A template-free laser nano-in-situ patterning method and device

Abstract

The present invention provides a template-free laser nano-in-situ patterning method and equipment, including the following steps: S1 establishes the system parameters of laser action, substrate approach mechanism and laser alignment mechanism; S2 screen scraping, forming a high-quality uniform nano solution film on the screen plate; S3 substrate approaching, accurately adjusting the height of the substrate workbench, and controlling the distance between the screen plate and the substrate material; S4 laser positioning, generating a laser action route according to the written graphics at the required patterning position of the substrate; S5 curing, heating and curing the substrate workbench to complete the patterning process. The beneficial effects of the present invention: the process flow is simple, easy to operate, and the applicable materials and substrates are wide; the mask or mold preparation process is eliminated, the product cycle is compressed, the processing accuracy is improved, and the process cost is reduced; it has obvious advantages in the rapid development of new products, the preparation of multi-variety small batch products, and meeting the needs of various non-standard devices, and has broad application prospects.

Description

Technical Field

[0001] The invention belongs to the field of microelectronics and micro-nano processing, and particularly relates to a template-free laser nano in-situ patterning method and equipment for printing and patterning of nano materials. Background Art

[0002] Products such as flexible electronics, flexible sensors, LED graphics, solar panels, high-definition flat-panel displays, anti-reflective and self-cleaning glass, wafer-level micro-nano optical devices, etc. all require the printing and preparation of nanostructures on substrates or base materials, thus giving rise to a relatively broad market demand.

[0003] At present, the method for preparing nanomaterials by graphic printing is mainly based on screen printing technology, nanoimprint technology, photolithography technology and its derivative technologies. For example, a method for graphic printing of nanomaterials disclosed in Chinese patent CN108263106B covers a filter membrane with a screen plate, forms a graphic polymer slurry layer on the filter membrane surface by screen printing polymer slurry, and then deposits nanomaterials in the graphic area of ​​the polymer slurry layer to form a nanomaterial structure, and finally transfers the nanomaterial structure to the substrate. Due to the limitations of screen printing technology, this method still has great technical difficulties for complex structures and high-precision printing.

[0004] Chinese patent CN105159029A discloses a micro-nano patterning method and device combining flat-plate nanoimprinting and roller nanoimprinting, which realizes micro-nano patterning of large-area and large-size rigid substrates through pretreatment, imprinting and curing, demolding and post-processing. The equipment uses a soft mold with roller imprinting and demolding processes, and the preparation process is complicated, which increases the risk of graphic deformation and dislocation caused by the intermediate production links.

[0005] Chinese patent CN106115681A discloses a method for realizing two-dimensional material patterning, in which a one-dimensional or two-dimensional phase grating is placed on a sample, and the grating is irradiated with a laser, and the spatial distribution of laser energy is formed by the coherence phenomenon to realize the patterned structure. The technical difficulty of this method lies in the manufacture of high-quality grating masks, which has high requirements for preparation equipment and technicians, and a set of molds is only suitable for the preparation of specific graphic structures, and the preparation cost is high.

[0006] A common technical bottleneck of the above-mentioned traditional patterning technologies is that they all need to be combined with masks or molds. With the continuous miniaturization and high integration of devices, the feature size of devices continues to shrink, and the difficulty and cost of preparing the required masks continue to rise. Maskless technology has attracted widespread attention. At the same time, high-precision nano-printing and patterning technologies are in urgent need of improvement. Summary of the invention

[0007] The technical problem to be solved by the present invention is to provide a template-free nanomaterial in-situ patterning method and device, which can realize laser in-situ patterning in one step and meet the current market demands of high efficiency, low cost, high precision, etc.

[0008] In order to solve the above technical problems, the technical solution adopted by the present invention is: a laser nano-in-situ patterning method, comprising the following steps:

[0009] Step S1: Establishing the system parameters of laser action, screen scraping, substrate approach and laser alignment, the system parameters include: laser spot size, laser power, laser scanning speed, scraping angle, and the distance between the screen and the substrate; Step S2, screen scraping: using the scraping method to form a high-quality uniform nano solution film on the screen plate; Step S3, substrate approach: accurately adjusting the height of the substrate workbench to control the distance between the screen plate and the substrate material; Step S4, laser positioning, generating a printed graphic route: at the required graphic position of the substrate, generating a laser action route according to the graphic path set by the computer; Step S5, mapping and curing: the computer controls the laser to move and act along the set route in the XY plane, and where the laser acts on the screen, the nano material attached to the screen is transferred to the substrate, and the substrate workbench is heated and cured to complete the graphic process.

