1results about How to "Appropriate detection" patented technology

The substrate processing apparatus includes a substrate holding unit, a nozzle, a flow path opening / closing unit, a detection unit, and a control unit capable of controlling each unit. The substrate holding portion is capable of holding a substrate. The nozzle can supply the processing liquid to the substrate or a component different from the substrate. The flow path opening and closing portion is capable of opening and closing a supply flow path for supplying the processing liquid to the nozzle. The detection unit is capable of detecting the presence or absence of the processing liquid landing on the substrate or the member. The control unit outputs, to the flow path opening and closing unit, an opening signal for causing the flow path opening and closing unit to perform an opening operation for opening the supply flow path. The control unit detects an operation abnormality of the flow path opening / closing unit on the basis of an elapsed time from the output of the opening signal until the detection unit detects that the processing liquid has landed.