Gas-dissolved water manufacturing device and electronic component manufacturing system

Abstract

To provide a gas dissolution water manufacturing device capable of stabilizing a gas supply amount to a gas dissolution device and to provide an electronic component manufacturing system with the gas dissolution water manufacturing device.SOLUTION: A gas dissolution water manufacturing device has a gas dissolution device and a main line 1 and sub-lines 3, 4 to supply a gas to the gas dissolution device. The sub-lines 3, 4 are branched from the middle of the main line 1 and disposed so as to join at a gas dissolution device side from a branch part. Mass flow controllers 5, 6 are disposed at the sub-lines 3, 4. The gas always flows in the main line 1. The gas flow rate in the main line 1 is 80-90% of a total flow rate.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to a gas-dissolved water production device, and more particularly to a gas-dissolved water production device having a mechanism for controlling the amount of gas supplied to the gas-dissolved water production device. The present invention also relates to an electronic component manufacturing system having the gas-dissolved water production device. [Background technology]

[0002] Functional cleaning water, which is prepared by dissolving specific gases in ultrapure water and adding trace amounts of chemicals as needed, has come to be used instead of highly concentrated chemical solutions to remove fine particles, organic matter, metals, etc. from the surfaces of electronic materials such as silicon substrates for semiconductors, glass substrates for liquid crystal displays, and quartz substrates for photomasks. Specific gases used in functional cleaning water include hydrogen gas, oxygen gas, ozone gas, rare gases, and carbon dioxide gas.

[0003] A gas dissolution membrane unit is widely used as a dissolution device for dissolving gas in ultrapure water (Patent Documents 1 and 2). To control the amount of gas supplied to this gas dissolution membrane unit, a mass flow controller (MFC) that can precisely and quickly control the gas flow rate is widely used (Patent Documents 1 and 2). [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Laid-Open No. 2009-219995 [Patent Document 2] Japanese Patent Application Laid-Open No. 2014-93357 Summary of the Invention [Problem to be solved by the invention]

[0005] Electronic component cleaning equipment requires stable delivery of gas-dissolved water at a specified concentration. To ensure stable delivery of gas to the gas-dissolved film unit even in the event of a mass flow controller failure, mass flow controllers are sometimes installed in parallel on the gas supply line, allowing the other mass flow controller to continue supplying gas if one mass flow controller fails. However, if one mass flow controller fails, gas will be supplied to the gas-dissolved film unit at a rate lower than the specified flow rate until the setting of the other mass flow controller is changed to increase the flow rate.

[0006] It is also possible to provide a bypass line with a manual valve to bypass the mass flow controller, but even in this case, if the mass flow controller breaks down, the amount of gas supplied to the gas dissolution film unit will remain low until the manual valve is opened.

[0007] An object of the present invention is to provide a gas-dissolved water production device that can stabilize the amount of gas supplied to a gas dissolver, and an electronic component production system that is equipped with this gas-dissolved water production device. [Means for solving the problem]

[0008] The gist of the present invention is as follows.

[0009] [1] A gas-dissolved water production apparatus having a gas dissolving device and a main line and a sub-line for supplying gas to the gas dissolving device, The sub-line branches off from the main line midway and is arranged to join the main line on the gas dissolving device side of the branched part, The gas-dissolved water manufacturing apparatus has a gas flow rate adjusting means provided in the sub-line.

[0010] [2] The gas-dissolved water manufacturing apparatus according to [1], wherein the main line is configured to allow gas to flow constantly.

[0011] [3] The gas-dissolved water manufacturing apparatus according to [1], wherein the sub-line is provided in a plurality of lines.

[0012] [4] The gas-dissolved water manufacturing apparatus according to any one of [1] to [3], wherein 80 to 90% of the gas flow rate supplied to the gas dissolver flows through the main line.

[0013] [5] The gas-dissolved water manufacturing apparatus according to any one of [1] to [4], wherein the gas flow rate adjusting means is a mass flow controller.

[0014] [6] The gas-dissolved water manufacturing apparatus according to any one of [1] to [5], wherein a flow meter is provided in the main line between the branching portion and the joining portion of the sub-line.

[0015] [7] The gas-dissolved water producing apparatus according to any one of [1] to [6], wherein the gas-dissolver is a gas-dissolved membrane module.

[0016] [8] An electronic component manufacturing system comprising: an apparatus for producing dissolved gas water according to any one of [1] to [7]; and an electronic component cleaning apparatus to which the dissolved gas water is supplied from the apparatus for producing dissolved gas water. [Effects of the Invention]

[0017] According to the gas-dissolved water manufacturing apparatus of the present invention, even if the flow rate adjusting means of the sub-line fails, gas is still supplied to the gas dissolver via the main line. By setting the diameter and length of the main line so that most (e.g., 80 to 90%) of the gas required by the gas dissolver flows through the main line, even if the flow rate adjusting means of the sub-line fails, a nearly sufficient amount of gas can be supplied via the main line, preventing a significant decrease in the gas concentration in the gas-dissolved water produced by the gas dissolver.

