Overlay alignment method of photovoltaic cell photoetching equipment
By establishing a plane coordinate system in the photovoltaic cell lithography equipment and using positioning points on the mask, efficient and accurate positioning of the mask and cell is achieved, and the problems of low alignment accuracy and long beat time in the prior art are solved.
Patent Information
- Application Number
- CN202411889256.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-20
- Publication Date
- 2025-03-21
AI Technical Summary
In the prior art, the surface of the photovoltaic cell is completely covered with the photoresist film layer, and the alignment mark cannot be set on the cell, which makes it difficult to accurately align the mask and the cell, and the edge positioning method has problems such as low alignment accuracy and long beat time.
By establishing a planar coordinate system on the exposure table, taking pictures of the cell, obtaining the center coordinates and edge slopes, using multiple positioning points on the mask to form the center of the area overlaps with the center of the graphics area, accurately move and rotate the mask to align the center of the cell.
It realizes efficient and accurate positioning of mask plates and cell cells, improves alignment accuracy and efficiency, and overcomes the defects that alignment marks cannot be used in photovoltaic cell lithography applications.
Smart Images
Figure CN119668047A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the technical field of photovoltaic cell patterning, and in particular to an overlay alignment method for photovoltaic cell lithography equipment. Background Art
[0002] At present, the formation of the front and back electrode structures of photovoltaic cells is all done by screen printing. The method is to transfer silver paste to the photovoltaic cell in a graphic manner. After high temperature or low temperature sintering, the silver paste forms a silver electrode structure as a conductor. This method is simple in process. However, in recent years, the width and aspect ratio of the silver electrode in the screen printing process have reached the development limit, and the silver paste is expensive, resulting in the inability to further reduce the production cost of photovoltaic cells. In order to reduce the cost of photovoltaic cells and improve the efficiency of photovoltaic cells, the process of making metal electrodes of cells using a graphic plus electroplating metallization method has emerged. The graphic plus electroplating metallization method can use cheaper copper metal to replace silver, which can not only reduce costs, but also make the wires thinner and thinner, and better improve the power generation efficiency of the cells.
[0003] Photolithography is one of the key steps in the patterning process. It determines the line width, line height and morphology of the subsequent electroplated graphics. There are many ways to implement photolithography. The photolithography process is realized by an exposure photolithography process. The so-called exposure refers to the use of ultraviolet light as a parallel light source to illuminate the mask. The mask has translucent areas and opaque areas according to the customized graphics. After passing through the translucent area of the mask, the parallel light is irradiated onto the battery cell, causing the photoresist in the irradiated area on the battery cell to undergo a glue chain reaction. Through subsequent development, the graphics on the mask can be transferred to the battery cell to achieve the purpose of patterning.
[0004] The pattern obtained by photolithography is located in the middle of the cell, and the outermost line is slightly away from the edge of the cell, which requires certain overlay accuracy. In actual use, the position of the mask changes every time it is replaced, causing the position of its pattern to change accordingly. In addition, the back of each cell is adsorbed on the exposure table, and the position of each cell on the exposure table is also different, which makes it difficult to accurately align the mask and the cell.
[0005] Existing visual alignment technologies are mostly alignment mark overlap positioning methods or edge patrol positioning methods. The alignment mark overlap positioning method is to align the alignment mark on the mask with the alignment mark on the silicon wafer one by one. This requires that there must be alignment marks on both alignment graphics. By moving the position of one of the alignment marks to overlap with the other alignment mark, the purpose of automatic alignment is achieved. However, in the lithography application of photovoltaic cells, the surface of the cell is completely covered with a layer of photoresist film, and no positioning alignment marks can be made on the surface of the cell. Therefore, it is impossible to align by the alignment mark overlap positioning method, which brings another difficulty to the lithography alignment of photovoltaic cells.
