Method for charging a charging furnace body using a charging device in a clean vacuum environment

Abstract

The present invention discloses a method for feeding a furnace body to be fed with a feeding device using a clean vacuum environment, the feeding device comprises a feeding tank, the feeding volume of the feeding tank is greater than or equal to the feeding volume of the furnace body to be fed, the feeding tank is provided with a feeding port connected to the feeding port of the furnace body to be fed, the feeding tank and the furnace body to be fed are detachably connected, a feeding isolation valve is provided at the feeding port, a feeding isolation valve is provided at the feeding port of the furnace body to be fed, the feeding tank and the furnace body to be fed are both provided with a vacuum interface and a gas replacement interface, the vacuum interface and the gas replacement interface are both provided with a purification isolation valve, a weighing sensor is provided in the feeding tank, the outer wall of the feeding tank has a display, the weighing sensor is electrically connected to the display, and the method comprises: a loading process, a purification process, a feeding process, and a withdrawal process. The method can be fed uniformly, the required feeding amount can be completed at one time, the purification is uniform, the purification space is small, the purification time is saved, and automation is realized.

Description

Technical Field

[0001] The invention relates to the technical field of charging equipment, in particular to a method for charging a charging furnace body using a charging device in a clean vacuum environment. Background Art

[0002] The existing feeding device includes the following steps for each material barrel added to the furnace body to be fed: loading, purification, feeding, and withdrawal. Purification means that many raw materials need to exist in an environment isolated from certain gases, such as an oxygen-free environment, or a vacuum environment. The purification process often requires vacuuming and conversion with inert gas. An isolation valve is provided at the upper feed port of the furnace body to be fed. The isolation valve can isolate the two cavities in the closed state and connect the two cavities in the open state. Because of different processes, pressures and atmospheres between different cavities, they are sometimes connected when needed and sometimes not connected when needed. The isolation valve can isolate and connect the two cavities.

[0003] Please refer to Figure 1 , Figure 1 The figure is a typical charging flow chart of a charging device for a furnace body to be charged in the prior art. The outer diameter of the charging tube is smaller than the upper feeding port of the furnace body to be charged, and the charging tube can enter the feeding port of the furnace body 1 to be charged. Loading process: the charging isolation valve 11 of the furnace body to be charged is in a closed state, the upper chamber 2 needs to be filled with atmospheric pressure, and then the charging tube is hung up. Purification process: the charging isolation valve 11 is in a closed state, the upper chamber is evacuated and the gas is replaced several times to achieve a cleanliness and vacuum degree close to that of the furnace body 1 to be charged. Charging process: the charging isolation valve 11 is in an open state, the charging tube descends, and after the charging is completed, the charging tube rises back into the upper chamber. Withdrawal process: the charging isolation valve 11 is in a closed state, and after the upper chamber 2 is filled with atmosphere, it is opened to take out the charging tube.

[0004] Due to production needs, the upper chamber cannot be made very large, and the feeding tube in the upper chamber cannot be made very large either. The amount of material added each time will not be much, while the total amount of material added needs to be very large. Therefore, the above-mentioned feeding process needs to be repeated many times, with many operating steps and is relatively time-consuming.

[0005] In summary, how to effectively solve the problems that the feeding process needs to be repeated many times, has many operation steps, and is time-consuming, is an urgent problem that technicians in this field need to solve. Summary of the invention

[0006] The purpose of the present invention is to provide a method for charging a charging furnace body using a charging device in a clean vacuum environment. The method can perform unified charging, complete the required charging amount at one time, uniformly purify, reduce the purification space, save purification time, and realize automation.