[0018] By providing a plurality of sub-lines in parallel, even if the flow rate adjusting means of one of the sub-lines fails, a substantially sufficient amount of gas can still be supplied to the gas dissolving device via the main line and the remaining sub-lines. [Brief explanation of the drawings]

[0019] [Figure 1] 1 is a configuration diagram of a gas-dissolved water manufacturing apparatus according to an embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0020] Hereinafter, an embodiment will be described with reference to the drawings.

[0021] FIG. 1 shows an example of a gas-dissolved water production apparatus of the present invention, in which a gas such as carbon dioxide is supplied to a gas-dissolved membrane module 10 via a gas supply line, and the gas is dissolved in ultrapure water to produce gas-dissolved water.

[0022] A gas supply line includes a main line 1 and sub-lines 3 and 4. A flow meter 2 is provided midway along the main line 1. The sub-lines 3 and 4 branch off from the main line upstream section 1a so as to connect an upstream section 1a of the main line, which is upstream of the flow meter 2, with a downstream section 1b of the main line, which is downstream of the flow meter 2, and merge with the downstream section 1b of the main line.

[0023] The sub-lines 3 and 4 are provided with mass flow controllers 5 and 6 as flow rate adjusting means (flow rate control valves), respectively.

[0024] The gas-dissolved membrane module 10 has a gas-phase chamber 12 and a liquid-phase chamber 13 separated by a gas-dissolved membrane 11. Gas from a gas supply line is introduced into the gas-phase chamber 12. Ultrapure water is introduced into the liquid-phase chamber 13 via piping 14, and the gas-dissolved water flows out into piping 15.

[0025] The flow rate detected by the flow meter 2 is input to a controller 7 , and the mass flow controllers 5 and 6 are controlled by a control signal from the controller 7 .

[0026] In this embodiment, most of the gas required by the gas-dissolved membrane module 10 (preferably 80 to 90% of the gas amount used in the gas-dissolved membrane module 10) is supplied to the gas-dissolved membrane module 10 via the main line 1. Then, mass flow controllers 5 and 6 are controlled so that the remaining 10 to 20% is supplied via sub-lines 3 and 4. The gas may flow equally to the mass flow controllers 5 and 6, or may flow more to one than the other. Gas may flow to only one of the mass flow controllers 3 and 4, and in the event of a malfunction in one of the mass flow controllers, gas may flow to the other. The mass flow controllers 3 and 4 each have a capacity that can pass at least 20% of the gas required by the gas-dissolved membrane module 10.

[0027] According to this embodiment, even if one of the mass flow controllers 3 and 4 fails, the required amount of gas can still be supplied to the gas-dissolved membrane module 10. Furthermore, even if both of the mass flow controllers 3 and 4 fail, at least 80 to 90% of the required amount of gas can still be supplied to the gas-dissolved membrane module 10. Therefore, even if both of the mass flow controllers 3 and 4 fail, a significant decrease in the gas concentration in the gas-dissolved water can be prevented.

[0028] In the present invention, the gas may be any of carbon dioxide gas, hydrogen gas, oxygen gas, ozone gas, rare gas, etc. The produced gas-dissolved water is suitable for supply to an electronic component cleaning device in an electronic component manufacturing system, but can also be supplied to other processes. [Explanation of symbols]

[0029] 1 Main Line 2 flow meter 2,4 Subline 5,6 Mass flow controller 7 Controller 10 Gas dissolution membrane module 11 Gas-dissolved membrane

Claims

1. 1. A gas-dissolved water manufacturing apparatus for manufacturing gas-dissolved water for cleaning electronic components, the apparatus comprising: a gas dissolving apparatus; and a main line and a sub-line for supplying gas to the gas dissolving apparatus, The sub-line branches off from the main line midway and is arranged to join the main line on the gas dissolving device side of the branched part, A gas flow rate adjusting means is provided in the sub-line, The main line is configured to allow gas to flow at all times, The sub-line is provided in a plurality of lines, The gas dissolving device is configured so that 80 to 90% of the gas flow rate supplied to the gas dissolving device flows through the main line, the gas flow rate adjusting means is a mass flow controller, a flow meter is provided in the main line between a branching portion and a joining portion of the sub-line, The gas dissolving device is a gas-dissolving membrane module.

2. 10. An electronic component manufacturing system comprising: the apparatus for producing dissolved gas water according to claim 1; and an electronic component cleaning apparatus to which the dissolved gas water is supplied from said apparatus for producing dissolved gas water.

Images