Maintenance system

Abstract

The present invention makes it possible to provide a technique capable of efficiently performing maintenance involving replacing consumable components used in a substrate processing chamber. This maintenance system includes a seasoning station, a component storage station, and a self-propelled component transfer unit. The self-propelled component transfer unit is configured so as to execute: a step for docking in the seasoning station and removing a seasoned consumable component seasoned at the seasoning station; a step for docking in the component storage station and conveying the seasoned consumable component in the self-propelled component transfer unit to the component storage station, a step for docking in the component storage station and removing the seasoned consumable component in the component storage station, and a step for docking in the substrate processing chamber and replacing a used consumable component in the substrate processing chamber with the seasoned consumable component in the self-propelled component transfer unit.

Description

Maintenance System

[0001] An exemplary embodiment of the present disclosure relates to a maintenance system.

[0002] Japanese Patent Application Laid-Open No. 2003-144992 discloses a technique for facilitating replacement of consumable parts used in a substrate processing apparatus.

[0003] Japanese Patent Application Laid-Open No. 2021-136359

[0004] The present disclosure provides a technique for efficiently performing maintenance to replace consumable parts used in a substrate processing chamber.

[0005] In one exemplary embodiment of the present disclosure, a maintenance system is a maintenance system for maintaining a substrate processing chamber, and includes a seasoning station configured to season consumable parts used in the substrate processing chamber, a part storage station, and a self-propelled part transport unit configured to self-propel between the seasoning station, the part storage station, and the substrate processing chamber, wherein the self-propelled part transport unit is configured to perform the following steps: docking to the seasoning station and removing seasoned consumable parts seasoned at the seasoning station; docking to the part storage station and transporting the seasoned consumable parts in the self-propelled part transport unit to the part storage station; docking to the part storage station and removing the seasoned consumable parts in the part storage station; and docking to the substrate processing chamber and replacing used consumable parts in the substrate processing chamber with seasoned consumable parts in the self-propelled part transport unit.

[0006] According to one exemplary embodiment of the present disclosure, a technique can be provided that allows efficient maintenance of replacing consumable parts used in a substrate processing chamber.

[0007] FIG. 1 is a diagram for explaining an example of the configuration of a maintenance system. FIG. 2 is a diagram for explaining an example of the configuration of a plasma processing apparatus. FIG. 3 is a diagram for explaining an example of the configuration of a seasoning station. FIG. 4 is a diagram for explaining an example of the configuration of a component storage station. FIG. 5 is a diagram for explaining an example of the configuration of a cleaning / repair station. FIG. 6 is a diagram for explaining an example of the configuration of a self-propelled component transport unit. FIG. 7 is a diagram for explaining an example of a maintenance flowchart. FIG. 8 is a diagram for explaining an example of docking a self-propelled component transport unit to each chamber. FIG. 9 is a diagram for explaining an example of a door holding mechanism of a self-propelled component transport unit. FIG. 10 is a diagram for explaining an example of the structure of a door of a plasma processing chamber. FIG. 11 is a diagram for explaining another example of the configuration of a door of a plasma processing chamber. FIG. 12 is a diagram for explaining an example in which a gate valve of a self-propelled component transport unit holds and opens and closes the door of a plasma processing chamber. FIG. 13 is a diagram for explaining an example of the configuration of a self-propelled component transport unit having a cleaning robot. FIG. 14 is a diagram for explaining variations of the arm head of the cleaning robot.

[0008] Hereinafter, each embodiment of the present disclosure will be described.

[0009] In one exemplary embodiment, a maintenance system for performing maintenance on a substrate processing chamber is provided, comprising: a seasoning station configured to season consumable parts used in the substrate processing chamber; a part storage station; and a self-propelled part transport unit configured to self-propel between the seasoning station, the part storage station, and the substrate processing chamber, wherein the self-propelled part transport unit is configured to perform the following steps: dock to the seasoning station and remove seasoned consumable parts seasoned at the seasoning station; dock to the part storage station and transport the seasoned consumable parts in the self-propelled part transport unit to the part storage station; dock to the part storage station and remove the seasoned consumable parts in the part storage station; and dock to the substrate processing chamber and replace used consumable parts in the substrate processing chamber with seasoned consumable parts in the self-propelled part transport unit.

[0010] In one exemplary embodiment, the seasoning station includes a seasoning chamber and a plasma generating portion configured to generate a plasma in the seasoning chamber to season the consumable parts in the seasoning chamber.

[0011] In one exemplary embodiment, the component storage station includes a component support and a heater configured to heat the component support to maintain a seasoned consumable component supported on the component support at a first temperature.

[0012] In one exemplary embodiment, the self-propelled part transport unit further includes a cleaning / repair station configured to clean and / or repair used consumable parts, and the self-propelled part transport unit is configured to perform the steps of docking with the cleaning / repair station and transporting used consumable parts in the self-propelled part transport unit to the cleaning / repair station, docking with the cleaning / repair station and removing consumable parts that have been cleaned and / or repaired in the cleaning / repair station, and docking with the seasoning station and transporting cleaned and / or repaired consumable parts in the self-propelled part transport unit to the seasoning station, and the seasoning station is configured to season the cleaned and / or repaired consumable parts.

[0013] In one exemplary embodiment, the self-propelled component transport unit includes a battery for powering the self-propelled component transport unit and is configured to charge the battery while docked to a component storage station, a seasoning station, a cleaning / repair station, or a substrate processing chamber.

[0014] In one exemplary embodiment, at least two selected from the group consisting of the parts storage station, the seasoning station, and the cleaning / repair station are integrated.

[0015] In one exemplary embodiment, the self-propelled component transport unit is configured to clean the inner walls of the substrate processing chamber and / or components within the substrate processing chamber in a vacuum environment while docked to the substrate processing chamber.

[0016] In one exemplary embodiment, cleaning is performed by at least one selected from the group consisting of laser, ultrasound, plasma jet, UV, lamp, air jet and superheated steam.

[0017] In one exemplary embodiment, the self-propelled component transport unit has a gate valve configured to hold and open / close the door of the substrate processing chamber when the self-propelled component transport unit is docked to the substrate processing chamber.

[0018] In one exemplary embodiment, the door has a configuration that allows it to be switched between a locked state and an unlocked state, and the gate valve is configured to allow the door to be switched between the locked state and the unlocked state.

[0019] In one exemplary embodiment, a maintenance system for performing maintenance on a first substrate processing chamber is provided, comprising: a component storage station; and a self-propelled component transport unit configured to self-propel between the component storage station, the first substrate processing chamber, and a second substrate processing chamber, the second substrate processing chamber being configured to season consumable parts used in the first substrate processing chamber. The self-propelled component transport unit is configured to perform the following steps: dock to the second substrate processing chamber and remove seasoned consumable parts that have been seasoned in the second substrate processing chamber; dock to the component storage station and transport the seasoned consumable parts in the self-propelled component transport unit to the component storage station; dock to the component storage station and remove the seasoned consumable parts in the component storage station; and dock to the first substrate processing chamber and replace used consumable parts in the first substrate processing chamber with seasoned consumable parts in the self-propelled component transport unit.

[0020] In one exemplary embodiment, the component storage station includes a component support and a heater configured to heat the component support to maintain a seasoned consumable component supported on the component support at a first temperature.

[0021] In one exemplary embodiment, the system further includes a cleaning / repair station configured to clean and / or repair used consumable parts, and the self-propelled component transport unit is configured to perform the following steps: docking with the cleaning / repair station to transport used consumable parts in the self-propelled component transport unit to the cleaning / repair station; docking with the cleaning / repair station to remove consumable parts that have been cleaned and / or repaired in the cleaning / repair station; and docking with a second substrate processing chamber to transport the cleaned and / or repaired consumable parts in the self-propelled component transport unit to the second substrate processing chamber, and the second substrate processing chamber is configured to season the cleaned and / or repaired consumable parts.

[0022] In one exemplary embodiment, the self-propelled component transport unit is configured to clean the inner walls of the first substrate processing chamber and / or components within the first substrate processing chamber in a vacuum environment while docked to the first substrate processing chamber.

[0023] In one exemplary embodiment, the self-propelled component transport unit has a gate valve configured to hold and open and close the door of the first substrate processing chamber when the self-propelled component transport unit is docked to the first substrate processing chamber.

[0024] In one exemplary embodiment, a maintenance system for performing maintenance on a substrate processing chamber is provided, comprising: a seasoning station configured to season consumable parts used in the substrate processing chamber; a part storage station; and a self-propelled part transport unit configured to self-propel between the seasoning station, the part storage station, and the substrate processing chamber, wherein the self-propelled part transport unit is configured to perform the following steps: dock to the seasoning station and transport consumable parts between the seasoning station and the self-propelled part transport unit in a vacuum environment; dock to the part storage station and transport consumable parts between the part storage station and the self-propelled part transport unit in a vacuum environment; and dock to the substrate processing chamber and transport consumable parts between the substrate processing chamber and the self-propelled part transport unit in a vacuum environment.

[0025] In one exemplary embodiment, the self-propelled component transport unit is configured to perform the steps of docking with a component storage station and retrieving consumable components in the component storage station, docking with a seasoning station and transporting consumable components in the self-propelled component transport unit to the seasoning station, docking with a seasoning station and retrieving seasoned consumable components that have been seasoned in the seasoning station, and docking with a substrate processing chamber and replacing used consumable components in the substrate processing chamber with seasoned consumable components in the self-propelled component transport unit.

[0026] In one exemplary embodiment, the seasoning station includes a seasoning chamber and a plasma generating portion configured to generate a plasma in the seasoning chamber to season the consumable parts in the seasoning chamber.

[0027] In one exemplary embodiment, the self-propelled component transport unit is configured to clean the inner walls of the substrate processing chamber and / or components within the substrate processing chamber in a vacuum environment while docked to the substrate processing chamber.

[0028] In one exemplary embodiment, the self-propelled component transport unit has a gate valve configured to hold and open / close the door of the substrate processing chamber when the self-propelled component transport unit is docked to the substrate processing chamber.

[0029] Hereinafter, each embodiment of the present disclosure will be described in detail with reference to the drawings. In each drawing, the same or similar elements are designated by the same reference numerals, and redundant explanations will be omitted. Unless otherwise specified, the positional relationships, such as up, down, left, and right, will be described based on the positional relationships shown in the drawings. The dimensional ratios in the drawings do not represent actual ratios, and the actual ratios are not limited to the ratios shown in the drawings.

