Glass film pasting technology

Abstract

The invention discloses a glass film sticking process, which comprises the following steps: (1) providing a qualified glass substrate; (2) depositing one or more functional film layers on the surface of the glass substrate, which is deposited by magnetron sputtering. way, in a working atmosphere with a vacuum level of 0.1Pa, N 2 / O 2 It is carried out under the condition that the ratio does not exceed 8; (3) Deposit a layer of zirconium mixed-doped film layer on the surface of one or more functional film systems, using magnetron sputtering deposition method, and the vacuum level is 0.12Pa Class working atmosphere, N 2 / O 2 Under the condition that the ratio does not exceed 8, the magnetron sputtering deposition method is used to deposit the functional film system layer and the zirconium mixed doped film layer. The zirconium doped film has high hardness and strong oxidation resistance, and the film layer can be avoided. A series of problems such as PE organic film, and at the same time, it has a good protective effect on the substrate film layer. During transportation and storage, it can prevent the substrate film layer from being scratched and delay the oxidation speed of the silver layer.

Description

technical field

[0001] The invention relates to the technical field of glass film application, in particular to a glass film application process. Background technique

[0002] The glass body, especially the ordinary flat glass body has limited performance, and its application is limited. Therefore, it is often necessary to carry out deep processing on glass to improve and enhance its performance. In various glass deep processing technologies, glass surface coating is a common method. By coating different films, the optical, thermal, electrical, chemical and mechanical properties of glass can be improved. In addition, some films also have decorative functions, so the application fields of coated glass are very wide.

[0003] The history of glass surface coating technology is also very long [1-2]. As early as the end of the 12th century and the beginning of the 13th century, glass mirrors coated with a metal film on the back appeared. From the 15th to the 16th centuries, Ven...

Examples

Embodiment 1

[0026] A glass film sticking process, comprising the steps of:

[0027] (1) Provide qualified glass substrates;

[0028] (2) Deposit one or more functional film layers on the surface of the glass substrate, using magnetron sputtering deposition, in a working atmosphere with a vacuum level of 0.1Pa, N 2 / O 2 It is carried out under the condition that the ratio does not exceed 8; the functional film system layer includes NiCr, Ag, AgCu, Si 3 N 4 、Ti 3 N 4 、TiO 2 , SnO 2 , SiO 2 , ZnO or SnZnO 3 , AlZnOx, NbOx one or more material film layers; the outermost layer of the functional film system layer is SiO 2 , the deposition thickness is 10-40nm;

[0029] (3) Deposit a layer of zirconium mixed-doped film layer on the surface of one or more functional film systems, using the method of magnetron sputtering deposition, under the working atmosphere with a vacuum order of 0.12Pa, N 2 / O 2 It is carried out under the condition that the ratio does not exceed 8; the material o...

Embodiment 2

[0031] A glass film sticking process, comprising the steps of:

[0032] (1) Provide qualified glass substrates;

[0033] (2) Deposit one or more functional film layers on the surface of the glass substrate, using magnetron sputtering deposition, in a working atmosphere with a vacuum level of 0.1Pa, N 2 / O 2 It is carried out under the condition that the ratio does not exceed 8; the functional film system layer includes NiCr, Ag, AgCu, Si 3 N 4 、Ti 3 N 4 、TiO 2 , SnO 2 , SiO 2 , ZnO or SnZnO 3 One or more material film layers in , AlZnOx, NbOx; The functional film system layer is in order from the glass substrate to the outside:

[0034] The base dielectric layer plated on the glass substrate is made of titanium oxide with a thickness of 12nm;

[0035] The first barrier layer plated on the base dielectric layer is made of nickel-chromium alloy with a thickness of 4nm;

[0036] The functional layer plated on the first barrier layer is made of elemental silver with a t...

technical field

[0001] The invention relates to the technical field of glass film application, in particular to a glass film application process. Background technique

[0002] The glass body, especially the ordinary flat glass body has limited performance, and its application is limited. Therefore, it is often necessary to carry out deep processing on glass to improve and enhance its performance. In various glass deep processing technologies, glass surface coating is a common method. By coating different films, the optical, thermal, electrical, chemical and mechanical properties of glass can be improved. In addition, some films also have decorative functions, so the application fields of coated glass are very wide.

[0003] The history of glass surface coating technology is also very long [1-2]. As early as the end of the 12th century and the beginning of the 13th century, glass mirrors coated with a metal film on the back appeared. From the 15th to the 16th centuries, Ven...

Examples

Embodiment 1

[0026] A glass film sticking process, comprising the steps of:

[0027] (1) Provide qualified glass substrates;

[0028] (2) Deposit one or more functional film layers on the surface of the glass substrate, using magnetron sputtering deposition, in a working atmosphere with a vacuum level of 0.1Pa, N 2 / O 2 It is carried out under the condition that the ratio does not exceed 8; the functional film system layer includes NiCr, Ag, AgCu, Si 3 N 4 、Ti 3 N 4 、TiO 2 , SnO 2 , SiO 2 , ZnO or SnZnO 3 , AlZnOx, NbOx one or more material film layers; the outermost layer of the functional film system layer is SiO 2 , the deposition thickness is 10-40nm;

[0029] (3) Deposit a layer of zirconium mixed-doped film layer on the surface of one or more functional film systems, using the method of magnetron sputtering deposition, under the working atmosphere with a vacuum order of 0.12Pa, N 2 / O 2 It is carried out under the condition that the ratio does not exceed 8; the material o...

Embodiment 2

[0031] A glass film sticking process, comprising the steps of:

[0032] (1) Provide qualified glass substrates;

[0033] (2) Deposit one or more functional film layers on the surface of the glass substrate, using magnetron sputtering deposition, in a working atmosphere with a vacuum level of 0.1Pa, N 2 / O 2 It is carried out under the condition that the ratio does not exceed 8; the functional film system layer includes NiCr, Ag, AgCu, Si 3 N 4 、Ti 3 N 4 、TiO 2 , SnO 2 , SiO 2 , ZnO or SnZnO 3 One or more material film layers in , AlZnOx, NbOx; The functional film system layer is in order from the glass substrate to the outside:

[0034] The base dielectric layer plated on the glass substrate is made of titanium oxide with a thickness of 12nm;

[0035] The first barrier layer plated on the base dielectric layer is made of nickel-chromium alloy with a thickness of 4nm;

[0036] The functional layer plated on the first barrier layer is made of elemental silver with a t...