Apparatus for cleaning pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or EUV exposure masks

Abstract

The present invention relates to an apparatus 10 for cleaning a pot-shaped hollow body 12, in particular a transport container 30 for semiconductor wafers or EUV exposure masks, the apparatus 10 comprising: a base wall 20 on which the hollow body 12 can be placed by means of a peripheral surface 38; a locking device 26 for sealingly and removably connecting the hollow body 12 to the base wall 20; at least one through-opening 24 formed by the base wall 20 and arranged radially inside the locking device 26; a cleaning device 40 for discharging a first cleaning fluid for cleaning an inner surface 33 of the hollow body 12 when the hollow body 12 is connected to the base wall 20; and a first discharge channel 70 having a first end 72, which is exclusively in fluid communication with the through-opening 24 by means of its first end 72, and which can be used to discharge the first cleaning fluid discharged from the cleaning device 40 (Figure 1).

Description

[Technical field]

[0001] The invention relates to an apparatus for cleaning pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or for EUV exposure masks. [Background technology]

[0002] Today, the manufacture of highly integrated electronic circuits and other sensitive semiconductor elements is carried out in factories in which so-called semiconductor wafers pass through numerous processing steps, the majority of which are carried out in clean spaces that are kept free of contaminants, and in particular free of particles, at great expense, particularly because particles coming into contact with the semiconductor material of the semiconductor wafers can affect the material properties of the semiconductor wafers in such a way that the entire production batch becomes defective, unusable and must be discarded.

[0003] As the integration density of semiconductor circuits increases, it becomes increasingly important to keep them clean, and as the size of the clean space increases, the burden of keeping them clean grows exponentially, so that semiconductor wafers are not transported in an "open" form from one processing station to the next. Instead, special transport containers (so-called FOUPs, Front Open Unified Pods) are used. These are understood to be loaf-pan shaped transport containers in which a number of semiconductor wafers can be placed. FOUPs are usually closed by a removable lid. Without a lid, the FOUP has the basic shape of a pan with a square base. If the FOUP is closed by its lid, the semiconductor wafers contained therein can be transported from one clean space to another in a protected manner from the outside world. When the FOUP reaches a processing station, it is opened and the semiconductor wafers are removed and processed accordingly. After the processing has been carried out, the semiconductor wafers are transported back to the FOUP and transferred to the next processing station.

[0004] Because of the large production losses that can occur if the semiconductor wafers are contaminated, the FOUP must be cleaned from time to time. The FOUP is contaminated by dust from the semiconductor wafers, especially when the wafers are transferred into and removed from the FOUP.

[0005] Significantly, the same is true for transport containers for EUV (Extreme Ultra-Violet Radiation) exposure masks, which are used to manufacture very small integrated circuits. Similar situations arise when EUV exposure masks, like semiconductors, must be transported. In the following, wherever FOUPs are mentioned, the statements about them also apply to transport containers for EUV exposure masks.

[0006] Apparatuses for cleaning FOUPs are well known, for example, from Patent Documents 1 to 3.

[0007] In such an apparatus, the FOUP is cleaned both on its inner surface and on its outer surface. The outer surface of the FOUP is usually cleaned significantly more than the inner surface. As a result, the cleaning fluid picks up both particles originating from the outer surface and from the inner surface during the cleaning process. They can therefore be transported from the outer surface to the inner surface. However, a satisfactory cleaning result is only achieved if the number of particles falls below a certain value. For particles originating from the outer surface, the cleaning process must be carried out for a correspondingly long time in order to be able to remove a sufficient amount of particles. This is disadvantageous in that, on the one hand, a relatively large amount of cleaning fluid is required and, on the other hand, the FOUP cannot be used for transporting semiconductor wafers during the cleaning process. This increases the production costs of the semiconductor wafers. In addition, the cleaning of the outer surface only contributes to a reduction in defective semiconductor wafers. [Prior art documents] [Patent documents]

[0008] [Patent Document 1] US Patent Publication No. 5,238,703 [Patent Document 2] International Patent Publication No. 2005 / 001888 [Patent Document 3] European Patent Registration No. 1899084 Summary of the Invention [Problem to be solved by the invention]

[0009] The object of an embodiment of the invention is to propose a device for cleaning pot-shaped hollow bodies, which allows cleaning the hollow bodies within a short time by simple and inexpensive means. [Means for solving the problem]

[0010] This problem is solved by the features of claim 1. Advantageous embodiments are the subject of the dependent claims.

[0011] One embodiment of the invention relates to an apparatus for cleaning a pot-shaped hollow body, in particular a transport container for semiconductor wafers or EUV exposure masks, which hollow body comprises: a bottom wall and one or more side walls defining a hollow interior surface; an opening in the bottom wall surrounded by a peripheral surface of the side wall; having This device, a base wall on which the hollow body can be placed, the base wall having a peripheral surface; a locking device for sealing the hollow body by a peripheral surface and for allowing the hollow body to be removably connected to a base wall; At least one through hole formed by the base wall and positioned radially inward of the locking device; a cleaning device capable of delivering a first cleaning fluid for cleaning the inner surface of the hollow body when the hollow body is connected to the base wall; a first exhaust flow passage having a first end; The first discharge flow passage is in fluid communication exclusively with the through hole at its first end and can be used to drain the first cleaning fluid discharged from the cleaning device.

[0012] For cleaning, the hollow body is placed on the base wall by its peripheral surface, whereby the opening of the hollow body and the through-hole of the base wall are in direct contact with each other. It is therefore possible to introduce a first cleaning fluid into the hollow body and thus to clean the inner surface of the hollow body. Due to the fact that the locking device is configured in such a way that the hollow body is not only fixed but also sealed against the base wall by its peripheral surface, the first cleaning fluid cannot leave the inner space of the hollow body. There is therefore no possibility of the first cleaning fluid being contaminated by particles present outside the hollow body. The first cleaning fluid therefore serves only to clean the inner surface of the hollow body, which, as mentioned at the outset, is usually significantly less contaminated than the outer surface of the hollow body. As a result, the first cleaning fluid is not contaminated by particles originating from the outer surface of the hollow body, whereby the inner surface of the hollow body is effectively cleaned. This peripheral surface is the part that separates the inner surface of the hollow body from the outer surface of the hollow body when the hollow body is placed on the base wall. This peripheral surface also provides a seal of the hollow body against the base wall. The time required for cleaning the inner surface of the hollow body can be significantly reduced in comparison with the devices known from the prior art. Furthermore, the amount of first cleaning fluid required for cleaning the inner surface of the hollow body is likewise reduced.

[0013] In one alternative embodiment, the first exhaust channel is connected by its first end to the base wall and surrounds the through hole. This embodiment reduces the structural burden required for the preparation of the device. In particular, the first exhaust channel can be made integral with the base wall or connected thereto, for example by welding.

[0014] In one improved embodiment, the first discharge channel can widen in a funnel shape towards its first end. Due to the first discharge channel widening in a funnel shape towards its first end, the difference in diameter between the through opening and the first discharge channel can be easily levelled out, which reduces the structural load. Furthermore, no abrupt diameter changes occur, which can cause flow disturbances, for example in the form of turbulence. This disturbance can cause the deposition of particles, which can slow down or even prevent the discharge of particles altogether, so that the cleaning of the inner surface of the hollow body is adversely affected.

[0015] In one improved embodiment, the first discharge channel can terminate at its first end flush with the through opening, so that no dead spaces arise in which particles can accumulate and whereby cleaning of the internal surface of the hollow body can be adversely affected.