[0030] <Configuration Example of Maintenance System> Figure 1 is a diagram illustrating a configuration example of a maintenance system MS in one embodiment. The maintenance system MS performs maintenance on substrate processing chambers. In one embodiment, the maintenance system MS includes a seasoning station 200, a component storage station 201, a cleaning / repair station 202, and a self-propelled component transfer unit 203. The substrate processing chambers that are maintained by the maintenance system MS may be included in a substrate processing system PS.

[0031] <Configuration Example of Substrate Processing System> In one embodiment, the substrate processing system PS includes a vacuum transfer module TM, process modules PM1 to PM6, load lock modules LL1 and LL2, an atmospheric transfer module LM, load ports LP1 to LP4, an aligner AN, and the like.

[0032] The vacuum transfer module TM has a substantially polygonal shape in a plan view. The process modules PM1 to PM6 are connected to multiple side surfaces of the vacuum transfer module TM. In one embodiment, the vacuum transfer module TM has a substantially rectangular shape in a plan view, and the process modules PM1 to PM6 are connected to two side surfaces along the longitudinal direction of the vacuum transfer module TM. The load lock modules LL1 and LL2 are connected to one side surface along the lateral direction of the vacuum transfer module TM. The vacuum transfer module TM has a vacuum chamber with a vacuum atmosphere, and a vacuum transfer robot TR1 is arranged inside.

[0033] The vacuum transfer robot TR1 is configured to be able to rotate, extend, and elevate freely. The vacuum transfer robot TR1 can transport substrates based on operational instructions output by a control unit CU, which will be described later. For example, the vacuum transfer robot TR1 can place and hold a substrate on an end effector EE1 located at the tip, and transport the substrate between the load lock modules LL1 and LL2 and the process modules PM1 to PM6. The end effector is also referred to as a pick, fork, or transport arm. The end effector EE1 of the vacuum transfer robot TR1 may have a U-shaped, bifurcated shape and be configured to transport a substrate placed thereon. The substrate may be, for example, a semiconductor wafer, a dummy wafer, a sensor wafer, or the like.

[0034] Each of the process modules PM1 to PM6 has a processing chamber and a substrate support disposed therein. At least one of the process modules PM1 to PM6 may be a plasma processing apparatus including a substrate processing chamber. A detailed configuration example of the plasma processing apparatus will be described later. The vacuum transfer module TM and each of the process modules PM1 to PM6 are separated by an openable / closable gate valve G1. A openable / closable gate valve G2 is disposed on one side of each of the process modules PM1 to PM6. The gate valve G2 is disposed on the side of the process modules PM1 to PM6 opposite the side on the vacuum transfer module TM side (the side on which the gate valve G1 is disposed).

[0035] The load lock modules LL1 and LL2 are disposed between the vacuum transfer module TM and the atmospheric transfer module LM. The load lock modules LL1 and LL2 have internal pressure variable chambers whose interiors can be switched between vacuum and atmospheric pressure. The load lock modules LL1 and LL2 each have a stage (mounting table) disposed therein. When transferring a substrate from the atmospheric transfer module LM to the vacuum transfer module TM, the load lock modules LL1 and LL2 can set the interior to atmospheric pressure, receive the substrate from the atmospheric transfer robot TR3 of the atmospheric transfer module LM, and then evacuate the interior to transfer the substrate to the vacuum transfer robot TR1 of the vacuum transfer module TM. When transferring a substrate from the vacuum transfer module TM to the atmospheric transfer module LM, the load lock modules LL1 and LL2 can evacuate the interior, receive the substrate from the vacuum transfer robot TR1 of the vacuum transfer module TM, and then pressurize the interior to atmospheric pressure to transfer the substrate to the atmospheric transfer robot TR3 of the atmospheric transfer module LM.

[0036] The load lock modules LL1 and LL2 may have lifter pins that move up and down on the stage. The load lock modules LL1 and LL2 may be capable of transferring substrates between the atmospheric transfer robot TR3 and the load lock modules LL1 and LL2, and between the vacuum transfer robot TR1 and the load lock modules LL1 and LL2, while lifting and supporting the substrates with the lifter pins. The load lock modules LL1 and LL2 are separated from the vacuum transfer module TM by a gate valve G3 that can be opened and closed. The load lock modules LL1 and LL2 are separated from the atmospheric transfer module LM by a gate valve G4 that can be opened and closed.

[0037] The atmospheric transfer module LM is disposed opposite the vacuum transfer module TM, with the load lock modules LL1 and LL2 sandwiched between them. The atmospheric transfer module LM may be, for example, an Equipment Front End Module (EFEM). The atmospheric transfer module LM is rectangular, equipped with an FFU (Fan Filter Unit), and has an atmospheric transfer chamber maintained at atmospheric pressure. Two load lock modules LL1 and LL2 are connected to one longitudinal side of the atmospheric transfer module LM. Load ports LP1 to LP4 are connected to the other longitudinal side of the atmospheric transfer module LM. An aligner AN is connected to one lateral side of the atmospheric transfer module LM along its short side. Note that the connection position of the aligner AN relative to the atmospheric transfer module LM is not limited to this and can be selected arbitrarily. An atmospheric transfer robot TR3 for transporting substrates is disposed within the atmospheric transfer module LM.

[0038] The atmospheric transfer robot TR3 is configured to be movable along the longitudinal direction of the atmospheric transfer module LM, and is also configured to be freely swiveling, extending and retracting, and moving up and down. The atmospheric transfer robot TR3 can transport substrates based on operation instructions output by a control unit CU, which will be described later. For example, the atmospheric transfer robot TR3 can place and hold a substrate on an end effector EE3 located at the tip, and transport the substrate between the load ports LP1 to LP4, the load lock modules LL1 and LL2, and the aligner AN. The end effector EE3 of the atmospheric transfer robot TR3 may have the same shape as the end effector EE1 of the vacuum transfer robot TR1.

[0039] The load ports LP1 to LP4 are configured to accommodate multiple containers C. The containers C may accommodate multiple substrates (e.g., 25 substrates). The containers C may be, for example, front-opening unified pods (FOUPs).

[0040] The aligner AN may be a device that detects the position (orientation and center) of the substrate. The aligner AN may include a rotary support table, an optical sensor (neither of which are shown), etc. The control unit CU may correct the orientation of the substrate based on the detection result by the aligner AN. Based on the detection result by the aligner AN, the control unit CU may correct the position of the end effector EE3 of the atmospheric transfer robot TR3 when receiving the substrate from the aligner AN so that the center of the substrate is located at a predetermined position of the end effector EE3 of the atmospheric transfer robot TR3.

[0041] The substrate processing system PS is connected to the control unit CU via a communication interface. In one embodiment, part or all of the control unit CU may be included in the substrate processing system PS. The control unit CU may be, for example, a computer. The control unit CU includes a central processing unit (CPU), random access memory (RAM), read-only memory (ROM), an auxiliary storage device, etc. The CPU operates based on a program stored in the ROM or the auxiliary storage device, and can control each part of the substrate processing system PS.

[0042] <Configuration Example of Plasma Processing Apparatus> At least one of the process modules PM1 to PM6 is a plasma processing apparatus including a substrate processing chamber. Configuration examples of the plasma processing apparatus will be described below. Figure 2 is a diagram for explaining a configuration example of a capacitively coupled plasma processing apparatus.

[0043] The plasma processing system includes a capacitively coupled plasma processing apparatus 1 and a controller 2. The capacitively coupled plasma processing apparatus 1 includes a plasma processing chamber 10, a gas supply unit 20, a power supply 30, and an exhaust system 40. The plasma processing chamber 10 is an example of a substrate processing chamber. The plasma processing apparatus 1 also includes a substrate support 11 and a gas inlet. The gas inlet is configured to introduce at least one process gas into the plasma processing chamber 10. The gas inlet includes a showerhead 13. The substrate support 11 is disposed within the plasma processing chamber 10. The showerhead 13 is disposed above the substrate support 11. In one embodiment, the showerhead 13 forms at least a portion of the ceiling of the plasma processing chamber 10. The plasma processing chamber 10 has a plasma processing space 10s defined by the showerhead 13, a sidewall 10a of the plasma processing chamber 10, and the substrate support 11. The plasma processing chamber 10 has at least one gas inlet for supplying at least one processing gas to the plasma processing space 10s and at least one gas outlet for exhausting gas from the plasma processing space 10s. The plasma processing chamber 10 is grounded. The showerhead 13 and the substrate support 11 are electrically insulated from the housing of the plasma processing chamber 10.

[0044] The substrate support 11 includes a main body 111 and a ring assembly 112. The main body 111 has a central region 111a for supporting a substrate W and an annular region 111b for supporting the ring assembly 112. A wafer is an example of a substrate W. The annular region 111b of the main body 111 surrounds the central region 111a of the main body 111 in a plan view. The substrate W is disposed on the central region 111a of the main body 111, and the ring assembly 112 is disposed on the annular region 111b of the main body 111 so as to surround the substrate W on the central region 111a of the main body 111. Therefore, the central region 111a is also called a substrate support surface for supporting the substrate W, and the annular region 111b is also called a ring support surface for supporting the ring assembly 112.

[0045] In one embodiment, the main body 111 includes a base 1110 and an electrostatic chuck 1111. The base 1110 includes a conductive member. The conductive member of the base 1110 can function as a lower electrode. The electrostatic chuck 1111 is disposed on the base 1110. The electrostatic chuck 1111 includes a ceramic member 1111a and an electrostatic electrode 1111b disposed within the ceramic member 1111a. The ceramic member 1111a has a central region 111a. In one embodiment, the ceramic member 1111a also has an annular region 111b. Note that the annular region 111b may also be provided by another member surrounding the electrostatic chuck 1111, such as an annular electrostatic chuck or an annular insulating member. In this case, the ring assembly 112 may be disposed on the annular electrostatic chuck or the annular insulating member, or may be disposed on both the electrostatic chuck 1111 and the annular insulating member. Furthermore, at least one RF / DC electrode coupled to an RF (Radio Frequency) power supply 31 and / or a DC (Direct Current) power supply 32 (described later) may be disposed within the ceramic member 1111a. In this case, the at least one RF / DC electrode functions as a lower electrode. When a bias RF signal and / or a DC signal (described later) is supplied to the at least one RF / DC electrode, the RF / DC electrode is also called a bias electrode. Note that the conductive member of the base 1110 and the at least one RF / DC electrode may function as multiple lower electrodes. Furthermore, the electrostatic electrode 1111b may function as a lower electrode. Therefore, the substrate support 11 includes at least one lower electrode.