[0006] The edge inspection positioning method uses a CCD camera above the mask to shoot, and then drives the cell to move to the bottom of the mask through the exposure table. The edge inspection checks the overlap between the edge of the pattern on the mask and the edge of the cell. First, the table is moved, and the edge inspection is performed to align the edge of the pattern on the mask with the edge of the cell. Then, the exposure table is fine-tuned to ensure that the pattern on the mask can be engraved within the edge of the cell, so as to achieve the purpose of engraving alignment. Since the fine-tuning of the moving table is completely dependent on the system's virtual line formation and calculation, it is impossible to achieve one-to-one alignment of the actual situation, and its accuracy is not high. In addition, the edge inspection is time-consuming and inefficient. Each time, it needs to be aligned before exposure, and the cycle time is long, which cannot meet the high-speed and high-efficiency requirements of mass production. Summary of the invention
[0007] To this end, the technical problem to be solved by the present invention is to overcome the problem in the prior art that the installation position of the mask and the placement position of the cell are not fixed, resulting in the pattern of the mask unable to be accurately engraved on the surface of the cell, and the surface of the cell is completely covered with a photoresist film layer, and it is impossible to make alignment marks on the surface of the cell, which brings difficulties to the precise alignment of the mask and the cell. At the same time, the edge positioning method has the problems of low alignment accuracy and long cycle time. Therefore, a method for overlay alignment of photovoltaic cell lithography equipment is provided, which realizes efficient and accurate positioning of the mask and the cell.
[0008] In order to solve the above technical problems, the present invention provides an overlay alignment method for photovoltaic cell lithography equipment, wherein the overlay alignment method realizes the alignment of the mask and the cell by an overlay alignment device, wherein the overlay alignment device comprises a mask, which is provided with a graphic area and a plurality of positioning points, wherein the plurality of positioning points are arrayed on the graphic area, and the center of the area formed by the connection line of the plurality of positioning points coincides with the center of the graphic area; the overlay alignment method comprises the following steps: Step S1: Fixing the cell to be engraved on the placement area on the exposure stage; Step S2: adjusting the mask so that the plane where the mask is located is parallel to the plane where the cell to be overlaid is located; Step S3: Establishing a plane coordinate system about X and Y with the center of the placement area as the coordinate origin; Step S4: Take a photo of the cell to be engraved, and obtain the center coordinates W0 (w x ,w y ) and the slope k1 of the edge L1; take a photo of the mask to obtain the center coordinates N0 (n 0x , n 0y ) and the slope g1 of the edge L2, and calculating the angle θ between the edge L1 and the edge L2 by the slope k1 and the slope g1; moving the mask plate w along the first direction x -n 0x , move the mask along the second direction w y -n 0y , so that the coordinates N0 and W0 coincide, the angle of the mask is rotated to θ, so that the central axis of the cell coincides with the central axis of the mask, and the alignment is completed; Alternatively, take a photo of the cell to be engraved to obtain the center coordinates W0 (w x ,w y ), the slope k1 of the side length L1 and the slope k of the side length L3 2， , calculate the mean k, , establish the equation of the straight line as y=kx+(w y -kw x ), obtain the straight line y1; take a photo of the mask, and obtain the center coordinates N0 (n 0x , n 0y ), the slope g1 of the side length L2 and the slope g2 of the side length L4, calculate the mean g,
[0009] Establish the equation of the straight line as y=gx+(n 0y -gn 0x ), obtain the straight line y2, calculate the angle θ between the straight line y1 and the straight line y2; move the mask w along the first direction x -n 0x , move the mask along the second direction w y -n 0y , so that the coordinates N0 and W0 coincide, the angle of the mask is rotated to θ, so that the central axis of the battery cell coincides with the central axis of the mask, and the alignment is completed.
[0010] In one embodiment of the present invention, the method for adjusting the mask to make the mask and the cell parallel is: adjusting the mask to a horizontal plane by a leveling device so that the horizontal plane where the mask is located is parallel to the horizontal plane where the cell is located.
[0011] In one embodiment of the present invention, the overlay alignment device further comprises a rotational translation alignment platform, and in step S4, the rotational translation alignment platform is used to move the mask along the X-axis and the Y-axis, and to rotate the mask around the Z-axis.
[0012] In one embodiment of the present invention, the overlay alignment device includes an alignment station. In step S4, the method for photographing the battery cell to be overlaid is: setting the central vision camera at the alignment station, and photographing the placement area and the edge of the battery cell through the central vision camera.