[0016] In one alternative embodiment, the cleaning device can comprise a first cleaning head that protrudes beyond the through opening. In this embodiment, the first cleaning head can be inserted into the interior space of the hollow body. As a result, the distance between the first cleaning head and the inner surface of the hollow body can be reduced. The pressure for pushing the cleaning fluid out of the first cleaning head also acts on the inner surface of the hollow body with only small losses, so that particles present on the inner surface of the hollow body can be particularly effectively removed.

[0017] One improved embodiment is characterized in that the first cleaning head is rotatably and / or translatably movable. Due to the mobility of the cleaning head, the geometrical characteristics of the inner surface of the hollow body can be adapted. In particular, it is possible to spray the first cleaning fluid at least approximately perpendicularly to the inner surface of the hollow body, so that the kinetic energy of the first cleaning fluid can be utilized particularly effectively for cleaning the inner surface of the hollow body.

[0018] In one improved embodiment, the first cleaning head comprises a certain number of first cleaning nozzles, through which the first cleaning fluid can be released at a spray angle, in which case the first cleaning head comprises an adjustment device that allows the spray angle to be adjusted. The spray angle at which the first cleaning fluid is released also determines the angle at which this cleaning fluid hits the inner surface of the hollow body. An angle of 90° or approximately 90° is ideal. Due to the fact that the spray angle is adjustable, the geometric shape of the inner surface of the hollow body can be followed, to the effect that the first cleaning fluid can be sprayed at an angle of 90° or approximately 90° almost over the entire inner surface of the hollow body. The inner surface of a hollow body usually has distorted spots, as a result of which shadows can occur, whereby with non-adjustable cleaning nozzles the first cleaning fluid cannot be sprayed with sufficient kinetic energy on the inner surface of the hollow body or only a limited amount of the first cleaning fluid can be sprayed. In this embodiment, such shadows can be prevented, which results in an overall improved cleaning result.

[0019] An improved embodiment can provide that the first cleaning nozzles can be opened and closed independently of one another. If one of the first cleaning nozzles is open, the first cleaning fluid can be discharged, which is not possible in the closed state. It is thus possible to clean the inner surface of the hollow body in such a way that first the expected cleaner parts are cleaned and then only the more contaminated parts are cleaned. This can reduce the first cleaning fluid from being loaded with particles detached from the inner surface of the hollow body for as long as possible. In particular, it is thereby prevented that relatively clean parts are cleaned with an already high load of the first cleaning fluid. In many cases, the capacity of the first cleaning fluid to accept particles decreases with increasing load. In extreme cases, particles from the first cleaning fluid can even be deposited on relatively clean parts of the inner surface of the hollow body. This can be prevented by a corresponding drive of the first cleaning nozzle.

[0020] Furthermore, only a selected portion of the inner surface of the hollow body can be cleaned and the number of collected particles can be counted. This particle count can be repeated as often as necessary to provide representative information. This makes it possible to ascertain whether a higher than average number of particles was deposited on the inner surface of the hollow body during a selected manufacturing process of semiconductor wafers. From this, certain defects or possible improvements of the manufacturing process can be inferred.

[0021] An embodiment is characterized in that the device comprises at least one coupling unit for coupling sound waves into the first cleaning fluid. In this case, the sound waves can in particular be configured as ultrasonic or hypersonic. By definition, ultrasonic waves have a frequency range of approximately 20 kHz to 500 kHz, whereas hypersonic waves have a frequency range of approximately 500 kHz to 3 MHz. In this case, it is conceivable to completely wet the inner surface of the hollow body with the first cleaning fluid or to fill the entire space enclosed by the inner surface of the hollow body in order to couple the sound waves into the first cleaning fluid. The first cleaning fluid then serves to transmit the sound waves. Due to the fact that a defined amount of energy is thereby applied to the first cleaning fluid, the particles adhering to the inner surface of the hollow body can thereby be particularly well detached, so that the cleaning effect is improved. The energy input increases with the frequency of the coupled sound. When using hypersonic waves, the advantage is obtained that the energy can be applied in a very precisely targeted manner close to the inner surface of the hollow body to be cleaned, so that good cleaning results can be achieved.

[0022] In one improved embodiment, at least some of the coupling units can be integrated into or work in cooperation with at least some of the first cleaning nozzles, which can then be configured as so-called "megasonic nozzles" capable of coupling sound waves into the first cleaning fluid emitted by the first cleaning nozzles, such that it is no longer necessary to wet the entire inner surface of the hollow body with the first cleaning fluid, thereby reducing the amount of first cleaning fluid required.

[0023] In one alternative embodiment, the cleaning device comprises a supply channel for supplying a first cleaning fluid to the first cleaning head, the first drain channel and the supply channel being at least partially combined in one fluid conducting unit. In this case, however, the supply channel and the drain channel remain fluidically separated. In this case, the supply channel and the drain channel can be configured as lines and / or tubes. By combining the first drain channel and the supply channel in one fluid conducting unit, construction space can be saved and therefore the device can be configured compact. Furthermore, the number of components of the device can be reduced, which reduces the manufacturing burden.

[0024] In one further embodiment, a first channel is arranged in the base wall, by means of which a cleaning fluid can be guided to the peripheral surface. In particular, nitrogen or compressed air, particularly preferably very clean dry air, also called XCDA, is used as the cleaning fluid. This prevents the first cleaning fluid from reaching the outer surface of the hollow body via the peripheral surface and there mixing with the second cleaning fluid. Furthermore, it prevents the second cleaning fluid from reaching the inner surface of the hollow body via the peripheral surface and there mixing with the first cleaning fluid. This prevents contamination.

[0025] A further embodiment is characterized in that a particle measuring device is arranged in the first discharge flow path for measuring particles contained in the first cleaning fluid. The particle measuring device can be configured, for example, to measure the number of particles passing through the particle measuring device through the first discharge flow path at a given volumetric flow rate of the first cleaning fluid. If the number of counted particles falls below a certain value, it can be assumed that the inner surface of the hollow body is sufficiently cleaned. With the particle measuring device, it is ensured, on the one hand, that the inner surface of the hollow body is actually sufficiently cleaned, and, on the other hand, the cleaning process can be stopped in this case. In devices known from the prior art, the cleaning process is carried out for as long as it can be assumed with sufficient probability that the hollow body is sufficiently cleaned. In most cases, for safety reasons, the cleaning process is carried out significantly longer than necessary. Due to the aforementioned ability to stop the cleaning process according to this embodiment, both the time and the amount of first cleaning fluid are reduced, so that the cleaning process can be carried out significantly more efficiently than in the prior art. Furthermore, the particle measuring device also allows documentation as to whether a given FOUP is actually sufficiently cleaned.

[0026] In one improved embodiment, the hollow body comprises a lid having an inner lid surface and an outer lid surface, by means of which the opening can be closed, in which case a cleaning opening which is at least partially closeable by means of a closure is arranged in the base wall or in a further wall part, the closure comprising a receiving unit for receiving the lid of the hollow body, and the cleaning device comprises a further first cleaning head by means of which a first cleaning fluid for cleaning can be sprayed onto the inner surface of the lid when the cleaning opening is closed by the closure or the lid.