[0046] The ring assembly 112 includes one or more annular members. In one embodiment, the one or more annular members include one or more edge rings and at least one cover ring. The edge rings are formed of a conductive or insulating material, and the cover rings are formed of an insulating material.

[0047] The substrate support 11 may also include a temperature adjustment module configured to adjust at least one of the electrostatic chuck 1111, the ring assembly 112, and the substrate to a target temperature. The temperature adjustment module may include a heater, a heat transfer medium, a flow passage 1110a, or a combination thereof. A heat transfer fluid such as brine or a gas flows through the flow passage 1110a. In one embodiment, the flow passage 1110a is formed in the base 1110, and one or more heaters are disposed in the ceramic member 1111a of the electrostatic chuck 1111. The substrate support 11 may also include a heat transfer gas supply configured to supply a heat transfer gas to a gap between the backside of the substrate W and the central region 111a.

[0048] The showerhead 13 is configured to introduce at least one process gas from the gas supply unit 20 into the plasma processing space 10s. The showerhead 13 has at least one gas supply port 13a, at least one gas diffusion chamber 13b, and multiple gas inlets 13c. The process gas supplied to the gas supply port 13a passes through the gas diffusion chamber 13b and is introduced into the plasma processing space 10s from the multiple gas inlets 13c. The showerhead 13 also includes at least one upper electrode. In addition to the showerhead 13, the gas inlet may also include one or more side gas injectors (SGIs) attached to one or more openings formed in the sidewall 10a.

[0049] The gas supply unit 20 may include at least one gas source 21 and at least one flow controller 22. In one embodiment, the gas supply unit 20 is configured to supply at least one process gas from a corresponding gas source 21 to the showerhead 13 via a corresponding flow controller 22. Each flow controller 22 may include, for example, a mass flow controller or a pressure-controlled flow controller. Additionally, the gas supply unit 20 may include one or more flow modulation devices to modulate or pulse the flow rate of the at least one process gas.

[0050] The power supply 30 includes an RF power supply 31 coupled to the plasma processing chamber 10 via at least one impedance matching circuit. The RF power supply 31 is configured to supply at least one RF signal (RF power) to at least one lower electrode and / or at least one upper electrode. This generates a plasma from at least one process gas supplied to the plasma processing space 10s. Therefore, the RF power supply 31 can function as at least a part of a plasma generating unit configured to generate a plasma from one or more process gases in the plasma processing chamber 10. Furthermore, by supplying a bias RF signal to the at least one lower electrode, a bias potential is generated on the substrate W, thereby attracting ion components in the formed plasma to the substrate W.

[0051] In one embodiment, the RF power supply 31 includes a first RF generating unit 31a and a second RF generating unit 31b. The first RF generating unit 31a is coupled to at least one lower electrode and / or at least one upper electrode via at least one impedance matching circuit and is configured to generate a source RF signal (source RF power) for plasma generation. In one embodiment, the source RF signal has a frequency in the range of 10 MHz to 150 MHz. In one embodiment, the first RF generating unit 31a may be configured to generate multiple source RF signals having different frequencies. The generated one or more source RF signals are supplied to at least one lower electrode and / or at least one upper electrode.

[0052] The second RF generator 31b is coupled to at least one lower electrode via at least one impedance matching circuit and is configured to generate a bias RF signal (bias RF power). The frequency of the bias RF signal may be the same as or different from the frequency of the source RF signal. In one embodiment, the bias RF signal has a frequency lower than the frequency of the source RF signal. In one embodiment, the bias RF signal has a frequency in the range of 100 kHz to 60 MHz. In one embodiment, the second RF generator 31b may be configured to generate multiple bias RF signals having different frequencies. The generated one or more bias RF signals are supplied to at least one lower electrode. In various embodiments, at least one of the source RF signal and the bias RF signal may be pulsed.

[0053] The power supply 30 may also include a DC power supply 32 coupled to the plasma processing chamber 10. The DC power supply 32 includes a first DC generator 32a and a second DC generator 32b. In one embodiment, the first DC generator 32a is connected to the at least one lower electrode and configured to generate a first DC signal. The generated first bias DC signal is applied to the at least one lower electrode. In one embodiment, the second DC generator 32b is connected to the at least one upper electrode and configured to generate a second DC signal. The generated second DC signal is applied to the at least one upper electrode.

[0054] In various embodiments, at least one of the first and second DC signals may be pulsed. In this case, a sequence of voltage pulses is applied to at least one lower electrode and / or at least one upper electrode. The voltage pulses may have a rectangular, trapezoidal, triangular, or combination thereof pulse waveform. In one embodiment, a waveform generator for generating the sequence of voltage pulses from the DC signal is connected between the first DC generator 32a and at least one lower electrode. Thus, the first DC generator 32a and the waveform generator constitute a voltage pulse generator. When the second DC generator 32b and the waveform generator constitute a voltage pulse generator, the voltage pulse generator is connected to at least one upper electrode. The voltage pulses may have either positive or negative polarity. Furthermore, the sequence of voltage pulses may include one or more positive voltage pulses and one or more negative voltage pulses within one period. The first and second DC generating units 32a and 32b may be provided in addition to the RF power supply 31, or the first DC generating unit 32a may be provided instead of the second RF generating unit 31b.

[0055] The exhaust system 40 may be connected to, for example, a gas exhaust port 10e provided at the bottom of the plasma processing chamber 10. The exhaust system 40 may include a pressure regulating valve and a vacuum pump. The pressure in the plasma processing space 10s is regulated by the pressure regulating valve. The vacuum pump may include a turbomolecular pump, a dry pump, or a combination thereof.

[0056] The control unit 2 processes computer-executable instructions that cause the plasma processing apparatus 1 to perform various processes described in this disclosure. The control unit 2 may be configured to control each element of the plasma processing apparatus 1 to perform various processes described herein. In one embodiment, part or all of the control unit 2 may be included in the plasma processing apparatus 1. The control unit 2 may include a processing unit 2a1, a storage unit 2a2, and a communication interface 2a3. The control unit 2 may be implemented by, for example, a computer 2a. The processing unit 2a1 may be configured to read a program from the storage unit 2a2 and execute the read program to perform various control operations. This program may be stored in the storage unit 2a2 in advance or may be acquired via a medium when needed. The acquired program is stored in the storage unit 2a2 and read from the storage unit 2a2 by the processing unit 2a1 for execution. The medium may be various storage media readable by the computer 2a or a communication line connected to the communication interface 2a3. The processing unit 2a1 may be a CPU (Central Processing Unit). The storage unit 2a2 may include a random access memory (RAM), a read-only memory (ROM), a hard disk drive (HDD), a solid state drive (SSD), or a combination thereof. The communication interface 2a3 may communicate with the plasma processing apparatus 1 via a communication line such as a local area network (LAN).

[0057] In one embodiment, a first transfer port 300 for transferring a substrate and a second transfer port 301 for transferring a consumable part are disposed in a sidewall 10a of the plasma processing chamber 10. In one embodiment, the first transfer port 300 and the second transfer port 301 are disposed at opposing positions. A gate valve G1 is disposed in the first transfer port 300. A gate valve G2 is disposed in the second transfer port 301.

[0058] 3 is a diagram illustrating an example of the configuration of the seasoning station 200. In one embodiment, the seasoning station 200 includes a seasoning chamber 400, a component support unit 401, a plasma generation unit 402, a gas supply unit 403, an exhaust unit 404, and the like.

[0059] The component support unit 401 is disposed within the seasoning chamber 400. The component support unit 401 has a component support surface for supporting the consumable component Q. The component support unit 401 is configured so that the temperature of the consumable component Q can be adjusted to a target temperature by a temperature adjustment module 410. The temperature adjustment module 410 includes a flow path 411 that passes through the component support unit 401 and a heat transfer medium supply device 412 that supplies a heat transfer medium such as a refrigerant to the flow path 411. The component support unit 401 has lift pins that enable the consumable component Q to be supported on the component support unit 401 and raised and lowered.

[0060] The gas supply unit 403 includes a showerhead 420 and a gas supply device 421. The showerhead 420 is disposed above the component support 401 and forms at least a portion of the ceiling of the seasoning chamber 400. The gas supply device 421 may include at least one gas source and at least one flow controller. In one embodiment, the gas supply unit 403 is configured to supply at least one process gas from the gas supply device 421 to the showerhead 420, and the showerhead 420 is configured to supply the process gas to the plasma processing space 400s above the component support 401.

[0061] The plasma generating unit 402 is configured to generate plasma within the seasoning chamber 400. The power supply 430 may function as at least a part of the plasma generating unit. The power supply 430 is configured to supply at least one RF signal (RF power) to at least one lower electrode and / or at least one upper electrode. In one embodiment, the component support 401 includes at least one lower electrode, and the showerhead 420 includes an upper electrode. By supplying RF power to the lower electrode and / or the upper electrode and supplying a process gas to the plasma processing space 400s, plasma can be formed from the process gas. The power supply 430 may also be configured to supply a bias RF signal or a bias DC signal to the lower electrode. By supplying a bias RF signal or a bias DC signal to the lower electrode, a bias potential is generated on the consumable part Q, thereby attracting ion components in the plasma to the consumable part Q. The power supply 430 may have the same function and configuration as the power supply 30 of the plasma processing apparatus 1.

[0062] The exhaust unit 404 includes, for example, a gas exhaust port 440 provided at the bottom of the seasoning chamber 400 and an exhaust device 441 connected to the gas exhaust port 440. The exhaust device 441 may include a pressure adjustment valve and a vacuum pump. The exhaust device 441 exhausts the atmosphere in the plasma processing space 400s through the gas exhaust port 440, thereby reducing the pressure in the plasma processing space 400s to a predetermined level.

[0063] A transfer port 460 for transferring the consumable parts Q is disposed in a side wall 400a of the seasoning chamber 400. A gate valve 470 that can be opened and closed is disposed in the transfer port 460.

[0064] 4 is a diagram illustrating an example of the configuration of the component storage station 201. In one embodiment, the component storage station 201 includes a component storage chamber 500, a component support unit 501, a heater 502, a gas supply unit 503, an exhaust unit 504, and the like.

