Touch display panel, manufacturing method and touch display device

Abstract

The invention discloses a touch display panel, a manufacturing method and a touch display device.The manufacturing method comprises the steps that the first surface of a substrate is covered with a transparent conducting layer, patterned first touch electrode parts and bonding pads are formed through etching, and then high-temperature annealing process treatment is conducted; then box forming process treatment is carried out; the first surface of the substrate is covered with a metal layer, patterned second touch electrode parts and patterned second touch electrode strips are formed through etching, and the first touch electrode parts and the second touch electrode parts jointly form first touch electrode strips. According to the touch display panel, the first touch electrode part and the bonding pad are formed on the first surface of the substrate, high-temperature annealing process treatment is carried out, then box forming process treatment is carried out, and then other electrodes of the externally-embedded touch structure are manufactured, so that the high-temperature annealing process of the transparent conductive layer is not limited by the temperature of the touch display panel, and the quality of the transparent conductive layer can be improved; the bonding pad is made of the transparent conductive layer, has good anti-corrosion performance, and has better adhesive force with the substrate.

Description

Technical Field

[0001] The present invention relates to the technical field of capacitor processing, and in particular to a touch display panel and a manufacturing method thereof, and a touch display device. Background Art

[0002] With the rapid development of display technology, touch display panels have been widely accepted and used by people, such as smart phones, tablet computers, etc. Touch display panels are used. Touch display panels use embedded touch technology to combine the touch panel and display panel into one, and embed the touch panel function into the display panel, so that the display panel has the functions of displaying and sensing touch input at the same time.

[0003] According to the different ways of setting the touch sensing layer in the display panel, the touch display panel is divided into add-on mode, in-cell and on-cell structures. The in-cell touch screen integrates the touch function into the display screen, which can effectively reduce the thickness of the entire display and simplify the production process, making the product thinner and lighter, and lower the production cost. The on-cell touch screen is to directly configure the touch panel on the liquid crystal display panel. Compared with the in-cell technology, it is much easier and widely used. It is one of the mainstream touch technologies in liquid crystal display devices.

[0004] Figure 1 Schematic diagram of the structure of a touch display panel in the prior art. Figure 1As shown, the on-cell touch structure in the prior art 1 is to directly manufacture the first touch electrode layer 11 and the second touch electrode layer 12 on the surface of the liquid crystal display panel, the first touch electrode layer 11 and the second touch electrode layer 12 are respectively located in different layers and separated by the first insulating layer 101, and then covered with the second insulating layer 102 to cover the second touch electrode layer 12. Among them, the first touch electrode layer 11 has a plurality of first touch electrode strips 111, and the second touch electrode layer 12 has a plurality of second touch electrode strips 121, one of the first touch electrode strips 111 and the second touch electrode strips 121 is a touch driving electrode (Tx), and the other is a touch sensing electrode (Rx), and the first touch electrode strips 111 and the second touch electrode strips 121 intersect each other to form a touch sensing capacitor, thereby realizing the touch function. A binding area is provided in the non-display area of ​​the edge, and a pad 13 is provided in the binding area. The first touch electrode strip 111 and the second touch electrode strip 121 are conductively connected to the corresponding pad 13 in the binding area through the touch signal routing. In order to save manufacturing process, the pad 13 is usually etched by the same metal film as the first touch electrode layer 11 through the same mask process, and the second touch electrode layer 12 is etched by another metal film through a mask process. Since the pad 13 is made of metal and exposed, the pad 13 is prone to corrosion during testing, use or other tests, resulting in poor contact and product reliability issues.

[0005] Figure 2 Schematic diagram of the structure of the touch display panel in the prior art II, such as Figure 2 As shown, in order to avoid the problem that the pad 13 is exposed to the outside and is prone to corrosion, the prior art 2 is based on the technology of the prior art 1, and the pad 13 and the first touch electrode layer 11 are etched by the same mask process using the same metal film and the same transparent conductive film (ITO), that is, a layer of transparent conductive film is covered on the surface of the metal film, so that the pad 13 can be protected to a certain extent, so as to avoid the problem that the pad 13 is exposed to the outside and is prone to corrosion. In order to avoid damage to the embedded touch structure in the process of making the liquid crystal display panel, the embedded touch structure is usually made on the outer surface of the liquid crystal display panel after the liquid crystal display panel manufacturing process is completed. Due to the temperature limitation of the liquid crystal display panel, the transparent conductive film cannot be subjected to high-temperature annealing process, so that the stability of the quality of the transparent conductive film is poor. After the touch display panel has undergone high-temperature aging test, the quality and conductivity of the transparent conductive film are poor, resulting in the pad 13 being prone to poor contact, affecting the touch performance. Summary of the invention

[0006] In order to overcome the shortcomings and deficiencies in the prior art, an object of the present invention is to provide a touch display panel and a manufacturing method thereof, and a touch display device, so as to solve the problem that the pads of the touch display panel in the prior art are prone to poor contact.

[0007] The purpose of the present invention is achieved through the following technical solutions:

[0008] The present invention provides a method for manufacturing a touch display panel, comprising:

[0009] Providing a substrate having a first surface and a second surface disposed opposite to each other;

[0010] Covering a transparent conductive layer on the first surface of the substrate, etching the transparent conductive layer to form a patterned first touch electrode portion and a pad, and performing a high-temperature annealing process on the etched transparent conductive layer;

[0011] A black matrix and a color resist layer are fabricated on the second surface of the substrate, wherein the black matrix separates the plurality of color resist layers from each other to form a color filter substrate;

[0012] Providing an array substrate and a liquid crystal layer, and subjecting the color filter substrate, the array substrate and the liquid crystal layer to a box process, wherein the liquid crystal layer is located between the color filter substrate and the array substrate, and the transparent conductive layer is located on a side of the color filter substrate away from the liquid crystal layer;

[0013] forming a first insulating layer covering the transparent conductive layer on a first surface of the substrate;

[0014] Etching the first insulating layer to form a contact hole corresponding to the first touch electrode portion;

[0015] A metal layer covering the first insulating layer is formed on the first insulating layer, and the metal layer is etched to form patterned second touch electrode portions and second touch electrode strips, and the two second touch electrode portions separated by the second touch electrode strips are connected to the corresponding first touch electrode portions through the contact holes, and the first touch electrode portions and the second touch electrode portions together form a first touch electrode strip, and the first touch electrode strip and the second touch electrode strip are respectively conductively connected to the corresponding pads.

[0016] Furthermore, a first touch signal routing line and a second touch signal routing line are provided on a side of the color film substrate away from the liquid crystal layer, the first touch electrode strip is conductively connected to the corresponding pad through the first touch signal routing line, and the second touch electrode strip is conductively connected to the corresponding pad through the second touch signal routing line;

[0017] The first touch signal wiring and the second touch signal wiring are both formed by etching the transparent conductive layer and / or the metal layer.

