Multifunctional microwave plasma ultraviolet deodorization equipment

Abstract

The multifunctional microwave plasma ultraviolet deodorization equipment is characterized in that: a rapid decomposition device (1), a high-frequency plasma electric field (2), a microwave plasma electric field (3), a high-intensity ultraviolet radiation field (4), a low-temperature plasma electric field (5), a high-intensity ozone gas reaction chamber (6), a termination reaction chamber (7), and a clean gas combing chamber (8) are sequentially installed on the wall of a horizontal rectangular box. The equipment only needs 3 kilowatts of main engine power, and the maximum waste gas purification volume of a single machine can reach 50 to 3,000 cubic meters per hour; the equipment is quick and easy to install, and the operating cost is one-tenth of the traditional purification equipment. The equipment has the unique performance of automatic, high efficiency, energy saving, and environmental protection, and achieves the most ideal waste gas purification effect.

Description

Technical Field

[0001] The invention relates to equipment for deodorizing malodorous waste gas discharged from a pharmaceutical factory. Background Art

[0002] 1. Odor collection and treatment in sewage treatment plants are widely used abroad, but in China, there are not many large sewage treatment plants that collect and treat odor. The sewage treatment plants with large imported deodorization equipment mainly include Macau Hanzai Sewage Treatment Plant and Nanjing Chengbei Sewage Treatment Plant, which use biological or chemical methods for deodorization, while small sewage treatment plants focus on deodorization with adsorbents. The main reason is that foreign deodorization equipment is expensive, with high initial installation costs, operation and maintenance costs; while domestic waste gas deodorization technology started late and there are not many mature products. 2. Existing deodorization control technologies include: 1. Spraying deodorants and flushing agents to cover and oxidize odorous compounds. 2. Directly injecting chemical agents into sewage to prevent the formation of nitrogen or sulfur chain reactions. 3. Odor collection and ultraviolet treatment. The third type is the most widely used now. Summary of the invention

[0003] The purpose of the invention is to provide a multifunctional microwave plasma ultraviolet deodorizing complete set of equipment.

[0004] The multifunctional microwave plasma ultraviolet deodorization equipment is characterized in that: a rapid decomposition device (1), a high-frequency plasma electric field (2), a microwave plasma electric field (3), a high-intensity ultraviolet radiation field (4), a low-temperature plasma electric field (5), a high-intensity ozone gas reaction chamber (6), a termination reaction chamber (7), and a clean gas combing chamber (8) are sequentially installed on the wall of a horizontal rectangular parallelepiped box, and the middle of the horizontal rectangular parallelepiped box is a channel-type cavity along the horizontal axis, and the waste gas odor collection pipeline and the odor storage cabinet (9) are connected to an exhaust pump (10), and the exhaust pump (10) is connected to the odor inlet of the rapid decomposition device (1), and the tail end of the clean gas combing chamber (8) is connected to the clean gas exhaust pipe; wherein:

[0005] The rapid decomposition device (1) contains activated carbon for adsorption, and the rapid decomposition device (1) contains a monofluorine atom oxide catalyst, the monofluorine atom oxide catalyst is a product of sodium monofluorophosphate, and the chemical formula is Na2PO3F;

[0006] The high-frequency plasma electric field (2) comprises: a high-frequency plasma electric field generator;

[0007] The microwave plasma electric field (3) comprises: a control console connected to a high-voltage power supply (39), the high-voltage power supply (39) connected to a magnetron (32), a fixed partition (33) in the microwave plasma electric field (3), a quartz tube (31) fixed on the fixed partition (33), and a magnetron (32) fixed on a box of the microwave plasma electric field (3); inert gas and mercury are filled in the quartz tube (31), and the entire quartz tube (31) is uniformly discharged in the microwave plasma electric field (3), generating full-band ultraviolet rays and ozone of 180 to 380 nm, and sterilizing by using ultraviolet rays and ozone;

[0008] The high-intensity ultraviolet radiation field (4) comprises: a controller (45) connected in parallel to a plurality of ballasts (44), each ballast (44) being connected to a high-intensity ultraviolet generator (42), and all the high-intensity ultraviolet generators (42) being fixed in a cavity (46) of the high-intensity ultraviolet radiation field (4).

