Film deposition apparatus and film deposition method

Abstract

To provide a film-forming apparatus capable of forming a thicker film thickness at at least one end in the width direction of a coated structure in which a film is applied to a substrate. [Solution] The film-forming apparatus of the embodiment comprises a conveying section and a discharge nozzle. The conveying roll is equipped with a conveying roll capable of supporting a substrate, and the conveying roll is equipped with a position adjustment roll that adjusts the position of the conveyed substrate so that the entire width of the substrate is within a specified range. The discharge nozzle has a discharge port located outside the width direction of the substrate relative to the specified range, and the discharge nozzle coats the surface of the substrate by discharging the raw material liquid from the discharge port toward the substrate being conveyed so that the entire width is within the specified range.

Description

Technical Field

[0001] Embodiments of the present invention relate to a film forming apparatus and a film forming method.

Background Art

[0002] In a film forming apparatus that forms a film on the surface of a substrate, a raw material liquid containing an organic material is applied to the surface of the substrate being conveyed in a conveying unit. Then, a film is formed by drying the raw material liquid applied to the substrate. When forming a film on a substrate as described above using a film forming apparatus, depending on the product to be manufactured, in a coated structure in which the substrate is coated with a film, it is required to form a thicker film thickness at at least one end in the width direction. For example, in the manufacture of a coil using a conductive wire, an insulating film serving as a film is formed on the wire serving as a substrate using a film forming apparatus to form a coated conductor in which the wire is coated with the insulating film. Then, a coil is formed by winding the coated conductor. In the coil formed as described above, from the viewpoint of appropriately preventing a short circuit between adjacent turns that are overlapped, in the coated conductor that is a coated structure, it is required to form a thicker film thickness of the insulating film at at least one end in the width direction.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] The problem to be solved by the present invention is to provide a film forming apparatus and a film forming method capable of forming a thicker film thickness at at least one end in the width direction in a coated structure in which a substrate is coated with a film.

Means for Solving the Problems

[0005] The film-forming apparatus of this embodiment includes a transport section and a discharge nozzle. The transport roll is equipped with a transport roll capable of supporting a substrate, and the transport roll is equipped with a position adjustment roll that adjusts the position of the transported substrate so that the entire width of the substrate is within a specified range. The discharge nozzle has a discharge port located outside the specified range in the width direction of the substrate, and the discharge nozzle coats the surface of the substrate by discharging the raw material liquid from the discharge port toward the substrate being transported so that the entire width is within the specified range. [Brief explanation of the drawing]

[0006] [Figure 1] Figure 1 is a schematic block diagram showing an example of a film deposition apparatus according to the first embodiment. [Figure 2] Figure 2 is a schematic cross-sectional view showing an example of a coated structure formed by a film deposition process in a film deposition apparatus in the first embodiment. [Figure 3] Figure 3 is a schematic cross-sectional view showing a portion of the covering structure 10 of an example shown in Figure 2, with some parts enlarged. [Figure 4] Figure 4 is a schematic perspective view showing an example of the configuration of the coating region and its vicinity in a film-forming apparatus according to the first embodiment, where the raw material liquid is applied to the substrate by the coating unit. [Figure 5] Figure 5 is a schematic cross-sectional view showing the coating area of ​​an example in Figure 4, in a cross-section perpendicular or nearly perpendicular to the conveying direction. [Figure 6] Figure 6 is a schematic cross-sectional view showing an example of a coating area in a first modification of the first embodiment in which the raw material liquid is applied to the substrate by the coating unit, in a cross-section perpendicular or substantially perpendicular to the conveying direction. [Figure 7] Figure 7 is a schematic cross-sectional view showing an example of a coating area in a second modification of the first embodiment, where the raw material liquid is applied to the substrate by the coating unit, in a cross-section perpendicular or substantially perpendicular to the conveying direction. [Figure 8] Figure 8 is a schematic cross-sectional view showing an example of a coating area in a third modification of the first embodiment, where the raw material liquid is applied to the substrate by the coating unit, in a cross-section perpendicular or substantially perpendicular to the conveying direction. [Figure 9] Figure 9 is a schematic perspective view showing an example of the configuration of the coating region and its vicinity in a film-forming apparatus according to the second embodiment, where the raw material liquid is applied to the substrate by the coating unit. [Figure 10] Figure 10 is a schematic cross-sectional view showing the coating area of ​​an example in Figure 9, in a cross-section perpendicular or nearly perpendicular to the conveying direction. [Figure 11] Figure 11 is a schematic cross-sectional view showing an example of a coating area in a modified example of the second embodiment, where the raw material liquid is applied to the substrate by the coating unit, in a cross-section perpendicular or substantially perpendicular to the conveying direction. [Modes for carrying out the invention]

[0007] The embodiments will be described below with reference to the drawings.

[0008] (First embodiment) First, as an example of an embodiment, a first embodiment will be described. Figure 1 is a schematic block diagram showing an example of a film-forming apparatus 1 according to the first embodiment. As shown in Figure 1, in this embodiment, the film-forming apparatus 1 comprises a transport unit 2, an unwinding unit 3, a winding unit 5, a coating unit 6, a drying unit 7, and a control unit 8. In the film-forming apparatus 1, the unwinding unit 3 is equipped with an unwinding reel (not shown), and by rotating the unwinding reel, the substrate wound on the unwinding reel is unwound to the transport unit 2. Then, a film-forming process is performed on the substrate being transported in the transport unit 2 using the coating unit 6 and the drying unit 7 to form a coating on the surface of the substrate. That is, a coated structure is formed by the film-forming process, in which the substrate is covered with a coating. In addition, in the film-forming apparatus 1, the winding unit 5 is equipped with a winding reel (not shown), and by rotating the winding reel, the coated structure is wound up. In one example, the base material is transported from the unwinding reel of the unwinding unit 3 to the winding reel of the winding unit 5 using a roll-to-roll method.

[0009] The control unit 8 controls the overall operation of the film deposition apparatus 1, including the transport of the substrate in the transport unit 2 and the film deposition process on the substrate performed by the coating unit 6 and the drying unit 7. The control unit 8 includes a processor or integrated circuit (control circuit) including a CPU (Central Processing Unit), ASIC (Application Specific Integrated Circuit), or FPGA (Field Programmable Gate Array), and a storage medium such as memory. The control unit 8 may have only one processor or may have multiple processors. The control unit 8 performs processing by executing programs stored in the storage medium. The control by the control unit 8 may be performed by the processor of a single computer or by multiple processors working together. Furthermore, at least a portion of the control by the control unit 8 may be performed by a server in a cloud environment.

[0010] In the film-forming process for creating a coating on a substrate, the coating unit 6 applies a raw material liquid containing organic material to the surface of the substrate being transported in the transport unit 2. The substrate coated with the raw material liquid is then transported by the transport unit 2 to the drying unit 7. The drying unit 7 then forms a coating by drying the raw material liquid applied to the substrate. The drying unit 7 dries the raw material liquid applied to the substrate by performing at least one of blowing air and heating. In the transport unit 2, the transport direction in which the substrate is transported, i.e., the direction toward the winding unit 5, is the downstream side. In the transport unit 2, the direction opposite to the transport direction, i.e., the direction toward the unwinding unit 3, is the upstream side. Therefore, the drying region in which the raw material liquid is dried by the drying unit 7 is located downstream of the coating region in which the raw material liquid is applied to the substrate by the coating unit 6.