[0007] In order to solve the above technical problems, the present invention provides the following technical solutions:

[0008] A method for feeding a furnace body to be fed using a feeding device in a clean vacuum environment, characterized in that the feeding device in a clean vacuum environment comprises a feeding tank, the feeding volume of the feeding tank is greater than or equal to the feeding volume of the furnace body to be fed, the feeding tank is provided with a feeding port connected to the feeding port of the furnace body to be fed, the feeding tank and the furnace body to be fed are detachably connected, a feeding isolation valve is provided at the feeding port, a feeding isolation valve is provided at the feeding port of the furnace body to be fed, the feeding tank and the furnace body to be fed are both provided with a vacuum interface and a gas replacement interface, the vacuum interface and the gas replacement interface are both provided with a purification isolation valve, a weighing sensor is provided in the feeding tank, the outer wall of the feeding tank is provided with a display, and the weighing sensor is electrically connected to the display;

[0009] The method comprises:

[0010] Charging process: The charging device is charged uniformly in the charging workshop. Before the charging device is fully charged in the charging workshop, the charging isolation valve is closed and the device is directly purified in the charging workshop to achieve automatic purification. After all the isolation valves are closed, the vacuum tube, air pipe and charging pipe or pipeline are disconnected, the charging device can be carried by the AGV trolley or other tools to the side of the furnace;

[0011] Purification process: The isolation valves of the furnace body to be charged and the charging device are both in the closed state, the charging port of the charging device is connected with the charging port of the furnace body to be charged, there is a narrow space between the charging isolation valve of the charging device and the charging isolation valve of the furnace body to be charged, the inside of the charging tank and the furnace body to be charged is in the purification state, and the narrow space between the two isolation valves is purified;

[0012] Charging process: The isolation valves of the furnace body to be charged and the charging device are both in the open state, and the furnace body to be charged and the charging device have similar cleanliness and vacuum degree. Under the action of gravity, the material in the charging tank falls into the furnace body to be charged, and the furnace body to be charged is charged;

[0013] Feeding process: The isolating valves of the furnace body and the feeding device to be fed are in the closed state, and the feeding is completed by removing the feeding device.

[0014] Optionally, a feed ridge is provided at the feed port of the furnace body to be charged, the feed isolation valve is arranged at the lower edge of the feed ridge, and the charging isolation valve is arranged at the bottom surface of the charging tank. When the charging device is docked with the furnace body to be charged, the bottom surface of the charging tank abuts against the upper end surface of the feed ridge. The bottom surface of the charging tank, the feed ridge, the charging isolation valve and the feed isolation valve constitute a docking chamber. The docking chamber is provided with a docking vacuum interface and a docking gas replacement interface. The docking vacuum interface and the docking gas replacement interface are both equipped with docking isolation valves.

[0015] Optionally, the feeding port of the feeding device has a feeding ridge, and the feeding isolation valve is arranged on the upper edge of the feeding ridge.

[0016] Optionally, the outer diameter of the feeding flange is equal to the inner diameter of the feeding flange, and the feeding flange can be inserted into the feeding flange.

[0017] Optionally, the height of the feeding ridge is equal to the depth of the feeding ridge.

[0018] Optionally, the cross-section of the feeding port is equal to the cross-section of the feed port.

[0019] Optionally, the cross-section of the feeding port is equal to the cross-section of the feeding ridge.

[0020] The present invention provides a method for feeding a furnace body to be fed using a feeding device in a clean vacuum environment. The feeding device in a clean vacuum environment includes a feeding tank, which has a feeding port. The feeding tank is fed with materials through the feeding port, and the materials flow out through the feeding port. The furnace body to be fed has a feeding port, and the furnace body to be fed is fed with materials through the feeding port.

[0021] The feeding port of the feeding tank matches the shape and size of the feeding port of the furnace body to be charged, and the feeding port of the feeding tank and the feeding port of the furnace body to be charged can be sealed and docked, so that the material in the feeding tank can be added to the furnace body to be charged. The feeding port of the feeding tank matches the feeding port of the furnace body to be charged, and the feeding tank can be adapted to different furnace types and interfaces, and has universality.

[0022] The feeding tank is detachably connected to the furnace body to be fed, and the furnace body to be fed can be selectively connected to the feeding tank and the upper cavity, that is, when feeding is needed, the feeding tank is connected to the furnace body to be fed; during normal operation, the upper cavity is connected to the furnace body to be fed.

[0023] The feeding tank and the furnace body to be fed are both equipped with vacuum interfaces and gas replacement interfaces, through which the feeding tank and the furnace body to be fed can be evacuated and converted with inert gas respectively, so that the feeding tank and the furnace body to be fed have similar cleanliness and vacuum degree, so as to keep the materials in the feeding tank and the furnace body to be fed in a purified state.