[0027] The above-described embodiment of the device relates to the cleaning of the inner surface of the hollow body. As mentioned above, the FOUP is closed by means of a removable lid. However, just like the inner surface of the hollow body, particles may accumulate on the inner surface of this lid, which may have a detrimental effect on the production of semiconductor wafers. However, in this embodiment, the device comprises a separate first cleaning head, by means of which the inner surface of the lid can be cleaned. For this purpose, the same first cleaning fluid is used as is also used for cleaning the inner surface of the hollow body. However, if deemed necessary, a different cleaning fluid can also be used. Thus, particles on the inner surface of the lid can be removed as well. In order to prevent the first cleaning fluid from flowing out of the cleaning opening in an uncontrolled manner, the cleaning opening must be sealed during the cleaning process. For this purpose, either the lid or the closing body works in cooperation with the base wall or another wall part so that the cleaning opening is sealed. In this case, the cleaning opening can be arranged in such a way that particles from the surroundings of the hollow body cannot reach the first cleaning fluid during the cleaning process. In this case, it is conceivable to drain the first cleaning fluid via a first drainage channel. In this case, the receiving unit of the closure works in cooperation with the outer surface of the lid, so that the inner surface of the lid is unhinderedly accessible, in particular for the first cleaning fluid.

[0028] A further embodiment provides that the closure is fixed to the base wall or another wall part in such a way that it is movable between an open position in which the closure opens the cleaning opening and a closed position in which the closure closes the cleaning opening. In this embodiment, the closure can be particularly well fitted to the handle of the lid. In the open position, a gripping robot or equivalent can fit the lid into a receiving unit of the closure. This receiving unit comprises fastening means by which the lid can be removably fastened to the closure. After the gripping robot has removed the lid and the lid has been fastened to the closure, the closure is moved to the closed position. In the closed position, the cleaning opening is sealed, so that a cleaning process on the inner surface of the lid can be started. After the end of the cleaning process, the closure is again moved to the open position and the connection between the closure and the lid is released, so that the gripping robot can remove the lid from the receiving unit. In this case, it is conceivable to fasten the closure to the base wall or another wall part in a rotatable manner.

[0029] A further embodiment provides that the device can comprise a second flow path, by means of which the cleaning fluid can be guided to the lid. The lid of the transport vessel is usually provided with a lid gasket, by means of which the lid can be sealed against the rest of the transport vessel. As cleaning fluid, in particular nitrogen or compressed air, particularly preferably very clean dry air, also called XCDA, is used. By means of this cleaning fluid, it is possible to achieve a precise limitation of the action area of ​​the first cleaning fluid for cleaning the inner surface of the lid. In this case, the limitation area can be selected such that the first cleaning fluid cannot reach the lid gasket. This prevents particles present in the first cleaning fluid and which may adhere to the gasket from being dislodged from the gasket during operation of the transport vessel and thus damaging the semiconductor wafer. When a gas is used, turbulence is generated, which promotes active blowing or cleaning of the gasket.

[0030] In another embodiment, where the bottom wall and the side wall form the outer surface of the hollow body, the cleaning device comprises a second cleaning head, by means of which a second cleaning fluid can be discharged for cleaning the outer surface of the hollow body. In this case, the device comprises a second discharge channel, by means of which the second cleaning fluid discharged from the second cleaning head can be discharged. As mentioned at the beginning, it is also not necessary to clean the outer surface of the hollow body. Nevertheless, this can be desirable, for example, to reduce particle deposition in the clean space. In this embodiment, it is possible to clean the outer surface of the hollow body, the second cleaning fluid being discharged separately from the first cleaning fluid. A mixing of the first and second cleaning fluids and a resulting increase in particle deposition due to particles originating from the outer surface of the hollow body is prevented, which is not possible with devices according to the prior art. Thus, even when both the inner surface of the hollow body and the outer surface of the hollow body are cleaned, it is prevented that particles originating from the outer surface of the hollow body can reach the inner surface of the hollow body. Therefore, the cleaning process of the inner surface of the hollow body is not adversely affected by particles originating from the outer surface of the hollow body.

[0031] Typically, the particle load on the inner surface of the hollow body is less than on the outer surface of the hollow body. Separate discharge of the first and second cleaning fluids allows the first cleaning fluid to be reused to clean the outer surface of the hollow body. In this case, the load (or particle load) in the first cleaning fluid can first be measured to determine whether the load of the first cleaning fluid is low enough to clean the outer surface of the hollow body to the required extent. If this is possible, the amount of cleaning fluid and therefore the cleaning costs can be reduced.

[0032] In one improved embodiment, the device comprises a housing which together with the base wall encloses a process space, the process space being accessible via a housing opening which can be closed by a cover. The hollow body can be brought into the process space through the housing opening and removed again. In this embodiment, it is possible to guide the second cleaning fluid in a defined manner to prevent its dispersion in an uncontrolled manner in the device.

[0033] In one improved embodiment, the base wall can have a certain number of through holes, which are arranged radially outside the locking device, by means of which the second discharge channel is connected in a fluid-tight manner with the process space. Depending on the embodiment of the hollow body, the through holes can also be realized as through slits. The second cleaning fluid can be removed in a controlled manner from the process space via the second discharge channel, without the second cleaning fluid mixing with the first cleaning fluid.

[0034] One improved embodiment is characterized in that the second cleaning head is configured in a U-shape and is rotatably and / or translatably movable in the process space. Due to the U-shaped configuration of the second cleaning head, the second cleaning fluid can be guided both to the bottom wall and to the side wall. Due to the mobility of the second cleaning head, a flexible adaptation to the geometrical characteristics of the outer surface of the hollow body to be cleaned can be achieved.

[0035] In one alternative embodiment, the first cleaning head, the further first cleaning head and / or the second cleaning head are provided with at least one drying nozzle and / or infrared diode. In this embodiment, the device proposed here can be used not only for cleaning the hollow body, but also for the subsequent drying. To end the cleaning process, the supply of the first cleaning fluid or the first and second cleaning fluid is stopped and instead a drying gas for drying the hollow body, for example air or nitrogen, is transferred through the fluid guiding unit. For this purpose, the hollow body has a correspondingly configured port, in particular a negative pressure port, via which a negative pressure can be generated in the hollow body in order to suck the drying gas into the hollow body and then remove it again from there. A pipe, also called a snorkel, can be connected to this port, for example, which can be connected to a vacuum pump. In this case, the position of the hollow body in the device remains unchanged. Depending on the embodiment, both the inner surface of the hollow body and the outer surface of the hollow body can be dried. In this case, no mixing of the drying gas used on the inner surface of the hollow body with the drying gas used on the outer surface of the hollow body occurs.

[0036] Additionally, it is possible to provide the second cleaning nozzle and the second cleaning head with the same features as the first cleaning nozzle and the first cleaning head, and vice versa, as long as it serves the purpose of the present invention.

[0037] Alternatively or additionally, infrared diodes can be used, the advantage being that the light emitted by them occurs within a restricted narrow frequency band that is optimal for the cleaning fluid used: any residues of cleaning fluid still remaining on the inner surface of the hollow body or on the outer surface of the hollow body are heated very effectively and thus eliminated.

[0038] One embodiment of the invention relates to the use of the device according to one of the above-mentioned embodiments for cleaning transport containers for semiconductor wafers. The technical effects and advantages that can be achieved by the proposed use are the same as those discussed for the device. To summarize, it should be noted that the time required for cleaning the inner surface of the hollow body can be significantly reduced compared to the devices known from the prior art. Furthermore, the amount of first cleaning fluid required for cleaning the inner surface of the hollow body is likewise reduced. These advantages are particularly applicable during the production of semiconductor wafers.