[0011] In one example, an inspection is performed between the drying section 7 and the winding section 5 on either the conveyed substrate 11 or the coating 12 formed on the substrate 11. In this case, for example, an inspection is performed on the thickness of the formed coating 12. In another example, an accumulator is provided between the drying section 7 and the winding section 5. In this case, the accumulator adjusts the tension acting on the conveyed substrate 11, suppressing the occurrence of sagging in the substrate 11.

[0012] Figure 2 is a schematic cross-sectional view showing an example of a coated structure 10 formed by a film deposition process in a film deposition apparatus 1 in the first embodiment. In the example in Figure 2, an electrically conductive conductor is used as the base material 11, for example, a conductive wire such as a conductor is used as the base material 11. Then, by the film deposition process, an electrically insulating insulating film is formed as a coating 12 on the surface of the base material 11. Therefore, a coated conductor, in which an insulating film is coated on an electric conductor, is formed as the coated structure 10. The base material 11 and the coated structure 10 are defined in a longitudinal direction, a width direction that intersects (orthogonal or approximately orthogonal to) the longitudinal direction (directions shown by arrows W1 and W2 in Figure 2), and a thickness direction that intersects (orthogonal or approximately orthogonal to) both the longitudinal and width directions (directions shown by arrows D1 and D2 in Figure 2). In Figure 2, the base material 11 and the coated structure 10 are shown in a cross-section that is orthogonal or approximately orthogonal to the longitudinal direction.

[0013] In the base material 11 and the coating structure 10, the dimensions along the longitudinal direction are larger than the dimensions along the width direction, and the dimensions along the width direction are larger than the dimensions along the thickness direction. The base material 11 has a pair of main surfaces 15 and 16. Main surface 15 faces one side in the thickness direction (arrow D1 side), and main surface 16 faces the opposite side in the thickness direction from the side that main surface 15 faces. In the example in Figure 2, the coating 12 is applied to both main surfaces 15 and 16 of the base material 11. The base material 11 also has a pair of edge surfaces 17 and 18, each of which extends from main surface 15 to main surface 16 along the thickness direction of the base material 11. In the base material 11, edge surface 17 forms the edge on one side in the width direction (arrow W1 side), and edge surface 18 forms the edge on the opposite side of edge surface 17 in the width direction. In the example shown in Figure 2, the coating 12 is applied to both the edge surfaces 17 and 18 of the substrate 11.

[0014] In one example, a superconductor such as a superconducting wire is used as the base material 11, and an insulating film is formed as a coating 12 on the surface of the base material 11, including the main surfaces 15, 16, etc. Then, a coated superconductor such as a coated superconducting wire is formed as the coated structure 10. When a superconductor is used as the base material 11, the base material 11 contains, for example, one of the following as the superconducting material: a niobium-titanium alloy system, a niobium-tin compound system, a niobium-aluminum compound system, a magnesium diboride system, a bismuth oxide system, or a yttrium oxide system. When a coated superconducting wire is formed as the coated structure 10, for example, a superconducting wire with dimensions of 3 mm or more and 20 mm or less along the width direction is used as the base material 11.

[0015] FIG. 3 is a cross-sectional view schematically showing a partially enlarged coating structure 10 of an example in FIG. 2. In FIG. 3, in the base material 11, a corner portion between the main surface 15 and the edge surface 17, and the vicinity thereof are shown. Also in FIG. 3, as in FIG. 2, the base material 11 and the coating structure 10 are shown in a cross-section orthogonal or substantially orthogonal to the longitudinal direction. In an example of FIG. 3, the coating 12 which is an insulating film includes resin masses 21, and the coating 12 is formed from an aggregate of resin masses 21 in which a plurality of resin masses 21 are arranged continuously. Each of the resin masses 21 is preferably formed into fine particles. For example, in each of the resin masses 21, it is preferable that the dimension of the side of the circumscribing square is 10 μm or less. Also in the coating 12, voids 22 are formed between the resin masses 21 in the aggregate of the plurality of resin masses 21.

[0016] Incidentally, in one example, the coating 12 which is an insulating film may include organic fibers in addition to the resin masses 21. In this case, the respective ratios of the resin masses 21 and the organic fibers contained in the coating 12 are not particularly limited. However, when the coating 12 which is an insulating film contains the resin masses 21 and the organic fibers, the ratio of the resin masses 21 contained in the coating 12 is preferably 50% by volume or more. That is, in the coating 12, it is preferable that the resin masses 21 become the main constituent.

[0017] Also, as shown in FIG. 2 and the like, in the coating 12, the film thickness is defined. The film thickness of the coating 12 corresponds to the thickness (dimension) of the coating 12 from the surface of the base material 11 to the surface of the coating 12. In the present embodiment, in the film forming process, as will be described later, the coating portion 6 applies the raw material liquid to the base material 11, so that in the coating structure 10, the film thickness of the coating 12 is formed thick at at least one end in the width direction. Also in the present embodiment, as in an example of FIG. 2 and the like, in the coating structure 10, it is preferable that the film thickness of the coating 12 is formed thick at each of both ends in the width direction.

[0018] In the coating structure 10 of an example shown in FIG. 2, in the central portion in the width direction, the film 12 is formed with a film thickness Tc1 in the portion covering the main surface 15 and a film thickness Tc2 in the portion covering the main surface 16, respectively. Further, in the coating structure 10, at the end on the side where the edge surface 17 in the width direction is located, the film 12 is formed with a film thickness Te1 in the portion covering the main surface 15, a film thickness Te2 in the portion covering the main surface 16, and a film thickness Te3 in the portion covering the edge surface 17, respectively. And in the coating structure 10, at the end on the side where the edge surface 18 in the width direction is located, the film 12 is formed with a film thickness Te4 in the portion covering the main surface 15, a film thickness Te5 in the portion covering the main surface 16, and a film thickness Te6 in the portion covering the edge surface 18, respectively. In the film 12, each of the film thicknesses Te1 to Te6 is thicker than either of the film thicknesses Tc1 and Tc2. For this reason, in the coating structure 10 of an example shown in FIG. 2, at both ends in the width direction, the film thickness of the film 12 is formed thicker than other portions including the central portion in the width direction.

[0019] FIG. 4 is a perspective view schematically showing an example of the configuration of a coating region A1 where a raw material liquid is applied to a base material 11 by a coating unit 6 and its vicinity in the film forming apparatus 1 according to the first embodiment. As shown in FIG. 4, in the coating region A1, the raw material liquid is applied to the base material 11 being conveyed downstream (in the direction indicated by arrow X1) in the conveyance direction. Further, in the coating region A1, the width direction (in the directions indicated by arrow Y1 and arrow Y2) of the conveyance unit 2 that intersects (is orthogonal or substantially orthogonal) to the conveyance direction, and the height direction (in the directions indicated by arrow Z1 and arrow Z2) of the conveyance unit 2 that intersects (is orthogonal or substantially orthogonal) to both the conveyance direction and the width direction of the conveyance unit 2 are defined. And in the coating region A1, one side in the height direction corresponds to the upper side (arrow Z1 side), and the side opposite to the upper side in the height direction corresponds to the lower side (arrow Z2 side).

[0020] In one example, the substrate 11 is transported along a horizontal plane in the coating area A1. In this case, in the coating area A1, the transport direction and the width direction of the transport unit 2 are aligned with the horizontal plane, and the height direction of the transport unit 2 is aligned with the vertical direction. In yet another example, the substrate 11 may be transported along the vertical direction in the coating area A1. In this case, in the coating area A1, the transport direction is aligned with the vertical direction, and the width direction and height direction of the transport unit 2 are aligned with the horizontal plane. In yet another example, the substrate 11 may be transported in the coating area A1 with the transport direction inclined with respect to both the horizontal plane and the vertical direction.