[0024] A feeding isolation valve is provided at the feeding port, a feeding isolation valve is provided at the feeding port of the furnace body to be fed, and purification isolation valves are provided at the vacuum interface and the gas replacement interface. The isolation valve can isolate the two cavities in the closed state and connect the two cavities in the open state. Different cavities have different processes, pressures and atmospheres, and they are sometimes connected and sometimes not connected. The isolation valve can isolate and connect the two cavities.

[0025] The feeding volume of the feeding tank is greater than or equal to the feeding volume of the furnace body to be charged. The feeding volume of the feeding tank is larger, and one loading can meet the feeding demand of the furnace body to be charged, and there is no need to feed the furnace body to be charged multiple times; it can even be done continuously for multiple furnace bodies to be charged, and there is no need to repeatedly feed the feeding tank. The feeding amount required for multiple furnace bodies to be charged can be loaded at one time, and the feeding process is simpler, saving time and effort.

[0026] Charging process: The charging device can be charged uniformly in the charging workshop. Before the charging device is fully charged in the charging workshop, the charging isolation valve is closed and the device is directly purified in the charging workshop to achieve automatic purification. After all the isolation valves are closed and other interfaces or pipelines such as vacuum pipes, air pipes and charging pipes are disconnected, the charging device can be carried by AGV or other tools to the side of the furnace.

[0027] Purification process: the isolation valves of the furnace body to be charged and the charging device are both in closed state, the charging port of the charging device is connected with the charging port of the furnace body to be charged, there is a narrow space between the charging isolation valve of the charging device and the charging isolation valve of the furnace body to be charged, the inside of the charging tank and the furnace body to be charged is in a purification state, and only the narrow space between the two isolation valves needs to be purified. The purification space is small, which reduces the workload and saves time.

[0028] Feeding process: The isolation valves of the furnace body to be fed and the feeding device are both in open state, the furnace body to be fed and the feeding device have similar cleanliness and vacuum degree, and under the action of gravity, the material in the feeding tank falls into the furnace body to be fed, and the furnace body to be fed is fed.

[0029] Feeding process: The isolating valves of the furnace body and the feeding device to be fed are in the closed state, and the feeding is completed by removing the feeding device.

[0030] The feeding device provided by the present invention uses a method for feeding a feeding furnace body using a clean vacuum environment. The feeding device can perform unified feeding, complete the required feeding amount at one time, perform unified purification, reduce the purification space, save purification time, and realize automation. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0032] Figure 1 It is a typical charging flow chart of a charging furnace body by a charging device in the prior art;

[0033] Figure 2This is a flow chart of feeding a furnace body to be fed with a feeding device in a clean vacuum environment provided in a specific embodiment of the present invention.

[0034] The following are marked in the accompanying drawings:

[0035] The furnace body to be charged 1, the upper chamber 2, the charging tank 3, the docking chamber 4, the feed isolation valve 11, and the charging isolation valve 31. DETAILED DESCRIPTION

[0036] The core of the present invention is to provide a method for feeding a charging furnace body using a feeding device in a clean vacuum environment. The method can perform unified feeding, complete the required feeding amount at one time, perform unified purification, reduce the purification space, save purification time, and realize automation.

[0037] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0038] In a specific embodiment, the feeding device for a clean vacuum environment provided by the present invention includes a feeding tank 3, the feeding volume of the feeding tank 3 is greater than or equal to the feeding volume of the furnace body 1 to be charged, the feeding tank 3 is provided with a feeding port connected to the feeding port of the furnace body 1 to be charged, the feeding tank 3 and the furnace body 1 to be charged are detachably connected, a feeding isolation valve 31 is provided at the feeding port, a feeding isolation valve 11 is provided at the feeding port of the furnace body 1 to be charged, the feeding tank 3 and the furnace body 1 to be charged are both provided with a vacuum interface and a gas replacement interface, and the vacuum interface and the gas replacement interface are both equipped with a purification isolation valve.

[0039] In the above structure, the feeding device in the clean vacuum environment includes a feeding tank 3, which has a feeding port, through which the material is fed to the feeding tank 3 and discharged. The furnace body 1 to be fed has a feeding port, through which the material is fed to the furnace body 1 to be fed.