[0018] Furthermore, the production method comprises:

[0019] When etching the transparent conductive layer, the transparent conductive layer also forms a patterned first wiring and a second wiring, the first wiring forms a first touch signal wiring, and the second wiring forms a second touch signal wiring;

[0020] Alternatively, when the metal layer is etched, the metal layer further forms a patterned third wiring and a fourth wiring, the third wiring forms a first touch signal wiring, and the fourth wiring forms a second touch signal wiring.

[0021] Furthermore, the production method comprises:

[0022] When the transparent conductive layer is etched, the transparent conductive layer also forms a patterned first wiring and a second wiring;

[0023] When the metal layer is etched, the metal layer also forms a patterned third wiring and a fourth wiring;

[0024] The third routing line is stacked on the upper surface of the first routing line and together forms a first touch signal routing line. The fourth routing line is stacked on the upper surface of the second routing line and together forms a second touch signal routing line.

[0025] Furthermore, the production method comprises:

[0026] After the transparent conductive layer is subjected to a high temperature annealing process and before the black matrix and the color resist layer are formed on the second surface of the substrate, a first insulating layer covering the transparent conductive layer is formed on the first surface of the substrate;

[0027] After the box forming process, the first insulating layer is etched to form a contact hole corresponding to the first touch electrode portion.

[0028] Furthermore, the production method comprises:

[0029] After the transparent conductive layer is subjected to a high temperature annealing process and before the black matrix and the color resist layer are formed on the second surface of the substrate, a protective film covering the transparent conductive layer is formed on the first surface of the substrate;

[0030] After the box forming process, the protective film is peeled off, and a first insulating layer covering the transparent conductive layer is formed on the first surface of the substrate.

[0031] The present application also provides a touch display panel, which is manufactured using the above-mentioned method for manufacturing a touch display panel, and the touch display panel includes:

[0032] The color filter substrate, the array substrate arranged opposite to the color filter substrate, and the liquid crystal layer located between the color filter substrate and the array substrate;

[0033] A transparent conductive layer, a first insulating layer and a metal layer are sequentially provided on a side of the color film substrate away from the liquid crystal layer, the transparent conductive layer includes a patterned first touch electrode portion and a pad, the first insulating layer is provided with a contact hole in an area corresponding to the first touch electrode portion, the metal layer includes a patterned second touch electrode portion and a second touch electrode strip, two second touch electrode portions separated by the second touch electrode strip are connected to the corresponding first touch electrode portion through the contact hole, the first touch electrode portion and the second touch electrode portion together form a first touch electrode strip, and the first touch electrode strip and the second touch electrode strip are respectively conductively connected to the corresponding pad.

[0034] Furthermore, a first touch signal routing and a second touch signal routing are provided on a side of the color film substrate away from the liquid crystal layer, the first touch electrode strip is conductively connected to the corresponding pad through the first touch signal routing, and the second touch electrode strip is conductively connected to the corresponding pad through the second touch signal routing.

[0035] Furthermore, the transparent conductive layer further includes a patterned first wiring and a second wiring, the first wiring forms the first touch signal wiring, and the second wiring forms the second touch signal wiring;

[0036] Alternatively, the metal layer further includes a patterned third routing line and a fourth routing line, the third routing line forms the first touch signal routing line, and the fourth routing line forms the second touch signal routing line.

[0037] Furthermore, the transparent conductive layer also includes a patterned first routing and a second routing, and the metal layer also includes a patterned third routing and a fourth routing, the third routing is stacked on the upper surface of the first routing and together forms the first touch signal routing, and the fourth routing is stacked on the upper surface of the second routing and together forms the second touch signal routing.

[0038] Further, the projection of the first touch electrode portion on the color film substrate overlaps with the first touch electrode strip; or, the first touch electrode portion includes a plurality of bridging electrode blocks, each of which connects two corresponding second touch electrode portions.

[0039] The present application also provides a touch display device, comprising the touch display panel as described above.

[0040] The beneficial effects of the present invention are as follows: by first forming the first touch electrode portion and the pad on the first surface of the substrate and performing a high-temperature annealing process, a black matrix and a color resist layer are made on the second surface of the substrate to form a color film substrate, and then the array substrate and the liquid crystal layer are subjected to a box-forming process, and then other electrodes of the embedded touch structure are made, so that the high-temperature annealing process of the transparent conductive layer is not limited by the temperature of the touch display panel, and at the same time, the quality and conductivity of the transparent conductive layer can be improved; moreover, the pad is made of a transparent conductive layer, which has good corrosion resistance and better adhesion to the substrate, thereby avoiding the problem of poor contact of the pad. In addition, the first touch electrode portion of the first touch electrode strip and the pad are formed by etching the same transparent conductive layer, and the second touch electrode portion of the first touch electrode strip and the second touch electrode strip are formed by etching the same metal layer, thereby reducing one process to reduce the manufacturing cost. BRIEF DESCRIPTION OF THE DRAWINGS

[0041] Figure 1 It is a structural schematic diagram of a touch display panel in the prior art;

[0042] Figure 2 It is a structural schematic diagram of a touch display panel in the prior art II;

[0043] Figure 3 is a schematic structural diagram of a touch display panel in Embodiment 1 of the present invention;

[0044] Figure 4 is a schematic diagram of the planar structure of the touch display panel in the first embodiment of the present invention;

[0045] Figure 5 is a schematic diagram of the planar structure of the touch electrodes on the color film substrate in the first embodiment of the present invention;

[0046] Figure 6 is a schematic diagram of the planar structure of the transparent conductive layer in Embodiment 1 of the present invention;

[0047] Figure 7 is a schematic diagram of the planar structure of the metal layer in the first embodiment of the present invention;

[0048] Figure 8 is a schematic diagram of the planar structure of the third wiring and the second touch electrode portion in the metal layer in the first embodiment of the present invention;

[0049] Fig. 9 is a schematic diagram of the planar structure of the fourth wiring and the second touch electrode strip in the metal layer in the first embodiment of the present invention;

[0050] Fig.10 is a schematic diagram of the planar structure of the first touch electrode strip in the first embodiment of the present invention;

[0051] Fig.11is a schematic diagram of the cross-sectional structure of the color filter substrate in the edge non-display area in the first embodiment of the present invention;

[0052] Figure 12a-12h is a structural schematic diagram of a touch display panel manufacturing process in the first embodiment of the present invention;

[0053] Fig.13 is a schematic diagram of the planar structure of the transparent conductive layer in the second embodiment of the present invention;

[0054] Fig.14 is a schematic diagram of the cross-sectional structure of the color filter substrate in the edge non-display area in the second embodiment of the present invention;