[0021] Furthermore, the conveying unit 2 is equipped with one or more conveying rolls 23. In the example shown in Figure 4, multiple conveying rolls 23, including conveying rolls 23A and 23B, are provided in the conveying unit 2. Each of the conveying rolls 23 is rotatable about a central axis and capable of supporting the base material 11 (coating structure 10) being conveyed downstream. Each of the conveying rolls 23 supports the conveyed base material 11 from one side in the thickness direction of the base material 11, for example, by contacting the base material 11 or the coating structure 10. In one example, one or more of the conveying rolls 23 are air turn bars, and each of the conveying rolls 23 that act as air turn bars supports the conveyed base material 11 by the pressure of the air they discharge. Therefore, each of the conveying rolls 23 that act as air turn bars supports the conveyed base material 11 from one side in the thickness direction of the base material 11 without contacting the base material 11 or the coating structure 10.

[0022] In the example shown in Figure 4, a coating area A1 is formed between two conveyor rolls 23A and 23B, and in the coating area A1, the substrate 11 is conveyed from conveyor roll 23A to conveyor roll 23B. Conveyor roll 23A is positioned upstream of the coating area A1, and conveyor roll 23B is positioned downstream of the coating area A1. In the example shown in Figure 4, there is no conveyor roll 23 supporting the substrate 11 between conveyor rolls 23A and 23B. In the example shown in Figure 4, the central axes of the conveyor rolls 23A and 23B are aligned with the width direction of the conveying section 2 in the coating area A1.

[0023] In the example shown in Figure 4, in the coating area A1, the substrate 11 is transported by the transport rolls 23A, 23B, etc., such that the longitudinal direction of the substrate 11 is aligned with the transport direction and the width direction of the substrate 11 is aligned with the width direction of the transport section 2. When the substrate 11 is being transported between the transport rolls 23A, 23B, the thickness direction of the substrate 11 is aligned with the height direction of the transport section 2. In the example shown in Figure 4, the substrate 11 is transported in the coating area A1 with the main surface 15 facing upwards in the height direction of the transport section 2. The axial directions of the transport rolls 23A, 23B, respectively, are aligned with the width direction of the substrate 11 being transported in the coating area A1.

[0024] The coating unit 6 is equipped with a discharge nozzle 25. In the example shown in Figure 4, one discharge nozzle 25A and one discharge nozzle 25B are provided. Each discharge nozzle 25 has a discharge port 26. In the coating area A1, the raw material liquid is discharged from each discharge port 26 of the discharge nozzle 25 toward the conveyed substrate 11, thereby coating the surface of the substrate 11 with the raw material liquid.

[0025] The raw material solution applied to the substrate 11 is produced by dissolving an organic material in a solvent. Examples of organic materials used in the raw material solution include one or more of the following: polyolefin, polyether, polyimide, polyketone, polysulfone, cellulose, polyvinyl alcohol (PVA), polyamide, polyamide-imide, and polyvinylidene fluoride (PVdf). Examples of polyolefins include polypropylene (PP) and polyethylene (PE).

[0026] Furthermore, any of the following solvents can be used to dissolve the organic material in the raw material solution: dimethylacetamide (DMAc), dimethyl sulfoxide (DMSO), N,N-dimethylformamide (DMF), N-methylpyrrolidone (NMP), acetone, dimethoxyethylene, toluene, tetrahydrofuran, water, and alkanes, ketones, esters, alcohols, ethers, etc. In the raw material solution, the organic material is dissolved in the solvent at a concentration of, for example, 5% by mass or more and 60% by mass or less. In addition, multiple types of solvents may be mixed and used in the raw material solution.

[0027] The film deposition apparatus 1 is equipped with a supply source (not shown) that supplies raw material liquid to each of the discharge nozzles 25. In one example, the supply source consists of a tank for storing the raw material liquid and a supply drive unit such as a supply pump. The control unit 8 controls the drive of the supply drive unit to supply the raw material liquid from the tank to each of the discharge nozzles 25. Each of the discharge nozzles 25 discharges the raw material liquid supplied from the supply source toward the substrate 11 being transported in the coating area A1.

[0028] In one example, using an electrostatic coating method, each of the discharge nozzles 25 discharges the raw material liquid toward the substrate 11. In this case, the film deposition apparatus 1 is equipped with a power supply (not shown), such as a DC power supply. The power supply then generates a potential difference between the transported substrate 11 and each of the discharge nozzles 25 by applying a voltage to each of the discharge nozzles 25. As a result, the raw material liquid supplied from the supply source becomes charged in each of the discharge nozzles 25 due to the applied voltage, and each of the discharge nozzles 25 discharges the charged raw material liquid toward the substrate 11. Note that the electrostatic coating method is also called the "electrospinning method."

[0029] The control unit 8 appropriately adjusts the voltage between each of the discharge nozzles 25 and the substrate 11, corresponding to the type of solvent and organic material in the raw material liquid, the boiling point and vapor pressure curve of the solvent in the raw material liquid, the concentration, viscosity and temperature of the raw material liquid, the pressure in the supply path that supplies the raw material liquid to each of the discharge nozzles 25, and the distance between the substrate 11 and the discharge nozzles 25. In one example, the voltage (potential difference) applied between each of the discharge nozzles 25 and the substrate 11 is appropriately adjusted between 1kV and 100kV.

[0030] In one example, a voltage is applied by the aforementioned power supply, etc., to either the source supplying the raw material liquid to the discharge nozzle 25, or to the supply path of the raw material liquid between the source and the discharge nozzle 25, thereby charging the raw material liquid. In this case as well, the charged raw material liquid is discharged from each of the discharge nozzles 25 toward the substrate 11, and the raw material liquid is discharged from each of the discharge nozzles 25 by electrostatic coating. Alternatively, the discharge of the raw material liquid from the discharge nozzles 25 may be performed by a method other than electrostatic coating. In one example, instead of electrostatic coating, the raw material liquid is discharged from each of the discharge nozzles 25 toward the substrate 11 by a solution blowing method.

[0031] When forming an insulating film 12 with resin lumps 21 as the main component, the raw material liquid is applied under conditions that facilitate the deposition of the raw material liquid as droplets onto the substrate 11. In this case, conditions that facilitate the deposition of the raw material liquid as droplets onto the substrate 11 are adjusted, for example, the type of organic material including the molecular weight of the organic material dissolved in the raw material liquid, the concentration and viscosity of the raw material liquid, and the pressure in the supply path that supplies the raw material liquid to each of the discharge nozzles 25. As the raw material liquid is deposited onto the substrate 11 as droplets, the deposited droplets are dried by the drying unit 7 to form the resin lumps 21. As a result, the coating 12 is formed from the aggregate of resin lumps 21.

[0032] Here, when applying the raw material liquid using electrostatic coating, the lower the concentration of the raw material liquid, the more likely droplets are to accumulate, and the higher the concentration of the raw material liquid, the more likely organic fibers are to accumulate. Furthermore, the lower the viscosity of the raw material liquid, the more likely droplets are to accumulate, and the higher the viscosity of the raw material liquid, the more likely organic fibers are to accumulate. Also, regarding the organic material dissolved in the raw material liquid, the lower the molecular weight, the more likely droplets are to accumulate, and the higher the molecular weight, the more likely organic fibers are to accumulate. And in the supply path that supplies the raw material liquid to each of the discharge nozzles 25, the lower the pressure, the more likely droplets are to accumulate, and the higher the pressure, the more likely organic fibers are to accumulate.