[0065] The component support section 501 is disposed in the component storage chamber 500. The component support section 501 has a plurality of component support surfaces for supporting a plurality of consumable components Q in a plurality of vertical stages.

[0066] The heater 502 is disposed on the component support portion 501. The heater 502 is configured to adjust the temperature of the consumable component Q supported on the component support portion 501 to a target temperature (first temperature).

[0067] The gas supply unit 503 includes a gas supply port 510 provided on the ceiling of the component storage chamber 500 and a gas supply device 511 connected to the gas supply port 510. The gas supply device 511 is configured to supply an inert gas, such as nitrogen gas, into the component storage chamber 500 through the gas supply port 510. By supplying the inert gas into the component storage chamber 500, the interior of the component storage chamber 500 can be maintained in an inert atmosphere.

[0068] The exhaust unit 404 includes, for example, a gas exhaust port 540 provided at the bottom of the component storage chamber 500, and an exhaust device 541 connected to the gas exhaust port 540. The exhaust device 541 may include a pressure adjustment valve and a vacuum pump. The exhaust device 541 exhausts the atmosphere inside the component storage chamber 500 through the gas exhaust port 540, thereby reducing the pressure inside the component storage chamber 500 to a predetermined level.

[0069] A transfer port 560 for transferring consumable parts Q is arranged in a side wall 500a of the part storage chamber 500. A gate valve 570 that can be opened and closed is arranged in the transfer port 560.

[0070] 5 is a diagram illustrating an example of the configuration of the cleaning / repair station 202. In one embodiment, the cleaning / repair station 202 includes a cleaning / repair chamber 600, a component support unit 601, an agitation unit 602, a chemical supply unit 603, a drainage unit 604, and the like.

[0071] The cleaning / repair chamber 600 is configured to store the chemical solution A1 inside. The component support unit 601 is disposed within the cleaning / repair chamber 600. The component support unit 601 has a plurality of component support surfaces for supporting a plurality of consumable components Q in multiple vertical rows.

[0072] The agitation unit 602 is configured to agitate the chemical solution stored in the cleaning / repair chamber 600. The agitation unit 602 may include an agitator 610 and a motor 611 that drives the agitator 610.

[0073] The chemical liquid supply unit 603 includes a chemical liquid supply port 620 provided on the ceiling of the cleaning / repair chamber 600, and a chemical liquid supply device 621 connected to the chemical liquid supply port 620. The chemical liquid supply device 621 is configured to supply the chemical liquid A1 into the cleaning / repair chamber 600 through the chemical liquid supply port 620. By supplying the chemical liquid A1 into the cleaning / repair chamber 600, the chemical liquid A1 can be stored in the cleaning / repair chamber 600 and the consumable parts Q on the part support unit 601 can be immersed in the chemical liquid A1.

[0074] The drain section 604 includes, for example, a drain port 640 provided at the bottom of the cleaning / repair chamber 600, and a drain device 641 connected to the drain port 640. The drain device 641 may include a pump. The chemical solution A1 in the cleaning / repair chamber 600 can be discharged from the drain port 640 by the drain device 641.

[0075] A transfer port 660 for transferring consumable parts Q is arranged in a sidewall 600a of the cleaning / repair chamber 600. A gate valve 670 that can be opened and closed is arranged in the transfer port 660.

[0076] 6 is a diagram illustrating an example of the configuration of the self-propelled component transfer unit 203. In one embodiment, the self-propelled component transfer unit 203 is configured to self-propel between the seasoning station 200, the component storage station 201, the cleaning / repair station 202, and the plasma processing chamber 10.

[0077] In one embodiment, the self-propelled component transport unit 203 includes a transport chamber 700, a transport robot 702, a moving device 703, and the like.

[0078] The transfer chamber 700 has a vacuum chamber with a vacuum atmosphere. The transfer robot 702 is disposed in the transfer chamber 700.

[0079] The transfer robot 702 is configured to be able to rotate, extend, and move up and down freely. The transfer robot 702 can transfer consumable parts based on operational instructions output by a control unit 781 (described later). In one embodiment, the transfer robot 702 includes a base and at least one transfer arm. In one embodiment, the base is configured to be able to rotate and / or move up and down freely. In one embodiment, the at least one transfer arm is attached to the base and configured to be able to extend and retract horizontally. The at least one transfer arm has at least one end effector 710 at its tip. Thus, the transfer robot 702 can transfer consumable parts by placing and holding the consumable parts on the at least one end effector 710 and moving the end effector 710. The transfer robot 702 can transfer consumable parts by moving the end effector 710 in and out of the seasoning station 200, the part storage station 201, the cleaning / repair station 202, and the plasma processing chamber 10, all of which are docked to the self-propelled part transfer unit 203. The end effector is also referred to as a pick, a fork, or a transport arm. The at least one end effector 710 may include multiple end effectors. In one embodiment, the at least one end effector 710 includes a first end effector for transporting and holding a pre-used consumable part and a second end effector for transporting and holding a used consumable part. The pre-used consumable part may correspond to any of a new consumable part, an unused consumable part, a refurbished consumable part, and a repaired consumable part.

[0080] The transfer chamber 700 may have a parts container. The parts container may have multiple part support surfaces for supporting multiple consumable parts Q in multiple vertical rows. The parts container may have a heater for keeping the consumable parts Q warm. In this case, the transfer robot 702 may be able to transfer the consumable parts to the parts container.

[0081] The moving device 703 has a main body 730, wheels 731, etc. The main body 730 has a power source such as a battery, a power source, a steering mechanism, etc. The wheels 731 rotate using the power source of the main body 730 and move the self-propelled component transport unit 203 in a direction controlled by the steering mechanism of the main body 730. Note that the moving device 703 may move the wheels 731 by a method other than the wheels 731, such as a walking type, as long as it can move the self-propelled component transport unit 203.

[0082] The self-propelled component transport unit 203 is configured to be able to dock with the seasoning station 200, the component storage station 201, the cleaning / repair station 202, and the plasma processing chamber 10. In one embodiment, the transport chamber 700 of the self-propelled component transport unit 203 has a docking section 750 for docking with the seasoning station 200, the component storage station 201, the cleaning / repair station 202, and the plasma processing chamber 10.

[0083] In one embodiment, the dock portion 750 is formed in a frame-like shape so as to protrude outward from the sidewall 700a of the transfer chamber 700. When the self-propelled component transfer unit 203 docks with the seasoning station 200, the component storage station 201, the cleaning / repair station 202, or the plasma processing chamber 10, the tip of the dock portion 750 abuts against the sidewall of the other docked chamber, and an airtight closed space is formed by the dock portion 750 and the sidewall of the other chamber.

[0084] A transfer port 760 for transferring consumable parts Q is disposed in a side wall 700a of the transfer chamber 700 located inside the dock section 750. A gate valve 770 that can be opened and closed is disposed in the transfer port 760. The transfer robot 702 can transfer consumable parts through the transfer port 760 to the seasoning station 200, the part storage station 201, the cleaning / repair station 202, and the plasma processing chamber 10 that are docked in the dock section 750 of the self-propelled part transfer unit 203.

[0085] In one embodiment, the self-propelled component transport unit 203 further includes a communication unit 780, a control unit 781, a memory unit 782, a sensor 783, an exhaust system 784, and the like.

[0086] The communication unit 780 is, for example, a wireless communication circuit, and is configured to communicate wirelessly with an external control unit CU. The sensor 783 is configured to sense the surroundings of the self-propelled component transport unit 203 and output the sensing results to the control unit 781. In one embodiment, the sensor 783 is an image sensor, and is configured to capture images of the surroundings of the self-propelled component transport unit 203 and output the images to the control unit 781.

[0087] The memory unit 782 is a read-only memory (ROM), a hard disk drive (HDD), a solid state drive (SSD), or the like, and stores data, programs, and the like used by the control unit 781. The control unit 781 is a processor such as a central processing unit (CPU) or a digital signal processor (DSP), and can control the entire self-propelled component transport unit 203 by reading and executing programs from the memory unit 782. In one embodiment, the control unit 781 can move the self-propelled component transport unit 203 to a predetermined position instructed by the control unit CU by controlling the moving device 703 using the sensing results from the sensor 783.

[0088] In one embodiment, the exhaust system 784 includes a valve 790, a pipe 791, an exhaust device 792, and an exhaust port 793. The exhaust device 792 is connected to the space inside the transfer chamber 700 via the valve 790 and the pipe 791. The exhaust device 792 may include a pump. The exhaust device 792 can suck gas from inside the transfer chamber 700 via the valve 790 and the pipe 791 and discharge the sucked gas to the outside of the self-propelled component transfer unit 203 via the exhaust port 793. This allows the inside of the transfer chamber 700 to be depressurized to a predetermined vacuum level. The self-propelled component transfer unit 203 may further include a gas supply unit that supplies an inert gas, such as nitrogen gas, into the exhaust chamber 700 to maintain an inert gas atmosphere inside the exhaust chamber 700.

[0089] The self-propelled component transport unit 203 has a battery 795 for driving the self-propelled component transport unit 203, and may be configured to charge the battery 795 while docked in the component storage station 201, the seasoning station 200, the cleaning / repair station 202, or the plasma processing chamber 10. This battery 795 may be a battery for driving the moving device 703. The battery 795 may be charged by power from a power supply included in the component storage station 201, the seasoning station 200, the cleaning / repair station 202, or the plasma processing chamber 10.

[0090] <Example of Substrate Processing> An example of substrate processing performed in the substrate processing system PS shown in FIG. 1 will be described. In one embodiment, the substrate processing is executed by the control unit CU. Substrates housed in containers C of load ports LP1 to LP4 are transferred to load lock modules LL1 and LL2 by the atmospheric transfer robot TR3 of the atmospheric transfer module LM. At this time, the interiors of the load lock modules LL1 and LL2 are maintained at atmospheric pressure. Next, the interiors of the load lock modules LL1 and LL2 are evacuated. Then, the vacuum transfer robot TR1 of the vacuum transfer module TM transfers the substrates from the load lock modules LL1 and LL2 through the vacuum transfer module TM to at least one of the process modules PM1 to PM6.

[0091] For example, the substrate is transferred to a plasma processing apparatus 1, which is a process module. In the plasma processing apparatus 1, plasma processing is performed on the substrate.

[0092] The plasma processing includes an etching process in which plasma is used to etch a film on the substrate W. In one embodiment, the plasma processing is performed by a control unit 2 in a plasma processing apparatus 1 shown in FIG.