[0013] In one embodiment of the present invention, a plurality of positioning holes are arranged in an array on the exposure stage, and a plurality of first visual cameras are arranged at the alignment station, the plurality of first visual cameras coincide with the plurality of positioning holes, the center of the plurality of positioning hole forming areas coincides with the center of the placement area, and the coordinates of the plurality of positioning holes are acquired through the plurality of first visual cameras.
[0014] In one embodiment of the present invention, the overlay alignment device further includes an exposure station and a lifting mechanism. In step S4, the method for photographing the mask is as follows: in the exposure station, the exposure stage is raised to an exposure height by the lifting mechanism and then the mask is photographed.
[0015] In one embodiment of the present invention, the overlay alignment device further includes a linear module. In step S4, after the cell photographing is completed, the exposure stage is moved from the alignment station to the exposure station using the linear module.
[0016] In one embodiment of the present invention, the overlay alignment device further includes a plurality of second visual cameras arranged in an array, and the plurality of second visual cameras coincide with the plurality of positioning points. In step S4, the plurality of second visual cameras are used to respectively take pictures of the plurality of positioning points.
[0017] In one embodiment of the present invention, after the exposure stage moves to the exposure station, the following steps are also completed: After the exposure stage is moved to the exposure height by the lifting mechanism, the plurality of second vision cameras are adjusted to coincide with the plurality of positioning points of the mask to achieve calibration of the second vision cameras; After the exposure stage returns to the alignment station, the following steps must be completed: The position of the mask is adjusted so that the plurality of positioning points coincide with the visual centers of the plurality of second visual cameras, thereby achieving the mask calibration.
[0018] In one embodiment of the present invention, the following steps need to be performed before performing step S1: Firstly, the exposure stage is mounted on a marble base, and then the marble base and the exposure stage are calibrated into a horizontal plane to achieve mechanical installation and debugging; After the mask is mounted on the rotation and translation alignment platform, the mask is adjusted to be parallel to the exposure stage by using the leveling device to achieve leveling of the mask.
[0019] In one embodiment of the present invention, after the battery cell is fixed to the placement area, the following steps are also performed: The exposure stage is moved to the alignment station, and the central vision camera and the multiple first vision cameras are adjusted so that the central vision camera can capture the placement area, and the visual centers of the multiple first vision cameras coincide with the multiple positioning holes.
[0020] The above technical solution of the present invention has the following advantages compared with the prior art: The overlay alignment method of the photovoltaic cell lithography equipment described in the present invention overcomes the defect that it is impossible to set an alignment mark on the cell by establishing a plane coordinate system on the exposure table, and taking a photo of the cell located at any position in the placement area to obtain its center coordinates and edge slopes, thereby overcoming the defect that it is impossible to set an alignment mark on the cell, so as to accurately obtain the coordinates of the cell; by setting multiple positioning points on the mask, the center of the area formed by the multiple positioning lines coincides with the center of the mask graphic area, and the center coordinates and edge slopes of the mask graphic area can be obtained by taking photos of the multiple positioning points, which is convenient for accurately moving the center of the mask and rotating the mask, so that the center of the mask is aligned with the center of the cell, and the central axis of the mask coincides with the central axis of the cell, finally achieving the alignment accuracy of the mask and the cell, and improving the alignment efficiency of the grinding plate and the cell; by taking the average of the two edge slopes of the cell and the average of the two edge slopes of the area formed by the positioning point connection line of the mask, the alignment accuracy of the mask and the cell is further improved. BRIEF DESCRIPTION OF THE DRAWINGS
[0021] In order to make the contents of the present invention more clearly understood, the present invention is further described in detail below based on specific embodiments of the present invention in conjunction with the accompanying drawings.
[0022] Figure 1 is a flow chart of the overlay alignment method of the present invention; Figure 2 It is a structural schematic diagram of the overlay alignment device of the present invention; Figure 3 for Figure 2 A schematic structural diagram of a top view of the overlay alignment device shown; Figure 4 for Figure 3 A schematic structural diagram of a top view of the exposure stage shown; Figure 5 for Figure 2 A schematic structural diagram of a side view of the overlay alignment device shown; Figure 6 for Figure 5 A local enlarged view of point A.