[0009] The multifunctional microwave plasma ultraviolet deodorization equipment is characterized in that: the low-temperature plasma electric field (5) comprises: in the box (52) of the low-temperature plasma electric field (5), an air inlet filter (54) is fixed close to the air inlet (51) of the low-temperature plasma electric field (5), an air outlet filter (57) is fixed close to the air outlet (56) of the low-temperature plasma electric field (5), and a low-temperature plasma electric field generator (55) is fixed in the middle of the box (52) of the low-temperature plasma electric field (5);

[0010] The high-intensity ozone gas reaction chamber (6) comprises: an air compressor (61) connected to an air source gas transmission pipe (62), the air source gas transmission pipe (62) is connected in parallel to a plurality of ozone generators (63), the gas outlet of each ozone generator (63) is connected to an ozone gas transmission pipe (64), and the tail end of the ozone gas transmission pipe (64) is connected to an ozone gas inlet at the bottom of the high-intensity ozone gas reaction chamber (6).

[0011] The multifunctional microwave plasma ultraviolet deodorization equipment is characterized by:

[0012] The termination reaction chamber (7) comprises: a plurality of honeycomb activated carbon filters (73) are installed on the termination reaction chamber box (72), and pure carbon elements (75) are densely distributed on the honeycomb activated carbon filters (73);

[0013] A plurality of positive and negative ion generators (83) are installed on the frame of a clean gas combing chamber box (82) of the clean gas combing chamber (8).

[0014] The multifunctional microwave plasma ultraviolet deodorizing complete set of equipment is characterized in that the microwave plasma circuit of the microwave plasma electric field (3) comprises: an integrated circuit IC1 whose model is MAX038, and an integrated circuit IC2 whose model is LF353.

[0015] The multifunctional microwave plasma ultraviolet deodorization complete set of equipment is characterized in that the high-frequency plasma electric field generator comprises: an integrated circuit IC1 whose model is 7809, and an integrated circuit IC2 whose model is 555.

[0016] The multifunctional microwave plasma ultraviolet deodorizing complete set of equipment is characterized in that the front of the horizontal rectangular box body is provided with a plurality of cabinet doors which are convenient to open.

[0017] The multifunctional microwave plasma ultraviolet deodorization equipment overcomes the problems of large investment, high energy consumption, slow absorption, high operating cost and heavy maintenance workload of existing technologies. The equipment only needs 3 kilowatts of main engine power, and the maximum exhaust gas purification capacity of a single machine can reach 50 to 3,000 cubic meters per hour; the equipment is quick and easy to install, and the operating cost is one-tenth of traditional purification equipment. The equipment has the unique performance of automatic, high efficiency, energy saving and environmental protection, achieving the most ideal exhaust gas purification effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 The invention discloses a structural block diagram of a multifunctional microwave plasma ultraviolet deodorizing complete set of equipment.

[0019] Figure 2 It is a circuit diagram of a high-frequency plasma electric field generator of the high-frequency plasma electric field (2) of the present invention.

[0020] Figure 3 This is a schematic diagram of the microwave plasma electric field (3) in the present invention.

[0021] Figure 4 This is a circuit diagram of a high voltage power supply in the microwave plasma electric field (3) of the present invention.

[0022] Figure 5 It is a schematic diagram of the installation structure in the microwave plasma electric field (3) of the present invention.

[0023] Figure 6 This is the appearance diagram of the multifunctional microwave plasma ultraviolet deodorizing complete set of equipment of the present invention.

[0024] Figure 7 This is a working principle diagram of the high-intensity ultraviolet radiation field (4) of the present invention.