[0033] Figure 5 is a schematic cross-sectional view of the coating area A1 of an example in Figure 4, shown in a cross-section perpendicular or approximately perpendicular to the conveying direction. In Figure 5, a cross-section is shown that passes downstream of the two discharge nozzles 25A and 25B and upstream of the conveying roll 23B. In Figure 5, the substrate 11 and the coating structure 10 are shown in a cross-section perpendicular or approximately perpendicular to the longitudinal direction, and the discharge nozzles 25A and 25B and the conveying roll 23A are shown as viewed from the downstream side. As shown in Figures 4 and 5, the position of the conveyed substrate 11 is adjusted by the conveying rolls 23A and 23B in the coating area A1. In other words, the conveying rolls 23A and 23B act as position adjustment rolls that adjust the position of the conveyed substrate 11 in the coating area A1.

[0034] The transport rolls 23A and 23B adjust the position of the substrate 11 in the width direction. In this embodiment, the position of the substrate 11 in the width direction of the transport unit 2 is adjusted by the transport rolls 23A and 23B. Here, the dimension (width) of the substrate 11 along the width direction of the substrate 11 is defined as the total width of the substrate 11. The transport rolls 23A and 23B adjust the position of the substrate 11 in the width direction of the substrate 11 so that the total width of the substrate 11 being transported in the coating area A1 falls within the defined range Qref. This suppresses uneven distribution of the substrate 11 in the coating area A1, such as the substrate 11 shifting to one side in the width direction (width direction of the transport unit 2).

[0035] In the example shown in Figures 4 and 5, recesses 27 are formed on the outer circumferential surfaces of the transport rolls 23A and 23B, which serve as position adjustment rolls, and are recessed toward the inner circumference. On the outer circumferential surfaces of the transport rolls 23A and 23B, the recesses 27 are formed along the circumferential direction and extend over the entire circumference. Furthermore, on each of the transport rolls 23A and 23B, the recesses 27 are formed in the axial center of the transport roll (23A or 23B), that is, in the width direction of the transport section 2 and the width direction of the base material 11. On each of the transport rolls 23A and 23B, the outer diameter of the portion where the recess 27 is formed is smaller than the outer diameter of the portion where the recess 27 is not formed. Hereinafter, the portion of each of the transport rolls 23A and 23B where the recess 27 is formed will also be referred to as the "non-recessed portion 28".

[0036] The dimensions of the recesses 27 along the axial direction (width direction of the substrate 11) on each of the transport rolls 23A and 23B are slightly larger than the total width of the substrate 11. Each of the transport rolls 23A and 23B supports the transported substrate 11 so that its total width fits within the recesses 27. As a result, each of the transport rolls 23A and 23B prevents the transported substrate 11 from shifting beyond the recesses 27 in the width direction of the substrate 11 (width direction of the transport section 2). Consequently, in the coating area A1 between the transport rolls 23A and 23B, the substrate 11 is transported so that its total width fits within the specified range Qref.

[0037] In the example shown in Figures 4 and 5, the dimensions of the specified range Qref along the width direction of the substrate 11 (width direction of the transport section 2) in the coating area A1 coincide with or nearly coincide with the dimensions of the recesses 27 along the axial direction (width direction of the substrate 11) of each of the transport rolls 23A and 23B. Therefore, the dimensions of the specified range Qref along the width direction of the substrate 11 (width direction of the transport section 2) are slightly larger than the total width of the substrate 11. Furthermore, the specified range Qref is not shifted, or is hardly shifted, in the width direction of the substrate 11 (width direction of the transport section 2) relative to the recesses 27 of each of the transport rolls 23A and 23B.

[0038] Note that the transport rolls 23A and 23B, which serve as position adjustment rolls, are not limited to configurations in which a recess 27 is provided. In this embodiment, the transport rolls 23A and 23B only need to adjust the position of the substrate 11 in the width direction so that the total width of the substrate 11 being transported in the coating area A1 falls within a specified range Qref. In one example, the transport rolls 23A and 23B are crown rolls. In this case, the transport rolls 23A and 23B transport the substrate 11 with each supporting the substrate 11 at the part with the largest outer diameter. The transport rolls 23A and 23B then apply an axial force (in the width direction of the substrate 11) to the transported substrate 11, which brings it towards the part with the largest outer diameter, thereby adjusting the position of the substrate 11 so that the total width of the substrate 11 falls within a specified range Qref.

[0039] In this embodiment, in the coating area A1, each discharge port 26 of the discharge nozzle 25 is located outside the width direction of the substrate 11 relative to the aforementioned defined range Qref. Therefore, each discharge nozzle 25 discharges the raw material liquid toward the conveyed substrate 11 from a discharge port 26 located outside the width direction of the conveying unit 2 relative to the defined range Qref. Due to this configuration, in the coating area A1, each discharge nozzle 25 discharges the raw material liquid from a position outside the width direction of the substrate 11 relative to the edge surfaces 17,18 of the substrate 11. That is, each discharge port 26 of the discharge nozzle 25 is located further outside the width direction of the conveyed substrate 11.

[0040] In the example shown in Figures 4 and 5, the discharge port 26 of the discharge nozzle (first discharge nozzle) 25A is located on one side (arrow W1 side) in the width direction of the substrate 11 with respect to the specified range Qref, and on one side (arrow Y1 side) in the width direction of the transport unit 2 with respect to the specified range Qref. Furthermore, the discharge port 26 of the discharge nozzle 25A is located on the side facing the edge surface 17 with respect to the specified range Qref. Also, the discharge port 26 of the discharge nozzle 25A is located on the outside of the substrate 11 in the width direction with respect to the edge surface 17 of the substrate 11, and is located on the side facing the edge surface 17.

[0041] Furthermore, in the example shown in Figures 4 and 5, the discharge port 26 of the discharge nozzle (second discharge nozzle) 25B is located on the opposite side from the discharge nozzle 25A with respect to the specified range Qref. Therefore, the discharge port 26 of the discharge nozzle 25B is located on the opposite side from the side where the discharge nozzle 25A is located with respect to the specified range Qref in the width direction of the substrate 11 (width direction of the transport section 2), and is located on the side facing the edge surface 18. Also, the discharge port 26 of the discharge nozzle 25B is located on the outside of the substrate 11 in the width direction with respect to the edge surface 18 of the substrate 11, and is located on the side facing the edge surface 18.

[0042] In the example shown in Figures 4 and 5, in coating area A1, the discharge nozzles 25A and 25B are positioned above the substrate 11 in the height direction of the transport unit 2, and on the side facing the main surface 15 in the thickness direction of the substrate 11. Therefore, in coating area A1, the raw material liquid is discharged onto the substrate 11 from only one side in the thickness direction (height direction of the transport unit 2). However, even with a configuration where the raw material liquid is discharged onto the substrate 11 from only one side in the thickness direction, the raw material liquid is applied to both the main surfaces 15 and 16 of the substrate 11, and the drying of the raw material liquid by the drying unit 7 forms a coating 12 on both the main surfaces 15 and 16 of the substrate 11.

