3results about How to "Appropriate detection" patented technology

The invention provides a substrate processing apparatus and a substrate processing method, which can properly detect the edge position of a transparent substrate. The substrate processing apparatus includes a light sensor (46) and a control unit. The light sensor projects and receives inspection light at detection positions (P1, P2) on an advancing and retreating path of the substrate (W), and outputs a light blocking signal when the light receiving amount of the inspection light is lower than a threshold value. When the substrate (W) is separated from the detection position (P1), the control unit detects the position of the edge (E) of the substrate (W) on the basis of the end portion of the light blocking signal. Furthermore, when the substrate (W) approaches the detection position (P2), the control unit detects the position of the edge (E) of the substrate (W) on the basis of the start end of the light-blocking signal. As a result, the position of the edge of the substrate can be detected on the basis of the signal of the portion closest to the outside of the substrate (W) among the light blocking signals output near the edge (E) of the substrate (W). Therefore, the position of the edge of the transparent substrate can be properly detected.

A non-combustion type inhalator (100) comprises: a case (110); a power supply (10); a heating unit (130) heating a rod (500) by electric power supplied from the power supply (10); a control unit (120) controlling the heating unit (130); a rod accommodation portion (140) configured to allow insertion and extraction of the rod (500) and to be able to accommodate at least a part of the rod (500); a bottom cap (134) movable in accordance with insertion of the rod (500) in the insertion direction; a biasing member (136) biasing the bottom cap (134) in an opposite direction to the insertion direction; and an internal switch (16) arranged inside the case (110) and detecting displacement of the bottom cap (134) in the insertion direction. The control unit (120) starts heating of the heating unit (130) upon detecting an input to the internal switch (16).

The substrate processing apparatus includes a substrate holding unit, a nozzle, a flow path opening / closing unit, a detection unit, and a control unit capable of controlling each unit. The substrate holding portion is capable of holding a substrate. The nozzle can supply the processing liquid to the substrate or a component different from the substrate. The flow path opening and closing portion is capable of opening and closing a supply flow path for supplying the processing liquid to the nozzle. The detection unit is capable of detecting the presence or absence of the processing liquid landing on the substrate or the member. The control unit outputs, to the flow path opening and closing unit, an opening signal for causing the flow path opening and closing unit to perform an opening operation for opening the supply flow path. The control unit detects an operation abnormality of the flow path opening / closing unit on the basis of an elapsed time from the output of the opening signal until the detection unit detects that the processing liquid has landed.