A method and system for adaptively designing thickness of optical film

Abstract

The invention discloses an adaptive design method and system for the thickness of an optical film, comprising the following steps: S1: first, a processor preliminarily calculates the film thickness data corresponding to each area under the target brightness / chromaticity requirements; S2: adjusting the voltages of the upper and lower substrates to change the liquid level of each area; S3: an imaging brightness colorimeter located on the light-emitting imaging side scans the light-emitting surface, obtains multi-point brightness / chromaticity data corresponding to each area, and uploads the data to a data processor; S4: comparing the brightness / chromaticity data and distribution conditions uploaded in step S3 with the given target brightness / chromaticity to determine whether the requirements are met; S5: ending the adjustment cycle, and outputting the voltage, liquid level, film thickness, brightness / chromaticity data and uniformity results of each area; the invention innovatively introduces feedback control into the design of an optical film to realize the automatic design of the thickness and surface morphology of the optical film under the specified brightness / chromaticity index; the problems of low efficiency, cumbersome work, low precision and high cost of manual design can be solved.

Description

Technical Field

[0001] The invention belongs to the technical field of optical films, and in particular relates to a method and system for adaptively designing the thickness of an optical film. Background Art

[0002] For lighting systems and light source modules of flat panel displays, brightness and color uniformity have always been an important indicator. Traditional methods to improve uniformity usually start from the perspectives of light source design, LED arrangement design, and optical film materials and combinations. The most commonly used method is to change the LED arrangement and use a diffusion film to even out the light. Recently, related studies have proposed a new research angle, which is to design the thickness and surface morphology of the optical film, match the thickness of each area of ​​the film with the light intensity distribution in different areas, and develop a non-uniform thickness film that is different from the traditional film, especially suitable for color conversion film layers. This design can integrate color conversion, color absorption, divergent or concentrated light and other effects in the same optical film, which has a positive effect and significance on optimizing optical films, improving module integration, and thinning modules.

[0003] In view of this new research angle, the present invention introduces feedback control and proposes an adaptive design method and system for optical film thickness. This method is applicable to various light sources such as LED and OLED, and can automatically and adaptively match the thickness of each region, which helps to improve the development efficiency and automation of films with non-uniform thickness, and solve the problems of cumbersome manual adjustment, long cycle, and low precision. Summary of the invention

[0004] The object of the present invention is to provide a method and system for adaptively designing the thickness of an optical film, so as to solve the problems raised in the above-mentioned background technology.

[0005] To achieve the above object, the present invention provides the following technical solution: a method for adaptively designing the thickness of an optical film, comprising the following steps:

[0006] S1: First, the processor preliminarily calculates the film thickness data corresponding to each area under the target brightness / chromaticity requirements;

[0007] S2: According to the voltage value of each region obtained in step S1, the voltage of the upper and lower substrates is adjusted to change the liquid level of each region, wherein the liquid level of the first charged liquid layer corresponds to the film thickness of the region, and different film thicknesses will lead to different brightness / chromaticity changes in each region;

[0008] S3: The imaging brightness colorimeter located on the light-emitting imaging side scans the light-emitting surface, obtains multi-point brightness / chromaticity data corresponding to each area, and uploads it to the data processor;

[0009] S4: Compare the brightness / chromaticity data and distribution uploaded in step S3 with the given target brightness / chromaticity to determine whether they meet the requirements;

[0010] If the current luminance / chromaticity situation is consistent with the target situation, a “yes” response is issued, and if it is inconsistent, a “no” response is issued;

[0011] If a "yes" response is issued, it means that the liquid level distribution at this time can make the brightness / chromaticity meet the desired uniformity or distribution law, and no further adjustment is required;

[0012] If a "no" response is issued, it means that the liquid level distribution cannot make the brightness / chromaticity meet the desired uniformity or distribution pattern, and it is necessary to return to step S1 to continue adjustment. The voltage can be changed in a small increase or decrease and gradual manner until a "yes" response is issued.