[0023] Explanation of the reference numerals in the specification: 1. light source; 2. mask fixing mechanism; 3. mask; 4. battery cell; 5. exposure stage; 6. linear module; 7. second vision camera; 8. light source bracket; 9. leveling device; 10. marble base; 11. rotation and translation alignment platform; 12. first vision camera; 121. center vision camera; 122. first vision camera; 123. first vision camera; 124. first vision camera; 13. alignment station; 14. exposure station; 15. placement area; H1. positioning hole; H2. positioning hole; H3. positioning hole; H4. positioning hole; W0. center of battery cell; o. center of the area formed by connecting multiple positioning holes; W1. vertex coordinates of battery cell; W2. vertex coordinates of battery cell; W3. vertex coordinates of battery cell; W4. vertex coordinates of battery cell.
[0024] The present invention is further described below in conjunction with the accompanying drawings and specific embodiments so that those skilled in the art can better understand the present invention and implement it, but the embodiments are not intended to limit the present invention.
[0025] Reference Figure 1 , Figure 2 , Figure 4 and Figure 6 As shown, in one embodiment of the present invention, an overlay alignment method for a photovoltaic cell lithography device is disclosed, wherein the overlay alignment method realizes the alignment of a mask 3 and a cell 4 through an overlay alignment device, wherein the overlay alignment device comprises a mask 3 and a light source 1 arranged above the mask 3, the mask 3 is provided with a graphic area and four positioning points M1 / M2 / M3 / M4, or four positioning circle centers; the four positioning points are arrayed at the four corners of the graphic area, and the center of a rectangular area formed by connecting the four positioning points coincides with the center of the graphic area, so the center of the mask 3 can be determined by the four positioning points; the overlay alignment method comprises the following steps: Step S1: fix the cell 4 to be engraved on the placement area 15 on the exposure stage 5, and fix the cell 4 by adsorbing it through a vacuum nozzle; Step S2: adjusting the mask 3 so that the plane where the mask 3 is located is parallel to the plane where the cell 4 to be overlaid is located; Step S3: Establishing a plane coordinate system about X and Y with the center of the placement area 15 as the coordinate origin; Step S4: Take a photo of the cell 4 to be engraved, and obtain the coordinates W of the four vertices of the cell 4 1、 W 2、 W 3、 W4, the intersection of diagonal lines W1W3 and W2W4 is W 0, Then, the center coordinate W0 (w x ,w y ) and the slope k1 of the edge L1 (W1W2); take a photo of the mask 3 to obtain the four positioning points N1 / N2 / N3 / N4, the intersection of the diagonal lines N1N4 and N2N3 is N0, and then obtain the center coordinates N0 (n 0x , n 0y ) and the slope g1 of edge L2 (N1N2), the angle θ between edge L1 and edge L2 is calculated by slope k1 and slope g1; the distance of moving the mask 3 along the first direction (x axis) is w x -n 0x , the distance of moving the mask 3 along the second direction (y axis) is w y -n 0y , so that the coordinates N0 and W0 coincide, the angle of the mask 3 is rotated to θ, so that the central axis of the cell 4 coincides with the central axis of the mask 3, and the alignment is completed; Since the two edges of the cell 4 to be engraved are not parallel, in order to further improve the alignment accuracy, Alternatively, take a photo of the cell 4 to be engraved, and obtain the center coordinate W0 (w x ,w y ), the slope k1 of the side length L1 (W1W2) and the slope k of the side length L3 (W3W4) 2， , calculate the mean k, , obtain the straight line y passing through the center W0 of the battery cell 4 1， The equation of the straight line y1 is y=kx+(w y -kw x ); Take a picture of the mask 3 and obtain the center coordinates N0 (n 0x , n 0y ), the slope g1 of the side length L2 (N1N2) and the slope g2 of the side length L4 (N3N4), calculate the mean g, , obtain the center coordinate N0 (n 0x , n 0y ) of the straight line y2, the equation of the straight line y2 is y=gx+(n 0y -gn 0x ), calculate the angle θ between the straight line y1 and the straight line y2; move the mask 3 along the first direction by a distance w x -n 0x , the distance of moving the mask 3 along the second direction is w y -n 0y , so that the coordinates N0 and W0 coincide, the angle of the mask 3 is rotated to θ (less than 90 degrees), so that the central axis of the cell 4 coincides with the central axis of the mask 3, and the alignment is completed, that is, the edges W1W2 and N1N2 are parallel, and the edges W3W4 and N3N4 are parallel; The angle θ is calculated as follows: .