[0055] Fig.15 is a schematic structural diagram of a touch display panel in Embodiment 3 of the present invention;

[0056] Fig.16 is a schematic diagram of the planar structure of the transparent conductive layer in the third embodiment of the present invention;

[0057] Fig.17 is a schematic structural diagram of the touch display device in the present invention in a dark state;

[0058] Fig.18 It is a schematic diagram of the structure of the touch display device in the present invention when it is in a bright state. DETAILED DESCRIPTION

[0059] In order to further explain the technical means and effects adopted by the present invention to achieve the predetermined invention purpose, the specific implementation methods, structures, features and effects of the touch display panel and manufacturing method, and the touch display device proposed in the present invention are described in detail below in conjunction with the accompanying drawings and preferred embodiments:

[0060] [Example 1]

[0061] Figure 3 It is a schematic diagram of the structure of the touch display panel in the first embodiment of the present invention. Figure 4 It is a schematic diagram of the planar structure of the touch display panel in the first embodiment of the present invention. Figure 5 It is a schematic diagram of the planar structure of the touch electrode on the color film substrate in the first embodiment of the present invention. Figure 6 It is a schematic diagram of the planar structure of the transparent conductive layer in the first embodiment of the present invention. Figure 7 It is a schematic diagram of the planar structure of the metal layer in the first embodiment of the present invention. Figure 8 It is a schematic diagram of the planar structure of the third wiring and the second touch electrode portion in the metal layer in an embodiment of the present invention. Fig. 9 It is a schematic diagram of the planar structure of the fourth wiring and the second touch electrode strip in the metal layer in the first embodiment of the present invention. Fig.10 It is a schematic diagram of the planar structure of the first touch electrode strip in the first embodiment of the present invention.

[0062] like Figures 3 to 10 As shown, a touch display panel provided in the first embodiment of the present invention has a display area 110 and a non-display area 120 located around the display area 110, and a binding area 130 is provided in the non-display area 120. The touch display panel includes: a color filter substrate 10, an array substrate 20 arranged opposite to the color filter substrate 10, and a liquid crystal layer 30 located between the color filter substrate 10 and the array substrate 20. Among them, the liquid crystal layer 30 preferably uses positive liquid crystal molecules, that is, liquid crystal molecules with positive dielectric anisotropy. In the initial state, the positive liquid crystal molecules in the liquid crystal layer 30 are aligned parallel to the color filter substrate 10 and the array substrate 20, and the alignment direction of the positive liquid crystal molecules close to the color filter substrate 10 is parallel or anti-parallel to the positive liquid crystal molecules close to the array substrate 20. Of course, in other embodiments, the alignment directions of the positive liquid crystal molecules on the side close to the color filter substrate 10 and the positive liquid crystal molecules on the side close to the array substrate 20 are perpendicular to each other, and the liquid crystal layer 30 is twisted by 90°, thereby forming a TN display mode; alternatively, the liquid crystal layer 30 may also use negative liquid crystal molecules, and the negative liquid crystal molecules in the liquid crystal layer 30 may be aligned perpendicular to the color filter substrate 10 and the array substrate 20, which is similar to the alignment method of the VA display mode.

[0063] A black matrix 14 and a color resist layer 15 are provided on the side of the color filter substrate 10 facing the liquid crystal layer 30. The multiple color resist layers 15 are distributed in an array in the display area 110 and are separated from each other by the black matrix 14. The color resist layer 15 contains red (R), green (G), and blue (B) color resist materials, and correspondingly forms sub-pixels of red (R), green (G), and blue (B). The black matrix 14 not only separates the multiple color resist layers 15 in the display area 110 from each other, but also completely covers the non-display area 120 to avoid light leakage in the non-display area 120.

[0064] A transparent conductive layer 16, a first insulating layer 101 and a metal layer 17 are sequentially provided on the side of the color film substrate 10 away from the liquid crystal layer 30. The transparent conductive layer 16 and the metal layer 17 are separated from each other by the first insulating layer 101. The transparent conductive layer 16 includes a patterned first touch electrode portion 111a and a pad 13. The first insulating layer 101 is provided with a contact hole 103 in a region corresponding to the first touch electrode portion 111a. The metal layer 17 includes a patterned second touch electrode portion 111b and a second touch electrode bar 121. The two second touch electrode portions 111b separated by the second touch electrode bar 121 are connected to the corresponding first touch electrode portion 111a through the contact hole 103. The first touch electrode portion 111a and the second touch electrode portion 111b together form a first touch electrode bar 111. The first touch electrode bar 111 and the second touch electrode bar 121 are respectively conductively connected to the corresponding pad 13. In addition, the first touch electrode portion 111a of the first touch electrode bar 111 and the pad 13 are formed by etching the same transparent conductive layer 16, and the second touch electrode portion 111b of the first touch electrode bar 111 and the second touch electrode bar 121 are formed by etching the same metal layer 17, thereby reducing one process step to reduce the manufacturing cost. The first touch electrode portion 111a, the second touch electrode portion 111b, the first touch electrode bar 111 and the second touch electrode bar 121 are all located in the display area 110, the pad 13 is located in the binding area 130 in the non-display area 120, and the touch chip is bound to the pad 13 through the printed circuit board (FPC) 50, so as to transmit touch signals to the first touch electrode bar 111 and the second touch electrode bar 121. One of the first touch electrode strip 111 and the second touch electrode strip 121 is a touch driving electrode (Tx), and the other is a touch sensing electrode (Rx), so as to realize an external embedded touch structure, the touch electrode is closer to the user, and the touch effect is better. The material of the transparent conductive layer 16 can be indium tin oxide (ITO) or indium zinc oxide (IZO). The metal layer 17 can be made of metals such as copper (Cu), silver (Ag), chromium (Cr), molybdenum (Mo), aluminum (Al), titanium (Ti), manganese (Mn), nickel (Ni), etc., or a combination of the above metals, such as Al / Mo, Cu / Mo, etc.

[0065] In this embodiment, Figure 3 , Figure 8 as well as Fig.10 As shown, the first touch electrode portion 111a includes a plurality of bridging electrode blocks, each of which connects two corresponding second touch electrode portions 111b. That is, the first touch electrode portion 111a in this embodiment plays a bridging role, and is used to connect the two second touch electrode portions 111b separated by the second touch electrode strip 121 together, thereby forming the first touch electrode strip 111 together.

