the threshold, the control device 41 ends the current operation of the evaporation system 1. The control device 41 may transport the raw material in the raw material tank 51 to the next process. On the other hand, if the concentration of the target aroma component A is not within the reference range in the judgment of S108, the raw material processed in the current operation may not be suitable for the product, and the control device 41 notifies the operator of this fact (S109). This notification may be, for example, by displaying a predefined warning on the display device 43.

[0081] The manufacturing method shown in Figure 3 makes it possible to produce a product that emits aroma component A at a concentration close to the target concentration. For example, when the aroma of aroma component A is strong, by using this manufacturing method, it is possible to achieve the desired aroma without adding fragrances, etc.

[0082] The method for producing a product that emits an aroma is not limited to the example shown in Fig. 3. For example, while the evaporation system 1 is operating, the control device 41 may monitor the actual evaporation amount of the target aroma component A per unit time (unit actual evaporation amount), or the actual evaporation amount of the target aroma component A from a unit amount of raw material (unit actual evaporation amount). If this unit actual evaporation amount is outside the reference range, the operating conditions may be inappropriate. Therefore, when it is found that the unit actual evaporation amount is outside the reference range, the control device 41 may stop the operation of the evaporation system 1 and notify the operator of this fact. This notification may also be displayed by displaying a predefined warning on the display device 43.

[0083] [Second example of manufacturing method] In the flow of Fig. 3, the evaporation system 1 is operated under operating conditions (control parameters) that are pre-associated with the target aroma component A. Alternatively, the operating conditions (control parameters) may be adjusted so as to realize an operation more suitable for the target aroma component A. Fig. 4 is a flow diagram showing an example of such a production method.

[0084] In the following, an example will be described in which, among multiple aroma components contained in a raw material, the content of aroma component A is reduced to adjust the aroma balance, similar to the example in Fig. 3. In the example described here, the raw material stored in raw material tank 51 out of multiple raw material tanks 51 and 52 is treated.

[0085] S201 to S204 may be similar to S101 to S104 in the flow shown in FIG. 3, and therefore a description thereof will be omitted here.

[0086] In S205, the control device 41 acquires control parameters that specify the operating conditions of the evaporation system 1. The control parameters may include, for example, the following five parameters. Control parameter 1: Pressure in cylinder 11 (driving speed of vacuum pump 31) Control parameter 2: Temperature of the raw material flowing inside the cylinder 11 (current supplied to the heater 32) Control parameter 3: Stirring speed (rotation speed of the stirring motor 14b) Control parameter 4: Flow rate of the raw material supplied to the cylinder 11 (amount supplied per unit time by the raw material supply pump 34) Control parameter 5: Carrier gas flow rate (amount supplied per unit time by carrier gas pump 33)

[0087] By reducing the pressure inside the cylinder 11 (by lowering the pressure inside the cylinder 11 below atmospheric pressure) by driving the vacuum pump 31, it becomes possible to evaporate aroma components with low vapor pressure. Therefore, using the pressure inside the cylinder 11 as one of the control parameters is effective in ensuring the degree of freedom in aroma adjustment.

[0088] Moreover, it is possible to evaporate aroma components that are difficult to evaporate at room temperature by heating the raw material flowing inside the cylinder 11. Therefore, using the raw material temperature as one of the control parameters is also effective in ensuring the degree of freedom in aroma adjustment.

[0089] Furthermore, stirring the ingredients with the stirring blades 14a increases the frequency with which aroma component molecules reach the surface of the ingredients (the interface with the air) and thins the film of ingredients flowing inside the cylinder 11. Therefore, using the stirring speed as one of the control parameters is also effective in ensuring the freedom of aroma adjustment.

[0090] Increasing the flow rate of the carrier gas flowing over the surface of the raw material can promote the evaporation of aroma components. Therefore, using the flow rate of the carrier gas (the supply rate of the carrier gas) as one of the control parameters is also effective in ensuring the freedom of aroma adjustment.

[0091] Increasing the flow rate (feed rate) of the raw material shortens the residence time of the raw material in the cylinder 11. As a result, the evaporation of aroma components per unit amount of raw material is suppressed. Therefore, using the flow rate of the raw material as one of the control parameters is also effective in ensuring the freedom of aroma adjustment.

[0092] As described above, according to the findings of the present inventors, the environment in which evaporation is likely to occur differs depending on the aroma component. As an example, acetic acid is likely to evaporate under reduced pressure, whereas the amount of evaporation of ethyl acetate is limited even under reduced pressure. It has also been found that the amount of evaporation of acetic acid increases as the pressure is lowered. Therefore, in S205, a correlation curve showing the relationship between the control parameter for the target aroma component A and the amount of evaporation is referenced to calculate a control parameter corresponding to the required amount of evaporation. The control parameter for the target aroma component A is a parameter that effectively acts on the evaporation of the target aroma component A. For example, the control device 41 calculates a control parameter corresponding to the amount of evaporation required when a unit amount of raw material passes through the cylinder 11 once (referred to as a unit required amount of evaporation).