[0026] In one embodiment of the present invention, referring to Figure 5 As shown, the method for adjusting the mask 3 so that the mask 3 and the battery cell 4 are parallel is: the mask 3 is adjusted to a horizontal plane by a leveling device 9 provided with a swinging table, and the mask 3 is swung and adjusted by the swinging table so that the horizontal plane where the mask 3 is located is parallel to the horizontal plane where the battery cell 4 is located.
[0027] In one embodiment of the present invention, the overlay alignment device also includes a rotational translation alignment platform 11, and the rotational translation alignment platform 11 is preferably a UVW platform. The mask 3 is fixed on the rotational translation alignment platform 11 through a mask fixing mechanism 2. In step S4, the rotational translation alignment platform 11 is used to move the mask 3 along the X-axis and Y-axis, and to rotate the mask 3 around the Z-axis.
[0028] In one embodiment of the present invention, referring to Figure 4 As shown, the overlay alignment device includes an alignment station 13. In step S4, the method for taking a picture of the battery cell 4 to be overlaid is as follows: the central vision camera 121 is set above the alignment station 13, and the placement area 15 and the edge of the battery cell 4 are photographed by the central vision camera 121.
[0029] In one embodiment of the present invention, referring to Figure 4As shown, four positioning holes H1 / H2 / H3 / H4 are arranged in an array on the exposure stage 5, and in addition to the four vertices of the four positioning hole array placement area 15, four first visual cameras 12 / 122 / 123 / 124 are arranged above the alignment station 13. The visual centers of the four first visual cameras can be manually adjusted to coincide with the four positioning holes, so that the first visual cameras can just clearly capture the positioning holes, and the center o of the rectangular area formed by the connecting line of the four positioning holes coincides with the center of the placement area 15. In step S4, the coordinates of the four positioning holes are respectively acquired by the four first visual cameras.
[0030] In one embodiment of the present invention, referring to Figure 3 As shown, the overlay alignment device also includes an exposure station 14 and a lifting mechanism. In step S4, the method for photographing the mask 3 is: in the exposure station 14, the exposure platform 5 is raised from the dwelling height to the exposure height by the lifting mechanism, and then the mask 3 is photographed.
[0031] In one embodiment of the present invention, referring to Figure 2 As shown, the overlay alignment device further includes a linear module 6 . In step S4 , after the battery cell 4 is photographed, the exposure stage 5 is moved from the alignment station 13 to the exposure station 14 by using the linear module 6 .
[0032] In one embodiment of the present invention, referring to Figure 2 As shown, the overlay alignment device also includes four second vision cameras 7 arranged in an array at the exposure station 14, and the four second vision cameras are located below the exposure stage 5. The four second vision cameras coincide with the four positioning points of the mask 3, and the four second vision cameras also coincide with the four positioning holes of the exposure stage 5. In step S4, when the exposure stage 5 moves between the mask 3 and the four second vision cameras, the four second vision cameras are used to take pictures of the four positioning points respectively.
[0033] In one embodiment of the present invention, after the exposure stage 5 moves to the exposure station 14, the following steps are also completed: After the exposure stage 5 is moved to the exposure height by the lifting mechanism, the four second vision cameras are adjusted so that their visual centers coincide with the four positioning points of the mask 3, so as to achieve the second vision camera calibration; After the exposure stage 5 returns to the alignment station 13, the following steps are required: The position of the mask 3 is adjusted so that the four positioning points coincide with the visual centers of the four second visual cameras, thereby completing the adjustment of the mask 3.