[0010] In step S3, the distance between the screen plate and the substrate material is controlled to be 0.05-0.2 mm.

[0011] In step S4, the laser action route is generated and the laser power and the spot size are adjusted by a power regulator to focus on the screen film.

[0012] Another object of the present invention is to provide a device for a laser nano-in-situ patterning method, comprising: a computer, a laser action mechanism, a screen scraping mechanism, a substrate approaching mechanism and a laser alignment mechanism. The computer is respectively connected to the laser action mechanism, the screen scraping mechanism, the substrate approaching mechanism and the laser alignment mechanism; the laser action mechanism comprises a laser, a laser adjustment component and an XY plane laser moving component, the laser is connected to the computer through the laser adjustment component and the XY plane laser moving component, and the computer controls the laser power, spot size and automatic focusing adjustment of the laser and realizes the scanning movement of the screen scraping mechanism in the XY plane.

[0013] The XY plane laser moving assembly comprises an X-direction precision lead screw, a Y-direction precision lead screw, an X-direction high-precision stepping motor, and a Y-direction high-precision stepping motor. The X-direction precision lead screw is provided with an X-direction high-precision stepping motor, the Y-direction precision lead screw is provided with a Y-direction high-precision stepping motor, the X-direction precision lead screw and the Y-direction precision lead screw are cross-connected, and the laser is provided on the X-direction precision lead screw.

[0014] The screen film scraping mechanism includes a screen plate, an ink scraper, an ink return knife, a stepper motor G and a stepper motor H. The screen plate and the scraper / ink return knife are arranged at an angle of 30-90 degrees. The ink scraper and the ink return knife are respectively provided with a stepper motor G and a stepper motor H. The stepper motor G and the stepper motor H are respectively controlled by a computer to reciprocately scrape the printing material on the screen plate by the ink scraper and the ink return knife.

[0015] The ink scraper and ink return knife are both double-sided scrapers, consisting of a scraper frame, a slide rail, an upper scraper, and a lower scraper. The scraper frame is a rectangular frame with slide rails on both sides. Two scrapers are arranged up and down in the scraper frame, with the blade surfaces facing each other, and the distance between the upper scraper and the lower scraper can be adjusted by sliding along the slide rail. The screen plate passes between the upper scraper and the lower scraper of the ink scraper / ink return knife.

[0016] The screen plate is arranged at an angle of 30-90 degrees to the scraper / ink return knife.

[0017] The laser alignment mechanism includes a low-magnification CCD camera and a high-magnification CCD camera, which are respectively arranged near the screen plate and connected to a computer. The low-magnification CCD camera identifies and preliminarily locates within a large field of view, and the high-magnification CCD camera accurately displays the local morphology of the image and accurately measures the distance between the substrate and the screen plate.

[0018] The substrate approach mechanism includes a substrate workbench, an electric lifting platform, a lifting platform controller, a temperature controller, a vacuum pipeline and a vacuum pump. The substrate workbench has a plurality of adsorption holes on its surface, which are connected to the vacuum pump through a vacuum pipeline to adsorb and fix the substrate; the substrate workbench is arranged on the electric lifting platform, and the electric lifting platform is connected to a computer through a lifting platform controller. The laser alignment mechanism performs precise distance measurement, and the lifting platform controller performs precise regulation on the height of the substrate workbench; the substrate workbench is connected to a computer through a temperature controller to achieve temperature control of substrate pattern curing heating.

[0019] The beneficial effects of the present invention are: providing a template-free, contactless, one-time laser in-situ patterning device and method, the device process is simple, easy to operate, and applicable to a wide range of materials and substrates; compared with traditional mask technology, the mask or mold preparation process is eliminated, the random error caused by the mask process is eliminated, and the processing accuracy is effectively improved; no mask or mold is required, direct in-situ patterning is performed, which greatly reduces the process cost and shortens the product cycle, has obvious advantages in the rapid development of new products, the preparation of small batches of multiple varieties of products, and meeting the needs of various non-standard devices, and has broad application prospects. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 This is a schematic diagram of the structure of the template-free laser nano in-situ patterning device of the present invention;

[0021] Figure 2 This is a schematic diagram of the ink scraper / ink return knife structure of the present invention;

[0022] Figure 3 This is a flow chart of the template-free laser nano-in-situ patterning preparation method of the present invention;

[0023] Figure 4 This is a top view schematic diagram of the template-free laser nano-in-situ patterning preparation process of an embodiment of the present invention;

[0024] Figure 5 This is a side view schematic diagram of the template-free laser nano in-situ patterning preparation process for an implementation example of the present invention.