[0043] Furthermore, in this embodiment, at least one of the two discharge nozzles 25A and 25B may be positioned below the substrate 11 in the height direction of the transport unit 2, and on the side facing the main surface 16 in the thickness direction of the substrate 11. In one example, discharge nozzle 25A discharges the raw material liquid to the substrate 11 from one side in the thickness direction of the substrate 11, and discharge nozzle 25B discharges the raw material liquid to the substrate 11 from the opposite side of the thickness direction of the substrate 11 from discharge nozzle 25A. In this case, in the coating area A1, the raw material liquid is discharged to the substrate 11 from both sides in the thickness direction (height direction of the transport unit 2).

[0044] In the example shown in Figures 4 and 5, each of the discharge nozzles 25 is positioned such that the direction of discharge of the raw material liquid is aligned with the thickness direction of the substrate 11. That is, each of the discharge nozzles 25 is positioned such that the direction of discharge of the raw material liquid is perpendicular or nearly perpendicular to the main surfaces 15 and 16 of the substrate 11. Furthermore, the direction of discharge of the raw material liquid from each of the discharge nozzles 25 is aligned with the height direction of the conveying unit 2. In the example shown in Figures 4 and 5, the direction of discharge of the raw material liquid from each of the discharge nozzles 25 coincides with or nearly coincides with the lower side of the conveying unit 2 in the height direction.

[0045] Furthermore, in the example shown in Figures 4 and 5, the discharge nozzles 25A and 25B are positioned offset from each other in the transport direction of the transport section 2. The discharge nozzle (first discharge nozzle) 25A is positioned downstream of the discharge nozzle (second discharge nozzle) 25B. Therefore, in the coating area A1, the raw material liquid is applied to the substrate 11 by the discharge nozzle 25B, and then applied to the substrate 11 by the discharge nozzle 25A. In one example, the discharge nozzle (first discharge nozzle) 25A may be positioned upstream of the discharge nozzle (second discharge nozzle) 25B.

[0046] As described above, in this embodiment, the conveying rolls 23A and 23B, which serve as position adjustment rolls, adjust the position of the conveyed substrate 11 so that its entire width is within the specified range Qref. Then, each discharge port 26 of the discharge nozzle 25 is located outside the width direction of the substrate 11 relative to the specified range Qref, and each of the discharge nozzles 25 discharges the raw material liquid from its discharge port 26 toward the substrate 11 that is being conveyed with its entire width within the specified range Qref, thereby coating the surface of the substrate 11 with the raw material liquid. As a result of this coating of the substrate 11 with the raw material liquid, the film thickness of the film 12 is formed thicker at at least one end in the width direction of the coated structure 10 in which the substrate 11 is covered with the film 12.

[0047] In one example, a coated conductor, which is an electrical conductor covered with an insulating film, is formed as a coated structure 10, and a coil is formed by winding the coated conductor. In this embodiment, as described above, the raw material liquid is applied to the electrical conductor which will be the base material 11, so that the thickness of the insulating film, which is the coating 12, is thicker at at least one end in the width direction of the coated conductor. Because the thickness of the insulating film is thicker at at least one end in the width direction of the coated conductor, short circuits between adjacent turns are appropriately prevented in the coil in which the coated conductor is wound.

[0048] Furthermore, in one example of this embodiment, one of the multiple discharge nozzles 25, a first discharge nozzle 25A, discharges the raw material liquid toward the conveyed substrate 11 from a discharge port 26 located on one side in the width direction of the substrate 11 relative to a specified range Qref. Then, one of the multiple discharge nozzles 25, a second discharge nozzle 25B, discharges the raw material liquid toward the conveyed substrate 11 from a discharge port 26 located on the opposite side from discharge nozzle 25A relative to the specified range Qref. By applying the raw material liquid to the substrate 11 in this manner, the film thickness of the film 12 is formed thicker at each of the ends on both sides in the width direction in the coated structure 10 in which the substrate 11 is covered with a film 12.

[0049] For example, when forming a coated conductor as a coated structure 10, applying the raw material liquid to the substrate 11 using the discharge nozzles 25A and 25B as described above results in a thicker film thickness of the insulating film, which is the coating 12, being formed at both ends in the width direction of the coated conductor. This further effectively prevents short circuits between adjacent turns in a coil in which the coated conductor is wound.

[0050] Furthermore, in one embodiment, the discharge nozzles 25A and 25B are positioned offset from each other in the transport direction in the transport section 2. This configuration reduces the mutual influence between the nozzles, allowing for the application of the raw material liquid by the discharge nozzle 25A and the application of the raw material liquid by the discharge nozzle 25B. As a result, in the coated structure 10 in which the coating 12 is applied to the substrate 11, a configuration in which the film thickness of the coating 12 is increased at both ends in the width direction is appropriately realized.

[0051] (Modified version of the first embodiment) In the first embodiment, each of the discharge nozzles 25 is positioned such that the discharge direction of the raw material liquid is aligned with the thickness direction of the substrate 11 (height direction of the transport unit 2), but this is not the only configuration. Figure 6 is a schematic cross-sectional view showing an example of a coating area A1 in which the raw material liquid is applied to the substrate 11 by the coating unit 6 in a first modified example of the first embodiment, in a cross-section perpendicular or substantially perpendicular to the transport direction. Figure 7 is a schematic cross-sectional view showing an example of a coating area A1 in which the raw material liquid is applied to the substrate 11 by the coating unit 6 in a second modified example of the first embodiment, in a cross-section perpendicular or substantially perpendicular to the transport direction.

[0052] Figures 6 and 7 show cross-sections that pass downstream of the two discharge nozzles 25A and 25B, and upstream of the conveyor roll 23B. In Figures 6 and 7, the base material 11 and the coating structure 10 are shown in cross-sections perpendicular or nearly perpendicular to the longitudinal direction, and the discharge nozzles 25A and 25B and the conveyor roll 23A are shown as viewed from the downstream side.

[0053] As shown in Figure 6, in the first modified example, each of the discharge nozzles 25 is positioned such that the direction of discharge of the raw material liquid is inclined with respect to the thickness direction of the substrate 11 (height direction of the transport section 2). Furthermore, each of the discharge nozzles 25 is positioned such that the direction of discharge of the raw material liquid is inclined with respect to the main surfaces 15, 16 of the substrate 11 and the width direction of the substrate 11 (width direction of the transport section 2). In addition, the direction of discharge of the raw material liquid from each of the discharge nozzles 25 is inclined inward in the width direction of the substrate 11 as it approaches the substrate 11 in the thickness direction, and is inclined with respect to the thickness direction and width direction of the substrate 11.

[0054] In the example shown in Figure 6, both discharge nozzles 25A and 25B are positioned above the transport unit 2 in the height direction and on the side facing the main surface 15 in the thickness direction of the base material 11. However, similar to the first modification, in a configuration where the discharge direction of the raw material liquid from each of the discharge nozzles 25 is inclined with respect to the thickness direction and width direction of the base material 11, at least one of the discharge nozzles 25A and 25B may be positioned below the transport unit 2 in the height direction with respect to the base material 11 and on the side facing the main surface 16 in the thickness direction of the base material 11.

[0055] As shown in Figure 7, in the second modified example, each of the discharge nozzles 25 is positioned such that the direction of discharge of the raw material liquid is aligned with the width direction of the substrate 11 (the width direction of the transport section 2). Furthermore, each of the discharge nozzles 25 is positioned such that the direction of discharge of the raw material liquid is aligned with the main surfaces 15 and 16 of the substrate 11. In this modified example, the direction of discharge of the raw material liquid from each of the discharge nozzles 25 is perpendicular or approximately perpendicular to the thickness direction of the substrate 11 (the height direction of the transport section 2). Also, in this modified example, in the coating area A1, each discharge port 26 of the discharge nozzles 25 faces the transported substrate 11 from the outside in the width direction of the substrate 11. The discharge port 26 of the discharge nozzle (first discharge nozzle) 25A faces the substrate 11 from one side in the width direction of the substrate 11, for example, facing the edge surface 17. The discharge port 26 of the discharge nozzle (second discharge nozzle) 25B faces the substrate 11 from the opposite side of the discharge nozzle 25A, for example, facing the edge surface 18.