[0093] First, the substrate W is carried into the plasma processing chamber 10 through the first transfer port 300 by the vacuum transfer robot TR1, and is placed on the substrate support 11 by the lifter and held on the substrate support 11 by suction.

[0094] Next, plasma is generated in the plasma processing space 10s by the plasma generating unit. First, a processing gas is supplied to the shower head 13 by the gas supply unit 20, and then supplied from the shower head 13 to the plasma processing space 10s. The processing gas supplied at this time includes a gas that generates activated species necessary for etching the substrate W.

[0095] A source RF signal is supplied from a power supply 30 to the upper electrode and / or the lower electrode. A bias RF signal or a bias DC signal is supplied to the lower electrode. The atmosphere in the plasma processing space 10s is exhausted from a gas exhaust port 10e, and the inside of the plasma processing space 10s is depressurized. Plasma is generated from the processing gas on the substrate support 11 in the plasma processing space 10s, and the substrate W is etched.

[0096] When plasma processing is completed, the substrate is removed from the plasma processing chamber 10 by the vacuum transfer robot TR1 of the vacuum transfer module TM shown in FIG. The substrate is transferred by the vacuum transfer robot TR1 through the vacuum transfer module TM to the load lock modules LL1 and LL2. Alternatively, the substrate is transferred by the vacuum transfer robot TR1 through the vacuum transfer module TM to another process module PM1-M6, where it is processed and then transferred to the load lock modules LL1 and LL2. Next, the substrate is transferred from the load lock modules LL1 and LL2 to the containers C of the load ports LP1-LP4 by the atmospheric transfer robot TR3 of the atmospheric transfer module LM.

[0097] <Example of Maintenance> The maintenance system MS performs maintenance on the plasma processing chamber 10. FIG. 7 is a flowchart illustrating an example of maintenance performed by the maintenance system MS. The part storage station 201 stores a plurality of consumable parts Q (step ST1 shown in FIG. 7). The consumable parts Q are replaceably attached to the plasma processing chamber 10 and may be parts that are consumed when various processes, such as plasma processing, are performed in the plasma processing chamber 10. In one embodiment, the consumable part Q is a part that constitutes the ring assembly 112. In one embodiment, the consumable part Q is an edge ring. In one embodiment, the consumable part Q is a cover ring. In one embodiment, the consumable part Q is a part that constitutes the showerhead 13. In one embodiment, the consumable part Q is an upper electrode.

[0098] In the component storage station 201 shown in FIG. 4 , the consumable component Q is supported on a component support 501. A heater 502 maintains the consumable component Q at a first temperature. In one embodiment, the first temperature is the same as the temperature of the substrate support 11 during plasma processing in the plasma processing chamber 10. For example, the first temperature is 300° C. or less. A gas supply unit 503 supplies an inert gas into the component storage chamber 500, and an exhaust unit 504 exhausts the gas inside the component storage chamber 500. In this way, the consumable component Q is stored in a given inert gas atmosphere at a given temperature and pressure.

[0099] The timing for replacing consumable parts used in plasma processing chamber 10 may be determined based on the amount of wear of the consumable parts detected by a sensor disposed in plasma processing chamber 10, or may be determined based on the amount of wear of the consumable parts estimated from the amount of substrates processed in plasma processing chamber 10 (the amount of operation of plasma processing chamber 10). When replacing consumable parts in plasma processing chamber 10, first, self-propelled part transfer unit 203 retrieves consumable part Q stored in part storage station 201 (step ST2 shown in FIG. 7).

[0100] The self-propelled component transfer unit 203 docks with the component storage station 201 and removes the consumable part Q from the component storage station 201 under vacuum conditions. At this time, first, as shown in FIG. 8 , the dock section 750 of the self-propelled component transfer unit 203 is connected to the component storage chamber 500 of the component storage station 201. Next, the gate valve 770 of the self-propelled component transfer unit 203 and the gate valve 570 of the component storage station 201 are opened. Then, the first end effector of the transfer robot 702 of the self-propelled component transfer unit 203 enters the component storage chamber 500 through the transfer opening 760 and the transfer opening 560, holds the pre-used consumable part Q, and transfers the pre-used consumable part Q from the component storage station 201 into the self-propelled component transfer unit 203. The first end effector of the transfer robot 702 continues to hold the consumable part Q within the self-propelled component transfer unit 203.

[0101] Next, the self-propelled component transfer unit 203 replaces the unused consumable part Q with a used consumable part Q' in the plasma processing chamber 10 (step ST3 shown in FIG. 7 ). At this time, as shown in FIG. 1 , the self-propelled component transfer unit 203 first moves to the plasma processing chamber 10 of the target plasma processing apparatus 1 in the substrate processing system PS and docks with the plasma processing chamber 10. At this time, as shown in FIG. 8 , the dock part 750 of the self-propelled component transfer unit 203 is connected to the plasma processing chamber 10, and the gate valve 770 of the self-propelled component transfer unit 203 and the gate valve G2 of the plasma processing chamber 10 are opened. Then, the second end effector of the transfer robot 702 of the self-propelled component transfer unit 203 enters the plasma processing chamber 10 through the transfer opening 760 and the second transfer opening 301, holds the used consumable part Q', and transfers the used consumable part Q' from the component storage station 201 into the self-propelled component transfer unit 203. The second end effector of the transfer robot 702 continues to hold the used consumable part Q' in the self-propelled part transfer unit 203. Next, the first end effector of the transfer robot 702 of the self-propelled part transfer unit 203 enters the plasma processing chamber 10 while holding the used consumable part Q, and transfers the used consumable part Q to the plasma processing chamber 10. The used consumable part Q is placed at a predetermined position in the plasma processing chamber 10.

[0102] Next, the cleaning / repair station 202 cleans and repairs the used consumable part Q' (step ST4 shown in FIG. 7 ). At this time, first, as shown in FIG. 1 , the self-propelled component transfer unit 203 moves to the cleaning / repair station 202, docks at the cleaning / repair station 202, and transfers the used consumable part Q' to the cleaning / repair station 202. At this time, as shown in FIG. 8 , the dock section 750 of the self-propelled component transfer unit 203 is connected to the cleaning / repair chamber 600 of the cleaning / repair station 202. Next, the gate valve 770 of the self-propelled component transfer unit 203 and the gate valve 670 of the cleaning / repair station 202 are opened. Then, the end effector of the transport robot 702 of the self-propelled component transport unit 203 enters the cleaning / repair chamber 600 through the transport opening 760 and the transport opening 660 while holding the used consumable part Q', and transports the used consumable part Q' to the cleaning / repair station 202. After transporting the used consumable part Q' to the cleaning / repair station 202, the self-propelled component transport unit 203 is detached from the cleaning / repair station 202 (undocked).

[0103] In the cleaning / repair station 202 shown in FIG. 5 , a used consumable part Q' is supported on the part support part 601. A chemical solution A1 is supplied into the cleaning / repair chamber 600 by the chemical solution supply part 603 and stored therein. Next, the chemical solution A1 is agitated by the agitation part 602. After that, the chemical solution A1 is discharged by the drainage part 604. In this manner, the used consumable part Q' is cleaned / repaired. Then, the cleaned / repaired consumable part Q" is removed from the cleaning / repair station 202. At this time, the self-propelled part transfer unit 203 moves to the cleaning / repair station 202 and docks there. Next, the gate valve 770 of the self-propelled part transfer unit 203 and the gate valve 670 of the cleaning / repair station 202 are opened. Then, the end effector of the transport robot 702 of the self-propelled part transport unit 203 enters the cleaning / repair chamber 600 through the transport opening 760 and the transport opening 660, and holds the cleaned / repaired consumable part Q'' and removes it from the cleaning / repair chamber 600.

[0104] Next, the seasoning station 200 seasons the cleaned / repaired consumable part Q" or the unused consumable part Q (step ST5 shown in FIG. 7). At this time, as shown in FIG. 1, the self-propelled part transfer unit 203 first moves to the seasoning station 200, docks at the seasoning station 200, and transfers the cleaned / repaired consumable part Q" or the unused consumable part Q to the seasoning station 200. At this time, as shown in FIG. 8, the dock section 750 of the self-propelled part transfer unit 203 is connected to the seasoning chamber 400 of the seasoning station 200. Next, the gate valve 770 of the self-propelled part transfer unit 203 and the gate valve 470 of the seasoning station 200 are opened. Then, the end effector of the transport robot 702 of the self-propelled part transport unit 203 enters the seasoning chamber 400 through the transport opening 760 and the transport opening 460 while holding the cleaned / repaired consumable part Q" or the unused consumable part Q, and transports the cleaned / repaired consumable part Q" or the unused consumable part Q to the seasoning station 200. After transporting the cleaned / repaired consumable part Q" or the unused consumable part Q to the seasoning station 200, the self-propelled part transport unit 203 is detached from the seasoning station 200 (undocked).

[0105] In the seasoning station 200, a cleaned / repaired consumable part Q" or a consumable part Q before use is seasoned. In the example shown in FIG. 3, a cleaned / repaired consumable part Q" is seasoned. First, the cleaned / repaired consumable part Q" is supported on the part support part 401. A plasma is generated in the plasma processing space 400s by the plasma generation part 402. A processing gas is supplied to the shower head 420 by the gas supply part 403, and is supplied from the shower head 420 to the plasma processing space 400s. The processing gas supplied at this time may be the same gas as that used in the plasma processing performed in the plasma processing chamber 10.

[0106] A source RF signal is supplied to the upper electrode and / or the lower electrode from the power supply 430. A bias RF signal or a bias DC signal may also be supplied to the lower electrode. The atmosphere in the plasma processing space 400s is exhausted by the exhaust unit 404, and the pressure in the plasma processing space 400s is reduced. Plasma is generated from the processing gas on the component support unit 401 in the plasma processing space 400s, and the cleaned / repaired consumable part Q" is seasoned. The seasoned consumable part Q'" is then removed from the seasoning station 200. At this time, the self-propelled component transfer unit 203 moves to the seasoning station 200 and docks there. Next, the gate valve 770 of the self-propelled component transfer unit 203 and the gate valve 470 of the seasoning station 200 are opened. Then, the end effector of the transfer robot 702 of the self-propelled part transfer unit 203 enters the plasma processing space 400 s through the transfer opening 760 and the transfer opening 460 , holds the seasoned consumable part Q′″, and removes it from the seasoning station 200 .