[0025] In the figure:

[0026] 1. Computer 2. Laser

[0027] 3. Laser adjustment assembly 4. X-axis precision screw

[0028] 5. Y-axis precision screw 6. X-axis precision stepping motor

[0029] 7. Y-axis high-precision stepper motor 8. Silk screen plate

[0030] 9. Ink scraper 10. Ink return knife

[0031] 11. Stepper motor G12. Stepper motor H

[0032] 13. Low magnification CCD camera 14. High magnification CCD camera

[0033] 15. Substrate 16. Substrate workbench

[0034] 17. Electric lifting platform 18. Lifting platform controller

[0035] 19. Temperature control component 20. Adsorption hole

[0036] 21. Vacuum pipeline 22. Vacuum pump

[0037] 901, scraper frame 902, slide rail

[0038] 903, upper scraper 904, lower scraper DETAILED DESCRIPTION

[0039] The present invention is further described in detail below in conjunction with the accompanying drawings and specific embodiments:

[0040] like Figure 1As shown, the template-free laser nano-in-situ patterning device of the present invention includes four main modules: a laser action mechanism, a screen scraping mechanism, a substrate approaching mechanism, and a laser alignment mechanism. The substrate approaching mechanism is arranged below the laser action mechanism and above the substrate approaching mechanism. The laser action mechanism includes a computer 1, a laser 2, a laser adjustment component 3, and an XY plane laser moving component. The laser 2 is connected to the computer 1 through the laser adjustment component 3 and the XY plane laser moving component. The computer controls and adjusts the laser power, the spot size, and the automatic focusing, and realizes the scanning movement of the laser 2 in the XY plane. The XY plane laser moving component includes an X-axis precision screw 4, a Y-axis precision screw 5, an X-axis high-precision stepping motor 6, and a Y-axis high-precision stepping motor 7. The X-axis precision screw 4 is provided with an X-axis high-precision stepping motor 6, and the Y-axis precision screw 5 is provided with a Y-axis high-precision stepping motor 7. The X-axis precision screw 4 and the Y-axis precision screw 5 are cross-connected, and the laser 2 is arranged on the X-axis precision screw 4.

[0041] The screen scraping mechanism includes a screen plate 8, a scraper 9, an ink return knife 10, a stepper motor G11 and a stepper motor H12. The screen plate 8, the scraper 9 and the ink return knife 10 are arranged perpendicular to each other, and the scraper 9 and the ink return knife 10 are both connected to a stepper motor, which is then connected to a computer 1 to control the scraper 9 and the ink return knife 10 to move back and forth on the screen plate to scrape and apply the printing material.

[0042] The laser alignment mechanism includes a low-magnification CCD camera 13 and a high-magnification CCD camera 14. The two cameras are relatively arranged at two locations near the screen plate 8 and connected to the computer 1. The low-magnification camera 13 is used to identify and initially locate within a large field of view, and the high-magnification camera 14 is used to locally display the written pattern with high precision, and the spacing between the substrate 15 and the screen plate 8 is positioned and measured.

[0043] The substrate approach mechanism includes a substrate workbench 16, an electric lifting platform 17, a precision lifting controller 18, a temperature control component 19, a vacuum pipeline 21 and a vacuum pump 22. The substrate workbench 16 has a plurality of adsorption holes 20 on its surface, which are connected to the vacuum pump 22 through the vacuum pipeline 21 to adsorb and fix the substrate 15. The substrate workbench 16 is arranged on the electric lifting platform 17, which is connected to the computer 1 through the lifting platform controller 18. The laser alignment mechanism accurately measures the distance, and the lifting platform controller 18 accurately controls the height of the substrate workbench 16. The substrate workbench 16 is connected to the computer 1 through the temperature control component 19 to realize the temperature control of the substrate pattern curing heating. The temperature control component 19 includes a heating device and a temperature sensor, and the heating device is arranged below the substrate workbench 16.