[0093] FIG. 5 is a diagram showing an example of such a correlation curve. In the figure, the horizontal axis is the value of the control parameter, for example, any one of the above-mentioned control parameters 1 to 5. Meanwhile, the vertical axis is the above-mentioned required evaporation amount per unit. When the control parameter shown in FIG. 5 is the pressure in the cylinder 11, FIG. 5 shows that the evaporation amount increases as the pressure is lowered. In S104, such a correlation curve is referred to and a control parameter corresponding to the required evaporation amount per unit is calculated. For control parameters for which no correlation curve is provided, a value that is specified in advance may be used. In the example shown in FIG. 5, the evaporation amount decreases as the control parameter increases. However, depending on the type of control parameter, the evaporation amount may also increase as the control parameter increases. There may also be other relationships between the control parameter and the evaporation amount.

[0094] Such a correlation curve may be determined, for example, by an experiment prior to operation of the evaporation system 1. That is, the control parameters are set to certain values, the amount of evaporation of the target aroma component A obtained from a unit amount of raw material is measured, and then the control parameters are set to different values ​​and the amount of evaporation is measured in the same manner. By measuring the amount of evaporation multiple times in this manner, the correlation curve shown in FIG. 5 can be created.

[0095] The required evaporation amount per unit required for calculating the control parameters may be calculated based on, for example, the total required evaporation amount or the planned processing amount. For example, by adopting a control parameter with a large required evaporation amount per unit, the time required to complete the evaporation process can be shortened.

[0096] There may be more than one control parameter for one target aroma component A. For example, the unit required evaporation amount may be a function of the pressure in the cylinder 11 and the flow rate of the carrier gas. In this case, in S205, the control device 41 may refer to the function and calculate values ​​of multiple control parameters corresponding to the unit required evaporation amount.

[0097] Note that the process of S205 using the correlation curve does not necessarily have to be performed. For example, one or more control parameters may be predetermined in association with the target aroma component A. The control parameters may be values ​​that are experimentally calculated in advance and are desirable for the evaporation of the target aroma component A.

[0098] Next, the control device 41 operates the evaporation system 1 with the control parameters acquired in S205 (S206, evaporation step). That is, the control device 41 drives the vacuum pump 31, the heater 32, the stirring motor 14b, the raw material supply pump 34, the raw material return pump 35, and the carrier gas pump 33. In addition, the control device 41 drives the devices related to the control parameters acquired in S205 according to the control parameters. Since the control device 41 drives the pumps 34 and 35, the raw material in the raw material tank 51 is repeatedly supplied to the cylinder 11, and the raw material circulates between the evaporator 10 and the raw material tank 51. Then, the target aroma component A evaporates from the raw material, and the amount of the target aroma component A contained in the raw material is reduced. This changes the balance of the aroma components emitted by the raw material.

[0099] Next, the control device 41 calculates the difference (evaporation amount difference) between the actual evaporation amount from the raw material passing through the cylinder 11 and the unit required evaporation amount calculated in S205 for the target aroma component A (S207). The actual evaporation amount may be calculated, for example, based on the concentration of the target aroma component A obtained from the output of the gas component measuring instrument 21 and the gas flow rate obtained from the output of the gas flow meter 22. When the actual evaporation amount is the evaporation amount from a unit amount of raw material, the actual evaporation amount may be calculated based on the concentration, the gas flow rate, and the supply rate of the raw material obtained from the output of the raw material flow meter 26.

[0100] Next, the control device 41 adjusts the operating conditions (control parameters) of the evaporation system 1 based on the evaporation amount difference calculated in S207 (S208, adjustment step). Specifically, the control device 41 changes the value of the control parameter calculated in S205 by an amount corresponding to the evaporation amount difference. For example, when the control parameter is the pressure in the cylinder 11 and the actual evaporation amount does not reach the unit required evaporation amount, the vacuum pump 31 is driven so that the pressure in the cylinder 11 is reduced by an amount corresponding to the evaporation amount difference.

[0101] Next, the control device 41 integrates the amount of the target aroma component A evaporated in the evaporation process, calculates the integrated amount as the total actual evaporation amount (S209), and judges whether the total actual evaporation amount calculated in S209 has reached the total required evaporation amount calculated in S204 (S210). If the total actual evaporation amount has not yet reached the total required evaporation amount, the process returns to S206 and executes the subsequent processes. By repeating the processes of S206, S209, and S210, the raw material in the raw material tank 51 is repeatedly supplied to the evaporator 10, and the concentration of the target aroma component A in the raw material gradually decreases. In addition, the control parameters are adjusted by S207 and S208 so that the actual evaporation amount approaches the expected evaporation amount (unit required evaporation amount).

[0102] When the total actual evaporation amount reaches the total required evaporation amount in S211, the control device 41 stops the operation of the evaporation system 1, measures the concentration of the target aroma component A emitted from the raw material that has been subjected to the evaporation process, and determines whether the concentration is within a reference range (S211). The process of S211 may be the same as S108 in FIG. 3.

[0103] In S211, if the concentration of the target aroma component A emitted by the raw material after the evaporation process falls within the reference range, the control device 41 ends the current evaporation process. On the other hand, if the concentration of the target aroma component A is not within the reference range in the judgment of S211, the raw material processed in this operation may not be suitable for the product, and the control device 41 notifies the operator of this fact (S212). This notification may be, for example, by displaying a predefined warning on the display device 43.

[0104] The manufacturing method shown in Figure 4 makes it possible to manufacture a product that emits aroma component A at a concentration close to the target concentration. For example, when the aroma of aroma component A is strong, by using this manufacturing method, it is possible to realize the desired aroma without adding flavorings, etc. In addition, the time required to complete the evaporation process can be controlled by adjusting the control parameters according to the planned processing volume of the raw material, for example.