[0066] Furthermore, the extension directions of the first touch electrode strips 111 and the second touch electrode strips 121 are perpendicular to each other, and mutual capacitance is formed at the intersection of the first touch electrode strips 111 and the second touch electrode strips 121. The first touch electrode strips 111 and the second touch electrode strips 121 are both grid structures, that is, the first touch electrode strips 111 and the second touch electrode strips 121 are both bar-shaped grid structures as a whole, thereby reducing the impact on light transmittance. Among them, two adjacent first touch electrode strips 111 are insulated and spaced apart from each other, and two adjacent second touch electrode strips 121 are insulated and spaced apart from each other, and each of the first touch electrode strips 111 and the second touch electrode strips 121 can cover multiple rows or columns of sub-pixels.

[0067] Furthermore, a second insulating layer 102 is provided on the side of the color filter substrate 10 away from the liquid crystal layer 30. The second insulating layer 102 covers the metal layer 17 and the first insulating layer 101, so as to flatten and protect the surface of the color filter substrate 10 away from the liquid crystal layer 30. However, the first insulating layer 101 and the second insulating layer 102 do not cover the pad 13. The pad 13 is exposed from the binding area 130 of the non-display area 120 to facilitate binding with the circuit board (FPC) 50. The second insulating layer 102 exceeds the first insulating layer 101 by 50-100um near the binding area 130, so as to cover the first insulating layer 101. The materials of the first insulating layer 101 and the second insulating layer 102 are silicon oxide (SiOx), silicon nitride (SiNx) or a combination of the two, or can also be OC materials.

[0068] like Figure 5 As shown, a first touch signal line 181 and a second touch signal line 182 are provided on a side of the color film substrate 10 away from the liquid crystal layer 30, the first touch electrode strip 111 is conductively connected to the corresponding pad 13 through the first touch signal line 181, and the second touch electrode strip 121 is conductively connected to the corresponding pad 13 through the second touch signal line 182. The first touch signal line 181 and the second touch signal line 182 are both located in the non-display area 120 at the edge of the touch display panel, and extend to the edge of the binding area 130 to be conductively connected to the pad 13 in the binding area 130, thereby preventing the first touch signal line 181 and the second touch signal line 182 from affecting the normal picture display in the display area 110.

[0069] In this embodiment, Figures 6 to 11As shown, the transparent conductive layer 16 also includes a patterned first routing line 161 and a second routing line 162, and the metal layer 17 also includes a patterned third routing line 171 and a fourth routing line 172. The third routing line 171 is stacked on the upper surface of the first routing line 161 and together forms a first touch signal routing line 181, and the fourth routing line 172 is stacked on the upper surface of the second routing line 162 and together forms a second touch signal routing line 182, thereby reducing the impedance of the first touch signal routing line 181 and the second touch signal routing line 182. Among them, the surfaces of the first routing 161 and the third routing 171 are in direct contact, and the surfaces of the second routing 162 and the fourth routing 172 are in direct contact, that is, when etching the first insulating layer 101, it is necessary to etch away the first insulating layer 101 in the area of ​​the first routing 161 and the second routing 162 to expose the first routing 161 and the second routing 162. Only after covering and etching the metal layer 17 to form the third routing 171 and the fourth routing 172, can it be ensured that the surfaces of the first routing 161 and the third routing 171 are in direct contact, and the surfaces of the second routing 162 and the fourth routing 172 are in direct contact.

[0070] The array substrate 20 is formed into a plurality of pixel units by a plurality of scan lines (not shown) and a plurality of data lines (not shown) which are mutually insulated and crossed on the side facing the liquid crystal layer 30. A pixel electrode 22 and a thin film transistor (not shown) are provided in each pixel unit. The pixel electrode 22 is electrically connected to the data line of the adjacent thin film transistor through the thin film transistor. The thin film transistor includes a gate, an active layer, a drain and a source. The gate and the scan line are located in the same layer and are electrically connected. The gate and the active layer are separated by an insulating layer. The source is electrically connected to the data line, and the drain is electrically connected to the pixel electrode 22 through a contact hole.

[0071] like Figure 3 As shown, in this embodiment, a common electrode 21 is further provided on the side of the array substrate 20 facing the liquid crystal layer 30. The common electrode 21 and the pixel electrode 22 are located in different layers and insulated and isolated by an insulating layer. The common electrode 21 can be located above or below the pixel electrode 22 ( Figure 3As shown in the figure, the common electrode 21 is located below the pixel electrode 22). Preferably, the common electrode 21 is a planar electrode arranged on the entire surface, and the pixel electrode 22 is a block electrode arranged in each pixel unit or a slit electrode having a plurality of electrode strips to form a fringe field switching mode (Fringe Field Switching, FFS). Of course, in other embodiments, the pixel electrode 22 and the common electrode 21 may be located on the same layer, but the two are insulated and isolated from each other, and the pixel electrode 22 and the common electrode 21 may each include a plurality of electrode strips, and the electrode strips of the pixel electrode 22 and the electrode strips of the common electrode 21 are arranged alternately with each other to form an in-plane switching mode (In-Plane Switching, IPS); or, in other embodiments, the array substrate 20 is provided with a pixel electrode 22 on the side facing the liquid crystal layer 30, and the color film substrate is provided with a common electrode 21 on the side facing the liquid crystal layer 30 to form a TN mode or a VA mode.

[0072] Furthermore, an upper polarizer 51 is provided on the color filter substrate 10 , and the upper polarizer 51 is provided on the side of the second insulating layer 102 away from the color filter substrate 10 . A lower polarizer 52 is also provided on the array substrate 20 , and the light transmission axes of the upper polarizer 51 and the lower polarizer 52 are perpendicular to each other.

[0073] The color filter substrate 10 and the array substrate 20 may be made of glass, acrylic, polycarbonate, etc. The common electrode 21 and the pixel electrode 22 may be made of indium tin oxide (ITO) or indium zinc oxide (IZO), etc.

[0074] Figure 12a-12h FIG. 1 is a schematic diagram of the structure of the touch display panel manufacturing process in the first embodiment of the present invention. Figure 12a-12h As shown, the present application also provides a method for manufacturing a touch display panel, which is used to manufacture the touch display panel as described above. The manufacturing method comprises:

[0075] like Fig.12a As shown, a substrate 100 is provided, and the substrate 100 has a first surface 100a and a second surface 100b arranged opposite to each other. The substrate 100 can be made of transparent materials such as glass, quartz, silicon, acrylic acid or polycarbonate. The first metal layer can be made of metals such as copper (Cu), silver (Ag), chromium (Cr), molybdenum (Mo), aluminum (Al), titanium (Ti), manganese (Mn), nickel (Ni), etc., or a combination of the above metals such as Al / Mo, Cu / Mo, etc.