[0013] S5: End the adjustment cycle and output the voltage, liquid level, film thickness, brightness / chromaticity data and uniformity results of each area; if only thickness design is required, the design is completed when this method ends; if it is used for data collection for material development, after this method, the output data is uploaded to a computer or processor to establish a material database, and the light efficiency data of a certain material or a combination of two materials at different thicknesses is obtained, eliminating the tedious repeated test process and greatly improving the development efficiency in the form of dynamic experiments.

[0014] The step S1 can be calculated based on existing knowledge or data, or a randomly assigned value if there is no relevant data; different thicknesses correspond to the liquid level distribution of the two charged liquids in each area, and the processor converts the thickness data of each area into a corresponding voltage value.

[0015] The step S4 sets the deviation amount. If it is within the deviation range, or a "yes" response is issued, the requirement for brightness uniformity is 80%±2%. Then, when the actual brightness uniformity reaches 78%, a "yes" response can be issued.

[0016] A system for an adaptive design method of optical film thickness comprises an imaging brightness colorimeter, an upper transparent electrode, a lower transparent electrode, a first charged liquid layer, a second charged liquid layer and a light source.

[0017] The upper transparent electrode and the lower transparent electrode are divided into a plurality of regions, and the voltages between these regions can be adjusted and controlled independently without affecting each other.

[0018] The first charged liquid layer and the second charged liquid layer are made of two liquids with different densities, immiscible liquids and opposite electrical properties, and are respectively connected to the outside through a fine conduit for introducing or discharging liquid in the device.

[0019] The imaging brightness and colorimeter is placed on the light-emitting imaging side and is used to scan and detect multi-point brightness and color data; the light source is placed at the bottom.

[0020] The purpose of the present invention is to develop an adaptive design method and system for optical film thickness, which can realize automatic design of optical film thickness and surface morphology under specified brightness / chromaticity indicators, and is suitable for film design of lighting systems, direct-type or side-type backlight systems, etc., and can control uniformity to a certain standard, and can also make brightness / chromaticity distributed according to a certain rule. The use of this method can greatly improve the efficiency of optical film development, and can also be used for data collection for material development, film mold manufacturing and film production, etc.

[0021] The present invention provides an optical film thickness adaptive design method and system, which are used to control the brightness and chromaticity uniformity of the light output of the optical system or to distribute it according to certain requirements. The optical system panel is divided into several areas, and the film thickness corresponding to each area is preliminarily calculated according to the brightness / chromaticity distribution requirements; the film layer area is filled with charged liquid, and the voltage between the upper and lower substrates of each area is controlled to achieve different liquid level distributions, that is, different film thickness control of each area; the surface brightness / chromaticity is measured and sampled by an imaging brightness colorimeter; the measured data is analyzed and calculated, and the results are fed back to the input end to compare with the target uniformity index or distribution requirements, and a deviation signal is generated. The system is adjusted in a new round with this signal until the target brightness / chromaticity uniformity index or distribution requirements are met. The present invention introduces feedback control and innovatively proposes an optical film thickness adaptive design method and system, which is suitable for non-imaging optical lighting, display systems and other fields, realizes the automatic design of optical film thickness and surface morphology, solves the problems of low efficiency, cumbersome work, and low precision of manual design, and can be further applied to data collection for material development, film mold manufacturing and film production.

[0022] Compared with the prior art, the beneficial effects of the present invention are as follows: the present invention provides an optical film thickness adaptive design method and system, the present invention innovatively introduces feedback control into the optical film design, and realizes the automatic design of the optical film thickness and surface morphology under the specified brightness / chromaticity index;

[0023] It is widely used in non-imaging optical fields such as lighting and display. It is highly flexible and easy to control, and can solve problems such as low efficiency, cumbersome work, low precision and high cost of manual design.

[0024] It has great potential for subsequent applications and can be used for data collection for material development, diaphragm mold manufacturing, and diaphragm production, etc., and has high developability. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 A schematic diagram of the system structure of the method for adaptively designing the thickness of an optical film according to the present invention;

[0026] Figure 2 is a system block diagram of the adaptive closed-loop control of the present invention;

[0027] Figure 3 A flowchart of the steps of the method for adaptively designing the thickness of an optical film according to the present invention;

[0028] Figure 4 It is a schematic diagram of the curing system structure of the present invention;

[0029] Figure 5 It is a diagram of the mold making and diaphragm production steps of the present invention.