[0044] Figure 2The schematic diagram of the structure of the ink scraper or ink return knife of the present invention is shown in FIG. The ink scraper 9 and the ink return knife 10 are both double-sided scrapers, which are composed of a scraper frame 901, a slide rail 902, an upper scraper 903, and a lower scraper 904. The scraper frame 901 is a rectangular frame, and slide rails 902 are set on both sides. Two scrapers are set up and down in the scraper frame 901, and the blade surfaces are opposite. The spacing between the upper scraper 903 and the lower scraper 904 can be adjusted by sliding along the slide rail 902. The screen plate 8 passes between the upper scraper 903 and the lower scraper 903 of the ink scraper or ink return knife.

[0045] Figure 3 This is a flow chart of the laser nano-in-situ patterning preparation method of the present invention, including five main steps: establishing system parameters, screen scraping, substrate approaching, laser positioning, generating printing pattern route, mapping, and curing.

[0046] In this implementation case, the zinc oxide nano solution is used as the printing material to print the word "2020" on the silicon dioxide substrate. The selected pulse energy: 8.3mJ-166mJ pulse laser, a 300-mesh screen plate is selected, and the laser moves within the XY plane. The range is 200mm×200mm.

[0047] Figure 4 and Figure 5 The top view and side view of the graphical preparation process of the present invention are shown in the following examples. The specific process includes: preparing the zinc oxide nano solution, placing the silicon dioxide substrate on the substrate workbench 16, S1: starting the computer operating system, such as selecting AUTOCAD drawing and executing the windows system, establishing the system parameters of laser action, screen scraping, substrate approach and laser alignment: scraping angle 60 degrees, distance between screen and substrate 0.1mm, focusing laser spot size 10 microns, laser power set to 30mW, scanning speed 1cm / s. S2: taking the zinc oxide nano solution and dripping it onto the screen plate 8, the screen scraping mechanism simultaneously forms a uniform zinc oxide nano solution film on the screen plate 8 by the scraping method through system control. S3: laser positioning mechanism distance measurement, computer-controlled lifting platform controller 18 realizes the position adjustment of the electric lifting platform 17, and finally the screen plate 8 and the silicon dioxide substrate placed on the substrate workbench 16 are adjusted to a distance of about 0.1mm. S4: The control system positions the laser beam at the position of the substrate 15 to be patterned, and generates a laser action route according to the computer-set graphic "2020"; S5: The computer 1 controls the laser to scan the set "2020" route in the XY plane. Under the action of the laser, the zinc oxide solution on the screen plate is locally transferred to the silicon dioxide substrate directly below with the screen grid as a unit, forming a zinc oxide "2020" graphic. The substrate workbench 16 is heated and cured to complete the graphic structure preparation.

[0048] The present invention combines screen printing technology, high-precision laser technology, and computer control and data processing technology. The entire preparation process is template-free and contact-free, and laser in-situ graphics can be achieved at one time, meeting the current market demands for high efficiency, low cost, and high precision, and has broad application prospects. It should be noted that the above embodiments are only used to describe the specific implementation methods of the present invention, but the scope of application of the present invention is not limited to the above embodiments. In addition, any other improvements or modifications made on the basis of the technical solution of the present invention are still within the protection scope of the present invention.

Claims

1. A template-free laser nano-in-situ patterning method, characterized in that: The steps include: Step S1, establishing laser action, screen scraping, substrate approach and laser alignment system parameters, the system parameters include: laser spot size, laser power, laser scanning speed, scraping angle, and the distance between the screen and the substrate; Step S2, screen scraping: placing the nano-solution on the screen plate and scraping it flat by a scraping method to form a high-quality uniform nano-solution film; Step S3, substrate approaching: accurately adjusting the height of the substrate workbench of the substrate approaching mechanism to control the distance between the screen plate and the substrate material; Step S4, laser positioning and generating a printing pattern path: generating a laser action path at a desired patterning position of the substrate according to a pattern path set by a computer; Step S5, patterning and curing: The computer controls the laser to move and act along a set route in the XY plane. Where the laser acts on the screen, the nanomaterial attached to the screen is transferred to the substrate, and the patterning process is completed by heating and curing the substrate workbench.

2. The template-free laser nano-in-situ patterning method according to claim 1, characterized in that: In step S3, the distance between the screen plate and the substrate material is 0.05-0.2 mm.