[0076] like Figure 12a-12bAs shown, a transparent conductive layer 16 is covered on the first surface 100a of the substrate 100, and a mask process (photoresist, exposure, development, etching, and photoresist removal) is used to etch the transparent conductive layer 16 to form a patterned first touch electrode portion 111a and a pad 13, and then a high-temperature annealing process is performed on the etched transparent conductive layer 16 to improve the stability of the transparent conductive layer 16 and the adhesion to the surface of the substrate 100. The material of the transparent conductive layer 16 can be indium tin oxide (ITO) or indium zinc oxide (IZO).

[0077] like Fig.12c As shown, a protective film 1 covering the transparent conductive layer 16 is formed on the first surface 100a of the substrate 100, so as to provide a good protective effect on the transparent conductive layer 16 and prevent the transparent conductive layer 16 from being damaged in subsequent processes. The protective film 1 may be an acid-resistant material, and a layer of the protective film 1 is formed on the surface of the transparent conductive layer 16 after UV light curing.

[0078] like Fig.12d As shown, a black matrix 14 and a color resist layer 15 are made on the second surface 100b of the substrate 100. The black matrix 14 separates the multiple color resist layers 15 from each other to form a color filter substrate 10. The multiple color resist layers 15 are distributed in an array in the display area 110 and are separated from each other by the black matrix 14. The color resist layer 15 contains red (R), green (G), and blue (B) color resist materials, and correspondingly forms sub-pixels of red (R), green (G), and blue (B). The black matrix 14 not only separates the multiple color resist layers 15 in the display area 110 from each other, but also completely covers the non-display area 120 to avoid light leakage in the non-display area 120.

[0079] like Fig.12e As shown, an array substrate 20 and a liquid crystal layer 30 are provided, and the color filter substrate 10, the array substrate 20 and the liquid crystal layer 30 are subjected to a box-forming process, the liquid crystal layer 30 is located between the color filter substrate 10 and the array substrate 20, and the transparent conductive layer 16 is located on a side of the color filter substrate 10 away from the liquid crystal layer 30. The specific steps of the box-forming process of the touch display panel are conventional process technologies in the art, and can be referred to the prior art, and will not be repeated here.

[0080] The liquid crystal layer 30 preferably uses positive liquid crystal molecules, that is, liquid crystal molecules with positive dielectric anisotropy. In the initial state, the positive liquid crystal molecules in the liquid crystal layer 30 are aligned parallel to the color filter substrate 10 and the array substrate 20, and the alignment direction of the positive liquid crystal molecules close to the color filter substrate 10 is parallel or anti-parallel to the positive liquid crystal molecules close to the array substrate 20. Of course, in other embodiments, the alignment directions of the positive liquid crystal molecules close to the color filter substrate 10 and the positive liquid crystal molecules close to the array substrate 20 are perpendicular to each other, and the liquid crystal layer 30 is twisted by 90°, thereby forming a TN display mode; alternatively, the liquid crystal layer 30 may also use negative liquid crystal molecules, and the negative liquid crystal molecules in the liquid crystal layer 30 may be aligned perpendicular to the color filter substrate 10 and the array substrate 20, that is, similar to the alignment mode of the VA display mode.

[0081] The array substrate 20 is formed into a plurality of pixel units by a plurality of scan lines (not shown) and a plurality of data lines (not shown) which are mutually insulated and crossed on the side facing the liquid crystal layer 30. A pixel electrode 22 and a thin film transistor (not shown) are provided in each pixel unit. The pixel electrode 22 is electrically connected to the data line of the adjacent thin film transistor through the thin film transistor. The thin film transistor includes a gate, an active layer, a drain and a source. The gate and the scan line are located in the same layer and are electrically connected. The gate and the active layer are separated by an insulating layer. The source is electrically connected to the data line, and the drain is electrically connected to the pixel electrode 22 through a contact hole.

[0082] refer to Figure 3 As shown, in this embodiment, a common electrode 21 is further provided on the side of the array substrate 20 facing the liquid crystal layer 30. The common electrode 21 and the pixel electrode 22 are located in different layers and insulated and isolated by an insulating layer. The common electrode 21 can be located above or below the pixel electrode 22 ( Figure 3 As shown in the figure, the common electrode 21 is located below the pixel electrode 22). Preferably, the common electrode 21 is a planar electrode arranged on the entire surface, and the pixel electrode 22 is a block electrode arranged in each pixel unit or a slit electrode having a plurality of electrode strips to form a fringe field switching mode (Fringe Field Switching, FFS). Of course, in other embodiments, the pixel electrode 22 and the common electrode 21 may be located on the same layer, but the two are insulated and isolated from each other, and the pixel electrode 22 and the common electrode 21 may each include a plurality of electrode strips, and the electrode strips of the pixel electrode 22 and the electrode strips of the common electrode 21 are arranged alternately with each other to form an in-plane switching mode (In-Plane Switching, IPS); or, in other embodiments, the array substrate 20 is provided with a pixel electrode 22 on the side facing the liquid crystal layer 30, and the color film substrate is provided with a common electrode 21 on the side facing the liquid crystal layer 30 to form a TN mode or a VA mode.

[0083] like Fig.12fAs shown, after the box forming process is completed, the protective film 1 is peeled off, and then a first insulating layer 101 covering the transparent conductive layer 16 is formed on the first surface 100a of the substrate 100. The first insulating layer 101 is etched and a contact hole 103 corresponding to the first touch electrode portion 111a is formed, thereby exposing the first touch electrode portion 111a. Of course, in other embodiments, after the transparent conductive layer 16 is subjected to a high-temperature annealing process, and before the black matrix 14 and the color resist layer 15 are made on the second surface 100b of the substrate 100, a first insulating layer 101 covering the transparent conductive layer 16 can be formed on the first surface 100a of the substrate 100, so that the transparent conductive layer 16 is protected by the first insulating layer 101, and there is no need to additionally set up a protective film 1; after the box forming process, the first insulating layer 101 is etched and a contact hole 103 corresponding to the first touch electrode portion 111a is formed.