[0025] Figure 8 It is a circuit block diagram of the high-intensity ultraviolet radiation field (4) of the present invention.

[0026] Fig. 9 It is a structural diagram of the low-temperature plasma electric field (5) of the present invention.

[0027] Fig.10 This is a schematic diagram of the high-intensity ozone reaction chamber (6) of the present invention.

[0028] Fig.11 It is a structural diagram of the termination reaction chamber (7) in the present invention.

[0029] Fig.12 This is a cross-sectional view of the termination reaction chamber (7) of the present invention in the AA direction.

[0030] Fig.13 It is a schematic diagram of the clean gas combing chamber (8) in the present invention.

[0031] Fig.14 This is a circuit schematic diagram of the clean gas combing chamber (8) of the present invention. DETAILED DESCRIPTION

[0032] The present invention will be described in detail below with reference to the accompanying drawings.

[0033] See also Figure 1 The present invention is a block diagram of the structure of a multifunctional microwave plasma ultraviolet deodorization equipment. The multifunctional microwave plasma ultraviolet deodorization equipment is characterized in that: a rapid decomposition device (1), a high-frequency plasma electric field (2), a microwave plasma electric field (3), a high-intensity ultraviolet radiation field (4), a low-temperature plasma electric field (5), a high-intensity ozone gas reaction chamber (6), a termination reaction chamber (7), and a clean gas combing chamber (8) are sequentially installed on the wall of a horizontal rectangular box, and the middle of the horizontal rectangular box along the horizontal axis is a channel-type cavity, and the waste gas odor collection pipeline and the odor storage cabinet (9) are connected to an exhaust pump (10), and the exhaust pump (10) is connected to the odor inlet of the rapid decomposition device (1), and the tail end of the clean gas combing chamber (8) is connected to the clean gas exhaust pipe; wherein:

[0034] The multifunctional microwave plasma ultraviolet deodorization equipment is characterized in that: the rapid decomposition device (1) contains activated carbon for adsorption, the rapid decomposition device (1) contains a monofluorine atom oxide catalyst, the monofluorine atom oxide catalyst is a product of sodium monofluorophosphate, and the chemical formula is Na2PO3F;

[0035] Activated carbon plays a role of physical decomposition. The principle is: rapidly filter gas molecules smaller than 10,000 mesh and adsorb large particles; after being irradiated by ultraviolet rays, the catalyst plays a role of chemical decomposition. The principle is: single fluorine atom free oxide and activated carbon can quickly adsorb and crack nitrogen-containing, hydrogen-containing, hydrocarbons, nitrogen-oxygen-hydrogen-combined organic matter, and release heat in the strong decomposition process, showing chemical bond transfer to acidic and alkaline substances, losing their original characteristics, and continuously reorganizing the accumulated macromolecules into carbon-containing, oxygen-containing, and hydrogen-containing compounds. The odor is rapidly reduced. The reaction process is: odor molecules react to generate CO X and CCl and HCO X and SO X and CF4... and OH -- .

[0036] Figure 2 It is a circuit diagram of a high-frequency plasma electric field generator of the high-frequency plasma electric field (2) of the present invention;

[0037] There is a high-frequency plasma electric field generator in the high-frequency plasma electric field (2). The high-frequency plasma generated by the high-frequency plasma electric field generator performs adaptive oxidation treatment on the odorous substances, so that they are further oxidized and reduced. When new oxides are generated from the converted substances, the deep treatment creates conditions for structural destruction, thereby achieving the purpose of further deodorization.

[0038] The odor and bacteria attached to the dust are ionized and broken down by the high-frequency plasma electric field in the plasma area, and the chain reaction occurs. The dust larger than 0.5um is adsorbed, and the organic matter and bacteria are triggered to react as follows: O3 and OH - The reaction produces O2 - With HO2;

[0039] Free radical chain reaction, the reaction is as follows

[0040] O3 vs O2 - The reaction produces O3 - with O2;

[0041] HO3 - The reaction produces O3 - and H.