[0040] The feeding port of the feeding tank 3 matches the shape and size of the feeding port of the furnace body 1 to be charged, and the feeding port of the feeding tank 3 and the feeding port of the furnace body 1 to be charged can be sealed and docked, so that the material in the feeding tank 3 is added to the furnace body 1 to be charged. The feeding port of the feeding tank 3 matches the feeding port of the furnace body 1 to be charged, and the feeding tank 3 can be adapted to different furnace types and interfaces, and has universality.

[0041] The feeding tank 3 is detachably connected to the furnace body 1 to be fed, and the furnace body 1 to be fed can be selectively connected to the feeding tank 3 and the upper chamber 2, that is, when feeding is needed, the feeding tank 3 is connected to the furnace body 1 to be fed; during normal operation, the upper chamber 2 is connected to the furnace body 1 to be fed.

[0042] The feeding tank 3 and the furnace body 1 to be fed are both equipped with a vacuum interface and a gas replacement interface, through which the feeding tank 3 and the furnace body 1 to be fed can be evacuated and converted with inert gas respectively, so that the feeding tank 3 and the furnace body 1 to be fed have similar cleanliness and vacuum degree, so as to keep the materials in the feeding tank 3 and the furnace body 1 to be fed in a purified state.

[0043] A feeding isolation valve 31 is provided at the feeding port, a feeding isolation valve 11 is provided at the feeding port of the furnace body 1 to be fed, and purification isolation valves are provided at the vacuum interface and the gas replacement interface. The isolation valve can isolate the two cavities in the closed state and connect the two cavities in the open state. Different cavities have different processes, pressures and atmospheres, and they are sometimes connected and sometimes not connected when needed. The isolation valve can isolate and connect the two cavities.

[0044] The feeding volume of the feeding tank 3 is greater than or equal to the feeding volume of the furnace body 1 to be fed. The feeding volume of the feeding tank 3 is relatively large, and the feeding demand of the furnace body 1 to be fed can be met by loading once, and there is no need to feed the furnace body 1 to be fed multiple times; it can even be done continuously for multiple furnace bodies 1 to be fed, and there is no need for repeated feeding of the feeding tank 3. The required feeding amount of multiple furnace bodies 1 to be fed can be loaded at one time, and the feeding process is simpler, saving time and effort.

[0045] like Figure 2 As shown, Figure 2 This is a flow chart of feeding a furnace body 1 to be fed with a feeding device in a clean vacuum environment provided in a specific embodiment of the present invention.

[0046] Charging process: The charging device can be charged uniformly in the charging workshop. Before the charging device is fully charged in the charging workshop, the charging isolation valve 31 is closed and the charging device is directly purified in the charging workshop to achieve automatic purification. After all the isolation valves are closed and other interfaces or pipelines such as vacuum pipes, air pipes and charging pipes are disconnected, the charging device can be carried by an AGV or other tools to the side of the furnace.

[0047] Purification process: the isolation valves of the furnace body 1 to be charged and the charging device are both in a closed state, the charging port of the charging device is connected with the feeding port of the furnace body 1 to be charged, there is a narrow space between the charging isolation valve 31 of the charging device and the feeding isolation valve 11 of the furnace body 1 to be charged, the inside of the charging tank 3 and the furnace body 1 to be charged is in a purification state, and only the narrow space between the two isolation valves needs to be purified, the purification space is small, the workload is reduced, and time is saved.

[0048] Feeding process: the isolation valves of the furnace body 1 to be fed and the feeding device are both in the open state, the furnace body 1 to be fed and the feeding device have similar cleanliness and vacuum degree, and under the action of gravity, the material in the feeding tank 3 falls into the furnace body 1 to be fed, and the furnace body 1 to be fed is fed.

[0049] Submission process: The isolating valves of the furnace body 1 and the charging device to be charged are both in the closed state, and the charging is completed by removing the charging device.

[0050] The feeding device provided by the present invention uses a method for feeding a feeding furnace body using a clean vacuum environment. The feeding device can perform unified feeding, complete the required feeding amount at one time, perform unified purification, reduce the purification space, save purification time, and realize automation.