[0039] One embodiment of the invention relates to a method for cleaning a pot-shaped hollow body, in particular a transport container for semiconductor wafers or EUV exposure masks, using an apparatus according to one of the above-mentioned embodiments, which method comprises the steps of: placing the hollow body on a base wall by means of a peripheral surface; sealingly and releasably connecting the hollow body to the base wall using a locking device, the hollow body being sealed against the base wall by a peripheral surface; using a first cleaning head of the cleaning device to emit a first cleaning fluid for cleaning the inner surface of the hollow body and discharging the first cleaning fluid using a first discharge flow path; using a second cleaning head of the cleaning device to emit a second cleaning fluid for cleaning the outer surface of the hollow body and using a second discharge passage to discharge the second cleaning fluid; or A process that is both has.

[0040] The technical effects and advantages that can be achieved by the method proposed here are the same as those discussed with respect to the present device. To summarise, it should be noted that the inner surface of the hollow body and the outer surface of the hollow body can be cleaned independently of each other. Contamination of the first cleaning fluid used for cleaning the inner surface of the hollow body with particles detached from the outer surface of the hollow body is precluded. Furthermore, the method proposed here allows either cleaning of only the outer surface of the hollow body or cleaning of only the inner surface of the hollow body, if this is desired. Furthermore, the outer surface of the hollow body can be cleaned in a shorter time than the inner surface of the hollow body. In addition to this, it is also possible to clean both the outer surface of the hollow body and the inner surface of the hollow body simultaneously.

[0041] In one alternative configuration, the method includes: moving the closure to an open position; placing the lid on the receiving unit of the closure with the lid outer surface to releasably secure the lid to the closure; moving the closure to a closed position; using a separate first cleaning head to emit a first cleaning fluid for cleaning the interior surface of the lid; has.

[0042] The lid can be placed on the receiving unit, for example, by means of a gripping robot. In the open position, the receiving unit is easily accessible, so that the lid can be quickly and easily placed and removed without the gripping robot having to perform complex movements. In the closed position, guidance of the first cleaning fluid is ensured, so that mixing with the second cleaning fluid is prevented for the reasons mentioned above. It should be noted that it is also possible to operate the proposed device in such a way that only the lid is cleaned, and not the hollow body. In this case, the through opening can be closed by means of a closing part.

[0043] In one alternative configuration, the method comprises: Hollow body Insidecompletely filling the space defined by the first cleaning fluid; coupling acoustic waves into the first cleaning fluid using an in-coupling unit; It is stipulated that the

[0044] The sound waves can be coupled in, for example, in the form of ultrasonic waves or hypersonic waves, thereby introducing energy into the first cleaning fluid which serves to loosen particles on the inner surface of the hollow body, thereby improving the cleaning result. The inner surface of these lids and the outer surface of the hollow body can be treated accordingly.

[0045] In one improved configuration, the method comprises: coupling acoustic waves into a first cleaning fluid emitted from a first cleaning nozzle using an input coupling unit, the input coupling unit being integrated into or operating in cooperation with the first cleaning nozzle; has.

[0046] In this configuration, sound waves can also be coupled in as ultrasonic or hypersonic waves. For the reasons mentioned above, the cleaning result is also improved in this configuration. However, since it is not necessary to fill the space defined by the inner surface of the hollow body, the required amount of first cleaning fluid can be correspondingly reduced. The inner surfaces of these lids and the outer surfaces of the hollow body can be treated accordingly.

[0047] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. [Brief description of the drawings]

[0048] [Figure 1] FIG. 1 shows a main cross-sectional view of an embodiment of an apparatus for cleaning a pot-shaped hollow body, in particular a carrier container for semiconductor wafers or for EUV exposure masks. [Diagram 2] A not-to-scale enlargement of cross section A defined in Figure 1. [Diagram 3] Not to scale enlargement of section B defined in Figure 1 DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0049] In Fig. 1, an embodiment of the proposed device 10 for cleaning a pot-shaped hollow body 12 is shown in a main cross-section. The device 10 has a housing 14 which forms a closable housing opening 16 by means of a cover 18 which can be removed from the housing 14. In addition to this, a base wall 20 is arranged in the housing 14, so that a closed process space 22 is realized in the housing 14. This process space 22 is defined by the base wall 20, the housing 14 itself and the cover 18. The base wall 20 is formed with a through-opening 24, and a locking device 26 is arranged radially outside the through-opening 24. In the illustrated embodiment, two through-holes 28 are provided in the base wall 20 radially outside the locking device 26.

[0050] When the cover 18 is removed, the hollow body 12, in particular a transport container 30 for semiconductor wafers, also called FOUP, or a transport container 30 for EUV exposure masks, can be brought into the process space 22. The hollow body 12 has a bottom wall 32 and in this case four side walls 34, so that the pot-shaped hollow body 12 is formed approximately in the shape of a rectangular parallelepiped. However, it is quite possible to define the pot-shaped hollow body 12 with other, for example cylindrical, geometric shapes. The bottom wall 32 and the four side walls 34 form an inner surface 33 of the hollow body and an outer surface 35 of the hollow body.

[0051] The hollow body 12 has an opening 36 which is arranged opposite the bottom wall 32 and which is surrounded by a peripheral surface 38 formed by the side walls. In the illustrated embodiment, in the region of this peripheral surface 38, the hollow body 12 is realized in the form of a flange. This peripheral surface 38 can be used to place the hollow body 12 on the base wall 20. In the illustrated embodiment, the through opening 24 in the base wall 20 and the opening 36 in the hollow body 12 are at least approximately of the same size and of the same geometric shape.

[0052] Furthermore, the locking device 26 is configured such that the through opening 24 and the part of the inner surface 33 of the hollow body which communicates with the through opening 24 are at least approximately flush with each other.

[0053] In Fig. 2, the characteristic area A in Fig. 1 is shown enlarged and not to scale, and does not correspond exactly. For reasons of illustration, this locking device 26 is not shown. From Fig. 2, it can be seen that the base wall 20 has a base wall portion 37 which forms a contact surface 39 which contacts the peripheral surface 38 of the carrier vessel 30. In this case, the contact surface 39 of the base wall portion 37 is completely covered by the peripheral surface 38. In this base wall portion 37, a first channel 41 is arranged which merges into the contact surface 39 and which can be used to guide a cleaning fluid, for example air or nitrogen, to the peripheral surface 38.

[0054] In addition to this, the apparatus 10 comprises a cleaning device 40, which comprises a first cleaning head 42 protruding beyond the through opening 24 and thus arranged in the process space 22. The first cleaning head 42 is surrounded by the hollow body 12 when the hollow body 12 is connected to the base wall 20.

[0055] The housing 14 further comprises a wall portion 44 in which a flushing opening 46 is arranged. The wall portion 44 is on the side of the base wall 20 facing away from the locking device 26. The flushing opening 46 can be at least partially closed by means of a closure body 48 which is fixed to the wall portion 44 in a rotatable manner about a first axis of rotation D1 by means of a drive unit (not shown). The closure body 48 can be moved between an open position in which the closure body 48 opens the flushing opening 46 and a closed position in which the closure body 48 at least partially closes the flushing opening 46. In FIG. 1 the closure body 48 is in the closed position.

[0056] The closure 48 comprises a receiving unit 50 by means of which a lid 52 can be removably fixed to the closure 48, with which the hollow body 12 can be closed. The lid 52 forms an inner lid surface 54 and an outer lid surface 56. In this case, the inner lid surface 54 is the side of the lid 52 with which the inner surface 33 of the hollow body directly joins when the hollow body 12 is closed with the lid 52. In other words, in this case, the inner lid surface 54 faces towards the bottom wall 32 of the hollow body 12.