[0056] Furthermore, in the first embodiment and others, the coating 12 is formed not only on both ends in the width direction but also on the central part in the width direction of the coating structure 10, but it is not limited to this. Figure 8 is a schematic cross-sectional view showing an example of a coating area A1 in which the raw material liquid is applied to the substrate 11 by the coating unit 6 in a third modified example of the first embodiment, in a cross-section perpendicular or substantially perpendicular to the conveying direction. In Figure 8, a cross-section is shown that passes downstream of the two discharge nozzles 25A and 25B and upstream of the conveying roll 23B. Also, in Figure 8, the substrate 11 and the coating structure 10 are shown in a cross-section perpendicular or substantially perpendicular to the longitudinal direction, and the discharge nozzles 25A and 25B and the conveying roll 23A are shown as viewed from the downstream side.

[0057] As shown in Figure 8, in the third modified example, a coating 12 is formed on each of the ends on both sides in the width direction of the coating structure 10. However, in this modified example, no coating 12 is formed on the central part of the coating structure 10 in the width direction. In this modified example, the raw material liquid is discharged from each of the discharge nozzles 25 under different conditions than those of the embodiments described above, thereby forming a coating 12 only on the ends on both sides in the width direction of the coating structure 10.

[0058] In the example shown in Figure 8, the direction of discharge of the raw material liquid from each of the discharge nozzles 25 is aligned with the thickness direction of the substrate 11. However, even when the coating 12 is formed only on the ends on both sides in the width direction of the coating structure 10, the direction of discharge of the raw material liquid from each of the discharge nozzles 25 can be changed as appropriate, similar to the modified examples in Figure 6 and Figure 7.

[0059] Here, in all of the modifications described above, similar to the first embodiment, each discharge port 26 of the discharge nozzle 25 is located outside the width direction of the substrate 11 relative to the specified range Qref, and each of the discharge nozzles 25 discharges the raw material liquid from its discharge port 26 toward the substrate 11 which is being transported with its entire width within the specified range Qref. For this reason, in all of the modifications, in the coated structure 10 in which the substrate 11 is covered with a coating 12, the thickness of the coating 12 is formed to be thicker at at least one end in the width direction.

[0060] Furthermore, in all of the above-mentioned modifications, the discharge nozzle (first discharge nozzle) 25A discharges the raw material liquid toward the conveyed substrate 11 from a discharge port 26 located on one side in the width direction of the substrate 11 relative to the specified range Qref. The discharge nozzle (second discharge nozzle) 25B discharges the raw material liquid toward the conveyed substrate 11 from a discharge port 26 located on the opposite side from the discharge nozzle 25A relative to the specified range Qref. For this reason, in all of the above modifications, in the coated structure 10 in which the coating 12 is applied to the substrate 11, the thickness of the coating 12 is formed to be thicker at each of the ends on both sides in the width direction.

[0061] Furthermore, in the embodiments described above, one discharge nozzle 25A and one discharge nozzle 25B are provided. However, in a certain modification, multiple discharge nozzles 25A and 25B may be provided. In this case, each of the multiple discharge nozzles (first discharge nozzles) 25A discharges the raw material liquid toward the conveyed substrate 11 from a discharge port 26 located on one side in the width direction of the substrate 11 with respect to a specified range Qref. Then, each of the multiple discharge nozzles (second discharge nozzles) 25B discharges the raw material liquid toward the conveyed substrate 11 from a discharge port 26 located on the opposite side from the discharge nozzles 25A with respect to a specified range Qref.

[0062] In a preferred example of this modification, in the coating area A1, each of the multiple discharge nozzles 25A is positioned offset in the transport direction relative to any of the multiple discharge nozzles 25B. In this case, for example, the discharge nozzles (first discharge nozzle) 25A and the discharge nozzles (second discharge nozzle) 25B are arranged alternately along the transport direction. Alternatively, each of the multiple discharge nozzles 25B may be positioned upstream or downstream of any of the multiple discharge nozzles 25A. In this case, the portion where all the discharge nozzles 25B are aligned along the transport direction is formed upstream or downstream of the portion where all the discharge nozzles 25A are aligned along the transport direction.

[0063] Furthermore, in the embodiments described above, two types of discharge nozzles 25A and 25B, located on opposite sides of each other with respect to the specified range Qref, are provided as discharge nozzles 25, but the invention is not limited to this. In one modified example, only one of the two types of discharge nozzles 25A and 25B described above is provided as the discharge nozzle 25. In both the configuration in which only discharge nozzle 25A is provided and the configuration in which only discharge nozzle 25B is provided, the discharge port 26 of one or more discharge nozzles 25 is located outside the width direction of the substrate 11 with respect to the specified range Qref, and each discharge nozzle 25 discharges the raw material liquid from its discharge port 26 toward the substrate 11, which is being transported with its entire width within the specified range Qref. For this reason, in this modified example as well, in the coated structure 10 in which the substrate 11 is coated with a film 12, the film thickness of the film 12 is formed thicker at at least one end in the width direction.

[0064] (Second embodiment) Next, a second embodiment will be described as a modification of the first embodiment. In the second embodiment, the parts that have been changed from the previously described embodiments will be mainly described. Figure 9 is a schematic perspective view showing an example of the configuration of the coating area A1 and its vicinity in the film-forming apparatus 1 according to the second embodiment, where the raw material liquid is applied to the substrate 11 by the coating unit 6. As shown in Figure 9, in this embodiment as well as in the previously described embodiments, the transport direction (direction indicated by arrow X1), the width direction of the transport unit 2 (directions indicated by arrows Y1 and Y2), and the height direction of the transport unit 2 (directions indicated by arrows Z1 and Z2) are defined in the coating area A1.

[0065] In the example shown in Figure 9, in addition to transport rolls 23A and 23B, transport rolls 23C and 23D are provided as transport rolls 23. In the transport section 2, transport roll 23C is positioned adjacent to transport roll 23A from the downstream side, and transport roll 23D is positioned adjacent to transport roll 23B from the upstream side. As shown in Figure 9, in this embodiment, a coating area A1 is formed between transport rolls 23C and 23D, and in the coating area A1, the substrate 11 is transported from transport roll 23C toward transport roll 23D. Transport rolls 23A and 23C are positioned upstream of the coating area A1, and transport rolls 23B and 23D are positioned downstream of the coating area A1.

[0066] In the example shown in Figure 9, the transport roll 23 supporting the substrate 11 is not positioned between the transport rolls 23C and 23D. In this embodiment as well, the central axes of the transport rolls 23A and 23B are aligned with the width direction of the transport section 2 in the coating area A1. In this embodiment, the central axes of the transport rolls 23C and 23D intersect with the width direction of the transport section 2 in the coating area A1. In the example shown in Figure 9, the central axes of the transport rolls 23C and 23D are perpendicular or nearly perpendicular to the width direction of the transport section 2 in the coating area A1 and are aligned with the height direction of the transport section 2 in the coating area A1. In this embodiment as well, the coating section 6 is equipped with a discharge nozzle 25, and in the example shown in Figure 9, one discharge nozzle 25A and one discharge nozzle 25B are provided.