[0084] like Figure 12gAs shown, a metal layer 17 covering the first insulating layer 101 is formed on the first insulating layer 101, and a mask process (photoresist, exposure, development, etching, and photoresist removal) is used to etch the metal layer 17 to form patterned second touch electrode portions 111b and second touch electrode strips 121. The two second touch electrode portions 111b separated by the second touch electrode strips 121 are connected to the corresponding first touch electrode portions 111a through the contact holes 103, and the first touch electrode portions 111a and the second touch electrode portions 111b together form the first touch electrode strips 111, and the first touch electrode strips 111 and the second touch electrode strips 121 are respectively conductively connected to the corresponding pads 13. In addition, the first touch electrode portion 111a of the first touch electrode bar 111 and the pad 13 are formed by etching the same transparent conductive layer 16, and the second touch electrode portion 111b of the first touch electrode bar 111 and the second touch electrode bar 121 are formed by etching the same metal layer 17, thereby reducing one process step to reduce the manufacturing cost. The first touch electrode portion 111a, the second touch electrode portion 111b, the first touch electrode bar 111 and the second touch electrode bar 121 are all located in the display area 110, the pad 13 is located in the binding area 130 in the non-display area 120, and the touch chip is bound to the pad 13 through the printed circuit board (FPC) 50, so as to transmit touch signals to the first touch electrode bar 111 and the second touch electrode bar 121. One of the first touch electrode strip 111 and the second touch electrode strip 121 is a touch driving electrode (Tx), and the other is a touch sensing electrode (Rx), so as to realize an external embedded touch structure, the touch electrode is closer to the user, and the touch effect is better. The material of the transparent conductive layer 16 can be indium tin oxide (ITO) or indium zinc oxide (IZO). The metal layer 17 can be made of metals such as copper (Cu), silver (Ag), chromium (Cr), molybdenum (Mo), aluminum (Al), titanium (Ti), manganese (Mn), nickel (Ni), etc., or a combination of the above metals, such as Al / Mo, Cu / Mo, etc.

[0085] In this embodiment, reference Figure 3 , Figure 8 as well as Fig.10 As shown, the first touch electrode portion 111a includes a plurality of bridging electrode blocks, each of which connects two corresponding second touch electrode portions 111b. That is, the first touch electrode portion 111a in this embodiment plays a bridging role, and is used to connect the two second touch electrode portions 111b separated by the second touch electrode strip 121 together, thereby forming the first touch electrode strip 111 together.

[0086] Furthermore, the extension directions of the first touch electrode strips 111 and the second touch electrode strips 121 are perpendicular to each other, and mutual capacitance is formed at the intersection of the first touch electrode strips 111 and the second touch electrode strips 121. The first touch electrode strips 111 and the second touch electrode strips 121 are both grid structures, that is, the first touch electrode strips 111 and the second touch electrode strips 121 are both bar-shaped grid structures as a whole, thereby reducing the impact on light transmittance. Among them, two adjacent first touch electrode strips 111 are insulated and spaced apart from each other, and two adjacent second touch electrode strips 121 are insulated and spaced apart from each other, and each of the first touch electrode strips 111 and the second touch electrode strips 121 can cover multiple rows or columns of sub-pixels.

[0087] A second insulating layer 102 covering the metal layer 17 is formed on the metal layer 17, so as to flatten and protect the surface of the color filter substrate 10 away from the liquid crystal layer 30. The second insulating layer 102 exceeds the first insulating layer 101 by 50-100um near the binding area 130, so as to cover the first insulating layer 101. When etching the first insulating layer 101, the first insulating layer 101 in the pad 13 area can be etched away to expose the pad 13; and then the second insulating layer 102 is etched and the second insulating layer 102 in the pad 13 area is etched away to expose the pad 13. Of course, the first insulating layer 101 and the second insulating layer 102 can also be etched at the same time after covering the second insulating layer 102, and the first insulating layer 101 and the second insulating layer 102 in the pad 13 area can be etched away at the same time to expose the pad 13, so as to facilitate binding with the circuit board (FPC) 50; and after covering the second insulating layer 102, the first insulating layer 101 and the second insulating layer 102 can be etched at the same time, so that the pad 13 is always protected by the first insulating layer 101, which can protect the pad 13 when etching the metal layer 17 to avoid etching to the pad 13, and can also avoid the metal layer 17 remaining on the surface of the pad 13 to affect the stability of binding. Among them, the materials of the first insulating layer 101 and the second insulating layer 102 are silicon oxide (SiOx), silicon nitride (SiNx) or a combination of the two, or can also be OC materials.

[0088] like Figure 12h As shown, an upper polarizer 51 is attached to the side of the color filter substrate 10 away from the liquid crystal layer 30, the upper polarizer 51 is arranged on the side of the second insulating layer 102 away from the color filter substrate 10, and a lower polarizer 52 is attached to the side of the array substrate 20 away from the liquid crystal layer 30, and the light transmission axes of the upper polarizer 51 and the lower polarizer 52 are perpendicular to each other, thereby forming a touch display panel.

[0089] Furthermore, a first touch signal line 181 and a second touch signal line 182 are provided on a side of the color film substrate 10 away from the liquid crystal layer 30, and the first touch electrode strip 111 is conductively connected to the corresponding pad 13 through the first touch signal line 181, and the second touch electrode strip 121 is conductively connected to the corresponding pad 13 through the second touch signal line 182. The first touch signal line 181 and the second touch signal line 182 are both formed by etching the transparent conductive layer 16 and / or the metal layer 17. The first touch signal line 181 and the second touch signal line 182 are both located in the non-display area 120 at the edge of the touch display panel, and extend to the edge of the binding area 130 to be conductively connected to the pad 13 in the binding area 130, so as to avoid affecting the normal picture display in the display area 110.

[0090] In this embodiment, the manufacturing method further includes:

[0091] When the transparent conductive layer 16 is etched, the transparent conductive layer 16 also forms a patterned first wiring 161 and a second wiring 162; when the metal layer 17 is etched, the metal layer 17 also forms a patterned third wiring 171 and a fourth wiring 172; the third wiring 171 is stacked on the upper surface of the first wiring 161 and together forms a first touch signal wiring 181, and the fourth wiring 172 is stacked on the upper surface of the second wiring 162 and together forms a second touch signal wiring 182, thereby reducing the impedance of the first touch signal wiring 181 and the second touch signal wiring 182. Among them, the surfaces of the first wiring 161 and the third wiring 171 are in direct contact, and the surfaces of the second wiring 162 and the fourth wiring 172 are in direct contact, that is, when the first insulating layer 101 is etched, the first insulating layer 101 in the area of ​​the first wiring 161 and the second wiring 162 needs to be etched away to expose the first wiring 161 and the second wiring 162.

[0092] [Example 2]

[0093] Fig.13 It is a schematic diagram of the planar structure of the transparent conductive layer in the second embodiment of the present invention. Fig.14 FIG. 1 is a schematic diagram of the cross-sectional structure of the color filter substrate in the edge non-display area in the second embodiment of the present invention. Fig.13 and Fig.14 As shown, the touch display panel and manufacturing method provided in the second embodiment of the present invention are similar to those in the first embodiment ( Figure 3 to Figure 12h ) are basically the same, except that, in this embodiment:

[0094] The metal layer 17 further includes a patterned third wiring 171 and a fourth wiring 172. The third wiring 171 forms a first touch signal wiring 181, and the fourth wiring 172 forms a second touch signal wiring 182. That is, the first touch signal wiring 181 is formed only by the third wiring 171, and the second touch signal wiring 182 is formed only by the fourth wiring 172. The transparent conductive layer 16 does not need to be provided with the first wiring 161 and the second wiring 162, so that the first touch signal wiring 181 and the second touch signal wiring 182 are protected by the first insulating layer 101 and the second insulating layer 102 on both sides, respectively, to reduce the probability of damage and poor touch contact. Fig.14 As shown, the third routing line 171 and the fourth routing line 172 are conductively connected to the pad 13 through the contact hole near the binding area 130. Of course, in other embodiments, the transparent conductive layer 16 further includes patterned first routing lines 161 and second routing lines 162, the first routing lines 161 form the first touch signal routing lines 181, and the second routing lines 162 form the second touch signal routing lines 182, that is, the first touch signal routing lines 181 can also be formed only by the third routing lines 171, and the second touch signal routing lines 182 can be formed only by the fourth routing lines 172, and the third routing lines 171 and the fourth routing lines 172 do not need to be provided in the metal layer 17.