[0105] [Third example of manufacturing method] Many products that emit aromas, such as food ingredients, contain multiple aroma components. Therefore, when one aroma component is evaporated, other aroma components may also evaporate, although the amount may vary. For example, when evaporating evaporating system 1 at a certain pressure and temperature to evaporate aroma component A, aroma components B and C may also evaporate, although in small amounts, and as a result, the concentrations of aroma components B and C emitted from the raw material may be lower than desired. In other words, it may not be appropriate to determine the operating conditions (control parameters) of evaporating system 1 by focusing only on the required evaporation amount of aroma component A.

[0106] Therefore, a plurality of control parameters may be calculated so that the plurality of aroma components evaporate in a good balance. In this case, a machine learning model may be used that inputs the required evaporation amounts of the plurality of aroma components and outputs the values ​​of the plurality of control parameters. Hereinafter, this machine learning model is referred to as a "control parameter calculation model."

[0107] Fig. 6 is a conceptual diagram showing an example of such a control parameter calculation model. A regression model such as a neural network can be used as the control parameter calculation model. Fig. 6 shows a neural network as an example. The values ​​of the input layer are, for example, the evaporation amounts (total required evaporation amount) of the aroma components A to H evaporated in the evaporation system 1, and the values ​​of the output layer are, for example, the values ​​of the control parameters 1 to 5 described above.

[0108] The control parameter calculation model is generated using data including a set of the evaporation amounts of multiple aroma components and the values ​​of multiple control parameters as teacher data. That is, the evaporation system 1 is operated under certain operating conditions (control parameters), and the evaporation amounts of each of the multiple aroma components obtained thereby are measured. Then, the operating conditions (control parameters) are slightly changed, and the evaporation system 1 is operated, and the evaporation amounts of each of the multiple aroma components obtained thereby are measured. This operation is repeated multiple times. The control parameters obtained in this manner and the measured evaporation amounts of each aroma component are used as teacher data. As the learning progresses, a machine learning model is generated that reflects the degree of relationship between the control parameters and the evaporation amounts of each aroma component. The evaporation amount of each aroma component is obtained by multiplying the information (aroma component concentration) obtained from the gas component measuring device 21 by the gas flow rate obtained from the output of the gas flow meter 22. Such machine learning may be executed by the control device 41.

[0109] Fig. 7 is a flow diagram showing an example of a manufacturing method when such a control parameter calculation model is used. Here, an example will be described in which the contents of multiple aroma components A to H are reduced and the aroma balance is adjusted. The following will mainly explain the differences from the method referred to in Fig. 3. Items not explained may be the same as the example in Fig. 3.

[0110] First, the control device 41 measures the concentrations of multiple target aroma components A-H emitted from the raw material stored in the raw material tank 51 (S301). This measurement is performed, similar to S101, for example, in a state where the stirring blade 14a is not rotating (a state where the evaporation system 1 is not operating), based on information obtained from the gas component measuring instrument 21. The concentration measurement in S301 may be performed before the raw material is placed in the raw material tank 51.

[0111] Next, the control device 41 calculates the difference (concentration difference) between the target concentration for the multiple target aroma components A-H and the concentration measured in S301 (S302). The target concentration here is, for example, the concentration of the target aroma components A-H emitted by a product having a desirable aroma balance. The control device 41 calculates the concentration difference for each of the multiple target aroma components A-H. Next, the control device 41 calculates the required evaporation amount from a unit amount of raw material (unit required evaporation amount) for each of the multiple target aroma components A-H based on the concentration difference calculated in S302 (S303).

[0112] Next, the control device 41 calculates the amount of aroma components that need to be evaporated from the planned processing amount of the raw material (total required evaporation amount) for each of the target aroma components A-H based on the planned processing amount of the raw material and the unit required evaporation amount calculated in S303 (S304, calculation step). Specifically, the control device 41 may calculate the total required evaporation amount by multiplying the unit required evaporation amount of each of the target aroma components A-H by the planned processing amount.

[0113] Next, the control device 41 inputs the total required evaporation amount of each of the target aroma components A to H into the control parameter calculation model to obtain values ​​of the control parameters 1 to 5 (S305).Then, the evaporation system 1 is operated with the values ​​obtained in S305 (S306, evaporation step).

[0114] Next, the control device 41 integrates the amount of evaporation in the evaporation process for each of the target aroma components A to H, and calculates the integrated amount as the total actual evaporation amount (S307). For example, for the target aroma component A, the control device 41 calculates the actual evaporation amount based on the concentration of the target aroma component A obtained from the output of the gas component measuring instrument 21 and the gas flow rate obtained from the output of the gas flow meter 22. The control device 41 integrates the evaporation amounts calculated in this manner during the evaporation process, and the integrated amount is the total actual evaporation amount. The control device 41 performs similar processing for the other target aroma components B to H, and calculates the total actual evaporation amount for each of the target aroma components A to H.

[0115] Next, the control device 41 determines whether the total actual evaporation amount calculated in S307 has reached the total required evaporation amount calculated in S304 (S308). Here, the control device 41 may determine, for example, whether the total actual evaporation amount of some (one or more) of the multiple target aroma components A-H has reached the total required evaporation amount, or whether the total actual evaporation amount of all of the target aroma components A-H has reached the total required evaporation amount.