[0051] The above-mentioned feeding device for the clean vacuum environment is only a preferred solution and is not limited to it. On this basis, targeted adjustments can be made according to actual needs to obtain different implementation methods. A feeding ridge is provided at the feeding port of the furnace body 1 to be fed, and the feeding isolation valve 11 is arranged at the lower edge of the feeding ridge, that is, the upper side of the feeding ridge is open and the lower side is isolated by the feeding isolation valve 11. The feeding isolation valve 11 can isolate the cavity of the furnace body 1 to be fed for purification treatment.

[0052] The feeding isolation valve 31 is arranged at the bottom surface of the feeding tank 3 , and the feeding isolation valve 31 can isolate the cavity of the feeding tank 3 for purification treatment.

[0053] When the feeding device is docked with the furnace body 1 to be fed, the bottom surface of the feeding tank 3 is in contact with the upper end surface of the feeding convex edge, and the bottom surface of the feeding tank 3, the feeding convex edge, the feeding isolation valve 31 and the feeding isolation valve 11 constitute a docking chamber 4. The docking chamber 4 is equipped with a docking vacuum interface and a docking gas replacement interface, and the docking vacuum interface and the docking gas replacement interface are both equipped with docking isolation valves. The docking chamber 4 has a small space, and the cavity of the feeding tank 3 and the furnace body 1 to be fed is in a purification state. Only the docking chamber 4 needs to be purified, and the purification space is small, which reduces the workload and saves purification time.

[0054] On the basis of the above-mentioned specific embodiments, the feeding port of the feeding device is provided with a feeding flange, and the feeding isolation valve 31 is arranged on the upper edge of the feeding flange. The bottom of the feeding flange is open, and the top is isolated by the feeding isolation valve 31, that is, the cavity of the feeding tank 3 is isolated for purification treatment.

[0055] Optionally, when the charging device is docked with the furnace body 1 to be charged, the charging flange is connected to the feeding flange, the connection position is small, the connection is convenient, and the sealing is good.

[0056] Based on the above-mentioned specific embodiments, the outer diameter of the feeding flange is equal to the inner diameter of the feeding flange, and the feeding flange can be inserted into the feeding flange, that is, the feeding flange is inserted into the feeding flange, and the outer wall of the feeding flange fits tightly with the inner wall of the feeding flange, so the connection stability is better and the sealing is better.

[0057] On the basis of the above-mentioned specific embodiments, the charging flange and the feeding flange are connected by gravity, and are detachably connected. The connection is convenient, and the charging device and the furnace body 1 to be charged can be quickly connected.

[0058] Based on the above specific embodiments, the height of the feeding flange is equal to the depth of the feeding flange. When docked, the mutual insertion depth of the feeding flange and the feeding flange is deeper, and the connection strength is higher. The ends of the feeding flange and the feeding flange abut against the ground, which has better stability and reduces shaking.

[0059] Based on the above-mentioned specific embodiments, the cross-section of the charging port is equal to that of the feed port, the feed port can completely receive the discharge of the charging port, the material can quickly fall into the furnace body 1 to be charged, the falling of the material is relatively smooth, and the material is prevented from accumulating at the feeding port.

[0060] Based on the above-mentioned specific embodiments, the cross-section of the feeding port is equal to the cross-section of the feeding ridge, the diameter of the feeding port is larger, the feeding ridge is connected to the edge of the feeding port, there is no step surface or obstruction at the connection, and the material flows smoothly into the feeding ridge along the edge of the feeding port to ensure smooth discharge.

[0061] In another more reliable embodiment, based on any of the above embodiments, a weighing sensor is provided in the feeding tank 3, and the weighing sensor can be used to weigh the material of the feeding device in real time, and the weight of the material can be accurately obtained, so as to accurately control the feeding amount of the feeding device and the furnace body 1 to be fed. The outer wall of the feeding tank 3 has a display, and the weighing sensor is electrically connected to the display. The display displays the value of the weighing sensor in real time, and the operator can clearly know the weight of the material of the feeding device and the furnace body 1 to be fed, so as to accurately control the feeding amount.

[0062] The various embodiments in this specification are described in a progressive manner, and each embodiment focuses on the differences from other embodiments. The same or similar parts between the various embodiments can be referenced to each other.