[0107] Next, the component storage station 201 stores the seasoned consumable component Q'" (step ST1 shown in FIG. 7). At this time, first, as shown in FIG. 1, the self-propelled component transfer unit 203 moves to the component storage station 201, docks at the component storage station 201, and transfers the seasoned consumable component Q'" to the component storage station 201. At this time, as shown in FIG. 8, the dock section 750 of the self-propelled component transfer unit 203 is connected to the component storage chamber 500 of the component storage station 201. Next, the gate valve 770 of the self-propelled component transfer unit 203 and the gate valve 570 of the component storage station 201 are opened. Then, the transfer robot 702 of the self-propelled component transfer unit 203 enters the component storage chamber 500 through the transfer opening 760 and the transfer opening 560, and transfers the seasoned consumable component Q'" to the component storage station 201. After transporting the seasoned consumable part Q''' to the part storage station 201, the self-propelled part transport unit 203 is detached from the part storage station 201 (undocked).

[0108] Then, when the consumable parts of the plasma processing chamber 10 are next replaced, the seasoned consumable parts Q''' stored in the parts storage station 201 may be used as the unused consumable parts Q. At this time, the self-propelled parts transport unit 203 takes out the seasoned consumable parts Q''' stored in the parts storage station 201 as the unused consumable parts Q, and transports them to the plasma processing chamber 10. Note that the consumable parts that cannot be reused may be discarded, and new consumable parts may be replenished in the parts storage station 201.

[0109] According to this exemplary embodiment, the maintenance system MS includes a seasoning station 200 configured to season consumable parts used in the plasma processing chamber 10, a part storage station 201, and a self-propelled part transport unit 203 configured to self-propel between the seasoning station 200, the part storage station 201, and the plasma processing chamber 10. The self-propelled part transport unit 203 is configured to perform the following steps: docking with the seasoning station 200 and removing consumable parts seasoned at the seasoning station 200; docking with the part storage station 201 and transporting the seasoned consumable parts in the self-propelled part transport unit 203 to the part storage station 201; docking with the part storage station 201 and removing the seasoned consumable parts in the part storage station 201; and docking with the plasma processing chamber 10 and replacing used consumable parts in the plasma processing chamber 10 with the seasoned consumable parts in the self-propelled part transport unit 203. According to this exemplary embodiment, the consumable parts stored in the parts storage station 201 can be seasoned in advance, so that maintenance to replace the consumable parts used in the plasma processing chamber 10 can be performed efficiently.

[0110] According to this exemplary embodiment, the maintenance system MS further includes a cleaning / repair station 202 configured to clean and / or repair used consumable parts. The self-propelled component transport unit 203 is configured to perform the following steps: dock with the cleaning / repair station 202 and transport used consumable parts stored in the self-propelled component transport unit 203 to the cleaning / repair station 202; dock with the cleaning / repair station 202 and remove consumable parts cleaned and / or repaired in the cleaning / repair station 202; and dock with the seasoning station 200 and transport cleaned and / or repaired consumable parts stored in the self-propelled component transport unit 203 to the seasoning station 200. The seasoning station 200 is configured to season the cleaned and / or repaired consumable parts. According to this exemplary embodiment, maintenance for replacing consumable parts used in the plasma processing chamber 10 can be efficiently performed.

[0111] In the above embodiment, the seasoning station 200 seasons the cleaned / repaired consumable part Q" or the used consumable part Q. However, the second plasma processing chamber 10 may season the cleaned / repaired consumable part Q" or the used consumable part Q. The second plasma processing chamber 10 may be a plasma processing chamber other than the first plasma processing chamber 10 in which the used consumable part Q' was installed. The second plasma processing chamber 10 may be a chamber in which no substrate processing is being performed in the substrate processing system PS at the time of maintenance. The second plasma processing chamber 10 may be any of the process modules M1 to M6. The second plasma processing chamber 10 may have the same configuration as the first plasma processing chamber 10 shown in FIG. 2.

[0112] In this case, the self-propelled component transfer unit 203 moves to the second plasma processing chamber 10 and docks with the second plasma processing chamber 10. At this time, as shown in Figure 8, the dock part 750 of the self-propelled component transfer unit 203 is connected to the second plasma processing chamber 10, and the gate valve 770 of the self-propelled component transfer unit 203 and the gate valve G2 of the second plasma processing chamber 10 are opened.

[0113] Then, the end effector of the transport robot 702 of the self-propelled component transport unit 203, while holding the cleaned / repaired consumable part Q" or the unused consumable part Q, enters the second plasma processing chamber 10 through the transport opening 760 and the second transport opening 301, and transports the cleaned / repaired consumable part Q" or the unused consumable part Q to the second plasma processing chamber 10. After transporting the cleaned / repaired consumable part Q" or the unused consumable part Q to the second plasma processing chamber 10, the self-propelled component transport unit 203 is detached (undocked) from the second plasma processing chamber 10.

[0114] In the second plasma processing chamber 10, a cleaned / repaired consumable part Q" or a consumable part Q before use is seasoned. For example, a cleaned / repaired consumable part Q" is seasoned. In the second plasma processing chamber 10 as shown in FIG. 2 , first, the cleaned / repaired consumable part Q" is supported on the substrate support 11. A plasma is generated in the plasma processing space 10s by the plasma generation unit. A processing gas is supplied to the shower head 13 by the gas supply unit 20, and then supplied from the shower head 13 to the plasma processing space 10s. The processing gas supplied at this time may be the same gas as that used in the plasma processing performed in the first plasma processing chamber 10.

[0115] A source RF signal is supplied from the power supply 30 to the upper electrode and / or the lower electrode. A bias RF signal or a bias DC signal may also be supplied to the lower electrode. The atmosphere in the plasma processing space 10s is exhausted by the exhaust system 40, reducing the pressure in the plasma processing space 10s. Plasma is generated from the processing gas on the substrate support 11 in the plasma processing space 10s, and the cleaned / repaired consumable part Q" is seasoned. The seasoned consumable part Q"' is then removed from the seasoning station 200. At this time, the self-propelled part transfer unit 203 moves to the second plasma processing chamber 10 and docks in the second plasma processing chamber 10. Next, the gate valve 770 of the self-propelled part transfer unit 203 and the gate valve G2 of the second plasma processing chamber 10 are opened. Then, the end effector of the transport robot 702 of the self-propelled part transport unit 203 enters the plasma processing space 10s through the transport opening 760 and the second transport opening 301, holds the seasoned consumable part Q''', and removes it from the second plasma processing chamber 10.

[0116] According to this exemplary embodiment, the consumable parts are seasoned using the second plasma processing chamber 10, so that maintenance for replacing the consumable parts of the first plasma processing chamber 10 can be performed efficiently.

[0117] <Example of Door Holding Mechanism of Self-Propelled Component Transfer Unit> In the above-described embodiment, the gate valve 770 of the self-propelled component transfer unit 203 may be configured to hold and open / close the door of the plasma processing chamber 10 when the self-propelled component transfer unit 203 is docked to the plasma processing chamber 10. In this case, as shown in FIG. 9 , the plasma processing chamber 10 has a door 900 that can be opened and closed at the second transfer port 301 in the side wall 10 a. The door 900 does not need to have a drive unit. In one embodiment, the door 900 may be configured to be switchable between a locked state and an unlocked state. The gate valve 770 is configured to be switchable between the locked state and the unlocked state of the door 900.

[0118] 10 , the door 900 includes a main body 910, a rotating part 911 provided on the main body 910, and an advancing / retreating part 913 that advances and retreats relative to a door locking part 912 on the side wall 10 a as the rotating part 911 rotates. The main body 910 is configured to cover and close the second transfer port 301. The rotating part 911 includes a held part 914 that can be held by a holding part 951 of the gate valve 770.

[0119] 9 includes a main body 950, a holding portion 951 provided on the main body 950, and a drive portion 952 that rotates and drives the holding portion 951. The main body 950 is configured to cover and close the transfer port 760. The holding portion 951 may be a protrusion, and the held portion 914 may be a hole into which the protrusion of the holding portion 951 is inserted and locked.

[0120] When the self-propelled component transfer unit 203 docks with the plasma processing chamber 10, the holding portion 951 of the gate valve 770 holds the held portion 914 of the door 900. The drive portion 952 of the gate valve 770 rotates the holding portion 951, causing the held portion 914 to rotate and the advance / retract portion 913 to retract from the door locking portion 912. This unlocks the door 900. The main body 950 of the gate valve 770 then descends, causing the main body 910 of the door 900 to descend, opening the transfer opening 760 and the second transfer opening 301. This allows the transfer robot 702 of the self-propelled component transfer unit 203 to enter the plasma processing chamber 10.

[0121] Furthermore, with the transport robot 702 of the self-propelled component transport unit 203 retreated from inside the plasma processing chamber 10, the main body 950 of the gate valve 770 rises, causing the main body 910 of the door 900 to rise and close the transport opening 760 and the second transport opening 301. Then, the drive unit 952 of the gate valve 770 rotates the holding unit 951, causing the held unit 914 to rotate and the advancing / retracting unit 913 to enter the door locking unit 912. This locks the door 900.

[0122] According to this exemplary embodiment, a gate valve having a drive unit is not required in the plasma processing chamber 10, so space for arranging the gate valve is not required. Furthermore, since a drive unit extending downward, as in the case of a gate valve, is not required, it becomes easier to access peripheral devices provided below the plasma processing chamber 10, for example.

[0123] In the above embodiment, the door 900 does not need to be configured to be switchable between a locked state and an unlocked state. The gate valve 770 may be configured to hold and open the door 900. In this case, as shown in FIG. 11 , the door 900 may have a main body 960 and a slider 962 that moves up and down along a rail 961 on the side wall 10 a. The rail 961 may have a recess 961 a that is partially deepened when the door 900 is positioned to close the second transfer port 301. The door 900 may be configured to approach the side wall 10 a of the plasma processing chamber 10 when closed and to move slightly away from the side wall 10 a when open. The main body 960 may also have a recessed engaging portion 963 on its outer surface. In contrast, the main body 950 of the gate valve 770 may have a protruding engaging portion 970 on its inner surface, as shown in FIG. 12( a). The locking portion 970 and the locked portion 963 may be configured to lock with each other when moving in the vertical direction.