[0116] If the total actual evaporation amount has not yet reached the total required evaporation amount in S308, the process returns to S306 and executes the subsequent processes. By repeating the processes of S306, S307, and S308, the raw material in the raw material tank 51 is repeatedly supplied to the evaporator 10, and the concentrations of the multiple target aroma components A to H in the raw material are adjusted to a good balance.

[0117] When the total actual evaporation amount reaches the total required evaporation amount in S308, the control device 41 stops the operation of the evaporation system 1, and then measures the concentration of each of the target aroma components A to H emitted by the raw material that has been subjected to the evaporation process, and judges whether the concentration is within a reference range (S309). As with S301, the concentration measurement in S309 may be performed in an environment similar to the environment in which the raw material to be processed is consumed by consumers. The concentration measurement in S309 may be performed by the gas component measuring instrument 21, or may be performed by a dedicated gas component measuring instrument that measures aroma components emitted by the raw material after the evaporation process.

[0118] In S309, if the concentrations of the target aroma components A-H emitted from the raw material after the evaporation process are within the reference range, for example, if the difference between the concentration of each of the target aroma components A-H and the target concentration is equal to or less than the threshold, the control device 41 ends the current evaporation process. On the other hand, if the determination in S309 is that the concentration of any of the target aroma components A-H is not within the reference range, the raw material processed in this operation may not be suitable for the product, and the control device 41 notifies the operator of this fact (S310). This notification may be, for example, by displaying a predefined warning on the display device 43.

[0119] The manufacturing method using the machine learning model is not limited to the one exemplified in FIG. 7. For example, while the evaporation system 1 is operating, the control device 41 may monitor the actual evaporation amount of the target aroma components A-H per unit time, or the actual evaporation amount of the target aroma components A-H from a unit amount of raw material. If the actual evaporation amount is outside the reference range, the operating conditions may be inappropriate. Therefore, the control device 41 may, for example, stop the operation of the evaporation system 1 and notify the operator of this fact. This notification may also be displayed by displaying a predefined warning on the display device 43.

[0120] Also, in the manufacturing method using a machine learning model, the operating conditions (control parameters) of the evaporation system 1 may be adjusted in the process of circulating the raw material between the raw material tank 51 and the evaporator 10, as in the method described with reference to FIG. 4.

[0121] For example, the control device 41 may monitor the actual evaporation amount per unit time (actual evaporation amount per unit) and the actual evaporation amount from a unit amount of raw material (actual evaporation amount per unit) for each of the multiple target aroma components A to H, and if the actual evaporation amount per unit is outside the reference range, adjust the operating conditions so that the actual evaporation amount per unit is changed toward the reference range. For example, if the evaporation amount per unit of the target aroma component A is outside the reference range and the control parameter related to the target aroma component A (for example, the main control parameter that affects the evaporation amount of the target aroma component A) is the pressure in the cylinder 11, the control device 41 may drive the vacuum pump 31 to reduce the pressure.

[0122] The control method proposed in this disclosure includes a calculation step (S104, S204, S304) for calculating a total required evaporation amount of aroma components in the raw material from a planned processing amount of the raw material, an evaporation step (S105, S206, S306) for supplying the raw material to an evaporation system and evaporating a part of the aroma components from the raw material, and an integration step (S106, S209, S307) for accumulating the amount of aroma components evaporated in the evaporation step and calculating the integrated amount as a total actual evaporation amount. The evaporation step is repeated until the total actual evaporation amount reaches the total required evaporation amount.

[0123] It should be noted that the manufacturing method proposed in the present disclosure is not limited to the examples described with reference to the drawings and the like.

[0124] For example, in the manufacturing methods described with reference to Figures 3, 4, and 7, each procedure is executed by the control device 41. However, some of the procedures shown in these figures may be executed by an operator.

[0125] [Fourth example of manufacturing method] According to a preferred embodiment of the present disclosure, in the evaporation system for evaporating aroma components from food ingredients, the aroma components to be measured are preferably selected and distinguished using the level of variation in the amount of evaporation according to the degree of vacuum and temperature as an index. Such aroma components can be advantageously used to check changes in aroma balance and adjust the aroma balance of a product.

[0126] The level of variation in the amount of evaporation according to the degree of vacuum and temperature varies depending on the food ingredient, and may be selected for each food ingredient. For example, in a food containing cacao, a heat treatment at about 45°C can be used to preferentially evaporate aroma components with a relatively high vapor pressure, and a vacuum treatment at a degree of vacuum of about -0.08 MPa can be used to evaporate aroma components with a low vapor pressure and a tendency towards lipophilicity, which are relatively difficult to evaporate.

[0127] According to a preferred embodiment of the present disclosure, it is preferable to classify the aroma components emitted by the raw material into a plurality of groups based on the vapor pressure (20-25°C) and the octanol / water partition coefficient (logKow), and to determine the control parameters of the evaporation system for each of the groups. The term "vapor pressure" refers to the pressure of the vapor when the liquid and the vapor are in vapor-liquid equilibrium. The term "octanol / water partition coefficient (logKow)" refers to the logarithmic ratio of the concentration of a chemical substance when it is placed in two liquid layers, octanol, which is non-polar, and water, which is polar, and how much of the chemical substance dissolves in each liquid. The above information on aroma components can be obtained, for example, from PubChem. Determining the control parameters of the evaporation system for each of the groups as in the method of the present disclosure is advantageous in adjusting the operating conditions of the evaporation system so that the aroma balance of the food is within a predetermined range.