[0057] In the embodiment shown, the storage unit 50 is realized to cooperate with the lid 52 only by means of the outer surface 56 of the lid.

[0058] In Fig. 3, the characteristic area B in Fig. 1 is shown enlarged and not to scale, and does not correspond exactly. It can be seen that the housing gasket 51 is arranged in the housing 14 in contact with and surrounding the cleaning opening 46. When the closure body 48 is in the closed position, the lid 52 works in cooperation with the housing gasket 51. To this extent, the cleaning opening 46 is closed and sealed with the lid 52. In view of this background, it is to be understood that the information presented is that the closure body 48 at least partially closes the cleaning opening 46. However, it is also conceivable that the closure body 48 works in cooperation with the housing gasket 51 to completely seal the cleaning opening 46.

[0059] 3, the lid 52 is provided with a lid gasket 53, which can be used to seal the transport container 30 when the lid 52 is connected to the transport container 30. Furthermore, a flow path part 55 is arranged on the housing 14, which forms a second flow path 57 together with the housing 14, and which can be used to guide a cleaning fluid, for example air or nitrogen, to the lid 52. The flow path part 55 is configured to form a gap 60 with the lid gasket 53.

[0060] Additionally, the cleaning device 40 includes a separate first cleaning head 58 that is positioned adjacent the closure 48 when the closure is in the closed position.

[0061] Furthermore, the cleaning device 40 comprises a second cleaning head 64, which is configured approximately U-shaped and is arranged at least partially inside the process space 22. However, in the case where the hollow body 12 is connected to the base wall 20 as shown in FIG. 1, the second cleaning head 64, unlike the first cleaning head 42, is arranged outside the hollow body 12. This second cleaning head 64 is rotatable about a second rotation axis D2, the drive device used for this is not shown. Furthermore, an embodiment is not shown in which the second cleaning head 64 is movable not only in a rotational manner, but also in a translational manner or only in a translational manner. In the illustrated embodiment, the first cleaning head 42 is not movable, but this cleaning head can also be realized to be rotationally and / or translationally movable.

[0062] The device 10 further comprises a fluid directing unit 66, which can be used to direct the first cleaning fluid to the first cleaning head 42 and the further first cleaning head 58, and the second cleaning fluid to the second cleaning head 64. The fluid directing unit 66 comprises a first supply channel 68, which can be used to direct the first cleaning fluid to the first cleaning head 42.

[0063] For illustrative reasons, a detailed view of the second supply channel that supplies the second cleaning fluid to the second cleaning head 64 has been omitted, but this configuration can be readily deduced by one skilled in the art.

[0064] Furthermore, the fluid directing unit 66 comprises a first discharge channel 70, by means of which the first cleaning fluid discharged from the first cleaning head 42 and the first further cleaning head 58 can be discharged again from the process space 22. The first discharge channel 70 has a first end 72 in fluid communication with the through opening 24. As is clear from FIG. 1, the first discharge channel 70 widens in a funnel shape towards its first end 72 and is connected to the base wall 20 in such a way that the first end 72 of the discharge channel ends flush with the through opening 24.

[0065] In this first discharge channel 70 a first particle measuring device 741 is arranged, by means of which particles present in the first cleaning fluid and originating from the inner surface 33 of the hollow body can be measured, in particular counted. Furthermore, in the associated channel 742 a second particle measuring device 742 is arranged, by means of which particles present in the first cleaning fluid and originating from the inner surface 54 of the lid can be measured, in particular counted.

[0066] In addition to this, the fluid guiding unit 66 is provided with a second discharge channel 76, which is constructed substantially identically to the first discharge channel 70, but which is in fluid communication with the two through holes 28. In this case, the first discharge channel 70 forms the radially inner wall of the second discharge channel 76, so that the fluid guiding unit 66 can be constructed very compactly. An embodiment in which a further particle measuring device 74 is arranged in the second discharge channel 76 is not shown. It should be pointed out here that the fluid guiding unit 66 is shown in only a basic form in FIG. 1. Due to the numerous intricate and differently arranged channels, the drawing of the fluid guiding unit 66 according to FIG. 1 does not require precision. However, a person skilled in the art can easily derive from FIG. 1 the functional configuration of the fluid guiding unit 66.

[0067] The device 10 is operated as follows: In an initial state, not shown here, the cover 18 is open and the second cleaning head 64 is rotated 90° relative to Fig. 1 so that the U-shaped portion 64s of the second cleaning head 64 is perpendicular to the plane of Fig. 1. The closure body 48 is in an open position, in which the closure body 48 is oriented substantially horizontally relative to Fig. 1.

[0068] Using a handling device, not shown, for example a gripping robot, the lid 52 is separated from the hollow body 12 and placed on the receiving unit 50. This open hollow body 12 is brought into the process space 22, as shown in FIG. 1, so that the hollow body 12 places its peripheral surface 38 on the base wall 20. The hollow body 12 is then locked by the locking device 26, so that it is connected with the base wall 20 and is therefore fixed in the process space 22. In this case, the locking device 26 comprises a sealing means, not shown here, so that the hollow body 12 is sealed against the base wall 20. The cover 18 is now closed. Furthermore, the receiving unit 50 of the closure body 48 is actuated, so that the lid 52 is fixed to the closure body 48. The closure body 48 is rotated by 90° into the closed position, as shown in FIG. 1. In this case, the lid 52 seals the cleaning opening 46.

[0069] Here, the first cleaning fluid is guided via a first supply channel 68 to the first cleaning head 42 and is released through a first cleaning nozzle 78 so as to clean the inner surface 33 of the hollow body with the first cleaning fluid. The further first cleaning head 58 comprises a further first cleaning nozzle 80, by means of which the first cleaning fluid is sprayed onto the inner surface 54 of the lid, so that this inner surface is cleaned.

[0070] At the same time, a second cleaning fluid, which can be the same as the first cleaning fluid, is guided via a second supply channel, not shown here, to the second cleaning head 64, where it is emitted through a second cleaning nozzle 82 for cleaning the outer surface 35 of the hollow body. In this case, the second cleaning head 64 is rotatable about a second axis of rotation D2.

[0071] The first cleaning nozzle 78, the further first cleaning nozzle 80 and the second cleaning nozzle 82 can be configured in such a way that the spray angle α for the emission of the first and second cleaning fluids is adjustable. For this purpose, the first cleaning nozzle 78, the further first cleaning nozzle 80 and the second cleaning nozzle 82 can be journalled in the form of a spherical head. Alternatively or additionally, in particular, the first cleaning nozzle 78 can be arranged on a cylinder 83 which is rotatable about a third axis of rotation D3, whereby the spray angle α can be adjusted. In any case, the first cleaning head 58 is provided with an adjustment device 85, by means of which the spray angle α can be adjusted. The further first cleaning nozzle 80 and the second cleaning nozzle 82 can be configured accordingly, and the spray angle α for the emission of the first cleaning fluid from the further first cleaning nozzle 80 is likewise adjusted by the adjustment device 85. The adjustment device 85 can be configured in such a way that the spray angle α of the second cleaning nozzle 80 in the second cleaning head 64 can likewise be adjusted. Thereby it can be achieved that the first and second cleaning fluids impinge perpendicularly or nearly perpendicularly on the inner surface 33 of the hollow body and on the inner surface of the lid or the outer surface 35 of the hollow body.