[0124] When the door 900 of the plasma processing chamber 10 is opened, as shown in FIG. 12B, the dock portion 750 of the self-propelled component transfer unit 203 docks with the plasma processing chamber 10. Then, as shown in FIG. 12C, the pressure inside the plasma processing chamber 10 is made higher than the pressure inside the dock portion 750. As a result, the main body 960 of the door 900 is pressed against the main body 950 of the gate valve 770, and the locking portion 970 and the locked portion 963 are locked together. As shown in FIG. 12D, the main body 960 of the gate valve 770 is lowered (or raised), and the door 900 is lowered (or raised), opening the transfer port 760 and the second transfer port 301. Thereafter, the main body 960 is raised (or lowered), and the door 900 is also raised (or lowered), and the transfer port 760 and the second transfer port 301 are closed.

[0125] <Example of cleaning mechanism for self-propelled component transport unit> In the above embodiments, the self-propelled component transport unit 203 may be configured to clean the inner wall of the plasma processing chamber 10 and / or components inside the plasma processing chamber 10 in a vacuum environment while docked to the plasma processing chamber 10.

[0126] 13, the self-propelled component transfer unit 203 includes a cleaning robot 1000. The cleaning robot 1000 is disposed in the transfer chamber 700.

[0127] The cleaning robot 1000 is configured to be able to freely rotate, extend, and move up and down. The cleaning robot 1000 has an arm head 1001 at its tip. In one embodiment, the cleaning robot 1000 includes a base and at least one articulated arm. In one embodiment, the base is configured to be able to rotate and / or move up and down. In one embodiment, the at least one articulated arm is attached to the base and is configured to be able to extend and retract. The at least one articulated arm has at least one arm head 1001 at its tip. The cleaning robot 1000 can move the arm head 1001 at its tip based on an operation command output by the control unit 781. The cleaning robot 1000 can move the arm head 1001 into the plasma processing chamber 10 and move it in any direction within the plasma processing chamber 10. The cleaning robot 1000 may have, at the base end of the arm head 1001, a first rotating unit that rotates in a horizontal plane and a second rotating unit that rotates in a vertical plane.

[0128] In one embodiment, cleaning by the cleaning robot 1000 is performed using at least one selected from the group consisting of laser, ultrasonic, plasma jet, UV, lamp, air jet, and superheated steam. The arm head 1001 may emit a laser, as shown in FIG. 14(A) . The laser may have a wavelength shorter than 355 nm. As shown in FIG. 14(B) , an ultrasonic horn may be used. The ultrasonic waves may be 20 kHz or higher. As shown in FIG. 14(C) , a high-voltage power supply 1002 may be used to generate a gas into plasma and eject a plasma jet. The gas used to generate the plasma may be nitrogen gas or oxygen gas. As shown in FIG. 14(D) , a lamp 1003 may emit UV or light. As shown in FIG. 14(E) , a nozzle 1004 may eject a high-pressure air jet or superheated steam. The high-pressure air jet may have a pressure of 0.3 MPa or higher, or 0.4 MPa or higher. The superheated steam may be at a temperature of 110°C or higher, or 200°C or higher.

[0129] The arm head 1001 may come into contact with dirt on components inside the plasma processing chamber 10 and physically scrape off the dirt. The cleaning robot 1000 may be integrated with the transfer robot 702. That is, the transfer robot 702 may have the function of the cleaning robot 1000.

[0130] Cleaning of the plasma processing chamber 10 may be performed when replacing consumable parts. Cleaning may be performed after the self-propelled part transfer unit 203 removes used consumable parts from the plasma processing chamber 10 and before transferring seasoned consumable parts into the plasma processing chamber 10. For example, while the self-propelled part transfer unit 203 is docked with the plasma processing chamber 10, the arm head 1001 of the cleaning robot 1000 of the self-propelled part transfer unit 203 enters the plasma processing chamber 10 in a vacuum environment to clean the inner wall and / or components of the plasma processing chamber 10. The cleaning robot 1000 may clean the sidewall 10a of the plasma processing chamber 10, the substrate support 11, the ring assembly 12, the showerhead 13, the exhaust system 40, and the like within the plasma processing chamber 10. During cleaning, the plasma processing chamber 10 may be evacuated by the exhaust system 40. Additionally, an inert gas may be supplied into the plasma processing chamber 10 by a gas supply 20 .

[0131] According to this exemplary embodiment, parts and members that are not to be replaced inside the plasma processing chamber 10 can be automatically cleaned by the cleaning robot 1000 of the self-propelled part transfer unit 203. This allows efficient cleaning of the plasma processing chamber 10.

[0132] In the above embodiment, the self-propelled component transfer unit 203 transfers seasoned consumable parts to the component storage station 201, but the self-propelled component transfer unit 203 may also remove the consumable parts from the component storage station 201, transfer them to the seasoning station 200, and replace the seasoned consumable parts in the seasoning station 200 with used consumable parts in the plasma processing chamber 10. That is, the self-propelled component transfer unit 203 may be configured to perform the following steps: docking with the component storage station 201 and removing the consumable parts in the component storage station 201; docking with the seasoning station 200 and transferring the consumable parts in the self-propelled component transfer unit 203 to the seasoning station 200; docking with the seasoning station 200 and removing the consumable parts seasoned in the seasoning station 200; and docking with the plasma processing chamber 10 and replacing the used consumable parts in the plasma processing chamber 10 with the seasoned consumable parts in the self-propelled component transfer unit 203.

[0133] In the above embodiment, the maintenance system MS includes the cleaning / repair station 202, but it is not necessary to include the cleaning / repair station 202. In other words, the maintenance system MS may include only the seasoning station 200, the component storage station 201, and the self-propelled component transport unit 203.

[0134] At least two selected from the group consisting of the part storage station 201, the seasoning station 200, and the cleaning / repair station 202 may be integrated. For example, at least two chambers selected from the group consisting of the seasoning station 200 and the cleaning / repair station 202 may be adjacent and connected to each other.

[0135] Embodiments of the present disclosure further include the following aspects.

[0136] (Supplementary Note 1) A maintenance system for performing maintenance on a substrate processing chamber, comprising: a seasoning station configured to season consumable parts used in the substrate processing chamber; a part storage station; and a self-propelled part transport unit configured to self-propel between the seasoning station, the part storage station, and the substrate processing chamber, wherein the self-propelled part transport unit is configured to perform the following steps: dock at the seasoning station and remove seasoned consumable parts that have been seasoned at the seasoning station; dock at the part storage station and transport the seasoned consumable parts in the self-propelled part transport unit to the part storage station; dock at the part storage station and remove the seasoned consumable parts in the part storage station; and dock at the substrate processing chamber and replace used consumable parts in the substrate processing chamber with seasoned consumable parts in the self-propelled part transport unit.

[0137] (Supplementary Note 2) The maintenance system described in Supplementary Note 1, wherein the seasoning station includes: a seasoning chamber; and a plasma generating unit configured to generate plasma in the seasoning chamber to season consumable parts in the seasoning chamber.

[0138] (Supplementary Note 3) The maintenance system described in Supplementary Note 1 or 2, wherein the component storage station includes: a component support; and a heater configured to heat the component support to maintain a seasoned consumable component supported on the component support at a first temperature.

[0139] (Supplementary Note 4) A maintenance system as described in any one of Supplementary Notes 1 to 3, further comprising a cleaning / repair station configured to clean and / or repair used consumable parts, wherein the self-propelled part transport unit is configured to perform the steps of docking at the cleaning / repair station and transporting used consumable parts in the self-propelled part transport unit to the cleaning / repair station, docking at the cleaning / repair station and removing consumable parts that have been cleaned and / or repaired in the cleaning / repair station, and docking at the seasoning station and transporting cleaned and / or repaired consumable parts in the self-propelled part transport unit to the seasoning station, and the seasoning station is configured to season the cleaned and / or repaired consumable parts.

[0140] (Appendix 5) The self-propelled component transport unit includes a battery for powering the self-propelled component transport unit, and is configured to charge the battery while docked to the component storage station, the seasoning station, the cleaning / repair station, or the substrate processing chamber. A maintenance system as described in Appendix 4.

[0141] (Supplementary Note 6) The maintenance system according to Supplementary Note 4 or 5, wherein at least two selected from the group consisting of the part storage station, the seasoning station, and the cleaning / repair station are integrated.

[0142] (Appendix 7) A maintenance system described in any one of Appendices 1 to 6, wherein the self-propelled component transport unit is configured to clean the inner walls of the substrate processing chamber and / or components within the substrate processing chamber in a vacuum environment while docked to the substrate processing chamber.

[0143] (Supplementary Note 8) The maintenance system according to Supplementary Note 7, wherein the cleaning is performed by at least one selected from the group consisting of a laser, ultrasonic waves, a plasma jet, UV, a lamp, an air jet, and superheated steam.

[0144] (Appendix 9) A maintenance system described in any one of Appendices 1 to 8, wherein the self-propelled component transport unit has a gate valve, and the gate valve is configured to hold and open / close the door of the substrate processing chamber when the self-propelled component transport unit is docked to the substrate processing chamber.

[0145] (Supplementary Note 10) The maintenance system according to Supplementary Note 9, wherein the door has a configuration that allows it to be switched between a locked state and an unlocked state, and the gate valve is configured to be able to switch the door between the locked state and the unlocked state.

[0146] (Supplementary Note 11) A maintenance system for performing maintenance on a first substrate processing chamber, comprising: a component storage station; and a self-propelled component transport unit configured to self-propel between the component storage station, the first substrate processing chamber, and a second substrate processing chamber, the self-propelled component transport unit being configured to self-propel between the component storage station, the first substrate processing chamber, and a second substrate processing chamber, the second substrate processing chamber being configured to season consumable parts used in the first substrate processing chamber, wherein the self-propelled component transport unit is configured to perform the following steps: dock to the second substrate processing chamber and remove seasoned consumable parts that have been seasoned in the second substrate processing chamber; dock to the component storage station and transport the seasoned consumable parts in the self-propelled component transport unit to the component storage station; dock to the component storage station and remove the seasoned consumable parts in the component storage station; and dock to the first substrate processing chamber and replace used consumable parts in the first substrate processing chamber with seasoned consumable parts in the self-propelled component transport unit.

[0147] (Supplementary Note 12) The maintenance system described in Supplementary Note 11, wherein the part storage station includes: a part support; and a heater configured to heat the part support to maintain a seasoned consumable part supported on the part support at a first temperature.