[0030] In the figure: 1. Imaging brightness colorimeter; 2. Upper transparent electrode; 3. Lower transparent electrode; 4. First charged liquid layer; 5. Second charged liquid layer; 6. Light source; 7. Upper curing device; 8. Lower curing device; 110. Controller; 120. Actuator; 130. Controlled object; 140. Comparator; 150. Data processing module. DETAILED DESCRIPTION

[0031] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0032] Embodiment 1: Figure 1 The system structure diagram of the adaptive design method of optical film thickness is shown, which includes an imaging brightness colorimeter 1, an upper transparent electrode 2, a lower transparent electrode 3, a first charged liquid layer 4, a second charged liquid layer 5 and a light source 6.

[0033] The upper transparent electrode 2 and the lower transparent electrode 3 are divided into a plurality of regions, and the voltages between these regions can be adjusted and controlled independently without affecting each other.

[0034] The first charged liquid layer 4 and the second charged liquid layer 5 are made of two liquids with different densities, immiscible liquids and opposite electrical properties, and are respectively connected to the outside through a fine conduit for introducing or discharging liquid in the device.

[0035] The imaging brightness colorimeter 1 is placed on the light-emitting imaging side, and is used to scan and detect multi-point brightness / chromaticity data; the light source 6 is placed at the bottom, and taking LCD backlight as an example, it can be a direct backlight or an edge-entry backlight.

[0036] like Figure 2The figure shows a system block diagram of adaptive closed-loop control, where the input is a given brightness / chromaticity distribution and the output is the actual brightness / chromaticity distribution. The distribution here can be the specific brightness / chromaticity of each area or the brightness / chromaticity uniformity index.

[0037] The control process includes the following parts: controller 110 (voltage controller), actuator 120 (liquid level change in the device), controlled object 130 (film thickness distribution), imaging brightness colorimeter 1 (detection device) and data processing module 150, comparator 140;

[0038] Among them, the controller 110 and the actuator 120 can change the voltage of the upper and lower electrodes. Under their action, the first charged liquid layer 4 and the second charged liquid layer 5 in the area form a specific liquid level, and different voltages in each area will produce different liquid levels. These areas with different liquid levels are combined to form an overall film layer, and the film layer has a specific thickness distribution morphology. An imaging brightness colorimeter 1 is used as a detection device to collect the upper surface brightness / chromaticity data, and it is processed, analyzed, and converted through a data processing module 150. The result is input into the comparator 140, compared with the input quantity, and a difference signal is formed. The difference signal is used as a new input quantity to start the next round of liquid level control until the difference signal disappears, that is, the output quantity is consistent with the input quantity, and the closed-loop feedback control process ends at this time.

[0039] like Figure 3 The flowchart of the method for adaptively designing the thickness of an optical film according to the first embodiment of the present invention is shown, which is based on a cycle until a certain type is formed. The method comprises the following steps:

[0040] S1: First, the processor preliminarily calculates the film thickness data corresponding to each area under the target brightness / chromaticity requirements;

[0041] S2: According to the voltage value of each region obtained in step S1, the voltage of the upper and lower substrates is adjusted to change the liquid level of each region, wherein the liquid level of the first charged liquid layer 4 corresponds to the film thickness of the region, and different film thicknesses will lead to different brightness / chromaticity changes in each region;

[0042] S3: The imaging brightness colorimeter located on the light-emitting imaging side scans the light-emitting surface, obtains multi-point brightness / chromaticity data corresponding to each area, and uploads it to the data processor;

[0043] S4: Compare the brightness / chromaticity data and distribution uploaded in step S3 with the given target brightness / chromaticity to determine whether they meet the requirements;

[0044] If the current luminance / chromaticity situation is consistent with the target situation, a “yes” response is issued, and if it is inconsistent, a “no” response is issued;

[0045] If a "yes" response is issued, it means that the liquid level distribution at this time can make the brightness / chromaticity meet the desired uniformity or distribution law, and no further adjustment is required;

[0046] If a "no" response is issued, it means that the liquid level distribution cannot make the brightness / chromaticity meet the desired uniformity or distribution pattern, and it is necessary to return to step S1 to continue adjustment. The voltage can be changed in a small increase or decrease and gradual manner until a "yes" response is issued.