[0095] The present application also provides a method for manufacturing a touch display panel, which is similar to the method of the first embodiment ( Figure 12a to Figure 12h ) are substantially the same, except that the manufacturing method in this embodiment includes:

[0096] The transparent conductive layer 16 is covered on the first surface 100a of the substrate 100, and the transparent conductive layer 16 is etched by a mask process (photoresist, exposure, development, etching and photoresist removal) to form a patterned first touch electrode portion 111a and a pad 13, and then the etched transparent conductive layer 16 is subjected to a high temperature annealing process to improve the stability of the transparent conductive layer 16 and the adhesion to the surface of the substrate 100. Fig.13 As shown, the transparent conductive layer 16 does not need to form the first wiring 161 and the second wiring 162 in the edge non-display area 120 , and the material of the transparent conductive layer 16 can be indium tin oxide (ITO) or indium zinc oxide (IZO).

[0097] A metal layer 17 covering the first insulating layer 101 is formed on the first insulating layer 101, and the metal layer 17 is etched by a mask process (photoresist, exposure, development, etching, and photoresist removal) to form patterned second touch electrode portions 111b, second touch electrode strips 121, third wirings 171, and fourth wirings 172. The two second touch electrode portions 111b separated by the second touch electrode strips 121 are connected to the corresponding first touch electrode portions 111a through the contact holes 103, and the first touch electrode portions 111a and the second touch electrode portions 111b together form the first touch electrode strips 111, and the first touch electrode strips 111 and the second touch electrode strips 121 are respectively conductively connected to the corresponding pads 13. The third line 171 forms a first touch signal line 181, and the fourth line 172 forms a second touch signal line 182, that is, the first touch signal line 181 is formed only by the third line 171, and the second touch signal line 182 is formed only by the fourth line 172. The first touch electrode portion 111a, the second touch electrode portion 111b, the first touch electrode bar 111, and the second touch electrode bar 121 are all located in the display area 110, and the pad 13 is located in the binding area 130 in the non-display area 120. The touch chip is bound to the pad 13 through the printed circuit board (FPC) 50, so as to transmit touch signals to the first touch electrode bar 111 and the second touch electrode bar 121. One of the first touch electrode bar 111 and the second touch electrode bar 121 is a touch driving electrode (Tx), and the other is a touch sensing electrode (Rx), so as to realize an external touch structure, the touch electrode is closer to the user, and the touch effect is better. The material of the transparent conductive layer 16 may be indium tin oxide (ITO) or indium zinc oxide (IZO), etc. The metal layer 17 may be made of metals such as copper (Cu), silver (Ag), chromium (Cr), molybdenum (Mo), aluminum (Al), titanium (Ti), manganese (Mn), nickel (Ni), etc., or a combination of the above metals, such as Al / Mo, Cu / Mo, etc.

[0098] It should be understood by those skilled in the art that the rest of the structure and working principle of this embodiment are the same as those of the first embodiment and will not be described in detail here.

[0099] [Example 3]

[0100] Fig.15 It is a schematic diagram of the structure of the touch display panel in the third embodiment of the present invention. Fig.16 Schematic diagram of the planar structure of the transparent conductive layer in the third embodiment of the present invention. Fig.15 and Fig.16 As shown, the touch display panel and manufacturing method provided in the third embodiment of the present invention are similar to those in the first embodiment ( Figure 3 to Figure 12h )、Example 2 ( Fig.13 and Fig.14) are basically the same, except that, in this embodiment:

[0101] The projection of the first touch electrode portion 111a on the color filter substrate 10 overlaps with the first touch electrode strip 111, that is, the first touch electrode portion 111a is a strip grid structure as a whole. Compared with a plurality of bridging electrode blocks, the first touch electrode portion 111a in the present application can not only play a bridging role, but also reduce the impedance of the first touch electrode strip 111.

[0102] It should be understood by those skilled in the art that the rest of the structure and working principle of this embodiment are the same as those of Embodiment 1 and Embodiment 2, and will not be described in detail here.

[0103] Fig.17 It is a schematic structural diagram of the touch display device in the present invention in a dark state. Fig.18 Schematic diagram of the structure of the touch display device in the present invention in the bright state. Fig.17 and Fig.18 As shown, the present application also provides a touch display device, including the touch display panel as described above and a backlight module 60. The backlight module 60 is arranged below the touch display panel and is used to provide a backlight source for the touch display panel.

[0104] The backlight module 60 includes a backlight source 61 and an anti-peep layer 62, and the anti-peep layer 62 is used to narrow the range of the light emission angle. A brightness enhancement film 63 is also provided between the backlight source 61 and the anti-peep layer 62, and the brightening film 63 increases the brightness of the backlight module 60. Among them, the anti-peep layer 62 is equivalent to a miniature shutter structure, which can block light with a larger incident angle and allow light with a smaller incident angle to pass through, so that the angle range of light passing through the anti-peep layer 62 becomes smaller. The anti-peep layer 62 includes a plurality of parallel light-blocking walls and a light-transmitting hole located between two adjacent light-blocking walls, and light-absorbing materials are provided on both sides of the light-blocking walls. Of course, the backlight source 61 can also be a light-collecting backlight source, so there is no need to set the anti-peep layer 62, but the light-collecting backlight source is more expensive than the conventional backlight source.

[0105] The backlight module 60 can be an edge-type backlight module or a direct-type backlight module. Preferably, the backlight module 60 adopts a collimated backlight (CBL) mode, which can collect light and ensure the display effect.

[0106] In this document, the directional words such as up, down, left, right, front, and back are defined by the positions of the structures in the drawings and the positions of the structures relative to each other, just for the sake of clarity and convenience in expressing the technical solution. It should be understood that the use of the directional words should not limit the scope of protection claimed in this application. It should also be understood that the terms "first" and "second" used in this document are only used to distinguish names and are not used to limit quantity and order.