[0072] Furthermore, the device 10 comprises at least one coupling unit 87 for coupling sound waves into the first cleaning fluid. In this case, the coupling unit 87 can also be configured to be able to couple sound waves into the second cleaning fluid. In the illustrated embodiment, some of the coupling units 87 are integrated into at least some of the first cleaning nozzles 78, so-called "megasonic nozzles". Hypersonic waves can be coupled into the first cleaning fluid emitted from the first cleaning nozzles 78. The same can be defined for the further first cleaning nozzles 80 and the second cleaning nozzles 82.

[0073] These first cleaning nozzles 78 can be opened and closed independently of one another. It is therefore possible to first clean different parts of the inner surface 33 of the hollow body and then clean other parts. For example, parts that are less soiled according to the invention can be cleaned first and then parts that are more soiled according to the invention. These further first cleaning nozzles 80 and second cleaning nozzles 82 can be constructed accordingly, so that the inner surface 54 of the first lid and the outer surface 35 of the hollow body can be cleaned accordingly.

[0074] At the same time, a cleaning fluid is guided to the peripheral surface 38 through the first channel 41 or to the lid 52 through the second channel 57, or both. These can be the same cleaning fluid, but it is also possible to guide a first cleaning fluid through the first channel 41 and a second cleaning fluid different from the first cleaning fluid through the second channel 57. The cleaning fluid guided to the peripheral surface 38 through the first channel 41 serves to ensure that neither the first cleaning fluid nor the second cleaning fluid can cross the peripheral surface. It thus achieves a fluidic seal between the first and second cleaning fluids. It is therefore ensured that the first and second cleaning fluids cannot mix. Contamination of the first cleaning fluid by the second cleaning fluid and vice versa is prevented.

[0075] The first cleaning fluid emitted from the first cleaning head 42 and sprayed onto the inner surface 33 of the hollow body is discharged via a first discharge channel 70. The same applies to the first cleaning fluid emitted from the separate first cleaning head 58 and sprayed onto the inner surface 54 of the lid. To discharge the first cleaning fluid used to clean the inner surface 54 of the lid, the first discharge channel 70 comprises an associated channel 84 which merges into the first discharge channel 70.

[0076] The cleaning fluid guided into the lid 52 flows back through the gap 60 into the associated channel 84. The housing gasket 51 prevents the cleaning fluid from being able to reach the surroundings. This prevents the first cleaning fluid, discharged from a separate first cleaning head 58 and applied to the inside surface 54 of the lid, from being able to reach the lid gasket 53, on which particles present in the first cleaning fluid may adhere.

[0077] A sufficiently large pressure can be applied to the cleaning fluid directed against the peripheral surface 38 and / or the lid 52 .

[0078] With the first cleaning fluid, particles present on the inner surface 33 of the hollow body and on the inner surface 54 of the lid are evacuated. The particles originating from the inner surface 33 of the hollow body are detected by the first particle measuring device 741 and the particles originating from the inner surface 54 of the lid are detected by the second particle measuring device. In this case, the first particle measuring device 741 and the second particle measuring device 742 can be configured to measure the number of particles passing through the particle measuring device 74 at a given volume flow rate within a given time. It can then be determined whether the inner surface 33 of the hollow body and the inner surface 54 of the lid have been cleaned to a desired extent. For example, if the inner surface 33 of the hollow body is sufficiently clean, the cleaning process with respect to the hollow body 12 can be stopped, while the cleaning process with respect to the inner surface 54 of the lid is continued. Meanwhile, the hollow body 12 can be removed from the device by the gripping robot, thereby saving time.

[0079] As mentioned above, a further particle measuring device 74 can be arranged in the second discharge channel 76. This further particle measuring device can be used to detect particles originating from the outer surface 35 of the hollow body. This information can also be incorporated in deciding whether the cleaning process for the hollow body 12 can be stopped. If the loading of the first cleaning fluid with particles originating from the inner surface 33 of the hollow body does not exceed a predetermined value, this fluid can also be used to clean the outer surface 35 of the hollow body.

[0080] Not shown is an embodiment in which the particle measuring device 74 is located downstream of the point where the auxiliary channel 84 joins the first discharge channel 70. In this case, it is not possible to distinguish whether the particles originate from the inner surface 54 of the lid or from the inner surface 33 of the hollow body. Nevertheless, the cleaning process can be stopped if the number of particles falls below a predetermined high level.

[0081] The second cleaning fluid emitted from the second cleaning head 64 and sprayed onto the outer surface 35 of the hollow body is discharged via the second discharge channel 76. The first cleaning fluid and the second cleaning fluid are thus discharged separately from each other, so that particles originating from the outer surface 35 of the hollow body cannot reach the first cleaning fluid and therefore the inner surface 33 of the hollow body or the inner surface 54 of the lid.

[0082] Generally, cleaning of the hollow body inner surface 33 and the lid inner surface 54 is of greater importance than cleaning of the hollow body outer surface 35. When it has been determined that the hollow body inner surface 33 and the lid inner surface 54 have been cleaned to the desired extent, the cleaning process can be stopped regardless of the extent to which the hollow body outer surface 35 has already been cleaned.

[0083] Here, the first and second drying gas, for example air or nitrogen, can be guided to the first cleaning head 42, the further first cleaning head 58 and the second cleaning head 64 via the first supply channel 68 or the second supply channel in exactly the same way as the first and second cleaning fluids. However, for this purpose, a negative pressure is generated in the hollow body 12 by connecting a non-illustrated pipe to a negative pressure port 94, which can be connected to a vacuum pump, also not shown. Due to the negative pressure, the first drying gas and / or the second drying gas is sucked into the hollow body 12 and then removed again from it. The first cleaning head 42 comprises a first drying nozzle 86, the further first cleaning head 58 comprises a further first drying nozzle 88 and the second cleaning head comprises a second drying nozzle 90, by means of which the first drying gas or the second drying gas can be emitted and sprayed onto the inner surface 33 of the hollow body, the inner surface 54 of the lid and the outer surface 35 of the hollow body. The first drying gas and the second drying gas push the first cleaning fluid and the second cleaning fluid out of the apparatus 10. Additionally, remnants of the first and second cleaning fluids can be blown away.

[0084] Additionally, the first cleaning head 42, the further first cleaning head 58 and the second cleaning head each include an infrared diode 92 that can be used to heat and vaporize the remainder of the first and second cleaning fluids so that they can be expelled from the apparatus 10 by the first and second drying gases.

[0085] After the drying process is finished, the cover 18 is opened and the closure body 48 is moved into the open position. The cleaned hollow body 12 is removed from the process space 22. The receiving unit 50 is stopped so that the lid 52 can be removed from the closure body 48 and transferred to the hollow body 12 for closing the hollow body.