[0047] S5: End the adjustment cycle and output the voltage, liquid level, film thickness, brightness / chromaticity data and uniformity results of each area; if only thickness design is required, the design is completed when this method ends; if it is used for data collection for material development, after this method, the output data is uploaded to a computer or processor to establish a material database, and the light efficiency data of a certain material or a combination of two materials at different thicknesses is obtained, eliminating the tedious repeated test process and greatly improving the development efficiency in the form of dynamic experiments.

[0048] The step S1 can be calculated based on existing knowledge or data, or a randomly assigned value if there is no relevant data; different thicknesses correspond to the liquid level distribution of the two charged liquids in each area, and the processor converts the thickness data of each area into a corresponding voltage value.

[0049] The step S4 sets the deviation amount. If it is within the deviation range, or a "yes" response is issued, the requirement for brightness uniformity is 80%±2%. Then, when the actual brightness uniformity reaches 78%, a "yes" response can be issued.

[0050] Embodiment 2: used for direct production of diaphragms;

[0051] On the basis of the first embodiment, the adaptive film thickness design method and system proposed in the present invention can be further used for direct production of membranes.

[0052] Figure 4 The schematic diagram of the curing system structure is shown, including an upper transparent electrode 2, a lower transparent electrode 3, a first charged liquid layer 4, a second charged liquid layer 5, an upper curing device 7, and a lower curing device 8. According to the characteristics of the material, the curing device can be a UV curing or a heating curing form. For the charged liquid layer filled with a solvent or material with low volatility, after the step S5 of the first embodiment of the design process is completed, the voltage of the upper transparent electrode 2 and the lower transparent electrode 3 is maintained, and the structure is transferred or switched to the curing system, and the first charged liquid layer 4, the second charged liquid layer 5, or the first charged liquid layer 4 and the second charged liquid layer 5 are directly cured.

[0053] The method of selecting the curing liquid layer is: if the thickness distribution design is performed for one material, only the upper or lower layer of liquid needs to be selected for curing, that is, one of the first charged liquid layer 4 and the second charged liquid layer 5 is selected for UV curing or heat curing; if the thickness distribution design is performed for a composite structure of two materials, the first charged liquid layer 4 and the second charged liquid layer 5 are UV cured or heat cured simultaneously or separately through the upper and lower curing devices.

[0054] Finally, a dried and cured membrane that meets the design requirements is obtained.

[0055] Embodiment 3: used for diaphragm mold manufacturing and diaphragm production;

[0056] The adaptive film thickness design method and system proposed in the present invention can be further applied to diaphragm mold manufacturing and diaphragm production by extending and expanding on the basis of the first embodiment. Different from the second embodiment, if the solvent or material is highly volatile and the solidification will result in a significant reduction in volume, the diaphragm can be produced by making a mold.

[0057] like Figure 5 The figure shows the steps of mold making and diaphragm production. The output data of the data processing module 150 of the adaptive closed-loop control system in the first embodiment is used as input. Figure 5 The following is an example of the first charged liquid layer 4 corresponding to the required membrane and the second charged liquid layer 5 as the auxiliary liquid layer (the second charged liquid layer 5 is made of a material with little or no volatility).

[0058] First, step 410 is performed to solidify the second charged liquid layer 5 by a solidifying device, and the solidified second charged liquid layer 5 is used as a mold for membrane production;

[0059] Then proceed to step 420, remove the first charged liquid layer 4, and clean the cured structure, completely remove the first charged liquid layer 4 and other impurities that may be introduced, and then transfer to an oven for drying;

[0060] Continuing to step 430, the solidified second charged liquid layer 5 is inverted, a frame is added around it to prevent the liquid from flowing out, and the required material is coated or filled on it with a desired thickness to naturally form a specific morphology;

[0061] Finally, step 440 is performed to solidify and demould the coated or filled liquid, and the process of steps 430 to 440 can be repeatedly performed for rapid production.