[0067] Figure 10 is a schematic cross-sectional view of the coating area A1 of an example in Figure 9, shown in a cross-section perpendicular or approximately perpendicular to the conveying direction. In Figure 10, a cross-section is shown that passes downstream of the two discharge nozzles 25A and 25B, and upstream of the conveying rolls 23B and 23D. In Figure 10, the substrate 11 and the coating structure 10 are shown in a cross-section perpendicular or approximately perpendicular to the longitudinal direction, and the discharge nozzles 25A and 25B and the conveying rolls 23C are shown as viewed from the downstream side.

[0068] As shown in Figures 9 and 10, in this embodiment, in the coating area A1, the substrate 11 is conveyed by the conveyor rolls 23C, 23D, etc., such that the longitudinal direction of the substrate 11 is along the conveying direction and the width direction of the substrate 11 intersects with the width direction of the conveying section 2. In the example shown in Figures 9 and 10, in the substrate 11 being conveyed between the conveyor rolls 23C and 23D, the width direction of the substrate 11 is along the height direction of the conveying section 2, and the thickness direction of the substrate 11 is along the width direction of the conveying section 2. Furthermore, in this embodiment, the axial directions of the conveyor rolls 23C and 23D are along the width direction of the substrate 11 being conveyed in the coating area A1.

[0069] In this embodiment, the conveying roll 23C acts as a twisting roll that twists the conveyed substrate 11, and the conveying roll 23D acts as a twist release roll that releases the twisting of the substrate 11 by the conveying roll 23C. The conveying roll 23C, which is a twisting roll, twists the substrate 11 being conveyed in the coating area A1 from a state where the width direction of the substrate 11 is aligned with the width direction of the conveying section 2 to a state where the width direction of the substrate 11 intersects with the width direction of the conveying section 2. In the example shown in Figures 9 and 10, the conveying substrate 11 in the coating area A1 is twisted so that the width direction of the substrate 11 is aligned with the height direction of the conveying section 2. Furthermore, in this embodiment, the twist is released by the conveying roll 23D, which is a twist release roll, so that the width direction of the substrate 11 is aligned with the width direction of the conveying section 2 in the coating area A1.

[0070] As shown in Figures 9 and 10, in this embodiment, the transport rolls 23C and 23D act as position adjustment rolls that adjust the position of the substrate 11 being transported in the coating area A1. The transport rolls 23C and 23D adjust the position of the substrate 11 in the width direction, similar to the transport rolls 23A and 23B in the embodiments described above. However, in the example shown in Figures 9 and 10, the position of the substrate 11 in the height direction of the transport section 2 is adjusted by the transport rolls 23C and 23D. In this embodiment as well, the transport rolls 23C and 23D adjust the position of the substrate 11 in the width direction so that the entire width of the substrate 11 being transported in the coating area A1 falls within the specified range Qref.

[0071] In the examples shown in Figures 9 and 10, recesses 27 are not formed on the transport rolls 23A and 23B, but recesses 27 are formed on the transport rolls 23C and 23D, which serve as position adjustment rolls. Recesses 27 are formed on each of the transport rolls 23C and 23D in the same manner as on the transport rolls 23A and 23B in the examples shown in Figures 4 and 5. Therefore, the dimensions of the recesses 27 along the axial direction (width direction of the substrate 11) on each of the transport rolls 23C and 23D are slightly larger than the total width of the substrate 11. Each of the transport rolls 23C and 23D supports the transported substrate 11 in such a state that the total width of the substrate 11 fits within the recesses 27. As a result, in the coating area A1 between the transport rolls 23C and 23D, the substrate 11 is transported in such a state that the total width of the substrate 11 fits within the specified range Qref. Note that the parts of the transport rolls 23C and 23D other than the recesses 27 are also referred to as "non-recessed areas 28".

[0072] In this embodiment as well, the dimensions of the specified range Qref along the width direction of the substrate 11 are slightly larger than the total width of the substrate 11. Furthermore, the specified range Qref is not shifted, or is hardly shifted, in the width direction of the substrate 11 relative to the respective recesses 27 of the transport rolls 23C and 23D. In the example shown in Figures 9 and 10, in the coating area A1, the specified range Qref is not shifted, or is hardly shifted, in the height direction of the transport section 2 relative to the respective recesses 27 of the transport rolls 23C and 23D.

[0073] In this embodiment, the transport rolls 23C and 23D, which serve as position adjustment rolls, are not limited to having a recess 27. For example, the transport rolls 23C and 23D may each be crown rolls. In other words, in this embodiment, the transport rolls 23C and 23D only need to adjust the position of the substrate 11 in the width direction so that the entire width of the substrate 11 being transported in the coating area A1 falls within the specified range Qref.

[0074] In this embodiment as well, in the coating area A1, each discharge port 26 of the discharge nozzle 25 is located outside the width direction of the substrate 11 with respect to the aforementioned specified range Qref. In the example shown in Figures 9 and 10, each discharge nozzle 25 discharges the raw material liquid toward the conveyed substrate 11 from a discharge port 26 located outside the height direction of the conveying unit 2 with respect to the specified range Qref. Due to this configuration, in this embodiment as well, in the coating area A1, each discharge nozzle 25 discharges the raw material liquid from a position outside the width direction of the substrate 11 with respect to the edge surfaces 17 and 18 of the substrate 11. That is, each discharge port 26 of the discharge nozzle 25 is located further outside the width direction of the conveyed substrate 11.

[0075] In the example shown in Figures 9 and 10, the discharge port 26 of the discharge nozzle (first discharge nozzle) 25A is located on one side of the substrate 11 in the width direction (arrow W1 side) with respect to the specified range Qref, and on one side of the transport unit 2 in the height direction (arrow Z2 side) with respect to the specified range Qref. Furthermore, the discharge port 26 of the discharge nozzle 25A is located on the outside of the substrate 11 in the width direction with respect to the edge surface 17 of the substrate 11. Also in the example shown in Figures 9 and 10, the discharge port 26 of the discharge nozzle (second discharge nozzle) 25B is located on the opposite side of the specified range Qref from the discharge nozzle 25A, and is located on the opposite side of the specified range Qref with respect to the width direction of the substrate 11 (height direction of the transport unit 2). Furthermore, the discharge port 26 of the discharge nozzle 25B is located on the outside of the substrate 11 in the width direction with respect to the edge surface 18 of the substrate 11.

[0076] In the example shown in Figures 9 and 10, each of the discharge nozzles 25 is positioned such that the direction of discharge of the raw material liquid is aligned with the width direction of the substrate 11. That is, each of the discharge nozzles 25 is positioned such that the direction of discharge of the raw material liquid is aligned with the main surfaces 15 and 16 of the substrate 11. Also in the example shown in Figures 9 and 10, the direction of discharge of the raw material liquid from each of the discharge nozzles 25 is aligned with the height direction of the conveying section 2. Discharge nozzle 25A discharges the raw material liquid toward one side in the height direction of the conveying section 2, and the direction of discharge of the raw material liquid from discharge nozzle 25B is opposite to the direction of discharge of the raw material liquid from discharge nozzle 25A. Furthermore, in the example shown in Figures 9 and 10, the discharge nozzles 25A and 25B are positioned offset from each other in the conveying direction of the conveying section 2.