[0128] For example, it is said that there are as many as 300 kinds of aroma components contained in cacao. However, according to one embodiment of the present disclosure, 14 aroma components may be selected. The aroma is not proportional to the amount of the component, and a new aroma is only sensed when multiple components are present as a complex odor, and there are components that have a sensory threshold for each component and have a strong aroma intensity even in small amounts. Therefore, in general, aroma research often targets trace amounts of aroma components. However, there are many analytical issues with trace amounts of aroma components, such as large detection errors in GC-MS analysis and overlapping detection peaks when components with similar molecular structures are detected simultaneously, making accurate detection difficult. Therefore, GC-MS, which is the most reliable analytical method for aroma components, is plagued with the problem of not being able to accurately grasp the amount of the components. For this reason, it has been difficult and difficult to pattern the volatilization behavior of aroma components in the past.

[0129] Under such technical circumstances, according to the present disclosure, by deliberately eliminating aroma components that become noise (components that are difficult to analyze, such as those that are present in trace amounts or have overlapping peaks) and performing cluster analysis on components that are stably detectable, the aroma components can be classified into multiple groups based on their vapor pressure and octanol / water partition coefficient (logKow), and the control parameters of the evaporation system can be determined for each of the multiple groups, making it possible to control the aroma, as has been made clear through experiments by the present disclosure, which will be described later. The vapor pressure used in classifying the aroma components into a plurality of groups is, for example, that at 20 to 30°C, preferably 20 to 25°C, and more preferably 25°C.

[0130] The number of groups of multiple aroma components based on the vapor pressure and octanol / water partition coefficient is not particularly limited and can be appropriately determined depending on the type and properties of the product. For example, it is preferable to adjust the number of groups to 6 to 14, preferably 4 to 5, and more preferably 2 to 3.

[0131] According to a more specific embodiment of the present disclosure, the plurality of groups each independently satisfy any one of the following (A1) to (D1): (A1) Vapor pressure range: 11.3 to 173 mmHg, and octanol / water partition coefficient range: -1.3 to 1.8; (B1) Vapor pressure range: 1.6 to 9.78 mmHg, and octanol / water partition coefficient range: 1.2 to 3.4; (C1) Vapor pressure range: 1.5 to 3.3 mmHg, and octanol / water partition coefficient range: -0.7 to 0.8 (D1) Vapor pressure range: -0.9 to 3.1 mmHg, and octanol / water partition coefficient range: 0.0 to 0.6.

[0132] According to one embodiment of the present disclosure, the vapor pressure range of (A1) is preferably 11.3 to 300 mmHg, more preferably 11.3 to 173 mmHg. According to one embodiment of the present disclosure, the octanol / water partition coefficient range of (A1) is preferably −2.0 to 8.20 mmHg, more preferably −1.3 to 1.80 mmHg.

[0133] According to one embodiment of the present disclosure, the vapor pressure range of (B1) is preferably 1.5 to 300 mmHg, more preferably 1.6 to 9.78 mmHg. According to one embodiment of the present disclosure, the octanol / water partition coefficient range of (A1) is preferably 1.2 to 8.2 mmHg, more preferably 1.2 to 3.4 mmHg.

[0134] According to one embodiment of the present disclosure, the vapor pressure range of (C1) is preferably 1.5 to 300 mmHg, more preferably 1.5 to 3.3 mmHg. According to one embodiment of the present disclosure, the octanol / water partition coefficient range of (A1) is preferably −2.0 to 1.2 mmHg, more preferably −0.7 to 0.8 mmHg.

[0135] According to one embodiment of the present disclosure, in (D1), the vapor pressure range is preferably −2.0 to 5.0 mmHg, more preferably −0.9 to 3.1 mmHg. According to one embodiment of the present disclosure, in (A1), the octanol / water partition coefficient range is preferably 0.0 to 8.2 mmHg, more preferably 0.0 to 0.6 mmHg.

[0136] According to one embodiment of the present disclosure, each of the plurality of groups independently includes any one of compound groups selected from the following (A2) to (D2): (A2) a compound group including 2 to 494 compounds selected from 2-methylpropanal, ethyl acetate, butan-2-one, ethanol, butane-2,3-dione, pentanal, 3-methylbutanal, 2-methylbutanal, formic acid, pentan-2-one, (methyldisulfanyl)methane, acetic acid, and hexanal; (B2) a compound group including 2 to 494 compounds selected from 1-methyl-4-prop-1-en-2-ylcyclohexene, nonanal, nonan-2-one, heptan-2-ol, 3-methylbutyl acetate, pentan-2-yl acetate, pentan-1-ol, benzaldehyde, pentan-2-ol, and 3-methyl-1-butanol; (C2) a compound group including 2 to 494 compounds selected from 2-methylpropanoic acid, butanoic acid, 2-ethylpyrazine, 2,5-dimethylpyrazine, 2,3-dimethylpyrazine, furan-2-carbaldehyde, propanoic acid, 3-hydroxybutan-2-one, and 1-hydroxypropan-2-one; (D2) A compound group including 2 to 494 compounds selected from furan-2-ylmethanol, oxolan-2-one, 3-methylbutanoic acid, 2-phenylacetaldehyde, 3,7-dimethylocta-1,6-dien-3-ol, 2-ethylhexan-1-ol, 2-methoxyphenol, phenylmethanol, 2-phenylethanol, hexanoic acid, and acetamide.