[0148] (Supplementary Note 13) A maintenance system as described in Supplementary Note 11 or 12, further comprising a cleaning / repair station configured to clean and / or repair used consumable parts, wherein the self-propelled component transport unit is configured to perform the steps of docking with the cleaning / repair station and transporting used consumable parts in the self-propelled component transport unit to the cleaning / repair station, docking with the cleaning / repair station and removing consumable parts that have been cleaned and / or repaired in the cleaning / repair station, and docking with the second substrate processing chamber and transporting the cleaned and / or repaired consumable parts in the self-propelled component transport unit to the second substrate processing chamber, wherein the second substrate processing chamber is configured to season the cleaned and / or repaired consumable parts.

[0149] (Appendix 14) A maintenance system described in any one of Appendices 11 to 13, wherein the self-propelled component transport unit is configured to clean the inner wall of the first substrate processing chamber and / or components within the first substrate processing chamber in a vacuum environment while docked to the first substrate processing chamber.

[0150] (Appendix 15) A maintenance system described in any one of Appendices 11 to 14, wherein the self-propelled component transport unit has a gate valve, and the gate valve is configured to hold and open / close the door of the first substrate processing chamber when the self-propelled component transport unit is docked to the first substrate processing chamber.

[0151] (Appendix 16) A maintenance system for performing maintenance on a substrate processing chamber, comprising: a seasoning station configured to season consumable parts used in the substrate processing chamber; a part storage station; and a self-propelled part transport unit configured to self-propel between the seasoning station, the part storage station, and the substrate processing chamber, wherein the self-propelled part transport unit is configured to perform the following steps: dock to the seasoning station and transport consumable parts between the seasoning station and the self-propelled part transport unit in a vacuum environment; dock to the part storage station and transport consumable parts between the part storage station and the self-propelled part transport unit in a vacuum environment; and dock to the substrate processing chamber and transport consumable parts between the substrate processing chamber and the self-propelled part transport unit in a vacuum environment.

[0152] (Appendix 17) The maintenance system described in Appendix 16, wherein the self-propelled component transport unit is configured to perform the steps of docking with the component storage station and removing consumable components from the component storage station, docking with the seasoning station and transporting consumable components from the self-propelled component transport unit to the seasoning station, docking with the seasoning station and removing seasoned consumable components that have been seasoned in the seasoning station, and docking with the substrate processing chamber and replacing used consumable components from the substrate processing chamber with seasoned consumable components from the self-propelled component transport unit.

[0153] (Supplementary Note 18) The maintenance system described in Supplementary Note 16 or 17, wherein the seasoning station includes: a seasoning chamber; and a plasma generating unit configured to generate plasma in the seasoning chamber to season consumable parts in the seasoning chamber.

[0154] (Appendix 19) A maintenance system described in any one of Appendices 16 to 18, wherein the self-propelled component transport unit is configured to clean the inner walls of the substrate processing chamber and / or components within the substrate processing chamber in a vacuum environment while docked to the substrate processing chamber.

[0155] (Appendix 20) A maintenance system described in any one of Appendices 16 to 19, wherein the self-propelled component transport unit has a gate valve, and the gate valve is configured to hold and open / close the door of the substrate processing chamber when the self-propelled component transport unit is docked to the substrate processing chamber.

[0156] The above embodiments are described for the purpose of explanation and are not intended to limit the scope of the present disclosure. Various modifications can be made to the above embodiments without departing from the scope and spirit of the present disclosure. For example, some components in one embodiment can be added to other embodiments. Also, some components in one embodiment can be replaced with corresponding components in other embodiments.

[0157] MS...maintenance system, 1...plasma processing apparatus, 10...plasma processing chamber, 200...seasoning station, 201...parts storage station, 202...cleaning / repair station, 400...seasoning chamber, 500...parts storage chamber, 600...cleaning / repair chamber, 700...transfer chamber, 702...transfer robot, Q...consumable parts

Claims

1. A maintenance system for performing maintenance on a substrate processing chamber, comprising: a seasoning station configured to season consumable parts used in the substrate processing chamber; a part storage station; and a self-propelled part transport unit configured to self-propel between the seasoning station, the part storage station, and the substrate processing chamber, wherein the self-propelled part transport unit is configured to perform the following steps: dock to the seasoning station and remove seasoned consumable parts that have been seasoned at the seasoning station; dock to the part storage station and transport the seasoned consumable parts in the self-propelled part transport unit to the part storage station; dock to the part storage station and remove the seasoned consumable parts in the part storage station; and dock to the substrate processing chamber and replace used consumable parts in the substrate processing chamber with seasoned consumable parts in the self-propelled part transport unit.

2. The maintenance system according to claim 1, wherein the seasoning station includes: a seasoning chamber; and a plasma generating unit configured to generate plasma in the seasoning chamber to season consumable parts in the seasoning chamber.

3. The maintenance system of claim 2, wherein the component storage station includes: a component support; and a heater configured to heat the component support to maintain a seasoned consumable component supported on the component support at a first temperature.

4. A maintenance system as described in any one of claims 1 to 3, further comprising a cleaning / repair station configured to clean and / or repair used consumable parts, wherein the self-propelled part transport unit is configured to perform the steps of: docking at the cleaning / repair station and transporting used consumable parts in the self-propelled part transport unit to the cleaning / repair station; docking at the cleaning / repair station and removing consumable parts that have been cleaned and / or repaired in the cleaning / repair station; and docking at the seasoning station and transporting cleaned and / or repaired consumable parts in the self-propelled part transport unit to the seasoning station, and the seasoning station is configured to season the cleaned and / or repaired consumable parts.

5. The maintenance system of claim 4, wherein the self-propelled component transport unit includes a battery for driving the self-propelled component transport unit, and is configured to charge the battery while docked to the component storage station, the seasoning station, the cleaning / repair station, or the substrate processing chamber.

6. The maintenance system according to claim 4, wherein at least two selected from the group consisting of the part storage station, the seasoning station, and the cleaning / repair station are integrated.

7. The maintenance system according to claim 1, wherein the self-propelled component transport unit is configured to clean the inner wall of the substrate processing chamber and / or components within the substrate processing chamber in a vacuum environment while docked to the substrate processing chamber.

8. The maintenance system according to claim 7, wherein the cleaning is performed by at least one selected from the group consisting of laser, ultrasonic, plasma jet, UV, lamp, air jet and superheated steam.

9. The maintenance system according to claim 1, wherein the self-propelled component transport unit has a gate valve, and the gate valve is configured to hold and open / close the door of the substrate processing chamber when the self-propelled component transport unit is docked to the substrate processing chamber.

10. The maintenance system according to claim 9, wherein the door is configured to be switchable between a locked state and an unlocked state, and the gate valve is configured to be able to switch the door between the locked state and the unlocked state.

11. A maintenance system for performing maintenance on a first substrate processing chamber, comprising: a part storage station; and a self-propelled part transport unit configured to self-propel between the part storage station, the first substrate processing chamber, and a second substrate processing chamber, the self-propelled part transport unit being configured to season consumable parts used in the first substrate processing chamber, wherein the self-propelled part transport unit is configured to perform the following steps: dock to the second substrate processing chamber and remove seasoned consumable parts that have been seasoned in the second substrate processing chamber; dock to the part storage station and transport the seasoned consumable parts in the self-propelled part transport unit to the part storage station; dock to the part storage station and remove the seasoned consumable parts in the part storage station; and dock to the first substrate processing chamber and replace used consumable parts in the first substrate processing chamber with seasoned consumable parts in the self-propelled part transport unit.

12. The maintenance system of claim 11, wherein the component storage station includes: a component support; and a heater configured to heat the component support to maintain a seasoned consumable component supported on the component support at a first temperature.

13. The maintenance system of claim 11 or 12, further comprising a cleaning / repair station configured to clean and / or repair used consumable parts, wherein the self-propelled component transport unit is configured to perform the steps of: docking with the cleaning / repair station and transporting used consumable parts in the self-propelled component transport unit to the cleaning / repair station; docking with the cleaning / repair station and removing consumable parts that have been cleaned and / or repaired in the cleaning / repair station; and docking with the second substrate processing chamber and transporting the cleaned and / or repaired consumable parts in the self-propelled component transport unit to the second substrate processing chamber, wherein the second substrate processing chamber is configured to season the cleaned and / or repaired consumable parts.

14. The maintenance system according to claim 11, wherein the self-propelled component transport unit is configured to clean the inner wall of the first substrate processing chamber and / or components within the first substrate processing chamber in a vacuum environment while docked to the first substrate processing chamber.

15. The maintenance system according to claim 11, wherein the self-propelled component transport unit has a gate valve, and the gate valve is configured to hold and open / close the door of the first substrate processing chamber when the self-propelled component transport unit is docked to the first substrate processing chamber.

16. A maintenance system for performing maintenance on a substrate processing chamber, comprising: a seasoning station configured to season consumable parts used in the substrate processing chamber; a part storage station; and a self-propelled part transport unit configured to self-propel between the seasoning station, the part storage station, and the substrate processing chamber, wherein the self-propelled part transport unit is configured to perform the following steps: dock with the seasoning station and transport consumable parts between the seasoning station and the self-propelled part transport unit in a vacuum environment; dock with the part storage station and transport consumable parts between the part storage station and the self-propelled part transport unit in a vacuum environment; and dock with the substrate processing chamber and transport consumable parts between the substrate processing chamber and the self-propelled part transport unit in a vacuum environment.

17. The maintenance system described in claim 16, wherein the self-propelled component transport unit is configured to perform the steps of: docking with the component storage station and retrieving consumable components in the component storage station; docking with the seasoning station and transporting consumable components in the self-propelled component transport unit to the seasoning station; docking with the seasoning station and retrieving seasoned consumable components that have been seasoned in the seasoning station; and docking with the substrate processing chamber and replacing used consumable components in the substrate processing chamber with seasoned consumable components in the self-propelled component transport unit.

18. The maintenance system according to claim 17, wherein the seasoning station includes: a seasoning chamber; and a plasma generating unit configured to generate plasma in the seasoning chamber to season consumable parts in the seasoning chamber.

19. The maintenance system according to claim 16, wherein the self-propelled component transport unit is configured to clean the inner wall of the substrate processing chamber and / or components within the substrate processing chamber in a vacuum environment while docked to the substrate processing chamber.

20. The maintenance system according to claim 16, wherein the self-propelled component transport unit has a gate valve, and the gate valve is configured to hold and open / close the door of the substrate processing chamber when the self-propelled component transport unit is docked to the substrate processing chamber.

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