[0042] HO3 - The reaction generates OH - with O2;

[0043] H2R and OH - Reaction to generate HR - with H2O;

[0044] 3O3 and 2OH - and H + The reaction generates 2OH - and 4O2;

[0045] It causes bacteria and viruses to produce permeability distortion, prevents the regeneration of molecular organic matter, and achieves the purpose of disinfection, purification, dust removal and deodorization. By adjusting PR2, the duty cycle of the output square wave can be adjusted to 10% to 20%, that is, the microwave output power of the switching power supply module can be adjusted.

[0046] Figure 3 This is a schematic diagram of the microwave plasma electric field (3) in the present invention. Figure 5Schematic diagram of the installation structure in the microwave plasma electric field (3). The numbers are as follows: quartz tube (31), magnetron (32), bacteria-containing malodorous gas to be treated (36), odorless gas after degradation, control console (38), high-voltage power supply (390. The microwave plasma electric field (3) includes: the control console is connected to the high-voltage power supply (39), the high-voltage voltage is connected to the magnetron (32), a fixed partition (33) is provided in the microwave plasma electric field (3), the quartz tube (31) is fixed on the fixed partition (33), and the magnetron (32) is fixed on the box of the microwave plasma electric field (3); inert gas and mercury are filled in the quartz tube (31), and the entire quartz tube (31) is uniformly discharged in the microwave plasma electric field (3), generating full-band ultraviolet rays and ozone of 180 to 380 nm, and sterilizing by ultraviolet rays and ozone;

[0047] Triple microwave sterilization technology description: 1. Microwave sterilization: When the microwave field acts on a substance, there are thermal effects and non-thermal effects. The non-thermal effect is that the microwave field directly acts on the cell, breaks the cell wall, breaks the DNA chain, ruptures the cell, kills the bacteria or modifies the odor cells. 2. Microwave-excited ultraviolet deodorization and sterilization: Deodorization and sterilization using ultraviolet rays. The method is as follows: In the quartz glass tube, inert gas and mercury are filled, and the entire lamp tube is evenly discharged in the microwave field to generate full-band ultraviolet rays and ozone of 180 to 380 nm. The sterilization effect is very obvious when ultraviolet rays and ozone are used for sterilization. 3. Microwave-excited ultraviolet rays produce ozone deodorization and sterilization. The quartz tube material, the ratio of inert gas and mercury, can produce full-band ultraviolet rays of 180 nm to 380 nm under the action of the microwave field. Ultraviolet rays of different wavelengths will ionize the odor molecules entering the microwave reaction cavity, produce ozone, and use ozone for oxidation deodorization and sterilization. Compared with ozone produced by traditional high-voltage discharge method, the ozone produced by this method has higher purity and does not produce harmful nitric oxide and nitrogen dioxide. In summary, when microwave, ultraviolet and ozone deodorization and sterilization technologies act together on odor molecules and bacteria, the deodorization rate can reach more than 98%, and the bacteria killing rate can reach more than 99.96%. The ultraviolet rays with high radiation in the band generated by microwave plasma electric field 3 strongly radiate all gas decomposition output by high-frequency plasma electric field, causing permeability distortion and modification, replication, decolorization, dehydration, cell rupture of gas molecules, and all odor components. DNA and RNA are severely damaged here and lose their original activity. The microwave power reaches 300W.