[0137] Moreover, according to one embodiment of the present disclosure, (A2) is a compound group containing preferably 2 to 20 compounds, more preferably 21 to 100 compounds, and even more preferably 101 to 494 compounds, among the above compounds.

[0138] Moreover, according to one embodiment of the present disclosure, (B2) is a compound group including preferably 2 to 20 compounds, more preferably 21 to 100 compounds, and even more preferably 101 to 494 compounds, among the above compounds.

[0139] Moreover, according to one embodiment of the present disclosure, (C2) is a compound group including preferably 2 to 20 compounds, more preferably 21 to 100 compounds, and even more preferably 101 to 494 compounds, among the above compounds.

[0140] Moreover, according to one embodiment of the present disclosure, (D2) is a compound group including preferably 2 to 20 compounds, more preferably 21 to 100 compounds, and even more preferably 101 to 494 compounds, among the above compounds.

[0141] Moreover, according to one embodiment of the present disclosure, by controlling the evaporation conditions of the compounds for each of the compound groups by referring to the correlation between the flavor components and the aroma characteristics, it is possible to appropriately determine the evaporation conditions according to the desired flavor to be imparted to the product.

[0142] In a preferred embodiment of the present invention, the evaporation system used in the method for producing an aroma-emitting food is a thin film volatilizer as described above. The operating conditions of the evaporation system, such as the processing temperature and degree of vacuum, are not particularly limited and may be appropriately adjusted according to the type and properties of the food, depending on the results of the aroma component analysis, but in the case of a food containing cacao, the processing vacuum degree in the evaporation system is, for example, 0 to 200°C, preferably 30 to 90°C, and preferably 45°C to 80°C. The processing vacuum degree in the evaporation system is, for example, -0.10 to 0 MPa, preferably -0.09 to 0 MPa, and more preferably -0.08 to 0 MPa. EXAMPLES

[0143] The present disclosure will be described below with reference to examples, but is not limited to these examples. The measurement methods and units in the present disclosure are in accordance with the provisions of the Japanese Industrial Standards (JIS) unless otherwise specified.

[0144] Test Example 1 Using the thin-film volatilization apparatus shown in Figure 2 and chocolate dough as a test sample, the volatilization effect for each operating parameter was confirmed by GC-MS. The volatilization pattern of aroma components was numerically understood through statistical processing, and a technology for controlling the volatilization of the target aroma was investigated according to the following method.

[0145] Chocolate dough production The entire amount of chocolate raw materials (60% by weight of cacao mass, 29.6% by weight of sugar, 10.0% by weight of cocoa butter, 0.3% by weight of lecithin, 0.1% by weight of emulsifier) ​​was put into a closed grinder (ball mill), and the mixed raw materials were ground until the particle diameter D90 was 30 μm or less to obtain a chocolate dough. The cacao mass was obtained by grinding cacao nibs derived from Brazilian cacao beans in a closed environment to obtain a chocolate dough, which was then applied to a thin film volatilization device. The particle size was measured on a volume basis using a laser diffraction particle size distribution measuring device (Shimadzu Corporation, SAL-2200).

[0146] The operating parameters of the thin film volatilization device were varied, including the agitator rotation speed, jacket temperature, degree of vacuum, air flow rate, and dough flow rate, and the changes in the aroma components of the resulting chocolate dough were measured using a GC-MS (Agilent Technologies).

[0147] The results are shown in Figure 8, and it was found that vacuum operation (degree of vacuum) and heating operation (jacket temperature) were effective in changing the aroma balance. This suggests that the characteristics of aroma components that are easily volatilized and those that are not easily volatilized can be classified depending on the operation parameters.

[0148] Next, because the aroma balance changes significantly depending on the operational parameters, particularly the degree of vacuum and jacket temperature, a hierarchical cluster analysis (Ward method) was performed to analyze the change in aroma over time when the degree of vacuum and jacket temperature were changed.

[0149] The results are shown in Figure 9A, and it was found that the evaporation patterns of the aroma groups were classified into four clusters (groups): (part of A2), (part of B2), (part of C2), and (part of D2).

[0150] The components shown in Table 1 were selected for the cluster analysis. In preliminary experiments, statistical processing such as cluster analysis was performed on all aroma components, but when components with unstable GCMS values ​​were included, analytical noise occurred, making correct cluster analysis impossible. Therefore, by narrowing down the targets to components with stable GCMS values ​​shown in Table 1, it was found that they could be classified into four clusters.

[0151] [Table 1]

[0152] Additionally, using the software JMP, we investigated which of the characteristic values ​​of each component, such as "vapor pressure," "octanol / water partition coefficient (logKow)," "molecular weight," "number of OH groups," "number of H groups," "number of carbon chains," "boiling point," "melting point," "solubility," "density," "surface tension," and "viscosity," which are molecular characteristics of aroma components, are important in aroma. Note that in the following experiments, "vapor pressure" was examined at 25°C, and it was confirmed that similar results were obtained at temperatures between 20 and 25°C.