[0086] Another hollow body 12 to be cleaned can now be handled in the device 10 in the manner previously described. The present application relates to the invention described in the claims, but may also include the following configurations as other aspects. 1. An apparatus (10) for cleaning a pot-shaped hollow body (12), in particular a transport container (30) for semiconductor wafers or EUV exposure masks, comprising: This hollow body (12) is a bottom wall (32) and one or more side walls (34) forming an inner surface (33) of the hollow body; an opening (36) facing the bottom wall (32) and surrounded by a peripheral surface (38) of the side wall (34); having The device (10), a base wall (20) on which the hollow body (12) can be placed by a peripheral surface (38); a locking device (26) for sealing the hollow body (12) by a peripheral surface (38) and for enabling releasable connection to the base wall (20); at least one through opening (24) defined by the base wall (20) and disposed radially inward of the locking device (26); a cleaning device (40) capable of delivering a first cleaning fluid for cleaning the inner surface (33) of the hollow body (12) when the hollow body (12) is connected to the base wall (20); a first exhaust flow passage (70) having a first end (72); Equipped with The device has a first discharge flow path (70) that is fluidly connected exclusively to the through opening (24) at its first end (72), and the first discharge flow path can be used to discharge a first cleaning fluid discharged from the cleaning equipment (40). 2. In the device (10) described in the above paragraph 1, The device includes a first exhaust passage (70) connected by a first end (72) to the base wall (20) and surrounding a through opening (24). 3. In the device (10) according to 1 or 2 above, The device, wherein the first exhaust passage (70) widens in a funnel shape toward its first end. 4. In the device (10) according to any one of 1 to 3 above, The device, wherein the first exhaust passage (70) terminates at a first end (72) thereof flush with the through opening (24). 5. In the device (10) according to any one of 1 to 4 above, The apparatus, wherein the cleaning device (40) comprises a first cleaning head (42) protruding beyond the through opening (24). 6. In the device (10) according to 5 above, The apparatus, wherein the first cleaning head (42) is rotatably and / or translatably movable. 7. In the device (10) according to claim 6, The apparatus, wherein the first cleaning head (42) comprises a certain number of first cleaning nozzles (78) through which a first cleaning fluid can be discharged at a spray angle (α), and the first cleaning head (42) comprises an adjustment device (85) by means of which the spray angle (α) can be adjusted. 8. In the device (10) according to any one of 1 to 7 above, The apparatus (10) comprises at least one in-coupling unit (87) for in-coupling acoustic waves into the first cleaning fluid. 9. In the device (10) according to claim 8, The apparatus, wherein at least some of said input coupling units (87) are integral with or cooperate with at least some of the first wash nozzles (78). 10. In the device (10) according to any one of 1 to 9 above, The cleaning device (40) comprises a supply channel (68) for supplying a first cleaning fluid to a first cleaning head (42), and the discharge channel (70) and the supply channel (68) are at least partially integrated in one fluid directing unit (66). 11. In the device (10) according to any one of 1 to 10 above, The device has a first flow passage (41) disposed in the base wall (20), the flow passage being operable to direct cleaning fluid to the peripheral surface (38). 12. In the device (10) according to any one of 1 to 11 above, The apparatus further includes a particle measuring device (74) disposed in the first discharge flow path (70) for measuring particles contained in the first cleaning fluid. 13. In the device (10) according to any one of the above 1 to 12, the hollow body (12) is provided with a lid (52) having a lid inner surface (54) and a lid outer surface (56), and the opening (36) can be closed by using the lid, A flushing opening (46) is arranged in the base wall (20) or in a further wall section (44), which is at least partially closable by means of a closure (48), which closure (48) comprises a receiving unit (50) for receiving a lid (52) of the hollow body (12), The cleaning device (40) is provided with a separate first cleaning head (58) which can be used to spray a first cleaning fluid for cleaning the inner surface (54) of the lid when the cleaning opening (46) is closed by a closure (48) or lid (52). 14. In the device (10) according to claim 13, The device, wherein the closure (48) is secured to the base wall (20) or another wall portion (44) so ​​as to be movable between an open position in which the closure (48) opens the cleaning opening (46) and a closed position in which the closure (48) or lid (52) closes the cleaning opening (46). 15. 15. The device (10) according to claim 13 or 14, The device (10) comprises a second flow passage (57) by means of which the cleaning fluid can be guided to the lid (52). 16. In the apparatus (10) according to any one of the above 1 to 15, the bottom wall (32) and the side wall (34) form an outer surface (35) of a hollow body, said cleaning device (40) comprising a second cleaning head (64) by means of which a second cleaning fluid can be emitted for cleaning the outer surface (35) of the hollow body; The apparatus (10) includes a second exhaust flow passage (76) that can be used to exhaust the second cleaning fluid emitted from the second cleaning head (64). 17. 17. The device (10) according to claim 16, The apparatus (10) comprises a housing (14) which, together with a base wall (20), encloses a process space (22), the process space (22) being accessible through a housing opening (16) which can be closed by a cover (18). 18. 18. The device (10) according to claim 17, The apparatus, wherein the base wall (20) has a certain number of through holes (28) disposed radially outward of the locking device (26), and the through holes fluidly connect the second exhaust flow passage (76) to the process space (22). 19. 19. The device (10) according to any one of the above 16 to 18, The apparatus, wherein the second cleaning head (64) is U-shaped and is rotatably and / or translatably movable within the process space (22). 20. In the device (10) according to any one of claims 5, 13 and 16, The apparatus, wherein the first cleaning head (42), the further first cleaning head (58) and / or the second cleaning head (64) are equipped with at least one drying nozzle (86, 88, 90) and / or an infrared diode (92). 21. A method for cleaning a pot-shaped hollow body (12), in particular a transport container (30) for semiconductor wafers or EUV exposure masks, using the device according to any one of 1 to 20 above, comprising the steps of: placing the hollow body (12) on the base wall (20) by the peripheral surface (38); sealingly and releasably connecting the hollow body (12) to the base wall (20) using a locking device (26), the hollow body (12) being sealed against the base wall (20) at a peripheral surface; using a first cleaning head (42) of the cleaning device (40) to emit a first cleaning fluid for cleaning the inner surface (33) of the hollow body and discharging the first cleaning fluid using a first discharge passage (70); using a second cleaning head (64) of the cleaning device (40) to emit a second cleaning fluid for cleaning the outer surface (35) of the hollow body and using a second discharge passage (76) to discharge the second cleaning fluid; or and a process comprising both steps. 22. 22. The method according to claim 21, moving the closure (48) to an open position; placing the lid (52) on the receiving unit (50) of the closure (48) by the lid's exterior surface (56) to removably secure the lid (52) to the closure (48); moving the closure (48) to a closed position; and using a separate first cleaning head (58) to emit a first cleaning fluid for cleaning the interior surface (54) of the lid. 23. 23. The method according to claim 21 or 22, completely filling the space defined by the inner surface (33) of the hollow body with a first cleaning fluid; and in-coupling acoustic waves into the first cleaning fluid using an in-coupling unit (87). 24. 23. The method according to claim 21 or 22, and coupling acoustic waves into the first cleaning fluid emitted from the first cleaning nozzle (78) using an input coupling unit (87), the input coupling unit (87) being integral to or operating in cooperation with the first cleaning nozzle (78). [Explanation of symbols]

[0087] 10 This device 12 Hollow body 14. Chassis 16 Housing opening 18 Cover 20 Foundation Wall 22 Process Space 24 Through opening 26 Locking Devices 28 Through hole 30 Transport Containers 32 Bottom wall 33 Inner surface of hollow body 34 Side wall 35 Opening 36 Peripheral surface 40 Cleaning Equipment 42 First cleaning head 44 Wall section 46 Cleaning opening 48 Closed body 50 Containment Units 52 Lid 54 Inside of the lid 56 Outer surface of lid 58 Alternate First Cleaning Head 64 Second Cleaning Head 66 Fluid guide unit 68 First supply channel 70 First discharge flow path 72 First end 74 Particle measuring equipment 76 Second discharge flow path 78 First cleaning nozzle 80 Another first cleaning nozzle 82 Second cleaning nozzle 83 Cylinder 84 Associated Channel 85 Regulatory equipment 86 First Drying Nozzle 87 Input Coupling Unit 88 Another first drying nozzle 90 Second Drying Nozzle 92 Infrared Diode 94 Negative pressure port α Spray angle D1 First rotation axis D2 Second rotation axis