[0107] The above is only a preferred embodiment of the present invention and does not limit the present invention in any form. Although the present invention has been disclosed as a preferred embodiment as above, it is not used to limit the present invention. Any technician familiar with this profession can make some changes or modifications to the technical contents disclosed above without departing from the scope of the technical solution of the present invention, which are equivalent embodiments of equivalent changes. However, any simple modification, equivalent change and modification made to the above embodiments based on the technical essence of the present invention without departing from the content of the technical solution of the present invention still fall within the protection scope of the technical solution of the present invention.

Claims

1. A method for manufacturing a touch display panel, characterized in that: include: Providing a substrate (100), wherein the substrate (100) has a first surface (100a) and a second surface (100b) disposed opposite to each other; Covering a transparent conductive layer (16) on the first surface (100a) of the substrate (100), etching the transparent conductive layer (16) to form a patterned first touch electrode portion (111a) and a pad (13), and subjecting the etched transparent conductive layer (16) to a high-temperature annealing process; A black matrix (14) and a color resist layer (15) are fabricated on the second surface (100b) of the substrate (100), wherein the black matrix (14) separates a plurality of the color resist layers (15) from each other to form a color filter substrate (10); Providing an array substrate (20) and a liquid crystal layer (30), and subjecting the color film substrate (10), the array substrate (20), and the liquid crystal layer (30) to a box-forming process, wherein the liquid crystal layer (30) is located between the color film substrate (10) and the array substrate (20), and the transparent conductive layer (16) is located on a side of the color film substrate (10) away from the liquid crystal layer (30); forming a first insulating layer (101) covering the transparent conductive layer (16) on a first surface (100a) of the substrate (100); Etching the first insulating layer (101) to form a contact hole (103) corresponding to the first touch electrode portion (111a); A metal layer (17) covering the first insulating layer (101) is formed on the first insulating layer (101), and the metal layer (17) is etched to form patterned second touch electrode portions (111b) and second touch electrode strips (121); two second touch electrode portions (111b) separated by the second touch electrode strips (121) are connected to the corresponding first touch electrode portions (111a) through the contact holes (103); the first touch electrode portions (111a) and the second touch electrode portions (111b) together form a first touch electrode strip (111); and the first touch electrode strips (111) and the second touch electrode strips (121) are respectively conductively connected to the corresponding pads (13).

2. The method for manufacturing a touch display panel according to claim 1, characterized in that: A first touch signal wiring (181) and a second touch signal wiring (182) are provided on a side of the color film substrate (10) away from the liquid crystal layer (30); the first touch electrode strip (111) is conductively connected to the corresponding pad (13) via the first touch signal wiring (181); and the second touch electrode strip (121) is conductively connected to the corresponding pad (13) via the second touch signal wiring (182); The first touch signal wiring (181) and the second touch signal wiring (182) are both formed by etching the transparent conductive layer (16) and / or the metal layer (17).

3. The method for manufacturing a touch display panel according to claim 1, characterized in that: The production method comprises: After the transparent conductive layer (16) is subjected to a high-temperature annealing process and before the black matrix (14) and the color resist layer (15) are manufactured on the second surface (100b) of the substrate (100), a first insulating layer (101) covering the transparent conductive layer (16) is formed on the first surface (100a) of the substrate (100); After the box forming process, the first insulating layer (101) is etched to form a contact hole (103) corresponding to the first touch electrode portion (111a).

4. The method for manufacturing a touch display panel according to claim 1, characterized in that: The production method comprises: After the transparent conductive layer (16) is subjected to a high-temperature annealing process and before the black matrix (14) and the color resist layer (15) are manufactured on the second surface (100b) of the substrate (100), a protective film (1) covering the transparent conductive layer (16) is formed on the first surface (100a) of the substrate (100); After the box forming process, the protective film (1) is peeled off, and a first insulating layer (101) covering the transparent conductive layer (16) is formed on the first surface (100a) of the substrate (100).

5. A touch display panel, characterized in that: The touch display panel is manufactured by the manufacturing method of the touch display panel according to any one of claims 1 to 4, and the touch display panel comprises: The color film substrate (10), the array substrate (20) arranged opposite to the color film substrate (10), and the liquid crystal layer (30) located between the color film substrate (10) and the array substrate (20); A transparent conductive layer (16), a first insulating layer (101) and a metal layer (17) are sequentially provided on a side of the color film substrate (10) away from the liquid crystal layer (30); the transparent conductive layer (16) comprises a patterned first touch electrode portion (111a) and a pad (13); the first insulating layer (101) is provided with a contact hole (103) in a region corresponding to the first touch electrode portion (111a); and the metal layer (17) comprises a patterned second touch electrode portion (111b) and a second touch pad (13). The first touch electrode strip (111) and the second touch electrode strip (121) are connected to the corresponding first touch electrode strip (111a) through the contact hole (103); the first touch electrode strip (111a) and the second touch electrode strip (111b) together form a first touch electrode strip (111); and the first touch electrode strip (111) and the second touch electrode strip (121) are respectively conductively connected to the corresponding pad (13).

6. The touch display panel according to claim 5, characterized in that: A first touch signal wiring (181) and a second touch signal wiring (182) are provided on a side of the color film substrate (10) away from the liquid crystal layer (30); the first touch electrode strip (111) is conductively connected to the corresponding pad (13) via the first touch signal wiring (181); and the second touch electrode strip (121) is conductively connected to the corresponding pad (13) via the second touch signal wiring (182).

7. The touch display panel according to claim 6, characterized in that: The transparent conductive layer (16) further comprises a patterned first wiring (161) and a second wiring (162), wherein the first wiring (161) forms the first touch signal wiring (181), and the second wiring (162) forms the second touch signal wiring (182); Alternatively, the metal layer (17) further comprises a patterned third routing line (171) and a fourth routing line (172), wherein the third routing line (171) forms the first touch signal routing line (181), and the fourth routing line (172) forms the second touch signal routing line (182).

8. The touch display panel according to claim 6, characterized in that: The transparent conductive layer (16) further comprises a patterned first routing line (161) and a second routing line (162); the metal layer (17) further comprises a patterned third routing line (171) and a fourth routing line (172); the third routing line (171) is stacked on the upper surface of the first routing line (161) and together forms the first touch signal routing line (181); the fourth routing line (172) is stacked on the upper surface of the second routing line (162) and together forms the second touch signal routing line (182).

9. The touch display panel according to claim 5, characterized in that: The projection of the first touch electrode portion (111a) on the color film substrate (10) overlaps with the first touch electrode strip (111); or the first touch electrode portion (111a) includes a plurality of bridging electrode blocks, each of which connects two corresponding second touch electrode portions (111b).

10. A touch display device, characterized in that: Comprising a touch display panel as described in any one of claims 5-9.

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