[0153] The results are shown in Figure 9B. When the aroma components were distributed on the two axes of "vapor pressure" and "octanol / water partition coefficient (logKow)", the above four volatilization pattern clusters were separated, indicating that these two axes are important for aroma volatilization.

[0154] The specific information on the "vapor pressure" and "octanol / water partition coefficient (logKow)" of the above four volatility pattern clusters (groups) is shown in Table 4 below.

[0155] [Table 2]

[0156] The volatilization phenomenon found in industrial machine operations is, in principle, the same as the expression of aroma in the mouth. Therefore, it is believed that the aroma balance created by industrial machine operations directly leads to the adjustment of aroma expression in the mouth. In addition, each aroma component and its descriptor (aroma characteristics) can be associated with publicly available information and a complete table. Therefore, from the above experiment, the graph in Figure 9B, in which the cacao aroma components are plotted on the two axes of "vapor pressure" and "octanol / water partition coefficient," can be used as reference information for the aroma component volatilization phenomenon in industrial and sensory evaluation, and the evaporation of multiple aroma components can be controlled by machine operations to obtain the final product.

[0157] Test Example 2 One of the undesirable aromas of cacao is "solvent." The causative agent is 3-methylbutyl acetate, and when this aroma component is reduced to a certain level, it is perceived as a desirable "fruity" aroma. Therefore, it is necessary to adjust the amount of excess 3-methylbutyl acetate. In Test Example 1, the analysis diagram in Figure 10B revealed that 3-methylbutyl acetate has the characteristic of being easily volatile at 80°C.

[0158] Therefore, 3-methylbutyl acetate was controlled by processing the chocolate under controlled operating conditions in a device with a jacket temperature of 80°C in accordance with Test Example 1, and a sensory evaluation of the chocolate was carried out. The sensory evaluation was carried out by a panel of 13 experts who were selected after passing flavor evaluation tests for cacao foods held several times a year. Peruvian cacao beans were used as the raw material for the chocolate to be evaluated. The evaluation items were eight flavors (acidity, fruity, solvent, cacao, roast, floral, astringency, preference level) that were commented on in the free comments section of a preliminary flavor survey of Peruvian cacao beans.

[0159] Figure 10 shows the results of the sensory evaluation of the samples obtained by the evaporation process. The "solvent," which is generally considered a negative aroma in chocolate, was selectively reduced. The results of the above test showed that it is possible to adjust the balance of specific flavors.

[0160] Test Example 3 From the above test results, it is considered that it is possible to achieve a different aroma balance even from the same chocolate dough by combining the jacket temperature and the degree of vacuum, and by removing (subtracting) aroma components with a masking effect without using flavorings (addition), and by controlling the operating conditions of the device with reference to the aroma component volatilization pattern shown in Figure 9B. Therefore, to see if it is possible to express multiple flavors with different characteristics from one chocolate dough, the operating conditions were changed with reference to the aroma component volatilization pattern shown in Figure 9B, and four test samples were produced and subjected to sensory evaluation. The sensory evaluation was performed by a panel of 13 experts selected after passing flavor evaluation tests for cacao foods several times a year. In addition, cacao beans from the Dominican Republic were used as the chocolate raw material to be evaluated. In addition, four flavors were selected as evaluation items based on comments made in the free comments section of a preliminary flavor survey of Dominican cocoa beans (dried fruits such as raisins, prunes, and apricots; red berries such as cherries, raspberries, grapes, and blackcurrants; citrus fruits such as oranges and lemons; and others such as apples, oranges, bananas, pineapples, plums, and fresh apricots).

[0161] Figure 11 shows a graph of the sensory evaluation results of the samples obtained by the evaporation process. Figure 12 shows that multiple flavors with different characteristics can be expressed from the same dough, demonstrating that it is possible to bring out the desirable aroma of the ingredients by removing (subtracting) aroma components that have a masking effect, without using flavorings (adding).

[0162] Test Example 4 In addition, using the same samples as in Test Example 3, the operating conditions of the device were controlled and TDS (Temporal Dominance of Sensations, J-SEMS, Sensory Evaluation System) was performed. The TDS method is a technique that can capture the changes in multiple sensory characteristics over time in a single evaluation, and is used mainly in the fragrance and food industries as a flavor design tool that introduces a time axis. In this experiment, participants tasted the samples and answered over time about the "taste" and "flavor" that they found most impressive, and the results of N=14 (people) were statistically processed and visualized as a curve.

[0163] The results are shown in Figures 12A and 12B. Figures 12A and 12B show the changes over time before and after the evaporation treatment in the impressive items (nature, fermentation (fermented aroma), acidity, fruity, solvent, cacao, roast, floral, astringency, and bitterness).