[0063] The above is a detailed introduction to the method of charging a charging furnace body using a charging device using a clean vacuum environment provided by the present invention. Specific examples are used herein to illustrate the principles and implementation methods of the present invention. The description of the above embodiments is only used to help understand the method of the present invention and its core idea. It should be pointed out that for ordinary technicians in this technical field, without departing from the principles of the present invention, several improvements and modifications can be made to the present invention, and these improvements and modifications also fall within the scope of protection of the claims of the present invention. Therefore, the present invention will not be limited to the embodiments shown herein, but will conform to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A method for feeding a furnace body to be fed using a feeding device in a clean vacuum environment, characterized in that: The feeding device for the clean vacuum environment comprises a feeding tank (3), the feeding volume of the feeding tank (3) being greater than or equal to the feeding volume of the furnace body (1) to be fed, the feeding tank (3) being provided with a feeding port connected to the feeding port of the furnace body (1) to be fed, the feeding tank (3) and the furnace body (1) to be fed being detachably connected, a feeding isolation valve (31) being provided at the feeding port, a feeding isolation valve (11) being provided at the feeding port of the furnace body (1) to be fed, the feeding tank (3) and the furnace body (1) to be fed being provided with a vacuum interface and a gas replacement interface, the vacuum interface and the gas replacement interface being provided with a purification isolation valve, a weighing sensor being provided inside the feeding tank (3), a display being provided on the outer wall of the feeding tank (3), and the weighing sensor being electrically connected to the display; The method comprises: Charging process: the charging device is charged uniformly in the charging workshop. Before the charging device is fully charged in the charging workshop, the charging isolation valve (31) is closed and the charging device is directly purified in the charging workshop to realize automatic purification. After all the isolation valves are closed and the vacuum pipe, air pipe and charging pipe are disconnected, the charging device can be carried by an AGV or other tools to the side of the furnace. Purification process: the isolation valves of the furnace body (1) to be charged and the charging device are both in a closed state, the charging port of the charging device is connected to the feeding port of the furnace body (1) to be charged, there is a narrow space between the charging isolation valve (31) of the charging device and the feeding isolation valve (11) of the furnace body (1) to be charged, the inside of the charging tank (3) and the furnace body (1) to be charged are in a purification state, and the narrow space between the two isolation valves is purified; Charging process: the isolation valves of the furnace body (1) to be charged and the charging device are both in an open state, the furnace body (1) to be charged and the charging device have similar cleanliness and vacuum, and under the action of gravity, the material in the charging tank (3) falls into the furnace body (1) to be charged, and the furnace body (1) to be charged is charged; Feeding process: The isolating valves of the furnace body (1) to be charged and the charging device are both in the closed state, and the charging is completed by removing the charging device.

2. The method according to claim 1, characterized in that A feed convex edge is provided at the feed inlet of the furnace body (1) to be fed, the feed isolating valve (11) is arranged at the lower edge of the feed convex edge, and the feed isolating valve (31) is arranged at the bottom surface of the feed tank (3). When the feeding device is docked with the furnace body (1) to be fed, the bottom surface of the feed tank (3) abuts against the upper end surface of the feed convex edge. The bottom surface of the feed tank (3), the feed convex edge, the feed isolating valve (31) and the feed isolating valve (11) constitute a docking chamber (4). The docking chamber (4) is provided with a docking vacuum interface and a docking gas replacement interface. The docking vacuum interface and the docking gas replacement interface are both provided with docking isolation valves.

3. The method according to claim 2, characterized in that The feeding port of the feeding device is provided with a feeding ridge, and the feeding isolation valve (31) is arranged on the upper edge of the feeding ridge.

4. The method according to claim 3, characterized in that The outer diameter of the feeding flange is equal to the inner diameter of the feeding flange, and the feeding flange can be inserted into the feeding flange.

5. The method according to claim 4, characterized in that The height of the feeding ridge is equal to the depth of the feeding ridge.

6. The method according to claim 2, characterized in that The cross section of the feeding port is equal to the cross section of the feed port.

7. The method according to claim 6, characterized in that The cross section of the feeding port is equal to the cross section of the feeding convex edge.

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