This invention belongs to the field of
black phosphorus preparation technology, and particularly relates to a method for preparing
black phosphorus thin films with controllable thickness based on CVT. The technical problem to be solved is the technical challenge of large-size film growth in the industrial preparation of
black phosphorus. Key technical points: S1, Selecting a "Z-shaped"
quartz tube as the reaction vessel; S2, Preparing an epitaxial growth substrate with lattice-inducing ability; S3, Loading the
quartz tube with the high end as the
raw material conversion zone and the low end as the epitaxial growth zone; wherein, loading the
raw material conversion zone involves placing a mixed
phosphorus source and mineralizer at the high end of the
quartz tube; loading the epitaxial growth zone involves placing the substrate at the low end of the quartz tube; S4, After vacuum sealing the quartz tube, a seed layer is generated, and under the induction of the seed layer, black
phosphorus grows laterally along the surface of the substrate; S5, Cooling the quartz tube to
room temperature at a certain
cooling rate to obtain a cooled black
phosphorus film of a certain thickness.