[0164] It has been shown that chocolate with a quality that gives a "solvent" top note before evaporation can be adjusted to a quality that gives a "fermentation" top note and "acidity" and "fruity" middle notes. In other words, it is possible to visually see the phenomenon that the components with high vapor pressure contain "solvent," and when this is removed, the next highest vapor pressure notes, "fermentation," "acidity," and "fruity," are felt. From these results, it has been possible to establish a method for creating a vaporization pattern of aroma components by controlling the operating conditions of the evaporation device using a new index that can estimate the vaporization pattern by vapor pressure and the processing vacuum in the evaporation system, and to achieve the desired aroma balance without adding flavorings as in the past. [Explanation of symbols]

[0165] 1: Aroma component evaporation system (evaporation system) 10: Evaporator 11: Cylinder 11d: Raw material receiving section 11e: Gas supply port 11f: Gas exhaust port 12a: Raw material supply port 13: Jacket 13a: Heat transfer medium passage 14a: Stirring blade 14b: Stirring motor 21: Gas component measuring instrument 22: Gas flow meter 23: Pressure gauge 24: Stirring speed meter 25: Thermometer 26: Raw material flow meter 31: Vacuum pump 32: Heater 33: Carrier gas pump 34: Raw material supply pump 35: Raw material return pump 41: Control device 42: Input device 43:Display device 51·52: Raw material tank 55a·55b: Switching valve

Claims

1. A calculation step of calculating a required evaporation amount of aroma components in the raw material from a planned processing amount of the raw material; an evaporation step of supplying the raw material to an evaporation system and evaporating a portion of the aroma components from the raw material; an integrating step of integrating the amount of the aroma component evaporated in the evaporation step and calculating the integrated amount as an actual evaporation amount; Including, The evaporation step is repeatedly performed on the raw material until the actual evaporation amount reaches the required evaporation amount. A method for producing a product that emits fragrance.

2. In the integrating step, an actual evaporation amount of the aroma component is calculated based on a flow rate of the gas flowing through the evaporation system in the evaporation step and a concentration of the aroma component in the gas.

2. The method of claim 1.

3. The evaporation step is carried out under reduced pressure.

2. The method of claim 1.

4. The raw material is heated in the evaporation step.

2. The method of claim 1.

5. In the calculation step, the required evaporation amount is calculated for each of the aroma components, In the integrating step, the actual evaporation amount is integrated for each of the aroma components.

2. The method of claim 1.

6. The method further includes the step of measuring the aroma components evaporated in the evaporation step and adjusting control parameters of the evaporation system based on the measurement results.

2. The method of claim 1.

7. A step of inputting the required evaporation amount of the aroma component into a machine learning model generated using the evaporation amount of the aroma component emitted from the raw material and the control parameters of the evaporation system as training data, and calculating the control parameters of the evaporation system to be used in the evaporation step as an output from the machine learning model.

2. The method of claim 1.

8. The method according to claim 1 , wherein the aroma components are preselected using as an index a level of variation in the amount of evaporation depending on the degree of vacuum and temperature in the evaporation system.

9. 2. The method of claim 1, further comprising a step of classifying aroma components emitted by the raw material into a plurality of groups based on vapor pressure and octanol / water partition coefficient, and determining control parameters of the evaporation system for each of the plurality of groups.

10. The method according to claim 9 , wherein the plurality of groups each independently satisfy any one of the following (A1) to (D1): (A1) a vapor pressure range of 11.3 to 173 mmHg and an octanol / water partition coefficient range of -1.3 to 1.8; (B1) a vapor pressure range of 1.6 to 9.78 mmHg and an octanol / water partition coefficient range of 1.2 to 3.4; (C1) Vapor pressure range: 1.5 to 3.3 mmHg, and octanol / water partition coefficient range: -0.7 to 0.8 (D1) Vapor pressure range: -0.9 to 3.1 mmHg, and octanol / water partition coefficient range: 0.0 to 0.

6.

11. The method according to claim 9, wherein the plurality of groups each independently includes any one of compound groups selected from the following (A2) to (D2): (A2) a compound group including at least one compound selected from 2-methylpropanal, ethyl acetate, butan-2-one, ethanol, butane-2,3-dione, pentanal, 3-methylbutanal, 2-methylbutanal, formic acid, pentan-2-one, (methyldisphanyl)methane, acetic acid, and hexanal; (B2) a compound group including at least one compound selected from 1-methyl-4-prop-1-en-2-ylcyclohexene, nonanal, nonan-2-one, heptan-2-ol, 3-methylbutyl acetate, pentan-2-yl acetate, pentan-1-ol, benzaldehyde, pentan-2-ol, and 3-methyl-1-butanol; (C2) a compound group containing at least one compound selected from 2-methylpropanoic acid, butanoic acid, 2-ethylpyrazine, 2,5-dimethylpyrazine, 2,3-dimethylpyrazine, furan-2-carbaldehyde, propanoic acid, 3-hydroxybutan-2-one, and 1-hydroxypropan-2-one; (D2) A compound group containing at least one compound selected from furan-2-ylmethanol, oxolan-2-one, 3-methylbutanoic acid, 2-phenylacetaldehyde, 3,7-dimethylocta-1,6-dien-3-ol, 2-ethylhexan-1-ol, 2-methoxyphenol, phenylmethanol, 2-phenylethanol, hexanoic acid, and acetamide.

12. The method of claim 1 , wherein the evaporation system is a thin film evaporator.

13. The method according to claim 1 , wherein the product is a food product or a cosmetic product.

14. The method according to claim 1, wherein the product is an oily food product.

15. 10. The method of claim 1, wherein the product comprises cocoa.

16. 2. The method of claim 1, wherein the product is chocolate.

17. The manufacturing method according to claim 1 , wherein the processing vacuum in the evaporation system is 0 to −0.08 MPa.

18. 2. The method of claim 1, wherein the processing temperature in the evaporation system is 45 to 80°C.

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