[0034] In one embodiment of the present invention, the following steps need to be performed before performing step S1: First, the exposure stage 5 is mounted on the marble base 10, and then the marble base 10 and the exposure stage 5 are calibrated into a horizontal plane to achieve mechanical installation and debugging; After the mask 3 is mounted on the rotation and translation alignment platform 11 , the leveling device 9 is used to adjust the plane where the mask 3 is located to be parallel to the plane where the exposure stage 5 is located, so as to achieve leveling of the mask 3 .
[0035] In one embodiment of the present invention, after the battery cell 4 is fixed to the placement area 15, the following steps are also performed: Move the exposure stage 5 to the alignment station 13, and adjust the central visual camera 121 and the four first visual cameras so that the central visual camera 121 can capture the placement area 15, so that the visual centers of the four first visual cameras coincide with the four positioning holes, and the four positioning holes can be clearly captured.
[0036] The working principle of the overlay alignment method of the photovoltaic cell lithography equipment of the present invention is: After establishing a rectangular coordinate system with the center o of the area formed by the connecting line of the four positioning holes of the exposure stage 5 as the origin, at the alignment station 13, after the cell 4 is placed in the placement area 15, the first visual camera is used to take pictures to obtain the coordinates of the four vertices of the cell 4, and the edge slope and center coordinates of the cell 4 are determined by the coordinates of the four vertices of the cell 4. The control system determines the difference between the center coordinates of the cell 4 and the center coordinates of the mask 3, as well as the angle difference between the edge of the cell 4 and the edge of the mask 3 according to the edge slope and center coordinates of the cell 4. At exposure station 14, after the exposure stage 5 rises to the exposure height, the control system controls the rotational translation alignment platform 11 according to the edge angle difference and center coordinate difference between the cell 4 and the mask 3. The rotational translation alignment platform 11 drives the mask 3 to move a corresponding distance along the X-axis and Y-axis directions to achieve the coincidence of the center of the cell 4 and the center of the mask 3. Then, the rotational translation alignment platform 11 rotates the mask 3 around the Z-axis to make the edge of the mask 3 parallel to the edge of the cell 4. At this point, the mask 3 and the cell 4 are fully aligned.
[0037] Obviously, the above embodiments are merely examples for clear explanation and are not intended to limit the implementation methods. For those skilled in the art, other different forms of changes or modifications can be made based on the above description. It is not necessary and impossible to list all the implementation methods here. The obvious changes or modifications derived from these are still within the protection scope of the invention.
Claims
1. A method for overlay alignment of a photovoltaic cell lithography device, characterized in that: The overlay alignment method realizes the alignment of the mask and the cell by an overlay alignment device, wherein the overlay alignment device comprises a mask, which is provided with a graphic area and a plurality of positioning points, wherein the plurality of positioning points are arrayed on the graphic area, and the center of the area formed by the connection line of the plurality of positioning points coincides with the center of the graphic area; the overlay alignment method comprises the following steps: Step S1: Fixing the cell to be engraved on the placement area on the exposure stage; Step S2: adjusting the mask so that the plane where the mask is located is parallel to the plane where the cell to be overlaid is located; Step S3: Establishing a plane coordinate system about X and Y with the center of the placement area as the coordinate origin; Step S4: Take a photo of the cell to be engraved, and obtain the center coordinates W0 (w x ,w y ) and the slope k1 of the edge L1; take a photo of the mask to obtain the center coordinates N0 (n 0x , n 0y ) and the slope g1 of the edge L2, and calculating the angle θ between the edge L1 and the edge L2 by the slope k1 and the slope g1; moving the mask plate w along the first direction x -n 0x , move the mask along the second direction w y -n 0y , so that the coordinates N0 and W0 coincide, the angle of the mask is rotated by θ, so that the central axis of the cell coincides with the central axis of the mask, and the alignment is completed; Alternatively, take a photo of the cell to be engraved to obtain the center coordinates W0 (w x ,w y ), the slope k1 of the side length L1 and the slope k of the side length L3 2， , calculate the mean k, , establish the equation of the straight line as y=kx+(w y -kw x ), obtain the straight line y1; take a photo of the mask, and obtain the center coordinates N0 (n 0x , n 0y ), the slope g1 of the side length L2 and the slope g2 of the side length L4, calculate the mean g, , establish the equation of the straight line as y=gx+(n 0y -gn 0x ), obtain the straight line y2, calculate the angle θ between the straight line y1 and the straight line y2; move the mask plate w along the first direction x -n 0x , move the mask along the second direction w y -n 0y , so that the coordinates N0 and W0 coincide, the angle of the mask is rotated to θ, so that the central axis of the battery cell coincides with the central axis of the mask, and the alignment is completed.