[0062] The methods and processes described above have the advantages of flexible regulation, wide applicability and low cost, and can be used for mold manufacturing and diaphragm production with various specific surface morphologies.

[0063] In summary, compared with the prior art, the present invention innovatively introduces feedback control into the design of optical film to achieve automatic design of the thickness and surface morphology of the optical film under specified brightness / chromaticity indicators;

[0064] It is widely used in non-imaging optical fields such as lighting and display. It is highly flexible and easy to control, and can solve problems such as low efficiency, cumbersome work, low precision and high cost of manual design.

[0065] It has great potential for subsequent applications and can be used for data collection for material development, diaphragm mold manufacturing, and diaphragm production, etc., and has high developability.

[0066] Finally, it should be noted that the above is only a preferred embodiment of the present invention and is not intended to limit the present invention. Although the present invention has been described in detail with reference to the aforementioned embodiments, it is still possible for those skilled in the art to modify the technical solutions described in the aforementioned embodiments or to make equivalent substitutions for some of the technical features therein. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A system for an adaptive design method of optical film thickness, characterized in that: The system comprises an imaging brightness colorimeter (1), an upper transparent electrode (2), a lower transparent electrode (3), a first charged liquid layer (4), a second charged liquid layer (5) and a light source (6); The upper transparent electrode (2) and the lower transparent electrode (3) are divided into a plurality of regions, and the voltages between these regions can be independently adjusted and controlled without affecting each other; The first charged liquid layer (4) and the second charged liquid layer (5) are made of two liquids with different densities, immiscible liquids and opposite electrical properties, and are respectively connected to the outside through a fine conduit for introducing or discharging liquid in the device; The imaging brightness and colorimeter (1) is placed on the light-emitting imaging side and is used to scan and detect brightness and color data of multiple points; The light source (6) is placed at the bottom; The method for adaptively designing the thickness of an optical film comprises the following steps: S1: First, the processor preliminarily calculates the film thickness data corresponding to each area under the target brightness / chromaticity requirements; Different thicknesses correspond to the level distribution of the two charged liquids in each area, and the processor converts the thickness data of each area into corresponding voltage values; S2: According to the voltage value of each region obtained in step S1, the voltage of the upper transparent electrode (2) and the lower transparent electrode (3) is adjusted to change the liquid level of each region; S3: The imaging brightness colorimeter located on the light-emitting imaging side scans the light-emitting surface, obtains multi-point brightness / chromaticity data corresponding to each area, and uploads it to the data processor; S4: Compare the brightness / chromaticity data and distribution uploaded in step S3 with the given target brightness / chromaticity to determine whether they meet the requirements; If the current brightness / chromaticity situation is consistent with the target situation, a "yes" response is issued, and if it is inconsistent, a "no" response is issued; If a "yes" response is issued, it means that the liquid level distribution can make the brightness / chromaticity meet the desired uniformity or distribution law, and no further adjustment is needed; If a "no" response is issued, it means that the liquid level distribution cannot make the brightness / chromaticity meet the desired uniformity or distribution law, and it is necessary to return to step S1 to continue adjustment. The voltage can be changed in a small increase or decrease and gradually approaching manner until a "yes" response is issued; The step S4 sets the deviation amount. If it is within the deviation range, a "yes" response is issued. The requirement for brightness uniformity is 80%±2%. When the actual brightness uniformity reaches 78%, a "yes" response can be issued. S5: End the adjustment cycle and output the voltage, liquid level, film thickness, brightness / chromaticity data and uniformity results of each area; if only thickness design is required, the design is completed when this method ends; if it is used for data collection for material development, after this method, the output data is uploaded to a computer or processor to establish a material database to obtain the light efficiency data of a certain material or a combination of two materials at different thicknesses.

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