[0048] Figure 7 , Figure 8The diagram is a schematic diagram of the working principle of ultraviolet light in the high-intensity ultraviolet radiation field 4 of the present invention. The high-intensity ultraviolet radiation field (4) comprises: a controller (45) connected in parallel to a plurality of ballasts (44), each ballast (44) connected to a high-intensity ultraviolet generator (42), and all high-intensity ultraviolet generators (42) are fixed in a cavity (46) of the high-intensity ultraviolet radiation field (4). The high-intensity ultraviolet radiation field generates an ultraviolet radiation dose of ≥ 20000uw, and all organic odors and bacteria-carrying air 41 passing through the high-intensity ultraviolet radiation field are strongly decomposed or replicated into modified molecules, and the residues are further cracked into new gas molecules 43 and then discharged.

[0049] Fig. 9 The multifunctional microwave plasma ultraviolet deodorization equipment is characterized in that: the low-temperature plasma electric field (5) includes: in the box (52) of the low-temperature plasma electric field (5), the air inlet filter (54) is fixed close to the air inlet (51) of the low-temperature plasma electric field (5), the air outlet filter (57) is fixed close to the air outlet (56) of the low-temperature plasma electric field (5), and the low-temperature plasma electric field generator (55) is fixed in the middle of the box (52) of the low-temperature plasma electric field (5); gas molecules, organic matter, bacteria, etc. completely lose their life characteristics after being oscillated by high frequency in the low-temperature plasma electric field, and are accelerated and impacted by the electric field to generate gas molecules in a plasma state, which further changes the original characteristics, loses the odor and transforms into new gas molecules, and its density reaches 2.4×10 16 ~8.9×10 16 m - 3.

[0050] Fig.10 The high-intensity ozone gas reaction chamber (6) includes: an air compressor (61) connected to an air source gas pipeline (62), the air source gas pipeline (62) is connected in parallel to a plurality of ozone generators (63), the gas outlet of each ozone generator (63) is connected to an ozone gas pipeline (64), and the tail end of the ozone gas pipeline (64) is connected to an ozone gas inlet at the bottom of the high-intensity ozone gas reaction chamber (6). All the continuously transformed and modified gas molecules that are rapidly decomposed, degraded, modified, oxidized, replicated, and permeability distorted to form low-temperature plasma need to be further oxidized, ring-opened, and chain-broken by the high-intensity ozone gas to transform the gas molecules into clean gas to form oxide molecular chains. Fig.10 Numbering in the figure: air compressor (61), air source air supply pipe (62), ozone generator (63), ozone gas supply pipe (64), air inlet (65) of the high-intensity ozone gas reaction chamber, ozone gas (66), high-intensity ozone gas reaction chamber (6), air outlet (68) of the high-intensity ozone gas reaction chamber.

[0051] Fig.11It is a structural diagram of the termination reaction chamber (7) of the present invention. A plurality of honeycomb activated carbon filters (73) are installed on the termination reaction chamber box (72), and pure carbon elements (75) are densely distributed on the honeycomb activated carbon filters (73). Fig.11 Numbering: air inlet of the termination reaction chamber (71), housing of the termination reaction chamber (72), honeycomb activated carbon filter (73), air outlet of the termination reaction chamber (74), pure carbon element (75). After the odorous gas is decomposed, modified, replicated, reduced, and plasma-state, all reaction processes are terminated here, so that no new environmental pollution will be generated for the final exhaust gas. The pure carbon element and the 20-10000-A composite carbon chamber close all reaction processes, and the residual odor continues to be adsorbed to achieve the purpose of terminating the reaction.

[0052] Fig.12 The present invention is a schematic diagram of the installation of a clean gas combing chamber (8) in which a plurality of positive and negative ion generators (83) are installed on the frame of a clean gas combing chamber box (82) of the clean gas combing chamber (8). The numbering in the figure is air intake gas (81), clean gas combing chamber box (82), positive and negative ion generator (83), and discharged colorless, odorless and fresh air (84); the working principle is: the positive and negative ion generators respectively increase the input low voltage to DC positive high voltage and negative high voltage through a boost circuit, and use the discharge tip to generate high corona with the DC positive high voltage, ionize the air to generate a large number of positive ions, and use another discharge tip to generate high corona with the DC negative high voltage, ionize the air to generate a large number of negative ions, and synchronously generate equal amounts of positive ions and negative ions to meet in the air to neutralize the positive and negative charges, and generate huge energy release at the moment of neutralization of the positive and negative ions, thereby effectively causing the change of the surrounding bacterial structure or the conversion of energy to cause the bacteria to die, thereby achieving the bactericidal effect of the positive and negative ion generators. The number of negative ions is greater than the number of positive ions. The excess negative ions floating in the air can effectively purify dust in the air and improve the quality of oxygen in the air.