[0077] In this embodiment as well, the same functions and effects as in the embodiments described above are achieved. That is, in this embodiment as well, each discharge port 26 of the discharge nozzle 25 is located outside the width direction of the substrate 11 with respect to the specified range Qref, and each discharge nozzle 25 discharges the raw material liquid from its discharge port 26 toward the substrate 11 which is being transported in a state in which the entire width is within the specified range Qref. As a result, in the coated structure 10 in which the substrate 11 is covered with a coating 12, the thickness of the coating 12 is formed to be thicker at at least one end in the width direction.

[0078] In this embodiment as well, the discharge nozzle (first discharge nozzle) 25A discharges the raw material liquid toward the conveyed substrate 11 from a discharge port 26 located on one side in the width direction of the substrate 11 relative to a specified range Qref. The discharge nozzle (second discharge nozzle) 25B discharges the raw material liquid toward the conveyed substrate 11 from a discharge port 26 located on the opposite side from the discharge nozzle 25A relative to the specified range Qref. Therefore, in this embodiment as well, in the coated structure 10 in which the substrate 11 is covered with a coating 12, the thickness of the coating 12 is formed to be thicker at each of the ends on both sides in the width direction.

[0079] Furthermore, in this embodiment, the conveying roll 23C, which acts as a twisting roll, twists the conveyed substrate 11 in the coating area A1 from a state where the width direction of the substrate 11 is aligned with the width direction of the conveying section 2 to a state where the width direction of the substrate 11 intersects with the width direction of the conveying section 2. By conveying the substrate 11 with its width direction intersecting with the width direction of the conveying section 2, even if each discharge port 26 of the discharge nozzle 25 is located outside the width direction of the substrate 11 relative to the specified range Qref, the dimensions of the conveying section 2 along the width direction in the coating area A1 can be reduced. This makes it possible to miniaturize the mechanism for applying the raw material liquid to the substrate 11.

[0080] (Modified version of the second embodiment) In the example shown in Figures 9 and 10, the substrate 11 is twisted by the conveying roll 23C, which is a twisting roll, in the coating area A1 such that the width direction of the substrate 11 is aligned with the height direction of the conveying section 2, but this is not the only example. In a configuration in which a twisting roll is provided, it is sufficient that the substrate 11 is twisted in the coating area A1 such that the width direction of the substrate 11 intersects with the width direction of the conveying section 2. In one modified example, the substrate 11 is twisted by the conveying roll 23C, which is a twisting roll, in the coating area A1 such that the width direction of the substrate 11 is inclined with respect to both the height and width directions of the conveying section 2.

[0081] Furthermore, even in configurations where a twisting roll is provided, as in the second embodiment, the direction of discharge of the raw material liquid from each of the discharge nozzles 25 can be appropriately changed, as described above in the modified example of the first embodiment. Figure 11 is a schematic cross-sectional view showing an example of a coating area A1 in a modified example of the second embodiment, where the raw material liquid is applied to the substrate 11 by the coating unit 6, in a cross-section perpendicular or substantially perpendicular to the conveying direction. In Figure 11, a cross-section is shown that passes downstream of the two discharge nozzles 25A and 25B, and upstream of the conveying rolls 23B and 23D. Also in Figure 11, the substrate 11 and the coating structure 10 are shown in a cross-section perpendicular or substantially perpendicular to the longitudinal direction, and the discharge nozzles 25A and 25B and the conveying rolls 23C are shown as viewed from the downstream side.

[0082] In the modified version shown in Figure 11, each of the discharge nozzles 25 is positioned such that the direction of discharge of the raw material liquid is aligned with the thickness direction of the substrate 11. Furthermore, each of the discharge nozzles 25 is positioned such that the direction of discharge of the raw material liquid is perpendicular or nearly perpendicular to the main surfaces 15, 16 of the substrate 11 and the width direction of the substrate 11. In yet another modified version, each of the discharge nozzles 25 is positioned such that the direction of discharge of the raw material liquid is inclined with respect to the thickness direction of the substrate 11. Furthermore, each of the discharge nozzles 25 is positioned such that the direction of discharge of the raw material liquid is inclined with respect to the main surfaces 15, 16 of the substrate 11 and the width direction of the substrate 11.

[0083] Furthermore, even in a configuration where a twisting roll is provided, as in the second embodiment, the coating 12 may not be formed in the central part in the width direction of the coating structure 10, but only on the ends in the width direction. Also, even in a configuration where a twisting roll is provided, as in the second embodiment, it is possible to make appropriate changes, such as providing multiple discharge nozzles 25A and 25B, or providing only one of the two types of discharge nozzles 25A and 25B as the discharge nozzle 25.

[0084] According to at least one embodiment or example, the position of the conveyed substrate is adjusted so that the entire width of the substrate falls within a specified range. Then, using a discharge nozzle whose discharge port is located outside the substrate in the width direction relative to the specified range, the raw material liquid is discharged from the discharge port of the discharge nozzle toward the substrate being conveyed in a state where the entire width falls within the specified range, thereby coating the surface of the substrate with the raw material liquid. This makes it possible to provide a film-forming apparatus and method that can form a thicker film thickness at at least one end in the width direction of a coated structure in which a film is coated on a substrate.

[0085] While several embodiments of the present invention have been described, these embodiments are presented as examples only and are not intended to limit the scope of the invention. These novel embodiments can be carried out in a variety of other forms, and various omissions, substitutions, and modifications can be made without departing from the spirit of the invention. These embodiments and their variations are included in the scope and spirit of the invention, as well as in the claims of the invention and its equivalents. [Explanation of Symbols]

[0086] 1...Film forming apparatus, 2...Conveying section, 6...Coating section, 10...Coated structure, 11...Substrate, 12...Coating film, 23 (23A~23D)...Conveying roll, 25 (25A,25B)...Discharge nozzle, 26...Discharge port, Qref...Specified range.

Claims

1. A conveying unit comprising a conveying roll capable of supporting a substrate, the conveying roll also comprising a position adjustment roll that adjusts the position of the conveyed substrate so that the entire width of the substrate is within a specified range, A discharge nozzle is provided, the discharge port of which is located outside the width direction of the substrate with respect to the specified range, and which discharges the raw material liquid from the discharge port toward the substrate being transported in a state where the total width is within the specified range, thereby coating the surface of the substrate with the raw material liquid. A film deposition apparatus equipped with the following:

2. The aforementioned discharge nozzle is A first discharge nozzle that discharges the raw material liquid toward the conveyed substrate from the discharge port located on one side of the substrate in the width direction relative to the specified range, A second discharge nozzle discharges the raw material liquid toward the conveyed substrate from the discharge port located on the opposite side of the first discharge nozzle with respect to the specified range, A film deposition apparatus according to claim 1, comprising:

3. The film-forming apparatus according to claim 2, wherein the first discharge nozzle and the second discharge nozzle are positioned offset from each other in the transport direction in the transport section.

4. The film-forming apparatus according to any one of claims 1 to 3, wherein the conveying roll includes a twisting roll that twists the conveyed substrate in the coating region where the raw material liquid is applied to the substrate from the discharge nozzle, so that the width direction of the substrate is aligned with the width direction of the conveying section, and then intersects with the width direction of the conveying section.

5. The substrate is transported, and the position of the transported substrate is adjusted so that the entire width of the substrate falls within a specified range. Using a discharge nozzle in which the discharge port is located outside the width direction of the substrate relative to the specified range, the raw material liquid is discharged from the discharge port of the discharge nozzle toward the substrate being transported so that its entire width is within the specified range, thereby coating the surface of the substrate with the raw material liquid. A film formation method comprising the following:

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