3. The template-free laser nano-in-situ patterning method according to claim 1, characterized in that: The step S4 of generating the laser action route is to focus the laser beam on the screen film by adjusting the power and the spot size of the laser.

4. A device according to the template-free laser nano-in-situ patterning method of claim 1, comprising: A computer, characterized in that the computer is respectively connected to a laser action mechanism, a screen scraping mechanism, a substrate approaching mechanism, and a laser alignment mechanism; the laser action mechanism comprises a laser (2), a laser adjustment component (3), and an XY plane laser moving component; the laser (2) is connected to the computer (1) via the laser adjustment component (3) and the XY plane laser moving component; the computer controls the laser power, spot size, and automatic focusing adjustment of the laser (2) and realizes scanning movement of the screen scraping mechanism in the XY plane.

5. The device for the template-free laser nano-in-situ patterning method according to claim 4, characterized in that: The XY plane laser moving assembly comprises an X-axis precision lead screw (4), a Y-axis precision lead screw (5), an X-axis high-precision stepping motor (6), and a Y-axis high-precision stepping motor (7); the X-axis precision lead screw (4) is provided with an X-axis high-precision stepping motor (6), the Y-axis precision lead screw (5) is provided with a Y-axis high-precision stepping motor (7), the X-axis precision lead screw (4) and the Y-axis precision lead screw (5) are cross-connected, and the laser (2) is provided on the X-axis precision lead screw (4).

6. The device for the template-free laser nano-in-situ patterning method according to claim 4, characterized in that: The screen film scraping mechanism comprises a screen plate (8), an ink scraper (9), an ink return knife (10), a stepping motor G (11) and a stepping motor H (12); the screen plate (8) is arranged at an angle with the ink scraper (9) and the ink return knife (10); the ink scraper (9) and the ink return knife (10) are respectively provided with a stepping motor G (11) and a stepping motor H (12); the stepping motor G (11) and the stepping motor H (12) are respectively controlled by a computer (1) to scrape the ink scraper (9) and the ink return knife (10) to reciprocately scrape the printing material on the screen plate (8).

7. The device for the template-free laser nano-in-situ patterning method according to claim 6, characterized in that: The ink scraper (9) and ink return knife (10) are both double-sided scrapers, and are composed of a scraper frame (901), a slide rail (902), an upper scraper (903), and a lower scraper (904). The scraper frame (901) is a rectangular frame, and slide rails (902) are arranged on both sides. Two scrapers are arranged in the scraper frame (901) from top to bottom, and the blade surfaces are opposite to each other. The spacing between the upper scraper (903) and the lower scraper (904) can be adjusted by sliding along the slide rail (902). The screen plate (8) passes between the upper scraper (903) and the lower scraper (904) of the ink scraper / ink return knife.

8. The device for the template-free laser nano-in-situ patterning method according to claim 6, characterized in that: The screen plate is arranged at an angle of 30-90 degrees to the scraper / ink return knife.

9. The device for the template-free laser nano-in-situ patterning method according to claim 4, characterized in that: The laser alignment mechanism comprises a low-magnification CCD camera (13) and a high-magnification CCD camera (14). The low-magnification CCD camera (13) and the high-magnification CCD camera (14) are respectively arranged near the screen plate (8) and connected to the computer (1). The low-magnification CCD camera (13) performs identification and preliminary positioning within a large field of view, and the high-magnification CCD camera (14) performs local fine display of the graphic morphology and performs positioning measurement on the spacing between the substrate (15) and the screen plate (8).

10. The device for the template-free laser nano-in-situ patterning method according to claim 4, characterized in that: The substrate approach mechanism comprises a substrate workbench (16), an electric lifting platform (17), a lifting platform controller (18), a temperature control component (19), a vacuum pipeline (21) and a vacuum pump (22); a plurality of adsorption holes (20) are provided on the surface of the substrate workbench (16), which are connected to the vacuum pump (22) via the vacuum pipeline (21) to adsorb and fix the substrate (15); the substrate workbench (16) is arranged on the electric lifting platform (17), the electric lifting platform (17) is connected to the computer (1) via the lifting platform controller (18), the laser alignment mechanism performs precise distance measurement, and the lifting platform controller (18) performs precise control on the height of the substrate workbench (16); the substrate workbench (16) is connected to the computer (1) via the temperature control component (19) to achieve temperature control of substrate pattern curing heating.

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