[0053] Fig.13 The schematic diagram of the clean gas combing chamber (8) in the present invention is shown in Figure 8. The positive and negative ion generator (83) is a combing device, which activates the gas discharged after all reactions are terminated into oxygen-rich negative oxygen ions and discharges them into the outside air. The discharged gas is colorless, odorless and fresh air.

[0054] Fig.14The circuit schematic diagram of the clean gas combing chamber (8) in the present invention is shown. The diode D1 and the transistor SCR are of the MCR100 type, the diode D2, the transformer B, the positive and negative ion generator GDF, the resistors R1, R2, R3, R4, R5, and the capacitors C1, C2, and C3. The rectifier is composed of the diode D1, the resistor R1, and the capacitor C1, the oscillator is composed of the transistor SCR and the transformer B, and the half-wave rectifier is composed of the diode D2. The rectifier is connected to the oscillator, the oscillator is connected to the half-wave rectifier, and the half-wave rectifier is connected to the positive and negative ion generator GDF. The rectifier rectifies 220V, and the oscillator converts the current into a high-frequency current. The half-wave rectifier converts the high-frequency current into a DC high voltage. The positive and negative ion generator GDF emits positive and negative ions. Figure 6 The multifunctional microwave plasma ultraviolet deodorization equipment is characterized in that: a rapid decomposition device (1), a high-frequency plasma electric field (2), a microwave plasma electric field (3), a high-intensity ultraviolet radiation field (4), a low-temperature plasma electric field (5), a high-intensity ozone gas reaction chamber (6), a termination reaction chamber (7), and a clean gas combing chamber (8) are sequentially installed in a horizontal rectangular box. The front of the horizontal rectangular box is provided with a cabinet door, which is convenient for installing and repairing the equipment in the cabinet.

[0055] Figure 2 The high-frequency plasma electric field generator circuit diagram of the high-frequency plasma electric field (2) of the present invention comprises: a rectifier QU connected to a voltage regulator IC1 7809, the voltage regulator IC1 7809 is connected to the input end of the inverter IC2 555 time base circuit, the output end 3 pins of the inverter IC2 555 time base circuit are connected to the base of the amplifier VT1 through a resistor R5 and a capacitor C6, the output port of the amplifier is connected to a transformer T1, and a high-frequency voltage is output. Figure 2 In the figure, the rectifier QU is connected to the voltage regulator IC17809 to output DC voltage, the inverter IC2 555 time base circuit and its peripheral components are used as oscillators to output high-frequency voltage, which is amplified by the amplifier VT1 and then supplied to the transformer T1 to output high-frequency voltage. The model of the diode D is FR104. The model of the amplifier VT1 is 3DD202B.