2. The overlay alignment method of photovoltaic cell lithography equipment according to claim 1, characterized in that: The method for adjusting the mask to make the mask and the battery cell parallel is: adjusting the mask to a horizontal plane by a leveling device so that the horizontal plane where the mask is located is parallel to the horizontal plane where the battery cell is located.
3. The overlay alignment method of photovoltaic cell lithography equipment according to claim 1, characterized in that: The overlay alignment device further comprises a rotational translation alignment platform. In step S4, the rotational translation alignment platform is used to move the mask along the X-axis and the Y-axis, and to rotate the mask around the Z-axis.
4. The overlay alignment method of photovoltaic cell lithography equipment according to claim 3, characterized in that: The overlay alignment device includes an alignment station. In step S4, the method for taking pictures of the battery cell to be overlaid is: the central vision camera is set at the alignment station, and the placement area and the edge of the battery cell are photographed by the central vision camera.
5. The overlay alignment method of photovoltaic cell lithography equipment according to claim 4, characterized in that: A plurality of positioning holes are arranged in an array on the exposure stage, and a plurality of first visual cameras are arranged at the alignment station, the plurality of first visual cameras coincide with the plurality of positioning holes, the center of the plurality of positioning hole forming areas coincides with the center of the placement area, and the coordinates of the plurality of positioning holes are acquired through the plurality of first visual cameras.
6. The overlay alignment method of photovoltaic cell lithography equipment according to claim 5, characterized in that: The overlay alignment device further comprises an exposure station and a lifting mechanism. In step S4, the method for photographing the mask is as follows: in the exposure station, the exposure stage is raised to an exposure height by the lifting mechanism, and then the mask is photographed.
7. The overlay alignment method of photovoltaic cell lithography equipment according to claim 6, characterized in that: The overlay alignment device further includes a linear module. In step S4, after the cell is photographed, the exposure stage is moved from the alignment station to the exposure station using the linear module.
8. The overlay alignment method of photovoltaic cell lithography equipment according to claim 6, characterized in that: The overlay alignment device further comprises a plurality of second visual cameras arranged in an array, wherein the plurality of second visual cameras coincide with the plurality of positioning points. In step S4, the plurality of second visual cameras are used to take pictures of the plurality of positioning points respectively.
9. The overlay alignment method of photovoltaic cell lithography equipment according to claim 8, characterized in that: After the exposure stage moves to the exposure station, the following steps must be completed: After the exposure stage is moved to the exposure height by the lifting mechanism, the plurality of second vision cameras are adjusted to coincide with the plurality of positioning points of the mask to achieve calibration of the second vision cameras; After the exposure stage returns to the alignment station, the following steps must be completed: The position of the mask is adjusted so that the plurality of positioning points coincide with the visual centers of the plurality of second visual cameras, thereby completing the mask calibration.
10. The overlay alignment method of photovoltaic cell lithography equipment according to claim 9, characterized in that: Before proceeding to step S1, the following steps need to be performed: Firstly, the exposure stage is mounted on a marble base, and then the marble base and the exposure stage are calibrated into a horizontal plane to achieve mechanical installation and debugging; After the mask is mounted on the rotation and translation alignment platform, the mask is adjusted to be parallel to the exposure stage by using the leveling device to achieve leveling of the mask.
Citation Information
Cited By
Battery piece positioning method, system and equipment based on five-camera system
CN120635202A