Claims

1. An apparatus (10) for cleaning a pot-shaped hollow body (12) or a transport container (30) as said hollow body (12) for semiconductor wafers or for EUV exposure masks, comprising: This hollow body (12) a bottom wall (32) and one or more side walls (34) forming an inner surface (33) of the hollow body; an opening (36) facing the bottom wall (32) and surrounded by a peripheral surface (38) of the side wall (34); having The device (10), a base wall (20) on which the hollow body (12) can be placed with a peripheral surface (38); a locking device (26) for sealing the hollow body (12) by a peripheral surface (38) and for allowing it to be removably connected to the base wall (20); At least one through opening (24) formed by the base wall (20) and positioned radially inward of the locking device (26); a cleaning device (40) capable of emitting a first cleaning fluid for cleaning the inner surface (33) of the hollow body (12) when the hollow body (12) is connected to the base wall (20); a first exhaust flow passage (70) having a first end (72); Equipped with The device, wherein the first discharge passage (70) is in fluid communication with the through opening (24) exclusively by its first end (72), and the first discharge passage can be used to discharge a first cleaning fluid discharged from the cleaning device (40), The device is characterized in that a first channel (41) arranged in said base wall (20) can be used to guide a cleaning fluid to said peripheral surface (38).

2. The device (10) according to claim 1, The device, characterized in that the first discharge channel (70) is connected by its first end (72) to the base wall (20) and surrounds a through opening (24).

3. The device (10) according to claim 1 or 2, The apparatus according to claim 1, wherein said first exhaust passage (70) widens in a funnel shape toward its first end.

4. The device (10) according to any one of claims 1 to 3, The device according to claim 1, wherein said first discharge passage (70) terminates at its first end (72) flush with the through opening (24).

5. The device (10) according to any one of claims 1 to 4, The apparatus is characterized in that the cleaning device (40) comprises a first cleaning head (42) protruding beyond the through opening (24).

6. The device (10) according to any one of claims 1 to 5, The apparatus, characterized in that the first cleaning head (42) is rotatably and / or translatably movable.

7. The device (10) according to claim 6, CHARACTERIZED IN THAT said first cleaning head (42) comprises a number of first cleaning nozzles (78) through which a first cleaning fluid can be emitted at a spray angle (α), and that said first cleaning head (42) comprises an adjustment device (85) by means of which the spray angle (α) can be adjusted.

8. The device (10) according to any one of claims 1 to 7, 10. The apparatus (10), characterized in that it comprises at least one in-coupling unit (87) for in-coupling acoustic waves into the first cleaning fluid.

9. The device (10) according to claim 8, 4. An apparatus according to claim 3, wherein at least some of said input coupling units (87) are integrated with or cooperate with at least some of said first cleaning nozzles (78).

10. The device (10) according to any one of claims 1 to 9, The cleaning device (40) comprises a supply channel (68) for supplying a first cleaning fluid to a first cleaning head (42), the discharge channel (70) and the supply channel (68) being at least partially integrated in one fluid directing unit (66).

11. The device (10) according to any one of claims 1 to 10, The apparatus further comprises a particle measuring device (74) disposed in the first discharge flow path (70) for measuring particles contained in the first cleaning fluid.

12. The device (10) according to any one of claims 1 to 11, the hollow body (12) comprises a lid (52) having an inner lid surface (54) and an outer lid surface (56), the opening (36) being closable by means of the lid; In the further wall section (44) a flushing opening (46) is arranged which is at least partially closable by means of a closure (48), which closure (48) comprises a receiving unit (50) for receiving a lid (52) of the hollow body (12), The cleaning device (40) comprises a separate first cleaning head (58) by means of which the first cleaning fluid can be sprayed onto the inner surface (54) of the lid (52) for cleaning when the cleaning opening (46) is closed by a closure (48) or a lid (52).

13. The device (10) according to claim 12, The device is characterized in that the closure (48) is fixed to the further wall part (44) so ​​as to be movable between an open position in which the closure (48) opens the cleaning opening (46) and a closed position in which the closure (48) or a lid (52) closes the cleaning opening (46).

14. The device (10) according to claim 12 or 13, The device (10) is characterized in that it comprises a second flow passage (57) by means of which the cleaning fluid can be guided to the lid (52).

15. The device (10) according to any one of claims 1 to 14, The bottom wall (32) and the side wall (34) form the outer surface (35) of the hollow body; said cleaning device (40) comprising a second cleaning head (64) by means of which a second cleaning fluid can be emitted for cleaning the outer surface (35) of the hollow body; The apparatus (10) comprises a second discharge flow path (76) which can be used to discharge the second cleaning fluid emitted from the second cleaning head (64).

16. The device (10) according to claim 15, The apparatus (10) comprises a housing (14) which, together with a base wall (20), encloses a process space (22), the process space (22) being accessible through a housing opening (16) which can be closed by a cover (18).

17. The device (10) according to claim 16, the base wall (20) having a number of through holes (28) arranged radially outside the lock device (26), by means of which the second discharge channel (76) is fluidly connected with the process space (22).

18. The device (10) according to any one of claims 15 to 17, The apparatus, characterized in that the second cleaning head (64) is U-shaped and movable in a rotational and / or translational manner within the process space (22).

19. An apparatus (10) according to claim 5, claim 12 or claim 15, 11. An apparatus according to claim 10, wherein the first cleaning head (42), the further first cleaning head (58) and / or the second cleaning head (64) are provided with at least one drying nozzle (86, 88, 90) and / or an infrared diode (92).

20. 20. A method for cleaning a pot-shaped hollow body (12) or a transport container (30) as said hollow body (12) for semiconductor wafers or for EUV exposure masks using an apparatus according to any one of the preceding claims, comprising: placing the hollow body (12) on a base wall (20) by means of a peripheral surface (38); sealingly and releasably connecting the hollow body (12) to the base wall (20) using a locking device (26), the hollow body (12) being sealed against the base wall (20) at a peripheral surface; using a first cleaning head (42) of the cleaning device (40) to emit a first cleaning fluid for cleaning the inner surface (33) of the hollow body; using a second cleaning head (64) of the cleaning device (40) to emit a second cleaning fluid for cleaning the outer surface (35) of the hollow body and / or using a second exhaust flow path (76) to exhaust the second cleaning fluid; and directing the cleaning fluid to the peripheral surface (38) using a first flow channel (41) disposed in the base wall (20).

21. 21. The method of claim 20, moving a closure (48) to an open position; placing the lid (52) on the receiving unit (50) of the closure (48) by the lid's outer surface (56) to removably secure the lid (52) to the closure (48); moving a closure body (48) to a closed position; and using a separate first cleaning head (58) to emit a first cleaning fluid to clean the interior surface (54) of the lid.

22. 22. The method according to claim 20 or 21, Completely filling the space defined by the inner surface (33) of the hollow body with a first cleaning fluid; and coupling acoustic waves into the first cleaning fluid using an in-coupling unit (87).

23. 23. The method of claim 20 or 22, and coupling acoustic waves into a first cleaning fluid emitted from a first cleaning nozzle (78) using an input coupling unit (87), the input coupling unit (87) being integral to or operating in cooperation with the first cleaning nozzle (78).

Images