[0056] Figure 4The invention discloses a high-voltage power supply circuit diagram of a microwave plasma electric field (3). The high-voltage power supply includes: an integrated circuit IC1 MAX038 which is a high-frequency precision function signal generator, a potentiometer P1 connected to the 8th pin of IC1, a potentiometer P3 connected to the 7th pin of IC1, a potentiometer P2 connected to the 10th pin of IC1, a capacitor C5 connected to the 5th pin of IC1, a 19th pin of IC1 connected to a diode D1, D1 connected to the 3rd pin of IC2 IF353, a 17th pin connected to a +5V power supply, a 20th pin connected to a -5V power supply, 15th pin, 2nd pin, 9th pin, 11th pin, 12th pin, and 13th pin connected to ground, 18th pin and 15th pin connected to ground, a 3rd pin of IC1 connected to a CN3 touch switch, a 4th pin of IC1 connected to a CN4 touch switch, and an output end of a diode D14148 connected to a 3rd pin of an amplifier IC2 LF353. Pin 2 of amplifier IC2 LF353 is connected to resistor R1 and potentiometer P4, and pin 1 of amplifier IC2 LF353 is connected to pin 5 of amplifier IC2 LF353. Pin 6 of amplifier IC2 LF353 is connected to output pin 7 of amplifier IC2 LF353, and pin 8 of amplifier IC2 LF353 is connected to power supply. Working principle: the signal of the control console is operated by potentiometers P1, P2, and P3 respectively to set the output power. The signal is transmitted to integrated circuit IC1 MAX038, and IC1 converts the signal of the control console into a high-frequency signal. IC1 outputs the signal from pin 19 to IC2 LF353. IC2 LF353 amplifies the high-frequency voltage and outputs it to magnetron 32. Various waveform curves can be expressed by trigonometric function equations. A circuit that can generate a variety of waveforms, such as triangle wave, sawtooth wave, rectangular wave (including square wave), and sine wave is called a function signal generator. Function signal generators have a wide range of uses in circuit experiments and equipment testing. Function signal generators can be made of general devices such as transistors and op amp ICs, but more often they are produced by special function signal generator ICs. Early function signal generator ICs, such as L8038, BA205, XR2207 / 2209, etc., have fewer functions, low precision, and a frequency upper limit of only 300kHz. They cannot generate higher frequency signals, and the adjustment method is not flexible enough. The frequency and duty cycle cannot be adjusted independently, and the two affect each other. In view of this, Maxim Corporation of the United States has developed a new generation of function signal generator IC MAX038, which overcomes the shortcomings of the above chips and can achieve higher technical indicators, which is far beyond the reach of L8038, BA205, and XR2207 / 2209 chips. MAX038 has high frequency and good precision, so it is called a high-frequency precision function signal generator IC.

Claims

1. Multifunctional microwave plasma ultraviolet deodorization equipment, characterized by A rapid decomposition device (1), a high-frequency plasma electric field (2), a microwave plasma electric field (3), a high-intensity ultraviolet radiation field (4), a low-temperature plasma electric field (5), a high-intensity ozone gas reaction chamber (6), a termination reaction chamber (7), and a clean gas combing chamber (8) are sequentially installed on the wall of a horizontal rectangular box. The middle of the horizontal rectangular box along the horizontal axis is a channel-type cavity. The waste gas odor collection pipeline and the odor storage cabinet (9) are connected to an exhaust pump (10). The exhaust pump (10) is connected to the odor inlet of the rapid decomposition device (1). The tail end of the clean gas combing chamber (8) is connected to a clean gas exhaust pipe; wherein: The rapid decomposition device (1) contains activated carbon for adsorption, and the rapid decomposition device (1) contains a monofluorine atom oxide catalyst, which is sodium monofluorophosphate; The high-frequency plasma electric field (2) comprises: a high-frequency plasma electric field generator; The microwave plasma electric field (3) comprises: a control console connected to a high-voltage power supply (39), the high-voltage power supply (39) connected to a magnetron (32), a fixed partition (33) in the microwave plasma electric field (3), a quartz tube (31) fixed on the fixed partition (33), and a magnetron (32) fixed on a box of the microwave plasma electric field (3); inert gas and mercury are filled in the quartz tube (31), and the entire quartz tube (31) is uniformly discharged in the microwave plasma electric field (3), generating full-band ultraviolet rays and ozone of 180 to 380 nm, and sterilizing by using ultraviolet rays and ozone; The high-intensity ultraviolet radiation field (4) comprises: a controller (45) connected in parallel to a plurality of ballasts (44), each ballast (44) being connected to a high-intensity ultraviolet generator (42), and all the high-intensity ultraviolet generators (42) being fixed in a cavity (46) of the high-intensity ultraviolet radiation field (4); The low-temperature plasma electric field (5) comprises: in a box (52) of the low-temperature plasma electric field (5), an air inlet filter (54) is fixed close to an air inlet (51) of the low-temperature plasma electric field (5), an air outlet filter (57) is fixed close to an air outlet (56) of the low-temperature plasma electric field (5), and a low-temperature plasma electric field generator (55) is fixed in the middle of the box (52) of the low-temperature plasma electric field (5); The high-intensity ozone gas reaction chamber (6) comprises: an air compressor (61) connected to an air source gas transmission pipe (62), the air source gas transmission pipe (62) is connected in parallel to a plurality of ozone generators (63), the gas outlet of each ozone generator (63) is connected to an ozone gas transmission pipe (64), and the tail end of the ozone gas transmission pipe (64) is connected to an ozone gas inlet at the bottom of the high-intensity ozone gas reaction chamber (6); The termination reaction chamber (7) comprises: a plurality of honeycomb activated carbon filters (73) are installed on the termination reaction chamber box (72), and pure carbon elements (75) are densely distributed on the honeycomb activated carbon filters (73); A plurality of positive and negative ion generators (83) are installed on the frame of a clean gas combing chamber box (82) of the clean gas combing chamber (8).

2. The multifunctional microwave plasma ultraviolet deodorization equipment according to claim 1 is characterized in that: The high frequency plasma electric field generator comprises: an integrated circuit IC1 whose model is 7809, and an integrated circuit IC2 whose model is a 555 time base circuit.

3. The multifunctional microwave plasma ultraviolet deodorization equipment according to claim 1 is characterized in that: The high voltage power supply (39) of the microwave plasma electric field (3) comprises: an integrated circuit IC1 whose model is MAX038, and an integrated circuit IC2 whose model is LF353.

4. The multifunctional microwave plasma ultraviolet deodorization equipment according to claim 2 is characterized in that: The high-frequency plasma electric field generator includes: a rectifier QU connected to a voltage regulator IC17809, the voltage regulator IC17809 is connected to the input end of an inverter IC2555 timing circuit, the output end 3 pins of the inverter IC2555 timing circuit are connected to the base of an amplifier VT1 through a resistor R5 and a capacitor C6, the output port of the amplifier is connected to a transformer T1, and a high-frequency voltage is output.

5. The multifunctional microwave plasma ultraviolet deodorization equipment according to claim 3 is characterized in that The high voltage power supply in the microwave plasma circuit of the microwave plasma electric field (3) includes: an integrated circuit IC1MAX038 which is a high frequency precision function signal generator, a potentiometer P1 connected to the 8th pin of IC1, a potentiometer P3 connected to the 7th pin of IC1, a potentiometer P2 connected to the 10th pin of IC1, a capacitor C5 connected to the 5th pin of IC1, a 19th pin of IC1 connected to a diode D1, D1 connected to the 3rd pin of IC2IF353, a 17th pin connected to a +5V power supply, a 20th pin connected to a -5V power supply, and pins 15, 2, 9, 11, 12, and 13 are connected. Pin 3 is grounded, pins 18 and 15 are grounded, pin 3 of IC1 is connected to the CN3 touch switch, pin 4 of IC1 is connected to the touch switch CN4, the output end of diode D14148 is connected to pin 3 of amplifier IC2LF353, pin 2 of amplifier IC2LF353 is connected to resistor R1 and potentiometer P4, pin 1 of amplifier IC2LF353 is connected to pin 5 of amplifier IC2LF353, pin 6 of amplifier IC2LF353 is connected to output pin 7 of amplifier IC2LF353, and pin 8 of amplifier IC2LF353 is connected to the power supply.

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